Brush and substrate processing apparatus equipped therewith

Abstract

To increase yield, reduce costs, and reduce environmental impact by having a structure that allows the shape of a cleaning surface to be adjusted.SOLUTION: In a cleaning unit 77, a brush 99 that is detachably attached to a brush holder 101 includes a base member 703 to which a plurality of brush pieces 701 are detachably attached. The plurality of brush pieces 701 each constitute a small cleaning surface SCS, and together constitute a cleaning surface CS. Therefore, among the plurality of brush pieces 710, only the brush piece 701 that disturbs the shape of the cleaning surface CS can be replaced. As a result, yield is increased, costs can be reduced, and environmental impact can be reduced.SELECTED DRAWING: Figure 8

Description

Technical Field

[0001] The present invention relates to a brush that acts on a substrate when cleaning substrates such as semiconductor substrates, substrates for flat panel displays (FPDs) such as liquid crystal displays and organic EL (Electroluminescence) display devices, glass substrates for photomasks, and substrates for optical discs, and a substrate processing apparatus equipped with the same.

Background Art

[0002] Conventionally, as this type of apparatus, there is a brush equipped with a resin sponge (for example, see Patent Document 1). In this brush, a cross groove composed of two grooves is formed on the cleaning surface. Since this brush forms a cross groove with a right-angled edge on the cleaning surface, the cleaning characteristics and cleaning efficiency can be improved compared to conventional ones without grooves.

[0003] By the way, when various processes are performed on a substrate, due to the difference in the coefficient of thermal expansion between the front and back surfaces of the substrate, warpage may occur where the peripheral portion is inclined with respect to the central portion of the substrate. Depending on this inclination, the cleaning surface of the brush may not be able to follow the inclination. Therefore, the cleaning efficiency at the peripheral portion of the substrate decreases.

[0004] Therefore, it has been proposed to further increase the above cross grooves, and when viewed from the bottom surface, the cleaning surface is made into an aggregate of small square-shaped small cleaning surfaces. In the brush with a sawtooth-shaped cleaning surface like this, a plurality of small cleaning surfaces gather to form one cleaning surface. Therefore, each small cleaning surface follows according to the inclination of the substrate, so the cleaning surface is likely to follow the inclination of the substrate. As a result, the cleaning efficiency does not decrease even for a substrate with an inclination.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

[0006] However, conventional examples with such a configuration have the following problems. In other words, conventional devices form a cleaning surface by a collection of small cleaning surfaces, which makes it prone to variations in the shape of the cleaning surface. As a result, some cleaning surfaces may not be perfectly flat, or the small cleaning surfaces on the outer periphery may be curved outwards. Brushes with such abnormal cleaning surface shapes are unsuitable for cleaning. Therefore, such brushes are removed during the brush inspection stage. Consequently, this results in a low brush yield and high costs. Furthermore, since they are discarded, there is a significant environmental burden.

[0007] The present invention has been made in view of these circumstances, and aims to provide a brush and a substrate processing apparatus equipped therewith that have a structure that allows the shape of the cleaning surface to be adjusted, thereby enabling high yield, cost reduction, and reduced environmental impact. [Means for solving the problem]

[0008] To achieve this objective, the present invention has the following configuration. In other words, the invention described in claim 1 is a brush that acts on a substrate to perform a cleaning process, comprising a brush body that acts on the substrate, and a brush holder that detachably holds the brush body, wherein the brush body comprises a plurality of brush pieces, each constituting a small cleaning surface, and the entire brush body constituting a cleaning surface, and a base member to which each of the plurality of brush pieces is detachably attached, The brush piece has a locking portion and an extension portion that extends from the locking portion, is narrower than the locking portion, and whose lower surface constitutes the small cleaning surface. The base member has a plurality of mounting holes into which the locking portion is locked and the brush piece is detachably attached. It is characterized by having the following features.

[0009] [Function and Effect] According to the invention described in claim 1, the brush body, which is detachably attached to the brush holder, is equipped with a base member to which a plurality of brush pieces are detachably attached. Each of the plurality of brush pieces constitutes a small cleaning surface, and together they constitute a cleaning surface. Therefore, only the brush piece that is disrupting the shape of the cleaning surface can be replaced. As a result, the yield is high, costs can be reduced, and the environmental impact can be minimized.

[0010] Furthermore, in the present invention, the brush piece comprises a locking portion and an extension portion extending from the locking portion, being narrower than the locking portion, and having a lower surface that constitutes a small cleaning surface, and the base member preferably has a plurality of mounting holes into which the locking portion is locked and the brush piece is detachably attached. stomach.

[0011] The brush piece is attached to the mounting hole of the base member by being secured by a locking portion. Therefore, the extended portion of the brush piece protrudes from the base member, forming the overall cleaning surface. Since the brush piece is only attached to the mounting hole, it can be easily attached and detached.

[0012] Furthermore, in the present invention, the locking portion is configured in a circular shape in plan view, the extension portion is formed protruding from the center of the lower surface of the locking portion and is configured in a cylindrical shape with a smaller diameter than the locking portion, the mounting hole is provided with a counterbore formed on the upper surface of the base member for accommodating the locking portion, and it is preferable that the ceiling surface of the brush holder presses the locking portion against the base member (Claim). 2 ).

[0013] The locking portion of the brush piece is housed in the counterbore of the mounting hole, and the brush piece is attached to the base member. Furthermore, the top surface of the brush holder presses the locking portion against the base member. Therefore, even when the brush is pressed against the substrate with a predetermined pressure, the brush piece is prevented from easily shifting or coming off.

[0014] Furthermore, the invention described in claim 4 is a substrate processing apparatus that performs cleaning processing by applying a brush to a substrate, comprising: a rotating holding unit that holds the substrate in a horizontal position and rotates the substrate; a brush that acts on the upper surface of the substrate held by the rotating holding unit and comprises a brush body that acts on the substrate and a brush holder to which the brush body is attached; a cleaning arm with the brush at its tip; and an arm driving unit that drives the cleaning arm so that the brush moves radially across the substrate between the rotation center and the periphery of the substrate held by the rotating holding unit, wherein the brush body comprises a plurality of brush pieces, each constituting a small cleaning surface, and the entire brush piece constituting a cleaning surface, and a base member to which each of the plurality of brush pieces is detachably attached. The brush piece has a locking portion and an extension portion that extends from the locking portion, is narrower than the locking portion, and whose lower surface constitutes the small cleaning surface. The base member has a plurality of mounting holes into which the locking portion is locked and the brush piece is detachably attached. It is characterized by having the following features.

