Support glass substrate
The support glass substrate with a high Young's modulus to density ratio addresses the challenge of simultaneous deflection suppression and weight reduction by ensuring the Young's modulus per unit density is higher than expected, achieving both properties effectively.
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- AGC INC
- Filing Date
- 2024-08-22
- Publication Date
- 2026-07-29
AI Technical Summary
Support glass substrates used in FOWLP and similar processes face challenges in simultaneously achieving reduced deflection and weight, as increasing thickness for deflection suppression increases mass, while reducing thickness for weight reduction makes them more susceptible to deflection.
A support glass substrate with a specific ratio of Young's modulus to density (ε/d) of 37.0 (GPa·cm³/g or more, calculated using measured values and composition-based calculations, ensuring higher Young's modulus per unit density, allowing for thinner and lighter substrates with enhanced rigidity.
The solution effectively suppresses deflection and reduces weight beyond expectations by ensuring the Young's modulus to density ratio exceeds the composition-based calculation, enabling both properties to be achieved simultaneously.
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Abstract
Description
[Technical Field]
[0001] This invention relates to a support glass substrate. [Background technology]
[0002] With the miniaturization of electronic devices, there is a growing demand for technologies to mount semiconductor devices used in these devices at high density. In recent years, technologies such as fan-out wafer-level packages (FOWLP) and fan-out panel-level packages (FOPLP) have been proposed for mounting semiconductor devices at high density. Hereafter, FOWLP and FOPLP will be collectively referred to as FOWLP, etc.
[0003] In FOWLP and similar processes, a support glass substrate is sometimes used to support the processed substrate on which semiconductor devices are stacked in order to suppress the deflection of the processed substrate (see, for example, Patent Document 1). [Prior art documents] [Patent Documents]
[0004] [Patent Document 1] Patent No. 6443668 [Overview of the project] [Problems that the invention aims to solve]
[0005] Support glass substrates used to support components, such as those used in FOWLP (Free Flow Lapping) systems, require both reduced deflection and reduced weight. Increasing the thickness of the support glass substrate to reduce deflection increases its mass, while reducing its thickness to reduce weight makes it more susceptible to deflection. Therefore, achieving both deflection suppression and weight reduction simultaneously can be challenging.
[0006] The present invention has been made in view of the above problems, and an object thereof is to provide a support glass substrate capable of suppressing deflection and reducing weight.
Means for Solving the Problems
[0007] In order to solve the above-described problems and achieve the object, a support glass substrate according to the present disclosure has a ratio ε / d (GPa·cm ) of Young's modulus ε (GPa) to density d (g / cm 3 ) of 37.0 (GPa·cm 3 / g) or more, and is a value larger than a ratio calculation value α (GPa·cm 3 / g) which is a ratio of Young's modulus (GPa) calculated from the composition to density (g / cm 3 ). The ratio calculation value α (GPa·cm 3 / g) is represented by the following formula. α = 2·Σ{(V i [[ID=:23]]·G i ) / M i )·X i} Here, V i is a packing parameter of the metal oxide contained in the support glass substrate, G i is the dissociation energy of the metal oxide contained in the support glass substrate, M i is the molecular weight of the metal oxide contained in the support glass substrate, and X i is the molar ratio of the metal oxide contained in the support glass substrate.
Effects of the Invention
[0008] According to the present invention, suppression of deflection and weight reduction can be achieved.
Brief Description of the Drawings
[0009] [Figure 1] FIG. 1 is a schematic view of a support glass substrate according to the present embodiment. <00,00172> [Figure 2] FIG. 2 is a graph for explaining the performance of the support glass substrate according to the present embodiment. [Figure 3]Figure 3 is a schematic diagram showing the method for measuring deflection in the examples and comparative examples. [Figure 4] Figure 4 is a graph showing the characteristics of the supporting glass substrates of the examples and comparative examples. [Modes for carrying out the invention]
[0010] Preferred embodiments of the present invention will be described in detail below with reference to the attached drawings. However, the present invention is not limited to these embodiments, and if there are multiple embodiments, they may be constructed by combining these embodiments.
[0011] Figure 1 is a schematic diagram of the support glass substrate according to this embodiment. As shown in Figure 1, the support glass substrate 10 according to this embodiment is used as a glass substrate for the manufacture of semiconductor packages, and more specifically, it is a support glass substrate for the manufacture of FOWLP, etc. However, the use of the support glass substrate 10 is not limited to the manufacture of FOWLP, etc., and is arbitrary; it may be a glass substrate used to support components. Note that "FOWLP, etc." includes FOWLP and FOPLP, as described above.
[0012] The support glass substrate 10 achieves both suppression of deflection and weight reduction by increasing the ratio of Young's modulus ε to density d, ε / d. Specifically, the support glass substrate 10 has a ratio ε / d of 32.0 (GPa·cm). 3 The result is greater than or equal to / g, and satisfies the following equation (1). The ratio calculation value α in equation (1) is the calculated value of the ratio of Young's modulus to the density of the support glass substrate 10, calculated from the composition of the support glass substrate 10, but the details will be described later.
[0013] ε / d>α ···(1)
[0014] The ratio ε / d is a value calculated using the measured Young's modulus ε of the support glass substrate 10 and the measured density d of the support glass substrate 10. In this embodiment, the Young's modulus ε of the support glass substrate 10 is the value obtained by measuring ultrasonic propagation using an OLYMPUS 38DL PLUS. The density d of the support glass substrate 10 is the value obtained by measuring using the Archimedes method in this embodiment. The ratio ε / d is calculated by dividing the measured Young's modulus ε by the measured density d. The unit of Young's modulus ε is GPa, and the unit of density d is g / cm³. 3 The unit of the ratio ε / d is GPa·cm. 3 It is / g.
