Image display device

Abstract

To provide an image display device which has excellent light resistance and can shield blue light.SOLUTION: An image display device 10 includes an organic light-emitting diode element 20, a cover layer 60 provided on a side closer to the observer than the organic light-emitting diode element 20, and a resin layer 49 provided between the organic light-emitting diode element 20 and the cover layer 60, wherein indentation hardness of the resin layer 49 is 100 MPa or more and 600 MPa or less, and the resin layer 49 contains a light-absorbing agent for absorbing light in wavelength regions of 380 nm or more and 500 nm or less.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to an image display device.

Background Art

[0002] In recent years, as a display element, the development of an image display device using an organic light-emitting diode (OLED) element has been progressing (see, for example, Patent Document 1). Unlike a non-emissive display device typified by a liquid crystal display device, an image display device using an organic light-emitting diode element is a self-emissive type and does not require a light source such as a backlight device, so that it is possible to achieve thinning and weight reduction.

[0003]

[0004]

[0005]

[0006]

Prior Art Documents

Patent Document

[0006]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0007] However, conventional ultraviolet absorbers have a relatively short wavelength range centered around 300 nm to 360 nm, so the blue light shielding performance cannot be said to be sufficient. There was.

[0008] The present invention has been made to solve the above problems. That is, an image display device capable of suppressing deterioration of an organic light emitting diode element and shielding blue light is provided. for the purpose.

Means for Solving the Problems

[0009] According to one aspect of the present invention, an organic light emitting diode element, a cover layer provided on the observer side of the organic light emitting diode element, and the organic light emitting diode element and the cover layer are provided. An image display device is provided that includes a resin layer provided between the two, the indentation hardness of the resin layer is 100 MPa or more and 600 MPa or less, and the resin layer has a wavelength of 380 nm or more and 500 nm or less. An image display device including a light absorber that absorbs light in the wavelength range is provided. Pa or more and 600 MPa or less, and the resin layer includes a light absorber that absorbs light in a wavelength range of 380 nm or more and 500 nm or less.

[0010] In the above image display device, the film thickness of the resin layer may be 0.5 μm or more and 50 μm or less.

[0011] ​​​​​​In the above image display device, the light absorber is a compound represented by the following general formula (A). That's fine. [ka] (In formula (A), R 1 R represents a hydrogen atom or a methyl group. 2 It is a linear chain with 1 to 6 carbon atoms. Alternatively, a branched alkylene group or a linear or branched oxyal group having 1 to 6 carbon atoms. (Represents a chylene group.)

[0012] In the above image display device, the light absorber is a compound represented by the following general formula (B). That's fine. [ka] (In formula (B), R 3 This represents a linear or branched alkyl or aralkyl group. R 4 -CN or -COOR 5 This represents, and here, R 5 It may have substituents. Alkyl or aralkyl group (however, R 3 If it is a methyl group, remove the ethyl group. ) represents. )

[0013] According to another aspect of the present invention, an organic light-emitting diode element and the organic light-emitting diode element A cover layer provided on the observer side, and the organic light-emitting diode element and the cover layer A resin layer is provided between the two, and the resin layer is a sesamol-type benzotriazole system An image display device is provided which includes at least one of a compound and an indole compound. ru.

[0014] In the above image display device, the indentation hardness of the resin layer is 100 MPa or less It may be 600 MPa or less.

[0015] In the above image display device, the film thickness of the resin layer may be 0.5 μm or more and 50 μm or less.

[0016] In the above image display device, the resin layer may be an adhesive layer.

[0017] In the above image display device, the sesamol-type benzotriazole compound may be a compound represented by the following general formula (A).

Chemical formula

[0018] In the above image display device, the indole compound may be a compound represented by the following general formula (B).

Chemical formula

Advantages of the Invention

[0019] ​​​​​​According to one and other embodiments of the present invention, the degradation of the organic light-emitting diode element can be suppressed. Furthermore, it is possible to provide an image display device that can block blue light. [Brief explanation of the drawing]

[0020] [Figure 1] This is a schematic diagram of the image display device according to the first embodiment. [Figure 2] This is a schematic configuration diagram of another image display device according to the first embodiment. [Figure 3] This is a schematic diagram of the image display device according to the second embodiment. [Modes for carrying out the invention]

[0021] [First Embodiment] Hereinafter, an image display device according to an embodiment of the present invention will be described with reference to the drawings. In this specification, terms such as "film" and "sheet" are used only as alternative names. They are not distinguishable from each other. Therefore, for example, "film" is also called a sheet. It is used to mean that it also includes components that can be used. Figure 1 shows a schematic structure of the image display device according to this embodiment. Figure 1 is a schematic diagram of another image display device according to this embodiment.

[0022] <<<<<Image display device>>>>>> The image display device 10 shown in Figure 1 has an organic light-emitting diode element ( ) facing the observer. (Sometimes referred to as an "OLED element") 20, a touch sensor 30, and a resin layer 49 The system comprises a circular polarizing plate 40 and a cover layer 60 in this order. The resin layer 49 contains a circular polarizing plate 40. Although it is incorporated into the plate 40, if it is provided between the OLED element and the cover layer, circular deviation It does not need to be incorporated into the light plate. Between the touch sensor 30 and the circular polarizing plate 40 and the circular polarizing The light plate 40 and the cover layer 60 are bonded together via adhesive layers 71 and 72. In this context, "adhesion" is a concept that includes tackiness.

[0023] The size of the image display device 10 is not particularly limited; for example, it can be a smartphone or a tablet. Terminals, personal computers (PCs), wearable devices, digital signage, television The size is determined appropriately according to the size of the vision, etc. Specifically, the size of the image display device 10 is For example, it may be between 1 inch and 500 inches.

[0024] <<<<Organic Light-Emitting Diode Element>>>> As the organic light-emitting diode element 20, a known organic light-emitting diode element can be used. can.

[0025] <<<<Touch sensor>>>> A known touch sensor can be used as the touch sensor 30. The 30 types are not particularly limited, but for example, using a capacitive touch sensor The touch sensor 30 is positioned between the OLED element 20 and the circular polarizing plate 40. However, it may also be placed between the circular polarizing plate and the cover layer.

[0026] <<<<Cover layer>>>> The surface 60A of the cover layer 60 is the surface 10A of the image display device 10. 60 may be a cover glass or a cover film made of resin. Image display device If 10 is flexible, the cover layer 60 is made of flexible glass or a flexible material. It is preferable that it be composed of a flexible resin. Examples of flexible resins include poly Imide resins, polyamide-imide resins, polyamide resins, polyester resins (for example) For example, polyethylene terephthalate resin or polyethylene naphthalate resin, or these Examples include mixtures of two or more of the resins.

[0027] <<<<adhesive layer>>>> Adhesive layers 71 and 72 are liquid ionizing radiation curable adhesives containing ionizing radiation polymerizable compounds. For example, cured products or adhesives of OCR (Optical Clear Resin) or OCA (Optical Clear Resin) It can be composed of Clear Adhesive.

[0028] The thickness of the adhesive layers 71 and 72 is set to 0.5 μm or less, from the viewpoint of making the image display device 10 thinner. It is preferable that the thickness is 50 μm or less. The thickness of the adhesive layers 71 and 72 can be determined by scanning electron microscope ( Using a SEM, cross-sections of adhesive layers 71 and 72 were photographed, and in the images of the cross-sections, the adhesive layer 7 1. The thickness of 72 is measured at 20 locations, and the arithmetic mean of the film thickness at those 20 locations is calculated. It can be calculated by doing so.

[0029] The specific method for taking cross-sectional photographs is as follows: First, cut out a 1mm x 10mm section. A block is prepared by embedding a laminate containing an adhesive layer with an embedding resin, and from this block... Uniform sections, free of holes and other defects, with a thickness of approximately 70nm to 300nm, are prepared using general sectioning methods. Cut out sections. For section preparation, use the "Ultramicrotome EM UC7" (Leica Microphone). (Rosystems Co., Ltd.) etc. are used. Then, a uniform section without holes, etc. is cut out. The remaining block will be used as the measurement sample. Then, a scanning electron microscope (SEM) (product name " Using the "S-4800" (manufactured by Hitachi High-Technologies Corporation), cross-sectional images of the measurement sample were taken. To capture the truth. When taking cross-sectional images using the S-4800 mentioned above, set the detector to "SE". Cross-sectional observation was performed with an acceleration voltage of "3kV" and an emission current of "10μA". Regarding the ratio, adjust the focus and observe whether each layer can be distinguished by contrast and brightness. Dilution ratio is appropriate, ranging from 100 to 100,000 times, preferably 1,000 to 10,000 times depending on the thickness of the adhesive layer. Adjust as needed. Furthermore, to reduce measurement variability in film thickness, measure the adhesive layer thickness at the lowest possible magnification. It is recommended to do so. For example, if the thickness of the adhesive layer is about 9 μm, the magnification should be 2000x. For a particle size of approximately 5 μm, a magnification of 2000 to 5000 times is preferable. Furthermore, the aperture is " Set the beam monitor aperture to "1", the objective lens aperture to "2", and the WD to "8mm". do.

[0030] <<<<Circular polarizer>>>> The circular polarizer 40 has the function of cutting out ambient light. The circular polarizer 40 is, for example, on the observer's side. To that end, the first phase difference film 41 (hereinafter simply referred to as "phase difference film 41") There is also an adhesive layer 42 and a second phase difference film 43 (hereinafter simply referred to as "phase difference film"). It is sometimes referred to as "43," and the adhesive layer 44 and the first protective film 45 (hereinafter simply It is sometimes called "protective film 45," and polarizer 46, and second protective film 4 It is equipped with 7 (hereinafter sometimes simply referred to as "protective film 47") in this order. .

[0031] The circular polarizer 40 has a spectral transmittance of less than 1% at a wavelength of 380 nm, and at a wavelength of 4 The spectral transmittance at 10 nm is 0.5% or more and less than 30%, and the wavelength is 440 nm. It is preferable that the spectral transmittance at m is 35% or more. If the spectral transmittance at a wavelength of 380nm is less than 1%, then it has excellent blue light shielding capabilities. It is achievable. Furthermore, the spectral transmittance at a wavelength of 410 nm in a circular polarizer must be 0.5% or higher. Therefore, the yellow tint of the circular polarizer 40 can be suppressed, and the spectral transmittance at a wavelength of 410 nm is If it is less than 30%, it is possible to achieve excellent blue light blocking without negatively affecting transmitted light. If the spectral transmittance at a wavelength of 440 nm in the circular polarizer 40 is 35% or more, then The yellow index is low, so the circular polarizer 40 itself does not appear yellow, and it transmits light in the visible light range. The transient reduction can be suppressed. The upper limit of the spectral transmittance of the circular polarizer 40 at a wavelength of 380 nm is 0 Less than 0.5% and less than 0.2% are preferable (smaller numbers are preferable). Yen It is preferable that the lower limit of the spectral transmittance of the polarizing plate 40 at a wavelength of 410 nm be 1% or more. Furthermore, it is more preferable that the upper limit be 25% or less. At a wavelength of 440 nm of the circular polarizer 40 The lower limit of the spectral transmittance is preferably 40% or higher, and more preferably 45% or higher (the numerical value is large). (The bigger, the better).

[0032] The spectral transmittance was measured using a circular polarizing plate cut to a size of 50mm x 50mm, with a transmittance of 0.5 A spectrophotometer capable of measuring in nm increments (product name "UV-2450", manufactured by Shimadzu Corporation). (Light source: tungsten lamp and deuterium lamp) First phase difference film of circular polarizer inside With the device positioned so that the side facing the light source, the following measurement conditions were used: wavelength 380nm, 410nm At m and 440nm, the transmittance was measured for a minimum of 5 points within a 1nm margin before and after each value. It shall be determined by setting the average value and calculating it. Note that the wavelength is 380 nm, 4 The spectral transmittance at 10 nm and 440 nm is the value obtained from three measurements, each taken separately. Use the arithmetic mean. Also, if there is a ripple in the spectral transmittance spectrum, use the delta. Smoothing may be performed at 5.0nm. (Measurement conditions) ·Wavelength range: 300nm~780nm • Scan speed: High Slit width: 2.0 • Sampling interval: Auto (0.5nm intervals) ·Lighting:C • Light source: D2 and WI ·Field of view: 2° • Light source switching wavelength: 360nm S / R switching: Standard • Pixel: PM • Auto-zero: Performed at 550nm after baseline scan.

[0033] The circular polarizer 40 has a spectral transmittance of 5% or more and 25% or less at a wavelength of 420 nm. This is preferable. By keeping the spectral transmittance at a wavelength of 420 nm within this range, - To achieve light shielding performance, suppress the reduction in visibility due to coloring, and ensure transparency. Yes, it is possible. The spectral transmittance at a wavelength of 420 nm in the circular polarizer 40 is also possible at wavelengths such as 380 nm. The spectral transmittance should be measured in the same manner as in the case of [specific example].