[0015] [Function and Effects] According to the invention described in claim 4, the brush body, which is detachably attached to the brush holder, is equipped with a base member to which a plurality of brush pieces are detachably attached. Each of the plurality of brush pieces constitutes a small cleaning surface, and together they constitute a cleaning surface. Therefore, only the brush piece that is disrupting the shape of the cleaning surface can be replaced. As a result, the yield is high, costs can be reduced, and the environmental impact can be minimized. In addition, since the cleaning process is performed with a brush body that has a well-maintained cleaning surface, the degree of cleaning of the substrate can be increased. [Effects of the Invention]

[0016] According to the present invention, the brush body, which is detachably attached to a brush holder, includes a base member to which a plurality of brush pieces are detachably attached. Each of the plurality of brush pieces constitutes a small cleaning surface, and together they constitute a cleaning surface. Therefore, only the brush piece that is disrupting the shape of the cleaning surface can be replaced. As a result, yield is high, costs can be reduced, and the environmental impact can be minimized. [Brief explanation of the drawing]

[0017] [Figure 1]It is a plan view showing the overall configuration of a substrate processing apparatus according to an embodiment. [Figure 2] It is a view of the substrate processing apparatus of FIG. 1 seen from the rear X. [Figure 3] It is a plan view showing the schematic configuration of a back surface cleaning unit according to an embodiment. [Figure 4] It is a side view showing the schematic configuration of the back surface cleaning unit. [Figure 5] It is a longitudinal sectional view of the cleaning arm. [Figure 6] It is a longitudinal sectional view showing the cleaning part in a disassembled state. [Figure 7] It is a plan view of the base member. [Figure 8] It is a longitudinal sectional view showing the cleaning part in an assembled state. [Figure 9] It is a longitudinal sectional view showing the cleaning part according to Modification 1 in a disassembled state. [Figure 10] It is a longitudinal sectional view showing the cleaning part according to Modification 2 in a disassembled state.

Mode for Carrying Out the Invention

[0018] Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a plan view showing the overall configuration of a substrate processing apparatus according to an embodiment. FIG. 2 is a view of the substrate processing apparatus of FIG. 1 seen from the rear X.

[0019] <1. Overall Configuration>

[0020] The substrate processing apparatus 1 includes a loading / unloading block 3, an index block 5, and a processing block 7.

[0021] The substrate processing apparatus 1 processes a substrate W. The substrate processing apparatus 1 performs, for example, a cleaning process on the substrate W. The substrate processing apparatus 1 processes the substrate W in a single-wafer type in the processing block 7. The single-wafer type processes one substrate W at a time in a horizontal posture.

[0022] In this specification, for convenience, the direction in which the loading / unloading block 3, indexer block 5, and processing block 7 are aligned is called the "front-to-back direction X". The front-to-back direction X is horizontal. Of the front-to-back direction X, the direction from the processing block 7 toward the loading / unloading block 3 is called the "front". The direction opposite to the front is called the "rear". The horizontal direction perpendicular to the front-to-back direction X is called the "width direction Y". One direction of the "width direction Y" is appropriately called the "right". The direction opposite to the right is called the "left". The direction perpendicular to the horizontal is called the "vertical direction Z". In each figure, front, rear, right, left, up, and down are shown as appropriate for reference.

[0023] <2. Loading / Unloading Block>

[0024] The loading / unloading block 3 includes an input section 9 and an output section 11. The input section 9 and the output section 11 are arranged in the width direction Y. Multiple substrates W (for example, 25) are stacked horizontally at regular intervals within a single carrier C. The carrier C containing the unprocessed substrates W is placed on the input section 9. The input section 9 includes, for example, two mounting tables 13 on which the carrier C is placed. The carrier C has multiple grooves (not shown) formed therein, which accommodate each substrate W with the surfaces of the substrates W spaced apart. The carrier C accommodates the substrates W in a orientation with the surface facing upwards. An example of a carrier C is a FOUP (Front Opening Unify Pod). A FOUP is a sealed container. The carrier C may be an open container, and is of any type.

[0025] The dispensing unit 11 is located on the opposite side of the input unit 9, across the center of the width Y in the substrate processing apparatus 1. The dispensing unit 11 is positioned to the left Y of the input unit 9. The dispensing unit 11 stores the processed substrates W in a carrier C and dispenses the carrier C together. The dispensing unit 11, which functions in this way, is equipped with, for example, two mounting tables 13 for placing the carrier C, similar to the input unit 9. The input unit 9 and the dispensing unit 11 are also called load ports.

[0026] <3. Indexer Block>

[0027] The indexer block 5 is located adjacent to the rear X of the loading / unloading block 3 in the substrate processing apparatus 1. The indexer block 5 includes an indexer robot IR and a transfer unit 15.

[0028] The indexer robot IR is configured to rotate around the vertical Z direction. The indexer robot IR is configured to move in the width direction Y. The indexer robot IR comprises a first hand 19 and a second hand 21. In Figure 1, only one hand is shown for illustrative purposes. The first hand 19 and the second hand 21 each hold one substrate W. The first hand 19 and the second hand 21 are configured to move independently in the front-rear direction X. The indexer robot IR moves in the width direction Y and rotates around the vertical Z direction, moving the first hand 19 and the second hand 21 forward and backward to transfer the substrate W between each cassette C. Similarly, the indexer robot IR transfers the substrate W between itself and the transfer unit 15.

[0029] The transfer section 15 is located at the boundary between the indexer block 5 and the processing block 7. The transfer section 15 is located, for example, in the center in the width direction Y. As shown in Figure 2, the transfer section 15 is formed to be elongated in the vertical direction Z.

[0030] The transfer unit 15 comprises a first reversal unit 23, a pass unit 25, a pass unit 27, and a second reversal unit 29, extending from below to above in the vertical direction Z.

[0031] The first inversion unit 23 inverts the top and bottom of the substrate W received from the indexer block 5. The first inversion unit 23 also inverts the horizontal orientation of the substrate W. Specifically, the first inversion unit 23 changes the orientation of the substrate W from having the top surface facing upwards to having the top surface facing downwards. In other words, it changes the orientation of the substrate W so that the back surface faces upwards.

[0032] The second inversion unit 29 performs the reverse operation. That is, the second inversion unit 29 inverts the orientation of the substrate W received from the processing block 7. The second inversion unit 29 converts the substrate W, which is facing downwards, to an orientation where the front surface is facing upwards. In other words, it converts the orientation of the substrate W so that the back surface is facing downwards.

