Apparatus and method for removing impurities from aluminum plating solution, aluminum deposition apparatus, and method for manufacturing aluminum plated products

Abstract

The objective is to provide an aluminum plating solution impurity removal apparatus and method, or aluminum deposition apparatus, that can efficiently remove water-derived impurities by decomposing and removing water in a non-aqueous aluminum plating solution. According to one aspect of the present invention, an impurity removal apparatus for an aluminum plating solution that removes water-derived impurities contained in the aluminum plating solution comprises an anode and a cathode immersed in the aluminum plating solution, and a power supply device that applies a voltage between the anode and the cathode, wherein the anode is made of metallic aluminum.

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