Selective deposition of highly aligned carbon nanotube films using chemically and topographically patterned substrates.

JP7880887B2Active Publication Date: 2026-06-26WISCONSIN ALUMNI RES FOUND
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Patent Information

Application Number
JP2023547607
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Priority Date
2021-02-08
Filing Date
2022-02-03
Publication Date
2026-06-26
Estimated Expiration
2042-02-03

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Patent Text Reader

Abstract

A method for forming films of aligned carbon nanotubes is provided. Also provided are films formed by the method and electronic devices incorporating the films as active layers. The films are formed by flowing a suspension of carbon nanotubes over a chemically and topographically patterned substrate surface. The method provides a rapid and scalable means of forming films of densely packed, aligned carbon nanotubes over large surface areas.
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Citation Information

Patent Citations

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    JP2008528426A

  • nanotube assembly

    JP2009518261A

  • Alignment of carbon nanotubes in a restricted channel

    JP2020512257A

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    US20090246408A1

  • Highly organized single-walled carbon nanotube networks and method of making using template guided fluidic assembly

    US20100183844A1