Protective film forming film, composite sheet for protective film forming, first kit, second kit, use of protective film forming film, and use of second kit

Abstract

To provide an energy ray-curable protective film-forming film which is excellent in near-infrared shielding properties and in which, when a protective film-forming film is cured with energy rays, peeling of a formed protective film is suppressed, so that excellent reliability can be achieved.SOLUTION: Provided is a protective film-forming film (13) in which a first protective film-forming layer (131) that is energy ray curable and has near-infrared shielding properties, and a second protective film-forming layer (132) that is energy ray curable and has a higher transmittance of a near-infrared ray with a wavelength of 1,300 nm than the first protective film-forming layer (131) are laminated in the order. The protective film-forming film (13) has a transmittance of a near-infrared ray with a wavelength of 1,300 nm of 5% or less, the first protective film-forming layer (131) has a thickness of 5 μm or more and 15 μm or less, and the second protective film-forming layer (132) has a thickness of 1 μm or more.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a protective film-forming film, a composite sheet for forming a protective film, a first kit, a second kit, the use of the protective film-forming film, and the use of the second kit. [Background technology]

[0002] Semiconductor wafers and insulating wafers have circuits formed on one side (the circuit side), and some of these wafers also have protruding electrodes such as bumps on that side (the circuit side). Such wafers are divided into chips, and the protruding electrodes are connected to connection pads on the circuit board by a so-called face-down method, thereby mounting them on the circuit board. In such wafers and chips, the side opposite the circuit surface (the back side) is sometimes protected with a protective film to suppress damage such as crack formation.

[0003] To form such a protective film, a protective film-forming film is attached to the back surface of the wafer. The protective film-forming film is laminated on a support sheet and may be used as a composite sheet for protective film formation, or it may be used without being laminated on a support sheet. After laser marking the protective film-forming film, the semiconductor wafer is divided into chips by dicing, and then picked up, after curing with heat or energy rays as necessary to enhance the protective performance of the protective film-forming layer. Alternatively, the protective film formed by curing the protective film-forming film with heat or energy rays is laser marked, and then the semiconductor wafer is divided into chips by dicing and picked up. Next, the picked-up semiconductor chips with protective films are flip-chip connected to connection pads on a circuit board such as a motherboard, and the protruding electrodes on the chips with protective films are melted by heating the circuit board (hereinafter referred to as the reflow process), strengthening the electrical connection between the protruding electrodes and the connection pads on the circuit board, and then mounted on the circuit board.

[0004] Some protective film-forming films are non-curable, meaning they do not harden and function as protective films in their current state. When using non-curable protective film-forming films, a hardening process is unnecessary, allowing for the manufacture of chips with protective films at a simplified and low-cost method. On the other hand, when using curable protective film-forming films, the hardened material serves as the protective film, offering the advantage of high wafer protection. Furthermore, while thermosetting protective film-forming films, which harden by heating, require a relatively long heating period for hardening, energy-ray curable protective film-forming films, which harden by energy ray irradiation, have the advantage of requiring only a short energy ray irradiation period for hardening. Therefore, various developments of energy-ray curable protective film-forming films are underway (see Patent Documents 1-3). [Prior art documents] [Patent Documents]

[0005] [Patent Document 1] Japanese Patent Publication No. 2010-031183 [Patent Document 2] International Publication No. 2017 / 188197 [Patent Document 3] International Publication No. 2019 / 082977 [Overview of the project] [Problems that the invention aims to solve]

[0006] Semiconductor devices may malfunction when exposed to near-infrared light. By using a protective film containing inorganic pigments as a coloring agent, it is possible to reduce both light transmittance and near-infrared light transmittance. However, in conventional energy-ray curable protective film-forming films, if inorganic pigments are included to reduce the transmittance of near-infrared light, the curing of the protective film-forming film when irradiated with energy rays tends to be insufficient, which may lead to a lack of reliability in its function as a protective film.

[0007] The present invention aims to provide an energy-ray curable protective film-forming film that exhibits excellent near-infrared shielding properties and, when the protective film-forming film is cured with energy rays, suppresses peeling of the formed protective film and provides excellent reliability, as well as a protective film-forming composite sheet, a first kit, a second kit, the use of the protective film-forming film, and the use of the second kit. [Means for solving the problem]

[0008] The present invention has the following aspects. [1] A protective film-forming film comprising a first protective film-forming layer which is energy-curable and has near-infrared shielding properties, and a second protective film-forming layer which is energy-curable and has a higher transmittance of near-infrared rays with a wavelength of 1300 nm than the first protective film-forming layer, laminated in this order, The protective film has a near-infrared transmittance of 5% or less at a wavelength of 1300 nm. The thickness of the first protective film forming layer is 5 μm or more and 15 μm or less. A protective film-forming film in which the thickness of the second protective film-forming layer is 1 μm or more. [2] The protective film forming film according to [1], wherein the first protective film forming layer contains an inorganic pigment as a coloring agent. [3] A composite sheet for forming a protective film, comprising a support sheet and a protective film forming film provided on one surface of the support sheet, The protective film forming film is the protective film forming film described in [1] or [2], A composite sheet for forming a protective film, wherein the support sheet, the second protective film forming layer, and the first protective film forming layer are laminated in this order. [4] A first kit comprising a first laminate in which a first release film and a protective film forming film are laminated in this order, and a support sheet used to support a workpiece to which the protective film forming film is to be attached and the protective film forming film, The first kit, wherein the protective film forming film is the protective film forming film described in [1] or [2]. [5] A second laminate in which a third release film and a first protective film forming layer that is energy ray curable and has near infrared ray shielding properties are laminated in this order, and a fifth release film and a second protective film forming layer that is energy ray curable and has a higher transmittance of near infrared rays with a wavelength of 1300 nm than that of the first protective film forming layer are laminated in this order. A second kit comprising: The protective film forming film formed by laminating the first protective film forming layer and the second protective film forming layer has a near infrared ray transmittance of 5% or less at a wavelength of 1300 nm. The thickness of the first protective film forming layer is 5 μm or more and 15 μm or less. The second kit, wherein the thickness of the second protective film forming layer is 1 μm or more. [6] Use of a protective film forming film for forming a protective film on a surface opposite to the circuit surface of a semiconductor wafer or a semiconductor chip. Use of the protective film forming film, wherein the protective film forming film is the protective film forming film described in [1] or [2]. [7] Use of a second kit for forming a protective film on a surface opposite to the circuit surface of a semiconductor wafer or a semiconductor chip. The protective film forming film is formed by laminating the first protective film forming layer and the second protective film forming layer. Use of the second kit, wherein the second kit is the second kit described in [5]. A

Advantages of the Invention

[0009] According to the present invention, there are provided a protective film forming film that is energy ray curable, has excellent near infrared ray shielding properties, and suppresses peeling of the formed protective film and has excellent reliability when the protective film forming film is energy ray cured, a composite sheet for forming a protective film including the same, a first kit, and a second kit, use of the protective film forming film, and use of the second kit.

Brief Description of the Drawings

[0010] [Figure 1]It is a cross-sectional view schematically showing an example of a protective film forming film according to an embodiment of the present invention. [Figure 2] It is a cross-sectional view schematically showing an example of a composite sheet for forming a protective film according to an embodiment of the present invention. [Figure 3] It is a cross-sectional view schematically showing another example of a composite sheet for forming a protective film according to an embodiment of the present invention. [Figure 4] It is a cross-sectional view schematically showing still another example of a composite sheet for forming a protective film according to an embodiment of the present invention. [Figure 5] It is a cross-sectional view schematically showing still another example of a composite sheet for forming a protective film according to an embodiment of the present invention. [Figure 6] It is a cross-sectional view schematically showing an example of a first kit according to an embodiment of the present invention. [Figure 7] It is a cross-sectional view schematically showing an example of a second kit according to an embodiment of the present invention. [Figure 8] It is a cross-sectional view schematically showing another example of a second kit according to an embodiment of the present invention. [Figure 9] It is a cross-sectional view for schematically explaining an example of a method for manufacturing a chip with a protective film according to an embodiment of the present invention. [Figure 10] It is a cross-sectional view for schematically explaining another example of a method for manufacturing a chip with a protective film according to an embodiment of the present invention.

Mode for Carrying Out the Invention

[0011] ◇Protective Film Forming Film The protective film forming film according to an embodiment of the present invention is a protective film forming film in which a first protective film forming layer that is energy ray curable and has near infrared ray shielding properties and a second protective film forming layer that is energy ray curable and has a higher transmittance of near infrared rays with a wavelength of 1300 nm than that of the first protective film forming layer are laminated in this order. The protective film forming film has a near infrared ray transmittance with a wavelength of 1300 nm of 5% or less, the thickness of the first protective film forming layer is 5 μm or more and 15 μm or less, and the thickness of the second protective film forming layer is 1 μm or more.

[0012] The protective film-forming film of this embodiment is a film used to protect a chip by providing a protective film to the chip.

[0013] By using the protective film-forming film of this embodiment, or a composite sheet for forming a protective film equipped therewith, a chip with a protective film can be manufactured, comprising a chip and a protective film provided on the back surface of the chip. The aforementioned chip with a protective film can be manufactured, for example, by attaching a protective film-forming film to the back surface of a wafer, forming a protective film by curing the protective film-forming film, dividing the wafer into chips, and cutting the protective film along the outer circumference of the chips.

[0014] In this specification, "wafer" refers to semiconductor wafers composed of elemental semiconductors such as silicon, germanium, and selenium, or compound semiconductors such as GaAs, GaP, InP, CdTe, ZnSe, and SiC; and insulating wafers composed of insulators such as sapphire, glass, lithium niobate, and lithium tantalate. A circuit is formed on one side of these wafers, and in this specification, the side of the wafer on which the circuit is formed is referred to as the "circuit side." The side of the wafer opposite to the circuit side is referred to as the "back side." A wafer is divided into chips by means of dicing or other methods. In this specification, as with the wafer, the side of the chip on which the circuit is formed is referred to as the "circuit side," and the side of the chip opposite the circuit side is referred to as the "back side." Both the circuit surface of the wafer and the circuit surface of the chip are provided with protruding electrodes such as bumps and pillars. Preferably, these protruding electrodes are made of solder.

[0015] Furthermore, by using the aforementioned protective film-coated chip, a substrate device can be manufactured. In this specification, "substrate device" means a device configured such that a chip with a protective film is flip-chip connected to a connection pad on a circuit board at a protruding electrode on its circuit surface. For example, if a semiconductor wafer is used as the wafer, a semiconductor device can be considered a substrate device.

[0016] The protective film-forming film of this embodiment may be energy-ray curable and also thermosetting, or it may not be thermosetting. When the protective film-forming film of this embodiment has both energy-ray curable and thermosetting properties, the contribution of energy-ray curing of the protective film-forming film to the formation of the protective film is greater than the contribution of thermosetting.

[0017] In this specification, "energy beam" means an electromagnetic wave or charged particle beam that has an energy quantum. Examples of energy beams include ultraviolet rays, radiation, and electron beams. Ultraviolet rays can be irradiated, for example, by using high-pressure mercury lamps, fusion lamps, xenon lamps, black lights, or LED lamps as ultraviolet light sources. Electron beams can be irradiated using those generated by electron accelerators, etc. In this specification, "energy ray curable" means the property of hardening when irradiated with energy rays, and "non-energy ray curable" means the property of not hardening even when irradiated with energy rays. Furthermore, "non-curable" means that it does not harden by any means, such as heating or irradiation with energy rays.

[0018] The curing conditions when forming a protective film by energy ray curing of the protective film-forming film are not particularly limited as long as the degree of curing is sufficient for the protective film to fully perform its function, and can be appropriately selected depending on the type of protective film-forming film. For example, the illuminance of the energy rays during the energy ray curing of an energy ray-curable protective film is 60-320 mW / cm². 2 It is preferable that the amount of energy rays during curing is 100 to 1000 mJ / cm². 2It is preferable that this be the case.

[0019] The near-infrared transmittance of the protective film-forming film in this embodiment at a wavelength of 1300 nm is 5% or less. The near-infrared transmittance of the protective film-forming film at a wavelength of 1300 nm can be measured, for example, using a commercially available ultraviolet-visible-near-infrared spectrophotometer, when the first protective film-forming layer and the second protective film-forming layer are laminated together.

[0020] The near-infrared transmittance of the protective film-forming film of this embodiment at a wavelength of 1300 nm is 5% or less. To further improve the near-infrared shielding effect, the near-infrared transmittance at a wavelength of 1300 nm is preferably 4% or less, more preferably 3% or less, and even more preferably 2% or less. The near-infrared transmittance of the protective film at a wavelength of 1300 nm may be 0.04% or higher, or 0.1% or higher.

[0021] The protective film-forming film of this embodiment is constructed by laminating, in this order, a first protective film-forming layer that is energy-curable and has near-infrared shielding properties, and a second protective film-forming layer that is energy-curable and has a higher transmittance of near-infrared rays with a wavelength of 1300 nm than the first protective film-forming layer.

[0022] The first protective film-forming layer is not limited to any layer having energy ray curability and near-infrared shielding properties. The first protective film-forming layer has the effect of reducing the near-infrared transmittance of the protective film-forming film at a wavelength of 1300 nm to 5% or less. Examples of the first protective film forming layer include one containing an energy ray curable component (a), an acrylic resin (b) that does not have an energy ray curable group, and an inorganic pigment as a coloring agent.

[0023] The first protective film-forming layer may consist of one layer (single layer) or of two or more layers. When the protective film-forming film consists of multiple layers, these layers may be identical or different from each other, and the combination of these layers is not particularly limited.

[0024] In this specification, not only in the case of the first protective film forming layer, "multiple layers may be identical or different from one another" means "all layers may be identical, all layers may be different, or only some layers may be identical," and further, "multiple layers are different from one another" means "at least one of the constituent materials and thickness of each layer is different from the other."

