システム及び標本作製装置の精度管理を行う方法

JP7891824B2Active Publication Date: 2026-07-17SYSMEX CORP
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Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
SYSMEX CORP
Filing Date
2022-03-09
Publication Date
2026-07-17

AI Technical Summary

Benefits of technology

【0012】 本発明によれば、各施設が採用した塗抹·染色処理条件に対して適切に標本の精度管理を行うことが可能である。

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Abstract

To provide an accuracy management method, an accuracy management device, and a program that can appropriately perform accuracy management of samples according to processing conditions for smear and staining adopted by each facility.SOLUTION: An accuracy management method for samples prepared from specimens, includes: setting at least one index used for accuracy management of a sample from management index information (MII) in which multiple indices related to the samples are associated with management values corresponding to each of the multiple indices (S1); obtaining a feature value related to at least one index from image data of the sample (S3); and outputting accuracy management information of the sample based on the feature value and the management value associated with at least one index (S5).SELECTED DRAWING: Figure 1
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