Substrate processing equipment

Abstract

To provide a substrate processing apparatus which enables maintenance work to be conducted efficiently.SOLUTION: A substrate processing apparatus includes a cup 40, an exhaust duct 20, a mist collecting member 30, and a lid portion 26. The cup 40 surrounds a substrate being processed with use of a process liquid. The exhaust duct 20 has an opening 25a in a portion which does not overlap with the cup 40 in a plan view and forms an exhaust flow path for exhausting a gas in the cup 40. The mist collecting member 30 is provided at a position overlapping with the opening 25a and collects mist of the process liquid in the exhaust duct 20. The lid portion 26 closes the opening 25a of the exhaust duct 20.SELECTED DRAWING: Figure 15

Description

Technical Field

[0005]

[0001] The present invention relates to a substrate processing apparatus that performs processing on a substrate using a processing liquid.

Background Art

[0002] Conventionally, in order to perform predetermined processing on various substrates such as substrates for flat panel displays (FPDs) used in liquid crystal display devices or organic EL (Electro Luminescence) display devices, semiconductor substrates, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, photomask substrates, ceramic substrates, or solar cell substrates, a substrate processing apparatus is used.

[0003] For example, the substrate processing apparatus described in Patent Document 1 includes a spin chuck, a cup, and a nozzle. The spin chuck holds and rotates the substrate in a horizontal posture. The cup is disposed so as to surround the substrate supported by the spin chuck. An exhaust port for exhausting the inside of the cup is formed at the lower part of the cup. The nozzle supplies a processing liquid to the surface of the substrate from above the spin chuck.

[0004] A stage is disposed below the cup. A mist separator serving as particle capturing means is inserted between the stage and the exhaust port of the cup. Air containing particles such as mist in the cup is discharged from the exhaust port at the lower part of the cup and supplied to the mist separator. Particles such as mist are captured in the mist separator, and only the gas is supplied to the downstream exhaust box.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0006] Mist separators require periodic maintenance. In Patent Document 1, the mist separator can be easily removed when replacing the cup, thus improving the efficiency of maintenance work. However, further efficiency improvements in maintenance work are desired in order to further reduce the downtime of the substrate processing equipment.

[0007] The objective of the present invention is to provide a substrate processing apparatus that enables efficient maintenance work. [Means for solving the problem]

[0008] A substrate processing apparatus according to one aspect of the present invention comprises: a cup surrounding a substrate being processed with a processing liquid; an exhaust duct having an opening in a portion that does not overlap with the cup in a plan view and forming an exhaust passage for discharging gas from the cup; a mist capturing member provided in the exhaust duct at a position overlapping with the opening and capturing mist components of the processing liquid; and a lid portion that closes the opening of the exhaust duct. The exhaust duct has a bent portion that does not overlap with the cup in the plan view, the opening is formed in the bent portion, and the mist capturing member is provided within the bent portion. ru. [Effects of the Invention]

[0009] According to the present invention, maintenance work on substrate processing equipment can be performed efficiently. [Brief explanation of the drawing]

[0010] [Figure 1] This is a schematic perspective view illustrating the general configuration of a developing apparatus according to one embodiment of the present invention. [Figure 2] Figure 1 is a partially exploded perspective view illustrating the configuration of the liquid treatment unit. [Figure 3] This is a schematic plan view illustrating a part of the configuration of the liquid treatment unit shown in Figure 2. [Figure 4] This is a schematic longitudinal cross-sectional view illustrating a part of the configuration of the liquid treatment unit shown in Figure 2. [Figure 5] Figure 2 is a perspective view of the nozzle arm unit. [Figure 6]It is a longitudinal sectional view obtained by cutting the nozzle arm unit in a predetermined vertical plane. [Figure 7] It is an external perspective view of the partition plate and the cylindrical member in FIG. 2. [Figure 8] It is a plan view of the partition plate and the cylindrical member in FIG. 2. [Figure 9] It is a diagram for explaining the operation of the nozzle arm unit when a plurality of nozzles move between the standby position and the processing position. ​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​

[0011] Hereinafter, a substrate processing apparatus according to an embodiment of the present invention will be described while referring to the drawings. In the following description, the substrate refers to a substrate for a FPD (Flat Panel Display) used in a liquid crystal display device, an organic EL (Electro Luminescence) display device, etc., a semiconductor substrate, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, a ceramic substrate, a substrate for a solar cell, or the like.

[0012] As an example of the substrate processing apparatus, a developing apparatus will be described. In the present embodiment, the substrate to be subjected to the developing process has a front surface and a back surface. Further, in the developing apparatus according to the present embodiment, with the front surface of the substrate facing upward and the back surface of the substrate facing downward, the back surface (lower surface) of the substrate is held, and the developing process is performed on the front surface (upper surface) of the substrate.

[0013] A photosensitive film after the exposure process is formed at least in the central portion of the front surface of the substrate. This photosensitive film is, for example, a negative-type photosensitive polyimide film. As a developer for dissolving the exposed negative-type photosensitive polyimide film, an organic solvent containing cyclohexanone or cyclopentanone, etc. is used. Further, as a rinse liquid, an organic solvent containing isopropyl alcohol or propylene glycol monomethyl ether acetate (PGMEA), etc. is used.

[0014] In the present embodiment, "development processing of the substrate" means supplying a developer to the photosensitive film after the exposure process formed on the front surface of the substrate to dissolve a part of the photosensitive film.

[0015] 1. Configuration of the Developing Apparatus Figure 1 is a schematic perspective view illustrating the general configuration of a developing apparatus according to one embodiment of the present invention. As shown in Figure 1, the developing apparatus 1 basically has a configuration in which two liquid processing units LPA and LPB are housed within a housing CA. In Figure 1, the general shapes of the two liquid processing units LPA and LPB are shown by dotted lines. Details of the configuration of the liquid processing units LPA and LPB will be described later.

[0016] The enclosure CA has a roughly rectangular box shape extending in one direction in the horizontal plane. Specifically, the enclosure CA is formed by attaching a first side wall plate 1w, a second side wall plate 2w, a third side wall plate 3w, a fourth side wall plate 4w, a floor plate 5w, and a ceiling plate 6w to a frame (not shown). In the following description, the direction parallel to the direction in which the enclosure CA extends in the horizontal plane will be appropriately referred to as the first direction D1, and the direction perpendicular to the first direction D1 in the horizontal plane will be appropriately referred to as the second direction D2. The two liquid processing units LPA and LPB are arranged on a unit base, which will be described later, so as to be aligned in the first direction D1 within the enclosure CA.

[0017] The first side wall plate 1w and the second side wall plate 2w have a rectangular plate shape and are arranged parallel to each other in the vertical direction and the first direction D1. The third side wall plate 3w and the fourth side wall plate 4w have a rectangular plate shape and are arranged parallel to each other in the vertical direction and the second direction D2.

[0018] The second side wall plate 2w has two loading / unloading ports ph for transporting substrates between the inside and outside of the housing CA. The two loading / unloading ports ph are formed in two parts of the second side wall plate 2w that face the liquid processing units LPA and LPB in the second direction D2. The ceiling plate 6w has two openings op1 arranged in the first direction D1. The opening ratio of the two openings op1 in the ceiling plate 6w is set to be sufficiently large, to the same extent as when the entire upper end of the housing CA is open upwards.

[0019] Two filters FL are provided above the ceiling panel 6w so as to close the two openings op1 in the ceiling panel 6w. Alternatively, the two filters FL may be provided directly below the ceiling panel 6w. In Figure 1, the two filters FL are shown by thick dashed lines. The two filters FL are, for example, ULPA (Ultra Low Penetration Air) filters and are attached to a frame (not shown) or the ceiling panel 6w that constitutes the housing CA. An air guide AG is provided on the ceiling panel 6w of the housing CA, surrounding the two filters FL. In Figure 1, the air guide AG is shown by a double-dash line.