[0025] The thickness of the first protective film-forming layer is 5 μm or more and 15 μm or less, preferably 5 μm or more and 10 μm or less. When the thickness of the first protective film-forming layer is greater than or equal to the lower limit, a protective film with higher near-infrared shielding ability can be formed. When the thickness of the first protective film-forming layer is less than or equal to the upper limit, excessive shielding of energy rays is prevented, and when the protective film-forming film is cured with energy rays, peeling of the formed protective film is suppressed and reliability is improved. Here, "thickness of the first protective film forming layer" refers to the total thickness of the first protective film forming layer. For example, the thickness of a first protective film forming layer consisting of multiple layers refers to the total thickness of all the layers that make up the first protective film forming layer. In this specification, "thickness" can be determined by the method specified in JIS K 7130:1999 (ISO 4593:1993).

[0026] The second protective film-forming layer is energy-ray curable and has higher near-infrared transmittance at a wavelength of 1300 nm than the first protective film-forming layer. Examples of the second protective film-forming layer include one containing an energy-ray-curable component (a) and an acrylic resin (b) that does not have energy-ray-curable groups. The second protective film-forming layer may also contain an inorganic pigment as a coloring agent.

[0027] The second protective film-forming layer may consist of one layer (single layer) or of two or more layers. If the second protective film-forming layer consists of multiple layers, these layers may be identical or different, and the combination of these layers is not particularly limited. The protective film may consist of two layers, a first protective film forming layer and a second protective film forming layer, or it may consist of three or more layers.

[0028] The thickness of the second protective film forming layer is 1 μm or more, preferably 1 μm to 100 μm, more preferably 3 μm to 80 μm, and particularly preferably 5 μm to 60 μm. A thickness of the second protective film forming layer equal to or greater than the lower limit allows for the formation of a protective film with higher protective capabilities. A thickness of the second protective film forming layer equal to or less than the upper limit prevents the thickness of the protective film-coated chip from becoming excessive.

[0029] The thickness of the protective film is preferably 6 μm to 100 μm, more preferably 8 μm to 80 μm, and particularly preferably 10 μm to 60 μm. A protective film with a thickness equal to or greater than the lower limit provides a protective film with higher protective capabilities. A protective film with a thickness equal to or less than the upper limit avoids the protective film-coated chip becoming excessively thick.

[0030] In this embodiment, the protective film forming film preferably has a curing rate difference of 80% or less, as measured by the curing rate difference measurement method described below.

[0031] <Method for measuring the difference in hardening rate> Regarding the protective film forming film, the illuminance is 220 mW / cm². 2 , light intensity 500mJ / cm 2 Under these conditions, ultraviolet light is irradiated from the side of the second protective film forming layer to produce the protective film forming film after ultraviolet irradiation.

[0032] Using a Fourier transform infrared spectrometer, FT-IR measurements were performed on the side of the protective film-forming film facing the second protective film-forming layer (the side irradiated with ultraviolet light) before and after ultraviolet irradiation, at an incident angle of 45°, using the diamond ATR method. Wavenumber 790 cm⁻¹ -1After normalizing the peak intensity of nearby peaks to 1.5 Abs to correct spectral shifts, the protective film-forming film before and after UV irradiation was analyzed at a wavenumber of 810 cm⁻¹. -1 The change in peak intensity of the nearby peaks is calculated using the following formula (1), and this is taken as the curing rate [%] of the side of the protective film-forming film that was irradiated with ultraviolet light.

[0033] Next, FT-IR measurements are performed on the side of the protective film-forming film on the side of the first protective film-forming layer (the side opposite to the side irradiated with ultraviolet light) before and after ultraviolet irradiation, under the same conditions as above. Wavenumber 790 cm⁻¹ -1 After normalizing the peak intensity of nearby peaks to 1.5 Abs to correct spectral shifts, the protective film-forming film before and after UV irradiation was analyzed at a wavenumber of 810 cm⁻¹. -1 The change in peak intensity of the nearby peaks is calculated using the following formula (1), and this is taken as the curing rate [%] of the protective film on the side opposite to the side irradiated with ultraviolet light.

[0034] Next, the difference between the curing rate of the side of the protective film-forming film that was irradiated with ultraviolet light and the curing rate of the side opposite to the side that was irradiated with ultraviolet light is calculated using the following formula (2), and this is defined as the curing rate difference [%] of the protective film-forming film.

[0035] Hardening rate [%] = {(Peak intensity before UV irradiation - Peak intensity after UV irradiation) / Peak intensity before UV irradiation} × 100 ... (1) Curing rate difference [%] = Curing rate of the side of the protective film irradiated with ultraviolet light - Curing rate of the side of the protective film irradiated with ultraviolet light ... (2)

[0036] By ensuring that the curing rate difference calculated by equation (2) is 80% or less, when the protective film forming film is energy-ray cured from the side of the second protective film forming layer, it is possible to prevent the second protective film forming layer of the protective film from not curing sufficiently and making the protective film prone to peeling.

[0037] In the protective film forming film of this embodiment, the curing rate difference calculated by formula (2) is preferably 80% or less, and more preferably 75% or less, in order to sufficiently cure the first protective film forming layer of the protective film forming film and more effectively prevent peeling of the protective film.

[0038] The components of the first protective film forming layer and the second protective film forming layer will be described in detail later.

[0039] <<Composition for forming protective film>> The first protective film-forming layer and the second protective film-forming layer can each be formed using an energy-ray curable protective film-forming composition (which may be simply referred to as "protective film-forming composition" in this specification) containing their constituent materials. For example, the first protective film-forming layer can be formed by coating the surface to be formed with a protective film-forming composition containing an energy-ray curable component (a), an acrylic resin (b) that does not have energy-ray curable groups, and an inorganic pigment as a coloring agent, and drying it as necessary. For example, the second protective film-forming layer can be formed by coating the surface to be formed with a protective film-forming composition that does not contain an inorganic pigment as a coloring agent, or contains a smaller amount of it, and drying it as necessary.

[0040] In a protective film-forming composition, the ratio of components that do not vaporize at room temperature is usually the same as the ratio of those components in the first or second protective film-forming layer that is formed. In this specification, "room temperature" means a temperature that is not particularly cooled or heated, i.e., a normal temperature, such as 18 to 28°C.

[0041] The coating of the protective film-forming composition can be carried out by known methods, such as using various coaters including air knife coaters, blade coaters, bar coaters, gravure coaters, roll coaters, roll knife coaters, curtain coaters, die coaters, knife coaters, screen coaters, Meyer bar coaters, and kiss coaters.

[0042] The drying conditions for the protective film-forming composition are not particularly limited. However, if the protective film-forming composition contains a solvent as described later, it is preferable to heat-dry it. For example, a protective film-forming composition containing a solvent is preferably heat-dried at 70 to 130°C for 10 seconds to 5 minutes. However, for a thermosetting protective film-forming composition, it is preferable to heat-dry it in such a way that neither the composition itself nor the first or second protective film-forming layer formed from it becomes thermosetting.

[0043] <Energy-ray curable protective film forming composition (IV)> Examples of preferred protective film-forming compositions include, for example, an energy-ray-curable protective film-forming composition (IV) (which may be simply referred to as "composition (IV)" in this specification) containing the energy-ray-curable component (a), an acrylic resin (b) that does not have the energy-ray-curable group, and the inorganic filler (d).

[0044] [Energy ray curing component (a)] The energy-ray curable component (a) is a component that hardens upon irradiation with energy rays. It imparts film-forming properties and flexibility to the first and second protective film-forming layers, and also forms a hard protective film after hardening. The first and second protective film-forming layers form protective films with good properties by containing the energy-ray curable component (a). In the first protective film forming layer and the second protective film forming layer, the energy ray curable component (a) is preferably uncured, preferably tacky, and more preferably both uncured and tacky.

[0045] Examples of the energy-ray curable component (a) include a polymer (a1) having an energy-ray curable group and a weight-average molecular weight of 80,000 to 2,000,000, and a compound (a2) having an energy-ray curable group and a molecular weight of 100 to 80,000. The polymer (a1) may be at least partially crosslinked with a crosslinking agent, or it may not be crosslinked.

[0046] (a1) A polymer having energy-ray curable groups and a weight-average molecular weight of 80,000 to 2,000,000. Examples of polymers (a1) having energy-ray curable groups and a weight-average molecular weight of 80,000 to 2,000,000 include an acrylic resin (a1-1) obtained by reacting an acrylic polymer (a11) having a functional group that can react with a group that has been found in other compounds with an energy-ray curable compound (a12) having a group that reacts with the functional group and an energy-ray curable group such as an energy-ray curable double bond.

[0047] In this specification, "weight-average molecular weight" refers to the polystyrene equivalent value measured by gel permeation chromatography (GPC) unless otherwise specified.

[0048] Examples of functional groups that can react with groups of other compounds include hydroxyl groups, carboxyl groups, amino groups, substituted amino groups (groups having a structure in which one or two hydrogen atoms of an amino group are replaced by a group other than a hydrogen atom), and epoxy groups. However, in terms of preventing corrosion of circuits such as wafers and chips, it is preferable that the functional group is a group other than a carboxyl group. Among these, the functional group is preferably a hydroxyl group.

[0049] • Acrylic polymer having functional groups (a11) Examples of the acrylic polymer (a11) having the functional group include those obtained by copolymerizing an acrylic monomer having the functional group with an acrylic monomer not having the functional group, and those obtained by copolymerizing monomers other than acrylic monomers (non-acrylic monomers) in addition to these monomers. Furthermore, the acrylic polymer (a11) may be a random copolymer or a block copolymer, and known polymerization methods can also be employed.

[0050] Examples of acrylic monomers having the functional group include hydroxyl group-containing monomers, carboxyl group-containing monomers, amino group-containing monomers, substituted amino group-containing monomers, epoxy group-containing monomers, and the like.

[0051] Examples of the hydroxyl group-containing monomers include hydroxyalkyl (meth)acrylates such as hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate; and non-(meth)acrylic unsaturated alcohols (unsaturated alcohols that do not have a (meth)acryloyl skeleton) such as vinyl alcohol and allyl alcohol.

[0052] Examples of the carboxyl group-containing monomers include ethylenically unsaturated monocarboxylic acids (monocarboxylic acids having an ethylenically unsaturated bond) such as (meth)acrylic acid and crotonic acid; ethylenically unsaturated dicarboxylic acids (dicarboxylic acids having an ethylenically unsaturated bond) such as fumaric acid, itaconic acid, maleic acid, and citraconic acid; anhydrides of the ethylenically unsaturated dicarboxylic acids; and carboxyalkyl esters of (meth)acrylic acid such as 2-carboxyethyl methacrylate.

[0053] The acrylic monomer having the aforementioned functional group is preferably a monomer containing a hydroxyl group.

[0054] The acrylic polymer (a11) may consist of only one acrylic monomer having the functional group, or it may consist of two or more types. If there are two or more types, their combination and ratio can be arbitrarily selected.

[0055] Examples of acrylic monomers that do not have the aforementioned functional groups include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n-octyl (meth)acrylate, n-nonyl (meth)acrylate, and i Examples of alkyl esters include sononyl, decyl (meth)acrylate, undecyl (meth)acrylate, dodecyl ((meth)acrylate) (lauryl (meth)acrylate), tridecyl (meth)acrylate, tetradecyl ((meth)acrylate) (myristyl (meth)acrylate), pentadecyl (meth)acrylate, hexadecyl ((meth)acrylate) (palmityl (meth)acrylate), heptadecyl (meth)acrylate, octadecyl ((meth)acrylate) (stearyl (meth)acrylate), etc., in which the alkyl group constituting the alkyl ester has a chain structure with 1 to 18 carbon atoms.

[0056] Furthermore, examples of acrylic monomers that do not have the aforementioned functional groups include alkoxyalkyl group-containing (meth)acrylic acid esters such as methoxymethyl (meth)acrylate, methoxyethyl (meth)acrylate, ethoxymethyl (meth)acrylate, and ethoxyethyl (meth)acrylate; aromatic group-containing (meth)acrylic acid esters such as aryl (meth)acrylate such as phenyl (meth)acrylate; non-crosslinked (meth)acrylamides and their derivatives; and non-crosslinked (meth)acrylic acid esters having tertiary amino groups such as N,N-dimethylaminoethyl (meth)acrylate and N,N-dimethylaminopropyl (meth)acrylate.

[0057] The acrylic polymer (a11) may consist of only one acrylic monomer that does not have the functional group, or it may consist of two or more types. If there are two or more types, their combination and ratio can be arbitrarily selected.

[0058] Examples of the non-acrylic monomers include olefins such as ethylene and norbornene; vinyl acetate; and styrene. The non-acrylic monomers constituting the acrylic polymer (a11) may consist of only one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0059] In the acrylic polymer (a11), the ratio (content) of the amount of constituent units derived from the functional group-containing acrylic monomer to the total amount of constituent units is preferably 0.1 to 50% by mass, more preferably 1 to 40% by mass, and particularly preferably 3 to 30% by mass. Having this ratio within this range allows the content of energy-ray-curable groups in the acrylic resin (a1-1) obtained by copolymerization of the acrylic polymer (a11) and the energy-ray-curable compound (a12) to be adjusted to a preferred range for the degree of curing of the protective film.

[0060] The acrylic polymer (a11) constituting the acrylic resin (a1-1) may consist of only one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0061] In the first protective film forming layer and the second protective film forming layer, the ratio of the acrylic resin (a1-1) content to the total mass of the first protective film forming layer or the second protective film forming layer is preferably 1 to 70% by mass, more preferably 5 to 60% by mass, and particularly preferably 10 to 50% by mass.

[0062] • Energy ray curable compound (a12) The energy-ray curable compound (a12) preferably has one or more groups selected from the group consisting of isocyanate groups, epoxy groups, and carboxyl groups as groups that can react with the functional groups of the acrylic polymer (a11), and more preferably has an isocyanate group as the group. For example, if the energy-ray curable compound (a12) has an isocyanate group as the group, this isocyanate group readily reacts with the hydroxyl group of the acrylic polymer (a11) having a hydroxyl group as the functional group.

[0063] The number of energy-ray curable groups in one molecule of the energy-ray curable compound (a12) is not particularly limited and can be appropriately selected, for example, by considering physical properties such as shrinkage rate required for the target protective film. For example, the energy ray curable compound (a12) preferably has 1 to 5 energy ray curable groups in one molecule, and more preferably 1 to 3.

