Spectroscopic analysis substrate containing a polycrystalline structure and method for manufacturing the same

JP7865636B2Active Publication Date: 2026-05-26KOREA INST OF MATERIALS SCI
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
KOREA INST OF MATERIALS SCI
Filing Date
2022-12-14
Publication Date
2026-05-26

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Abstract

The present invention relates to a substrate for spectroscopic analysis including a polycrystalline structure and a method for manufacturing the same. More specifically, the present invention relates to a substrate for spectroscopic analysis of a universal material substrate including a polycrystalline structure with improved signal intensity and signal uniformity, and a method for manufacturing a substrate for spectroscopic analysis including a polycrystalline structure whose shape is controlled by a simple process on the surfaces of various materials.
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