[0020] A gas supply unit 10 is provided on the outside of the housing CA. The gas supply unit 10 is, for example, an air control unit, which adjusts the air conditions, such as temperature and humidity, to meet predetermined conditions while the power supply of the developing device 1 is turned on. The gas supply unit 10 also supplies the adjusted air to the air guide AG through the air supply duct DU. In this case, the air guide AG guides the air supplied from the gas supply unit 10 through two filters FL to two openings op1 in the ceiling panel 6w. As a result, clean air with adjusted temperature and humidity is supplied into the housing CA, and a downward airflow is generated throughout the internal space SP of the housing CA.

[0021] Two additional fluid supply units 11 are provided on the outside of the housing CA. Each fluid supply unit 11 includes a developer supply source, a rinse solution supply source, a gas supply source, and various fluid-related equipment, and supplies developer, rinse solution, and gas to the liquid processing units LPA and LPB through the fluid supply path 12. In Figure 1, the fluid supply path 12 is shown by a dashed line. In this embodiment, the fluid supply path 12 is composed of one or more pipes and valves, etc.

[0022] The developing apparatus 1 further includes a control unit 90. The control unit 90 includes, for example, a CPU (central processing unit) and memory, or a microcomputer, and controls the liquid processing units LPA, LPB and the two fluid supply units 11. Details of the control unit 90 will be described later.

[0023] 2. Configuration of the liquid processing unit (1) Outline of the liquid treatment unit configuration The two liquid treatment units LPA and LPB in Figure 1 have essentially the same configuration, except that some of their components are arranged symmetrically with respect to a plane (vertical plane) perpendicular to the first direction D1. Below, the configuration of liquid treatment unit LPA will be described as representative of the two liquid treatment units LPA and LPB. Figure 2 is a partially exploded perspective view illustrating the configuration of liquid treatment unit LPA in Figure 1. Figure 3 is a schematic plan view illustrating some of the configurations of liquid treatment unit LPA in Figure 2. Figure 4 is a schematic longitudinal cross-sectional view illustrating some of the configurations of liquid treatment unit LPA in Figure 2. In Figures 2 to 4, the substrate W to be treated is shown by a dotted line.

[0024] As shown in Figure 2, the liquid treatment unit LPA includes a partition plate 100, a cylindrical member 200, a nozzle arm unit 300, a nozzle drive unit 400, and a standby pod 500. The liquid treatment unit LPA further includes a cup 40, a lifting drive unit 49, a container 50, an exhaust pipe 61, a drain pipe 62, a substrate holding device 70, and a suction device 78. In Figure 2, some of the components of the liquid treatment unit LPA are shown separated vertically from the others in order to facilitate understanding of the structure of the multiple components.

[0025] Specifically, Figure 2 shows some components, including the partition plate 100, cylindrical member 200, nozzle arm unit 300, nozzle drive unit 400, and standby pod 500, and other components, including the cup 40, container 50, and substrate holder 70, separated vertically. Figures 3 and 4 show schematic plan views and schematic vertical cross-sectional views, respectively, of the cup 40, container 50, and substrate holder 70 as some components of the liquid processing unit LPA.

[0026] (2) Cups and containers Within the housing CA in Figure 1, the housing 50 is fixed on a unit base, which will be described later. As shown in Figure 2, the housing 50 includes a side wall 51 and a bottom 52. The side wall 51 has an annular horizontal cross-section and is formed to extend vertically with a constant inner diameter and a constant outer diameter. The bottom 52 is formed to close the lower end of the side wall 51.

[0027] Three through-holes are formed in the bottom portion 52. Two of the three through-holes face each other, with the substrate holding device 70 in between. Exhaust pipes 61 are connected to the portions where these two through-holes are formed. Each exhaust pipe 61 guides the atmosphere inside the housing CA to an exhaust device (not shown) located outside the housing CA, through an exhaust duct described later. In the housing 50, the end (open end) of each exhaust pipe 61 is located above the bottom portion 52.

[0028] Furthermore, a drain pipe 62 is connected to the remaining through-hole formation portion in the bottom 52. The drain pipe 62 guides the liquid (developer and rinse solution) that flows from the cup 40 to the bottom of the container 50 during the substrate W development process to a drainage device (not shown) located outside the housing CA. In the container 50, the end (open end) of the drain pipe 62 is located lower than the end of each exhaust pipe 61.

[0029] At least the lower part of the substrate holding device 70 is housed within the housing 50. Specifically, the substrate holding device 70 includes a suction holding section 71, a spin motor 72, and a motor cover 79 (Figure 4). The motor cover 79 is not shown in Figures 2 and 3. As shown in Figure 3, the spin motor 72 is fixed to the bottom 52 so as to be located in the center of the housing 50 in a plan view. In this example, the lower part of the spin motor 72 protrudes below the bottom 52. As shown in Figure 4, the spin motor 72 is provided with a rotating shaft 73 that extends upward. A suction holding section 71 is provided at the upper end of the rotating shaft 73. The suction holding section 71 protrudes above the upper end of the housing 50.

[0030] As shown in Figure 2, a suction device 78 is provided on the outside of the housing 50. The suction holding unit 71 is configured to be able to suction the center of the back surface of the substrate W when the suction device 78 is in operation. When the suction holding unit 71 suctions the center of the back surface of the substrate W, the substrate W is held in a horizontal position above the housing 50. Furthermore, when the spin motor 72 is operated while the substrate W is held by the suction holding unit 71, the substrate W rotates in a horizontal position.

[0031] As shown in Figure 4, the motor cover 79 has a roughly bowl shape and is fixed to the housing 50 with its open, large-diameter portion facing downwards. A through hole is formed in the center of the upper end of the motor cover 79 into which the rotating shaft 73 can be inserted. With the rotating shaft 73 inserted into the through hole in the center of the upper end of the motor cover 79, the motor cover 79 covers the upper end portion of the spin motor 72 excluding the rotating shaft 73 and a space of a certain width surrounding the spin motor 72 in the horizontal plane from above. A gap of a certain width is formed between the outer peripheral end of the motor cover 79 and the inner peripheral surface of the side wall portion 51.

[0032] Here, the ends of each exhaust pipe 61 are located below the motor cover 79. This prevents liquids (developer and rinse solution) falling from above the housing 50 during the substrate W development process from entering the interior of each exhaust pipe 61.

[0033] As shown in Figure 2, the lower part of the substrate holder 70, as well as at least the lower end of the cup 40, are housed in the container 50. Here, the cup 40 is configured to be movable vertically within the container 50. The cup 40 also includes a cylindrical wall portion 41 and a liquid receiving portion 42. Each of the cylindrical wall portion 41 and the liquid receiving portion 42 has an annular horizontal cross-section and is provided to extend at least vertically. As shown in Figure 3, the cup 40 is configured to surround the substrate holder 70 in a plan view.

[0034] As shown in Figure 4, the outer and inner diameters of the liquid receiving portion 42 gradually increase as they move downward from the upper end of the liquid receiving portion 42. The outer diameter of the lower end of the liquid receiving portion 42 (the maximum outer diameter of the liquid receiving portion 42) is smaller than the inner diameter of the side wall portion 51 of the container 50. Therefore, a gap of a certain width is formed between the outer peripheral end of the liquid receiving portion 42 and the inner peripheral surface of the side wall portion 51. The cylindrical wall portion 41 is formed to extend upward from the upper end of the liquid receiving portion 42 with a constant inner and outer diameter.

[0035] As shown in Figure 2, a lifting drive unit 49 is provided near the container 50 within the housing CA of Figure 1. The lifting drive unit 49 includes a drive mechanism such as a motor or air cylinder, and supports the cup 40 and moves the cup 40 up and down, thereby transitioning the cup 40 between a first state and a second state. The first and second states of the cup 40 will be described later.

