設備診断装置及び設備診断方法

JP7891893B2Active Publication Date: 2026-07-17HITACHI LTD

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Patents
Current Assignee / Owner
HITACHI LTD
Filing Date
2022-10-07
Publication Date
2026-07-17

AI Technical Summary

Benefits of technology

【0010】 本発明の一態様によれば、品質維持のために適切な設備の部位の使い方を推奨して、製造品質不良の発生を抑えることができる。前述した以外の課題、構成及び効果は、以下の実施例の説明によって明らかにされる。

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Abstract

To recommend proper usage of a facility for quality maintenance to suppress the generation of manufacturing quality errors.SOLUTION: A facility diagnostic apparatus according to the present invention has a processor and a storage device. The storage device stores usage information defining a plurality of usages of each part of a facility manufacturing a product, weight information indicating a degree of influence given to manufacturing quality of the product by a deterioration state of each part when each usage is applied, target quality information indicating a target value of the manufacturing quality. The processor estimates the deterioration state of each part based on the state of each part, specifies the degree of influence corresponding to usage applied to the facility, estimates the manufacturing quality of the product based on the estimated deterioration state of each part and the specified degree of influence corresponding to the usage applied to the facility, and, based on a result of comparison between the estimated manufacturing quality and the target value of the manufacturing quality, selects the usage applied to the facility so that the manufacturing quality satisfies the target value.SELECTED DRAWING: Figure 1
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