Plasma processing equipment

By configuring the plasma processing apparatus with a first coil surrounded by a second coil with more conductors and a larger diameter, the impedance difference is reduced, simplifying the distribution circuit and enhancing power control.

JP7884177B2Active Publication Date: 2026-07-03PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
Filing Date
2022-07-06
Publication Date
2026-07-03

AI Technical Summary

Technical Problem

The impedance difference between multiple coils in a plasma processing apparatus is significant due to the larger length of the second coil, complicating the distribution circuit for high-frequency power.

Method used

The plasma processing apparatus includes a first coil with multiple first conductors connected in parallel and a second coil surrounding it with more second conductors, reducing impedance by configuring the second coil to have a larger diameter and more conductors, and using a simpler distribution circuit with fewer components.

Benefits of technology

This configuration reduces the impedance difference between coils, simplifying the distribution circuit and enabling effective power control.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

To provide a plasma processing device capable of reducing the impedance difference of multiple coils.SOLUTION: A disclosed plasma processing device 10 includes: a chamber 11 having an opening 11a; a stage 12 arranged in the chamber 11 on which an object to be processed is placed; a dielectric member 13 that blocks the opening 11a; a plasma generation unit 16 that generates plasma in chamber 11 by being applied high-frequency power placed at the opposite side of the chamber 11 of the dielectric member 13. The plasma generation unit 16 has a first coil 17 including multiple first conductors 17a connected to one or each other in parallel, and a second coil 18 that is arranged enclosing the first coil 17 including multiple second conductors 18a connected in parallel to each other. The number of the second conductors 18a included in the second coil 18 is larger than the number of the first conductors 17a included in the first coil 17.SELECTED DRAWING: Figure 2
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