[0036] (3) Nozzle drive unit and standby pod In the housing CA of Figure 1, the nozzle drive unit 400 is provided adjacent to the housing 50 in a first direction D1. The nozzle drive unit 400 includes a motor having a rotating shaft 401 and an actuator. The actuator includes an air cylinder, a hydraulic cylinder, or a motor, and supports the motor having the rotating shaft 401 on a unit base so that the motor can move in the vertical direction. The rotating shaft 401 is located at the upper end of the nozzle drive unit 400.

[0037] Within the housing CA in Figure 1, a standby pod 500 is further provided on the unit base. The nozzle drive unit 400 and the standby pod 500 are spaced apart and arranged in a second direction D2 at a position to the side of the housing 50. The standby pod 500 has a box shape that extends for a certain length in the second direction D2. Multiple standby holes are formed on the upper surface of the standby pod 500 for housing the injection parts of the multiple nozzles 310, which will be described later.

[0038] The standby pod 500 is connected to a drain pipe (not shown) that discharges liquid sprayed from or dripped from the multiple nozzles 310 to the outside of the housing CA when the multiple nozzles 310 are in standby mode. The standby pod 500 is also connected to an exhaust pipe (not shown) that discharges the atmosphere inside the standby pod 500 to the outside of the housing CA.

[0039] (4) Nozzle arm unit A nozzle arm unit 300 is attached to the upper end of the rotating shaft 401. When attached to the upper end of the rotating shaft 401, the nozzle arm unit 300 has a longitudinal shape that extends linearly in a direction different from that of the rotating shaft 401. The nozzle arm unit 300 mainly consists of a plurality (six in this example) of nozzles 310, a support 320, and a cover member 330.

[0040] Figure 5 is a perspective view of the nozzle arm unit 300 shown in Figure 2. Figure 6 is a longitudinal cross-sectional view of the nozzle arm unit 300 cut along a predetermined vertical plane. In Figure 5, the cover member 330 is shown separated from the other components to facilitate understanding of the internal structure of the nozzle arm unit 300.

[0041] The support 320 is manufactured, for example, by appropriately bending a single metal plate that has been cut or laser-cut into a predetermined shape. Alternatively, it is manufactured by connecting multiple metal plates that have been processed into a predetermined shape by screwing or welding. The support 320 is formed to extend in one direction and has one end 321 and the other end 322. The support 320 also has three nozzle fixing parts 323 that are spaced apart from the vicinity of the one end 321 toward the other end 322. Two nozzles 310 are attached to each of the three nozzle fixing parts 323. Furthermore, the support 320 has a pipe fixing part 324 and two cover mounting parts 325. The pipe fixing part 324 is located near the other end 322. The pipe fixing part 324 and the cover mounting parts 325 will be described later.

[0042] One of the two nozzles 310 provided in each nozzle fixing section 323 is used to supply developer to the substrate W. The other of the two nozzles 310 provided in each nozzle fixing section 323 is used to supply rinse solution to the substrate W. Furthermore, each of the nozzles 310 in this embodiment is a soft-spray type two-fluid nozzle capable of spraying a mixed fluid of liquid and gas. Therefore, each nozzle 310 has two fluid introduction sections 310a and 310b for introducing liquid and gas into the nozzle 310, and a spray section 310c for spraying the mixed fluid.

[0043] Each nozzle 310 is fixed to the support 320 with the injection section 310c facing downwards. In this state, a fluid introduction section 310a for introducing liquid into the nozzle 310 is provided at the upper end of each nozzle 310. Additionally, a fluid introduction section 310b for introducing gas into the nozzle 310 is provided on the side of each nozzle 310.

[0044] One end of a pipe 311 for supplying liquid (in this example, developer or rinse solution) to the nozzle 310 is connected to the fluid inlet 310a of each nozzle 310. Another end of a pipe 312 for supplying gas (in this example, nitrogen gas) to the nozzle 310 is connected to the fluid inlet 310b of each nozzle 310. The pipes 311 and 312 are made of a flexible resin material. Examples of such resin materials include PTFE (polytetrafluoroethylene), PVC (polyvinyl chloride), PPS (polyphenylene sulfide), and PFA (tetrafluoroethylene perfluoroalkyl vinyl ether copolymer).

[0045] The other end 322 of the support body 320 is attached to the upper end of the rotating shaft 401 of the nozzle drive unit 400. In this state, a horizontal and flat support surface SS is formed approximately in the center of the support body 320 in the longitudinal direction. A portion of each of the multiple pipes 311, 312 is provided on the support surface SS so as to extend from the nozzle 310 to which the pipe is connected toward the pipe fixing part 324.

[0046] The pipe fixing section 324 is formed from a part of the support surface SS. Multiple pipes 311 and 312 are bundled together in the pipe fixing section 324. In this state, a pipe fixing piece 329 having an inverted U shape is screwed onto the support surface SS that constitutes the pipe fixing section 324. This fixes the multiple pipes 311 and 312 near the other end 322 of the support body 320. The portions of the multiple pipes 311 and 312 that extend outward from the pipe fixing section 324 to the support body 320 are housed inside a protective tube 391 while bundled together. The protective tube 391 is made of, for example, rubber or resin and is flexible.

[0047] The cover member 330 has a box shape with an open bottom. Specifically, the cover member 330 in this example consists of a top surface portion 331, one end surface portion 332, the other end surface portion 333, one side surface portion 334, and the other side surface portion 335. The top surface portion 331 has a rectangular shape that is larger than the nozzle opening of the partition plate 100, which will be described later, when viewed from above. The one end surface portion 332, the other end surface portion 333, the one side surface portion 334, and the other side surface portion 335 each extend downward from the four sides of the outer edge of the top surface portion 331. The one end surface portion 332 and the other end surface portion 333 face each other, and the one side surface portion 334 and the other side surface portion 335 face each other. A notch 333N is formed in the other end surface portion 333.

[0048] As described above, the support 320 has two cover mounting portions 325. The two cover mounting portions 325 are located at the upper end of the support 320. Screw holes are formed in each cover mounting portion 325. In the upper surface portion 331 of the cover member 330, through holes 331h are formed in two parts corresponding to the two cover mounting portions 325 of the support 320.

[0049] With multiple nozzles 310 attached to the support 320, multiple pipes 311 and 312 connected to the multiple nozzles 310, and the multiple pipes 311 and 312 fixed in place, a cover member 330 is attached to the support 320. Specifically, the two through holes 331h of the cover member 330 are positioned on the two cover mounting portions 325 of the support 320, and the cover member 330 is screwed to the support 320.

[0050] As a result, the portion of the support 320 from one end 321 to the vicinity of the other end 322 is covered from above and from the side by the cover member 330. Meanwhile, the remaining portion of the support 320 is pulled out through a notch 333N formed in the other end face 333 of the cover member 330. In this way, a portion of the support 320 is housed within the cover member 330. Furthermore, a portion of the multiple nozzles 310 supported by the support 320 is housed within the cover member 330. In addition, a portion of the multiple pipes 311, 312 supported by the support 320 is housed within the cover member 330. In Figure 5, the state of the cover member 330 when attached to the support 320 is shown by a dashed line.

[0051] Here, in the support 320, the pipe fixing portion 324 is located between the other end 322 of the support 320 and the other end face 333 of the cover member 330. The pipe fixing piece 329 bundles the multiple pipes 311 and 312 that extend from the cover member 330 and fixes them to the pipe fixing portion 324 so that they do not come into contact with the inner edge of the notch 333N of the other end face 333. As shown in Figure 6, with the cover member 330 attached to the support 320, most of each nozzle 310, excluding the fluid introduction portion 310a, protrudes downward from the cover member 330.