[0015] While the ratio ε / d is a value obtained using measured values, the calculated ratio α is a value calculated from the composition of the support glass substrate 10 without using measured values of Young's modulus ε and density d. Since it is known that the Young's modulus of glass can be calculated from its composition, the calculated ratio α of Young's modulus to density of the support glass substrate 10 can be calculated from the composition of the support glass substrate 10. The composition of the support glass substrate 10 here refers to the composition when the components contained in the support glass substrate 10 are converted into metal oxides. More specifically, the ratio calculation value α corresponds to the value obtained by multiplying the size of the metal oxide ion by its bonding strength, dividing that value by the weight of the ion, summing these values for each metal oxide, and then multiplying by 2. Specifically, the ratio calculation value α is calculated by the following equation (2).
[0016] α = 2·Σ(P i ·X i )=2·Σ{(V i ·G i ) / M i )·X i} ···(2)
[0017] Here, P i is, (V i ·G i / M i ) is. V i (cm 3 G ( / mol) is the packing parameter of the metal oxide contained in the support glass substrate 10, i (kJ / cm 3) is the dissociation energy of the metal oxide contained in the support glass substrate 10, and M i (g / mol) is the molecular weight of the metal oxide contained in the supporting glass substrate 10, and X i This is the molar ratio of the metal oxide contained in the support glass substrate 10 to the entire support glass substrate 10. i The unit is dimensionless. As shown in equation (2), the ratio calculation value α is the value calculated for each of the metal oxides contained in the support glass substrate 10 {(V i ·G i ) / M i )·X i This value is obtained by summing up all the metal oxides contained in the support glass substrate 10 and multiplying by 2. The unit of the ratio calculation value α is GPa·cm. 3 It is / g.
[0018] Also, V i It is calculated using the following formula (3), G i It is calculated using the following formula (4).
[0019] V i =6.02·10 23 ·(4 / 3)·π·(x·r 3 M +y·r 3 O ) ···(3) G i =d i / M i ·{x·ΔHf(M gas )+y·ΔHf(O gas )-ΔHf(M x O ycrystal )-(x+y)·RT} ···(4)
[0020] Here, the metal oxide contained in the support glass substrate 10 is M x O y Let's assume that. M is a metallic element, O is the oxygen element, x is the valence of metallic element M, and y is the valence of oxygen element O. r M M is a metal oxide x O yThe Shannon ionic radius of the metallic element M in r O M is a metal oxide x O y This is the Shannon ionic radius of the element oxygen O in . Also, d i M is a metal oxide x O y It is the density. ΔHf(M gas ) is the standard enthalpy of formation of a metallic element M in the gaseous state, and ΔHf(O gas ) is the standard enthalpy of formation of the element oxygen O in the gaseous state, and ΔHf(M x O ycrystal ) is a metal oxide M x O y This is the standard enthalpy of formation. R is the gas constant, and T is the absolute temperature.
[0021] The supporting glass substrate 10 has a ratio ε / d of 32.0 (GPa·cm). 3 The value is greater than or equal to ( / g) and is also greater than the ratio calculated value α based on the composition. In other words, the supporting glass substrate 10 is a component in which the ratio ε / d of Young's modulus to density, determined by actual measurement, is larger than the ratio calculated value α, which is the ratio of Young's modulus to density calculated based on the composition. The ratio ε / d of the supporting glass substrate 10 is 32.0 (GPa·cm). 3 By making the Young's modulus (Yong's modulus) greater than or equal to 1 / g, the support glass substrate 10 can be made thinner and lighter while maintaining high rigidity, thus achieving both suppression of deflection and thinning and weight reduction. Furthermore, the ratio ε / d of the support glass substrate 10 is greater than the ratio calculated value α based on the composition, in other words, the Young's modulus per unit density is greater than the value expected based on the composition. Therefore, the support glass substrate 10 can achieve both deflection suppression and weight reduction to a greater extent than expected.
[0022] Figure 2 is a graph illustrating the performance of the support glass substrate according to this embodiment. Figure 2 shows the range of the ratio ε / d described above, with the horizontal axis representing the calculated ratio α and the vertical axis representing the ratio ε / d. Line segment L1a represents the ratio ε / d = 32.0 (GPa·cm). 3 The boundary line is such that the ratio ε / d = calculated ratio α, and line segment L2a is the boundary line such that the ratio ε / d = calculated ratio α. In Figure 2, the support glass substrate 10 can be said to be plotted above line segments L1a and L2a in the vertical axis direction, or in other words, the ratio ε / d can be said to be plotted within the shaded area in Figure 2.
[0023] The supporting glass substrate 10 has a ratio ε / d of 37.0 (GPa·cm). 3 It is more preferable that it be 40.0 (GPa·cm) or more, and 3 It is even more preferable that the ratio ε / d is 37.0 (GPa·cm). 3 By achieving a ratio of 40.0 (GPa·cm) or higher, deflection suppression and weight reduction can be more effectively realized, and the ratio ε / d is 40.0 (GPa·cm). 3 By achieving a value of 1 / g or more, the suppression of deflection and weight reduction can be more effectively realized. In Figure 2, the line segment L1b has a ratio ε / d = 37.0 (GPa·cm). 3 The boundary line is such that the ratio ε / d = 40.0 (GPa·cm) and the line segment L1c is such that the ratio ε / d = 40.0 (GPa·cm) 3 This is the boundary line where / g) is the case.
[0024] Furthermore, it is more preferable that the support glass substrate 10 satisfies the ratio ε / d of the following equation (5), and even more preferable that it satisfies equation (6). By satisfying equation (5), deflection suppression and weight reduction can be more favorably achieved, and by satisfying equation (6), deflection suppression and weight reduction can be even more favorably achieved.
