resin film

JP7871587B2Active Publication Date: 2026-06-09SUMITOMO BAKELITE CO LTD

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
SUMITOMO BAKELITE CO LTD
Filing Date
2022-04-13
Publication Date
2026-06-09

AI Technical Summary

Benefits of technology

【0014】 本発明によれば、ポリノルボルネン系樹脂を主材料として含む樹脂フィルムにおける、その厚さ方向に切断することで形成された断面において、直径が5μm以下の細孔を含んでおり、さらに、小角X線散乱測定(SAXS)により得られた樹脂フィルムの散乱像において、散乱ベクトルの大きさをqとしたとき、前記散乱ベクトルの大きさqが0.05nm-1以上0.5nm-1以下の範囲内で、小角X線散乱強度I(q)がq-4に比例している。したがって、この樹脂フィルムを、ポリノルボルネン系樹脂を主材料として構成された、微細な複数の空孔を備える多孔質体からなるものであると言える。

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Patent Text Reader

Abstract

To provide a resin film formed of polynorbornene-based resin as main material, which is made of a porous material containing a plurality of fine voids.SOLUTION: A resin film 1 of the present invention contains polynorbornene-based resin as main material, and is formed of a porous material. A cross section of the resin film formed by being cut in a thickness direction, contains voids having a diameter of 5 μm or less. In a scattering image obtained by small-angle X-ray scattering measurement (SAXS), when the size of a scattering vector is defined as q, the size q of the scattering vector is within the range of 0.05 nm-1 or more and 0.5 nm-1 or less, and small-angle X-ray scattering intensity I(q) is proportional to q-4.SELECTED DRAWING: Figure 1
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Claims

1. A resin film comprising a porous body with polynorbornene-based resin as the main material, The aforementioned polynorbornene-based resin has a glass transition temperature of 200°C or higher. The aforementioned polynorbornene-based resin contains structural units represented by the following general formula (1Y): The resin film, in a cross-section formed by cutting it in the thickness direction, contains pores with a diameter of 5 μm or less, and in the scattering image obtained by small-angle X-ray scattering measurement (SAXS), when the magnitude of the scattering vector is denoted as q, the magnitude of the scattering vector q is 0.05 nm. -1 0.5nm or more -1 Within the following range, the small-angle X-ray scattering intensity I(q) is q -4 A resin film characterized by being proportional to [a certain value]. 【Chemistry 1】 [In general formula (1Y), R1 to R4 are each one of the following: hydrogen, a linear or branched alkyl group having 1 to 20 carbon atoms, an aromatic group, an alicyclic group, or a glycidyl ether group. Also, m is 0 or 1.]

2. The resin film according to claim 1, wherein the relative permittivity at a frequency of 10 GHz is less than 2.

0.

3. The resin film has a dielectric loss tangent of 5.0 × 10 at a frequency of 10 GHz. -4 The resin film according to claim 1, which is less than [amount missing].

4. The resin film according to claim 1, wherein the average thickness of the resin film is 20 μm or more and 500 μm or less.

5. The resin film according to claim 1, wherein the polynorbornene-based resin has a glass transition temperature of 200°C or higher.

6. The resin film according to claim 5, wherein the polynorbornene-based resin is represented by the following general formula (1). 【Chemistry 2】 [In the general formula (1) above, n and m are each independently an integer of 1 or more, and group X is one of the following: a linear or branched alkyl group having 1 to 20 carbon atoms, an aromatic group, an alicyclic group, or a glycidyl ether group.]