A purge flow distribution system for a substrate container, and a method for implementing the purge flow distribution system.

Abstract

To provide a purge gas distribution system for distributing purge gas to the interior of a substrate container, and a method for implementing the purge gas distribution system.SOLUTION: A substrate container has a purge flow distribution system 340. The purge flow distribution system is connected to an inlet port 305 to receive a stream of purge gas, and includes a network of separate gas distributing devices 350 for distributing the stream of purge gas into an interior space, and a supply line 360 connected to the inlet port and configured to divide the supply of the purge gas to the network of separate gas distributing devices. A method of purging an open substrate container includes supplying a stream of purge gas to an inlet port of a purge flow distribution system, and dividing the purge gas to supply a network of individual gas distributing devices to distribute the stream of purge gas into an interior space.SELECTED DRAWING: Figure 3A

Description

Technical Field

[0001] This disclosure claims priority to U.S. Provisional Patent Application No. 63 / 272,282, filed Oct. 27, 2021. This priority document is incorporated herein by reference.

[0002] This disclosure generally relates to a substrate container having a front opening for processing semiconductor devices. More particularly, this disclosure relates to a purge gas distribution system for distributing a purge gas into the interior of a substrate container, and a method for implementing the purge gas distribution system.

Background Art

[0003] A substrate in the form of a wafer can be processed to form semiconductor devices. A wafer substrate, or simply a substrate, is subjected to a series of processing steps. Exemplary processing steps can include, but are not limited to, deposition of material layers of the substrate material, doping, etching, or chemical or physical reactions. A substrate container is used to store and transport the wafer being processed between processing steps within a manufacturing facility. During some processing steps, the substrate is processed by processing equipment within a clean environment (e.g., a clean room). During processing, for example during a purge process, gas must be introduced into and removed from a substrate container such as a front opening unified pod (FOUP), and thus the FOUP must have one or more locations where gas can be introduced into or discharged from the FOUP. The substrate can be transferred from the substrate container to a processing tool via an equipment front end module (EFEM). The EFEM typically includes a load port for receiving the substrate container, a transfer unit, a frame or “mini environment,” and a fan filter unit used to generate a gas flow within the EFEM.

[0004] During use, the substrate container is docked on the load port and the EFEM door is opened. The door is then disengaged from the substrate container, thereby allowing the transfer unit housed within the EFEM to access the substrate contained within the container for processing. The gas flow introduced by the fan filter unit flows through the EFEM, from the top of the EFEM towards the bottom of the EFEM. When the front opening of the substrate container interfaces with the load port opening of the EFEM, some of the gas flowing through the EFEM and across the load port opening may be inadvertently directed into the interior of the container, potentially causing a temporary increase in relative humidity and / or oxygen levels in the microenvironment of the substrate container, which could interfere with the purging capability of the substrate container and is undesirable. [Overview of the Initiative]

[0005] This disclosure relates to a system for distributing purge gas for wafer or reticle transport containers, such as FOUPs (or pods, e.g., reticle pods), used, for example, in semiconductor manufacturing. More specifically, this disclosure relates to a purge flow distribution system within a FOUP (or reticle pod) for distributing a flow of purge gas into the internal space of a substrate container by splitting a flow of purge gas from a common input port into a plurality of discrete input purge ports to supply to a network of individual gas distribution devices.

[0006] In at least one exemplary embodiment, the substrate container defines the internal space. shell Includes, shell This includes a front opening, a first side wall, a second side wall, a rear wall, and shellThe substrate container also includes a bottom wall with a front edge extending between a first side wall and a second side wall along the front opening. The substrate container also includes a purge flow distribution system configured to receive a flow of purge gas, the purge flow distribution system including an inlet configured to receive a flow of purge gas and a network of individual gas distribution devices configured to distribute the flow of purge gas into the internal space. The purge flow distribution system further includes a supply line connected to the inlet, which is configured to divide the flow of purge gas into the network of individual gas distribution devices. According to at least one exemplary embodiment, the supply line includes a first flow path to one gas distribution device from the network of individual gas distribution devices and a second flow path to another gas distribution device from the network of individual gas distribution devices. In the embodiment, one gas distribution device in the network of gas distribution devices is a first gas distribution device located closer to the rear wall, another gas distribution device in the network of gas distribution devices is a second gas distribution device, which may be located closer to the front opening, and the first channel is configured to supply a portion of the purge gas flow to the first gas distribution device, and the second channel is configured to supply another portion of the purge gas flow to the second gas distribution device. The second gas distribution device may also be located elsewhere inside the substrate container, for example, at the rear or adjacent to another gas distribution device, and it is recognized that the embodiment is not limited to the above embodiment. According to at least one other exemplary embodiment, the purge flow distribution system further includes a manifold base located in the bottom wall that receives the purge gas flow from the inlet and distributes the purge gas flow to a network of gas distribution devices, the manifold base may be configured to divide the second channel into at least a left-side second channel and a right-side second channel to supply a portion of the purge gas flow to the second gas distribution device.

[0007] In at least one exemplary embodiment, Open stateA method for purging a substrate container having a front opening includes supplying a flow of purge gas to an inlet of a purge flow distribution system located at least partially within the substrate container via an inlet port located in the wall of the substrate container, and dividing the purge gas via supply lines of the purge flow distribution system to supply the flow of purge gas to a network of individual gas distribution devices for distributing the flow of purge gas into the internal space of the substrate container, wherein the supply lines comprise at least a first flow path to one gas distribution device of the network of gas distribution devices and at least a second flow path to another gas distribution device of the network of individual gas distribution devices. In embodiments, the method further includes setting a first portion of the flow of purge gas to a first gas distribution device via the first flow path, and setting a second portion of the flow of purge gas to a second gas distribution device via the second flow path.