[0025] ε / d > α + 2.0 (GPa·cm) 3 / g) ···(5) ε / d > α + 4.0 (GPa·cm) 3 / g) ···(6)
[0026] In FIG. 2, the line segment L2b is the boundary line where ε / d = α + 2.0 (GPa·cm 3 / g), and the line segment L2c is the boundary line where ε / d = α + 4.0 (GPa·cm 3 / g).
[0027] Further, the support glass substrate 10 preferably has a packing density Vt of less than 13.8 (cm 3 / mol), more preferably less than 13.6 (cm 3 / mol), and even more preferably less than 13.3 (cm 3 / mol). By having the packing density Vt within this range, the molecules can be densely packed, and suppression of deflection and weight reduction can be preferably achieved. Here, the packing density Vt indicates the degree of packing of the molecules, and in this embodiment, it indicates the degree of packing of the metal oxide contained in the support glass substrate 10. The packing density Vt is a value calculated based on the composition of the support glass substrate 10. The packing density Vt is calculated from the following formula (7).
[0028] Vt = Σ(V i ·X i ) ··· (7)
[0029] In formula (7), V i is the packing parameter of the metal oxide contained in the support glass substrate 10 as described above, and X i in formula (7) is the molar ratio of the metal oxide contained in the support glass substrate 10 to the entire support glass substrate 10 as described above. That is, the packing density Vt is the value obtained by summing the values obtained by multiplying the packing parameter calculated for each metal oxide by the molar ratio for all the metal oxides contained in the support glass substrate 10.
[0030] The support glass substrate 10 preferably has a ratio calculation value α of 31.6 (GPa·cm 3 / g) or more and a packing density Vt of less than 13.8 (cm 3 / mol). Further, the support glass substrate 10 has a ratio calculation value α of 32.8 (GPa·cm 3 / g) or more, and it is more preferable that the packing density Vt is less than 13.8, and the ratio calculation value α is 33.1 (GPa·cm 3 / g) or more, and it is still more preferable that the packing density Vt is less than 13.6 (cm 3 / mol), and it is still more preferable that the ratio calculation value α is 33.5 (GPa·cm 3 / g), and it is still more preferable that the packing density Vt is less than 13.3 (cm 3 / mol). By using the support glass substrate 10 in which the ratio calculation value α and the packing density Vt have such a relationship, suppression of deflection and weight reduction can be preferably realized.
[0031] Further, the ratio of the ratio ε / d to the ratio calculation value α, that is, the value obtained by dividing the ratio ε / d by the ratio calculation value α, is defined as the structure factor M. That is, the structure factor M indicates the ratio of the measured value of the specific elastic modulus to the specific elastic modulus calculated from the composition. In this case, it can be said that the support glass substrate 10 preferably has a structure factor M greater than 1, more preferably 1.1 or more, and still more preferably greater than 1.12. By making the structure factor M fall within this range, suppression of deflection and weight reduction can be preferably realized.
[0032] Further, the ratio of the average molecular weight V to the density d of the support glass substrate 10, that is, the value obtained by dividing the average molecular weight V by the density d, is defined as the molar volume Vm (cm 3 / mol). The average molecular weight V is the calculated value of the average molecular weight of the support glass substrate 10 and is calculated based on the composition of the support glass substrate 10. For example, for a support glass substrate containing 50% Al2O3 and 50% SiO2 in molar ratio, the average molecular weight V is (101.96×0.5)+(60.08×0.5). It can be said that the molar volume Vm is the ratio of the average molecular weight calculated from the composition to the measured value of the density d. The support glass substrate 10 preferably has a molar volume Vm less than 24.1 (cm 3 / mol), more preferably less than 23.2 (cm 3 / mol), and still more preferably less than 22.7 (cm 3It is even more preferable that the molecular volume Vm is less than ( / mol). When the molecular volume Vm is in this range, the molecules are densely packed, and bending can be effectively suppressed.
[0033] Next, the composition of the support glass substrate 10 will be described. In this embodiment, the support glass substrate 10 is composed of the composition described below, thereby achieving a ratio ε / d of 32.0 (GPa·cm). 3 The ratio can be greater than or equal to ( / g) and greater than the calculated ratio α, but the composition described below is just one example. The support glass substrate 10 has a ratio ε / d of 32.0 (GPa·cm). 3 Any composition is acceptable as long as it is greater than or equal to ( / g) and greater than the calculated ratio value α.
[0034] The support glass substrate 10 comprises a base material and an additive material. The support glass substrate 10 preferably contains SiO2 and Al2O3 as the base material. The total content of SiO2 and Al2O3 in the support glass substrate 10, expressed in mol% based on oxides, is preferably 50% to 85%, and more preferably 60% to 75%. Here, 50% to 85% refers to a content of 50% or more and 85% or less when the total mol% of the support glass substrate 10 is considered 100%, and the same applies hereafter. Furthermore, the support glass substrate 10 may contain B2O3 in addition to SiO2 and Al2O3 as the base material. The B2O3 content is preferably 1% to 30% and more preferably 3% to 10% in mole percent based on oxide. By setting the base material content within this range, the ratio ε / d can be increased, thereby suitably achieving both suppression of deflection and weight reduction. In addition, the support glass substrate 10 may contain at least one of P2O5, Ga2O3, AlN, and Si3N4 as the base material.
