Flowmeter calibration system, substrate processing apparatus, and flowmeter calibration method

JP7740823B2Active Publication Date: 2025-09-17TOKYO ELECTRON LTD
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Patent Information

Application Number
JP2021151170
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2021-09-16
Publication Date
2025-09-17
Estimated Expiration
2041-09-16

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Abstract

To provide a technology capable of saving calibration work of a flowmeter.SOLUTION: A flowmeter calibration system comprises: a treatment liquid supply line that supplies treatment liquid to a substrate; a flowmeter that detects a flow rate value of the treatment liquid; a treatment liquid discharge line that is provided downstream of the flowmeter, and discharges the treatment liquid; and a control unit that controls the treatment liquid discharge line. The treatment liquid discharge line has a weighing tank that stores the treatment liquid, and a valve that opens and closes a flow path for the treatment liquid that is discharged downward from the bottom part of the weighing tank. The control unit closes the flow path for the treatment liquid with the valve, and calibrates the flow rate value of the flowmeter based on an amount of treatment liquid stored in the weighing tank.SELECTED DRAWING: Figure 2
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Citation Information

Patent Citations

  • Calibration method for liquid flowmeter

    CN113167632A

  • Liquid adding equipment for calibrating metering precision

    CN215249533U

  • Bagging device of grain

    JP1982005615A

  • Substrate processing apparatus and processing liquid flow measurement method

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    JP2008098426A