Substrate processing apparatus and substrate processing method

Abstract

Provided are a substrate processing apparatus and a substrate processing method that can reduce the risk of clogging a drainage pipe, reduce liquid consumption, and contribute to reducing environmental load and running costs. The substrate processing apparatus includes a film fragment discharge unit (71) that uses a first liquid to guide film fragments of a processing film peeled from the surface of a substrate to a drainage pipe (60), a second liquid supply unit that supplies a second liquid to the drainage pipe, a separation mechanism (110) that separates the first and second liquids, and a first liquid storage mechanism (151) and a second liquid storage mechanism (152) that receive the separated first and second liquids, respectively. The processing film is soluble in one of the first and second liquids and insoluble or poorly soluble in the other. The separation mechanism may include a drainage trap tank (111) and a valve mechanism (112) that opens one of a first discharge port (PA) and a second discharge port (PB) and closes the other by vertical movement of a float (113).

Claims

1. A substrate processing unit that processes the substrate, The substrate processing unit includes a processing liquid nozzle that supplies a processing liquid containing a solute and a solvent to the surface of the substrate, The substrate processing unit includes a processing film forming unit that solidifies or hardens the processing liquid to form a processing film on the surface of the substrate, The substrate processing unit includes a peeling unit for peeling the processed film from the surface of the substrate, A drainage pipe for discharging drainage from the substrate processing unit, A film fragment discharge unit that guides the film fragments of the processed film peeled off from the surface of the substrate by the peeling unit to the drainage pipe using the first liquid, A second liquid supply unit supplies a second liquid, different from the first liquid, to the aforementioned drainage pipe, A separation mechanism is provided in the drainage pipe for separating the first liquid and the second liquid, A first liquid receiving mechanism that receives the first liquid separated by the separation mechanism, The system includes a second liquid receiving mechanism that receives the second liquid separated by the separation mechanism, A substrate processing apparatus wherein the processed film is soluble in one of the first liquid and the second liquid, and insoluble or sparingly soluble in the other of the first liquid and the second liquid.

2. The substrate processing apparatus according to claim 1, wherein the second liquid supply unit supplies the second liquid to the substrate in the substrate processing unit.

3. The treated film is insoluble or sparingly soluble in the first liquid, and soluble in the second liquid. The peeling unit, in the substrate processing unit, supplies the first liquid as a peeling solution to the surface of the substrate, thereby peeling the processed film from the surface of the substrate. The substrate processing apparatus according to claim 1, wherein the film fragment discharge section guides the stripping liquid discharged from the surface of the substrate together with the film fragments of the processed film to the drainage pipe.

4. The second liquid supply unit includes a residue removal unit in the substrate processing unit that supplies the second liquid as a residue removal liquid to the surface of the substrate to dissolve and remove the residue of the processing film remaining on the surface of the substrate from which the processing film has been peeled off by the peeling unit. The substrate processing apparatus according to claim 3, wherein the residue removal liquid discharged from the surface of the substrate is guided to the drainage pipe.

5. The treated film is soluble in the first liquid and insoluble or sparingly soluble in the second liquid. The film fragment discharge unit includes a residue removal unit in the substrate processing unit that supplies the first liquid as a residue removal liquid to the surface of the substrate and dissolves the residue of the processing film remaining on the surface of the substrate from which the processing film has been peeled off by the peeling unit, and guides the residue removal liquid discharged from the surface of the substrate together with the film fragments of the processing film to the drainage pipe. The substrate processing apparatus according to claim 1, wherein the second liquid supply unit includes a replacement unit in the substrate processing unit that supplies the second liquid to the surface of the substrate and replaces the residue removal liquid remaining on the surface of the substrate with the second liquid, and the second liquid discharged from the surface of the substrate is guided to the drainage pipe.

6. The substrate processing apparatus according to claim 5, wherein the peeling portion peels off the processing film from the surface of the substrate by blowing gas toward the surface of the substrate in the substrate processing apparatus.

7. The first liquid and the second liquid are immiscible to each other and have different densities. The separation mechanism is A drain trap tank for storing the first liquid and the second liquid and dissolving the film fragments of the processing membrane, A first discharge port for discharging the first liquid from the drain trap tank, A second discharge port for discharging the second liquid from the drain trap tank, The drain trap tank has a float that moves up and down in accordance with the interface between the first liquid and the second liquid, and the vertical movement of the float opens one of the first and second discharge ports and closes the other of the first and second discharge ports, A substrate processing apparatus according to claim 1, including the following:

8. The first liquid and the second liquid are immiscible with each other, have different densities, and have different melting points. The separation mechanism is A drain trap tank for storing the first liquid and the second liquid and dissolving the film fragments of the processing membrane, A cooling unit that freezes one of the first and second liquid layers, which are formed when the first and second liquids separate vertically within the drain trap tank, to transition it to a solid phase, while maintaining the other of the first and second liquid layers in a liquid phase, A discharge unit that discharges the other liquid phase, which is maintained in a liquid state, from the drain trap tank, while one of the first liquid layer and the second liquid layer is in a solid phase state. A substrate processing apparatus according to claim 1, including the following:

9. The substrate processing apparatus according to claim 1, wherein the separation mechanism includes an ion exchange resin unit for selectively extracting the first liquid or the second liquid from a mixture of the first liquid and the second liquid.

10. Either the first liquid or the second liquid contains water, The substrate processing apparatus according to claim 1, wherein the separation mechanism includes a dehydration unit for extracting water from a mixture of the first liquid and the second liquid.

11. The substrate processing apparatus according to claim 9 or 10, further comprising a drain trap tank provided in the drain pipe for storing the first liquid and the second liquid and dissolving the film fragments of the processing membrane, wherein a mixture of the first liquid and the second liquid is supplied from the drain trap tank to the separation mechanism.