[0033] The inversion directions of the first inversion unit 23 and the second inversion unit 29 described above may be opposite to each other. That is, the first inversion unit 23 changes the orientation of the substrate W so that the front surface is facing upwards. The second inversion unit 29 changes the orientation of the substrate W so that the back surface is facing upwards.

[0034] The path sections 25 and 27 are used to transfer the substrate W between the indexer block 5 and the processing block 7. Path section 25 is used, for example, to transport the substrate W from the processing block 7 to the indexer block 5. Path section 27 is used, for example, to transport the substrate W from the indexer block 5 to the processing block 7. Note that the transport directions of the substrate W in path sections 25 and 27 may be opposite to each other.

[0035] <4. Processing Block>

[0036] Processing block 7 performs a cleaning process on the substrate W, for example. The cleaning process is, for example, a process using a brush in addition to a processing liquid. As shown in Figure 1, processing block 7 is divided into, for example, a first column R1, a second column R2, and a third column R3 in the width direction Y. In detail, the first column R1 is located to the left in Y. The second column R2 is located in the center of the width direction Y. In other words, the second column R2 is located to the right of the first column R1 in Y. The third column R3 is located to the right of the second column R2 in Y.

[0037] <4-1. 1st column>

[0038] The first column R1 of the processing block 7 comprises multiple processing units 31. For example, the first column R1 comprises four processing units 31. The first column R1 consists of four processing units 31 stacked in the vertical direction Z. Each processing unit 31 will be described in detail later. Each processing unit 31 is, for example, a cleaning unit. The cleaning unit cleans the substrate W. Cleaning units include a surface cleaning unit that cleans the surface of the substrate W and a back surface cleaning unit that cleans the back surface of the substrate W. In this embodiment, the back surface cleaning unit SSR will be used as an example of a processing unit 31.

[0039] <4-2. 2nd column>

[0040] The second column R2 of the processing block 7 is equipped with a center robot CR. The center robot CR is configured to be rotatable about the vertical direction Z. The center robot CR is configured to be able to move up and down in the vertical direction Z. The center robot CR includes, for example, a first hand 33 and a second hand 35. The first hand 33 and the second hand 35 each hold one substrate W. The first hand 33 and the second hand 35 are configured to move independently in the front-rear direction X and the width direction Y.

[0041] <4-3. 3rd column>

[0042] The third column R3 of processing block 7 has the same configuration as the first column R1. That is, the third column R3 has multiple processing units 31. For example, the third column R3 has four processing units 31. The four processing units 31 in the third column R3 are stacked in the vertical direction Z. Each processing unit 31 in the first column R1 and each processing unit 31 in the third column R3 are positioned opposite each other in the width direction Y. This allows the center robot CR to access each opposing processing unit 31 in the first column R1 and the third column R3 at the same height in the vertical direction Z.

[0043] Processing block 7 is configured as described above. Here, an example of the operation of the center robot CR will be briefly explained. The center robot CR receives the substrate W from the first inversion unit 23, for example. The center robot CR transports the substrate W to either the first row R1 or the third row R3 back surface cleaning unit SSR to perform cleaning on the back surface of the substrate W. The center robot CR receives the substrate W that has been cleaned by either the first row R1 or the third row R3 back surface cleaning unit SSR. The center robot CR transports the substrate W to the second inversion unit 29.

[0044] <4-4. Processing Unit>

[0045] Here, the back surface cleaning unit SSR (processing unit 31) will be described with reference to Figures 3 to 5. Figure 3 is a plan view showing the schematic configuration of the back surface cleaning unit according to the embodiment. Figure 4 is a side view showing the schematic configuration of the back surface cleaning unit. Figure 5 is a longitudinal cross-sectional view of the cleaning arm.

[0046] Here, we will explain using the back surface cleaning unit SSR provided in the first row R1 as an example. The back surface cleaning unit SSR in the third row R3 has a configuration where the arrangement in the width direction Y is reversed.

[0047] The back surface cleaning unit SSR comprises a rotating holding section 37, a guard 39, a first processing liquid arm 41, a second processing liquid arm 43, a cleaning arm 45, and a standby pot 47.

[0048] <4-4-1. Rotation Holding Section>

[0049] The rotating holding unit 37 is positioned approximately in the center of the back surface cleaning unit SSR in a plan view. The rotating holding unit 37 rotates the substrate W in the horizontal plane while holding the substrate W in a horizontal position. The rotating holding unit 37 comprises an electric motor 49, a rotating shaft 51, a spin chuck 53, and a support pin 55.

[0050] The electric motor 49 is positioned with its rotating shaft 51 oriented in the vertical direction Z. A spin chuck 53 is attached to the upper end of the rotating shaft 51. The spin chuck 53 has a diameter slightly larger than the diameter of the substrate W. The spin chuck 53 is a circular plate-like member. The spin chuck 53 is equipped with a plurality of support pins 55. In this embodiment, for example, there are six support pins 55. The six support pins 55 contact the outer edge of the substrate W and support the substrate W in a horizontal position. The number of support pins 55 is not limited to six, as long as the substrate W can be stably supported in a horizontal position. The six support pins 55 are erected near the outer edge of the substrate W in the spin chuck 53. The six support pins 55 release the holding of the periphery of the substrate W when the substrate W is loaded into the spin chuck 53 and when the substrate W is unloaded from the spin chuck 53. Therefore, each support pin 55 is configured to be rotatable about the vertical direction Z. A detailed explanation of the specific configuration for performing this operation will be omitted. When the electric motor 49 rotates, the rotation holding unit 37 rotates the spin chuck 53 about the rotation center P1. The rotation center P1 is in the vertical direction Z.

[0051] <4-4-2. Guard>

[0052] The guard 39 is positioned to surround the rotating holding part 37 in a plan view. More specifically, the guard 39 comprises a cylindrical body 57 and an inclined part 59. The guard 39 is configured to be able to move up and down in the vertical direction Z. The guard 39 can move between a lowered standby position and a processing position above the standby position. A detailed explanation of the specific configuration for moving the guard 39 up and down is omitted.

[0053] The body 57 of the guard 39 is cylindrical. The inner circumferential surface of the body 57 is positioned outward from the outer circumferential side of the rotating holding part 37. The inclined part 59 is narrowed from the top of the body 57 toward the rotating shaft 51 side. The inclined part 59 has an opening 61 at its top. The opening 61 is formed in the center of the inclined part 59. The opening 61 is larger than the diameter of the substrate W. The opening 61 is larger than the diameter of the spin chuck 53. When loading or unloading the substrate W, the guard 39 is lowered in the vertical direction Z to a position where the spin chuck 53 protrudes upward from the opening 61. When cleaning the substrate W, the inclined part 59 of the guard 39 is positioned at approximately the height of the substrate W held by the spin chuck 53. The inclined part 59 guides the processing liquid and other substances scattered from the substrate W to the lower part of the guard 39 with its inclined inner circumferential surface.

