Transport system, exposure apparatus, and transport method

Abstract

To make it possible to transport an article on an article placement member with the article maintained high in the degree of flatness.SOLUTION: A transport system is provided with a wafer stage WST capable of holding a mounted wafer W and capable of moving along a XY plane, a chuck unit 153 which holds the wafer in a non-contact state from the upper side and can vertically move above a predetermined position, and, when the wafer stage WST is positioned at the predetermined position, a plurality of vertically movable pins 140 capable of supporting the wafer held by the chuck unit 153 from below on the wafer stage WST. Then, a Z-position detection system 146 measures the flatness of the wafer W, and based on the measurement result, the chuck unit 153 holding (supporting) the wafer W and the vertically movable pin 140 are independently driven.SELECTED DRAWING: Figure 4