[0008] Both the substrate container and the method for purging the substrate container have been described, and other features, embodiments, and advantages will be better understood by the following drawings. [Brief explanation of the drawing]

[0009] [Figure 1] This is a front perspective view of a substrate container according to at least one exemplary embodiment. [Figure 2] This is an exploded view of a substrate container according to at least one exemplary embodiment. [Figure 3A] This is a schematic diagram of a substrate container having a purge flow distribution system configured to divide the supply of purge gas according to different embodiments. [Figure 3B] This is a schematic diagram of a substrate container having a purge flow distribution system configured to divide the supply of purge gas according to different embodiments. [Figure 3C] This is a schematic diagram of a substrate container having a purge flow distribution system configured to divide the supply of purge gas according to different embodiments. [Figure 4A]This is a rear perspective view of a substrate container having a purge flow distribution system configured to divide the supply of purge gas, according to at least one exemplary embodiment. [Figure 4B] This is a top-side cross-sectional view of the substrate container of Figure 4A, according to at least one exemplary embodiment. [Figure 5A] This is a rear perspective view of a substrate container having a purge flow distribution system configured to divide the supply of purge gas using a manifold base, according to at least one exemplary embodiment. [Figure 5B] Figure 5A is a schematic diagram of a manifold base configured to split the supply of purge gas according to a different embodiment. [Figure 5C] This is a bottom side view of the substrate container of Figure 5A, according to at least one exemplary embodiment. [Figure 6] This is a flowchart for a method of purging a substrate vessel, comprising dividing the supply of purge gas to a network of individual gas distribution devices, according to at least one exemplary embodiment. [Modes for carrying out the invention]

[0010] While there is room for various modifications and alternative forms of this disclosure, details of this disclosure are illustrated and described in detail in the drawings as an example. However, it should be understood that the intent of this disclosure is not to limit the aspects of this disclosure to the specific illustrative embodiments described. Rather, the intent of this disclosure is to encompass all modifications, equivalents, and alternatives that fall within the spirit and scope of this disclosure.

[0011] As used herein, the term “network of gas distribution devices” means a network comprising a plurality of separate and distinct gas distribution devices connected together by at least one supply line. The term “gas distribution device” means a device which comprises at least one gas distribution surface and is a combination of any plurality of gas distribution surfaces provided at a specific defined location in a substrate vessel; for example, a forward gas distribution device includes all gas distribution surfaces provided at the front of the substrate vessel. The term “gas distribution surface” means a structural part of a gas distribution device that distributes a portion of the purge gas from the gas distribution device into the internal space, and a gas distribution device may include a plurality of gas distribution surfaces. The term “supply line” means a pipe, piping, or water supply and drainage system connected to an inlet port used to receive the purge gas and to divide and supply the purge gas to the input purge ports for the gas distribution devices and / or gas distribution surfaces. That is, a supply line can be used to supply purge gas for a gas distribution device / gas distribution surface to a single input purge port, or a supply line can be used to supply purge gas for a gas distribution device / gas distribution surface along a plurality of input purge ports. The term "pipe" or "pipe piping" refers to a structure used to distribute the flow of purge gas through a network of gas distribution devices, and includes pipes, pipe piping, conduits, passages, connectors, valves, controllers and similar structures that can be used to set / regulate the flow of gas through a network of gas distribution devices.

[0012] Similarly, as used herein, the terms “front” and “rear,” as well as “right” and “left,” are used to describe various elements, but these elements are not limited by these terms. Rather, these terms are used simply to distinguish one element from another. Alternatively, these terms can be interpreted broadly to include any positional relationship between elements, including front, rear, side, top, bottom, or any combination thereof, without departing from the scope of this disclosure.

[0013] As used herein and in the appended claims, the singular forms “a,” “an,” and “the” include plural references unless the content explicitly indicates otherwise. As used herein and in the appended claims, the term “or” is generally used in its sense to include “and / or” unless the content explicitly indicates otherwise.

[0014] The following detailed description should be read in reference to the drawings, where similar elements in different drawings are numbered the same. The detailed description and drawings, which are not necessarily to scale, illustrate illustrative embodiments and are not intended to limit the scope of the invention. The illustrated embodiments described are intended to be illustrative only. Selected features of any illustrative embodiment may be incorporated into additional embodiments unless explicitly stated otherwise.

[0015] The present disclosure generally relates to a purge flow distribution system for a substrate container having a front opening for accessing an internal space of the substrate container. More particularly, the present disclosure relates to a purge flow distribution system configured to distribute a flow of purge gas into an internal space of a substrate container by splitting a flow of purge gas from a common source into a plurality of discrete input purge ports for supplying a network of individual gas distribution devices. In some embodiments, the purge flow distribution system can be configured to prevent ingress of gas into the front opening of the substrate container while it is open, or can be configured as an outlet for facilitating exhaust of purge gas from the substrate container when the substrate container is closed.

[0016] A substrate in the form of a wafer can be processed to form semiconductor devices. A substrate container is a container for carrying the substrate during processing. The substrate can be stored within the substrate container before and between different processing steps. The substrate container is accessed through a front opening of the substrate container. The substrate container can be, for example, a front opening unified pod (FOUP). In an embodiment, the substrate container can be a container for a reticle, such as a reticle pod. In such an embodiment, the container body can include at least a portion of an outer pod configured to enclose an inner pod, and a purge flow distribution system including a flow distribution system base is configured to provide purge gas into an internal space of the outer pod.