[0064] Examples of the energy-ray curable compound (a12) include 2-methacryloyloxyethyl isocyanate, meta-isopropenyl-α,α-dimethylbenzyl isocyanate, methacryloyl isocyanate, allyl isocyanate, and 1,1-(bisacryloyloxymethyl)ethyl isocyanate; Acryloyl monoisocyanate compounds obtained by the reaction of a diisocyanate compound or polyisocyanate compound with hydroxyethyl (meth)acrylate; Examples include acryloyl monoisocyanate compounds obtained by the reaction of a diisocyanate compound or polyisocyanate compound with a polyol compound and hydroxyethyl (meth)acrylate. Among these, the energy ray curable compound (a12) is preferably 2-methacryloyloxyethyl isocyanate.

[0065] The energy ray curable compound (a12) constituting the acrylic resin (a1-1) may consist of only one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0066] In the acrylic resin (a1-1), the ratio of the content of energy-ray-curable groups derived from the energy-ray-curable compound (a12) to the content of the functional groups derived from the acrylic polymer (a11) is preferably 20 to 120 mol%, more preferably 35 to 100 mol%, and particularly preferably 50 to 100 mol%. Having the content within this range increases the adhesion strength of the cured products of the first protective film-forming layer and the second protective film-forming layer. Note that if the energy-ray-curable compound (a12) is a monofunctional compound (having one of the groups in one molecule), the upper limit of the content ratio is 100 mol%, but if the energy-ray-curable compound (a12) is a polyfunctional compound (having two or more of the groups in one molecule), the upper limit of the content ratio may exceed 100 mol%.

[0067] The weight-average molecular weight (Mw) of the polymer (a1) is preferably 100,000 to 2,000,000, and more preferably 300,000 to 1,500,000.

[0068] The polymer (a1) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0069] (a2) Compounds having energy-ray curable groups and a molecular weight of 100 to 80,000) In compound (a2) having an energy-ray curable group and a molecular weight of 100 to 80000, the energy-ray curable group can be a group containing an energy-ray curable double bond, and preferred examples include a (meth)acryloyl group and a vinyl group.

[0070] The compound (a2) is not particularly limited as long as it satisfies the above conditions, but examples include low molecular weight compounds having energy ray curable groups, epoxy resins having energy ray curable groups, and phenolic resins having energy ray curable groups.

[0071] Among the compounds (a2) mentioned above, examples of low molecular weight compounds having an energy-ray curable group include polyfunctional monomers or oligomers, and acrylate compounds having a (meth)acryloyl group are preferred.

[0072] Examples of the acrylate compounds include polyfunctional monomers or oligomers, and polyfunctional acrylate compounds having two or more (meth)acryloyl groups in one molecule are preferred. Examples of the aforementioned polyfunctional acrylate compounds include 2-hydroxy-3-(meth)acryloyloxypropyl methacrylate, polyethylene glycol di(meth)acrylate, propoxylated ethoxylated bisphenol A di(meth)acrylate, 2,2-bis[4-((meth)acryloxypolyethoxy)phenyl]propane, ethoxylated bisphenol A di(meth)acrylate, 2,2-bis[4-((meth)acryloxydiethoxy)phenyl]propane, 9,9-bis[4-(2-(meth)acryloyloxyethoxy)phenyl]fluorene, 2,2-bis[4-((meth)acryloxypolypropoxy)phenyl]propane, tricyclodecanedimethanol di(meth)acrylate (also known as tricyclodecanedimethylol di(meth)acrylate), 1,10-decanediol di(meth)acrylate, 1, Difunctional (meth)acrylates such as 6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, 2,2-bis[4-((meth)acryloxyethoxy)phenyl]propane, neopentyl glycol di(meth)acrylate, ethoxylated polypropylene glycol di(meth)acrylate, and 2-hydroxy-1,3-di(meth)acryloxypropane (meth)acrylates having two (meth)acryloyl groups in one molecule); Polyfunctional (meth)acrylates such as tris(2-(meth)acryloyl) isocyanurate, ε-caprolactone-modified tris-(2-(meth)acryloyl) isocyanurate, ethoxylated glycerin tri(meth)acrylate, pentaerythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, ethoxylated pentaerythritol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate, and dipentaerythritol hexa(meth)acrylate (meth)acrylates having three or more (meth)acryloyl groups in one molecule); Examples include polyfunctional (meth)acrylate oligomers such as polyfunctional urethane (meth)acrylate oligomers (meth)acrylate oligomers having two or more (meth)acryloyl groups in one molecule).

[0073] Among the compounds (a2) mentioned above, epoxy resins and phenolic resins having energy-ray curable groups can be, for example, those described in paragraph 0043 of "Japanese Patent Publication No. 2013-194102," etc. Such resins also fall under the category of resins constituting the thermosetting components described later, but in composition (IV), they are treated as compounds (a2).

[0074] The weight-average molecular weight of compound (a2) is preferably 100 to 30,000, and more preferably 300 to 10,000.

[0075] The compound (a2) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0076] The first protective film-forming layer and the second protective film-forming layer preferably contain the compound (a2) as the energy-ray curable component (a), more preferably contain a polyfunctional acrylate compound having two or more (meth)acryloyl groups in one molecule, and even more preferably contain a polyfunctional urethane (meth)acrylate oligomer. The cured product (protective film) of a protective film-forming film in which such an energy-ray curable component (a) is laminated in this order has good protective ability and flexibility, and possesses particularly excellent properties.

[0077] When composition (IV), the first protective film forming layer, and the second protective film forming layer contain an energy ray curable component (a), the content of the energy ray curable component (a) in composition (IV), the first protective film forming layer, and the second protective film forming layer is preferably 100 to 310 parts by mass, more preferably 130 to 280 parts by mass, based on 100 parts by mass of the acrylic resin (b). For example, it may be 130 to 200 parts by mass or 210 to 280 parts by mass.

[0078] In composition (IV), the ratio of the energy ray curable component (a) to the total content of all components other than the solvent (i.e., the ratio of the energy ray curable component (a) content to the total mass of the first protective film forming layer or the second protective film forming layer in the first protective film forming layer and the second protective film forming layer) is preferably 12 to 31% by mass, more preferably 14 to 28% by mass, and even more preferably 16 to 25% by mass. When the ratio of the energy ray curable component (a) (i.e., the ratio of the energy ray curable component (a) content) is above the lower limit, the energy ray curability of the formed first protective film forming layer and second protective film forming layer is improved. When the ratio of the energy ray curable component (a) (i.e., the ratio of the energy ray curable component (a) content) is below the upper limit, it is easier to prepare the desired first protective film forming layer and second protective film forming layer.

[0079] [Acrylic resin without energy-ray curable groups (b)] The first protective film forming layer and the second protective film forming layer preferably contain an acrylic resin (b) that does not have energy-ray curable groups (in this specification, this may be simply referred to as "acrylic resin (b)").

[0080] The acrylic resin (b) is a component that imparts film-forming properties to the first protective film-forming layer and the second protective film-forming layer.

[0081] The acrylic resin (b) may be any known material, for example, a homopolymer of one acrylic monomer, a copolymer of two or more acrylic monomers, or a copolymer of one or more acrylic monomers and one or more monomers other than acrylic monomers (non-acrylic monomers).

[0082] The acrylic resin (b) preferably has structural units derived from 4-(meth)acryloylmorpholine. That is, the acrylic resin (b) preferably is a polymer of 4-(meth)acryloylmorpholine. The presence of structural units derived from 4-(meth)acryloylmorpholine in the acrylic resin (b) results in excellent adhesion to the wafer or chip and a higher effect in suppressing the peeling of the protective film from the wafer or chip.

[0083] The acrylic resin (b) preferably has a constituent unit derived from 4-(meth)acryloylmorpholine and other constituent units. That is, the acrylic resin (b) is preferably a copolymer of 4-(meth)acryloylmorpholine and other monomers or oligomers.

[0084] In the acrylic resin (b), the ratio of the amount of constituent units derived from 4-(meth)acryloylmorpholine to the total amount of constituent units is preferably 10 to 30% by mass, more preferably 13 to 30% by mass, and may be any of 18 to 30% by mass or 23 to 30% by mass.

[0085] The acrylic resin (b) may be crosslinked with a crosslinking agent in at least a portion of it, or it may not be crosslinked.

[0086] Examples of acrylic monomers constituting the acrylic resin (b) include (meth)acrylic acid esters such as alkyl (meth)acrylates, (meth)acrylates having a cyclic skeleton but no functional groups, glycidyl group-containing (meth)acrylates, hydroxyl group-containing (meth)acrylates, substituted amino group-containing (meth)acrylates, carboxyl group-containing (meth)acrylates, and amino group-containing (meth)acrylates; (meth)acrylamides; and (meth)acrylamide derivatives such as 4-(meth)acryloylmorpholine. Here, "substituted amino group" means a group having a structure in which one or two hydrogen atoms of an amino group are substituted with a group other than a hydrogen atom. Here, "functional group" means a group that can react with other groups (reactive functional group), such as a glycidyl group, hydroxyl group, substituted amino group, carboxyl group, and amino group.

[0087] In this specification, "(meth)acrylic acid" is a concept that encompasses both "acrylic acid" and "methacrylic acid." The same applies to terms similar to (meth)acrylic acid; for example, "(meth)acrylate" is a concept that encompasses both "acrylate" and "methacrylate," and "(meth)acryloyl group" is a concept that encompasses both "acryloyl group" and "methacryloyl group."

[0088] In this specification, when a particular compound is assumed to have a structure in which one or more hydrogen atoms are substituted with groups other than hydrogen atoms, a compound having such a substituted structure will be referred to as a "derivative" of the particular compound described above. In this specification, the term "group" includes not only atomic groups formed by the bonding of multiple atoms, but also single atoms.

[0089] Examples of alkyl (meth)acrylate esters that do not have the aforementioned functional group and cyclic skeleton include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n-octyl (meth)acrylate, n-nonyl (meth)acrylate, and (meth Examples include alkyl esters such as isononyl acrylate, decyl (meth)acrylate, undecyl (meth)acrylate, dodecyl ((meth)acrylate) (lauryl (meth)acrylate), tridecyl (meth)acrylate, tetradecyl ((meth)acrylate) (myristyl (meth)acrylate), pentadecyl (meth)acrylate, hexadecyl ((meth)acrylate) (palmityl (meth)acrylate), heptadecyl (meth)acrylate, and octadecyl ((meth)acrylate) (stearyl (meth)acrylate), in which the alkyl group constituting the alkyl ester has a chain structure with 1 to 18 carbon atoms.

[0090] Examples of (meth)acrylic acid esters that do not have the aforementioned functional groups and have a cyclic skeleton include cycloalkyl (meth)acrylic acid esters such as isobornyl (meth)acrylate and dicyclopentanyl (meth)acrylate; (meth)acrylate aralkyl esters such as benzyl (meth)acrylate; (meth)acrylate dicyclopentenyl ester and other cycloalkenyl (meth)acrylates; Examples include cycloalkenyloxyalkyl esters of (meth)acrylate, such as dicyclopentenyloxyethyl (meth)acrylate.

[0091] Examples of the glycidyl group-containing (meth)acrylic acid ester include glycidyl (meth)acrylate. Examples of the hydroxyl group-containing (meth)acrylic acid ester include alkyl (meth)acrylic acid esters that do not have the functional group and a cyclic skeleton, and (meth)acrylic acid esters that do not have the functional group but have a cyclic skeleton, in which one or more hydrogen atoms are substituted with hydroxyl groups. Preferred examples of the hydroxyl group-containing (meth)acrylic acid ester include hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. Examples of the substituted amino group-containing (meth)acrylic acid ester include N-methylaminoethyl (meth)acrylic acid.

[0092] Examples of non-acrylic monomers constituting the acrylic resin (b) include olefins such as ethylene and norbornene; vinyl acetate; styrene, etc.

[0093] Examples of acrylic resins (b) that are crosslinked by a crosslinking agent include those in which the functional groups in acrylic resin (b) react with the crosslinking agent. The functional group can be appropriately selected depending on the type of crosslinking agent, etc., and is not particularly limited. For example, when the crosslinking agent is a polyisocyanate compound, the functional group can be a hydroxyl group, a carboxyl group, an amino group, etc., and among these, the hydroxyl group, which has high reactivity with isocyanate groups, is preferred. When the crosslinking agent is an epoxy compound, the functional group can be a carboxyl group, an amino group, etc., and among these, the carboxyl group, which has high reactivity with epoxy groups, is preferred. However, in terms of preventing corrosion of wafer and chip circuits, it is preferable that the functional group is a group other than a carboxyl group.

[0094] Examples of the acrylic resin (b) having the functional group include those obtained by polymerizing at least one monomer having the functional group. More specifically, the acrylic resin (b) having the functional group can be obtained by polymerizing one or more monomers selected from the group consisting of the glycidyl group-containing (meth)acrylic acid ester, the hydroxyl group-containing (meth)acrylic acid ester, the substituted amino group-containing (meth)acrylic acid ester, the carboxyl group-containing (meth)acrylic acid ester, the amino group-containing (meth)acrylic acid ester, and monomers having a structure in which one or more hydrogen atoms in the non-acrylic monomer are substituted with the functional group.

[0095] In the acrylic resin (b), the ratio (content) of the amount of constituent units derived from monomers having functional groups to the total amount of constituent units is preferably 1 to 20% by mass, and more preferably 2 to 10% by mass. When the ratio is within this range, the degree of crosslinking in the acrylic resin (b) is within a more preferable range.

[0096] The weight-average molecular weight (Mw) of acrylic resin (b) is preferably 10,000 or more, more preferably 20,000 or more, and even more preferably 40,000 or more, from the viewpoint of further suppressing bleed-out during the reflow process. The weight-average molecular weight (Mw) of acrylic resin (b) is preferably 10,000 to 2,000,000, and more preferably 100,000 to 1,500,000, from the viewpoint of improving the film-forming properties of composition (IV).

[0097] The acrylic resin (b) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0098] In composition (IV), the ratio of the content of acrylic resin (b) to the total content of all components other than the solvent (i.e., the ratio of the content of acrylic resin (b) to the total mass of the first protective film-forming layer or the second protective film-forming layer in the first protective film-forming layer and the second protective film-forming layer) is preferably 8% by mass or more, more preferably 10% by mass or more, and may be, for example, 12% by mass or more and 14% by mass or more.

