Mask assembly

The mask assembly addresses particle contamination by using a kinematic connection with a gap and elastic components to minimize debris generation and facilitate cleaning, improving the cleanliness and efficiency of lithography processes.

JP7864158B2Active Publication Date: 2026-05-22ASML NETHERLANDS BV +1
View PDF 9 Cites 0 Cited by

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
ASML NETHERLANDS BV
Filing Date
2024-06-20
Publication Date
2026-05-22

AI Technical Summary

Technical Problem

Existing mask assemblies in lithography apparatuses face issues with particle contamination due to the pellicle frame rubbing against the patterning device during attachment, leading to the generation of debris particles, and there is a need for a design that allows easy cleaning and reduces particle generation.

Method used

A mask assembly with a pellicle frame mounted on the patterning device using a kinematic connection or over-constrained attachment, featuring a gap between the pellicle frame and the patterning device, allowing for removable attachment and reducing contact, with elastic components to manage movement and prevent debris generation.

Benefits of technology

The design enables easy cleaning of the patterning device by allowing the pellicle frame to be removed, reduces debris generation, and maintains a controlled gas flow to prevent particle entry, enhancing the cleanliness and efficiency of the lithography process.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 0007864158000001
    Figure 0007864158000001
  • Figure 0007864158000002
    Figure 0007864158000002
  • Figure 0007864158000003
    Figure 0007864158000003
Patent Text Reader

Abstract

To provide a mask assembly that obviates or mitigates one or more problems associated with known mask assemblies.SOLUTION: A mask assembly suitable for use in a lithographic process comprises: a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount. The mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device. The mount provides releasably engageable attachment between the patterning device and the pellicle frame.SELECTED DRAWING: Figure 31
Need to check novelty before this filing date? Find Prior Art