[0034] If a cover glass or the like is provided on a circular polarizing plate via an adhesive layer, the adhesive layer After peeling off the cover glass, etc., along with the adhesive layer, wavelengths 380nm, 410nm, 420nm The spectral transmittance at nm and 440 nm shall be measured. The cover glass, etc., shall be removed. For example, this can be done as follows: First, a circular polarizing plate is attached via an adhesive or bonding layer. The laminate with a cover glass attached is heated with a hair dryer, and the interface between the circular polarizer and the cover glass is heated. Insert the tip of the cutter blade into the area that seems to be the problem and slowly peel it off. This heating and By repeatedly peeling, the adhesive layer, bonding layer, and cover glass can be removed. Even if such a peeling process is involved, it does not significantly affect the measurement of spectral transmittance.

[0035] The circular polarizer 40 preferably has a yellow index (YI) of 15 or less. If the YI of the polarizing plate 40 is 15 or less, the yellow tint of the circular polarizing plate 40 can be suppressed, and transparency can be achieved. It can also be used for various purposes. The Yellow Index (YI) is a large 50mm x 50mm. The protective film, cut to a small size, is used with a spectrophotometer (product name "UV-2450", Shima Co., Ltd.) (Manufactured by Tsu Manufacturing Co., Ltd., light source: tungsten lamp and deuterium lamp) The first phase of a circular polarizer inside The wavelength of the circular polarizer measured with the differential film side facing the light source side was 300 nm. From the transmittance at 780nm, the color is calculated according to the formula described in JIS Z8722:2009. Calculate the tristimulus values ​​X, Y, and Z, and from the tristimulus values ​​X, Y, and Z, ASTM D1925:196 This value is calculated according to the formula described in section 2. The Yellow Index (YI) is: By measuring the transmittance of each protective film at wavelengths of 300nm to 780nm three times, This is calculated three times, and the arithmetic mean of the values ​​obtained from the three calculations is taken. Note that UV-2450 In this case, the yellow index is displayed on the monitor connected to the UV-2450, as described above. By loading the transient measurement data and checking the "YI" item in the calculation items, This is how it is calculated. The measurement conditions for transmittance at wavelengths of 300nm to 780nm are as follows: The measurement conditions for spectral transmittance at m, 410 nm, and 440 nm are the same as for YI. The lower limit is preferable from the perspective of ensuring high transparency, but blue light cut Considering that performance is also being added, it is more preferable that the value be 1 or higher, 2 or higher, or 3 or higher (number A higher value is preferable. However, if YI is too high, the color will become too yellow. This may be the case. For this reason, it is preferable that the upper limit of YI be 10 or less, 7 or less, or 6 or less. (A smaller number is preferable).

[0036] Furthermore, if a cover glass or the like is provided on the circular polarizing plate via an adhesive or bonding layer, After peeling off the cover glass along with the adhesive layer using the same method as described above, yellow - The index (YI) shall be measured. Furthermore, assuming such a peeling process occurred... However, this does not significantly affect the measurement of the Yellow Index (YI).

[0037] The circular polarizing plate 40 preferably has a blue light shielding rate of 20% or more. If the light shielding rate is 20% or more, the problems caused by blue light mentioned above will be sufficiently resolved. Yes, it is possible. The above blue light shielding rate can be measured by, for example, first cutting it to a size of 50mm x 50mm. The circular polarizing plate that was cut out was measured using a spectrophotometer capable of measuring spectral transmittance in 0.5 nm increments (product name " UV-2450, manufactured by Shimadzu Corporation, light source: tungsten lamp and deuterium lamp With the circular polarizer positioned inside the (P) such that the first phase difference film side faces the light source side, wavelength A transmittance of at least 5 points within a 1nm margin of each wavelength between 300nm and 780nm. Measure the blue light cut rate (%), and the wavelength range is 380nm to 500nm. Let B be the average transmittance (%) for the wavelength range of 500nm to 650nm, and B be the average transmittance (%) for the wavelength range of 500nm to 650nm. Let C be the blue light cut rate, and calculate the blue light cut rate using the following formula. Note that the blue light shielding rate is The arithmetic mean of the values ​​obtained from three measurements is used. Furthermore, the measurement conditions for spectral transmittance are the wavelengths mentioned above. The measurement conditions for spectral transmittance at 380 nm, 410 nm, and 440 nm are the same. . A = (1 - B / C) × 100

[0038] Furthermore, if a cover glass or the like is provided on the circular polarizing plate via an adhesive or bonding layer, After peeling off the cover glass, etc., along with the adhesive layer or bonding layer using the same method as described above, - The shielding rate of the light shall be measured. Even if such a peeling process is performed, This does not significantly affect the measurement of blue light shielding rates.

[0039] The circular polarizer 40 transmits light in the wavelength range of 410 nm to 420 nm, obtained using the least squares method. It is preferable that the slope of the hyperspectral signal is between 2 and 3.8. If so, in the wavelength range of blue light, for example, the wavelength range of 380nm to 500nm It can sufficiently block light. Also, it blocks blue light in the wavelength range (wavelength 380nm~500nm). It is possible that too much of the wavelength range is being cut off, in which case the emission wavelength range of the image display device (for example) However, this can interfere with the light emitted from OLED elements at wavelengths starting from 430nm, resulting in poor color reproduction. The likelihood of such malfunctions occurring increases.

[0040] The above slope shall be determined as follows: First, the size of 50mm x 50mm The circular polarizing plate cut out is then measured using, for example, a spectrophotometer capable of measuring transmittance in 0.5 nm increments. Product name "UV-2450", manufactured by Shimadzu Corporation) contains the first phase difference filter of the circular polarizer With the device positioned so that the "Mu" side faces the light source, each device is used at wavelengths of 410nm to 420nm. Measure the transmittance at least five points within 1 nm before and after, and calculate the average value to obtain the spectral transmittance at wavelengths of 410 nm to 420 nm respectively. Then, using the obtained spectral transmittance, determine the slope of the spectral transmittance at wavelengths of 410 nm to 420 nm by the least squares method. Note that the above slope is the arithmetic mean value of the values obtained from three measurements. Also, the measurement conditions for the spectral transmittance are the same as those for the spectral transmittance at wavelengths of 380 nm, 410 nm, and 440 nm above. By doing so, the spectral transmittance at wavelengths of 410 nm to 420 nm is obtained respectively. Next, using the obtained spectral transmittance, the slope of the spectral transmittance at wavelengths of 410 nm to 420 nm is determined by the least squares method. Note that the above slope is the arithmetic mean value of the values obtained from three measurements. Also, the measurement conditions for the spectral transmittance are the same as those for the spectral transmittance at wavelengths of 380 nm, 410 nm, and 440 nm above. When a mandrel test (a test of winding the sample around a metal cylinder with a diameter ranging from 2 mm to 32 mm) in accordance with JIS K5600 - 5 - 1:1999 is performed on the circular polarizing plate 40, it is preferable that the minimum diameter of the cylinder is 6 mm or less when no crack occurs in the circular polarizing plate 40. If the minimum diameter is 6 mm or less, excellent flexibility can be obtained. The mandrel test is to be performed by winding a circular polarizing plate cut out to a size of 50 mm × 50 mm around a cylinder such that the second resin layer is on the inside. As the retardation film 41, a positive C - plate or a λ / 4 retardation film can be used. When a mandrel test (a test of winding the sample around a metal cylinder with a diameter ranging from 2 mm to 32 mm) in accordance with JIS K5600 - 5 - 1:1999 is performed on the circular polarizing plate 40, it is preferable that the minimum diameter of the cylinder is 6 mm or less when no crack occurs in the circular polarizing plate 40. If the minimum diameter is 6 mm or less, excellent flexibility can be obtained. The mandrel test is to be performed by winding a circular polarizing plate cut out to a size of 50 mm × 50 mm around a cylinder such that the second resin layer is on the inside.

[0041] When a mandrel test (a test of winding the sample around a metal cylinder with a diameter ranging from 2 mm to 32 mm) in accordance with JIS K5600 - 5 - 1:1999 is performed on the circular polarizing plate 40, it is preferable that the minimum diameter of the cylinder is 6 mm or less when no crack occurs in the circular polarizing plate 40. If the minimum diameter is 6 mm or less, excellent flexibility can be obtained. The mandrel test is to be performed by winding a circular polarizing plate cut out to a size of 50 mm × 50 mm around a cylinder such that the second resin layer is on the inside. When a mandrel test (a test of winding the sample around a metal cylinder with a diameter ranging from 2 mm to 32 mm) in accordance with JIS K5600 - 5 - 1:1999 is performed on the circular polarizing plate 40, it is preferable that the minimum diameter of the cylinder is 6 mm or less when no crack occurs in the circular polarizing plate 40. If the minimum diameter is 6 mm or less, excellent flexibility can be obtained. The mandrel test is to be performed by winding a circular polarizing plate cut out to a size of 50 mm × 50 mm around a cylinder such that the second resin layer is on the inside. As the retardation film 41, a positive C - plate or a λ / 4 retardation film can be used. The mandrel test is to be performed by winding a circular polarizing plate cut out to a size of 50 mm × 50 mm around a cylinder such that the second resin layer is on the inside.

[0042] <<<First retardation film>>> As the retardation film 41, a positive C - plate or a λ / 4 retardation film can be used. The positive C - plate is a film that satisfies the relationship nx≒ny < nz when the refractive indices in the in - plane direction are nx and ny, and the refractive index in the thickness direction is nz. By arranging the positive C - plate, the color when viewed from an oblique direction with respect to the normal direction of the display screen can be improved.

[0043] <<Positive C - plate>> The positive C - plate is a film that satisfies the relationship nx≒ny < nz when the refractive indices in the in - plane direction are nx and ny, and the refractive index in the thickness direction is nz. By arranging the positive C - plate, the color when viewed from an oblique direction with respect to the normal direction of the display screen can be improved. By arranging the positive C - plate, the color when viewed from an oblique direction with respect to the normal direction of the display screen can be improved. The positive C plate may, for example, be composed of vertically oriented liquid crystal layers. .

[0044] <<λ / 4 phase difference film>> A λ / 4 phase difference film is a film that, for a given wavelength of light (usually in the visible light region), This film has the characteristic of having an in-plane phase difference of approximately 1 / 4. By doing so, it is possible to convert linearly polarized light to circularly polarized light, or circularly polarized light to linearly polarized light. ru.

[0045] Examples of λ / 4 phase difference films include λ / 4 phase difference films with positive wavelength dispersion and negative phase difference films. Examples include λ / 4 phase difference films with wavelength dispersion. Phase difference film is a film that has the property of decreasing phase difference as the wavelength increases. A λ / 4 phase difference film with negative wavelength dispersion exhibits a larger phase difference as the wavelength increases. It is a film that possesses certain properties.

[0046] A λ / 4 phase difference film with positive wavelength dispersion is used with resin fill while adjusting the stretching ratio. It can be obtained by stretching the resin. A resin for obtaining a λ / 4 phase difference film. Examples of resins that make up the film include cycloolefin resins, cellulose resins, etc. Examples include λ / 4 phase difference films having negative wavelength dispersion, such as polycarbonate. It can be obtained from a phosphate resin or a resin having an aromatic structure.

[0047] <<<adhesive layer>>> Adhesive layers 42 and 44 are liquid ionizing radiation curable adhesives containing ionizing radiation polymerizable compounds. For example, cured products or adhesives of OCR (Optical Clear Resin) or OCA (Optical Clear Resin) It can be constructed from a clear adhesive. The thickness of the adhesive layer 42 is 0.5 μm or more. It is preferable that the thickness be 50 μm or less. The thickness of adhesive layers 42 and 44 is equal to the thickness of adhesive layers 71 and 72. It can be determined using the same method as for thickness.

[0048] <<<Second phase difference film>>> If the phase difference film 41 is a positive C plate, then it becomes the phase difference film 43. Therefore, a λ / 4 phase difference film with negative wavelength dispersion (inverse wavelength dispersion) can be used. Furthermore, if the phase difference film 41 is a λ / 4 phase difference film, then the λ / 2 phase difference film Room can be used.

[0049] <<λ / 4 phase difference film with negative wavelength dispersion>> As a λ / 4 phase difference film having negative wavelength dispersion, the above λ / 4 phase difference film Since it is similar to the λ / 4 phase difference film with negative wavelength dispersion explained in the section, here The explanation will be omitted.

[0050] <<λ / 2 phase difference film>> A λ / 2 phase difference film is a film that, for a given wavelength of light (usually in the visible light region), This film has the characteristic of having an in-plane phase difference of approximately 1 / 2. By doing so, it is possible to convert to circularly polarized light across a wide wavelength range.

[0051] λ / 2 phase difference film is produced by stretching a resin film while adjusting the stretching ratio. It can be obtained by the resin that constitutes the resin film for obtaining a λ / 2 phase difference film. Examples include polycarbonate resins and cycloolefin resins.

[0052] <<<First protective film>>> The protective film 45 is for protecting the polarizer 46. Thickness of the protective film 45 The thickness is preferably 5 μm or more and 80 μm or less. The thickness of the protective film 45 is determined by the adhesive. The film thickness of layers 71 and 72 can be determined by the same method.