[0054] <4-4-3. First Processing Liquid Arm>

[0055] The first processing liquid arm 41 is positioned rear X of the rotation holding unit 37 in a plan view. The first processing liquid arm 41 is equipped with an electric motor 42 at its base end. The first processing liquid arm 41 is oscillated around a rotation center P2 at its base end by the electric motor 42. The rotation center P2 is in the vertical direction Z. The first processing liquid arm 41 is equipped with one nozzle 63. The nozzle 63 has a discharge port at its bottom. The nozzle 63 discharges processing liquid. The tip of the nozzle 63 of the first processing liquid arm 41 is configured to swing between a standby position shown in Figure 3 and a supply position near the rotation center P1. When the first processing liquid arm 41 supplies processing liquid to the substrate W, the tip of the nozzle 63 is moved to the supply position. When the first processing liquid arm 41 does not supply processing liquid to the substrate W, the tip of the nozzle 63 is moved to the standby position. The first processing liquid arm 41 may be configured to swing its nozzle 63 above the substrate W so as not to interfere with the cleaning arm 45 when supplying the processing liquid to the substrate W.

[0056] Examples of the processing liquid discharged from the nozzle 63 include a rinsing solution. Examples of rinsing solutions include pure water, carbonated water, electrolyzed ionized water, hydrogen water, and ozonated water.

[0057] <4-4-4. Second processing fluid arm>

[0058] The second processing liquid arm 41 is positioned to the left Y of the rotation holding unit 37 in a plan view. The second processing liquid arm 41 is equipped with an electric motor 44 at its base end. The second processing liquid arm is oscillated by the electric motor 44 around a rotation center P3 at its base end. The rotation center P3 is in the vertical direction Z. The second processing liquid arm 43 is equipped with three nozzles 65, 67, and 69. Each nozzle 65, 67, and 69 has a discharge port at its bottom. The nozzles 65, 67, and 69 discharge processing liquid. The second processing liquid arm 43 is configured so that the tips of the nozzles 65, 67, and 69 can oscillate between a standby position shown in Figure 3 and a supply position near the rotation center P1. When the second processing liquid arm 43 supplies processing liquid to the substrate W, the tips of the nozzles 65, 67, and 69 are moved to the supply position. When the second processing liquid arm 43 is not supplying processing liquid to the substrate W, the tips of the nozzles 65, 67, and 69 are moved to a standby position. When supplying processing liquid to the substrate W, the second processing liquid arm 43 may also be configured to swing the nozzles 65, 67, and 69 above the substrate W to avoid interference with the cleaning arm 45.

[0059] Examples of the processing liquid discharged from nozzles 65, 67, and 69 include chemical solutions. Examples of chemical solutions include those containing at least one of sulfuric acid, nitric acid, acetic acid, hydrochloric acid, hydrofluoric acid, ammonia water, and hydrogen peroxide. More specifically, a mixture of ammonia water and hydrogen peroxide, such as SC-1, can be used.

[0060] <4-4-5. Washing Arm>

[0061] The cleaning arm 45 is configured as follows:

[0062] The cleaning arm 45 comprises a rotating and lifting mechanism 71, a support column 73, a housing 75, and a cleaning section 77.

[0063] The rotary lifting mechanism 71 is configured to allow the support column 73, the housing 75, and the cleaning unit 77 to move up and down in the vertical direction Z. The rotary lifting mechanism 71 is configured to allow the support column 73, the housing 75, and the cleaning unit 77 to swing around the rotation center P4. Specifically, the rotary lifting mechanism 71 is configured, for example, by combining an electric motor and an air cylinder. In the standby position, the rotary lifting mechanism 71 raises the cleaning unit 77 from the standby pot 47 in the vertical direction Z. The rotary lifting mechanism 71 swings (moves) the cleaning unit 77 in a horizontal plane through the support column 73 and the housing 75 so that the cleaning unit 77 passes near the rotation center P1.

[0064] The support column 73 is cylindrical in shape. The lower part of the support column 73 is connected to the rotational lifting mechanism 71. The upper part of the support column 73 is connected to one of the lower parts of the housing 75. The housing 75 has a long axis in the horizontal plane. The housing 75 is equipped with a cleaning unit 77 at the other lower part. The cleaning unit 77 rotates around a rotation center P5. The rotation center P5 is in the vertical direction Z.

[0065] The enclosure 75 comprises a lower enclosure 75a and an upper enclosure 75b. The lower enclosure 75a constitutes the lower part of the enclosure 75. The upper enclosure 75b constitutes the upper part of the enclosure 75. The upper enclosure 75b and the lower enclosure 75a are connected to each other.

[0066] The housing 75 is equipped with a pressing mechanism 81 and a rotating mechanism 83. Specifically, the lower housing 75a is equipped with the pressing mechanism 81 and the rotating mechanism 83.

[0067] The pressing mechanism 81 comprises a pivot member 85, a seesaw member 87, a pressing actuator 89, and a support mechanism 91.

[0068] The pivot member 85 is attached to the upper surface of the lower housing 75a. The pivot member 85 is erected approximately in the center of the lower housing 75a in the front-rear direction X. The pivot member 85 has a pivot shaft 85a at its upper part. The pivot shaft 85a is rotatable about the width direction Y. The seesaw member 87 has its central part 87c pivotably attached to the pivot member 85 via the pivot shaft 85a. The seesaw member 87 has both ends, one side 87l (point of application) and the other side 87r (point of force application), which can alternately move up and down in the vertical direction Z. The pivot shaft 85a is the pivot point of the seesaw member 87.

[0069] The pressing actuator 89 has an operating piece 89a positioned vertically in the Z direction. The pressing actuator 89 raises one side 87l of the seesaw member 87 by extending the operating shaft 89a. The pressing actuator 89 is preferably an air bearing actuator, for example.

[0070] In an air bearing actuator, the operating shaft 89a is supported by air, allowing it to move back and forth with a small gap. Therefore, theoretically, the sliding resistance of the operating shaft 89a is zero, and no friction occurs. As a result, an air bearing actuator can move the operating shaft 89a back and forth even with a small amount of air pressure, compared to a conventional air cylinder. Consequently, it is possible to move it back and forth linearly in response to the air pressure. However, a conventional air cylinder can also be used as the pressing actuator 89.