12. In the substrate processing section, there is a processing liquid supply step of supplying a processing liquid containing a solute and a solvent to the surface of the substrate, The substrate processing unit includes a processing film formation step in which the processing liquid is solidified or hardened to form a processing film on the surface of the substrate, In the substrate processing unit, a peeling step is performed to peel the processed film from the surface of the substrate, A film fragment discharge step in which film fragments of the processed film peeled off from the surface of the substrate by the peeling step are guided from the substrate processing section to a drainage pipe using a first liquid, A second liquid supply step involves supplying a second liquid, different from the first liquid, to the aforementioned drainage pipe. A separation step is performed to separate the first liquid and the second liquid using a separation mechanism provided in the drainage pipe, The process includes a storage step of storing the first liquid separated by the separation mechanism and the first liquid in a first liquid storage mechanism and a second liquid storage mechanism, respectively. A substrate processing method wherein the processed film is soluble in one of the first liquid and the second liquid, and insoluble or sparingly soluble in the other of the first liquid and the second liquid.

13. The treated film is insoluble or sparingly soluble in the first liquid, and soluble in the second liquid. The peeling step involves supplying the first liquid as a peeling solution to the surface of the substrate in the substrate processing unit, thereby peeling the processed film from the surface of the substrate. The substrate processing method according to claim 12, wherein the film fragment discharge step guides the peeling liquid discharged from the surface of the substrate together with the film fragments of the processed film to the drainage pipe.

14. The substrate processing method according to claim 13, wherein the second liquid supply step includes a residue removal step in which the substrate processing unit supplies the second liquid as a residue removal liquid to the surface of the substrate to dissolve and remove the residue of the processing film remaining on the surface of the substrate from which the processing film has been peeled off by the peeling step, and the residue removal liquid discharged from the surface of the substrate is led to the drainage pipe.

15. The treated film is soluble in the first liquid and insoluble or sparingly soluble in the second liquid. The film fragment discharge step includes a residue removal step in which, in the substrate processing unit, the first liquid is supplied to the surface of the substrate as a residue removal liquid to dissolve the residue of the processing film remaining on the surface of the substrate from which the processing film has been peeled off by the peeling step, and the residue removal liquid discharged from the surface of the substrate together with the film fragments of the processing film is guided to the drainage pipe. The substrate processing method according to claim 12, wherein the second liquid supply step includes a replacement step in the substrate processing unit to supply the second liquid to the surface of the substrate and replace the residue removal liquid remaining on the surface of the substrate with the second liquid, and the second liquid discharged from the surface of the substrate is guided to the drainage pipe.

16. The substrate processing method according to claim 15, wherein the peeling step includes a gas peeling step in which the processed film is peeled off from the surface of the substrate by blowing gas toward the surface of the substrate in the substrate processing unit.

17. The first liquid and the second liquid are immiscible to each other and have different densities. The separation mechanism is A drain trap tank for storing the first liquid and the second liquid and dissolving the film fragments of the processing membrane, A first discharge port for discharging the first liquid from the drain trap tank, A second discharge port for discharging the second liquid from the drain trap tank, The drain trap tank has a float that moves up and down in accordance with the interface between the first liquid and the second liquid, and the vertical movement of the float opens one of the first and second discharge ports and closes the other of the first and second discharge ports, Includes, The separation step is, A membrane fragment dissolution step in which membrane fragments of the treatment membrane are dissolved in the drain trap tank, A first discharge step involves opening the first discharge port with the valve mechanism and discharging the first liquid from the drain trap tank, The substrate processing method according to claim 12, comprising a second discharge step of opening the second discharge port by the valve mechanism and discharging the second liquid from the drain trap tank.

18. The first liquid and the second liquid are immiscible with each other, have different densities, and have different melting points. The separation mechanism includes a drain trap tank for storing the first liquid and the second liquid and dissolving the film fragments of the processing membrane, and a cooling unit for freezing one of the first and second liquid layers, which are formed when the first and second liquids separate vertically within the drain trap tank, to transition it to a solid phase, while maintaining the other of the first and second liquid layers in a liquid phase. The separation step is, A membrane fragment dissolution step in which membrane fragments of the treatment membrane are dissolved in the drain trap tank, A freezing step in which the cooling unit freezes one of the first liquid layer and the second liquid layer to transition to a solid phase, and maintains the other of the first liquid layer and the second liquid layer in a liquid phase, A first discharge step involves discharging the other liquid phase, which is maintained in a liquid state, from the drain trap tank, while one of the first liquid phase and the second liquid phase is in a solid state. After the first discharge step, a melting step is performed to melt one of the first liquid layer and the second liquid layer and transition it to a liquid phase, A second discharge step is performed in which, after the melting step, one of the first liquid layer and the second liquid layer that has transitioned to a liquid phase is discharged from the drain trap tank. The substrate processing method according to claim 12, including the method described in claim 12.

19. The substrate processing method according to claim 12, wherein the separation mechanism includes an ion exchange resin unit for selectively extracting the first liquid or the second liquid from a mixture of the first liquid and the second liquid.

20. Either the first liquid or the second liquid contains water, The substrate processing method according to claim 12, wherein the separation mechanism includes a dehydration unit for extracting water from a mixture of the first liquid and the second liquid.

21. The substrate processing method according to claim 19 or 20, further comprising a membrane dissolution step of storing the first liquid and the second liquid in a drain trap tank provided in the drain pipe to dissolve membrane fragments of the processing membrane, wherein a mixture of the first liquid and the second liquid is supplied from the drain trap tank to the separation mechanism.

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