[0053] The protective film 45 is preferably made of a resin. For example, the resin may be... Polyester resins, acetylcellulose resins, cycloolefin resins, poly Tersulfone resins, polycarbonate resins, polyolefin resins, (meth)acrylic Polyvinyl chloride resin, polyvinylidene chloride resin, polystyrene resin, vinyl alcohol-based resins, polyarylate-based resins, polyphenylene sulfide-based resins These are some examples. Among these, the OLED element 20 is also susceptible to degradation due to moisture. , with low water vapor transmission rate, and from the viewpoint of suppressing degradation of the OLED element 20 due to moisture, (meta Acrylic resins are preferred. These light-transmitting substrates may contain plasticizers and UV absorbers as needed. Various additives such as lubricants and lubricants may be added.

[0054] Examples of polyester resins include polyethylene terephthalate (PET) and poly Ethylene naphthalate (PEN), polybutylene terephthalate (PBT), polybutylene Examples include resins containing at least one type of naphthalate (PBN) as a component. When using an ester substrate, it exhibits the property of being excited and emitting fluorescence when irradiated with ultraviolet light. It is known that such fluorescence can affect the color of the display surface. When using polyester resins, as mentioned above, light with wavelengths below 380 nm is almost completely blocked. It is preferable to do so. This allows even if a polyester resin is used as the resin, the fluorescence This effectively prevents the occurrence of [the problem].

[0055] Examples of acetylcellulose resins include triacetylcellulose resins and diacetate. Examples include cellulose-based resins. Triacetylcellulose resins have a visible light range of 380°. This substrate is capable of achieving an average light transmittance of 50% or more at ~780nm. The average light transmittance of acetylcellulose-based substrates should be 70% or higher, and preferably 85% or higher. It seems so.

[0056] In addition to pure triacetylcellulose, other types of triacetylcellulose resins are also available. Cellulose acetate propionate, cellulose acetate butyrate, etc. It may also be a product in which components other than acetic acid are used as fatty acids that form esters with the acetic acid. Furthermore, these triacetylcelluloses may contain other compounds such as diacetylcellulose as needed. Cellulose lower fatty acid esters may be added.

[0057] Examples of cycloolefin resins include norbornene monomers and monocyclic cycloolefins. Examples include substrates made of polymers such as refin monomers. Commercially available cycloolefin resins. Examples of such products include Zeonex and Zeonor (norbornene-based) manufactured by Zeon Corporation. Resin), Sumitomo Bakelite Co., Ltd.'s Sumilight FS-1700, JSR Corporation's Arton (modified norbornene-based resin), and Apel (cyclic olefin-based resin) manufactured by Mitsui Chemicals, Inc. Polymer), Topas (cyclic olefin copolymer) manufactured by Ticona, Ltd., Hitachi Chemical Co., Ltd. Examples include the company's Optrets OZ-1000 series (alicyclic acrylic resin).

[0058] Examples of polycarbonate resins include bisphenols (such as bisphenol A). Aromatic polycarbonate resin based on diethylene glycol bisallyl carbonate Examples include aliphatic polycarbonate resins such as nate.

[0059] Examples of (meth)acrylic resins include poly(meth)acrylate methyl resins, Ethyl methacrylate resin, methyl methacrylate - methyl methacrylate Examples include chill copolymer resins.

[0060] <<<Polarizer>>> The polarizer 46 is positioned between the protective films 45 and 47. The polarizer 46 is iodine Alternatively, a polyvinyl alcohol-based resin film dyed with a dichroic dye and uniaxially stretched is used. It can be used. As for polyvinyl alcohol-based resins, saponified polyvinyl acetate resins are used. A polyvinyl acetate resin can be used. Examples include polyvinyl acetate copolymers, as well as copolymers of vinyl acetate with other monomers copolymerizable thereto. Other monomers copolymerizable with vinyl acetate include, for example, unsaturated carboxylic acids. Olefins, vinyl ethers, unsaturated sulfonic acids, acrylics having ammonium groups Examples include luamides, etc. Polyvinyl alcohol-based resins may be modified, for example For example, using polyvinyl formal or polyvinyl acetal modified with aldehydes. It is also possible to do so.

[0061] <<<Second protective film>>> The protective film 47 is also for protecting the polarizer 46. The protective film 47 is, A light-transmitting substrate 48 and a first resin layer 49 (hereinafter sometimes simply referred to as "resin layer 49") ) and the second resin layer 50 (hereinafter sometimes simply referred to as "resin layer 50") are It is a laminated structure with layers stacked in order. The surface of the protective film 47 is the surface of the second resin layer 50. It is a surface. "The surface of the second resin layer" refers to the light-transmitting substrate side of the second resin layer. The term "face" here refers to the opposite side.

[0062] The thickness of the protective film 47 is preferably 5 μm or more and 80 μm or less. The thickness of film 47 can be determined by the same method as the film thickness of adhesive layers 71 and 72.

[0063] The protective film 47 has a spectral transmittance of less than 1% at a wavelength of 380nm, The spectral transmittance at 410 nm is 1% or more and less than 60%, and the wavelength is 440 nm. It is preferable that the spectral transmittance at m is 70% or more. If the spectral transmittance at a wavelength of 380nm is less than 1%, then it provides excellent blue light shielding. The rate can be achieved. Furthermore, the spectral transmittance at a wavelength of 410nm in the protective film is 1%. If the above conditions are met, the yellowing of the protective film 47 can be suppressed, and the spectral analysis at a wavelength of 410 nm can be performed. If the transmittance is less than 60%, it provides excellent blue light blocking without negatively affecting transmitted light. It is achievable. The spectral transmittance at a wavelength of 440nm in protective film 47 is 70% or higher. If so, the yellow index is low and the protective film 47 itself does not turn yellow, This can suppress the decrease in transmittance in the visible light region. The upper limit of light transmittance is preferably less than 0.5% and more preferably less than 0.2% (the smaller the value...) (The more preferable) The lower limit of the spectral transmittance of protective film 47 at a wavelength of 410 nm is 3%. It is more preferable that it be greater than or equal to 55%, and more preferably that the upper limit be 55% or less. The lower limit of the spectral transmittance of Lum 47 at a wavelength of 440 nm is 75% or higher and 80% or higher. This is more preferable (the larger the value, the better). The spectral transmittance of the protective film 47 is The spectral transmittance of the circular polarizer 40 shall be measured using the same method as described above.

[0064] The surface of the protective film 47 (the surface of the resin layer 50) is subjected to a pencil hardness test to obtain flexibility. The hardness (pencil hardness) measured in the test is preferably between B and H. This involves cutting a protective film to a size of 50mm x 100mm and placing it on the glass plate to prevent folds and wrinkles. Secure it with cellophane tape (registered trademark) manufactured by Nichiban Co., Ltd., and on the surface of the protective film. In contrast, the pencil hardness tester (product name "Pencil Scratch Coating Hardness Tester (Electric Type)", Higashi Co., Ltd.) Using a (manufactured by Yoh Seiki Seisakusho) 300g of [material] into a pencil (product name "Uni", manufactured by Mitsubishi Pencil Co., Ltd.) This shall be done by moving the object at a speed of 3 mm / second while applying a load. The degree is the highest hardness at which the surface of protective film 47 remained unscratched in the pencil hardness test. Note that when measuring pencil hardness, multiple pencils with different hardness levels are used, but only one pencil is used. Each book underwent a pencil hardness test five times, and if the surface of the protective film 47 was scratched in four or more of those five tests, If this does not happen, the surface of the protective film 47 will not be scratched with pencils of this hardness. It is determined that the above scratches were found on the surface of protective film 47, which underwent a pencil hardness test under fluorescent light. This refers to things that can be seen through transmission observation.

[0065] The contact angle with water on the surface of the protective film 47 (surface of the resin layer 50) is 75° or less. It is preferable that the contact angle is downward. If this contact angle is 75° or less, the contact with the adhesive layer 72 is tight. Adhesion is improved. The contact angle with water on the surface of the protective film 47 is JIS R3 According to the drop method described in 257-1999, a microscopic contact angle meter (product name "DropMas") The measurement is performed using "ter300" (manufactured by Kyowa Interface Science Co., Ltd.). The contact angle with water is: 1 μL of water was dropped onto the surface of the protective film 47, and the contact angles were measured at 10 points immediately after dropping. The arithmetic mean of these is taken as the contact angle of the surface of the protective film 47. It is more preferable that the contact angle with water on the surface is 70° or less.

[0066] <<Light transparent base material>> The thickness of the light-transmitting substrate 48 is 5 μm or more, for the same reasons as the thickness of the protective film 45. It is preferable that the thickness be 0 μm or less. The thickness of the light-transmitting substrate 48 is equal to the thickness of the adhesive layers 71 and 72. It can be determined by a similar method. The light-transmitting substrate 48 is made of resin. It is preferable to do so. The resin can be the same as that used for the protective film 45. We will omit the explanation here.

[0067] <<First resin layer>> The resin layer 49 is positioned between the OLED element 20 and the cover layer 60, and hard coating This layer functions as a base layer. The indentation hardness of the resin layer 49 is 100 MPa or less. The upper limit is 600 MPa or less. The indentation hardness of resin layer 49 is 100 MPa. If it is above a, the desired hardness can be obtained while suppressing the decrease in scratch resistance, If the pressure is 600 MPa or less, a resin layer 49 with excellent flexibility can be obtained. The lower limit of the indentation hardness of 9 is preferably 150 MPa or higher, and the upper limit is 5 It is preferable that it be 00 MPa or less. In this specification, "indentation hardness" and This value is obtained from the load-displacement curve of the indenter from loading to unloading.

[0068] Indentation hardness (H IT ) is a TI manufactured by HYSITRON. This can be measured using the 950 TriboIndenter. Specifically, first A block is made by embedding a protective film cut to 1mm x 10mm in embedding resin. Prepare a sample suitable for hardness measurement using the nanoindentation method. For sample preparation, the "Ultramicrotome EM UC7" (Leica Microsys) is used. Thames Corporation, etc. can be used. Next, the surface on which the indenter of the measurement sample is pressed is The measurement sample is positioned parallel to the mounting surface of the stage using HYSITRON. It is fixed to the stage of the company's TI950 TriboIndenter. Then, the resin layer In the flat portion in the center of the cross-section, the load control method is used to ensure that the maximum indentation load is 300 μN. Then, a Berkovich-type indenter is applied at a loading speed of 10 μN / sec, and the load is increased from 0 μN to 300 μN in 30 seconds. Press the resin layer while applying load, then hold at 300 μN for 5 seconds, and then for 30 seconds Then, the load is removed from 300 μN to 0 μN. And the indentation load F(N) at this time corresponds to The indentation depth h (nm) is continuously measured, and a load-displacement curve is created. Indentation stiffness H from load-displacement curve IT Push it in as far as possible as shown in equation (1) below. Load Fmax (N) is the projected area A where the indenter and the resin layer are in contact. p (mm 2 The value obtained by dividing by ) This can be determined by the following method. The indentation hardness is the value obtained by measuring at 10 points. Let it be the arithmetic mean. H IT =F max / A p …(1) Here, A p This value is obtained by the following equation (2). A p =23.96(h max -0.75(h max -h r )) 2 …(2) In the above equation (2), h max is the maximum indentation depth, h r is F max Unloading curve in The tangent line to the horizontal axis (displacement) corresponds to the value at the intersection point.

[0069] The thickness of the resin layer 49 is preferably 0.5 μm or more and 15 μm or less. If the film thickness is 0.5 μm or more, a hardness sufficient to prevent scratching during the production process can be obtained. It can be done. Also, if the film thickness of the resin layer 49 is 15 μm or less, when bending or curving Crack formation can be suppressed. The thickness of the resin layer 49 is the same as the thickness of the adhesive layers 71 and 72. This can be determined by law. The lower limit of the film thickness of the resin layer 49 is 1 μm or more. It is preferable that the upper limit be 10 μm or less.

[0070] The resin layer 49 is mainly composed of resin, but also contains waves in addition to or as part of the resin. It contains a light-absorbing agent that absorbs light in the wavelength range of 380 nm to 500 nm.

[0071] <Resin> The resin contained in the resin layer includes polymers of ionizing radiation polymerizable compounds. The resin includes polymers of ionizing radiation polymerizable compounds, as well as solvent-drying resins and thermosetting compounds. That's fine.

[0072] (Ionizing radiation polymerizable compounds) Ionizing radiation polymerizable compounds are those that have at least one ionizing radiation polymerizable functional group. In this specification, "ionizing radiation polymerizable functional group" refers to a functional group that polymerizes upon irradiation with ionizing radiation. It is a functional group that can be used. Examples of ionizing radiation polymerizable functional groups include (meth)acryloyce. Examples of ethylenically unsaturated groups include vinyl groups, allyl groups, and other similar groups. The term "(meth)acryloyl group" refers to the combination of "acryloyl group" and "methacryloyl group". It means both. Also, ionizing radiation is irradiated when polymerizing ionizing radiation polymerizable compounds. Examples of radiation include visible light, ultraviolet rays, X-rays, electron beams, alpha rays, beta rays, and gamma rays. .