[0017] FIGS. 1-2 illustrate a substrate container 1 according to an embodiment of the present disclosure. FIG. 1 is a front perspective view of the substrate container 1, while FIG. 2 illustrates the substrate container with the door removed (e.g., the door is open). As shown in FIG. 1, the substrate container 1 includes a front door 4 and shell 6. The front door 4 is shell received within the front opening 12 of

[0018] 6 and blocks the front opening 12. shell6 defines the internal space 8 of the substrate container, and the substrate is stored in the internal space 8 of the substrate container 1. The substrate container 1 can be accessed by moving (e.g., opening, removing) the door 4. For example, the door 4 in FIG. 1 is shell inserted into 6 by shell received in 6. In an embodiment, one or more of the door 4 and shell 6 can include a locking mechanism (not shown) to prevent accidental removal of the door 4.

[0019] As further shown in FIG. 2, shell 6 includes a first side wall 14, a second side wall 16, a rear wall 18, a top wall 20, and a bottom wall 22. The first side wall 14 is on the opposite side of the second side wall 16, and the top wall 20 is on the opposite side of the bottom wall 22. The first side wall 14 can be called the left side, while the second side wall 16 can be called the right side. The top wall 20 and the bottom wall 22 extend between the first side wall 14 and the second side wall 16, respectively. shell 6 includes a front edge that extends between the opposing walls. The bottom wall 22 includes a front edge 24A that extends along the front opening 12. The front edge 24A shell also extends between the first side wall 14 and the second side wall 16 of 6. The first side wall 14 includes a front edge 24B that extends along the front opening 12. The front edge 24B of the first side wall 14 shell also extends between the top wall 20 and the bottom wall 22 of 6. As shown in FIG. 2, the front edges 24A, 24B of the embodiment are adjacent to the front opening 12, respectively.

[0020] The substrate container 1 is shellThe top wall 20 of 6 may include an equipment hookup 26. In an embodiment, this equipment hookup 26 may allow a standard automatic attachment (not shown) for moving the substrate container 1, such as an automatic arm, to be connected to the substrate container 1. For example, an automatic arm may be used to move the substrate container 1 between different processing equipment. In an embodiment, the substrate container 1 may include one or more handles (not shown) to allow manual movement of the substrate container 1 by a user (e.g., a technician, etc.).

[0021] The substrate container 1 may include a plurality of shelves 28 for holding substrates (not shown) within an internal space 8. The portion of the shelf 28 on the second side wall 16 has a similar configuration to the portion on the shelf 28 on the first side wall 14, although this is not clearly visible in Figure 2 (e.g., slots in the substrate container). Each shelf 28 is sized to hold substrates (not shown) within the internal space 8. For example, the shelves 28 in this embodiment are sized to hold substrates of a specific size (e.g., 150mm wafers, 200mm wafers, etc.).

[0022] The substrate container 1 may include a plurality of inlet and / or outlet purge ports (e.g., 30A, 30B, 30C, etc. in Figure 2) in its bottom wall 22, corresponding to the inlet and / or outlet of the substrate container 1. These plurality of inlet purge ports (and outlet purge ports) may be connected to a purge flow distribution system, as will be further discussed below. At least one outlet port may be provided for releasing gas from the internal space 8 out of the substrate container 1, and may be located in the bottom wall between the inlet and the second side wall. The inlet and / or outlet purge ports are shell They can also be provided at different locations along 6, for example on the rear wall 18, in which case the inlet purge port and / or outlet purge port are recognized to correspond to the inlet and outlet of the substrate container.

[0023] The substrate container 1 also includes at least one inlet, e.g., an inlet port, for receiving the flow of purge gas from the purge gas supply system. The purge gas supply system delivers the purge gas, which may generally be an inert gas. The purge gas may include, for example, one or more of nitrogen, clean dry air (CDA), and extra clean dry air (xCDA), but are not limited to these.

[0024] In this embodiment, the inlet port is connected to a purge flow distribution system to supply purge gas to the inlet purge port and distribute the purge gas into the internal space 8. When it is open A purge flow distribution system is used to distribute the purge gas into the internal space 8, thereby reducing the intrusion of the external environment (e.g., gas, particles, moisture, etc.) into the substrate container 1 through the front opening 12. For example, the supplied purge gas is configured to flow out from the internal space 8 through the front opening 12, which helps to minimize any inward flow into the internal space 8 through the front opening 12.

[0025] On the other hand, once the door 4 is received into the front opening 12 and the substrate container 1 is closed, the purge gas can continue to be supplied to the internal space 8 of the substrate container 1. The purge gas can also be exhausted to the outside of the substrate container 1 via a purge flow distribution system, as described herein by various embodiments, which can function as both an inlet and an outlet, or as an outlet only, depending on the configuration and desired application. The positive pressure of the purge gas in the internal space 8 creates a diffusion gradient that facilitates the flow of purge gas out of the substrate container through one or more outlets from the internal space.

[0026] Figure 3A schematically shows an embodiment of the purge flow distribution system 340. The purge flow distribution system 340 is connected to an inlet port 305 to receive purge gas from a purge supply system. The purge flow distribution system 340 further includes a network of individual gas distribution devices 350 for distributing the flow of purge gas into the internal space 8. A supply line 360 ​​connected to the inlet divides the flow of purge gas into the network of individual gas distribution devices 350. In an embodiment, for example, the supply line includes at least a first channel 360A connected to a first gas distribution device 350A, and at least a second channel 360B connected to a second gas distribution device 350B. However, it is recognized that the supply line 360 ​​can be separated into any number of different channels as needed for the purging operation of the substrate container, for example, into additional third, fourth, etc. channels for supplying purge gas to individual and / or the same gas distribution devices in the substrate container 1. In other words, the supply line 360 ​​is configured to receive the supply of purge gas from a common input port, such as a purge gas source, and to divide the supply of purge gas into multiple discrete input purge ports in order to supply it to multiple gas distribution devices 350.

[0027] The network of individual gas distribution devices includes a plurality of individual, distinct gas distribution devices 350 that are connected together by at least one supply line 360. Thus, the network of individual gas distribution devices includes the individual gas distribution devices 350 and associated piping that connects the individual distribution devices to distribute the purge gas flow into the substrate container 1.

