Reflective mask blank manufacturing method, reflective mask blank, and focused ion beam processing apparatus

Abstract

To provide a manufacturing method for a reflective mask blank that enables reduction in the processing time for a reference mark and concurrently enhances the precision of edge detection for the reference mark, to provide a reflective mask blank, and to provide a focused ion beam processing apparatus.SOLUTION: Provided is a manufacturing method for a reflective mask blank having a substrate and a reflective film which is laminated on a surface of the substrate and reflects exposure light, a reference mark having a recessed groove-shaped cross section being formed in the reflective film, the manufacturing method including: a contour processing step for processing the reflective film using a low-current focused ion beam along the contours of a planned formation area of the reference mark; and a whole-area processing step for processing the reflective film in the whole planned formation area using a high-current focused ion beam.SELECTED DRAWING: Figure 8

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