[0099] In composition (IV), the upper limit of the ratio of the acrylic resin (b) content to the total content of all components other than the solvent (i.e., the ratio of the acrylic resin (b) content to the total mass of the first protective film forming layer or the second protective film forming layer in the first and second protective film forming layers) is not particularly limited. In terms of ensuring that the protective film exhibits a good balance between the property of suppressing bleed-out due to the reflow process and other properties, the upper limit may be 27% by mass or less, preferably 25% by mass or less, more preferably 23% by mass or less, and even more preferably 21% by mass or less.

[0100] In composition (IV), the ratio of the acrylic resin (b) content to the total content of all components other than the solvent (i.e., the ratio of the acrylic resin (b) content to the total mass of the first protective film-forming layer or the second protective film-forming layer in the first and second protective film-forming layers) can be appropriately adjusted within a range set by arbitrarily combining any of the lower and upper limits described above. For example, in one embodiment, the proportion is preferably 8 to 27% by mass, more preferably 10 to 25% by mass, and may be any of 12 to 23% by mass or 14 to 21% by mass.

[0101] When composition (IV), the first protective film forming layer, and the second protective film forming layer contain an energy ray curable component (a) and an acrylic resin (b), the content of the energy ray curable component (a) in composition (IV), the first protective film forming layer, and the second protective film forming layer is preferably 70 to 310 parts by mass, more preferably 80 to 280 parts by mass, and even more preferably 85 to 250 parts by mass, based on the content of acrylic resin (b) per 100 parts by mass.

[0102] In composition (IV), the ratio of the total content of the energy ray-curable component (a) and the acrylic resin (b) to the total content of all components other than the solvent (i.e., the ratio of the total content of the energy ray-curable component (a) and the acrylic resin (b) to the total mass of the first protective film-forming layer or the second protective film-forming layer in the first and second protective film-forming layers) is preferably 10 to 60% by mass, and may be, for example, 20 to 50% by mass and 30 to 45% by mass. Having the ratio within this range enhances the effects of using the energy ray-curable component (a) and the acrylic resin (b).

[0103] [Other ingredients] Composition (IV), the first protective film forming layer, and the second protective film forming layer may contain other components that do not fall under either the energy ray curable component (a) or the acrylic resin (b), as long as they do not impair the effects of the present invention. Examples of the other components mentioned above include photopolymerization initiators (c), inorganic fillers (d), coupling agents (e), crosslinking agents (f), colorants (g), thermosetting components (h), general-purpose additives (z), and polymers (b0) that do not fall under the category of acrylic resin (b) and do not have energy-ray curable groups (in this specification, these may be referred to as "other polymers (b0) that do not have energy-ray curable groups" or "polymer (b0)").

[0104] (Photopolymerization initiator (c)) When composition (IV), the first protective film forming layer, and the second protective film forming layer contain a photopolymerization initiator (c), the polymerization (curing) reaction of the energy ray curable component (a) can be efficiently promoted.

[0105] Examples of the photopolymerization initiators include benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin methyl benzoate, and benzoin dimethyl ketal; acetophenone compounds such as acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, 2-hydroxy-1-(4-(4-(2-hydroxy-2-methylpropionyl)benzyl)phenyl)-2-methylpropan-1-one, and 2-(dimethylamino)-1-(4-morpholinophenyl)-2-benzyl-1-butanone; and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxy Examples include acylphosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide; sulfide compounds such as benzylphenyl sulfide and tetramethylthiuram monosulfide; α-ketol compounds such as 1-hydroxycyclohexylphenyl ketone; azo compounds such as azobisisobutyronitrile; titanocene compounds such as titanocene; thioxanthone compounds such as thioxanthone; peroxide compounds; diketone compounds such as diacetyl; benzyl; dibenzyl; benzophenone; 2,4-diethylthioxanthone; 1,2-diphenylmethane; 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propanone; and quinone compounds such as 1-chloroanthraquinone and 2-chloroanthraquinone. Furthermore, examples of photopolymerization initiators include photosensitizers such as amines.

[0106] The photopolymerization initiator (c) contained in composition (IV), the first protective film-forming layer, and the second protective film-forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected. For example, a highly reactive photopolymerization initiator that is liquid at room temperature, such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, can be used alone to efficiently crosslink the first protective film-forming layer and the second protective film-forming layer, thereby increasing the gel fraction. A less reactive photopolymerization initiator, such as 2-hydroxy-1-(4-(4-(2-hydroxy-2-methylpropionyl)benzyl)phenyl)-2-methylpropan-1-one or 1-hydroxycyclohexyl-phenyl ketone, can be used in combination with a highly reactive photopolymerization initiator such as 2-(dimethylamino)-1-(4-morpholinophenyl)-2-benzyl-1-butanone to efficiently crosslink the first protective film-forming layer and the second protective film-forming layer, thereby increasing the gel fraction.

[0107] When a photopolymerization initiator (c) is used, the content of the photopolymerization initiator (c) in composition (IV) is preferably 0.1 to 20 parts by mass, more preferably 1 to 10 parts by mass, and particularly preferably 2 to 5 parts by mass, based on the content of 100 parts by mass of the energy ray curable component (a).

[0108] (Inorganic filler (d)) When composition (IV), the first protective film forming layer, and the second protective film forming layer contain inorganic filler (d), the coefficient of thermal expansion of the cured product (e.g., protective film) of the protective film forming film in which the first protective film forming layer and the second protective film forming layer are laminated in this order can be more easily adjusted by adjusting the amount of inorganic filler (d) in composition (IV), the first protective film forming layer, and the second protective film forming layer. For example, optimizing the coefficient of thermal expansion of the protective film with respect to the object on which the protective film is formed further improves the reliability of the package obtained using the protective film forming film. Furthermore, by using the first protective film forming layer and the second protective film forming layer containing inorganic filler (d), it is also possible to reduce the moisture absorption rate or improve the heat dissipation of the cured product (e.g., protective film) of the protective film forming film in which the first protective film forming layer and the second protective film forming layer are laminated in this order.

[0109] Examples of inorganic fillers (d) include powders of inorganic materials such as silica, alumina, talc, calcium carbonate, titanium white, red iron oxide, silicon carbide, and boron nitride; beads formed from these inorganic materials in a spherical shape; surface-modified products of these inorganic materials; single-crystal fibers of these inorganic materials; and glass fibers. Among these, the inorganic filler (d) is preferably silica or alumina.

[0110] The inorganic filler (d) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0111] In composition (IV), the ratio of the inorganic filler (d) content to the total content of all components other than the solvent (i.e., the ratio of the inorganic filler (d) content to the total mass of the first protective film forming layer or the second protective film forming layer in the first protective film forming layer and the second protective film forming layer) is preferably 35 to 75% by mass, and may be, for example, 45 to 70% by mass and 50 to 65% by mass. By having the ratio within this range, the effect of using the inorganic filler (d) is enhanced without impairing the properties of the protective film forming film in which the first protective film forming layer and the second protective film forming layer are laminated in this order.

[0112] (Coupling agent (e)) When composition (IV), the first protective film-forming layer, and the second protective film-forming layer contain a coupling agent (e) having a functional group that can react with an inorganic or organic compound, the adhesion and bonding of the protective film-forming film to the adherend are improved. Furthermore, the cured product (e.g., protective film) of a protective film-forming film in which the first protective film-forming layer and the second protective film-forming layer are laminated in this order exhibits improved water resistance without impairing heat resistance.

[0113] The coupling agent (e) is preferably a compound having a functional group that can react with the functional groups of the acrylic resin (b), the energy ray curable component (a), etc., and is more preferably a silane coupling agent. Preferred silane coupling agents include, for example, 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropylmethyldiethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxymethyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-(2-aminoethylamino)propyltrimethoxysilane, 3-(2- Examples include aminoethylamino)propylmethyldiethoxysilane, 3-(phenylamino)propyltrimethoxysilane, 3-anilinopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, bis(3-triethoxysilylpropyl)tetrasulfan, methyltrimethoxysilane, methyltriethoxysilane, vinyltrimethoxysilane, vinyltriacetoxysilane, and imidazolesilane.

[0114] The coupling agent (e) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0115] When using a coupling agent (e), the content of the coupling agent (e) in composition (IV), the first protective film forming layer, and the second protective film forming layer is preferably 0.03 to 20 parts by mass per 100 parts by mass of the total content of the energy ray curable component (a) and the acrylic resin (b). When the content of the coupling agent (e) is above the lower limit, the effects of using the coupling agent (e) are more pronounced, such as improved dispersibility of the inorganic filler (d) in the resin and improved adhesion of the protective film forming film to the adherend. When the content of the coupling agent (e) is below the upper limit, outgassing is further suppressed.

[0116] (Crosslinking agent (f)) When using an acrylic resin (b) having functional groups such as vinyl groups, (meth)acryloyl groups, amino groups, hydroxyl groups, carboxyl groups, and isocyanate groups that can bond with other compounds, composition (IV), the first protective film-forming layer, and the second protective film-forming layer may contain a crosslinking agent (f). The crosslinking agent (f) is a component for crosslinking the functional groups in the acrylic resin (b) with other compounds, and by crosslinking in this way, the initial adhesion and cohesive force of the first protective film-forming layer and the second protective film-forming layer can be adjusted.

[0117] Examples of crosslinking agents (f) include organic polyvalent isocyanate compounds, organic polyvalent imine compounds, metal chelate crosslinking agents (crosslinking agents having a metal chelate structure), and aziridine crosslinking agents (crosslinking agents having an aziridinyl group).

[0118] Examples of the aforementioned organic polyvalent isocyanate compounds include aromatic polyvalent isocyanate compounds, aliphatic polyvalent isocyanate compounds, and alicyclic polyvalent isocyanate compounds (hereinafter, these compounds may be collectively abbreviated as "aromatic polyvalent isocyanate compounds, etc."); trimers, isocyanurates, and adducts of the aforementioned aromatic polyvalent isocyanate compounds, etc.; and terminal isocyanate urethane prepolymers obtained by reacting the aforementioned aromatic polyvalent isocyanate compounds, etc. with polyol compounds. The aforementioned "adduct" refers to the reaction product of the aromatic polyvalent isocyanate compound, aliphatic polyvalent isocyanate compound, or alicyclic polyvalent isocyanate compound with a low molecular weight active hydrogen-containing compound such as ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane, or castor oil. Examples of the aforementioned adduct include the xylylene diisocyanate adduct of trimethylolpropane, as described later. Furthermore, "terminal isocyanate urethane prepolymer" refers to a prepolymer that has urethane bonds and isocyanate groups at the ends of the molecule.

[0119] More specifically, examples of the aforementioned organic polyvalent isocyanate compounds include, for example, 2,4-tolylene diisocyanate; 2,6-tolylene diisocyanate; 1,3-xylylene diisocyanate; 1,4-xylylene diisocyanate; diphenylmethane-4,4'-diisocyanate; diphenylmethane-2,4'-diisocyanate; 3-methyldiphenylmethane diisocyanate; hexamethylene diisocyanate; isophorone diisocyanate; dicyclohexylmethane-4,4'-diisocyanate; dicyclohexylmethane-2,4'-diisocyanate; compounds in which one or more of tolylene diisocyanate, hexamethylene diisocyanate, and xylylene diisocyanate are added to all or some of the hydroxyl groups of polyols such as trimethylolpropane; and lysine diisocyanate.

[0120] Examples of the aforementioned organic polyvalent imine compounds include N,N'-diphenylmethane-4,4'-bis(1-aziridinylcarboxamide), trimethylolpropane-tri-β-aziridinylpropionate, tetramethylolmethane-tri-β-aziridinylpropionate, and N,N'-toluene-2,4-bis(1-aziridinylcarboxamide)triethylenemelamine.

[0121] When an organic polyvalent isocyanate compound is used as the crosslinking agent (f), it is preferable to use a hydroxyl group-containing polymer as the acrylic resin (b). When the crosslinking agent (f) has isocyanate groups and the acrylic resin (b) has hydroxyl groups, a crosslinked structure can be easily introduced into the first protective film-forming layer and the second protective film-forming layer by the reaction between the crosslinking agent (f) and the acrylic resin (b).

[0122] The crosslinking agent (f) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0123] When using a crosslinking agent (f), the content of the crosslinking agent (f) in composition (IV) is preferably 0.01 to 20 parts by mass per 100 parts by mass of acrylic resin (b). When the content of the crosslinking agent (f) is above the lower limit, the effect of using the crosslinking agent (f) is more pronounced. When the content of the crosslinking agent (f) is below the upper limit, the overuse of the crosslinking agent (f) is suppressed.

[0124] (Coloring agent (g)) The composition (IV) for producing the first protective film-forming layer and the first protective film-forming layer preferably contain an inorganic pigment as a coloring agent (g). By adjusting the content of the inorganic pigment, the near-infrared transmittance of the first protective film-forming layer, particularly the near-infrared transmittance at a wavelength of 1300 nm, can be adjusted.

[0125] The composition (IV) for producing the second protective film-forming layer and the second protective film-forming layer may contain an inorganic pigment as a colorant (g), but it is preferable that they do not contain an inorganic pigment. The second protective film-forming layer can be formed by using composition (IV) which does not contain an inorganic pigment or contains a smaller amount of it.

[0126] Examples of the inorganic pigments include carbon black, cobalt-based dyes, iron-based dyes, chromium-based dyes, titanium-based dyes, vanadium-based dyes, zirconium-based dyes, molybdenum-based dyes, ruthenium-based dyes, platinum-based dyes, ITO (indium tin oxide)-based dyes, ATO (antimony tin oxide)-based dyes, and others, with carbon black being preferred.