[0028] The gas distribution device 350 is distinct and completely different from other gas distribution devices in the network. ru deThe gas distribution device is a combination of any multiple gas distribution surfaces 351A, 351B, 351C provided at specific designated locations in the substrate container, for example, a forward gas distribution device includes any and all gas distribution surfaces 351A, 351B provided at the front of the substrate container. That is, a gas distribution device is a combination of any or all multiple gas distribution surfaces provided at specific locations in the substrate container, and a gas distribution surface is a structural part of the gas distribution device that distributes a portion of the purge gas from the gas distribution device into the internal space. The gas distribution surfaces 351A, 351B, 351C are connected to at least one input purge port and are recognized to include structures for distributing the purge gas into the internal space, such as a diffuser, manifold, membrane, slit or nozzle, or a part made of a porous material, or similar structures that can guide the purge gas into the interior of the substrate container, and combinations thereof.

[0029] For example, in the embodiment, the first gas distribution device 350A is located in the rear section, for example, closer to the rear wall 18 of the FOUP, and may include at least one gas distribution surface 351A, 351B, and may include a first and / or second diffuser connected to at least one inlet purge port. The second gas distribution device 350B may be located in the front section, for example closer to the front opening 12 of the FOUP, and may have a plurality of openings arranged along the length of the gas distribution surface between the first side wall and the second side wall, or may include at least one gas distribution surface 351C extending vertically along either the front edge of the first side wall or the front edge of the second side wall, and may include a top / bottom manifold and / or right / left manifold connected to at least one other inlet purge port. The supply line 360 ​​is divided into a first channel 360A to supply at least a portion of the purge gas flow to the inlet purge port for the first gas distribution device 350A, and into a second channel 360B to supply at least another portion of the purge gas flow to the inlet purge port for the second gas distribution device 350B. The first and second gas distribution devices do not necessarily have to be located in the rear and front sections, and are provided as an example, and it is recognized that they can be located in various (or the same) locations within the internal space of the substrate container.

[0030] The amount of purge gas supplied to the first and second flow paths 360A and 360B to supply individual gas distribution devices 350A and 350B can be set in many ways. For example, in one embodiment, this can be set by providing a valve in the supply line, for example by setting the valve to a predetermined opening size to divide the supply of purge gas to the first and second flow paths 360A and 360B, thereby supplying a predetermined amount of purge gas to the individual gas distribution devices 350A and 350B. These valves may include needle valves, ball valves, butterfly valves, check valves, or similarly structured valves used to set the amount of purge gas flow to different individual gas distribution devices. To divide the supply of purge gas into appropriate / predetermined amounts for supply to the gas distribution device, the amount of purge gas can be set using orifices, spring-loaded diverters, or by providing one of the first or second flow paths with a pipe / pipe having a smaller or larger cross-sectional area as needed, for example, it is recognized that the division / supply of purge gas is based on the differential pressure of the network. It is also recognized that the amount of purge gas can be set for individual gas distribution surfaces 351A, 351B, and 351C. In other words, the supply of purge gas from a single inlet port is divided and set so that a predetermined amount of purge gas is supplied to multiple discrete inlet purge ports, each for supply to the gas distribution device and / or gas distribution surface.

[0031] Figure 3B illustrates another embodiment of the purge flow distribution system 340, the inlet including at least two inlet ports 305A and 305B. In the embodiment of Figure 3B, the purge flow distribution system 340 is connected to both inlet ports 305A and 305B to receive purge gas from the purge gas supply system. The purge flow distribution system further includes a network of individual gas distribution devices 350 to distribute the purge gas into the interior space 8. However, in this embodiment, the supply line 360 ​​is connected to both inlet ports 305A and 305B such that the supply of purge gas is coupled and then divided into at least a first flow path 360A connected to a first gas distribution device 350A, and a second flow path 360B connected to a second gas distribution device 350B. It is recognized that the supply of purge gas can be mixed / combined by connecting the pipe piping of the supply line from inlet ports 305A, 305B, or by using an inline mixer, for example, and then divided / separated into different flow paths 360A, 360B. The first and second gas distribution devices 350A, 350B each include at least one gas distribution surface for distributing the purge gas into the interior of the substrate container as discussed above.

[0032] The amount of purge gas supplied to the first and second flow paths 360A and 360B to supply individual gas distribution devices 350A and 350B can be set in many ways. For example, in one embodiment, valves are provided and set on the upstream and / or downstream sides of the mixing / combination of the purge gas supply from the inlet ports 305A and 305B, thereby dividing the purge gas supply into predetermined amounts of purge gas for the individual gas distribution devices 350A and 350B and / or individual gas distribution surfaces 351A, 351B, and 351C. In other words, the purge gas supply from both inlet ports 305A and 305B is divided and set so that predetermined amounts of purge gas are supplied to multiple discrete input purge ports, each to supply an individual gas distribution device and / or individual gas distribution surface.

[0033] Figure 3C illustrates yet another embodiment of the purge flow distribution system 340, in which the inlet includes at least two inlet ports 305A and 305B, which are used individually to supply different networks of individual gas distribution devices. That is, the purge flow distribution system 340 includes at least two networks of individual gas distribution devices 350 to distribute the flow of purge gas into the internal space 8. In this embodiment, the purge flow distribution system 340 includes at least two individual supply lines 360, 370, which are individually connected to the inlet ports 305A and 305B, respectively. Using a first supply line 360 ​​connected to inlet port 305A, the supply of purge gas from inlet port 305A is divided into a first flow path 360A connected to a first gas distribution device 350A having gas distribution surfaces 351A, 351B, and a second flow path 360B connected to a second gas distribution device 350B having at least one gas distribution surface 351C. Using a second supply line 370 connected to the inlet port 305B, the supply of purge gas from the inlet port 305B is divided into at least a first flow path 370A connected to a third gas distribution device 350C having at least two gas distribution surfaces 351D, 351E, and a second flow path 370B connected to a fourth gas distribution device 350D having at least one gas distribution surface 351F.