[0073] Examples of ionizing radiation polymerizable compounds having one ethylenically unsaturated group include ethyl( Meth)acrylate, ethylhexyl (meth)acrylate, styrene, methylstyrene Examples include N-vinylpyrrolidone, etc. Electron having two or more ethylenically unsaturated groups. Examples of radiation-free polymerizable compounds include polymethylolpropane tri(meth)acrylate. Hexanediol (meth)acrylate, tripropylene glycol di(meth)acrylate acrylate, diethylene glycol di(meth)acrylate, pentaerythritol tri (meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,6- Hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate Polyfunctional compounds such as phosphates, or reaction products of the above polyfunctional compounds such as (meth)acrylates. Examples include poly(meth)acrylate esters of polyhydric alcohols. .

[0074] In addition to the above compounds, relatively low molecular weight polyester resins having ethylenically unsaturated groups. Polyether resin, acrylic resin, epoxy resin, urethane resin, alkyd resin, Pyroacetal resins, polybutadiene resins, polythiol polyene resins, etc., also emit the above-mentioned ionizing radiation. It can be used as a linearly polymerizable compound.

[0075] (Solvent-drying resin) Solvent-drying resins, such as thermoplastic resins, use solvents added to adjust the solid content during coating. This is a resin that forms a film simply by drying. By using a solvent-drying resin in combination... This effectively prevents defects in the coating surface. The solvent-drying resins that can be used are not particularly limited, and generally, thermoplastic resins Resin can be used.

[0076] The thermoplastic resins mentioned above are not particularly limited, and include, for example, styrene resins and (meth)acrylic resins. Vinyl resins, vinyl acetate resins, vinyl ether resins, halogen-containing resins, alicyclic olefin resins Polyvinyl resins, polycarbonate resins, polyester resins, polyamide resins, cellulose Examples include oxy-coated derivatives, silicone resins, and rubber or elastomers.

[0077] The above thermoplastic resin is amorphous and contains organic solvents (especially multiple polymers and polymerizable compounds). It is preferable that it is soluble in a common solvent capable of dissolving it. In particular, film-forming properties, transparency and weather resistance From this perspective, styrene resins, (meth)acrylic resins, alicyclic olefin resins, polyethylene Sterl-based resins and cellulose derivatives (such as cellulose esters) are preferred.

[0078] (thermosetting compound) The thermosetting compound is not particularly limited and includes, for example, phenolic resins, urea resins, and diamine resins. Rylphthalate resin, melamine resin, guanamine resin, unsaturated polyester resin, poly Urethane resin, epoxy resin, aminoalkyd resin, melamine-urea cocondensation resin, silicon Examples include resins and polysiloxane resins.

[0079] <Light absorber> A light absorber only needs to absorb light in the wavelength range of 380 nm to 500 nm, and this It is not necessary for the light absorber to have an absorption peak within the wavelength range. Also, the light absorber has a wavelength of 380 nm or more. It is sufficient for the device to absorb some wavelengths of light within the wavelength range below 0 nm, and not all waves within this wavelength range. It is not necessary to absorb light of a certain wavelength. For light absorbers, wavelengths of 380nm to 500nm are required. The maximum absorbance within the following wavelength range is preferably 0.5 or higher.

[0080] As a light absorber, it absorbs light in the wavelength range of 380 nm to 500 nm. If available, without particular limitation, for example, sesamol-type benzotriazole compounds and ing This includes at least one of the dole compounds. Whether or not the resin layer contains a light absorber is First, a fragment of the resin layer is taken, and the fragment is measured by infrared spectroscopy (IR). The infrared absorption spectrum obtained can be investigated by comparing it with that of commercially available light absorbers. The light absorber may be included as a copolymer in the resin constituting the resin layer 49.

[0081] (Sesamol-type benzotriazole compounds) Examples of sesamol-type benzotriazole compounds include those represented by the following general formula (A): Examples of such compounds include those represented by the following general formula (A), which have a wavelength of 380 nm. It can absorb light in the wavelength range of 500 nm or less. It is represented by the following general formula (A). The compound is contained as monomer units in the resin that makes up the resin layer 49. [ka] In formula (A), R 1 R represents a hydrogen atom or a methyl group. 2 It is a linear chain with 1 to 6 carbon atoms. Alternatively, a branched alkylene group or a linear or branched oxyal group having 1 to 6 carbon atoms. It represents a chylene group.

[0082] The sesamol-type benzotriazole compound represented by the above general formula (A) is a benzotri It is a derivative of a compound in which sesamol is bonded to the nitrogen atom at the 2 position of the azole ring, and is ben It has a molecular structure in which a polymerizable double bond is introduced to the benzene moiety of the zotriazole ring. convergence wavelength λ max It is above 365 nm, and the wavelength range is between 300 nm and 400 nm. It has a broad ultraviolet absorption spectrum that encompasses a wide range, including ultraviolet light up to the long wavelength range around 400 nm. It has the ability to absorb.

[0083] The above sesamol-type benzotriazole compounds are not particularly limited, but specific The substance's name is 2-[2-(6-hydroxybenzo[1,3]dioxol-5-yl] )-2H-benzotriazol-5-yl]ethyl methacrylate, 2-[2-(6-H] Droxybenzo[1,3]dioxol-5-yl)-2H-benzotriazole-5- [Iyl]ethyl acrylate, 3-[2-(6-hydroxybenzo[1,3]dioxol -5-yl)-2H-benzotriazole-5-yl]propyl methacrylate, 3-[ 2-(6-hydroxybenzo[1,3]dioxol-5-yl)-2H-benzotria Zole-5-yl]propyl acrylate, 4-[2-(6-hydroxybenzo[1,3 ]Dioxol-5-yl)-2H-benzotriazole-5-yl]butylmethacrylate 4-[2-(6-hydroxybenzo[1,3]dioxol-5-yl)-2H- [benzotriazol-5-yl]butyl acrylate, 2-[2-(6-hydroxyben Zo[1,3]dioxol-5-yl)-2H-benzotriazole-5-yloxy] Ethyl methacrylate, 2-[2-(6-hydroxybenzo[1,3]dioxol-5 -yl)-2H-benzotriazole-5-yloxy]ethyl acrylate, 2-[3 -{2-(6-hydroxybenzo[1,3]dioxol-5-yl)-2H-benzo [Riazole-5-yl]propanoyloxy]ethyl methacrylate, 2-[3-{2-( 6-Hydroxybenzo[1,3]dioxol-5-yl)-2H-benzotriazole -5-yl}propanoyloxy]ethyl acrylate, 4-[3-{2-(6-hydroxyl Cibenzo[1,3]dioxol-5-yl)-2H-benzotriazole-5-yl} Propanoyloxy]butyl methacrylate, 4-[3-{2-(6-hydroxybenzo] [1,3] Dioxol-5-yl)-2H-benzotriazole-5-yl}propano Iloxy]butyl acrylate, 2-[3-{2-(6-hydroxybenzo[1,3] Dioxol-5-yl)-2H-benzotriazole-5-yl}propanoyl oxy ]Ethyl methacrylate, 2-[3-{2-(6-hydroxybenzo[1,3]dioxo (Il-5-yl)-2H-benzotriazol-5-yl}propanoyloxy]ethyl Acrylate, 2-(methacryloyloxy)ethyl 2-(6-hydroxybenzo[1, 3] Dioxol-5-yl)-2H-benzotriazole-5 carboxylate, 2- (Acryloyloxy)ethyl 2-(6-hydroxybenzo[1,3]dioxol-5) -yl)-2H-benzotriazole-5-carboxylate, 4-(methacryloyl) Xy)butyl 2-(6-hydroxybenzo[1,3]dioxol-5-yl)-2H- Benzotriazole-5-carboxylate, 4-(acryloyloxy)butyl 2-( 6-Hydroxybenzo[1,3]dioxol-5-yl)-2H-benzotriazole Examples include -5-carboxylates. In addition, these sesamol-type benzotriols can be cited. Azole compounds can be used individually or in combination of two or more types.

[0084] (Indole compounds) Examples of indole compounds include those represented by the following general formula (B). If the compound is represented by the following general formula (B), then the wavelength is between 380 nm and 500 nm. It can absorb light in a specific wavelength range. [ka] In formula (B), R 3 This represents a linear or branched alkyl or aralkyl group. R 4 -CN or -COOR 5 This represents, and here, R 5It may have substituents. Alkyl or aralkyl group (however, R 3 If it is a methyl group, remove the ethyl group. ) represents.

[0085] R 3 The number of carbon atoms can be between 1 and 12. 3 A concrete example of this is, Iol group, ethyl group, (iso)butyl group, t-butyl group, hexyl group, octyl group, 2-ethyl group Examples include tylhexyl group, dodecyl group, benzyl group, etc. 5 For example, If the above R 3 The groups exemplified above, as well as β-cyanoethyl group, β-chloroethyl group, and ethoxypropyl Examples include pyr groups, hydroxyalkyl groups, and alkoxyalkoxyalkyl groups. However, , R 3 If R is a methyl group, 5 It is not an ethyl group.

[0086] As an example of an indole compound, BONASORB U, manufactured by Orient Chemical Industries, Ltd. Examples include the A-3911.

[0087] The above light absorber is, for example, contained in the resin layer 49 in an amount of 0.05% by mass or more and 50% by mass or less. It may be included in this range. The inclusion of a light absorber within this range results in the spectral transmission described above. The ratio can be met. Note that the above light absorber is a sesamol-type benzotriazole compound Even if it is a substance, even if it is contained in the resin layer 49 in an amount of 0.1% by mass or more and 50% by mass or less good.

[0088] The resin layer 49 is, for example, for the first resin layer, which contains an ionizing radiation polymerizable compound and a light absorber. The composition is applied to one side of a light-transmitting substrate 48, dried, and cured by irradiation with ionizing radiation. It can be formed by causing it to happen.

[0089] <Composition for resin layer> The resin layer composition includes ionizing radiation polymerizable compounds and light absorbers, as well as solvent-drying resins and heat-absorbing agents. It may contain curable compounds, polymerization initiators, solvents, etc.

[0090] (Polymerization initiator) The polymerization initiator is not particularly limited and any known one can be used, for example, polymerization initiator Examples of starting agents include acetophenones, benzophenones, and mihler-benzoyl Benzoates, α-amyloxime esters, thioxanthones, propiophenones, Examples include diluents, benzoins, and acylphosphine oxides. In addition, photosensitizers are also used. It is preferable to use them in a mixture, and specific examples include, for example, n-butylamine and tri Examples include ethylamine and poly-n-butylphosphine.

[0091] As a polymerization initiator, the above ionizing radiation polymerizable compound has a radical polymerizable functional group. The combination includes acetophenones, benzophenones, thioxanthones, benzoin, and benzoin. It is preferable to use methyl ether, etc., alone or in combination. Also, the above ionizing radiation weight If the composite compound has a cationic polymerizable functional group, the polymerization initiator is an aromatic diazo. Nium salts, aromatic sulfonium salts, aromatic iodonium salts, metallocene compounds, benzoyl It is preferable to use sulfonic acid esters, etc., alone or in mixtures.

[0092] The content of the polymerization initiator in the resin layer composition is as follows: It is preferable that the amount is 1 part by mass or more and 10 parts by mass or less. If it is, there is no risk that the hardness of the resin layer 49 will be insufficient, and if it is 10 parts by mass or less, the coating Since the ionizing radiation reaches the deep part of the applied film, curing is promoted even inside, and the surface hardness of the target resin layer (for example, pencil hardness of B or more) can be obtained.

[0093] The lower limit of the content of the above polymerization initiator is more preferably 2 parts by mass or more, and the upper limit is more preferably 8 parts by mass or less. When the content of the above polymerization initiator is within this range, no hardness distribution occurs in the film thickness direction, and it is likely to have a uniform hardness.

[0094] (Solvent) As the solvent, it can be selected according to the type and solubility of the ionizing radiation-polymerizable compound to be used and used. For example, ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diacetone alcohol, etc.), ethers (dioxane, tetrahydrofuran, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, etc.), aliphatic hydrocarbons (hexane, etc.), alicyclic hydrocarbons (cyclohexane, etc.), aromatic hydrocarbons (toluene, xylene, etc.), halogenated carbons (dichloromethane, dichloroethane, etc.), esters (methyl acetate, ethyl acetate, acetic butyl, etc.), water, alcohols (ethanol, isopropanol, butanol, cyclohe xanol, etc.), cellosolves (methyl cellosolve, ethyl cellosolve, etc.), cellosolve acetates, sulfoxides (dimethyl sulfoxide, etc.), amides (dimethylform amide, dimethylacetamide, etc.) can be exemplified, and a mixed solvent thereof may also be used.