[0071] In the front-rear direction X, a support mechanism 91 is provided on the opposite side of the pressing actuator 89, which is flanked by the pivot member 85. The support mechanism 91 supports the cleaning unit 77. The support mechanism 91 suspends the cleaning unit 77 below the housing 75.

[0072] The support mechanism 91 includes a holding member 93, a biasing part 95, and a guide part 97.

[0073] The support mechanism 91 suspends and supports the cleaning unit 77. The cleaning unit 77 includes a brush 99 and a brush holder 101. The brush 99 acts on the substrate W to perform cleaning. The brush holder 101 holds the brush 99. The brush holder 101 detachably holds the brush 99. A rotating shaft 103 is attached to the center of the brush holder 101 in a plan view. The rotating shaft 103 extends vertically in the Z direction from the brush holder 101. The brush 99 is held by the cleaning arm 45 and moves in the horizontal plane so as to pass near the rotation center P1 of the substrate W.

[0074] The retaining member 93 rotatably holds the rotating shaft 103. The rotating shaft 103 is, for example, a spline shaft. The rotating shaft 103 is attached to the retaining member 93 via a spline nut 103a. The rotating shaft 103 is movable vertically in the Z direction relative to the spline nut 103a. The retaining member 93 holds the spline nut 103a in a state that allows it to rotate around the vertical Z direction. The spline nut 103a is attached to the retaining member 93 via a bearing (not shown). The rotating shaft 103 is rotatable around the rotation center P5. A pulley 105 is attached to the spline nut 103a protruding from the upper part of the retaining member 93. The pulley 105 is fixed to the outer circumferential surface of the spline nut 103a. When the pulley 105 rotates, the spline nut 103a rotates, and the rotating shaft 103 rotates in the same direction along with it.

[0075] A biasing part 95 is positioned on the upper part of the pulley 105. The biasing part 95 comprises an upper holding part 107, a lower holding part 109, and a coil spring 111. The upper holding part 107 is attached to the upper side of the rotating shaft 103 via a bearing (not shown). In other words, the upper holding part 107 remains stationary even when the rotating shaft 103 rotates. The lower holding part 109 is positioned spaced apart from the upper holding part 107. The lower holding part 109 is located below the upper holding part 107 and on the upper part of the pulley 105. The inner circumferential surface of the lower holding part 109 is positioned spaced apart from the outer circumferential surface of the rotating shaft 103. Therefore, the lower holding part 109 remains stationary even when the rotating shaft 103 rotates. The lower holding part 109 is also attached to the upper surface of the pulley 105 via a bearing. Therefore, the lower holding portion 109 is not affected by the rotation of the pulley 105.

[0076] The coil spring 111 is attached to the upper holding portion 107 and the lower holding portion 109. The upper end of the coil spring 111 is fixed to the upper holding portion 107. The lower end of the coil spring 111 is fixed to the lower holding portion 109. The coil spring 111 has, for example, a cylindrical shape. The coil spring 111 is a compression coil spring. Therefore, the upper holding portion 107 is biased upward from the upper surface of the pulley 105 and the lower holding portion 109. As a result, the rotating shaft 103 is biased upward in the vertical direction Z. Therefore, in the normal state when the pressing actuator 89 is not operating, the brush 99 is maintained at a constant height from the lower surface of the lower housing 75a. In other words, in the normal state, the load on the brush 99 is zero.

[0077] The support mechanism 91 supports a rotating shaft 103 that moves up and down in the vertical direction Z. The support mechanism 91 comprises a linear guide 113 and a shaft holding part 115. The linear guide 113 is positioned adjacent to the holding member 93. The linear guide 113 is erected in the vertical direction Z. The linear guide 113 comprises a rail 113a and a carriage 113b. The rail 113a has its longitudinal direction oriented in the vertical direction Z. The carriage 113b is attached to the rail 113a so as to be movable in the vertical direction Z. The carriage 113b is positioned below the other side 87r of the seesaw member 87. The carriage 113b is positioned to contact the other side 87r of the seesaw member 87 when it is lowered.

[0078] The shaft holder 115 holds the upper part of the rotating shaft 103. The shaft holder 115 holds the rotating shaft 103 in a state that allows it to rotate. The shaft holder 115 holds the rotating shaft 103 via, for example, a bearing (not shown). The carriage 113b is connected to the shaft holder 115. When the pressing actuator 89 raises the operating shaft 89a with a driving force stronger than the biasing force of the coil spring 111, one side 87l (point of application) rises. When one side 87l rises, the other side 87r (point of force application) descends. At this time, the other side 87r lowers the carriage 113b together with the shaft holder 115. As a result, the rotating shaft 103 descends, and the brush 99 moves downward from its predetermined position. When the pressing actuator 89 is driven in this manner, a pressing force corresponding to the driving force of the pressing actuator 89 is applied to the brush 99.

[0079] A rotating mechanism 83 is positioned adjacent to the support mechanism 91. The rotating mechanism 83 is positioned on the pivot member 85 side. The rotating mechanism 83 comprises a mounting member 117 and an electric motor 119. The mounting member 117 is positioned above the bottom surface of the lower housing 75a, spaced apart from the electric motor 119. The rotating shaft of the electric motor 119 is positioned downward in the vertical direction Z. The electric motor 119 rotates its rotating shaft around a rotation center P6. The rotation center P6 is approximately parallel to the rotation center P5 in the vertical direction Z. A pulley 121 is attached to the rotating shaft of the electric motor 119. A timing belt 123 is stretched between pulley 121 and pulley 105. Therefore, when the electric motor 119 rotates, the rotating shaft 103 rotates around the rotation center P5 via the timing belt 123, pulleys 105 and 121, and spline nut 103a. Even when the rotation axis 103 is rotated in this manner, the rotation axis 103 can still move up and down in the vertical direction Z.

[0080] As described above, the cleaning arm 45 is configured as follows. In other words, the operation of the pressing actuator 89 is applied to the other side 87r (point of application) of the seesaw member 87 via one side 87l (point of force application). Therefore, by providing the seesaw member 87, the degree of freedom in the placement of the pressing actuator 89 is increased. Consequently, the height of the substrate processing apparatus 1 can be suppressed. As a result, a multi-stage stacking arrangement of the substrate processing apparatus 1 can be easily realized.

[0081] The brush 99 described above is raised and lowered as follows. The seesaw member 87 is oscillated by the pressing actuator 89. For example, the pressing actuator 89 is operated according to the target load, as will be described later. This operation moves the brush 99 in the vertical direction Z. Specifically, the brush 99 is raised and lowered to a no-load height, an operating height, and a maximum pressing height. The no-load height is the highest. Under normal circumstances, except during the cleaning process, the brush 99 is located at this no-load height. The operating height is lower than the no-load height. The maximum pressing height is lower than the operating height.