[0127] The composition (IV) for producing the first protective film-forming layer and the inorganic pigment content of the first protective film-forming layer can be appropriately adjusted so that the transmittance of the resulting protective film-forming film to near-infrared light at a wavelength of 1300 nm is suitable. For example, in the composition (IV) for producing the first protective film-forming layer, the ratio of the coloring agent (g) content to the total content of all components other than the solvent (i.e., the ratio of the coloring agent (g) content to the total mass of the first protective film-forming layer in the first protective film-forming layer) is preferably 0.5 to 15% by mass, more preferably 0.5 to 12% by mass, and particularly preferably 1.0 to 10% by mass. When the ratio is above the lower limit, the effect of using the coloring agent (g) is more pronounced. When the ratio is below the upper limit, excessive use of the coloring agent (g) is suppressed.

[0128] The inorganic pigment content of composition (IV) for producing the second protective film-forming layer and the second protective film-forming layer may be less than or equal to the inorganic pigment content of composition (IV) for producing the first protective film-forming layer and the first protective film-forming layer, or may not contain any inorganic pigment at all, and may be adjusted as appropriate so that the transmittance of the formed protective film-forming film to near-infrared rays at a wavelength of 1300 nm is suitable. For example, in composition (IV) for producing the second protective film-forming layer, the ratio of the coloring agent (g) content to the total content of all components other than the solvent (i.e., the ratio of the coloring agent (g) content to the total mass of the second protective film-forming layer in the second protective film-forming layer) is preferably 0% by mass or more and less than 3% by mass, more preferably 0.05 to 2% by mass, and particularly preferably 0 to 1% by mass. When the ratio is above the lower limit, the effect of using the coloring agent (g) is more pronounced. When the ratio is below the upper limit, excessive use of the coloring agent (g) is suppressed.

[0129] In addition to inorganic pigments, the coloring agent (g) may also include known substances such as organic pigments and organic dyes. Examples of the aforementioned organic pigments and organic dyes include aminium-based dyes, cyanine-based dyes, merocyanine-based dyes, croconium-based dyes, squalium-based dyes, azulenium-based dyes, polymethine-based dyes, naphthoquinone-based dyes, pyririum-based dyes, phthalocyanine-based dyes, naphthalocyanine-based dyes, naphtholactam-based dyes, azo-based dyes, condensed azo-based dyes, indigo-based dyes, perinone-based dyes, perylene-based dyes, dioxazine-based dyes, quinacridone-based dyes, isoindolone-based dyes, quinophthalone-based dyes, pyrrole-based dyes, thioindigo-based dyes, metal complex-based dyes (metal complex salt dyes), dithiol metal complex-based dyes, indolephenol-based dyes, triallylmethane-based dyes, anthraquinone-based dyes, naphthol-based dyes, azomethine-based dyes, benzimidazolone-based dyes, pyranthrone-based dyes, and surene-based dyes.

[0130] Furthermore, by adjusting the content of the coloring agent (g), the visibility of laser marks when laser marking is performed on a protective film or protective film can be adjusted. It is also possible to improve the aesthetic appearance of the protective film or to make grinding marks on the back surface of the wafer less visible.

[0131] The colorants (g) contained in composition (IV), the first protective film-forming layer, and the second protective film-forming layer may consist of only one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0132] (Thermosetting component (h)) When composition (IV), the first protective film forming layer, and the second protective film forming layer contain an energy ray curable component (a) and a thermosetting component (h), the adhesion strength of the first protective film forming layer and the second protective film forming layer to the adherend is improved by heating, and the strength of the cured product (e.g., protective film) of the protective film forming film obtained by laminating the first protective film forming layer and the second protective film forming layer is also improved.

[0133] Examples of thermosetting components (h) include epoxy thermosetting resins, polyimide resins, and unsaturated polyester resins, with epoxy thermosetting resins being preferred.

[0134] The epoxy-based thermosetting resin comprises an epoxy resin (h1) and a thermosetting agent (h2). The epoxy thermosetting resin contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0135] • Epoxy resin (h1) Examples of epoxy resins (h1) include well-known ones, such as polyfunctional epoxy resins, biphenyl compounds, bisphenol A diglycidyl ether and its hydrogenated products, orthocresol novolac epoxy resins, dicyclopentadiene type epoxy resins, biphenyl type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenylene skeleton type epoxy resins, and other bifunctional or more epoxy compounds.

[0136] As the epoxy resin (h1), an epoxy resin having unsaturated hydrocarbon groups may be used. Epoxy resins having unsaturated hydrocarbon groups have higher compatibility with acrylic resins than epoxy resins without unsaturated hydrocarbon groups. Therefore, using an epoxy resin having unsaturated hydrocarbon groups improves the reliability of the protective film-coated chip obtained using the protective film-forming composite sheet.

[0137] Examples of epoxy resins having unsaturated hydrocarbon groups include compounds obtained by converting some of the epoxy groups of a polyfunctional epoxy resin into groups having unsaturated hydrocarbon groups. Such compounds can be obtained, for example, by adding (meth)acrylic acid or a derivative thereof to the epoxy group. Furthermore, epoxy resins having unsaturated hydrocarbon groups include, for example, compounds in which a group having an unsaturated hydrocarbon group is directly bonded to an aromatic ring or the like that constituting the epoxy resin. The unsaturated hydrocarbon group is a polymerizable unsaturated group, and specific examples include the ethenyl group (vinyl group), the 2-propenyl group (allyl group), the (meth)acryloyl group, and the (meth)acrylamide group, with the acryloyl group being preferred.

[0138] The number-average molecular weight of the epoxy resin (h1) is not particularly limited, but from the viewpoint of the curability of the first protective film-forming layer and the second protective film-forming layer, as well as the strength and heat resistance of the protective film, it is preferably 300 to 30000, more preferably 300 to 10000, and particularly preferably 300 to 3000. The epoxy equivalent of the epoxy resin (h1) is preferably 100 to 1000 g / eq, and more preferably 150 to 950 g / eq.

[0139] The epoxy resin (h1) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0140] • Thermosetting agent (H2) The thermosetting agent (h2) functions as a curing agent for the epoxy resin (h1). Examples of the thermosetting agent (H2) include compounds having two or more functional groups capable of reacting with epoxy groups in one molecule. Examples of the functional groups include phenolic hydroxyl groups, alcoholic hydroxyl groups, amino groups, carboxyl groups, and groups in which an acid group has been converted to an anhydride. It is preferable that the functional group is a phenolic hydroxyl group, an amino group, or a group in which an acid group has been converted to an anhydride, and more preferably a phenolic hydroxyl group or an amino group.

[0141] Examples of thermosetting agents (H2) that include phenolic curing agents having phenolic hydroxyl groups include polyfunctional phenolic resins, biphenols, novolac-type phenolic resins, dicyclopentadiene-type phenolic resins, and aralkyl-type phenolic resins. Examples of amine-based curing agents containing an amino group among the thermosetting agents (H2) include dicyandiamide.

[0142] The thermosetting agent (H2) may have an unsaturated hydrocarbon group. Examples of thermosetting agents (H2) having unsaturated hydrocarbon groups include compounds having a structure in which some of the hydroxyl groups of a phenolic resin are replaced by groups having unsaturated hydrocarbon groups, and compounds having a structure in which groups having unsaturated hydrocarbon groups are directly bonded to the aromatic ring of a phenolic resin. Examples of the unsaturated hydrocarbon group in the thermosetting agent (H2) include those similar to the unsaturated hydrocarbon group in the epoxy resin having the unsaturated hydrocarbon group described above.

[0143] When using a phenolic curing agent as the thermosetting agent (h2), it is preferable that the thermosetting agent (h2) has a high softening point or glass transition temperature, as this improves the peelability of the protective film from the support sheet.

[0144] Among the thermosetting agents (H2), the number average molecular weight of the resin components, such as polyfunctional phenolic resins, novolac-type phenolic resins, dicyclopentadiene-type phenolic resins, and aralkyl-type phenolic resins, is preferably 300 to 30,000, more preferably 400 to 10,000, and particularly preferably 500 to 3,000. The molecular weight of the non-resin component of the thermosetting agent (H2), such as biphenol or dicyandiamide, is not particularly limited, but is preferably 60 to 500.

[0145] The thermosetting agent (h2) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0146] When a thermosetting component (h) is used, the content of the thermosetting agent (h2) in composition (IV), the first protective film forming layer, and the second protective film forming layer is preferably 0.1 to 100 parts by mass per 100 parts by mass of epoxy resin (h1). When the content of the thermosetting agent (h2) is above the lower limit, the curing of the first protective film forming layer and the second protective film forming layer proceeds more easily. When the content of the thermosetting agent (h2) is below the upper limit, the moisture absorption rate of the first protective film forming layer and the second protective film forming layer is reduced, and the reliability of the package obtained using the protective film-coated chip is further improved.

[0147] When a thermosetting component (h) is used, the content of the thermosetting component (h) in composition (IV), the first protective film forming layer, and the second protective film forming layer (for example, the total content of epoxy resin (h1) and thermosetting agent (h2)) is preferably 5 to 120 parts by mass per 100 parts by mass of acrylic resin (b). By having the content of the thermosetting component (h) within this range, for example, the adhesion between the cured products of the first protective film forming layer and the second protective film forming layer and the support sheet is suppressed, and the peelability of the support sheet is improved.

[0148] (General-purpose additive (z)) The general-purpose additive (z) may be any known additive and can be arbitrarily selected depending on the purpose; it is not particularly limited. Preferred general-purpose additives (z) include, for example, plasticizers, antistatic agents, antioxidants, gettering agents, and ultraviolet absorbers.

[0149] The general-purpose additive (z) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0150] When using a general-purpose additive (z), the content of the general-purpose additive (z) in composition (IV), the first protective film forming layer, and the second protective film forming layer is not particularly limited and may be appropriately selected depending on the purpose. For example, if the general-purpose additive (z) is an ultraviolet absorber, the ratio of the content of the general-purpose additive (z) (ultraviolet absorber) to the total content of all components other than the solvent in composition (IV) (i.e., the ratio of the content of the general-purpose additive (z) (ultraviolet absorber) to the total mass of the first protective film forming layer or the second protective film forming layer in the first and second protective film forming layers) is preferably 0.1 to 5% by mass. If the ratio is above the lower limit, the effect of using the general-purpose additive (z) will be more pronounced. If the ratio is below the upper limit, the excessive use of the general-purpose additive (z) will be suppressed.

[0151] (Other polymers (b0) that do not have energy-ray curable groups) Other polymers (b0) that do not have energy-ray curable groups impart film-forming properties to the first protective film-forming layer and the second protective film-forming layer. The polymer (b0) is not particularly limited as long as it does not fall under the category of acrylic resin (b). The polymer (b0) may be crosslinked with a crosslinking agent in at least a portion of its composition, or it may not be crosslinked.

[0152] Examples of the polymer (b0) include acrylic resins having a weight-average molecular weight greater than 1,100,000, acrylic resins having a dispersion degree of 3.0 or less (in this specification, these acrylic resins may be referred to as "other acrylic resins"); and polymers other than acrylic resins that do not have energy-ray curable groups.

[0153] Other acrylic resins mentioned above include those similar to acrylic resin (b), except that they have a weight-average molecular weight greater than 1,100,000 or a degree of dispersion of 3.0 or less.

[0154] Examples of polymers other than acrylic resins that do not have energy-ray curable groups include urethane resins, phenoxy resins, silicone resins, and saturated polyester resins.

[0155] The weight-average molecular weight (Mw) of polymers other than acrylic resins that do not have energy-ray curable groups is preferably 10,000 to 2,000,000, and more preferably 1,000,000 to 1,500,000, from the viewpoint of improving the film-forming properties of composition (IV).

[0156] The polymer (b0) contained in composition (IV), the first protective film forming layer, and the second protective film forming layer may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0157] In composition (IV), the first protective film forming layer, and the second protective film forming layer, the content of polymer (b0) is preferably 5 parts by mass or less, more preferably 3 parts by mass or less, even more preferably 1 part by mass or less, and 0 parts by mass, based on 100 parts by mass of acrylic resin (b). In other words, it is particularly preferable that composition (IV), the first protective film forming layer, and the second protective film forming layer do not contain polymer (b0). By keeping the content of polymer (b0) below the upper limit, the effect of suppressing the peeling of the protective film from the wafer or chip is further enhanced.

[0158] [solvent] Composition (IV) preferably further contains a solvent. Composition (IV) containing a solvent has good handling properties. The solvent is not particularly limited, but preferred examples include hydrocarbons such as toluene and xylene; alcohols such as methanol, ethanol, 2-propanol, isobutyl alcohol (2-methylpropan-1-ol), and 1-butanol; esters such as ethyl acetate; ketones such as acetone and methyl ethyl ketone; ethers such as tetrahydrofuran; and amides (compounds having an amide bond) such as dimethylformamide and N-methylpyrrolidone. The solvent contained in composition (IV) may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0159] A more preferred solvent for composition (IV) is, for example, methyl ethyl ketone, which allows for more uniform mixing of the components in composition (IV).

[0160] The solvent content of composition (IV) is not particularly limited and may be appropriately selected depending on the type of components other than the solvent.

[0161] <<Method for producing a protective film-forming composition>> Composition (IV) and other energy ray-curable protective film-forming compositions are obtained by blending the respective components. There are no particular restrictions on the order in which each component is added during formulation, and two or more components may be added simultaneously. The method of mixing each component during formulation is not particularly limited; it can be appropriately selected from known methods such as mixing by rotating a stirring bar or impeller, mixing using a mixer, or mixing by applying ultrasonic waves. The temperature and time during the addition and mixing of each component are not particularly limited as long as the components do not deteriorate, and can be adjusted as appropriate, but a temperature of 15 to 30°C is preferred.

[0162] Figure 1 is a schematic cross-sectional view showing an example of a protective film-forming film according to this embodiment. Note that, for convenience in order to make the features of the present invention easier to understand, the figures used in the following description may show enlarged versions of key parts, and the dimensional ratios of each component may not be the same as in reality.

[0163] The protective film forming film 13 shown herein is composed of a first protective film forming layer 131 and a second protective film forming layer 132, with a first release film 151 on the side 131a of the first protective film forming layer 131 opposite to the second protective film forming layer 132 (sometimes referred to as the "first side" in this specification), and a second release film 152 on the side 132b of the second protective film forming layer 132 opposite to the first protective film forming layer 131 (sometimes referred to as the "second side" in this specification). The first surface 131a of the first protective film forming layer 131 is the same as the surface 13a of the protective film forming film 13 that is opposite to the second protective film forming layer 132 side (which may be referred to as the "first surface" in this specification). The second surface 132b of the second protective film forming layer 132 is the same as the surface 13b of the protective film forming film 13 that is opposite to the first protective film forming layer 131 side (which may be referred to as the "second surface" in this specification). Such protective film-forming film 13 is suitable for storage, for example, in a roll form.