[0035] The additive material is a metal oxide. The support glass substrate 10 contains at least one of MgO, CaO, and Y2O3 as an additive material. The content of the additive material in the support glass substrate 10, in other words, the total content of one or more components selected from the group consisting of MgO, CaO, and Y2O3, is preferably in the range of 15% to 50% and more preferably 20% to 45% in mole percent based on the oxide. The support glass substrate 10 preferably contains only MgO, only MgO and CaO, all of MgO, CaO and Y2O3, or only Y2O3 as an additive material. The support glass substrate 10 preferably contains 11% to 35% MgO, and more preferably 20% to 30%, in mol% based on oxide. The support glass substrate 10 preferably contains 7% to 32% CaO, and more preferably 8% to 15%, in mol% based on oxide. The support glass substrate 10 preferably contains 2.8% to 20% Y2O3, in mol% based on oxide. By setting the content of the additive material within these ranges, the ratio ε / d can be increased, thereby suitably achieving both suppression of deflection and weight reduction. Furthermore, the supporting glass substrate 10 may contain, as an additive material, at least one selected from the group consisting of MgO, CaO, and Y2O3, in addition to at least one selected from the group consisting of ZrO2, TiO2, Li2O, and ZnO.
[0036] Furthermore, it is preferable that the support glass substrate 10 has an SiO2 content of 40% to 60%, an Al2O3 content of 20% to 30%, and an MgO content of 20% to 30%, expressed in mole percent based on oxides. In this case, it is preferable that the support glass substrate 10 does not contain any substances other than SiO2, Al2O3, and MgO, excluding unavoidable impurities.
[0037] The preferred composition of the support glass substrate 10 will be described in more detail. It is preferable that the parameters of the support glass substrate 10, such as the ratio ε / d, structure factor M, and molecular volume Vm, fall within the ranges specified above, but the composition is not particularly limited. That is, various support glass substrates can be manufactured with arbitrary compositions, and the parameters such as the ratio ε / d, structure factor M, and molecular volume Vm can be measured and calculated for the manufactured support glass substrates. The substrate whose calculated parameters fall within the ranges specified above can then be adopted as the support glass substrate 10.
[0038] The support glass substrate 10 preferably has an SiO2 content of 20% to 66% in molar percentage based on oxides, an Al2O3 content of 6% to 30%, and an MgO content of 25% to 30%. Alternatively, the support glass substrate 10 preferably has an SiO2 content of 20% to 66% in molar percentage based on oxides, an Al2O3 content of 6% to 30%, and a total MgO and CaO content of 19% to 46%. Alternatively, the support glass substrate 10 preferably has an SiO2 content of 20% to 66% in molar percentage based on oxides, an Al2O3 content of 6% to 30%, and a total B2O3 and Y2O3 content of 5.8% to 50%, and more preferably a total B2O3 and Y2O3 content of 25% to 50%.
[0039] (1st composition) An example of a preferred composition of the support glass substrate 10 is referred to as the first composition. The support glass substrate 10 of the first composition preferably has an SiO2 content of 48% to 52%, an Al2O3 content of 20% to 25%, and an MgO content of 25% to 30%, and preferably contains no substances other than SiO2, Al2O3, and MgO, excluding unavoidable impurities.
[0040] (Second composition) A second composition is an example of a preferred composition of the support glass substrate 10. The support glass substrate 10 of the second composition preferably has an SiO2 content of 43% to 58%, an Al2O3 content of 12% to 17%, an MgO content of 14% to 27%, and a CaO content of 7% to 32%, and preferably does not contain any substances other than SiO2, Al2O3, MgO, and CaO, excluding unavoidable impurities.
[0041] (Third composition) A third composition is an example of a preferred composition of the support glass substrate 10. The support glass substrate 10 of the third composition preferably has an SiO2 content of 64% to 68%, an Al2O3 content of 10% to 14%, an MgO content of 9% to 13%, a CaO content of 6% to 10%, and a B2O3 content of 1% to 5%, and preferably does not contain any substances other than SiO2, Al2O3, MgO, CaO, and B2O3, excluding unavoidable impurities.
[0042] (4th composition) A preferred composition of the support glass substrate 10 is referred to as the fourth composition. The support glass substrate 10 of the fourth composition preferably has an SiO2 content of 55.7% to 59.7%, an Al2O3 content of 15% to 19%, an MgO content of 13% to 17%, a CaO content of 7% to 11%, and a SrO content of 0.1% to 1%, and preferably contains no substances other than SiO2, Al2O3, MgO, CaO, and SrO, excluding unavoidable impurities.
[0043] (5th composition) A fifth composition is an example of a preferred composition of the support glass substrate 10. The fifth composition of the support glass substrate 10 preferably has an SiO2 content of 58% to 59%, an Al2O3 content of 13% to 14%, an MgO content of 17% to 19%, a CaO content of 7% to 8%, and a TiO2 content of 2% to 4%, and preferably does not contain any substances other than SiO2, Al2O3, MgO, CaO, and TiO2, excluding unavoidable impurities.
[0044] (6th composition) A sixth composition is an example of a preferred composition of the support glass substrate 10. The sixth composition of the support glass substrate 10 preferably has an SiO2 content of 58% to 62%, an Al2O3 content of 11% to 15%, an MgO content of 15% to 19%, a CaO content of 6% to 10%, and a ZrO2 content of 0.5% to 2%, and preferably does not contain any substances other than SiO2, Al2O3, MgO, CaO, and ZrO2, excluding unavoidable impurities.
[0045] (7th composition) A preferred composition of the support glass substrate 10 is given as composition 7. The support glass substrate 10 of composition 7 preferably has an SiO2 content of 48% to 50%, an Al2O3 content of 6% to 10%, an MgO content of 12% to 16%, a CaO content of 7% to 11%, a Y2O3 content of 0.8% to 4.8%, a TiO2 content of 0% to 4%, a ZrO2 content of 0% to 3%, a LiO2 content of 2% to 6%, and a ZnO content within a numerical range of 4% to 8%, and preferably does not contain any substances other than SiO2, Al2O3, MgO, CaO, Y2O3, TiO2, ZrO2, LiO2, and ZnO, excluding unavoidable impurities.