[0034] The amount of purge gas supplied to the first and second flow paths of at least two networks of individual gas distribution devices 350A, 350B, 350C, and 350D can be set in many ways. For example, in one embodiment, valves can be provided and set on supply lines 360 and 370 so that the supply of purge gas can be divided into predetermined amounts of purge gas for the individual gas distribution devices 350A, 350B, 350C, 350D and / or individual gas distribution surfaces 351A, 351B, 351C, 351D, 351E, and 351F. In other words, the supply of purge gas from inlet ports 305A and 305B is used individually to supply each supply line, and is divided and set using each individual supply line to supply the individual gas distribution devices so that a predetermined amount of purge gas is supplied to a plurality of discrete inlet purge ports.

[0035] Figures 3A to 3C show that the supply line 360 ​​(or 370) is divided prior to supplying individual gas distribution devices, but it is recognized that the supply line can be divided into any number of different channels that can be used to supply purge gas individually to any gas distribution device and / or gas distribution surface, as long as a predetermined amount of purge gas flow can be set to be divided and / or distributed to each gas distribution device, for example, an equal amount of purge gas flow can be set to all gas distribution devices in the network, or more purge gas flow can be set to one of the gas distribution devices as needed. It is also recognized that the inlet ports can be located in different places along the substrate container. For example, the bottom wall of the substrate container may include a rear inlet port for introducing a second flow of purge gas, with the rear inlet port located closer to the rear wall than the front opening, or the bottom wall may include a second inlet port for introducing a second flow of purge gas, with the second inlet port located closer to the front opening than the rear wall, or located elsewhere along the substrate container. In other embodiments, the inlet port (and / or outlet port) may be located on the bottom wall of the substrate container, and if multiple inlet ports are provided, the purge gas can be coupled before it is supplied to the purge flow distribution system.

[0036] Although the above description has been made in relation to FOUP, it is recognized that any embodiment considered herein can also be used to distribute purge gas to the internal space within the reticle pod, for example, to the internal space within the external pod of the reticle pod.

[0037] For example, Figures 4A and 4B illustrate another embodiment in which the supply line can provide the supply of purge gas to be divided into individual gas distribution devices and / or individual gas distribution surfaces. In this embodiment, the second flow path of the supply line is located after the first flow path.

[0038] Figure 4A shows the rear side of the substrate container 400. shell 406 defines the internal space 408 of the substrate container, and a substrate (not shown) is stored in the internal space 408 of the substrate container 400. shell 406 includes a first side wall 414, a second side wall 416, a rear wall 418, a top wall 420, and a bottom wall 422. The first side wall 414 is opposite the second side wall 416, and the top wall 420 is opposite the bottom wall 422. The first side wall 414 can be called the left side, while the second side wall 416 can be called the right side. The top wall 420 and the bottom wall 422 extend between the first side wall 414 and the second side wall 416, respectively. The substrate container 400 is, shell A carrier plate 423 can also be included, which can provide a base on which 406 can be mounted.

[0039] The purge flow distribution system is for the substrate container 400 shell It can be included in 406, or for example shell Between 406 and carrier plate 423 shell It can connect to 406, or shellThe purge flow distribution system can be positioned at least partially between 406 and the carrier plate 423. The purge flow distribution system is connected to at least one inlet port connected to a purge gas supply system for supplying purge gas to a network of individual gas distribution devices. The purge flow distribution system includes at least one supply line connected to at least one inlet purge port 430A, 430B of the bottom wall 422. The supply line includes a first flow path 460A connected to the inlet purge ports 430A, 430B for supplying purge gas to rear gas distribution devices 450A, 450B, the rear gas distribution devices may include at least two diffusers. These at least two diffusers 450A, 450B include multiple openings for distributing purge gas at the rear of the substrate container 400. At least one of these two diffusers 450A, 450B of the rear gas distribution device also includes an opening at its top end closer to the top wall 420 of the substrate container 400, forming an inlet purge port connected to a second flow path 460B to supply purge gas to another gas distribution device, such as a second gas distribution device. In this embodiment, the second flow path 460B is connected to a forward gas distribution device including at least one gas distribution surface, such as a top manifold 450C located near the top wall 420 of the substrate container 400.

[0040] As can be seen in Figure 4B, the second channel 460B includes a pipe, passage, or route provided along the top portion closer to the top wall 420 of the substrate container 400 for supplying and distributing at least a portion of the purge gas supplied to the first channel 460A to the forward gas distribution device. For example, the amount of purge gas to the forward gas distribution device can be set, for example, by sizing the cross-sectional area of ​​the second channel 460B to have a predetermined amount of purge gas flow, and the flow can be set by setting the size, for example, the diameter, of multiple openings of at least two diffusers 450A, 450B so that a predetermined amount of purge gas is supplied through the second channel 460B in proportion to the cross-sectional area and / or depending on the supply pressure, for example, the pressure difference. That is, the first gas distribution device is supplied with purge gas to distribute a predetermined amount of purge gas through the openings of diffusers 450A and 450B, while the remaining amount of purge gas is supplied to the second gas distribution device via the second flow path 460B to distribute the purge gas through the gas distribution surface of the second (forward) gas distribution device. Although described herein in relation to top manifolds and diffusers, it is recognized that any gas distribution surface may be any structure for distributing purge gas into the interior of the substrate container 400, including but not limited to top / bottom / side manifolds, top / bottom / side diffusers, top / bottom / side membranes, top / bottom / side portions having slits or nozzles, or top / bottom / side portions made of porous material. It is also recognized that the supply line may also include valves or other structures for setting the amount of purge gas supplied to the first and / or second gas distribution devices.