[0164] The protective film forming film 13, the first protective film forming layer 131, and the second protective film forming layer 132 have the characteristics described above. The first protective film forming layer 131 can be formed by coating the above-mentioned protective film forming composition onto the release surface of the first release film 151 and drying it as necessary. The second protective film forming layer 132 can be formed by coating the above-mentioned protective film forming composition onto the release surface of the second release film 152 and drying it as necessary. The protective film forming film 13 with a release film can be formed, for example, by laminating the exposed surface 131b of the first protective film forming layer 131 and the exposed surface 132a of the second protective film forming layer 132.

[0165] The first release film 151 and the second release film 152 may both be known. The first release film 151 and the second release film 152 may be the same as each other, or they may be different from each other, for example, in that they require different peeling forces when peeled from the protective film forming film 13.

[0166] In the protective film-forming film 13 shown in Figure 1, either the first release film 151 or the second release film 152 is removed, and the resulting exposed surface becomes the surface to be attached to the back surface of the wafer (not shown). Then, the remaining other part of the first release film 151 and the second release film 152 is removed, and the resulting exposed surface becomes the surface to be attached to the support sheet or dicing sheet, which will be described later. During the manufacturing process, energy rays may be irradiated through the support sheet, and from the viewpoint of the energy ray curability of the protective film forming layer, it is preferable that the first protective film forming layer be attached to the workpiece. In other words, it is preferable that the exposed surface created by peeling off the first release film 151 shown in Figure 1 be attached to the back surface of the workpiece, and it is preferable that the exposed surface created by peeling off the second release film 152 be attached to the adhesive layer of the support sheet or dicing sheet.

[0167] Figure 1 shows an example in which the release film is provided on both sides of the protective film forming film 13 (i.e., the first surface 131a of the first protective film forming layer 131 and the second surface 132b of the second protective film forming layer 132). However, the release film may be provided on only one of the surfaces of the protective film forming film 13, i.e., only the first surface 131a or only the second surface 132b.

[0168] The protective film forming film of this embodiment can be attached to the back surface of a wafer without using a support sheet, which will be described later. In this case, a release film may be provided on the side of the protective film forming film opposite to the side attached to the wafer, and this release film can be removed at an appropriate time. At this time, it is preferable to attach the first surface 131a of the first protective film forming layer 131 to the back surface of the wafer. This is because when the first protective film forming layer 131 and the second protective film forming layer 132 are energy-ray cured, the entire first protective film forming layer 131 and the second protective film forming layer 132 can be suitably energy-ray cured by irradiating them with energy rays from the side of the second protective film forming layer 132 on the opposite side of the wafer.

[0169] On the other hand, the protective film-forming film of this embodiment can be used in combination with a support sheet, as described later, to form a composite sheet for forming a protective film that can perform both protective film formation and dicing simultaneously. Such a composite sheet for forming a protective film will be described below.

[0170] ◇ Composite sheet for forming protective film A composite sheet for forming a protective film according to one embodiment of the present invention comprises a support sheet and a protective film forming film provided on one surface of the support sheet, wherein the protective film forming film is the protective film forming film according to the above embodiment of the present invention, and the support sheet, the second protective film forming layer, and the first protective film forming layer are laminated in this order. The composite sheet for forming a protective film of this embodiment, by comprising the protective film-forming film, exhibits excellent near-infrared shielding properties of the protective film-forming film, and also suppresses peeling of the protective film formed when the protective film-forming film is cured by energy rays, resulting in superior reliability.

[0171] In this specification, as long as the laminated structure of the support sheet and the cured protective film is maintained even after the protective film has hardened, this laminated structure will be referred to as a "composite sheet for forming a protective film."

[0172] The following describes in detail each layer that constitutes the composite sheet for forming the protective film.

[0173] ◎Support sheet The support sheet may consist of one layer (single layer) or of two or more layers. If the support sheet consists of multiple layers, the constituent materials and thicknesses of these layers may be the same or different, and the combination of these layers is not particularly limited as long as it does not impair the effects of the present invention.

[0174] The support sheet is preferably transparent, but may be colored depending on the purpose. In this embodiment, where the protective film-forming film is energy ray curable, the support sheet is preferably one that transmits energy rays.

[0175] Examples of support sheets include those comprising a base material and an adhesive layer provided on one surface of the base material; or those consisting only of the base material. When the support sheet includes an adhesive layer, the adhesive layer is positioned between the base material and the protective film in the case of a composite sheet for forming a protective film.

[0176] When a support sheet comprising a base material and an adhesive layer is used, the adhesion and peelability between the support sheet and the protective film-forming film can be easily adjusted in the composite sheet for forming the protective film. When a support sheet consisting only of the base material is used, a composite sheet for forming a protective film can be manufactured at a low cost.

[0177] Examples of the composite sheet for forming the protective film in this embodiment will be described below with reference to the drawings, according to each type of support sheet.

[0178] Figure 2 is a schematic cross-sectional view showing an example of a composite sheet for forming a protective film according to this embodiment. In Figures 2 and beyond, components identical to those shown in previously explained figures are denoted by the same reference numerals, and their detailed explanations are omitted.

[0179] The protective film-forming composite sheet 101 shown herein comprises a support sheet 10 and a protective film-forming film 13 provided on one surface (sometimes referred to as the "first surface" in this specification) 10a of the support sheet 10. The support sheet 10 comprises a base material 11 and an adhesive layer 12 provided on one surface (first surface) 11a of the base material 11. In the protective film-forming composite sheet 101, the adhesive layer 12 is positioned between the base material 11 and the protective film-forming film 13. In other words, the protective film-forming composite sheet 101 is constructed by laminating a base material 11, an adhesive layer 12, and a protective film-forming film 13 in this order. The first surface 10a of the support sheet 10 is the same as the surface 12a of the adhesive layer 12 that is opposite to the substrate 11 side (which may be referred to as the "first surface" in this specification).

[0180] The protective film-forming composite sheet 101 further includes a jig adhesive layer 16 and a release film 15 on the protective film-forming film 13. In the protective film-forming composite sheet 101, a protective film-forming film 13 is laminated over the entire or nearly entire surface of the first surface 12a of the adhesive layer 12, and a jig adhesive layer 16 is laminated on a portion of the surface 13a of the protective film-forming film 13 opposite to the adhesive layer 12 (the first surface 131a of the first protective film-forming layer 131), i.e., in the area near the periphery. Furthermore, a release film 15 is laminated on the area of ​​the first surface 13a of the protective film-forming film 13 where the jig adhesive layer 16 is not laminated, and on the surface 16a of the jig adhesive layer 16 opposite to the protective film-forming film 13 (sometimes referred to as the "first surface" in this specification). A support sheet 10 is provided on the surface 13b of the protective film-forming film 13 opposite to the first surface 13a (the second surface 132b of the second protective film-forming layer 132). Since the first surface 131a of the first protective film forming layer 131 can be attached to the back surface of the wafer, it is preferable to provide the second surface 132b of the second protective film forming layer 132 on the side of the support sheet 10.

[0181] In the case of the protective film-forming composite sheet 101, as well as in other cases of the protective film-forming composite sheet of this embodiment, the release film (for example, the release film 15 shown in Figure 1) can be of any configuration, and the protective film-forming composite sheet of this embodiment may or may not include a release film.

[0182] The adhesive layer 16 for the jig is used to fix the composite sheet 101 for forming a protective film to a jig such as a ring frame. The adhesive layer 16 for the jig may, for example, have a single-layer structure containing adhesive components, or it may have a multi-layer structure comprising a core sheet and layers containing adhesive components provided on both sides of the sheet.

[0183] The protective film-forming composite sheet 101 is used with the release film 15 removed, the back surface of the wafer attached to the first surface 13a of the protective film-forming film 13, i.e., the first surface 131a of the first protective film-forming layer 131, and further, the first surface 16a of the jig adhesive layer 16 attached to a jig such as a ring frame.

[0184] Figure 3 is a schematic cross-sectional view showing another example of the protective film-forming composite sheet of this embodiment. The protective film-forming composite sheet 102 shown here is the same as the protective film-forming composite sheet 101 shown in Figure 2, except that the shape and size of the protective film-forming film are different, and the jig adhesive layer is laminated on the first surface of the adhesive layer instead of the first surface of the protective film-forming film.

[0185] More specifically, in the protective film-forming composite sheet 102, the protective film-forming film 23 is laminated on a portion of the first surface 12a of the adhesive layer 12, that is, on the central region in the width direction (left-right direction in Figure 3) of the adhesive layer 12. Furthermore, in the area of ​​the first surface 12a of the adhesive layer 12 where the protective film-forming film 23 is not laminated, a jig adhesive layer 16 is laminated so as to surround the protective film-forming film 23 from the outside in its width direction without contact. Then, a release film 15 is laminated on the side of the protective film-forming film 23 opposite to the adhesive layer 12 side (sometimes referred to as the "first surface" in this specification) 23a and on the first surface 16a of the jig adhesive layer 16. A support sheet 10 is provided on the side of the protective film-forming film 23 opposite to the first surface 23a (sometimes referred to as the "second surface" in this specification) 23b.

[0186] Figure 4 is a schematic cross-sectional view showing yet another example of the composite sheet for forming a protective film according to this embodiment. The protective film-forming composite sheet 103 shown here is the same as the protective film-forming composite sheet 102 shown in Figure 3, except that it does not have a jig adhesive layer 16.

[0187] Figure 5 is a schematic cross-sectional view showing yet another example of the composite sheet for forming a protective film according to this embodiment. The protective film-forming composite sheet 104 shown here is the same as the protective film-forming composite sheet 101 shown in Figure 2, except that it is configured with a support sheet 20 instead of a support sheet 10.

[0188] The support sheet 20 consists only of the base material 11. In other words, the protective film-forming composite sheet 104 is constructed by laminating a base material 11 and a protective film-forming film 13. The side of the support sheet 20 facing the protective film-forming film 13 (first side) 20a is the same as the first side 11a of the base material 11. The substrate 11 is adhesive at least on its first surface 11a.

[0189] The composite sheet for forming the protective film in this embodiment is not limited to those shown in Figures 2 to 5. Within the limits that do not impair the effects of the present invention, some components of those shown in Figures 2 to 5 may be modified or deleted, or other components may be added to those described herein.

[0190] Next, we will describe each layer that makes up the support sheet in more detail.

[0191] ○Base material The substrate is in the form of a sheet or film, and its constituent materials include, for example, various resins. The aforementioned resins include, for example, polyethylene such as low-density polyethylene (LDPE), linear low-density polyethylene (LLDPE), and high-density polyethylene (HDPE); polyolefins other than polyethylene such as polypropylene, polybutene, polybutadiene, polymethylpentene, and norbornene resin; ethylene-based copolymers such as ethylene-vinyl acetate copolymer, ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylic acid ester copolymer, and ethylene-norbornene copolymer (polymers obtained using ethylene as a monomer); and vinyl chloride-based resins such as polyvinyl chloride and vinyl chloride copolymer (obtained using vinyl chloride as a monomer). Examples of materials include: modified resins; polystyrene; polycycloolefins; polyesters such as polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, polyethylene isophthalate, polyethylene-2,6-naphthalenedicarboxylate, and all aromatic polyesters having aromatic cyclic groups as all constituent units; copolymers of two or more of the above polyesters; poly(meth)acrylic acid esters; polyurethanes; polyurethane acrylates; polyimides; polyamides; polycarbonates; fluororesins; polyacetals; modified polyphenylene oxides; polyphenylene sulfides; polysulfones; polyether ketones, etc. Furthermore, the resin may also include, for example, a polymer alloy such as a mixture of the polyester and other resins. In the polymer alloy of polyester and other resins, it is preferable that the amount of the resin other than polyester is relatively small. Furthermore, examples of the resin include crosslinked resins obtained by crosslinking one or more of the resins exemplified so far; and modified resins such as ionomers using one or more of the resins exemplified so far.

[0192] The resin constituting the base material may consist of only one type, or two or more types. If there are two or more types, their combination and ratio can be arbitrarily selected.

[0193] The base material may consist of one layer (single layer) or of two or more layers. If it consists of multiple layers, these layers may be identical or different, and there are no particular limitations on the combination of these layers.

[0194] The thickness of the substrate is preferably 50 to 300 μm, and more preferably 60 to 100 μm. Having the substrate thickness within this range improves the flexibility of the composite sheet for protective film formation and its suitability for adhesion to the wafer. Here, "substrate thickness" refers to the total thickness of the substrate. For example, the thickness of a substrate consisting of multiple layers refers to the total thickness of all the layers that make up the substrate.

[0195] In addition to the main constituent materials such as the aforementioned resin, the base material may also contain various known additives such as fillers, colorants, antioxidants, organic lubricants, catalysts, and plasticizers.

[0196] The substrate is preferably transparent, but may be colored or have other layers deposited on it depending on the purpose. In this embodiment, where the protective film-forming film is energy ray curable, the substrate is preferably one that transmits energy rays.

[0197] The substrate may have its surface treated with sandblasting, solvent treatment, or other surface treatments to adjust its adhesion to the layer provided thereon (for example, an adhesive layer, a protective film-forming film, or the aforementioned other layer); oxidation treatments such as corona discharge treatment, electron beam irradiation treatment, plasma treatment, ozone / ultraviolet irradiation treatment, flame treatment, chromic acid treatment, or hot air treatment; lipophilic treatment; hydrophilic treatment, etc. The substrate may also have its surface treated with a primer.

[0198] The base material may contain components within a specific range (e.g., resin, etc.) to have adhesive properties on at least one surface.

[0199] The substrate can be manufactured by known methods. For example, a substrate containing a resin can be manufactured by molding a resin composition containing the resin.

