Inspection device and inspection method

By dividing patterns into regions and comparing them for alignment, the inspection apparatus and method address false defect detection in inspection methods, ensuring accurate alignment and reducing misinterpretations.

JP7887372B2Active Publication Date: 2026-07-09TORAY ENG CO LTD
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Patent Information

Application Number
JP2023020190
Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
Filing Date
2023-02-13
Publication Date
2026-07-09
Estimated Expiration
2043-02-13

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Abstract

To suppress detection of a pseudo defect due to a positional deviation between an inspection image and a reference image.SOLUTION: An inspection device 1 inspects an inspection object W by comparing an inspection image J obtained by imaging the inspection object W with a reference image K. In the reference image K, a registration pattern Pk is registered among a plurality of patterns P formed in the inspection object W. In the inspection image J, a detection pattern Pj similar to the registered pattern Pk is detected among the plurality of patterns P formed in the inspection object W. Based on a position Lj of the detection pattern Pj in the inspection image J and a position Lk of the registered pattern Pk in the reference image K, the inspection image J is aligned with the reference image K. The detection pattern Pj and the registered pattern Pk are respectively partitioned into a plurality of regions D, and the detection pattern Pj and the registration pattern Pk are compared with each other in the regions D corresponding to each other, whereby coincidence between the detection pattern Pj and the registered pattern Pk is determined.SELECTED DRAWING: Figure 3
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Citation Information

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