[0041] Figure 5A illustrates another embodiment and shows the rear side of the substrate container 500. shell 506 defines the internal space of the substrate container, and a substrate (not shown) is stored in the internal space of the substrate container 500. shell506 includes a first side wall 514, a second side wall 516, a rear wall 518, a top wall 520, and a bottom wall 522. The first side wall 514 is opposite the second side wall 516, and the top wall 520 is opposite the bottom wall 522. The first side wall 514 can be called the left side, while the second side wall 516 can be called the right side. The top wall 520 and the bottom wall 522 extend between the first side wall 514 and the second side wall 516, respectively. The substrate container 500 is, shell A carrier plate 523 can also be included, which can provide a base on which 506 can be mounted.

[0042] The purge flow distribution system is for substrate container 500 shell It can be included in 506, or for example shell Between 506 and carrier plate 523 shell It can connect to 506, or shell It can be positioned at least partially between 506 and the carrier plate 523. The purge flow distribution system 540 is connected to at least one inlet port 505 which is connected to a purge gas supply system to supply purge gas to a network of individual gas distribution devices. The purge flow distribution system 540 includes at least one supply line which is connected to at least one purge port in the bottom wall 522. In this embodiment, the purge flow distribution system 540 includes a manifold base 560 provided in the bottom wall 522 which is configured to divide the flow of purge gas to a network of gas distribution devices.

[0043] As can be seen in Figure 5B, the manifold base 560 is connected to a network of individual gas distribution devices 550. The manifold base 560 includes a first channel 560A connected to an inlet purge port to supply purge gas to a first gas distribution device, and a second channel 560B connected to an inlet purge port to supply purge gas to a second gas distribution device. The first gas distribution device may be a rear gas distribution device 550A which may include rear left and right diffusers 550A and 550B, and the second gas distribution device may be a front gas distribution device which may include a front manifold 550C and left and right manifolds 550D and 550E for distributing purge gas into the interior of the substrate container at the front of the substrate container. The purge flow distribution system 540 is configured such that the supply line can be adjusted to set the amount of purge gas flowing through at least one of the forward gas distribution device and the rear gas distribution device, and / or to adjust the amount of purge gas to the individual gas distribution surfaces of the forward gas distribution device and / or the rear gas distribution device. The first and second gas distribution devices are not necessarily located in the rear and forward sections, and are provided as examples, and it is recognized that they can be located in various (or the same) locations within the internal space of the substrate container.

[0044] For example, in this embodiment, the amount of purge gas supplied to the forward gas distribution device and the rear gas distribution device can be set by adjusting the inlet supply line valve 580. That is, by adjusting the supply line valve 580, a pressure difference can be created to divide the supply of purge gas to the first flow path 560A and the second flow path 560B in order to set the amount of purge gas necessary to purge the substrate container supplied to the forward gas distribution device and the rear gas distribution device.

[0045] In addition to controlling the amount of purge gas to the forward gas distribution device by setting the supply line valve 580, the amount of purge gas to the individual gas distribution surfaces 550C, 550D, and 550E of the forward gas distribution device can be adjusted using a plurality of adjustable valves 585A, 585B, 585C, and 585D. For example, adjustable valve 585A can be set to control the amount of purge gas to the forward right side, for example, the right manifold 550E; adjustable valves 585B and 585C can be set to control the amount of purge gas to the forward manifold 550C; and adjustable valve 585D can be set to control the amount of purge gas to the forward left side, for example, the left manifold 550D. Thus, by setting the adjustable valves 580, 585A, 585B, 585C, and 585D, the purge gas from the supply line can be divided into a network and / or individual gas distribution surfaces of the individual gas distribution device using the manifold base 560. In other words, the supply of purge gas from a single inlet port is divided and configured so that a predetermined amount of purge gas is supplied to multiple discrete inlet purge ports, each to be supplied to an individual gas distribution device 550.

[0046] As can be seen from Figure 5C, the inlet ports connected to the purge flow distribution system 540 can be located in various places. For example, Figure 5A shows that the inlet port 505 is generally located below the manifold base 560 to supply purge gas from the purge gas distribution system, but it is recognized that the purge gas can be supplied to many inlet ports (or outlet ports) 505A, 505B, 505C, 505D provided via the carrier plate 523, depending on the application / docking structure for the substrate container. It is recognized that the purge gas from the inlet ports 505A, 505B, 505C, 505D can be coupled before being supplied to the manifold base 560, or can be supplied / coupled to different purge flow distribution systems in the substrate container as needed.

[0047] It is recognized that the amount of purge gas can also be controlled or set using any combination of different structures that can set pressure drop or flow rate based on energy conservation. For example, an orifice can be placed in either the first or / or second flow path to create a pressure difference that sets the amount of purge gas supplied to the forward gas distribution device and / or the rear gas distribution device and / or any individual gas distribution surface. Alternatively, or in addition to such a structure, it is also possible to set the amount of purge gas divided between the forward and rear gas distribution devices and / or between the gas distribution surfaces of the forward and rear gas distribution devices by sizing the cross-sectional area of ​​various pipes in the first and / or second flow path. Thus, the purge flow distribution system 540 is configured to divide and supply purge gas to different gas distribution devices and / or gas distribution surfaces by adjusting and / or setting the different components of the purge flow distribution system 540 in an appropriate manner.

[0048] Figure 6 shows an operational flow 600 for supplying a purge flow to a substrate container according to at least one exemplary embodiment.