[0052] (5) Partition plate and cylindrical member Figure 7 is an external perspective view of the partition plate 100 and cylindrical member 200 of Figure 2. Figure 8 is a plan view of the partition plate 100 and cylindrical member 200 of Figure 2. As shown in Figures 7 and 8, the cylindrical member 200 has a cylindrical shape and is fixed to a part of the housing CA (Figure 1) via a bracket (not shown). The inner diameter of the cylindrical member 200 is larger than the outer diameter of the cylindrical wall portion 41 (Figure 3) of the cup 40. Furthermore, the cylindrical member 200 is positioned such that, in a plan view, the central axis of the cylindrical member 200 substantially coincides with the central axis of the cup 40. This allows, for example, when the cup 40 rises, the upper end of the cup 40 to be inserted into the cylindrical member 200 while preventing contact between the cup 40 and the cylindrical member 200.

[0053] The partition plate 100 has a substantially disc shape and is attached to the cylindrical member 200 near the upper end of the cylindrical member 200 and in contact with the entire inner circumferential surface of the cylindrical member 200. A rectangular nozzle opening 110 extending in a first direction D1 is formed in the approximate center of the partition plate 100. The nozzle opening 110 faces the central portion of the substrate W that is held by the substrate holding device 70 during the substrate W development process. As shown in Figure 7, a wall portion 111 is formed in the portion of the partition plate 100 where the nozzle opening 110 is formed, extending upward for a certain length (for example, about 5 mm to 10 mm) from the inner edge of the nozzle opening 110.

[0054] Furthermore, as shown in Figure 8, multiple through-holes H are formed in the partition plate 100 so as to be distributed throughout the entire partition plate 100, excluding the nozzle opening 110. The number and size of the multiple through-holes H formed in the partition plate 100 are determined considering the pressure relationship between the processing space and the non-processing space, which will be described later.

[0055] Regarding the arrangement of the multiple through-holes H, specifically, as shown by the dotted lines in Figure 8, concentric circles (multiple virtual circles vc1) with a predetermined pitch are defined with respect to the center 100C of the partition plate in a plan view. In this case, the multiple through-holes H are formed in a distributed manner so as to be arranged at equal intervals on each virtual circle vc1. Furthermore, the number of through-holes H formed on the largest virtual circle vc1 is greater than the number of through-holes H formed on the other virtual circles vc1. Also, in this example, only the largest virtual circle vc1 surrounds the entire nozzle opening 110. Therefore, the largest virtual circle vc1 has multiple through-holes H formed so as to be arranged at a constant interval across its entirety.

[0056] Furthermore, as shown by the thick dashed line in Figure 8, a virtual circle vc2 is defined with a radius of half the radius of the partition plate 100, centered at the partition plate center 100C. Here, if the area inside the virtual circle vc2 is defined as the central region A1 and the area outside the virtual circle vc2 is defined as the outer peripheral region A2, the number of through holes H formed in the outer peripheral region A2 is greater than the number of through holes H formed in the central region A1.

[0057] (6) Operation of the nozzle arm unit As described above, the nozzle arm unit 300 is attached to the rotation axis 401 of the nozzle drive unit 400. Therefore, when the motor of the nozzle drive unit 400 moves in the vertical direction, the nozzle arm unit 300 also moves in the vertical direction. Furthermore, when the motor of the nozzle drive unit 400 operates, the nozzle arm unit 300 rotates in the horizontal plane around the rotation axis 401. As a result, the multiple nozzles 310 of the nozzle arm unit 300 are held at a standby position P1 to the side of the substrate W, which is held by the substrate holding device 70, while development processing is not being performed on the substrate W. The multiple nozzles 310 are also held at a processing position P2 above the substrate W, which is held by the substrate holding device 70, while development processing is being performed on the substrate W. In Figure 2, the standby position P1 and the processing position P2 are indicated by white arrows, respectively.

[0058] Figures 9 to 12 illustrate the operation of the nozzle arm unit 300 when multiple nozzles 310 move between a standby position P1 and a processing position P2. In Figures 9 to 12, the state of the nozzle arm unit 300 and its surrounding components when multiple nozzles 310 move from the standby position P1 to the processing position P2 is shown in chronological order in external perspective views. Note that, as in the example in Figure 2, the illustration of the partition plate 100 shown in Figures 9 to 12 omits the depiction of multiple through holes H.

[0059] First, as shown in Figure 9, with the multiple nozzles 310 in standby position P1, the nozzle arm unit 300 is positioned to the side of the partition plate 100 and the cylindrical member 200 and held in a state extending parallel to the second direction D2. At this time, the nozzle arm unit 300 is positioned so that the injection portions 310c (Figure 6) of the multiple nozzles 310 are housed within the multiple standby holes 510 (Figure 10) of the standby pod 500.

[0060] When the nozzle drive unit 400 starts operating in the state shown in Figure 9, the nozzle arm unit 300 rises together with the rotation axis 401 to a height above the cylindrical member 200, as shown by the thick solid arrow in Figure 10. As a result, the jet portions 310c (Figure 6) of the multiple nozzles 310 are pulled out from the multiple standby holes 510 of the standby pod 500.

[0061] Next, the rotation axis 401 of the nozzle drive unit 400 rotates by a predetermined angle (90° in this example). As a result, the nozzle arm unit 300 rotates around the rotation axis 401, as shown by the thick solid arrow in Figure 11. This holds the nozzle arm unit 300 in a state where it extends parallel to the first direction D1. At this time, the nozzle arm unit 300 is positioned so that, in a plan view, the cover member 330 overlaps the nozzle opening 110 of the partition plate 100.

[0062] Next, the rotation shaft 401 of the nozzle drive unit 400 descends. As a result, the cover member 330 descends, as shown by the thick solid arrow in Figure 12. At this time, the height position of the nozzle arm unit 300 is adjusted so that the cover member 330 does not come into contact with the partition plate 100 but is close enough. This reduces the flow of gas through the nozzle opening 110. In this way, the nozzle opening 110 of the partition plate 100 is covered by the cover member 330, and the multiple nozzles 310 are held in the processing position P2.

[0063] The portions of the multiple pipes 311 and 312 extending outward from the nozzle arm unit 300 are movable parts that can be deformed in the form of expansion and contraction, bending or twisting in accordance with the movement or rotation of the nozzle arm unit 300. The movable portions of the multiple pipes 311 and 312 are covered by a protective tube 391. As shown in Figures 9 to 12, a fixing part 392 is provided inside the housing CA of Figure 1 for fixing a part of the protective tube 391 to a part of the housing CA (for example, the unit base).

[0064] According to the above configuration, the multiple pipes 311 and 312 located between the nozzle arm unit 300 and the fixed part 392 are bundled together in a deformable manner by the protective tube 391. Therefore, the handling of the multiple pipes 311 and 312 inside the housing CA in Figure 1 is improved. In addition, since the protective tube 391 is flexible, the degree of freedom of movement and rotation of the nozzle arm unit 300 is not restricted by the protective tube 391. The multiple pipes 311 and 312 bundled by the protective tube 391 are pulled out from the protective tube 391 near the fixed part 392 and connected to the fluid supply path 12 of the fluid supply unit 11 in Figure 1.

[0065] (7) Unit base Figure 13 is a plan view of the unit base. Figure 14 shows the liquid treatment units LPA and LPB supported by the unit base 600 of Figure 13. As shown in Figure 13, the unit base 600 includes a base plate 610 having a substantially rectangular shape. Two unit placement areas 620 are provided in the approximate center of the base plate 610, aligned in a first direction D1.

[0066] As shown in Figure 14, liquid processing units LPA and LPB are arranged in the two unit arrangement areas 620, respectively. In this state, the cup 40, container 50, substrate holding device 70, nozzle drive unit 400 (Figure 2), and standby pod 500 (Figure 2) in each of the liquid processing units LPA and LPB are supported by the base plate 610.

