Implementation of baffles to improve bottom purge gas flow uniformity

Abstract

To provide a processing chamber for improving a uniformity of an azimuthal angle of a pressure profile of a processing gas in a substrate processing device.SOLUTION: A processing chamber 100 contains: a chamber lid assembly 108 that defines a processing capacity 116; a side wall 104; and a substrate support body 111. A bottom bowl 166, a chamber base 106, and a side wall define a purge capacity 118. The purge capacity is positioned to a lower side of the processing capacity. The bottom bowl contains a first front surface 112 having a first equalizer hole penetrating therethrough. A passage 120 positioned onto the first equalizer hole is coupled to the purge capacity of the processing capacity via the first equalizer hole and an inlet port 121. The chamber base includes a purge port 144 so as to be coupled to a purge line 148 for supplying purge gas 119 to the purge capacity, and a baffle arranged in the purge capacity at a predetermined height onto the purge port makes a locus of the purge gas deviated, and makes the speed of a purge gas jet reduced.SELECTED DRAWING: Figure 1

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