[0082] <4-5. Control System>

[0083] The control unit 161 includes a CPU and memory (not shown). The control unit 161 comprehensively controls each of the above-mentioned parts. Specifically, the control unit 161 controls the transport operations in the input unit 9 and the discharge unit 11, the transport operations of the indexer robot IR, the reversal operations of the first reversal unit 23 and the second reversal unit 29, and the transport operations of the center robot CR. The control unit 161 controls the rotation of the electric motor 49 in the back surface cleaning unit SSR (processing unit 31), the lifting and lowering operation of the guard 39, the opening and closing operation of the support pin 55 in the spin chuck 53, the oscillating operation of the electric motors 42 and 44, and the pressing actuator 89. The control unit 161 operates the pressing actuator 89 according to the target load specified for the cleaning process, controlling the pressing pressure applied from the brush 99 to the substrate W.

[0084] The control unit 161 operates the rotary lifting mechanism 71 to move the cleaning unit 77 across the center and periphery of the substrate W. This operation is also called the scanning operation.

[0085] The rotating lifting mechanism corresponds to the "arm drive unit" of the present invention.

[0086] <4-6. Cleaning Section 77>

[0087] Here, the details of the cleaning unit 77 will be explained with reference to Figures 6 to 8. Figure 6 is a longitudinal cross-sectional view showing the cleaning unit in a disassembled state. Figure 7 is a plan view of the base member. Figure 8 is a longitudinal cross-sectional view showing the cleaning unit in an assembled state.

[0088] The cleaning unit 77 corresponds to the "brush" in this invention, and the brush 99 corresponds to the "brush body" in this invention.

[0089] The cleaning unit 77 has a brush 99 attached to a brush holder 101. The brush holder 101 includes a mounting portion 601, an outer circumference portion 603, and a regulating portion 605.

[0090] The mounting portion 601 constitutes the upper part of the brush holder 101. The mounting portion 601 has a circular shape in plan view. A mounting hole 607 is formed on the upper surface of the mounting portion 601. The mounting hole 607 is formed in the center of the mounting portion 601 in plan view. The lower end of the rotating shaft 103 is screwed into the mounting hole 607. The brush holder 101 is connected to the rotating shaft 103 on its upper surface.

[0091] The outer circumferential surface of the mounting portion 601 extends downward in the vertical direction Z. This extended portion constitutes the outer circumferential portion 603. The lower surface of the outer circumferential portion 603 extends toward the center of the mounting portion 601. This portion constitutes the restricting portion 605. The restricting portion 605 has an opening 609 formed in its center in a plan view. The lower surface of the mounting portion 601, the inner circumferential surface of the outer circumferential portion 603, and the upper surface of the restricting portion 605 form a space 611.

[0092] The brush 99 comprises a plurality of brush pieces 701 and a base member 703. The plurality of brush pieces 701 constitute the cleaning surface CS of the brush 99. The plurality of brush pieces 701 form a cleaning surface CS that acts on the upper surface of the substrate W across their entire lower surface. Each brush piece 701 is detachably attached to the base member 703. The base member 703 holds each brush piece 701.

[0093] The brush piece 701 comprises a locking portion 705 and an extension portion 707. The locking portion 705 constitutes the upper part of the brush piece 701. The extension portion 707 extends vertically in the Z direction from the locking portion 705. The extension portion 707 is narrower in width than the locking portion 705. The locking portion 705, for example, has a circular shape in plan view. When viewed from the extension portion 707, the locking portion 705 has a flange shape. The extension portion 707 has a smaller diameter than the locking portion 705. The extension portion 707 has a cylindrical shape. The lower surface of the extension portion 707 constitutes a small cleaning surface SCS.

[0094] The shape of the locking portion 705 is not limited to a circular shape in plan view. The locking portion 705 may also have a polygonal shape in plan view.

[0095] The brush piece 701 is made of, for example, PVA (polyvinyl alcohol). The brush piece 701 may be made of a material other than PVA.

[0096] Refer to Figure 7. Figure 7 shows mounting holes 709 located in a cross shape in the front-rear direction X and width direction Y, while other mounting holes 709 are not shown. The base member 703 has a circular shape in plan view, for example. The space 611 described above is approximately the same size as the outer dimensions of the base member 703. The base member 703 has a plurality of mounting holes 709 formed therein. Each mounting hole 709 penetrates the upper and lower surfaces of the base member 703. Each mounting hole 709 is formed between the center of the base member 703 and a position a certain distance from the end face of the base member 703 towards the center. This certain distance is approximately the same as the length of the restricting portion 605. The base member 703 is preferably an elastic member, taking into consideration the assembly process described later.

[0097] The mounting hole 709 has a counterbore 711 on the upper surface side of the base member 703. The inner diameter of the counterbore 711 is larger than the inner diameter of the mounting hole 709. The counterbore 711 accommodates the locking portion 705 of the brush piece 701. The counterbore 711 has a depth such that the locking portion 705 of the brush piece 701 does not protrude from the upper surface of the base member 703. The counterbore 711 has an inner diameter slightly larger than the diameter of the locking portion 705 of the brush piece 701.

[0098] Multiple brush pieces 701 are inserted from above into mounting holes 709 of the base member 703. The brush pieces 701 are locked by a locking portion 705 in a counterbore portion 711. As shown in Figure 8, the extension portion 707 of the brush piece 701 protrudes downward from the lower surface of the base member 703. The base member 703 is mounted on the brush holder 101. Specifically, the base member 703 is press-fitted through the opening 609 of the brush holder 101. At this time, the ceiling surface constituting the space 611 of the brush holder 101 presses against the upper surface of the base member 703. Therefore, when the cleaning unit 77 is biased by pressing according to the target load during the cleaning process, each brush piece 701 attached to the base member 703 is prevented from easily shifting or coming off.

[0099] It is preferable that the brush holder 101 be configured to be separable and attachable. Specifically, the brush holder 101 is configured to be detachable between the lower part of the outer peripheral portion 603 including the restricting portion 605 of the brush holder 101 and the upper part of the outer peripheral portion 603 including the mounting portion 601 of the brush holder 101. Then, with these separated, the base member 703 is placed in the space 611 and the brush holder 101 is joined. With the brush holder 101 configured in this way, the base member 703 can be easily placed in the space 611.

[0100] The brush piece 701 is simply attached to the mounting hole 709 of the base member 703. Therefore, if a brush piece 701 is deformed or otherwise disturbing the cleaning surface CS, that brush piece 701 can be easily removed. Then, a clean brush piece 701 can be attached in its place.