[0067] As described above, in each liquid processing unit LPA and LPB, the lower part of the spin motor 72 protrudes below the bottom 52 of the housing 50 (Figure 4). Therefore, as shown in Figure 13, a circular opening 621 is formed in each unit placement area 620. When each liquid processing unit LPA and LPB is placed in the corresponding unit placement area 620, the lower part of the spin motor 72 is housed within the opening 621. This prevents interference between the spin motor 72 and the base plate 610.

[0068] Furthermore, a fixing portion 392 corresponding to the liquid treatment unit LPA is provided near one corner of the base plate 610. A fixing portion 392 corresponding to the liquid treatment unit LPB is provided near the other corner of the base plate 610. In Figures 13 and 14, only the fixing portion 392 corresponding to the liquid treatment unit LPB is shown, and the fixing portion 392 corresponding to the liquid treatment unit LPA is omitted. The same applies to Figure 15, which will be described later.

[0069] The protective tube 391 is fixed on the unit base 600 by the fixing part 392, and the multiple pipes 311 and 312 (Figure 5) are bundled together by the protective tube 391. The downstream portions of the multiple pipes 311 and 312 bundled by the protective tube 391 are connected to multiple nozzles 310 (Figure 5). The upstream portions of the multiple pipes 311 and 312 are drawn out from the protective tube 391 and connected to the fluid supply path 12 (Figure 1) of the fluid supply unit 11 (Figure 1).

[0070] Furthermore, the unit base 600 is provided with exhaust ducts 20 corresponding to the liquid treatment units LPA and LPB, respectively. The exhaust from the exhaust pipes 61 (Figure 4) of each liquid treatment unit LPA and LPB is led through the corresponding exhaust ducts 20 to an exhaust device (not shown). The unit base 600 is also provided with drainage pipeline sections (not shown) corresponding to the liquid treatment units LPA and LPB, respectively. The drainage from the drain pipes 62 (Figure 4) of each liquid treatment unit LPA and LPB is led through the corresponding drainage pipeline sections to a drainage device (not shown).

[0071] (8) Exhaust duct As described above, two exhaust ducts 20 are provided to correspond to the liquid treatment units LPA and LPB, respectively. The two exhaust ducts 20 have basically the same configuration, except that they are provided symmetrically with respect to a plane (vertical plane) perpendicular to the first direction D1. Below, the configuration of the exhaust duct 20 corresponding to the liquid treatment unit LPB will be described as a representative example of the two exhaust ducts 20.

[0072] Figure 15 shows the exhaust duct 20 supported by the unit base 600 of Figure 13. Only some of the components of the liquid treatment units LPA and LPB are shown in Figure 15. Also in Figure 15, the outer edges of the cup 40 and container 50 of the liquid treatment unit LPB are indicated by dotted lines. As shown in Figure 15, the exhaust duct 20 includes exhaust pipe sections 21-24 and forms an exhaust passage for discharging gas from the cup 40.

[0073] The exhaust pipe section 21 extends in a first direction D1 and is located at a position spaced apart from the center of the liquid treatment unit LPB in a second direction D2. The exhaust pipe sections 22 and 23 extend in the second direction D2 and are located opposite each other, with the center of the liquid treatment unit LPB in between. The downstream end of the exhaust pipe section 22 is connected to the upstream end of the exhaust pipe section 21. The downstream end of the exhaust pipe section 22 is connected to the portion between the upstream and downstream ends of the exhaust pipe section 21. Elongated oval openings 22a and 23a are formed on the upper surfaces of the upstream ends of the exhaust pipe sections 22 and 23, respectively. The lower ends of the two exhaust pipes 61 (Figure 4) are inserted into the openings 22a and 23a, respectively.

[0074] The exhaust pipe section 24 extends in the second direction D2 and is provided near the end of the unit base 600 in the first direction D1. The upstream end of the exhaust pipe section 24 is connected to the downstream end of the exhaust pipe section 21. As a result, the connection between the downstream end of the exhaust pipe section 21 and the upstream end of the exhaust pipe section 24 becomes a bent section 25 that bends at a predetermined angle (90 degrees in this example). The downstream end of the exhaust pipe section 24 is connected to an exhaust device (not shown).

[0075] According to the above connection, the gas discharged from the two exhaust pipes 61 is introduced into the exhaust pipe sections 22 and 23 through openings 22a and 23a. The exhaust gas introduced into the exhaust pipe sections 22 and 23 flows from upstream to downstream through the exhaust pipe sections 21 and 24, as shown by the thick dashed lines in Figure 15. In this way, the exhaust gas is guided to the exhaust system.

[0076] Here, most of the exhaust pipe sections 21-24 are located below the cup 40 and container 50 of the liquid processing unit LPB. That is, most of the exhaust pipe sections 21-24 overlap with the cup 40 and container 50 of the liquid processing unit LPB in a plan view. Therefore, the footprint of the developing apparatus 1 (Figure 1) can be reduced. On the other hand, the bend 25 of the exhaust duct 20 does not overlap with the cup 40 and container 50 of the liquid processing unit LPB in a plan view.

[0077] Figure 16 is a partially enlarged perspective view showing the configuration around the bent portion 25 of the exhaust duct 20 shown in Figure 15. As shown in Figure 16, an opening 25a is formed on the upper surface of the bent portion 25. Within the bent portion 25, a mist capturing member 30 is positioned to overlap with the opening 25a.

[0078] The mist capturing member 30 is a plate that collects the mist component of the processing liquid and allows the gaseous component to pass through, and in this example has a substantially rectangular shape. The mist capturing member 30 may be a perforated plate, a mesh, or a filter. The mist capturing member 30 is positioned vertically. In a plan view, one end of the mist capturing member 30 is fixed near the inner corner of the bent portion 25, and the other end of the mist capturing member 30 is fixed near the outer corner of the bent portion 25.

[0079] A cover portion 26 is attached to the bent portion 25 so as to close the opening 25a. By closing the opening 25a with the cover portion 26, exhaust gas leakage from the opening 25a is prevented. Therefore, the cover portion 26 forms part of the exhaust flow path. In other words, the exhaust flow path is formed by the attachment of the cover portion 26 to the cover portion 26.

[0080] Preferably, at least a portion of the lid 26 is formed of a light-transmitting material. In this example, the lid 26 includes a light-transmitting portion 26a and a frame 26b. The light-transmitting portion 26a is formed of a light-transmitting material such as glass or transparent resin and is attached to the frame 26b. The frame 26b is formed of, for example, a metal material and is fixed to the bent portion 25 by a plurality of fixing members 27. This closes the opening 25a.

[0081] By positioning the mist capturing member 30 within the bent section 25, mist components of the processing liquid flowing through the exhaust duct 20 are collected. In this case, mainly the gaseous components of the processing liquid are guided downstream of the exhaust duct 20. This prevents the downstream portion of the exhaust duct 20 from being contaminated by mist components of the processing liquid. In particular, at the bent section 25, particles contained in the exhaust collide with the inner wall of the exhaust duct 20, making the mist components of the processing liquid more readily apparent. Therefore, mist components of the processing liquid flowing through the exhaust duct 20 can be efficiently collected.

[0082] If the mist capturing member 30 is used for a long period of time, maintenance such as replacement or cleaning of the mist capturing member 30 will be necessary. Even in this case, since the bent portion 25 does not overlap with the cup 40 and container 50 of the liquid processing unit LPB in a plan view, the user can easily access the bent portion 25. Therefore, the user can easily maintain the mist capturing member 30 by removing the lid portion 26. In this example, since the lid portion 26 is attached to the upper surface of the bent portion 25, the user can perform maintenance work from above. As a result, work efficiency is further improved.