[0200] ○ Adhesive layer The adhesive layer is in the form of a sheet or film and contains an adhesive. Examples of the adhesive include adhesive resins such as acrylic resin, urethane resin, rubber resin, silicone resin, epoxy resin, polyvinyl ether, polycarbonate, and ester resin.

[0201] In this specification, "adhesive resin" includes both resins that are tacky and resins that are adhesive. For example, the adhesive resin includes not only resins that are tacky in themselves, but also resins that exhibit tackiness when used in combination with other components such as additives, and resins that exhibit adhesiveness in the presence of triggers such as heat or water.

[0202] The adhesive layer may consist of one layer (single layer) or of two or more layers. If it consists of multiple layers, these layers may be identical or different, and there are no particular limitations on the combination of these layers.

[0203] The thickness of the adhesive layer is not particularly limited, but is preferably 1 to 100 μm, more preferably 1 to 60 μm, and especially preferably 1 to 30 μm. Here, "thickness of the adhesive layer" refers to the total thickness of the adhesive layer. For example, the thickness of an adhesive layer consisting of multiple layers refers to the total thickness of all the layers that make up the adhesive layer.

[0204] The adhesive layer is preferably transparent, but may be colored depending on the purpose. In this embodiment, where the protective film-forming film has energy ray curability, it is preferable that the adhesive layer is one that transmits energy rays.

[0205] The adhesive layer may be either energy-ray curable or non-energy-ray curable. The physical properties of the energy-ray curable adhesive layer can be adjusted before and after curing. For example, curing the energy-ray curable adhesive layer before picking up the protective film-coated chip (described later) makes it easier to pick up the chip. If the adhesive layer is non-energy-ray curable, it exhibits high photostability and excellent storage stability.

[0206] An adhesive layer can be formed using an adhesive composition containing an adhesive. For example, an adhesive layer can be formed on the desired area by applying the adhesive composition to the surface on which the adhesive layer is to be formed and drying it as needed. The ratio of components that do not vaporize at room temperature in the adhesive composition is usually the same as the ratio of those components in the adhesive layer.

[0207] The adhesive composition can be coated and dried, for example, in the same manner as the coating and drying of the protective film-forming composition described above.

[0208] When providing an adhesive layer on a substrate, for example, the adhesive composition can be applied to the substrate and dried as necessary. Alternatively, for example, the adhesive composition can be applied to a release film and dried as necessary to form an adhesive layer on the release film, and the exposed surface of this adhesive layer can be bonded to one surface of the substrate to laminate the adhesive layer onto the substrate. In this case, the release film can be removed at either the manufacturing or use stage of the protective film-forming composite sheet.

[0209] When the adhesive layer is energy ray curable, examples of energy ray curable adhesive compositions include: adhesive composition (I-1) containing a non-energy ray curable adhesive resin (I-1a) (hereinafter sometimes abbreviated as "adhesive resin (I-1a)") and an energy ray curable compound; adhesive composition (I-2) containing an energy ray curable adhesive resin (I-2a) (hereinafter sometimes abbreviated as "adhesive resin (I-2a)") in which an unsaturated group is introduced into the side chain of the non-energy ray curable adhesive resin (I-1a); and adhesive composition (I-3) containing the aforementioned adhesive resin (I-2a) and an energy ray curable compound.

[0210] When the adhesive layer is non-energy ray curable, examples of non-energy ray curable adhesive compositions include adhesive compositions (I-4) containing the non-energy ray curable adhesive resin (I-1a).

[0211] [Non-energy ray curable adhesive resin (I-1a)] The adhesive resin (I-1a) is preferably an acrylic resin.

[0212] Examples of the acrylic resin include acrylic polymers having at least one structural unit derived from an alkyl (meth)acrylate ester. Examples of the alkyl (meth)acrylate ester include those in which the alkyl group constituting the alkyl ester has 1 to 20 carbon atoms, and the alkyl group is preferably linear or branched.

[0213] The acrylic polymer preferably has, in addition to structural units derived from alkyl (meth)acrylate esters, structural units derived from functional group-containing monomers. Examples of the functional group-containing monomers include those in which the functional group reacts with a crosslinking agent (described later) to serve as a starting point for crosslinking, or those in which the functional group reacts with functional groups such as isocyanate groups and glycidyl groups in an unsaturated group-containing compound (described later) to enable the introduction of unsaturated groups into the side chains of acrylic polymers.

[0214] Examples of the functional group-containing monomers include hydroxyl group-containing monomers, carboxyl group-containing monomers, amino group-containing monomers, epoxy group-containing monomers, and the like.

[0215] The acrylic polymer may have structural units derived from other monomers, in addition to structural units derived from alkyl (meth)acrylate esters and structural units derived from functional group-containing monomers. The other monomers mentioned above are not particularly limited as long as they can be copolymerized with alkyl (meth)acrylate esters, etc. Examples of other monomers include styrene, α-methylstyrene, vinyltoluene, vinyl formate, vinyl acetate, acrylonitrile, and acrylamide.

[0216] In the aforementioned adhesive compositions (I-1), (I-2), (I-3), and (I-4) (hereinafter, these adhesive compositions will be collectively referred to as "adhesive compositions (I-1) to (I-4)"), the constituent units of the acrylic resin, such as the acrylic polymer, may consist of only one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0217] In the acrylic polymer, the ratio of the amount of constituent units derived from functional group-containing monomers to the total amount of constituent units is preferably 1 to 35% by mass.

[0218] The adhesive resin (I-1a) contained in adhesive composition (I-1) or adhesive composition (I-4) may be one type or two or more types, and if there are two or more types, the combination and ratio thereof can be arbitrarily selected.

[0219] In an adhesive layer formed from adhesive composition (I-1) or adhesive composition (I-4), the ratio of the content of adhesive resin (I-1a) to the total mass of the adhesive layer is preferably 5 to 99% by mass, and may be, for example, 25 to 95% by mass, 45 to 95% by mass, or 65 to 95% by mass.

[0220] [Energy ray curable adhesive resin (I-2a)] The adhesive resin (I-2a) can be obtained, for example, by reacting a functional group in the adhesive resin (I-1a) with an unsaturated group-containing compound having an energy-ray polymerizable unsaturated group.

[0221] The aforementioned unsaturated group-containing compound is a compound that, in addition to the energy-ray polymerizable unsaturated group, has a group that can bond to the adhesive resin (I-1a) by reacting with a functional group in the adhesive resin (I-1a). Examples of the energy-ray polymerizable unsaturated group include a (meth)acryloyl group, a vinyl group (ethenyl group), an allyl group (2-propenyl group), and the (meth)acryloyl group, which is preferred. Examples of groups that can bond to functional groups in the adhesive resin (I-1a) include isocyanate groups and glycidyl groups that can bond to hydroxyl groups or amino groups, and hydroxyl groups and amino groups that can bond to carboxyl groups or epoxy groups.

[0222] Examples of the unsaturated group-containing compounds include (meth)acryloyloxyethyl isocyanate, (meth)acryloyl isocyanate, and glycidyl (meth)acrylate.

[0223] The adhesive resin (I-2a) contained in the adhesive composition (I-2) or (I-3) may be one type or two or more types, and if there are two or more types, the combination and ratio thereof can be arbitrarily selected.

[0224] In an adhesive layer formed from adhesive composition (I-2) or (I-3), the ratio of the content of adhesive resin (I-2a) to the total mass of the adhesive layer is preferably 5 to 99% by mass.

[0225] [Energy ray curable compound] The energy-ray curable compound contained in the adhesive composition (I-1) or (I-3) includes monomers or oligomers having energy-ray polymerizable unsaturated groups that can be cured by irradiation with energy rays.

[0226] Examples of monomers among energy-ray curable compounds include polyvalent (meth)acrylates such as trimethylolpropane tri(meth)acrylate, pentaerythritol (meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,4-butylene glycol di(meth)acrylate, and 1,6-hexanediol (meth)acrylate; urethane (meth)acrylate; polyester (meth)acrylate; polyether (meth)acrylate; and epoxy (meth)acrylate. Examples of energy-ray curable compounds include oligomers, which are polymers of the monomers exemplified above.

[0227] The energy ray curable compound contained in the adhesive composition (I-1) or (I-3) may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0228] In an adhesive layer formed from adhesive composition (I-1) or (I-3), the ratio of the content of the energy ray curable compound to the total mass of the adhesive layer is preferably 1 to 95% by mass.

[0229] [Crosslinking agent] When using the acrylic polymer having a structural unit derived from a functional group-containing monomer in addition to the structural unit derived from an alkyl (meth)acrylate as the adhesive resin (I-1a), it is preferable that the adhesive composition (I-1) or (I-4) further contains a crosslinking agent. Further, when using the acrylic polymer having a structural unit derived from a functional group-containing monomer similar to that in the adhesive resin (I-1a) as the adhesive resin (I-2a), the adhesive composition (I-2) or (I-3) may further contain a crosslinking agent.

[0230] The crosslinking agent reacts with the functional group to crosslink the adhesive resins (I-1a) or the adhesive resins (I-2a) with each other. Examples of the crosslinking agent include isocyanate-based crosslinking agents (crosslinking agents having isocyanate groups) such as tolylene diisocyanate, hexamethylene diisocyanate, xylylene diisocyanate, and adducts of these diisocyanates; epoxy-based crosslinking agents (crosslinking agents having glycidyl groups) such as ethylene glycol glycidyl ether; aziridine-based crosslinking agents (crosslinking agents having aziridinyl groups) such as hexakis[1-(2-methyl)-aziridinyl]phosphotriazine; metal chelate-based crosslinking agents (crosslinking agents having metal chelate structures) such as aluminum chelate; and isocyanurate-based crosslinking agents (crosslinking agents having an isocyanuric acid skeleton).

[0231] The crosslinking agent contained in the adhesive compositions (I-1) to (I-4) may be only one kind or two or more kinds. When there are two or more kinds, their combinations and ratios can be arbitrarily selected.

[0232] In the adhesive composition (I-1) or (I-4), the content of the crosslinking agent is preferably 0.01 to 50 parts by mass with respect to 100 parts by mass of the content of the adhesive resin (I-1a), and may be, for example, any of 1 to 40 parts by mass, 5 to 35 parts by mass, and 10 to 30 parts by mass. In the adhesive composition (I-2) or (I-3), the content of the crosslinking agent is preferably 0.01 to 50 parts by mass with respect to 100 parts by mass of the content of the adhesive resin (I-2a).

[0233] [Photoinitiator] The adhesive compositions (I-1), (I-2) and (I-3) (hereinafter, these adhesive compositions are collectively abbreviated as "adhesive compositions (I-1) to (I-3)") may further contain a photoinitiator. The adhesive compositions (I-1) to (I-3) containing a photoinitiator can sufficiently proceed with the curing reaction even when irradiated with energy rays of relatively low energy such as ultraviolet rays.

[0234] Examples of the photoinitiator include the same ones as the above-mentioned photoinitiator (c).

[0235] The photoinitiator contained in the adhesive compositions (I-1) to (I-3) may be only one kind or two or more kinds. When there are two or more kinds, their combinations and ratios can be arbitrarily selected.

[0236] In the adhesive composition (I-1), the content of the photoinitiator is preferably 0.01 to 20 parts by mass with respect to 100 parts by mass of the content of the energy ray curable compound. In the adhesive composition (I-2), the content of the photoinitiator is preferably 0.01 to 20 parts by mass with respect to 100 parts by mass of the content of the adhesive resin (I-2a). In the adhesive composition (I-3), the content of the photoinitiator is preferably 0.01 to 20 parts by mass with respect to 100 parts by mass of the total content of the adhesive resin (I-2a) and the energy ray curable compound.

[0237] [Other additives] The adhesive compositions (I-1) to (I-4) may contain other additives that do not fall under any of the above components within a range that does not impair the effects of the present invention. Other known additives include, for example, antistatic agents, antioxidants, plasticizers, fillers, rust inhibitors, colorants (pigments, dyes), sensitizers, tackifiers, reaction retarders, and crosslinking accelerators (catalysts). A reaction retarder is, for example, a component that suppresses the unintended crosslinking reaction that occurs in adhesive compositions (I-1) to (I-4) during storage due to the action of a catalyst mixed in them. Examples of reaction retarders include those that form a chelate complex by chelation with the catalyst, and more specifically, those that have two or more carbonyl groups (-C(=O)-) in one molecule.

[0238] The other additives contained in adhesive compositions (I-1) to (I-4) may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0239] The content of other additives in adhesive compositions (I-1) to (I-4) is not particularly limited and may be appropriately selected depending on their type.

[0240] [solvent] Adhesive compositions (I-1) to (I-4) may contain a solvent. The presence of a solvent in adhesive compositions (I-1) to (I-4) improves their applicability to the surface to be coated.

[0241] The solvent is preferably an organic solvent, and examples of such organic solvents include ketones such as methyl ethyl ketone and acetone; esters (carboxylic acid esters) such as ethyl acetate; ethers such as tetrahydrofuran and dioxane; aliphatic hydrocarbons such as cyclohexane and n-hexane; aromatic hydrocarbons such as toluene and xylene; and alcohols such as 1-propanol and 2-propanol.

[0242] The solvent contained in adhesive compositions (I-1) to (I-4) may be one type or two or more types, and if there are two or more types, their combination and ratio can be arbitrarily selected.

[0243] The solvent content of adhesive compositions (I-1) to (I-4) is not particularly limited and may be adjusted as appropriate.

[0244] ○ Method for manufacturing adhesive compositions Adhesive compositions such as (I-1) to (I-4) are obtained by blending the adhesive with other components, as needed, to constitute the adhesive composition. The adhesive composition can be manufactured in the same manner as the protective film-forming composition described earlier, except that the types of components used are different.

[0245] ◇Method for manufacturing a composite sheet for forming a protective film The composite sheet for forming the protective film can be manufactured by laminating the above-mentioned layers in corresponding positional relationships and, if necessary, adjusting the shape of some or all of the layers. The method for forming each layer is as described above.