[0046] (8th composition) An example of a preferred composition of the support glass substrate 10 is the eighth composition. The support glass substrate 10 of the eighth composition preferably has an SiO2 content of 20% to 50%, an Al2O3 content of 20% to 30%, a B2O3 content of 5% to 30%, and a Y2O3 content of 19% to 20%, and preferably does not contain any substances other than SiO2, Al2O3, B2O3, and Y2O3, excluding unavoidable impurities.
[0047] (9th composition) A preferred composition of the support glass substrate 10 is given as composition 9. The support glass substrate 10 of composition 9 preferably has an SiO2 content of 38% to 42%, an Al2O3 content of 18% to 22%, a B2O3 content of 16% to 20%, a Y2O3 content of 18% to 22%, and a P2O5 content of 0% to 4%, and preferably does not contain any substances other than SiO2, Al2O3, B2O3, Y2O3, and P2O5, excluding unavoidable impurities.
[0048] (10th composition) A preferred composition of the support glass substrate 10 is referred to as the 10th composition. The support glass substrate 10 of the 10th composition preferably has an SiO2 content of 38% to 42%, an Al2O3 content of 13% to 15%, a B2O3 content of 18% to 22%, a Y2O3 content of 18% to 22%, and a Ga2O5 content of 3% to 7%, and preferably does not contain any substances other than SiO2, Al2O3, B2O3, Y2O3, and Ga2O5, excluding unavoidable impurities.
[0049] The support glass substrate 10 does not contain a sintered body. In other words, the support glass substrate 10 is glass that is not a sintered body. Here, a sintered body refers to a material formed by heating multiple particles at a temperature below their melting point to bond them together. Sintered bodies contain voids, so their porosity is somewhat high, but the support glass substrate 10 is not a sintered body, so its porosity is low, usually 0%. However, it is permissible for it to contain an unavoidable small amount of voids. The porosity here refers to the so-called true porosity, which is the value obtained by dividing the sum of the volumes of voids that communicate with the outside and voids that do not communicate with the outside by the total volume (apparent volume). Porosity can be measured, for example, according to JIS R 1634.
[0050] Furthermore, the glass used in the support glass substrate 10 is usually amorphous glass, i.e., an amorphous solid. This glass may also be crystallized glass containing crystals on the surface or inside, but amorphous glass is preferred from the viewpoint of density. Sintered bodies (ceramics) cannot be used because they have low transmittance and high density.
[0051] Next, the shape of the support glass substrate 10 will be described. As shown in Figure 1, the support glass substrate 10 is a plate-shaped glass substrate that includes a first surface 12, which is one surface, a second surface 14, which is the other surface, and a side surface 16. The second surface 14 is the surface opposite to the first surface 12, and is, for example, parallel to the first surface 12. The side surface 16 is the side surface of the support glass substrate 10, and can also be said to be the end surface that connects the first surface 12 and the second surface 14. The support glass substrate 10 is a circular disc shape when viewed in plan, that is, when viewed from a direction perpendicular to the first surface 12. However, the support glass substrate 10 is not limited to a disc shape and may be any shape, such as a polygonal plate like a rectangle.
[0052] Furthermore, the thickness D2 of the support glass substrate 10, that is, the length between the first surface 12 and the second surface 14, is preferably 0.1 mm to 2.0 mm, and more preferably 0.1 mm to 0.5 mm. By setting the thickness D2 to 0.1 mm or more, it is possible to prevent the support glass substrate 10 from becoming too thin, thereby suppressing damage due to bending and impact. By setting the thickness D2 to 2.0 mm or less, it is possible to suppress the weight, and by setting the thickness D2 to 0.5 mm or less, it is possible to further preferably suppress the weight.
[0053] The method for manufacturing the support glass substrate 10 is not particularly limited and is arbitrary. For example, the support glass substrate 10 may be manufactured by putting various raw materials, such as silica sand and soda ash, which are raw materials for the compounds contained in the support glass substrate 10, into a continuous melting furnace, heating and melting them at 1500°C to 1600°C, clarifying them, supplying them to a molding device, molding the supplied molten glass into a plate shape, and slowly cooling it. Various methods can be used to manufacture the support glass substrate 10, such as the molten casting method, the down-draw method (e.g., the overflow down-draw method, the slot-down method, and the redraw method), the float method, the roll-out method, and the press method.
[0054] Next, an example of the manufacturing process when the support glass substrate 10 is used in FOWLP manufacturing will be described. In FOWLP manufacturing, multiple semiconductor chips are bonded onto the support glass substrate 10, and the semiconductor chips are covered with a encapsulating material to form an element substrate. Then, the support glass substrate 10 and the element substrate are separated, and the side of the element substrate opposite to the semiconductor chips is bonded to, for example, another support glass substrate 10. Then, wiring and solder bumps are formed on the semiconductor chips, and the element substrate and the support glass substrate 10 are separated again. Finally, the element substrate is cut into individual pieces according to the semiconductor chips to obtain semiconductor devices.
[0055] As described above, the support glass substrate 10 according to this embodiment has a ratio ε / d of 32.0 (GPa·cm) 3 The ratio ε / d is greater than or equal to ( / g) and greater than the calculated ratio α. The ratio ε / d is the ratio of the Young's modulus ε of the support glass substrate 10 to the density d. The calculated ratio α is the ratio of the Young's modulus to the density calculated from the composition of the support glass substrate 10, and is expressed by the above equation (2).