[0083] Since the translucent portion 26a of the lid portion 26 is formed of a translucent material, the user can visually check the degree of contamination of the mist capturing member 30 through the translucent portion 26a without removing the lid portion 26. This allows the user to easily determine when maintenance of the mist capturing member 30 is required. In this example, the fixing member 27 is a screw, and the outer surface of the screw head is knurled. Therefore, the user can easily attach or detach the lid portion 26 to the bent portion 25 by manipulating the fixing member 27 without using any tools.

[0084] (9) The operation of the cup In the developing apparatus 1, the cup 40 is maintained in a first state when substrates W are loaded into and unloaded from the liquid processing units LPA and LPB. On the other hand, the cup 40 is maintained in a second state when the substrates W held by the substrate holding device 70 are being developed. The first and second states of the cup 40 will be described below.

[0085] Figure 17 is a schematic longitudinal cross-sectional view of the developing apparatus 1 when the cups 40 of the liquid processing units LPA and LPB are in the first state. Figure 18 is a schematic longitudinal cross-sectional view of the developing apparatus 1 when the cups 40 of the liquid processing units LPA and LPB are in the second state. In Figures 17 and 18, the nozzle arm unit 300 in standby position P1 is shown by a dotted line. Also, in Figures 17 and 18, some of the components of the liquid processing units LPA and LPB are not shown.

[0086] As shown in Figure 17, when the cup 40 is in the first state, it is located inside the container 50. That is, when the cup 40 is in the first state, it overlaps the container 50 in a side view and is separated from the cylindrical member 200. Therefore, when the cup 40 is in the first state, it is possible to access the substrate holding device 70 from the side of the cup 40 and the container 50. This allows the substrate W, which is brought in from outside the developing apparatus 1, to be placed on the suction holding section 71 of the liquid processing units LPA and LPB. Furthermore, the substrate W placed on the suction holding section 71 of the liquid processing units LPA and LPB can be removed and transported outside the developing apparatus 1.

[0087] The height (vertical dimension) of the cup 40 is set to be greater than the distance between the cylindrical member 200 and the container 50 in the vertical direction. As shown in Figure 18, when in the second state, the cup 40 overlaps the lower end of the cylindrical member 200 and the upper end of the container 50 in a side view. At this time, the upper end of the cup 40 and the inner circumferential surface near the lower end of the cylindrical member 200 are in close proximity. Also, the lower end of the cup 40 and the inner circumferential surface near the upper end of the container 50 are in close proximity.

[0088] (10) Processing space and unprocessed space During the development process of the substrate W, the cup 40 is held in a second state, and the multiple nozzles 310 of the nozzle arm unit 300 are positioned at the processing position P2. Figure 19 is a schematic longitudinal cross-sectional view of the development apparatus 1 during the development process of the substrate W. As shown in Figure 19, during the development process of the substrate W, the multiple nozzles 310 of each of the liquid processing units LPA and LPB are positioned at the processing position P2 (Figure 12), and the cover member 330 covers the nozzle opening 110 of the partition plate 100. As a result, the internal space SP of the housing CA is divided into a processing space SPa and a non-processing space SPb by the partition plate 100, cylindrical member 200, cover member 330, cup 40, and container 50 of the liquid processing units LPA and LPB. The processing space SPa is the space containing the substrate W held by the substrate holding device 70, and the non-processing space SPb is the space surrounding the processing space SPa.

[0089] As shown by the white arrows in Figure 19, clean air is continuously supplied from above to the untreated space SPb. In addition, a portion of the clean air supplied to the untreated space SPb is supplied to the treated space SPa through multiple through-holes H (Figure 8) in the partition plate 100. As a result, clean downward airflows are formed in the two treated spaces SPa and the untreated space SPb within the enclosure CA.

[0090] The inner surface of the liquid receiving portion 42 of the cup 40 that forms each processing space SPa surrounds the substrate W held by the substrate holding device 70 in a horizontal plane. As a result, most of the developer and rinse solution supplied to the substrate W from the multiple nozzles 310 during the substrate W development process is received by the inner surface of the liquid receiving portion 42 and guided to the container 50. On the other hand, splashes of developer or rinse solution that are not received by the liquid receiving portion 42 and scatter around the substrate W are guided to the container 50 by the downward airflow formed in the processing space SPa.

[0091] When the substrate W rotates within the processing space SPa by the substrate holding device 70, an upward airflow (upward airflow) may occur near the periphery of the substrate W, along the inner surface of the cup 40 and the cylindrical member 200. In this case, if the atmosphere containing splashes of developer or rinse solution rises within the processing space SPa, these splashes may adhere to the lower surface of the partition plate 100 and the inner surface of the cylindrical member 200. Furthermore, these splashes may re-adhere to the substrate W.

[0092] Therefore, as explained with reference to Figure 8, the partition plate 100 is manufactured such that, when concentric circles are defined on the substrate W, the number of through holes H formed on the largest virtual circle vc1 is greater than the number of through holes H formed on other virtual circles vc1. Furthermore, the partition plate 100 is manufactured such that multiple through holes H are distributed at regular intervals across the entire largest virtual circle vc1 surrounding the nozzle opening 110. Alternatively, when a central region A1 and an outer peripheral region A2 are defined on the partition plate 100, the number of through holes H formed in the outer peripheral region A2 is greater than the number of through holes H formed in the central region A1.

[0093] With the above configuration of the partition plate 100, in the processing space SPa, the amount of downdraft directed to the vicinity of the inner surface of the cup 40 can be made larger than the amount of downdraft directed to the central part of the substrate W. In particular, when multiple through holes H are distributed at regular intervals across the entire largest virtual circle vc1 surrounding the nozzle opening 110, a downdraft can be formed near the inner surface of the cup 40 over its entire circumference. As a result, the generation of an upward airflow near the inner surface of the cup 40 when the substrate W rotates is suppressed. Therefore, in the processing space SPa, the scattering of developer or rinse solution supplied to the substrate W upward near the outer edge of the substrate W is suppressed. As a result, the adhesion of developer or rinse solution droplets to the lower surface of the partition plate 100 and the inner surface of the cylindrical member 200 is suppressed. Furthermore, the re-adhesion of developer or rinse solution to the substrate W is suppressed.

[0094] 3. Configuration of the control unit of the developing device Figure 20 is a block diagram showing the configuration of the control unit 90 of the developing apparatus 1 in Figure 1. As shown in Figure 20, the control unit 90 includes a first lifting control unit 91, a fluid control unit 92, a first rotation control unit 93, a suction control unit 94, a second lifting control unit 95, and a second rotation control unit 96. The functions of each part of the control unit 90 in Figure 20 are realized, for example, by the CPU executing a predetermined program stored in memory.

[0095] The first lifting control unit 91 controls the operation of the lifting drive unit 49 of the liquid processing units LPA and LPB. As a result, the cups 40 of each liquid processing unit LPA and LPB transition between the first state and the second state. The fluid control unit 92 controls the operation of the two fluid supply units 11 in Figure 1. As a result, a mixed fluid of developer and gas is sprayed from some of the multiple nozzles 310 in each liquid processing unit LPA and LPB, and a mixed fluid of rinsing solution and gas is sprayed from the other nozzles 310.

[0096] The first rotation control unit 93 controls the operation of the spin motor 72 of the liquid processing units LPA and LPB in Figure 1. The suction control unit 94 controls the operation of the suction device 78 of the liquid processing units LPA and LPB in Figure 1. As a result, the substrate W is held in a horizontal position by suction in each substrate holding device 70 and rotated.