[0049] The operation flow 600 may include one or more operations, actions, or functions depicted by one or more blocks 610, 620, 630, and 640. Although illustrated as discrete blocks, various blocks can be divided into additional blocks, combined into fewer blocks, or removed depending on the desired embodiment. As a non-limiting example, corresponding to its description in Figure 6, the description of a method 600 carried out by one or more of the apparatus or components described in the above embodiments by one or more exemplary embodiments described herein relates to supplying a purge flow into a substrate container. The processing flow 600 may begin in block 610.

[0050] Block 610 can be described as supplying a flow of purge gas into the interior of a substrate container, which may be a wafer or a reticle container (e.g., a FOUP or reticle pod), via an inlet purge port connected to a purge flow distribution system located at least partially inside the container. The flow of purge gas may include one or more of nitrogen gas, clean dry air (CDA) gas, extra clean dry air (xCDA) gas, or any other suitable fluid to condition the container environment. Block 610 may be followed by Block 620.

[0051] Block 620 can be described as splitting the purge gas through the supply lines of the purge flow distribution system to supply the purge gas flow to a network of individual gas distribution devices to distribute the purge gas flow into the internal space of the substrate container. In embodiments, in block 630, splitting the purge gas involves dividing the supply lines into a first channel for supplying the purge gas to at least one of the network of gas distribution devices, and a second channel for supplying the purge gas to another of the network of gas distribution devices. The amount of purge gas supplied to the first and second channels can be based on a number of predetermined operating conditions. For example, in one embodiment, one or more sensors can be used to detect at least one environmental condition inside the substrate container for a predetermined period of time. The at least one environmental condition may include one or more of the following: relative humidity (%RH), pressure (e.g., absolute pressure), oxygen level, temperature, measured presence of airborne molecular contaminants, measured presence of one or more volatile organic compounds, etc. Block 620 / 630 may be followed by block 640.

[0052] Block 640 can be described as setting a first portion, or amount, of the flow of purge gas to a first distribution device via a first channel, and setting a second portion, or amount, of the flow of purge gas to a second gas distribution device via a second channel, based on at least one detected environmental condition for a predetermined time period.

[0053] In at least one exemplary embodiment, the amount of purge gas to the forward and / or rear gas distribution devices can be obtained or determined, for example, by achieving a desired (predetermined or optimal) environmental response (e.g., inside the container). The desired environmental response may include adjusting one or more of the following to each predetermined threshold level: relative humidity (%RH), oxygen level, temperature, measured presence of airborne molecular contaminants, and / or measured presence of one or more volatile organic compounds inside the container. The desired environmental response may also include generating a desired pressure (e.g., absolute pressure) inside the container. The environmental response may be detected or measured by sensors inside the container, and the detected data may be communicated to the outside of the container, for example, to a controller.

[0054] The controller analyzes the environmental response and determines the amount of purge gas required to reach an applicable operating scenario, which is supplied to the forward gas distribution device (and / or forward gas distribution surface) and the rear gas distribution device. In embodiments, the controller that analyzes the environmental response and determines the amount of purge gas required to reach an applicable operating scenario can be achieved by design of experiments (DOE), trained neural networks, modeling, etc.

[0055] The amount of purge gas supplied to at least one forward distribution device and / or rear distribution device can be set by setting valves provided in the supply line of the purge flow distribution system. These valves may include needle valves, ball valves, butterfly valves, check valves, or similarly structured valves that can be used to control the flow of gas to different individual gas distribution devices. It is recognized that the flow of purge gas can also be set using orifices, spring-loaded diverters, or by sizing one of the pipes / pipes of the first or second flow path so that when a supply pressure is given, it has a cross-sectional area that supplies a predetermined amount of purge gas, thereby dividing the supply of purge gas as needed. In embodiments, once the amount of purge gas supplied to the network of gas distribution devices is set, the amount of purge gas supplied, for example by a valve, is not further adjusted until needed, for example, by passive control.

[0056] manner Any of the embodiments 1 to 18 can be combined with either embodiment 19 or 20.

[0057] Appearance 1. Defining the interior space shell and a front opening, a first side wall, a second side wall, a rear wall, and shell Includes a bottom wall with a front edge that extends between the first and second side walls along the front opening. shell A substrate container comprising a purge flow distribution system configured to receive a flow of purge gas, the purge flow distribution system comprising an inlet configured to receive a flow of purge gas, and a network of individual gas distribution devices for distributing the flow of purge gas into an internal space, and further comprising a supply line connected to the inlet, the supply line configured to divide the flow of purge gas into the network of individual gas distribution devices.

[0058] Embodiment 2. A substrate container according to Embodiment 1, wherein the supply line comprises a first flow path to one gas distribution device in a network of individual gas distribution devices, and a second flow path to another gas distribution device in the network of individual gas distribution devices.

[0059] Embodiment 3. A substrate container according to Embodiment 2, wherein one gas distribution device in the network of gas distribution devices is a first gas distribution device located closer to the rear wall, another gas distribution device in the network of gas distribution devices is a second gas distribution device located in the internal space of the substrate container, the first flow path is configured to supply a portion of the purge gas flow to the first gas distribution device, and the second flow path is configured to supply another portion of the purge gas flow to the second gas distribution device.

[0060] Embodiment 4. A substrate container according to Embodiment 3, wherein the first flow path of the supply line to the first gas distribution device has a smaller or larger cross-sectional area than the second flow path of the supply line to the second gas distribution device, or comprises an orifice, a spring-loaded diverter, or a valve for guiding flow to the second flow path of the supply line to the second gas distribution device.

[0061] Embodiment 5. A substrate container according to Embodiment 3, wherein the second flow path is provided after the first flow path at the end of the first gas distribution device opposite to the inlet.

[0062] Embodiment 6. A substrate container according to Embodiment 3, wherein the second flow path is provided at the top of the substrate container for supplying a purge gas to a second gas distribution device.