[0056] Glass substrates are sometimes required to achieve both reduced deflection and reduced weight. However, normally, reducing deflection requires increasing the thickness, while reducing weight requires decreasing the thickness, making it difficult to achieve both simultaneously. In contrast, the support glass substrate 10 according to this embodiment has a ratio ε / d of 32.0 (GPa·cm) 3 By making the Young's modulus greater than or equal to 1 / g, even if the supporting glass substrate 10 is made thinner to reduce weight, the high Young's modulus makes it possible to suppress deflection, thus achieving both deflection suppression and weight reduction. Furthermore, the support glass substrate 10 has a ratio ε / d that is greater than the ratio calculated α based on its composition. In other words, the Young's modulus per unit density is greater than the value expected based on its composition. Therefore, the support glass substrate 10 can achieve both deflection suppression and weight reduction to a greater extent than expected.
[0057] Furthermore, the supporting glass substrate 10 has a ratio ε / d of 37.0 (GPa·cm). 3 The packing density Vt is 13.8 (cm³) or higher, the structure factor M is 1.1 or higher, and the packing density Vt is 13.8 (cm³). 3 It is preferable that the amount is less than ( / mol). A support glass substrate 10 that satisfies these conditions can achieve both deflection suppression and weight reduction to a greater extent than expected.
[0058] Furthermore, the support glass substrate 10 has a ratio calculation value α of 31.6 (GPa·cm). 3 The amount is 13.8 (cm³) or more, and the packing density Vt is 13.8 (cm³). 3 It is preferable that the ratio calculation value α and the packing density Vt are within this range, deflection suppression and weight reduction can be achieved to a greater extent than expected.
[0059] Furthermore, the supporting glass substrate 10 has a ratio ε / d > calculated ratio α + 2.0 (GPa·cm) 3 It is preferable that the relationship ε / d > calculated ratio α + 4.0 (GPa·cm) is satisfied, and the ratio ε / d > calculated ratio α + 4.0 (GPa·cm) 3 It is more preferable to satisfy the ( / g) condition. By satisfying these relationships, deflection suppression and weight reduction can be more effectively achieved.
[0060] Furthermore, the supporting glass substrate 10 has a ratio ε / d of 37.0 (GPa·cm). 3 It is preferable that the ratio ε / d be 40.0 (GPa·cm) or higher, and the ratio ε / d is 40.0 (GPa·cm). 3 It is more preferable that the ratio ε / d is greater than or equal to this value. When the ratio ε / d is this value, both deflection suppression and weight reduction can be more effectively achieved.
[0061] Furthermore, it is preferable that the total content of one or more components selected from the group consisting of MgO, CaO, and Y2O3 in the support glass substrate 10 is in the range of 15% to 50% in mol% relative to the total amount of the support glass substrate 10. By including such materials in such amounts, the Young's modulus ε of the support glass substrate 10 can be made higher than expected, thereby more favorably achieving suppression of deflection and weight reduction.
[0062] Furthermore, it is preferable that the total content of SiO2 and Al2O3 in the support glass substrate 10 is in the range of 50% to 85% in mole percent relative to the total amount of the support glass substrate 10. By having such a composition, the Young's modulus ε of the support glass substrate 10 can be made higher than expected, thereby more favorably achieving both suppression of deflection and weight reduction.
[0063] Furthermore, the support glass substrate 10 preferably has a thickness D2 in the range of 0.1 mm to 0.5 mm. By setting the thickness D2 within this range, it is possible to reduce weight while suppressing damage due to bending and impact.
[0064] Furthermore, the support glass substrate 10 is not a sintered glass. Because the support glass substrate 10 is not a sintered glass, it can be made lighter by suppressing excessive density, and light transmission can be ensured because light is not scattered by pores like those found in sintered glass.
[0065] Furthermore, the support glass substrate 10 is preferably amorphous glass. Because the support glass substrate 10 is amorphous glass, it can be made lighter by suppressing excessive density.
[0066] The support glass substrate 10 is preferably a support glass substrate for manufacturing FOWLP, or in other words, a support glass substrate for manufacturing at least one of a fan-out wafer-level package and a fan-out panel-level package. By using this support glass substrate 10 in at least one of the manufacturing of a fan-out wafer-level package and a fan-out panel-level package, semiconductor packages can be manufactured effectively.
[0067] (Examples) Next, examples will be described. Note that the embodiments may be modified as long as the effects of the invention are achieved. In the examples and comparative examples, support glass substrates with different compositions were prepared. For each support glass substrate, the ratio value α was calculated, and the Young's modulus ε and density d were measured to calculate the ratio ε / d. In addition, the deflection amount and mass of each support glass substrate were measured, and evaluations were performed based on the deflection amount and mass. A more detailed explanation follows below.
[0068] Table 1 shows the materials used for the support glass substrates in the examples and comparative examples. Table 1 shows the content of the materials used to prepare the support glass substrates in molar percentages based on oxides for Examples 1 to 17 and Comparative Examples 1 to 11. Table 2 shows the content of the materials used to prepare the support glass substrates in Examples 18 to 26, also based on oxides and expressed in molar percentages. In the examples and comparative examples, a blank plate with a diameter of 320 mm and a thickness of 6 mm was manufactured using the molten casting method with the compositions described in Tables 1 and 2, respectively. Next, several plates with a diameter of 300 mm and a thickness of 3 mm were cut from the center of the blank plate. Both sides of these plates were polished using cerium oxide as an abrasive, and the thicknesses were adjusted to 0.4 mm, 0.7 mm, 1.3 mm, and 2.0 mm respectively to prepare support glass substrates. The support glass substrates fabricated in this manner were used as samples for evaluation.
[0069] [Table 1] [Table 2]
[0070] In the examples and comparative examples, the ratio α was calculated for each of the support glass substrates prepared as samples, based on the material composition shown in Table 1. Then, for each of the support glass substrates prepared as samples, the Young's modulus ε was measured using an OLYMPUS 38DL PLUS, and the density d was measured by the Archimedes method. Based on the measured Young's modulus ε and density d, the ratio ε / d was calculated.
