Amorphous materials and cross-point memory

JP7789400B2Active Publication Date: 2025-12-22NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY
View PDF 10 Cites -1 Cited by

Patent Information

Application Number
JP2023556417
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2021-10-27
Filing Date
2022-10-24
Publication Date
2025-12-22
Estimated Expiration
2042-10-24

Smart Images

  • Figure 0007789400000002
    Figure 0007789400000002
  • Figure 0007789400000003
    Figure 0007789400000003
  • Figure 0007789400000004
    Figure 0007789400000004
Patent Text Reader

Abstract

The present invention provides an amorphous material which contains, as main components, Hf, O and Te and has such a characteristic that the electrical resistivity transits from a first state to a second state that is lower than the first state at a specific threshold voltage. A cross-point type memory can be obtained by sandwiching a pair of a memory part and a selector part containing this amorphous material between two electrode wiring lines.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Cross-point memory and method for manufacturing the same

    JP2018198321A

  • Storage element and storage device

    JP2019129239A

  • Nonvolatile memory element

    JP2020064897A

  • Resistance change element

    JP2021048258A

  • Nonvolatile semiconductor memory device and method for manufacturing the same

    JP2021132128A