[0101] The SSR back surface cleaning device, to which the cleaning unit 77 configured as described above is attached, performs the cleaning process as follows. Note that during the actual cleaning process, a cleaning solution is supplied, but this will be omitted in the following explanation.

[0102] In the aforementioned back surface cleaning device SSR, when cleaning the substrate W, the pressing mechanism 81 presses the cleaning unit 77 against the substrate W, which is being rotated by the rotating holding unit 37, with a target load. Furthermore, the cleaning arm 45 moves the cleaning unit 77 across the center and periphery of the substrate W. At this time, the multiple small cleaning surfaces SCS of the brush pieces 701 form a single cleaning surface CS, which acts on the upper surface of the substrate W to perform the cleaning process.

[0103] In this embodiment, the brush 99, which is detachably attached to the brush holder 101, is equipped with a base member 703 to which a plurality of brush pieces 701 are detachably attached. Each of the plurality of brush pieces 701 constitutes a small cleaning surface SCS, and together they constitute a cleaning surface CS. Therefore, only the brush piece 701 that is disrupting the shape of the cleaning surface CS can be replaced from among the plurality of brush pieces 710. As a result, yield is high, costs can be reduced, and the environmental impact can be minimized.

[0104] Furthermore, with the aforementioned back surface cleaning device SSR, the cleaning process on the substrate W is performed by a brush 99 with a well-maintained cleaning surface CS, thus enabling a higher degree of cleaning of the substrate W.

[0105] <Example 1>

[0106] Now, with reference to Figure 9, a modified example of the cleaning unit 77 will be described. Figure 9 is a longitudinal cross-sectional view showing the cleaning unit according to Modified Example 1 in an disassembled state. Note that components identical to those in the cleaning unit 77 in the above-described embodiment are denoted by the same reference numerals, and detailed explanations are omitted.

[0107] The cleaning section 77A differs from the embodiment described above in that the brush piece 701A and the base member 703A are different. In other words, the configuration of the brush 99A is different.

[0108] The brush piece 701A comprises a locking portion 705A and an extension portion 707. The locking portion 705A has a rounded shape at the upper and lower parts of its outer circumferential surface. The locking portion 705A has a chamfered and rounded outer circumferential surface.

[0109] The base member 703A has a plurality of mounting holes 709A. Each mounting hole 709A penetrates only the lower surface of the base member 703A. Each mounting hole 709A does not penetrate the upper surface of the base member 703A. Each mounting hole 709A has a fitting hole 713. The fitting hole 713 is formed above the mounting hole 709A. The inner diameter of the fitting hole 713 is larger than that of the mounting hole 709A. The diameter of the fitting hole 713 is slightly smaller than that of the locking portion 705A of the brush piece 701A. The fitting hole 713 has a ceiling surface.

[0110] Furthermore, it is preferable to form an air vent hole that penetrates from the ceiling surface of the fitting hole 713 to the upper surface of the base member 703A in order to facilitate the fitting of the brush piece 701A. The air vent hole has a smaller diameter than the fitting hole 713.

[0111] Each brush piece 701A is pushed into each mounting hole 709A of the base member 703A from the locking portion 705A side. The locking portion 705A of the brush piece 701A slides along the inner circumferential surface of the mounting hole 709A and then fits into the fitting hole 713. The brush piece 701A is attached to the base member 703A by the locking portion 705A and the fitting hole 713 fitting together. The locking portion 705A and the fitting hole 713 are merely fitted together. Therefore, the brush piece 701A can be removed from the base member 703A by pulling the extension portion 707 of the brush piece 701A firmly downwards.

[0112] The cleaning unit 77A configured in this way provides the same effects as the embodiment described above. Furthermore, when replacing the brush piece 701A, it is not necessary to remove the base member 703A from the brush holder 101. Therefore, the brush piece 701A can be replaced with fewer steps. In other words, the cleaning surface CS of the cleaning unit 77A can be prepared with fewer steps.

[0113] <Modification 2>

[0114] Now, with reference to Figure 10, a modified example of the cleaning unit 77 will be described. Figure 10 is a longitudinal cross-sectional view showing the cleaning unit according to Modified Example 2 in an disassembled state. Note that components that are the same as those in the cleaning unit 77 in the above-described embodiment are denoted by the same reference numerals, and detailed explanations are omitted.

[0115] In the modified example 2, the cleaning section 77B comprises a brush piece 701B and a base member 703B. The brush piece 701B and the base member 703B constitute the brush 99B.

[0116] The brush piece 701B is wedge-shaped. Specifically, the brush piece 701B is an inverted trapezoid, with the upper base longer than the lower base. In other words, the brush piece 701B is cylindrical. The diameter of the upper surface of the brush piece 701B is greater than the diameter of the lower surface.

[0117] The base member 703B is provided with a plurality of mounting holes 709B. Each mounting hole 709B penetrates the upper and lower surfaces of the base member 703B. Each mounting hole 709B is wedge-shaped. Specifically, the mounting hole 709B comprises an upper circular opening 715U and a lower circular opening 715D. The upper opening 715U has an inner diameter approximately the same as the outer diameter of the upper part of the brush piece 701B. The lower opening 715D has an inner diameter approximately the same as the outer diameter of the lower part of the brush piece 701B.

[0118] Each brush piece 701B is inserted from above into each mounting hole 709B of the base member 703B. The brush piece 701B is locked in place by the inner circumferential surface of the mounting hole 709B. The base member 703B with each brush piece 701B attached is then attached to the brush holder 101.

[0119] The cleaning unit 77B configured in this way provides the same effects as the embodiment described above. Furthermore, there are no corners on the brush piece 701B or the mounting hole 709B. Therefore, particles are less likely to accumulate when replacing the brush piece 701B. As a result, it is possible to prevent particles from adhering to the substrate W from the cleaning unit 77B during the cleaning process.

[0120] The present invention is not limited to the embodiments described above, and can be modified and implemented as follows.

[0121] (1) In the embodiments described above, a back surface cleaning unit SSR was used as an example of a substrate processing apparatus. However, the present invention is not limited to a back surface cleaning unit SSR. For example, a surface cleaning unit that cleans the surface of a substrate with a brush 99 can also be applied.

[0122] (2) In the above-described embodiment, the substrate processing apparatus was described using as an example a configuration in which the back surface cleaning unit SSR (processing unit 31) as a substrate processing apparatus is provided in a substrate processing apparatus 1 equipped with an input / output block 3, an indexer block 5, and the like. However, the present invention is not limited to such a configuration. For example, it may consist only of the back surface cleaning unit SSR (processing unit 31).