[0095] The proportion of raw materials (solid content) in the resin layer composition is not particularly limited, but there are five types. A concentration of % by mass or more and 70% by mass or less is preferred, and 25% by mass or more and 60% by mass or less is more preferred.

[0096] The resin layer composition has properties that increase hardness, suppress curing shrinkage, control refractive index, and / or, depending on the purpose such as providing anti-glare properties, conventionally known dispersants, surfactants, antistatic agents Agents, silane coupling agents, thickeners, color inhibitors, colorants (pigments, dyes), defoamers, leveling agents. Ringing agents, flame retardants, UV absorbers, adhesion promoters, polymerization inhibitors, antioxidants, surface modifiers, It may also contain lubricants or other additives.

[0097] The resin layer composition may also be used in combination with a photosensitizer, and a specific example of this is, for example, Examples include n-butylamine, triethylamine, and poly-n-butylphosphone.

[0098] The method for preparing the resin layer composition is not particularly limited as long as each component can be mixed uniformly, for example If so, use known equipment such as a paint shaker, bead mill, kneader, or mixer. It is possible.

[0099] The method for applying the resin layer composition onto a light-transmitting substrate is not particularly limited, for example, Pin coating method, dip method, spray method, die coating method, bar coating method, roll coater Methods such as meniscus coating, flexographic printing, screen printing, and speed coating. Publicly known methods can be cited.

[0100] When ultraviolet light is used as ionizing radiation for curing resin layer compositions, the ultraviolet light source Examples include ultra-high pressure mercury lamps, high pressure mercury lamps, low pressure mercury lamps, carbon arc lamps, and black Light sources include fluorescent lamps and metal halide lamps. Furthermore, the wavelength of ultraviolet light and Therefore, a wavelength range of 190-380 nm can be used. As a specific example of an electron source... These include Cockcroftwald type, Van de Graft type, resonant transformer type, insulated core transformer type, and Examples include various types of electron beam accelerators, such as linear, dynamitron, and high-frequency types.

[0101] <<Second resin layer>> The resin layer 50 is a layer that functions as an overcoat layer. The light absorber bleeds out. Because it is easy to do so, by forming a resin layer 50 on the resin layer 49, the light absorber is absorbed by the resin layer 49 This can suppress bleed-out and affect the adhesive layer 72. The resin layer 49 contains a light absorber, so it has poor scratch resistance, and scratches can occur during the manufacturing of the polarizing plate. There is a risk of it getting stuck. By forming a resin layer 50, scratch resistance is improved. This allows for the prevention of scratches occurring during the manufacturing of the circular polarizing plate 40.

[0102] The indentation hardness of resin layer 50 is between 100 MPa and 600 MPa. It is preferable that the indentation hardness of the resin layer 50 is 100 MPa or higher. If the desired hardness can be obtained, and if the pressure is 600 MPa or less, it is a resin with excellent flexibility. Layer 50 can be obtained. The lower limit of the indentation hardness of the resin layer is 150 MPa or higher. It is preferable that the pressure be 500 MPa or less, with a lower limit of 500 MPa.

[0103] The thickness of the resin layer 50 is preferably 0.5 μm or more and 15 μm or less. If the film thickness is 0.5 μm or more, a hardness sufficient to prevent scratching during the production process can be obtained. It can be cut. Also, if the film thickness of the resin layer 50 is 15 μm or less, the generation of cracks during bending or curving can be suppressed. The film thickness of the resin layer 50 can be determined in the same manner as the film thicknesses of the adhesive layers 71 and 72. The lower limit of the film thickness of the resin layer 50 is preferably 1 μm or more, and the upper limit is more preferably 10 μm or less. The resin layer 50 is mainly composed of resin. The resin layer 50 may contain an anti-blocking agent in addition to the resin in order to prevent the sticking of the protective films 47 when the protective film 47 is wound in a roll shape. The resin contained in the resin layer 50 includes a polymer of an ionizing radiation-polymerizable compound. The resin may contain a solvent-drying type resin or a thermosetting compound in addition to the polymer of the ionizing radiation-polymerizable compound. Examples of the ionizing radiation-polymerizable compound constituting the resin layer 50 include an ionizing radiation-polymerizable monomer, an ionizing radiation-polymerizable oligomer, or an ionizing radiation-polymerizable prepolymer, and these can be appropriately adjusted and used. As the ionizing radiation-polymerizable compound, a combination of an ionizing radiation-polymerizable monomer and an ionizing radiation-polymerizable oligomer or an ionizing radiation-polymerizable prepolymer is preferable.

[0104] Examples of the ionizing radiation-polymerizable monomer include monomers containing a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and ethylene glycol di (meth) acrylate, di When the resin layer 50 is cut, if the film thickness of the resin layer 50 is 15 μm or less, the generation of cracks during bending or curving can be suppressed. The film thickness of the resin layer 50 can be determined in the same manner as the film thicknesses of the adhesive layers 71 and 72. The lower limit of the film thickness of the resin layer 50 is preferably 1 μm or more, and the upper limit is more preferably 10 μm or less. The resin layer 50 is mainly composed of resin. The resin layer 50 may contain an anti-blocking agent in addition to the resin in order to prevent the sticking of the protective films 47 when the protective film 47 is wound in a roll shape.

[0105] <Resin> The resin contained in the resin layer 50 includes a polymer of an ionizing radiation-polymerizable compound. The resin may contain a solvent-drying type resin or a thermosetting compound in addition to the polymer of the ionizing radiation-polymerizable compound. Examples of the ionizing radiation-polymerizable compound constituting the resin layer 50 include an ionizing radiation-polymerizable monomer, an ionizing radiation-polymerizable oligomer, or an ionizing radiation-polymerizable prepolymer, and these can be appropriately adjusted and used. As the ionizing radiation-polymerizable compound, a combination of an ionizing radiation-polymerizable monomer and an ionizing radiation-polymerizable oligomer or an ionizing radiation-polymerizable prepolymer is preferable. Examples of the ionizing radiation-polymerizable monomer include monomers containing a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and ethylene glycol di (meth) acrylate, di

[0106] The resin layer 50 is mainly composed of resin. The resin layer 50 may contain an anti-blocking agent in addition to the resin in order to prevent the sticking of the protective films 47 when the protective film 47 is wound in a roll shape. Examples of the ionizing radiation-polymerizable compound constituting the resin layer 50 include an ionizing radiation-polymerizable monomer, an ionizing radiation-polymerizable oligomer, or an ionizing radiation-polymerizable prepolymer, and these can be appropriately adjusted and used. As the ionizing radiation-polymerizable compound, a combination of an ionizing radiation-polymerizable monomer and an ionizing radiation-polymerizable oligomer or an ionizing radiation-polymerizable prepolymer is preferable. Examples of the ionizing radiation-polymerizable monomer include monomers containing a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and ethylene glycol di (meth) acrylate, di When the resin layer 50 is cut, if the film thickness of the resin layer 50 is 15 μm or less, the generation of cracks during bending or curving can be suppressed. The film thickness of the resin layer 50 can be determined in the same manner as the film thicknesses of the adhesive layers 71 and 72. The lower limit of the film thickness of the resin layer 50 is preferably 1 μm or more, and the upper limit is more preferably 10 μm or less. The resin layer 50 is mainly composed of resin. The resin layer 50 may contain an anti-blocking agent in addition to the resin in order to prevent the sticking of the protective films 47 when the protective film 47 is wound in a roll shape.

[0107] Examples of the ionizing radiation-polymerizable monomer include monomers containing a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and ethylene glycol di (meth) acrylate, di Examples of the ionizing radiation-polymerizable monomer include monomers containing a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and ethylene glycol di (meth) acrylate, di Examples of the ionizing radiation-polymerizable monomer include monomers containing a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and ethylene glycol di (meth) acrylate, di Ethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate Tetraethylene glycol di(meth)acrylate, tetramethylene glycol Di(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimeth Roll ethane tri(meth)acrylate, pentaerythritol di(meth)acrylate Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate )Acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol Litol hexa(meth)acrylate, glycerol(meth)acrylate, etc. Examples include acrylic acid esters.

[0108] As ionizing radiation polymerizable oligomers, bifunctional or polyfunctional oligomers are preferred. A polyfunctional oligomer having three or more radiation-free polymerizable functional groups (trifunctional) is preferred. Examples of oligomers include polyester (meth)acrylate and urethane (meth)acrylate. acrylate, polyester-urethane (meth)acrylate, polyether (meth)acrylate Relate, polyol (meth)acrylate, melamine (meth)acrylate, isothea Examples include nurate (meth)acrylate and epoxy (meth)acrylate.

[0109] Ionizing radiation polymerizable prepolymers have a weight-average molecular weight of over 10,000. The average molecular weight is preferably between 10,000 and 80,000, and more preferably between 10,000 and 40,000. If the average molecular weight exceeds 80,000, the viscosity is high, which reduces the coating suitability. The appearance of the light-transmitting resin may deteriorate. As a polyfunctional prepolymer, urethane ( Meth)acrylate, isocyanurate (meth)acrylate, polyester-urethane Examples include (meth)acrylate and epoxy (meth)acrylate.

[0110] <Blocking prevention agent> Examples of anti-blocking agents include aluminum oxide, magnesium oxide, and silica. , oxides such as calcium oxide, titanium oxide, zinc oxide, aluminum hydroxide, magnesium hydroxide Nesium, hydroxides such as calcium hydroxide, magnesium carbonate, calcium carbonate and other carbonates Salts, calcium sulfate, barium sulfate and other sulfates, magnesium silicate, aluminum silicate Silicates such as calcium silicate, aluminosilicate, and others, kaolin, talc, crystalline silica Examples include one or more inorganic compounds such as soil.

[0111] The average particle size of inorganic compound-based blocking inhibitors is between 50 nm and 3 μm. This is preferable. If the average particle size of the blocking inhibitor is 50 nm or more, the surface of the resin layer Because the uneven surface is not too small, an antiblocking effect is obtained, and the average particle size is If the thickness is 3 μm or less, the surface irregularities of the resin layer will not become too large, thus suppressing a decrease in transparency. It can be controlled.

[0112] Examples of anti-blocking agents include high-density polyethylene with a molecular weight of 300,000 or more. Ultra-high molecular weight polyethylene, polypropylene, polycarbonate, polyamide, polyester From fine powders such as melamine resin, diallyl phthalate resin, acrylic resin, and others. The system may also consist of one or more organic compounds as raw materials.

[0113] The amount of the anti-blocking agent is 0.0 per 100 parts by mass of the resin constituting the resin layer. Preferably, the amount is 1 part by mass or more and 6 parts by mass or less, and 2 parts by mass or more and 5 parts by mass or less. This is more preferable. If the content of the blocking inhibitor is less than 0.01 parts by mass, light transmittance The formation of uneven surfaces on the functional layer becomes insufficient, resulting in insufficient blocking resistance. In addition, if the amount exceeds 6 parts by mass, the transparency of the resin layer may decrease.

[0114] The resin layer 50 comprises, for example, a second ionizing radiation polymerizable compound and an anti-blocking agent. The resin layer composition is applied to the surface of the resin layer 49, dried, and cured by irradiation with ionizing radiation. It can be formed by doing so.

[0115] <<<<Other image display devices>>>> The image display device 10 shown in Figure 1 has a second protective layer comprising a resin layer 50 on a resin layer 49. Although it is equipped with a film 47, as an image display device, as shown in Figure 2, it has a resin layer 49 Even if the image display device 80 has a second protective film 91 that does not have a resin layer 50 on top, good.

[0116] The image display device 80, the circular polarizing plate 90, and the protective film 91 are equipped with a resin layer 50. Except for the absence of the following, it is the same as the image display device 10, the circular polarizing plate 40, and the protective film 47. Therefore, the explanation will be omitted here. Furthermore, since it does not have a resin layer 50, The surface of the grease layer 49 is the surface of the protective film 91.

[0117] According to this embodiment, the wavelength is 380 nm to 500 nm on the observer side of the OLED element 20. The resin layer 49 contains a light-absorbing agent that absorbs light in the wavelength range of m or less, so the resin layer 49 This allows it to absorb light in the wavelength range of 380nm to 500nm from the ambient light. This suppresses the degradation of the OLED element 20 due to ambient light. It can absorb light emitted from 20 in the wavelength range of 380 nm to 500 nm. Therefore, it can block blue light.

[0118] According to this embodiment, the sesamol-type benzotriazole is located closer to the observer than the OLED element 20. The resin layer 49 comprises at least one of an indole compound and an indole compound. Therefore, the resin layer 49 filters out light in the wavelength range of 380 nm to 500 nm from the ambient light. It can absorb light. This suppresses degradation of the OLED element 20 due to ambient light. In addition, it can block the blue light emitted from the OLED element 20.

[0119] According to this embodiment, the wavelength on the observer side of the polarizer 46 is between 380 nm and 500 nm. Since the OLED element 20 is equipped with a resin layer 49 containing a light-absorbing agent that absorbs light in the wavelength range, Furthermore, it can suppress the degradation of the polarizer 46 due to ambient light.

