Structure of high molecular weight hyaluronic acid, method for producing the same, and cosmetic composition containing the same

JP7874182B2Active Publication Date: 2026-06-15スカイ·セラピューティクス·カンパニー·リミテッド
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Patent Information

Application Number
JP2024548753
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2022-02-23
Filing Date
2023-02-17
Publication Date
2026-06-15
Estimated Expiration
2043-02-17

AI Technical Summary

Technical Problem

Conventional cosmetic formulations with high molecular weight hyaluronic acid face issues of high viscosity, leading to stickiness and poor skin penetration, limiting its effectiveness and user experience, despite the need for higher concentrations to achieve optimal moisturizing effects.

Method used

A method involving the application of shear stress to high molecular weight hyaluronic acid to form a single polymer chain structure with ionic aggregates, reducing viscosity without altering molecular weight, thereby enhancing skin permeability and moisturizing properties.

Benefits of technology

The resulting structure maintains high molecular weight hyaluronic acid's benefits while significantly reducing viscosity, improving skin applicability and penetration, and enhancing moisturizing effects.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The present specification relates to a polymeric hyaluronic acid structure obtained by applying shear stress to a solution containing polymeric hyaluronic acid, a method for producing the same, and a cosmetic composition containing the same.
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Citation Information

Patent Citations

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    JP1990103204A

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    JP1992158796A

  • Pharmaceutical products consisting of salts of hyaluronic acid with local anesthetics

    JP2001503042A

  • Purification method for hyaluronic acid and / or salt thereof

    JP2011195611A

  • Sterile hyaluronic acid solution

    JP2013518926A