[0123] (3) In the embodiments described above, the cleaning arm 45 does not have a mechanism for detecting the load applied to the brush 99. However, the present invention is not limited to such a configuration. For example, the force applied to the carriage 113b may be detected by a load cell, and the degree of agreement with the target load may be detected.

[0124] (4) In the above-described embodiments and each of the modifications 1 and 2, the brush pieces 701, 701A, and 701B are detachably attached to the base members 703, 703A, and 703B by insertion or fitting. However, the present invention is not limited to this configuration. For example, the brush pieces 701, 701A, and 701B may be detachably attached to the base members 703, 703A, and 703B using fasteners such as screws.

[0125] (5) In the embodiments and each of the modifications 1 and 2 described above, the brush pieces 701, 701A, and 701B are all individual components. However, the present invention is not limited to such configurations. For example, the present invention may be configured to have multiple brush units consisting of multiple brush pieces 701, 701A, and 701B, such as brush pieces 701, 701A, and 701B located in concentric circles on the outer circumference in a plan view, brush pieces 701, 701A, and 701B located in concentric circles on the inner circumference, and brush pieces 701, 701A, and 701B in the center, which can be detachably attached. This allows for quick replacement of the multiple brush pieces 701, 701A, and 701B on the outer circumference, which are prone to warping that disrupts the cleaning surface CS.

[0126] (6) In the above-described embodiment, the cleaning arm 45 was rotated by a rotational lifting mechanism 71, and the brush 99 was oscillated. However, the present invention is not limited to this configuration. For example, the cleaning arm 45 may be linearly driven by a linear motion mechanism using a ball screw, a linear guide, and a motor that rotates the ball screw, and the movement of the brush 99 held by the cleaning arm 45 may be linear. [Explanation of symbols]

[0127] 1 ... Substrate processing equipment 3… Loading / unloading block 5… Indexerblock 7 ... Processing block W… Circuit board C... Career IR… Indexer Robot 15 … Delivery department 23 … First Inversion Unit 25, 27 ... Pass section 29… Second Inversion Unit 31… Processing Unit SSR… Backside cleaning unit CR... Center Robot 37 ... Rotation holding part 39… Guard 41 ... First processing fluid arm 42… Electric motor 43... Second processing fluid arm 45... Washing arm 47... Standby Pod 53… Spin Chuck 71… Rotary lifting mechanism 75… Cabinet 77, 77A, 77B ... Cleaning section 81... Pressing mechanism 83… Rotation mechanism 85 ... Pivot member 87... Seesaw component 87c … central part 87l ... one side 87r ... Other side 89… Actuator for pressing 91…Support mechanism 93 ... Retaining member 95 ... biasing part 97… Guide Section 99, 99A, 99B… Brushes 101… Brush holder 103 ... Rotation axis 111... Coil spring 113… Linear guide 601 ... Mounting part 603 … Perimeter 605 ... Regulatory Department 701, 701A, 701B… Brush pieces 703, 703A, 703B ... Base components CS… Cleaning surface 705 ... Locking part 707 … Extension part SCS ... Small cleaning surface 709… Mounting holes 711 ... Counterbore section

Claims

1. In a brush that acts on a substrate to perform a cleaning process, The brush body that acts on the circuit board, The brush holder includes a brush holder that detachably holds the brush body, The brush body is Each of the brush pieces constitutes a small cleaning surface, and together they form a cleaning surface. The system comprises a base member to which each of the aforementioned multiple brush pieces is detachably attached, The brush piece has a locking portion and an extension portion that extends from the locking portion, is narrower than the locking portion, and whose lower surface constitutes the small cleaning surface. The brush is characterized in that the base member has a plurality of mounting holes into which the brush pieces are detachably attached by engaging the locking portion.

2. In the brush according to claim 1, The locking portion is configured to be circular in shape when viewed from above. The extension is formed protruding from the center of the lower surface of the locking portion and is cylindrical in shape with a smaller diameter than the locking portion. The mounting hole is provided with a counterbore formed on the upper surface of the base member for housing the locking portion. A brush characterized in that the ceiling surface of the brush holder presses the locking portion against the base member.

3. A brush that acts on a substrate to perform a cleaning process, The brush body that acts on the circuit board, The brush holder includes a brush holder that detachably holds the brush body, The brush body is Each of the brush pieces constitutes a small cleaning surface, and together they form a cleaning surface. A base member to which each of the aforementioned multiple brush pieces is detachably attached, Equipped with, The base member is provided with a plurality of wedge-shaped mounting holes, The aforementioned brush piece is wedge-shaped, A brush characterized in that a portion of the brush piece is locked to the inner circumferential surface of the mounting hole.

4. In a substrate processing apparatus that performs cleaning on a substrate by applying a brush, A rotating holding unit that holds the substrate in a horizontal position and rotates the substrate, A brush that acts on the upper surface of a substrate held by the rotating holding part, comprising a brush body that acts on the substrate and a brush holder to which the brush body is attached, A cleaning arm equipped with the aforementioned brush at its tip, An arm drive unit drives the cleaning arm so that the brush moves radially across the substrate between the center of rotation and the peripheral edge of the substrate held by the rotating holding unit, Equipped with, The brush body is Each of the brush pieces constitutes a small cleaning surface, and together they form a cleaning surface. The system comprises a base member to which each of the aforementioned multiple brush pieces is detachably attached, The brush piece has a locking portion and an extension portion that extends from the locking portion, is narrower than the locking portion, and whose lower surface constitutes the small cleaning surface. The substrate processing apparatus is characterized in that the base member has a plurality of mounting holes into which the brush pieces are detachably attached by engaging the locking portion.

5. A rotating holding unit that holds the substrate in a horizontal position and rotates the substrate, A brush that acts on the upper surface of a substrate held by the rotating holding part, comprising a brush body that acts on the substrate and a brush holder to which the brush body is attached, A cleaning arm equipped with the aforementioned brush at its tip, The system includes an arm drive unit that drives the cleaning arm so that the brush moves radially across the substrate between the center of rotation and the peripheral edge of the substrate, which is held by the rotating holding unit. The brush body is Each of the brush pieces constitutes a small cleaning surface, and together they form a cleaning surface. The system comprises a base member to which each of the aforementioned multiple brush pieces is detachably attached, The base member is provided with a plurality of wedge-shaped mounting holes, The brush piece is wedge-shaped. A substrate processing apparatus characterized in that a portion of the brush piece is locked to the inner circumferential surface of the mounting hole.

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