[0071] Figure 3 is a schematic diagram showing the method of measuring deflection in the examples and comparative examples. In the examples and comparative examples, the deflection due to its own weight was measured for each of the support glass substrates prepared as samples. Specifically, as shown in Figure 3, the amount of deflection at the central part of the first surface 12 (indicated by the arrow in Figure 3) when the second surface 14 of the support glass substrate used as a sample was supported at three points by the support part B was measured using a Dyvoce manufactured by Kozu Seiki. The diameter of the support part B was 1.6 mm, and the support part B was positioned so that its center overlapped with a point 5.0 mm radially inward from the outer edge of the support glass substrate. The mass of each of the support glass substrates prepared as samples was also measured.
[0072] Table 3 shows the evaluation results for the examples and comparative examples. Figure 4 is a graph showing the characteristics of the support glass substrates for the examples and comparative examples. Table 3 shows the ratio calculation value α, Young's modulus ε, density d, ratio ε / d, deflection amount for each thickness D2, mass of a sample with a thickness of 2.0 mm, the deflection and mass judgment results, and the overall judgment results for each sample support glass substrate. As shown in Table 3, in Examples 1 to 17, the ratio ε / d was 32.0 (GPa·cm). 3 The ratio ε / d is greater than or equal to the calculated ratio α. On the other hand, in Comparative Examples 1 to 11, the ratio ε / d is 32.0 (GPa·cm). 3 At least one of the following conditions is not met: the condition that the ratio is greater than or equal to / g, and the condition that the ratio ε / d is greater than the calculated ratio α. Figure 4 is a graph plotting the relationship between the ratio ε / d and the calculated ratio α for the sample support glass substrates. In Figure 4, the black circles represent the support glass substrates of Examples 1 to 17, and the crosses represent the support glass substrates of Comparative Examples 1 to 11. In Figure 4, the support glass substrates of Examples 1 to 17 also have a ratio ε / d of 32.0 (GPa·cm). 3 The ratio ε / d is greater than or equal to / g, and the ratio ε / d is greater than the calculated ratio α, indicating that the supporting glass substrates of Comparative Examples 1 to 11 do not satisfy at least one of these conditions. As shown in Figure 4, in this embodiment, the ratio ε / d deviates from the calculated ratio α, but in the comparative examples, the ratio ε / d of the samples with particularly high ratios does not deviate from the calculated ratio α.
[0073] [Table 3]
[0074] Furthermore, in determining the amount of deflection in Table 3, A double circle indicates that the deflection is less than 0.8 mm. A deflection of 0.8 mm or more but less than 0.9 mm is considered a circle. A triangle is defined as a case where the deflection is 0.9 mm or more and less than 1.0 mm. A deflection of 1.0 mm or more was marked as incorrect. Double circles, circles, and triangles were judged as passing grades. Furthermore, in determining the mass in Table 3, If the mass is less than 400g, it will be marked with a double circle. A value of 400g or more but less than 430g is considered correct. If the mass is between 430g and 500g, it will be considered a triangle. If the mass was 500g or more, it was marked as incorrect. Double circles, circles, and triangles were judged as passing grades. Furthermore, if both the amount of deflection and the mass are double circles, the overall judgment will be a double circle. If both the deflection and mass are equal to or greater than a circle, and at least one of them is a circle, the overall judgment will be a circle. If both the deflection and mass are triangular or greater, and at least one side is triangular, the overall determination is triangular. If at least one of the deflection amount or mass was incorrect, the overall judgment was incorrect. In the overall evaluation, double circles, circles, and triangles were all considered passing grades.
[0075] As shown in Table 3, the support glass substrates in Examples 1 to 17 passed the evaluation of both deflection and mass. On the other hand, the support glass substrates in Comparative Examples 1 to 11 failed the evaluation of at least one of the deflection and mass. Specifically, the ratio ε / d was 32.0 (GPa·cm). 3 In this embodiment, the supporting glass substrate, which is greater than or equal to / g and whose ratio ε / d is greater than the calculated ratio α, can achieve both suppression of deflection and weight reduction.
[0076] Table 4 shows the calculated ratio α and the measurement results of the ratio ε / d for Examples 18 to 27. As shown in Table 4, the ratio ε / d was 32.0 (GPa·cm) in Examples 18 to 27 as well. 3 The result is greater than or equal to / g, and the ratio ε / d is greater than the calculated ratio value α.
[0077] [Table 4]
[0078] Table 5 shows the ratio ε / d, structure factor M, molecular volume Vm, ratio calculated value α, and packing density Vt for the supporting glass substrates of the examples and comparative examples. As shown in Table 5, in Examples 1, 3-4, 6-9, and 20-26, the ratio ε / d is 37.0 (GPa·cm). 3 The result is greater than the calculated ratio value α, indicating that the structure factor M is 1.1 or greater and the molecular volume Vm is less than 24.1. Furthermore, as shown in Table 5, in Examples 2, 4, 6-9, and 20-27, the calculated ratio value α is 31.6 (GPa·cm). 3 The amount is 13.8 (cm³) or more, and the packing density Vt is 13.8 (cm³). 3It can be seen that it is less than ( / mol).
