Photocurable composition with improved thermal stability

JP7880958B2Active Publication Date: 2026-06-26CANON KK
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
CANON KK
Filing Date
2022-11-23
Publication Date
2026-06-26

AI Technical Summary

Technical Problem

Existing inkjet adaptable planarization (IAP) materials lack high etching resistance and thermal stability during subsequent processing steps.

Method used

A photocurable composition comprising a photoinitiator and polymerizable material, including specific monomers with structures that enhance carbon content and low vapor pressure, such as formulas (1) and (2), which form a photocurable layer with high thermal stability and low volatility.

Benefits of technology

The composition achieves a photocurable layer with high thermal stability and etching resistance, suitable for inkjet adaptive planarization and nanoimprint lithography, maintaining uniformity and minimizing monomer loss during processing.

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Abstract

The photocurable composition includes a polymerizable material and a photopolymerization initiator, and the polymerizable material can include a first polymerizable monomer having a structure of formula (1) or formula (2). [Formula 1] JPEG2025503368000039.jpg19121However, X is C1-C4-alkyl or oxygen (O), n is 0 or 1, Y1 and Y2 are [Case 2] JPEG2025503368000040.jpg3389, R3 is H or methyl, where Y1 and Y2 can be the same or different, and the amount of Y1 and Y2 per benzene ring is 1, 2, or 3; R1, R2 are substituted or unsubstituted alkyl or aryl, and the amount of each of R1 and R2 per benzene ring is 0, 1, 2, 3, or 4.
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