Gel plating system and gel plating method
The gel plating system addresses gel peeling and void issues by using a controlled current pulse system to form a sound plating layer without defects.
JP7888446B2Active Publication Date: 2026-07-13HITACHI LTD
Patent Information
- Application Number
- JP2022201445
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2022-12-16
- Publication Date
- 2026-07-13
- Estimated Expiration
- 2042-12-16
AI Technical Summary
Technical Problem
Conventional gel plating techniques face issues such as peeling of the gel from the object to be plated and voids forming between the object and the gel, leading to incomplete or defective plating layers.
Method used
A gel plating system that includes a cathode terminal, an anode, a constant current pulse application device, and a control device with a database to manage conditions, preventing hydrogen gas generation by adjusting current pulses based on material data to form a sound plating layer.
Benefits of technology
The system effectively forms a sound plating layer without defects by controlling current pulses to prevent hydrogen generation, ensuring uniform and efficient plating.
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Abstract
To provide a gel plating system and a gel plating method capable of forming a healthy plating layer.SOLUTION: A gel plating system 1 according to the present invention includes: a cathode terminal 3 to be brought into contact with a plating object 10; an anode 2 to be brought into contact with a surface of the plating object 10 and to be brought into contact with a gel plating composition 11 containing a metal or metal ions to form a plating layer 12 on the surface of the plating object 10; a constant current pulse-applying device 4 for applying a constant pulse current between the anode 2 and the cathode terminal 3; and a control apparatus 5 equipped with a database DB in which gel plating data concerning the gel plating composition 11 are stored, the control apparatus setting the conditions of the pulse current so that hydrogen gas is not generated based on the gel plating data and controlling the constant current pulse-applying device 4 according to the conditions.SELECTED DRAWING: Figure 1
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Citation Information
Patent Citations
Manufacture of amorphous plating alloy
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