[0079] [Table 5]
[0080] Although embodiments of the present invention have been described above, the embodiments are not limited to those described herein. Furthermore, the aforementioned components include those that can be easily conceived by those skilled in the art, those that are substantially the same, and those that fall within the so-called equivalent range. Moreover, the aforementioned components can be combined as appropriate. Furthermore, various omissions, substitutions, or modifications of the components can be made without departing from the spirit of the embodiments described above. [Explanation of Symbols]
[0081] 10 Support glass substrate d density Calculated value of α ratio ε Young's modulus ε / d ratio
Claims
1. Expressed in mole percent based on oxides, SiO 2 and Al 2 O 3 The total content thereof is in the range of 60% to 75%, and Y 2 O 3 The content thereof is 2.8% to 20%, and B 2 O 3 and Y 2 O 3 The total content thereof is 25% to 50%, or SiO 2 and Al 2 O 3 The total content is in the range of 50% to 85%, and SiO 2 The content is 20% to 66%, Al 2 O 3 The content is 6% to 30%, Y 2 O 3 The content of is 2.8% to 20%, and B 2 O 3 and Y 2 O 3 The total content of is 25% to 50%, or SiO 2 The content is 36% to 50%, Al 2 O 3 The content is 20% to 25%, B 2 O 3 The content is 5% to 20%, Y 2 O 3 The content is 19% to 20%, and excluding unavoidable impurities, SiO 2 Al 2 O 3 , B 2 O 3 , and Y 2 O 3 It does not include anything other than, or SiO 2 The content is 38% to 42%, and Al 2 O 3 The content is 18% to 22%, B 2 O 3 The content is 16% to 20%, Y 2 O 3 The content is 18% to 22%, P 2 O 5 The content is 0% to 4%, and excluding unavoidable impurities, SiO 2 Al 2 O 3 , B 2 O 3 , Y 2 O 3 , and P 2 O 5 It does not include anything other than, or SiO 2 The content is 42%, and Al 2 O 3 The content is 13% to 15%, B 2 O 3 The content is 18% to 22%, Y 2 O 3 The content is 18% to 22%, and Ga 2 O 5 The content is 3% to 7%, and excluding unavoidable impurities, SiO 2 Al 2 O 3 , B 2 O 3 , Y 2 O 3 , and Ga 2 O 5 Includes everything else, Support glass substrate.
2. Ratio ε / d (GPa・cm) 3 / g) > Ratio calculation value α (GPa・cm) 3 ( / g) + 2.0 (GPa・cm) 3 A support glass substrate according to claim 1 that satisfies the relationship ( / g). Note that the ratio ε / d (GPa・cm) 3 The Young's modulus ε (GPa) is the density d (g / cm³). 3 This is the ratio to ), and the ratio calculation value α (GPa・cm) 3 The density (g / cm³) of Young's modulus (GPa) calculated from the composition is the density (g / cm³). 3 This is the ratio to ) and is expressed by the following formula. α=2・Σ{(V) i ・G i ) / M i )・X i } Here, V i G is the packing parameter of the metal oxide contained in the support glass substrate. i M is the dissociation energy of the metal oxide contained in the supporting glass substrate. i X is the molecular weight of the metal oxide contained in the support glass substrate. i This is the molar ratio of the metal oxide contained in the support glass substrate.
3. Ratio ε / d (GPa・cm) 3 / g) > Ratio calculation value α (GPa・cm) 3 ( / g) + 4.0 (GPa・cm) 3 A support glass substrate according to claim 2 that satisfies the relationship ( / g).
4. The ratio ε / d (GPa·cm 3 / g) is 32.0 (GPa·cm 3 / g) or more, and the support glass substrate according to any one of claims 1 to 3. Note that the ratio ε / d (GPa・cm) 3 The Young's modulus ε (GPa) is the density d (g / cm³). 3 This is the ratio to ).
5. Expressed in mole percent based on oxides, SiO 2 and Al 2 O 3 The total content thereof is 60% to 75%, and the content of Y 2 O 3 is 2.8% to 20%, and the total content of B 2 O 3 and Y 2 O 3 is 25% to 50%, or SiO 2 and Al 2 O 3 The total content of is in the range of 50% to 85%, and the SiO₂ content is 20% to 66%, Al 2 O 3 The content is 6% to 30%, Y 2 O 3 The content of is 2.8% to 20%, and B 2 O 3 and Y 2 O 3 The total content of is 25% to 50%, or SiO 2 The content is 20% to 50%, Al 2 O 3 The content is 20% to 30%, B 2 O 3 The content is 5% to 30%, Y 2 O 3 The content is 19% to 20%, and excluding unavoidable impurities, SiO 2 Al 2 O 3 , B 2 O 3 , and Y 2 O 3 It does not include anything other than, or SiO 2 The content is 38% to 42%, and Al 2 O 3 The content is 18% to 22%, B 2 O 3 The content is 16% to 20%, Y 2 O 3 The content is 18% to 22%, P 2 O 5 The content is 0% to 4%, and excluding unavoidable impurities, SiO 2 Al 2 O 3 , B 2 O 3 , Y 2 O 3 , and P 2 O 5 It does not include anything other than, or SiO 2 The content is 38% to 42%, and Al 2 O 3 The content is 13% to 15%, B 2 O 3 The content is 18% to 22%, Y 2 O 3 The content is 18% to 22%, and Ga 2 O 5 The content is 3% to 7%, and excluding unavoidable impurities, SiO 2 Al 2 O 3 , B 2 O 3 , Y 2 O 3 , and Ga 2 O 5 Includes everything else, Support glass substrate.
6. SiO 2 and Al 2 O 3 The total content of is in the range of 50% to 85%, Y 2 O 3 The content is 2.8% to 20%, and B 2 O 3 A support glass substrate according to claim 1 or claim 5, wherein the content of is in the range of 5% to 18%.
7. MgO, CaO, and Y 2 O 3 The support glass substrate according to claim 1 or claim 5, wherein the total content of one or more components selected from the group consisting of the above is in the range of 15% to 50% in mol% relative to the total amount of the support glass substrate.
8. A support glass substrate according to claim 1 or claim 5, wherein the thickness is in the range of 0.1 mm to 0.5 mm.
9. A support glass substrate according to claim 1 or claim 5, wherein the support glass substrate is amorphous glass.
10. A support glass substrate according to claim 1 or 5, which is a support glass substrate for manufacturing at least one of a fan-out wafer-level package and a fan-out panel-level package.