[0120] Even when the adhesive layer contains the above-mentioned light-absorbing agent, as in the second embodiment, the OLED element 2 It can suppress degradation caused by ambient light and block blue light, but the adhesive layer absorbs light. Adding astringents tends to reduce adhesive strength. Therefore, it is difficult to thin the adhesive layer. Furthermore, the type of adhesive layer may be changed depending on the configuration of the circular polarizer, etc. Each layer type needs to contain a light absorber. In contrast, according to this embodiment, A light-absorbing agent is included in the resin layer 49, which has a hardness of 100 MPa or more and 600 MPa or less. Therefore, the resin layer 49 can be made thinner. In addition, the resin layer 49 contains a light absorber. Since it is mixed, even if the type of adhesive layer changes depending on the composition of the circular polarizing plate 40, the resin This can be handled at layer 49.

[0121] [Second Embodiment] Hereinafter, an image display device according to a second embodiment of the present invention will be described with reference to the drawings. Figure 3 is a schematic diagram of the image display device according to this embodiment.

[0122] <<<<<Image display device>>>>>> The image display device 100 shown in Figure 3 has an organic light-emitting diode element 2 facing the observer. 0, touch sensor 30, circular polarizing plate 110 including resin layer 111, and cover layer 60, They are arranged in this order. Between the touch sensor 30 and the circular polarizing plate 110 and the circular polarizing plate 110 and The cover layer 60 is bonded to the other layer via adhesive layers 71 and 72. The light absorber is not included in the resin layer 113, but in the resin layer 111 which functions as an adhesive layer. It is included in [figure 2]. Note that in Figure 2, the components that are given the same reference numerals as in Figure 1 are shown in Figure 1. Since it is the same component as described above, the explanation will be omitted.

[0123] <<<<Circular polarizer>>>> The circular polarizer 110, for example, faces the observer, and has a first phase difference film 41 and an adhesive layer 42, the second phase difference film 43, and the third resin layer 111 (hereinafter simply referred to as "resin layer 111") It is sometimes referred to as " ), and the first protective film 45, polarizer 46, and second protective film The protective film 112 is provided in this order. The protective film 112 is a light-transmitting substrate 48, The first resin layer 113 (hereinafter sometimes simply referred to as "resin layer 113") and the second tree The lipid layer 50 is a laminated structure in which layers are stacked in this order.

[0124] <<<Resin layer>>> The resin layer 111 is used to bond the second phase difference film 43 and the first protective film 45. It functions as an adhesive layer. The resin layer 111 is mainly composed of resin, but also contains other materials. Alternatively, as part of the resin, it absorbs light in the wavelength range of 380 nm to 500 nm. It contains an astringent. The indentation hardness of the resin layer 111 is 100 MPa or higher. It does not need to be in the range of 600 MPa or less.

[0125] <<Light absorber>> A light absorber only needs to absorb light in the wavelength range of 380 nm to 500 nm, and this It is not necessary for the light absorber to have an absorption peak within the wavelength range. Also, the light absorber has a wavelength of 380 nm or more. It is sufficient for the device to absorb some wavelengths of light within the wavelength range below 0 nm, and not all waves within this wavelength range. It is not necessary to absorb light of a certain wavelength. For light absorbers, wavelengths of 380nm to 500nm are required. The maximum absorbance within the following wavelength range is preferably 0.5 or higher.

[0126] The light absorber is not particularly limited, but for example, sesamol-type benzotriazole Examples include at least one of a compound and an indole-based compound. Sesamol-type ben Zotriazole compounds and indole compounds are sesamo compounds as described in the first embodiment. Since it is similar to benzotriazole compounds and indole compounds, please explain. It shall be omitted.

[0127] In this embodiment, the second phase difference film 43 and the first protective film 45 The resin layer 111, which is placed between the layers and functions as an adhesive layer, contains a light absorber, but the Instead of the lipid layer 111, the adhesive layers 42, 71, and 72 may contain a light absorber.

[0128] <<<Resin layer>>> Since the resin layer 113 is the same as the resin layer 49 except that it does not contain a light absorber, here Therefore, I will omit the explanation.

[0129] According to this embodiment, it functions as an adhesive layer and is sesamol-type benzotriazole-based The resin layer 111 comprises at least one of the compound and an indole-based compound. Therefore, it can absorb light in the wavelength range of 380 nm to 500 nm. The resin layer 111 absorbs light in the wavelength range of 380 nm to 500 nm from the ambient light. Since it can be contained, degradation of the OLED element 20 due to ambient light can be suppressed, and O It can block the blue light emitted from the LED element 20.

[0130] The resin layer 111 containing the light absorber is more OLE than the polarizer 46 and protective films 45 and 112. Since it is located on the D element 20 side, the polarizer 46 and protective films 45 and 112 absorb ambient light. This allows for the absorbing of light. Therefore, the amount of light absorber to be included in the resin layer 111 can be reduced. Cut.

[0131] The applications of the image display devices 10, 80, and 100 are not particularly limited. For example, 10, 80, and 100 refer to smartphones, tablet devices, personal computers, and Revision (including rollable television), digital signage, public information It may be used in information displays (PID), automotive displays, and electrical appliances. Furthermore, the image display devices 10, 80, and 100 are for applications where aesthetic design and aesthetics are required, such as curved surfaces. It can also be suitably used in other applications. [Examples]

[0132] To explain the present invention in detail, examples will be given below, but the present invention is these This is not limited to what is written. Furthermore, unless otherwise specified, "part" or "%" in the text refers to quality. Use quantity as the basis.

[0133] <Example A1> (Preparation of resin layer composition 1) A 200 mL four-necked flask is fitted with a ball-type condenser, a mercury thermometer, and a stirring device. , 6-[5-(2-hydroxyethyl)-2H-benzotriazol-2-yl]benzo [1,3] Dioxol-5-ol 4.0g (0.013 mol), Toluene 40mL, 1.8g (0.021 mol) of methacrylic acid, 0.4g (0.004 mol) of methanesulfonic acid Add ) and reflux dehydration at 110-115°C for 4 hours. Then add 30 mL of water and sodium carbonate. Add 0.6g (0.006 mol) of um, let it stand, separate and remove the aqueous layer at the bottom, and activate 0.2g of charcoal was added and the mixture was stirred under reflux to decolorize it. After filtration, toluene was extracted from the filtrate. 40 mL was recovered under reduced pressure, 100 mL of isopropyl alcohol was added, and the precipitated crystals were filtered. After passing through the process, wash with 40 mL of isopropyl alcohol, then dry under reduced pressure at 40°C to obtain yellow crystals. 4.2 g was obtained. These 4.2 g of yellow crystals were repulped and washed with isopropyl alcohol. Dry under reduced pressure at 40°C, and 3.4 g of sesamol-type benzotriazole compound is obtained. -[2-(6-hydroxybenzo[1,3]dioxol-5-yl)-2H-benzo [Riazole-5-yl]ethyl methacrylate was obtained.

[0134] Next, a four-necked flask is fitted with a Liebig condenser, a mercury thermometer, a nitrogen gas inlet tube, and a stirring device. The apparatus was attached and the synthesized 2-[2-(6-hydroxybenzo[1,3]dioxole- 8 parts by mass of 5-yl)-2H-benzotriazole-5-yl]ethyl methacrylate, 32 parts by mass of methyl methacrylate (MMA) as another monomer, and toluene as a solvent. 20 parts by mass of methyl ethyl ketone, and 1,1'- as a polymerization initiator. Add 0.6 parts by mass of azobis(cyclohexane-1-carbonitride) and stir while After purging the flask with nitrogen gas at a flow rate of 10 mL / min for 1 hour, the reaction mixture temperature was 90-90°C. The polymerization reaction was carried out under reflux at 6°C for 10 hours.

[0135] After the polymerization reaction is complete, add 10 parts by mass of toluene and 10 parts by mass of methyl ethyl ketone (MEK). In addition, acrylic polymers in which sesamol-type benzotriazole compounds react and bond to MMA 100.6 parts by mass of a solution containing M1 (light absorber 1) was obtained.

[0136] Polyfunctional monomer (product name "KAYARAD PET-30", manufactured by Nippon Kayaku Co., Ltd.) Mix the above acrylic polymer 1 in a solids mass ratio of 20:80 until the solids content reaches 25%. Diluted with a solvent (methyl ethyl ketone and toluene in a mass ratio of 80:20) to form a resin composition. We prepared it.

[0137] Next, to 160 parts by mass of the obtained resin composition, a polymerization initiator (IGM Resins) is added. (The mass ratio of BV's Omnirad184 and Omnirad819 is 50:50) 4 parts by mass and 0.2 parts by mass of leveling agent (product name "F568", manufactured by DIC Corporation) Composition 1 for the resin layer was prepared by mixing and thoroughly stirring the ingredients.

[0138] (Preparation of resin layer composition 2) A polyfunctional monomer (product name "KAYARAD PET-30", manufactured by Nippon Kayaku Co., Ltd.) up to 50% solids content, solvent (methyl ethyl ketone and methyl isobutyl ketone, mass ratio 5 The resin composition was prepared by diluting at 0:50.

[0139] Next, to 200 parts by mass of the obtained resin composition, a polymerization initiator (IGM Resins) is added. 4 parts by mass of Omnirad184 manufactured by BV Corporation, and a leveling agent (product name "F568") Mix 0.2 parts by mass of (manufactured by DIC Corporation) and stir well to create a resin layer composition. Item 2 was prepared.

[0140] (Fabrication of circular polarizing plates and image display devices) The obtained resin layer composition 1 is prepared using Miyaba to form a triacetylcellulose layer with a thickness of 25 μm. The coating is applied to the surface of the substrate (product name "TJ25UL", manufactured by Fujifilm Corporation) to form a coating film. It was done. Next, dry air at 70°C was applied to the formed coating film at a flow rate of 0.5 m / s for 30 minutes. By allowing it to flow for a few seconds, the solvent in the coating film evaporates, and the accumulated ultraviolet light intensity reaches 200 mJ / c m 2 By irradiating the coating to cure it, a first resin layer with a thickness of 5 μm is formed. It was formed.

[0141] After forming the first resin layer, the resin layer composition 2 is applied to the surface of the first resin layer using a Miyaba. The coating was spread and a film was formed. Then, the formed film was treated with a flow rate of 0.5 m / s at 70°C. By circulating dry air for 30 seconds, the solvent in the coating film is evaporated, and the ultraviolet light is used to accumulate light. 200 mJ / cm 2By irradiating the coating to cure it, the film thickness becomes 4 μm. A second resin layer was formed on the triacetylcellulose substrate. A second protective film was obtained, comprising a first resin layer and a second resin layer with a thickness of 4 μm.

[0142] The thickness of the first resin layer was determined by measuring the cross-section of the first resin layer using a scanning electron microscope (SEM). The image was taken, and the thickness of the first resin layer was measured at 20 locations in the cross-sectional image. The arithmetic mean of the film thickness was used. The specific method for taking cross-sectional photographs was as follows: First, 1m A block is created by embedding a second protective film, cut to m x 10 mm, in embedding resin. From this block, uniform sections free of holes, etc., with a thickness of 70 nm are prepared using a general sectioning method. Sections of approximately 300 nm were prepared. An ultramicrotome (EM) was used to prepare the sections. We used the UC7 (Leica Microsystems Co., Ltd.), etc. And, there are no holes, etc. The remaining block from which uniform sections were cut was used as the measurement sample. Subsequently, scanning electron microscopy was performed. Using a microscope (SEM) (product name "S-4800", manufactured by Hitachi High-Technologies Corporation) Then, a cross-sectional photograph of the measurement sample was taken. The cross-sectional photograph was taken using the S-4800 mentioned above. In this case, set the detector to "SE", the acceleration voltage to "5kV", and the emission current to "10μA". Cross-sectional observation was then performed. Regarding magnification, the focus was adjusted to control contrast and brightness. While observing whether each layer can be distinguished, the thickness of the first resin layer is multiplied by 1,000 to 10,000 depending on the thickness of the first resin layer. It was adjusted as appropriate within the range. Specifically, to reduce measurement errors in film thickness, it was set from 2000 to 500. I adjusted it to 0x magnification. Furthermore, I set the aperture to "Beam Monitor Aperture 1" and the objective lens aperture. I set the value to "2" and the WD to "8mm". Also, the film thickness of the second resin layer was changed to the first The thickness of the resin layer was measured using the same method as in Examples 2-5 and Comparative Examples 1-4. In this case as well, the film thickness of the first resin layer and the second resin layer was measured using the same method as in Example A1. Ta.

[0143] After obtaining the second protective film, the second protective film is then subjected to 2 N, at a temperature of 55°C. The second protective film is saponified by immersion in a sodium hydroxide solution for 3 minutes. On the other hand, iodine was adsorbed onto a polyvinyl alcohol-based film, and then uniaxially stretched. A polarizer is fabricated by stretching and oriented the material, and polyvinyl alcohol is applied to both sides of the polarizer. Polyvinyl alcohol resin adhesive (product name "PVA-117", Kuraray Co., Ltd.) A polyvinyl alcohol aqueous solution (made by diluting the product with pure water to a solid content of 5%) was applied.

