Control support device and control support method

The control assistance device addresses the time-consuming process of determining control parameters by using model identification information and judgment models to automatically set appropriate values for air supply and exhaust system components, enhancing efficiency and accuracy in substrate processing.

JP7750775B2Active Publication Date: 2025-10-07SCREEN HOLDINGS CO LTD
View PDF 9 Cites 0 Cited by

Patent Information

Application Number
JP2022031944
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-03-02
Publication Date
2025-10-07
Estimated Expiration
2042-03-02

AI Technical Summary

Technical Problem

Determining control parameter values for components of an air supply and exhaust system in substrate processing apparatuses is time-consuming due to individual differences among components, requiring repeated fine-tuning by engineers.

Method used

A control assistance device that determines parameter values using a correspondence relationship between model identification information and judgment models based on processing information, automatically identifying appropriate parameter values for components in the air supply and exhaust system.

Benefits of technology

Reduces the effort required to determine appropriate control parameters, enabling quick and accurate control of airflow in the chamber, and allowing for automatic parameter setting during installation, inspection, or component replacement.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 0007750775000001
    Figure 0007750775000001
  • Figure 0007750775000002
    Figure 0007750775000002
  • Figure 0007750775000003
    Figure 0007750775000003
Patent Text Reader

Abstract

To reduce effort to determine the value of a control parameter of a component of a supply and exhaust system of a substrate processing device.SOLUTION: A control support device is to determine a parameter value that is the value of a control parameter for controlling a component in a supply and exhaust system of a substrate processing device, and the control support device comprises: a correspondence relationship acquisition unit that acquires the correspondence relationship between a plurality of parameter values and a plurality of pieces of model identification information for identifying each of a plurality of determination models that each determine the degree of normality of the operation of the component from processing information indicating the operation or state related to processing of a substrate performed by the substrate processing device; an information acquisition unit that acquires the model identification information corresponding to a determination model, of the plurality of determination models, which can obtain an appropriate determination result from the processing information during the operation of the component; and a determination unit that determines a parameter value for controlling the component based on the correspondence relationship acquired by the correspondence relationship acquisition unit and the model identification information acquired by the information acquisition unit.SELECTED DRAWING: Figure 7
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Device for changing object model to be controlled

    JP2000003206A

  • Data-analyzing device, method therefor, and program

    JP2006091937A

  • Pressure control device of depressurized processing chamber

    JP2008187139A

  • System, evaluation device, and evaluation method

    JP2018186610A

  • Information processing apparatus, detection method, program, substrate processing system and manufacturing method of article

    JP2021168364A