Selective deposition of highly aligned carbon nanotube films using chemically and topographically patterned substrates.

JP7880887B2Active Publication Date: 2026-06-26WISCONSIN ALUMNI RES FOUND
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
WISCONSIN ALUMNI RES FOUND
Filing Date
2022-02-03
Publication Date
2026-06-26

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Abstract

A method for forming films of aligned carbon nanotubes is provided. Also provided are films formed by the method and electronic devices incorporating the films as active layers. The films are formed by flowing a suspension of carbon nanotubes over a chemically and topographically patterned substrate surface. The method provides a rapid and scalable means of forming films of densely packed, aligned carbon nanotubes over large surface areas.
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