[0144] The triacetylcellulose substrate of the second protective film is in contact with one side of the polarizer, and the polarizer is polarized. The other side of the photon is a saponified 25 μm thick triacetylcellulose substrate (product name " The first protective film, "TJ25UL" (manufactured by Fujifilm Corporation), is in contact with the other part. The second protective film, polarizer, and first protective film were placed in this position. After drying for 10 minutes, the first protective film and polarizer and the second protective film and polarizer are ready. Polarizing plates were obtained by bonding them together with a vinyl alcohol-based adhesive.

[0145] After obtaining the polarizing plate, on the side of the first protective film of the polarizing plate opposite to the polarizer side, , via an adhesive layer (product name "PD-S1", manufactured by Panac Co., Ltd.), λ / 2 phase difference filter The film was laminated with a 100 μm thick cycloolefin resin film. Film (product name "Zeonor ZF-14", manufactured by Zeon Corporation) at a wavelength of 550nm By stretching at 150°C so that the in-plane retardation is 270 nm Obtained. Furthermore, an adhesive layer was applied to the surface of the λ / 2 phase difference film opposite to the polarizing plate side. The λ / 4 phase difference film is bonded via the product name "PD-S1" (manufactured by Panac Corporation). This resulted in obtaining a circular polarizer. The λ / 4 phase difference film was made of cyclo, with a thickness of 100 μm. Olefin resin film (product name "Zeonor ZF-14", manufactured by Nippon Zeon Co., Ltd.) The material was stretched at 150°C so that the in-plane retardation at a wavelength of 550nm was 140nm. It was obtained through stretching.

[0146] After obtaining the circular polarizer, the λ / 2 phase difference film side of the λ / 4 phase difference film of the circular polarizer. On the opposite side of this surface, an adhesive layer (product name "PD-S1", manufactured by Panac Co., Ltd.) is applied via From an OLED display (product name "Galaxy SII", manufactured by Samsung) Organic light-emitting diode panel (OLED panel) containing extracted organic light-emitting diode elements. They were bonded together. Furthermore, the opposite side of the polarizer side of the second protective film of the circular polarizer plate. On this surface, via an adhesive layer (product name "PD-S1", manufactured by Panac Co., Ltd.), Galaxy The cover glass of the SII was bonded to it. This allows the OLED panel to face the observer. An image display device is obtained by stacking an adhesive layer, a circular polarizing plate, another adhesive layer, and a cover glass in this order. Ta.

[0147] <Example A2> In Example 2, the process was the same as in Example A1, except that a second resin layer was not formed. Thus, a second protective film, a circular polarizing plate, and an image display device were obtained.

[0148] <Example A3> In Example 3, resin layer composition 3 was used instead of resin layer composition 1. Externally, a second protective film, a circular polarizing plate, and an image display device were obtained in the same manner as in Example A1. The resin layer composition 3 was prepared as follows.

[0149] (Composition 3 for resin layer) Polyester resin (product name "Byron 24SS", manufactured by Toyobo Co., Ltd.) with a solid content of 25% The resin composition was prepared by diluting with methyl ethyl ketone. Then, the obtained resin composition For 120 parts by mass of the substance, add a polymerization initiator (Omnira manufactured by IGM Resins BV). 4 parts by mass of d184 and Omnirad819 (mass ratio 50:50), indole-based compound Product (Product name "BONASORB UA-3912", manufactured by Orient Chemical Industry Co., Ltd.) Light absorber 2) 3 parts by mass, and benzotriazole compound (product name "JF-79", Johoku (Manufactured by Chemical Co., Ltd.) 5 parts by mass, Leveling agent (product name "F568", manufactured by DIC Corporation) 0 Composition 3 for the resin layer was prepared by mixing 0.2 parts by mass and stirring well.

[0150] <Example A4> In Example 4, resin layer composition 4 was used instead of resin layer composition 1. Externally, a second protective film, a circular polarizing plate, and an image display device were obtained in the same manner as in Example A1. The resin layer composition 4 was prepared as follows.

[0151] (Composition 4 for resin layer) Urethane acrylate (product name "RUA-051", manufactured by Asia Industries Co., Ltd.) 90g Part and phenoxyethyl acrylate (product name "Viscoat #192", Osaka Organic Chemical Co., Ltd.) Dilute 10 parts by mass (manufactured by Kogyo Co., Ltd.) with methyl ethyl ketone to a solid content of 25% and mix with resin. The product was prepared. Then, the obtained resin composition and the above acrylic polymer 1 were mixed in a solid content mass ratio. The mixture was then mixed in a 20:80 ratio to obtain a mixed resin composition. Subsequently, polymerization was carried out on the mixed resin composition. Initiators (Omnirad184 and Omnirad manufactured by IGM Resins BV) d819 (mass ratio 50:50) 4 parts by mass, leveling agent (product name "F568", DIC strain Mix 0.2 parts by mass (manufactured by Co., Ltd.) and further add methyl ethyl ketone until the solid content reaches 25%. Composition 4 for the resin layer was prepared by diluting and thoroughly stirring the mixture.

[0152] <Example A5> In Example A5, resin layer composition 5 was used instead of resin layer composition 1. Except as otherwise provided, a second protective film, a circular polarizing plate, and an image display device can be obtained in the same manner as in Example A1. The resin layer composition 5 was prepared as follows.

[0153] (Composition for resin layer 5) Dipentaerythritol polyacrylate (product name "A-9550", Shin Nakamura Chemical Co., Ltd.) 70 parts by mass of silica particles (product name "PGM-AC-2140Y", manufactured by Nissan Chemical Corporation), manufactured by Nissan Chemical Corporation. 30 parts by mass of (manufactured by Kogyo Co., Ltd.), and a fluorine-based leveling agent (product name "Megafac F- 444 (manufactured by DIC Corporation) 0.1 parts by mass are mixed with methyl ethyl ketone until the solid content reaches 25%. The resin composition was prepared by dilution. Then, the obtained resin composition and the above acrylic polymer 1 The solids were mixed in a solids mass ratio of 20:80 to obtain a mixed resin composition. Subsequently, the mixed resin composition For a substance, a polymerization initiator (Omnirad 184 manufactured by IGM Resins BV) Mix 4 parts by mass of Omnirad819 (50:50 mass ratio) and further methyl ester. Diluting with tylketone to a solid content of 25% and stirring well prepares resin layer composition 5. did.

[0154] <Example B1> In Example B1, resin layer composition 6 was used instead of resin layer composition 1, and Instead of the adhesive layer located between the first protective film and the λ / 2 phase difference film, a resin layer is used. Except for using a third resin layer consisting of composition 7, a circular polarizing plate was prepared in the same manner as in Example A1. And an image display device was obtained. Compositions 6 and 7 for the resin layer were prepared as follows.

[0155] (Composition 6 for resin layer) First, a four-necked flask is fitted with a Liebig condenser, a mercury thermometer, a nitrogen gas inlet tube, and a stirring device. Attach the device, add 32 parts by mass of methyl methacrylate (MMA) and toluene as a solvent. 0 parts by mass, 20 parts by mass of methyl ethyl ketone, and 1,1'-azo as a polymerization initiator. Add 0.6 parts by mass of bis(cyclohexane-1-carbonitride) and stir while absorbing nitrogen. After purging the flask with nitrogen at a gas flow rate of 10 mL / min for 1 hour, the reaction mixture temperature should be 90-96°C. The polymerization reaction was carried out under reflux for 10 hours.

[0156] After the polymerization reaction is complete, add 10 parts by mass of toluene and 10 parts by mass of methyl ethyl ketone (MEK). In addition, a solution containing acrylic polymer 2 that does not contain sesamol-type benzotriazole compounds. 100.6 parts by mass of the liquid were obtained.

[0157] Polyfunctional monomer (product name "KAYARAD PET-30", manufactured by Nippon Kayaku Co., Ltd.) Mix the above acrylic polymer 2 in a solids mass ratio of 80:20 until the solids content reaches 25%. Diluted with solvents (methyl ethyl ketone and toluene, mass ratio 80:20) to form a resin composition We prepared it.

[0158] Next, to 160 parts by mass of the obtained resin composition, a polymerization initiator (IGM Resins) is added. (The mass ratio of BV's Omnirad184 and Omnirad819 is 50:50) 4 parts by mass and 0.2 parts by mass of leveling agent (product name "F568", manufactured by DIC Corporation) Composition 6 for the resin layer was prepared by mixing and thoroughly stirring the ingredients.

[0159] (Composition 7 for resin layer) Acrylic adhesive (product name "SK Dyne 1604N", manufactured by Soken Chemical Co., Ltd.) 100% 2 parts by mass of a light absorbent, a hardening agent (product name "Coronate L", manufactured by Tosoh Corporation), and the above light absorbent. Mix 10 parts by mass of absorbing agent 1, dilute with toluene until the solid content is 25%, and prepare for resin layer assembly. Product 7 was obtained.

[0160] <Example B2> In Example B2, resin layer composition 6 was used instead of resin layer composition 1, and Instead of the adhesive layer located between the first protective film and the λ / 2 phase difference film, a resin layer is used. Except for using a resin layer made of composition 8, the circular polarizer and the following were made in the same manner as in Example A1. An image display device was obtained. The resin layer composition 8 was prepared as follows.

[0161] (Composition for resin layer 8) Acrylic adhesive (product name "SK Dyne 1604N", manufactured by Soken Chemical Co., Ltd.) 100% Parts by mass, hardener (product name "Coronate L", manufactured by Tosoh Corporation), and Indo Lu-type compound (product name "BONASORB UA-3912", Orient Chemical Industries Co., Ltd.) Mix 3 parts by mass of (light absorber 2) manufactured by the company, and dilute with toluene until the solid content is 25%. A resin layer composition 8 was obtained.

[0162] <Comparative Example A1> In Comparative Example A1, resin layer composition 6 was used instead of resin layer composition 1. Except as otherwise provided, a second protective film, a circular polarizing plate, and an image display device can be obtained in the same manner as in Example A1. Ta.

[0163] <Comparative example A2> In Comparative Example A2, resin layer composition 9 was used instead of resin layer composition 1. Except as otherwise provided, a second protective film, a circular polarizing plate, and an image display device can be obtained in the same manner as in Example A1. The resin layer composition 9 was prepared as follows.

[0164] (Composition 9 for resin layer) Polyfunctional monomer (product name "KAYARAD PET-30", manufactured by Nippon Kayaku Co., Ltd.) 1 00 parts by mass, polymerization initiator (Omnirad 184 manufactured by IGM Resins BV) 4 parts by mass of Omnirad819 (mass ratio 50:50), leveling agent (product name "F5 68", 0.2 parts by mass (manufactured by DIC Corporation), and hydroxyphenyltriazine-based ultraviolet Light absorber (product name "Tinuvin479", manufactured by BASF) (light absorber 3) 3 parts by mass The mixture was then diluted with MEK until the solids content reached 25% to obtain resin layer composition 9.

[0165] <Comparative Example B1> In Comparative Example B1, resin layer composition 10 was used instead of resin layer composition 4. Except for the above, the second protective film, circular polarizer, and image display device are prepared in the same manner as in Example B1. The resin layer composition 10 was obtained as follows.

[0166] (Composition 10 for resin layer) Acrylic adhesive (product name "SK Dyne 1604N", manufactured by Soken Chemical Co., Ltd.) 100% parts by mass, hardening agent (product name "Coronate L", manufactured by Tosoh Corporation), and hydrox Cyphenyltriazine-based UV absorber (product name "Tinuvin479", manufactured by BASF) Mix 3 parts by mass of (light absorber 3), dilute with toluene until the solid content is 25%, and A composition 10 for the lipid layer was obtained.

[0167] <Maximum absorption wavelength and absorbance at wavelengths of 380nm to 500nm> Maximum absorption wavelength λ of light absorbers 1-3 max and absorbance at wavelengths of 380nm to 500nm Spectrophotometer (product name "UV-2450", manufactured by Shimadzu Corporation, light source: tungsten) Measurements were taken using a lamp and a deuterium lamp. The maximum absorption wavelength λ of light absorber 1. max Oh The absorbance was measured after desolventing the solution containing the obtained light absorber 1 by vacuum drying, and then the concentration The test was performed using a 40 ppm chloroform solution, with the maximum absorption wavelength λ of light absorbers 2 and 3. ma x The absorbance was measured using a chloroform solution containing light absorbers 2 and 3 at a concentration of 40 ppm. It was done in a deliberate manner.

