Photomask transfer device that positions the side of the photomask with the pattern facing downwards.
JP7844062B1Active Publication Date: 2026-04-13HUAYANG PRECISION MACHINERY CO LTD
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- HUAYANG PRECISION MACHINERY CO LTD
- Filing Date
- 2025-03-19
- Publication Date
- 2026-04-13
Smart Images
Figure 0007844062000001_ABST
Abstract
The present invention provides a photomask transfer device that positions the side of the photomask with the pattern facing downwards. [Solution] The photomask transfer device, which positions the side of the photomask with the pattern facing downwards, comprises a base, an X-direction moving platform, a Y-direction moving platform, a gripper mechanism, a thrust / positioning mechanism, a lifting / rotating platform, and a loading platform. The gripper mechanism has two gripping units. The thrust / positioning mechanism has a fixing unit and a thrusting unit. The loading platform has four frames. The loading platform is positioned in a loading position, a gripping position, or a bottom position by moving up and down. When the loading platform is positioned in the gripping position, the two gripping units can grip or release the photomask on the loading platform. The thrusting unit can move the photomask or keep it stationary.
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Citation Information
Patent Citations
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