[0063] Embodiment 7. A substrate container according to Embodiment 6, wherein the second gas distribution device comprises a gas distribution surface having a plurality of openings arranged along the length of the gas distribution surface between the first side wall and the second side wall, or the front gas distribution device comprises a gas distribution surface extending vertically along either the front edge of the first side wall or the front edge of the second side wall.

[0064] Embodiment 8. A substrate container according to any of Embodiments 1 to 3, wherein the purge flow distribution system further comprises a manifold base provided on the bottom wall, which receives the flow of purge gas from the inlet and divides the flow of purge gas into a network of gas distribution devices.

[0065] Embodiment 9. A substrate container according to Embodiment 8, wherein the manifold base is configured to divide the second flow path into at least a left-side second flow path and a right-side second flow path, thereby supplying a portion of the purge gas flow to a second gas distribution device.

[0066] Embodiment 10. A substrate container according to Embodiment 9, wherein the manifold base comprises a plurality of adjustable valves for setting at least one of a portion of the flow of purge gas to a first channel to a first gas distribution device and a portion of the flow of purge gas to a second channel to a second gas distribution device.

[0067] Embodiment 11. A substrate container according to any of Embodiments 1 to 9, wherein one of the gas distribution devices in the network of gas distribution devices comprises a gas distribution surface containing a porous material.

[0068] Embodiment 12. A substrate container according to any of Embodiments 1 to 11, wherein the purge flow distribution system is shell A substrate container attached to the inlet purge port on the bottom wall.

[0069] Embodiment 13. A substrate container according to any of Embodiments 1 to 12, wherein one of the gas distribution devices in the network of gas distribution devices is shell A substrate container comprising a gas distribution surface having a plurality of openings arranged along the length of the gas distribution surface between a first side wall and a second side wall.

[0070] Embodiment 14. A substrate container according to any of Embodiments 1 to 13, further comprising an outlet port for releasing gas from the internal space, wherein the outlet port is located in the bottom wall between the inlet and the second side wall.

[0071] Embodiment 15. A substrate container according to any of Embodiments 1 to 14, wherein the bottom wall includes a rear inlet port for introducing a second flow of purge gas into the internal space via a purge flow distribution system, the rear inlet port being located closer to the rear wall than the front opening.

[0072] Embodiment 16. A substrate container according to any of Embodiments 1 to 14, wherein the bottom wall includes a second inlet port for introducing a second flow of purge gas into the internal space via a purge flow distribution system, the second inlet port being located closer to the front opening than the rear wall.

[0073] Embodiment 17. A substrate container according to any of Embodiments 1 to 16, shell A substrate container further comprising a door for sealing the internal space, configured to receive within a front opening defined by [the specified method].

[0074] Embodiment 18. A substrate container according to any of Embodiments 1 to 17, wherein the inlet of a purge flow distribution system comprises a first inlet and a second inlet, and the supply line is configured to combine the flow of purge gas from the first inlet and the second inlet, and then divide the flow of purge gas into a network of individual gas distribution devices.

[0075] Appearance 19. Open stateA method for purging a substrate container, comprising: supplying a flow of purge gas to an inlet of a purge flow distribution system at least partially located within the substrate container via an inlet port located in the wall of the substrate container; and dividing the purge gas via supply lines of the purge flow distribution system to supply the flow of purge gas to a network of individual gas distribution devices for distributing the flow of purge gas into the internal space of the substrate container, wherein the supply lines comprise a first flow path to one gas distribution device of the network of gas distribution devices, and a second flow path to another gas distribution device of the network of gas distribution devices.

[0076] Embodiment 20. A method according to Embodiment 19, further comprising setting a first portion of the purge gas flow to a first gas distribution device via a first flow path and setting a second portion of the purge gas flow to a second gas distribution device via a second flow path.

[0077] Therefore, although several illustrative embodiments of the present disclosure have been described, it will be readily apparent to those skilled in the art that other embodiments can be constructed and used within the scope of the claims accompanying this specification. Many of the advantages of the present disclosure encompassed herein are shown in the above description. However, it will be understood that the present disclosure is in many respects merely illustrative. Modifications can be made to the details without exceeding the scope of the present disclosure, particularly with respect to the shape, size and arrangement of parts. The scope of the present disclosure is, of course, defined in the language in which the accompanying claims are expressed.

Claims

1. A shell defining an internal space, comprising a front opening, a first side wall, a second side wall, a rear wall, and a bottom wall including a front edge extending between the first side wall and the second side wall along the front opening of the shell, A purge flow distribution system positioned on the surface of the shell and configured to receive a flow of purge gas, the purge flow distribution system including an inlet configured to receive a flow of purge gas, A plurality of gas distribution devices for distributing the flow of purge gas from the purge flow distribution system into the internal space, A substrate container comprising, The purge flow distribution system includes a supply line connected to the inlet, and the supply line is configured to divide the flow of the purge gas to the plurality of gas distribution devices. A substrate container in which, among the plurality of gas distribution devices, the first gas distribution device is positioned closer to the rear wall, and the second gas distribution device is positioned closer to the front opening.

2. The substrate container according to claim 1, further comprising an outlet port for releasing gas from the internal space, wherein the outlet port is located in the bottom wall between the inlet and the second side wall.

3. The substrate container according to claim 1, further comprising a door for sealing the internal space, configured to receive into the front opening defined by the shell.

4. A shell defining an internal space, comprising a front opening, a first side wall, a second side wall, a rear wall, and a bottom wall including a front edge extending between the first side wall and the second side wall along the front opening of the shell, A manifold base positioned on the surface of the shell, having an inlet configured to receive a flow of purge gas, Multiple diffusers, which communicate with the manifold base and distribute the flow of the purge gas into the internal space of the shell, A substrate container comprising, A substrate container in which at least one of the plurality of diffusers is positioned near the rear wall of the shell, and at least one of the plurality of diffusers is positioned near the front opening of the shell.

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