[0097] The second lifting control unit 95 and the second rotation control unit 96 control the operation of the nozzle drive unit 400 of the liquid processing units LPA and LPB in Figure 1. Specifically, the second lifting control unit 95 controls the operation of the actuator of each nozzle drive unit 400. The second rotation control unit 96 controls the operation of the motor having the rotation shaft 401 of each nozzle drive unit 400.

[0098] 4. Basic operation of the developing machine The basic operation of the developing apparatus 1 will now be explained. Figure 21 is a flowchart showing the basic operation of the developing apparatus 1 during the developing process of a substrate W. In the initial state, air with adjusted temperature and humidity is supplied to the developing apparatus 1 from the gas supply unit 10. In addition, the atmosphere inside the housing CA is guided from the exhaust pipe 61 of the liquid processing units LPA and LPB through the exhaust duct 20 to an exhaust device (not shown). A clean downward airflow is formed inside the housing CA. Furthermore, in the initial state, the cup 40 is assumed to be held in the first state. In addition, the multiple nozzles 310 are assumed to be held in the standby position P1.

[0099] Before the development process of the substrate W begins, the substrate W to be processed is first brought into the liquid processing units LPA and LPB. Also, as shown in Figure 17, the substrate W is placed on the suction holding section 71 of the substrate holding device 70. When the development process of the substrate W begins, the suction control unit 94 in Figure 20 controls the suction device 78 of the liquid processing units LPA and LPB so that the substrate W is adsorbed by the suction holding section 71 of the substrate holding device 70 (step S11).

[0100] Next, the first lifting control unit 91 in Figure 20 controls the lifting drive unit 49 of the liquid processing units LPA and LPB so that the cup 40 transitions from the first state to the second state (step S12).

[0101] Next, the second lifting control unit 95 and the second rotation control unit 96 in Figure 20 control the nozzle drive unit 400 of the liquid processing units LPA and LPB so that the multiple nozzles 310 move from the standby position P1 to the processing position P2 (step S13).

[0102] Next, the first rotation control unit 93 in Figure 20 controls the spin motors 72 of the liquid processing units LPA and LPB so that the substrate W rotates around the rotation axis 73 (step S14).

[0103] Next, the fluid control unit 92 in Figure 20 controls the fluid supply unit 11 of the liquid processing units LPA and LPB so that developer solution is supplied to the substrate W from some of the nozzles 310 for a predetermined time (step S15). Also, the fluid control unit 92 in Figure 20 controls the fluid supply unit 11 of the liquid processing units LPA and LPB so that rinse solution is supplied to the substrate W from the other nozzles 310 for a predetermined time (step S16).

[0104] Next, the first rotation control unit 93 in Figure 20 dries the substrate W by continuing to rotate it until a certain time has elapsed since the rinsing liquid supply was stopped. The first rotation control unit 93 in Figure 20 also controls the spin motors 72 of the liquid treatment units LPA and LPB so that the rotation of the substrate W stops after a certain time has elapsed since the rinsing liquid supply was stopped (step S17).

[0105] Next, the second lifting control unit 95 and the second rotation control unit 96 in Figure 20 control the nozzle drive unit 400 of the liquid processing units LPA and LPB so that the multiple nozzles 310 move from the processing position P2 to the standby position P1 (step S18).

[0106] Next, the first lifting control unit 91 in Figure 20 controls the lifting drive unit 49 of the liquid processing units LPA and LPB so that the cup 40 transitions from the second state to the first state (step S19).

[0107] Finally, the suction control unit 94 in Figure 20 controls the suction device 78 of the liquid processing units LPA and LPB so that the suction of the substrate W by the suction holding unit 71 of the substrate holding device 70 is released (step S20). This completes the development process of the substrate W. After development, the substrate W is discharged from the liquid processing units LPA and LPB.

[0108] 5. Effects In the developing apparatus 1 according to this embodiment, the gas in the cup 40 is discharged through an exhaust channel formed by the exhaust duct 20. Here, even if the processing liquid used for substrate processing is atomized into a mist inside the exhaust duct 20, the mist components are captured by the mist capturing member 30. Therefore, contamination of the inside of the exhaust duct 20 is prevented.

[0109] Furthermore, the opening 25a of the exhaust duct 20 is formed in a portion of the exhaust duct 20 that does not overlap with the cup 40 and the container 50 in a plan view. In addition, the mist capturing member 30 is provided in the exhaust duct 20 at a position that overlaps with the opening 25a. In this case, when removing the lid 26 that closes the opening 25a, it is not necessary to remove the cup 40 and the container 50. This allows the user to easily remove the lid 26 and maintain the mist capturing member 30. As a result, maintenance work on the developing device 1 can be performed efficiently.

[0110] Specifically, the opening 25a is formed in a bent portion 25 that does not overlap with the cup 40 and the container 50 in a plan view. The mist capturing member 30 is also provided within the bent portion 25. In this case, the opening 25a can be formed in a portion of the exhaust duct 20 that does not overlap with the cup 40 and the container 50 in a plan view, while preventing an increase in footprint. Furthermore, in the bent portion 25, particles contained in the exhaust collide with the inner wall of the exhaust duct 20, making the mist components of the processing liquid more readily apparent. Therefore, the mist components of the processing liquid flowing through the exhaust duct 20 can be efficiently captured by the exhaust duct 20.

[0111] The opening 25a is formed on the upper surface of the exhaust duct 20. In this case, the user can perform maintenance work from above. Therefore, work efficiency is further improved.

[0112] The lid 26 includes a light-transmitting portion 26a and a frame 26b. In this case, the user can visually check the degree of contamination of the mist capturing member 30 through the light-transmitting portion 26a of the lid 26 without removing the lid 26. This allows the user to easily determine when maintenance of the mist capturing member 30 is required. Furthermore, by fixing the frame 26b of the lid 26 to the exhaust duct 20 using the fixing member 27, the lid 26 can be easily attached to the exhaust duct 20.

[0113] 6. Other Embodiments (1) In the above embodiment, the opening 25a is formed in the bent portion 25, but the embodiment is not limited thereto. The opening 25a may be formed in any portion of the exhaust duct 20 that does not overlap with the cup 40 and the container 50 in a plan view. In this case, the exhaust duct 20 does not have to have the bent portion 25.

[0114] (2) In the above embodiment, the opening 25a is formed on the upper surface of the exhaust duct 20, but the embodiment is not limited thereto. The opening 25a may be formed on the side surface of the exhaust duct 20 or the like.

[0115] (3) In the above embodiment, a part of the lid portion 26 is formed of a light-transmitting material, but the embodiment is not limited thereto. The entire lid portion 26 may be formed of a light-transmitting material. On the other hand, in the exhaust duct 20, the degree of contamination of the mist-capturing member 30 can be confirmed by measuring the pressure in the portion downstream of the mist-capturing member 30. Therefore, if it is not necessary to visually confirm the degree of contamination of the mist-capturing member 30, the entire lid portion 26 may be formed of a non-light-transmitting material.

[0116] (4) In the above embodiment, the developing apparatus 1 includes a unit base 600, but the embodiment is not limited thereto. If the cup 40 and container 50 and the exhaust duct 20 are supported on separate bases, the developing apparatus 1 does not need to include a unit base 600.

[0117] (5) In the above embodiment, each liquid treatment unit LPA, LPB includes a container 50 surrounding the cup 40, but the embodiment is not limited thereto. Each liquid treatment unit LPA, LPB does not have to include a container 50. In this configuration, the opening 25a of the exhaust duct 20 should be formed in a portion of the exhaust duct 20 that does not overlap with the cup 40 in a plan view.

[0118] 7. Correspondence between each component of the claim and each part of the embodiment The following describes examples of the correspondence between each component of the claims and each part of the embodiments, but the present invention is not limited to the following examples. Various other elements having the configuration or function described in the claims can be used as each component of the claims.