[0168] <Blue light blocking rate> Blue light cut rate of circular polarizer in image display devices according to the examples and comparative examples (B The L-cut ratio was measured. Specifically, first, a piece measuring 50mm x 50mm was cut. A spectrophotometer capable of measuring the transmittance of a circular polarizing plate in 0.5 nm increments (product name "UV-245") 0", manufactured by Shimadzu Corporation, light source: tungsten lamp and deuterium lamp) with circular deviation The optical plate was positioned so that the λ / 4 phase difference film side faced the light source side. The circular polarizer had defects (foreign matter). It must be free from impurities, cracks, wrinkles, and stains, and also free from curls. It was held in a flat position in the spectrophotometer. In this state, under the following measurement conditions, at a wavelength of 300 nm For each wavelength from m to 780nm, transmittance was measured within a range of at least 5 points, within a 1nm margin before and after each value. Then, let A be the blue light cut rate (%), and the transmittance of wavelengths from 380nm to 500nm. Let B be the average value (%) of [the specified value], and let C be the average value (%) of the transmittance between wavelengths of 500nm and 650nm. The blue light cut rate was then calculated using the following formula. Note that the blue light cut rate was measured three times. The arithmetic mean of the values ​​obtained was taken. A = (1 - B / C) × 100 (Measurement conditions) ·Wavelength range: 300nm~780nm • Scan speed: High Slit width: 2.0 • Sampling interval: Auto (0.5nm intervals) ·Lighting:C • Light source: D2 and WI ·Field of view: 2° • Light source switching wavelength: 360nm S / R switching: Standard • Pixel: PM • Auto-zero: Performed at 550nm after baseline scan.

[0169] <Spectral transmittance> In the circular polarizers according to the examples and comparative examples, wavelengths of 380 nm, 410 nm, and 420 nm Spectral transmittance at m and 440 nm was measured. Specifically, a large 50 mm x 50 mm sample was taken. A circular polarizing plate cut to a small size is measured using a spectrophotometer capable of measuring transmittance in 0.5 nm increments (product) Name: "UV-2450", manufactured by Shimadzu Corporation, light source: tungsten lamp and deuterium The circular polarizer was positioned inside the lamp such that the λ / 4 phase difference film side faced the light source. Polarizing plates are free from defects (impurities), cracks, wrinkles, and dirt. Furthermore, it was held in the spectrophotometer in a flat, curl-free state. In this state, at a wavelength of 380 At 410nm, 420nm, and 440nm, the minimum within 1nm of each of these values. By measuring the transmittance at 5 points and calculating the average value, the wavelength 380nm, 4 The spectral transmittance at 10 nm, 420 nm, and 440 nm was determined. At a wavelength of 380 nm, The spectral transmittances at 410 nm, 420 nm, and 440 nm were obtained by taking three measurements. The arithmetic mean of the values ​​was used. Furthermore, the measurement conditions for spectral transmittance were the same as those for the blue light shielding rate. The conditions were the same as above.

[0170] <Lightfastness Test> In the image display devices according to the examples and comparative examples, a lightfastness test was performed, and the results before and after the lightfastness test were obtained. By measuring the brightness, we confirmed whether or not the OLED panel was degrading. Specifically Specifically, the first step was to turn on the image display device before the lightfastness test and measure its brightness. The brightness of light emitted from the surface of the image display device (the surface of the cover glass) is measured by the thickness of the image display device. From this direction, a spectroradiometer (product name "CS2000", manufactured by Konica Minolta, Inc.) was used. The measurement was then performed under conditions of a measurement angle of 1°. Next, a lightfastness tester (product name "UV fade") was used. Using a "Meter U48AU" (manufactured by Suga Test Instruments Co., Ltd.), the environment was measured at 42°C and 50% relative humidity. Below is a light resistance test in which light from a carbon arc lamp is shone onto an image display device for 50 hours (see below) This test is sometimes called the "50-hour lightfastness test." ) was conducted. And lightfastness After the test, the image display device was turned on and the same conditions as the brightness measurement of the image display device before the lightfastness test were applied. The brightness was measured in the case. Similarly, a lightfastness tester (product name "Ultraviolet Fade Meter U") was used. Using the "48AU" (manufactured by Suga Test Instruments Co., Ltd.), under conditions of 42°C and 50% relative humidity, the car A light resistance test was conducted by irradiating an image display device with light from a bon arc lamp for 100 hours. After the lightfastness test, the image display device is turned on, and the same brightness measurement as the image display device before the lightfastness test is performed. Brightness was measured under the specified conditions.

[0171] From these measured luminances, the retention rate of luminance after the lightfastness test relative to the luminance before the lightfastness test can be calculated. The following were determined. The luminance maintenance rate was defined as the luminance maintenance rate (%), and the light resistance test during illumination was performed. Let E be the surface brightness of the image display device before the test, and the image display device after the light resistance test while lit. The surface brightness was denoted as F and calculated using the following formula. D = F / E × 100

[0172] Then, based on the obtained brightness retention rate, it is determined whether or not the OLED panel has deteriorated through a light resistance test. This was confirmed. Specifically, if the brightness maintenance rate is less than 80%, the OLED panel is inferior. The OLED panel has been evaluated, and if the brightness retention rate is 80% or higher, it means that the OLED panel has not deteriorated. I gave it a good rating. The evaluation criteria were as follows: ○: No degradation of the OLED panel was detected. ×: Degradation of the OLED panel was confirmed.

[0173] <Indentation hardness of the layer containing the light absorber (H IT )> In the circular polarizing plate according to the example, the indentation hardness of the layer containing the light absorber was measured. In other words, in Examples A1 to A5, the first resin layer containing light absorbers 1 and 2 Dental hardness was measured, and in Examples B1 and B2, adhesive containing light absorbers 1 and 2 was found. The indentation hardness of the layers was measured. Indentation hardness (H IT ) is HYS Measurements were taken using the TI950 TriboIndenter manufactured by ITRON (Hygitron). It was determined. Specifically, first, a circular polarizing plate cut to 1 mm x 10 mm was embedded in resin. An embedded block is prepared, and a measuring sand suitable for hardness measurement by nanoindentation is prepared. A pull sample was prepared. The "Ultramicrotome EM UC7" was used to prepare the sample for measurement. (Leica Microsystems Co., Ltd.) was used. Next, the indenter of the sample to be measured was pressed. Position the sample so that the surface to be inserted is parallel to the mounting surface of the stage. It was fixed to the stage of a TI950 TriboIndenter manufactured by Zitron. The layer containing the light absorber (in Examples A1 to A5, this is the first resin layer, and in Example B1) In B2, the flat portion in the center of the cross-section of the adhesive layer is subjected to a load control method, with maximum indentation. A Berkovich indenter was applied at a loading rate of 10 μN / sec for 30 seconds, so that the load was 300 μN. Then, while applying a load from 0 μN to 300 μN, press the center of the cross-section of the layer containing the light absorber. After loading, hold at 300 μN for 5 seconds, then unload from 300 μN to 0 μN over 30 seconds. Then, the indentation depth h(nm) corresponding to the indentation load F(N) at this time was continuously We measured the load and displacement and created load-displacement curves. From the created load-displacement curves, we performed an indentation. Hardness H IT The maximum indentation load F is expressed in equation (1) above. max (N) The indenter and light Projection area A where the layer containing the absorbent is in contact. p (mm 2 The value was obtained by dividing by ). The station hardness was calculated as the arithmetic mean of the values ​​obtained from measurements at 10 locations. p The above This was the value obtained by equation (2).

[0174] <Pencil hardness> Surface of the second protective film according to the example (except for Example A2, the surface of the second resin layer, implementation) In Example A2, the pencil hardness was measured on the surface of the first resin layer. For the measurement, cut a sample measuring 5cm x 10cm from the second protective film. Use Nichiban Co., Ltd.'s cellophane tape (registered trademark) to ensure there are no folds or wrinkles on the glass plate. While keeping the pencil fixed, apply a 300g load to it and move the pencil at a speed of 3mm / second. Pencil hardness is the highest hardness that does not cause scratches on the surface of the sample in a pencil hardness test. It should be noted that when measuring pencil hardness, multiple pencils with different hardness levels are used, but pencils Each pencil was subjected to a pencil hardness test five times, and at least four of those five tests were performed under fluorescent light to check the surface of the sample. If no scratches are visible on the surface of the sample upon close inspection, then this hardness of pencil may be the cause of the odor. Therefore, we can conclude that no scratches were made on the surface of the sample.

[0175] <Scratch resistance test> Surface of the second protective film according to the example (except for Example A2, the surface of the second resin layer, implementation) Example A2 involved a scratch resistance test on the surface of the first resin layer. Specifically, first, 50m The back of the second protective film, cut to a size of m x 50 mm, is coated with a transparent adhesive with a thickness of 50 μm. Through the coating layer (refractive index: 1.55, product name "PD-S1", manufactured by Panac Corporation), large 10cm x 10cm and 2mm thick acrylic sheet (product name "Comoglass DFA50") It was laminated onto "2K" (manufactured by Kuraray Co., Ltd.). Then, on the surface of the second protective film, #0000 grade steel wool (product name "Bonstar", manufactured by Nippon Steel Wool Co., Ltd.) Using ) 150 g / cm³ 2 A scratch resistance test was conducted by rubbing the surface back and forth 10 times while applying a load, and then visually inspecting the surface. We then observed whether or not scratches were visible on the surface of the second protective film. The evaluation results are as follows: I followed the rules. ○: No damage was found. △: Some minor scratches were found, but they were at a level that did not affect practical use. ×: The injury was clearly identified.

[0176] <Flexibility> In the circular polarizing plate according to the example, a mandrel test (on a metal cylinder from 2 mm to 32 mm) was performed. A test was conducted in which a sample was wrapped around the material to evaluate its flexibility. Specifically, 50mm For a circular polarizing plate cut to a size of 50 mm, JIS K5600-5-1:199 A mandrel test was performed according to 9, and a circular polarizing plate was wrapped around a cylinder so that the second resin layer was on the inside. We determined the minimum diameter of a cylinder that did not develop cracks in the circular polarizing plate when it was attached. The evaluation results are as follows: ○: The minimum diameter was 6 mm or less. ×: The minimum diameter exceeded 6mm.

[0177] The results are shown in Tables 1-3 below. [Table 1]

[0178] [Table 2]

[0179] [Table 3]

[0180] [Table 4]

[0181] As shown in Table 2, in the image display device according to Comparative Example A1, a light absorber is used Because it was not present, the OLED panel degraded during the lightfastness test. See also Tables 2 and 3. As shown, in the image display devices relating to Comparative Examples A2 and B1, a light absorber is used However, it did not absorb light in the wavelength range of 380nm to 500nm. The OLED panel degraded after a 50-hour light resistance test. Furthermore, Comparative Examples A1 and A2 The circular polarizer for B1 had a low blue light cut rate. In contrast, Table 2 and Table As shown in 3, the image display devices according to Examples A1 to A5 and Examples B1 and B2 In this case, a light absorber 1 that absorbs light in the wavelength range of 380 nm to 500 nm, or light absorber Because agent 2 was used, the OLED panel did not degrade in the 50-hour lightfastness test. The circular polarizers in Examples A1-A5 and Examples B1 and B2 have a blue light cut rate. It was excellent. [Explanation of Symbols]

[0182] 10, 80, 90... Image display device 20…Organic light-emitting diode element 30... Touch sensor 40...Circular polarizing plate 45…First protective film 46… Polarizer 47, 112... Second protective film 48...Light-transparent base material 49…First resin layer 50...Second resin layer 60... Cover layer 111...Third resin layer

Claims

1. Organic light-emitting diode element, A cover layer provided on the observer side of the organic light-emitting diode element, A circular polarizing plate is provided between the organic light-emitting diode element and the cover layer, and comprises an adhesive layer, a second resin layer, a first resin layer, a light-transmitting substrate, and a polarizer in this order from the cover layer toward the organic light-emitting diode element. The first resin layer comprises a cured product of a composition containing an ionizing radiation polymerizable compound and at least one of a sesamol-type benzotriazole compound and an indole compound that absorbs light in the wavelength range of 380 nm to 500 nm. The second resin layer comprises a cured product of a composition containing an ionizing radiation polymerizable compound, and does not contain a light absorber. The adhesive layer is composed of a cured product or adhesive of an ionizing radiation-curable adhesive, and does not contain the light absorber. An image display device in which the film thickness of the first resin layer and the second resin layer are each 0.5 μm or more and 10 μm or less.

2. The image display device according to claim 1, wherein the indentation hardness of the first resin layer is 100 MPa or more and 600 MPa or less.

3. The image display device according to claim 1 or 2, wherein the sesamol-type benzotriazole compound is a compound represented by the following general formula (A). 【Chemistry 1】 (In formula (A), R １ R represents a hydrogen atom or a methyl group. ２ (This represents a linear or branched alkylene group having 1 to 6 carbon atoms, or a linear or branched oxyalkylene group having 1 to 6 carbon atoms.)

4. The image display device according to any one of claims 1 to 3, wherein the indole compound is a compound represented by the following general formula (B). 【Chemistry 2】 (In formula (B), R ３ R represents a linear or branched alkyl or aralkyl group. ４ -CN or -COOR ５ This represents, and here, R ５ is an alkyl group or aralkyl group which may have substituents (however, R ３ If it is a methyl group, exclude the ethyl group.

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