[0119] In the above embodiment, cup 40 is an example of a cup, opening 25a is an example of an opening, exhaust duct 20 is an example of an exhaust duct, mist capturing member 30 is an example of a mist capturing member, and lid 26 is an example of a lid. Developing apparatus 1 is an example of a substrate processing apparatus, bent portion 25 is an example of a bent portion, light-transmitting portion 26a is an example of a light-transmitting portion, frame 26b is an example of a frame, unit base 600 is an example of a base portion, and container 50 is an example of a surrounding member.

[0120] 8. Summary of Embodiments (Paragraph 1) The substrate processing apparatus relating to Paragraph 1 is: A cup surrounding the substrate during processing using the processing solution, An exhaust duct having an opening in a portion that does not overlap with the cup in a plan view, and forming an exhaust passage for discharging gas from the cup, Within the exhaust duct, a mist capturing member is provided at a position overlapping with the opening to capture the mist components of the processing liquid, The exhaust duct comprises a cover portion that closes the opening of the exhaust duct.

[0121] In this substrate processing apparatus, the gas in the cup is discharged through an exhaust channel formed by an exhaust duct. Here, even if the processing liquid used for substrate processing turns into a mist inside the exhaust duct, the mist components are captured by a mist capturing member. Therefore, contamination of the inside of the exhaust duct is prevented.

[0122] Furthermore, the opening of the exhaust duct is formed in a portion of the exhaust duct that does not overlap with the cup in a plan view. In addition, the mist capturing member is provided within the exhaust duct at a position that overlaps with the opening. In this case, it is not necessary to remove the cup when removing the cover that closes the opening. This allows the user to easily remove the cover and maintain the mist capturing member. As a result, maintenance work on the substrate processing device can be performed efficiently.

[0123] (Paragraph 2) In the substrate processing apparatus described in Paragraph 1, The exhaust duct has a bent portion that does not overlap with the cup in the plan view, The opening is formed in the bent portion, The mist capturing member may be provided within the bent portion.

[0124] In this case, while preventing an increase in footprint, an opening can be formed in the exhaust duct portion that does not overlap with the cup in a plan view. Furthermore, at the bends, particles contained in the gas collide with the inner wall of the exhaust duct, making the mist components of the processing liquid more readily apparent. Therefore, the mist components of the processing liquid flowing through the exhaust duct can be efficiently captured by the exhaust duct.

[0125] (3) In the substrate processing apparatus described in paragraph 1 or 2, The opening may be formed on the upper surface of the exhaust duct.

[0126] In this case, the lid is attached to the top surface of the bent section, allowing the user to perform maintenance work from above. This improves work efficiency.

[0127] (Article 4) In the substrate processing apparatus described in any one of paragraphs 1 to 3, At least a portion of the lid may be formed from a light-transmitting material.

[0128] In this case, the user can visually check the degree of contamination of the mist-catching component through the translucent portion of the lid without removing the lid. This allows the user to easily determine when maintenance of the mist-catching component is required.

[0129] (Item 5) In the substrate processing apparatus described in Item 4, The aforementioned lid portion is The light-transmitting portion formed by the light-transmitting member, The system may also include a frame to which the light-transmitting portion is attached.

[0130] In this case, the capture component can be easily inspected while also making it easier to attach the cover to the exhaust duct.

[0131] (Paragraph 6) In the substrate processing apparatus described in any one of paragraphs 1 to 5, The lid portion may form part of the exhaust passage.

[0132] In this case, an exhaust passage can be formed by attaching the lid to the exhaust duct.

[0133] (Paragraph 7) The substrate processing apparatus described in any one of paragraphs 1 to 6 is: The cup and the exhaust duct may be further provided with a base portion that supports them.

[0134] In this case, the cup and exhaust duct can be easily supported.

[0135] (Paragraph 8) The substrate processing apparatus described in any one of paragraphs 1 to 7 is: The cup is further provided with a surrounding member that surrounds the periphery of the cup, The opening may be formed in a portion of the exhaust duct that does not overlap with the surrounding member in the plan view.

[0136] With this configuration, even if a surrounding member is provided around the cup, it is not necessary to remove the surrounding member when removing the lid that closes the opening. Therefore, maintenance work on the substrate processing device can be performed efficiently. [Explanation of symbols]

[0137] 1…Developing device, 1w…First side wall plate, 2w…Second side wall plate, 3w…Third side wall plate, 4w…Fourth side wall plate, 5w…Floor plate, 6w…Ceiling plate, 10…Gas supply unit, 11…Fluid supply unit, 12…Fluid supply path, 20…Exhaust duct, 21~24…Exhaust pipe section, 22a, 23a, 25a, op1…Opening, 25…Bend, 26…Lid, 26a…Light-transmitting section, 26b…Frame, 27…Fixing member, 30…Mist capturing member, 40…Cup, 41…Cylindrical wall section, 42…Liquid receiving section, 49…Lifting drive unit ,50…Housing,51…Side wall,52…Bottom,61…Exhaust pipe,62…Drainage pipe,70…Substrate holding device,71…Suction holding part,72…Spin motor,73…Rotation shaft,78…Suction device,79…Motor cover,90…Control unit,91…First lifting control unit,92…Fluid control unit,93…First rotation control unit,94…Suction control unit,95…Second lifting control unit,96…Second rotation control unit,100…Partition plate,100C…Center of partition plate,110…Nozzle opening,111…Wall,200…Cylindrical member,30 0...Nozzle arm unit, 310...Nozzle, 310a, 310b...Fluid introduction section, 310c...Injection section, 320...Support, 321...One end, 322...Other end, 323...Nozzle fixing section, 324...Pipe fixing section, 325...Cover mounting section, 329...Pipe fixing piece, 330...Cover member, 331...Top surface, 331h...Through hole, 332...One end surface, 333...Other end surface, 333N...Notch, 334...One side surface, 335...Other side surface, 391...Protective tube, 392...Fixing section, 4 00…Nozzle drive unit, 401…Rotation shaft, 500…Standby pod, 510…Standby hole, 600…Unit base, 610…Base plate, 620…Unit placement area, A1…Central area, A2…Outer perimeter area, CA…Housing, DU…Air supply duct, FL…Filter, H…Through hole, LPA, LPB…Liquid processing unit, ph…Input / Output port, SP…Internal space, SPa…Processing space, SPb…Non-processing space, SS…Support surface, P1…Standby position, P2…Processing position, vc1, vc2…Virtual circle, W…Substrate

Claims

1. A cup surrounding the substrate during processing using the processing solution, An exhaust duct having an opening in a portion that does not overlap with the cup in a plan view, and forming an exhaust passage for discharging gas from the cup, Within the exhaust duct, a mist capturing member is provided at a position overlapping with the opening to capture the mist components of the processing liquid, The exhaust duct comprises a cover portion that closes the opening, The exhaust duct has a bent portion that does not overlap with the cup in the plan view, The opening is formed in the bent portion, The mist capturing member is provided within the bent portion of the substrate processing apparatus.

2. The substrate processing apparatus according to claim 1, wherein the opening is formed on the upper surface of the exhaust duct.

3. The substrate processing apparatus according to claim 1 or 2, wherein at least a portion of the lid is formed of a light-transmitting material.

4. The aforementioned lid portion is The light-transmitting portion formed by the light-transmitting member, The substrate processing apparatus according to claim 3, further comprising a frame to which the light-transmitting portion is attached.

5. The substrate processing apparatus according to claim 1 or 2, wherein the lid portion forms a part of the exhaust passage.

6. The substrate processing apparatus according to claim 1 or 2, further comprising a base portion that supports the cup and the exhaust duct.

7. The cup is further provided with a surrounding member that surrounds the periphery of the cup, The substrate processing apparatus according to claim 1 or 2, wherein the opening is formed in a portion of the exhaust duct that does not overlap with the surrounding member in the plan view.

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