[0246] For example, when manufacturing a support sheet and laminating an adhesive layer onto a substrate, the above-mentioned adhesive composition can be applied to the substrate and dried as necessary. Alternatively, an adhesive layer can be laminated onto a substrate by applying an adhesive composition to a release film, drying it as needed to form an adhesive layer on the release film, and then bonding the exposed surface of this adhesive layer to one surface of the substrate. In this case, it is preferable to apply the adhesive composition to the release surface of the release film. Up to this point, we have used the example of laminating an adhesive layer on a substrate, but the method described above can also be applied to cases where other layers besides the adhesive layer are laminated on the substrate.

[0247] On the other hand, for example, when laminating a protective film-forming film on top of an adhesive layer already laminated on a substrate, it is possible to directly form the second protective film-forming layer and the first protective film-forming layer by coating the second protective film-forming layer onto the adhesive layer and then coating the first protective film-forming layer onto the second protective film-forming layer. Layers other than protective film-forming films can also be laminated on the adhesive layer in a similar manner using a composition for forming that layer. Thus, when forming a new layer (hereinafter abbreviated as "second layer") on top of any layer already laminated on a substrate (hereinafter abbreviated as "first layer") to form a continuous two-layer laminated structure (in other words, a laminated structure of the first and second layers), a method can be applied in which a composition for forming the second layer is coated onto the first layer and dried as necessary. However, it is preferable to pre-form the second layer on the release film using a composition for forming it, and then bond the exposed surface of the pre-formed second layer opposite to the side in contact with the release film to the exposed surface of the first layer to form a continuous two-layer laminated structure. In this case, it is preferable to coat the release treatment surface of the release film with the composition. The release film may be removed as needed after the laminated structure is formed. Here, we have given an example of laminating a protective film on an adhesive layer, but the target laminated structure can be arbitrarily selected, for example, when laminating a layer (film) other than a protective film on an adhesive layer.

[0248] Thus, since all layers other than the substrate that make up the composite sheet for forming a protective film can be pre-formed on a release film and laminated by bonding them to the surface of the target layer, the composite sheet for forming a protective film can be manufactured by appropriately selecting the layers to which such a process is employed as needed.

[0249] The composite sheet for forming a protective film is usually stored in a state where a release film is laminated on the surface of the outermost layer (for example, the first protective film forming layer) on the side opposite to the support sheet. Therefore, a composition for forming a layer constituting the outermost layer, such as a composition for forming a protective film, is applied onto this release film (preferably its release-treated surface), and dried as necessary, to form a layer constituting the outermost layer on the release film. Then, the remaining respective layers are laminated on the exposed surface on the side opposite to the side in contact with the release film of this layer by any of the above-described methods, and left in a state where they are laminated without removing the release film, whereby a composite sheet for forming a protective film with a release film is obtained.

[0250] The composite sheet for forming a protective film may be in sheet form, and is preferably in roll form.

[0251] ◇First Kit The first kit according to an embodiment of the present invention is a first kit including a first laminate in which a first release film and a protective film forming film are laminated in this order, a work to be adhered with the protective film forming film, and a support sheet used for supporting the protective film forming film, wherein the protective film forming film is the protective film forming film according to an embodiment of the present invention described above. An example of the first kit 1 of the present embodiment will be described below while referring to the drawings.

[0252] FIG. 6 is a cross-sectional view schematically showing an example of the first kit 1 of the present embodiment. The first kit 1 of the present embodiment includes a first laminate 5 in which a first release film 151, a protective film forming film 13, and a second release film 152 are laminated in this order, a work to be adhered with the protective film forming film 13, and a support sheet 10 used for supporting the protective film forming film 13, and the protective film forming film 13 is the protective film forming film according to the embodiment of the present invention described above.

[0253] In the first laminate 5, the protective film forming film 13 is composed of a first protective film forming layer 131 and a second protective film forming layer 132, with a first release film 151 on the first surface 131a of the first protective film forming layer 131 opposite to the second protective film forming layer 132, and a second release film 152 on the second surface 132b of the second protective film forming layer 132 opposite to the first protective film forming layer 131.

[0254] By using the first kit 1, which includes a support sheet 10 and a protective film forming film 13, a protective film-coated chip comprising a chip and a protective film provided on the back surface of the chip can be manufactured by the method for manufacturing a protective film-coated chip described later.

[0255] Such protective film-forming film 13 is suitable for storage, for example, in the form of a roll. That is, the first laminate is preferably in the form of a roll.

[0256] The first laminate 5 can be formed using the above-described protective film-forming composition in the same manner as the above-described protective film-forming film with a release film.

[0257] The first release film 151 and the second release film 152 may both be known types. The first release film 151 and the second release film 152 may be the same as each other, or they may be different from each other, for example, in that they require different peeling forces when peeled from the protective film forming film 13.

[0258] In Figure 6, the protective film 13 is removed by removing either the first release film 151 or the second release film 152, and the resulting exposed surface becomes the surface to be attached to the back of the workpiece (not shown). Then, the remaining part of the first release film 151 and the second release film 152 is removed, and the resulting exposed surface becomes the surface to be attached to the support sheet. During the manufacturing process, energy rays may be irradiated through the support sheet, and from the viewpoint of the energy ray curability of the protective film forming layer, it is preferable that the first protective film forming layer be attached to the workpiece. In other words, it is preferable that the exposed surface created by peeling off the first release film 151 shown in Figure 6 be attached to the back surface of the workpiece, and it is preferable that the exposed surface created by peeling off the second release film 152 be attached to the adhesive layer 12 of the support sheet 10. In other words, it is preferable to have a laminate (second laminated film 602 or first laminated composite sheet 501) in which the workpiece, first protective film forming layer 131, second protective film forming layer 132, and support sheet 10 are laminated in that order.

[0259] Figure 6 shows an example in which the release film is provided on both sides (first surface 13a and second surface 13b) of the protective film forming film 13. However, the release film may be provided on only one side of the protective film forming film 13, that is, only the first surface 13a or only the second surface 13b.

[0260] The first kit 1 of this embodiment allows for the application of the protective film to the workpiece and the subsequent application of the support sheet to the workpiece in an in-line process by using the protective film forming film 13 and the support sheet 10 together. Here, "in-line process" refers to "a process performed in a device in which multiple devices (multiple units) that perform one or more processes are connected, or within the same device, and includes multiple processes and transport that connects those processes, with workpieces being transported one by one between each process."

[0261] ◇Second kit A second kit according to one embodiment of the present invention comprises a second laminate in which a third release film and a first protective film forming layer which is energy-curable and has near-infrared shielding properties are laminated in this order, and a third laminate in which a fifth release film and a second protective film forming layer which is energy-curable and has a higher transmittance of near-infrared rays at a wavelength of 1300 nm than the first protective film forming layer are laminated in this order. The protective film formed by laminating the first protective film forming layer and the second protective film forming layer has a near-infrared transmittance of 5% or less at a wavelength of 1300 nm, the thickness of the first protective film forming layer is 5 μm or more and 15 μm or less, and the thickness of the second protective film forming layer is 1 μm or more. An example of the second kit 2 of this embodiment will be described below with reference to the drawings.

[0262] Figure 7 is a schematic cross-sectional view showing another example of the second kit 2 of this embodiment. The second kit 2 of this embodiment comprises a second laminate 6 formed by laminating a third release film 153, a first protective film forming layer 131 which is energy-curable and has near-infrared shielding properties, and a fourth release film 154 in that order, and a third laminate 7 formed by laminating a fifth release film 155, a second protective film forming layer 132 which is energy-curable and has a higher transmittance of near-infrared rays at a wavelength of 1300 nm than the first protective film forming layer, and a sixth release film 156 in that order.

[0263] A protective film-forming film 13 can be manufactured by using the second kit 2, which includes a first protective film-forming layer 131 and a second protective film-forming layer 132.

[0264] Such a first protective film-forming layer 131 is suitable for storage, for example, in the form of a roll. That is, the second laminate 6 is preferably in the form of a roll. Similarly, such a second protective film-forming layer 132 is suitable for storage, for example, in the form of a roll. That is, the third laminate 7 is preferably in the form of a roll.

[0265] The first protective film forming layer 131 can be formed using the protective film forming composition described above, and the second protective film forming layer 132 can be formed using the protective film forming composition described above.

[0266] The third release film 153, the fourth release film 154, the fifth release film 155, and the sixth release film 156 may all be known. The third release film 153 and the fourth release film 154 may be the same as each other, or they may be different from each other, for example, requiring different peeling forces when peeling them from the first protective film forming layer 131. The fifth release film 155 and the sixth release film 156 may be the same as each other, or they may be different from each other, for example, in that they require different peeling forces when peeled from the second protective film forming layer 132.

[0267] In the second laminate 6 shown in Figure 7, the first protective film forming layer 131 is modified when either the third release film 153 or the fourth release film 154 is removed, and the resulting exposed surface becomes the surface to be attached to the back of the workpiece (not shown). Then, the remaining part of the third release film 153 or the fourth release film 154 is removed, and the resulting exposed surface becomes the surface to be attached to the second protective film forming layer 132.

[0268] In the second laminate 6 shown in Figure 7, an example is shown in which the release film is provided on both sides (first surface 131a and second surface 131b) of the first protective film forming layer 131. However, the release film may be provided on only one of the surfaces of the first protective film forming layer 131, that is, only the first surface 131a or only the second surface 131b.

[0269] In the third laminate 7 shown in Figure 7, the second protective film forming layer 132 is modified when either the fifth release film 155 or the sixth release film 156 is removed, and the resulting exposed surface becomes the surface to be attached to the first protective film forming layer 131. Then, the remaining part of the fifth release film 155 or the sixth release film 156 is removed, and the resulting exposed surface becomes the surface to be attached to the support sheet.

[0270] In the third laminate 7 shown in Figure 7, an example is shown in which the release film is provided on both sides (first surface 132a and second surface 132b) of the second protective film forming layer 132. However, the release film may be provided on only one of the sides of the second protective film forming layer 132, that is, only the first surface 132a or only the second surface 132b.

[0271] The second kit 2 of this embodiment can be converted into the third kit 3, which will be described later, by using the support sheet 10 in combination. An example of the third kit 3 of this embodiment will be described below with reference to the drawings.

[0272] Figure 8 is a schematic cross-sectional view showing another example of the second kit of this embodiment, specifically an example of the third kit 3. The third kit 3 of this embodiment comprises a second laminate 6 formed by laminating a third release film 153, a first protective film forming layer 131 which is energy-curable and has near-infrared shielding properties, and a fourth release film 154 in that order; a third laminate 7 formed by laminating a fifth release film 155, a second protective film forming layer 132 which is energy-curable and has a higher transmittance of near-infrared rays at a wavelength of 1300 nm than the first protective film forming layer, and a sixth release film 156 in that order; and a support sheet 10 used to support a workpiece to which the protective film forming film 13 is to be attached and the protective film forming film 13.

[0273] In the third kit 3, the second layer 6 and the third layer 7 are the same as the second layer 6 and the third layer 7 in the second kit 2. By using the third kit 3, a composite sheet for forming a protective film can be manufactured, and a chip with a protective film, comprising a chip and a protective film provided on the back surface of the chip, can be manufactured by the method for manufacturing a chip with a protective film described later.

[0274] ◇Manufacturing method for chips with protective film (Method of using protective film forming film, protective film forming composite sheet, first kit, second kit, and third kit) The protective film forming film, the composite sheet for forming the protective film, the first kit, the second kit, and the third kit can be used to manufacture the chip with the protective film. In other words, the method for manufacturing a chip with a protective film according to this embodiment is a method for manufacturing a chip with a protective film comprising a chip and a protective film provided on the back surface of the chip, comprising the steps of: 1) affixing a protective film forming film according to the above-described embodiment to the back surface of a wafer to produce a first laminated film in which the second protective film forming layer, the first protective film forming layer and the wafer are laminated; or 2) affixing the first protective film forming layer from a protective film forming composite sheet according to the above-described embodiment to the back surface of a wafer to produce a first laminated composite sheet in which the support sheet, the second protective film forming layer, the first protective film forming layer and the wafer are laminated in this order (this may be referred to as the "affixing step" in this specification); and 3) energy ray curing the protective film forming film in the first laminated film or the first laminated composite sheet to form the protective film, thereby producing a second laminated film in which the protective film and the wafer are laminated; or 4) affixing a protective film forming film from the support sheet, the protective film and the wafer The process includes: a step of producing a second laminated composite sheet in which the layers are stacked in this order (sometimes referred to as a "curing step" in this specification); a step of producing a third laminated film in which a plurality of protective film-covered chips are fixed on the dicing sheet by dividing the wafer in the second laminated film and cutting the protective film while a dicing sheet is provided on the protective film side of the second laminated film; or a step of producing a third laminated composite sheet in which a plurality of protective film-covered chips are fixed on the support sheet by dividing the wafer in the second laminated composite sheet and cutting the protective film (sometimes referred to as a "dividing step" in this specification); and a step of picking up the protective film-covered chips in the third laminated film by pulling them away from the dicing sheet; or picking up the protective film-covered chips in the third laminated composite sheet by pulling them away from the support sheet (sometimes referred to as a "pickup step" in this specification).

[0275] Hereinafter, with reference to the drawings, we will sequentially describe a method for manufacturing a chip with a protective film when a protective film forming film that does not constitute a protective film forming composite sheet (i.e., the first protective film forming layer and the second protective film forming layer in the first kit or the second kit) is attached to the back surface of the wafer (this may be referred to as "Manufacturing Method 1" in this specification), and a method for manufacturing a chip with a protective film when a protective film forming film in a protective film forming composite sheet (i.e., the first protective film forming layer in the protective film forming film) is attached to the back surface of the wafer (this may be referred to as "Manufacturing Method 2" in this specification).

[0276] <<Manufacturing method 1>> Figure 9 is a cross-sectional view illustrating manufacturing method 1. Here, manufacturing method 1 will be explained using the protective film-forming film 13 shown in Figure 1, or more specifically, the first kit shown in Figure 6, as an example. In the bonding step of manufacturing method 1, as shown in Figure 9(a), the protective film forming film 13 is bonded to the back surface 9b of the wafer 9 to produce a first laminated film 601 in which the protective film forming film 13 (i.e., the second protective film forming layer and the first protective film forming layer) and the wafer 9 are laminated together. The first surface 13a of the protective film forming film 13 (i.e., the first surface 131a of the first protective film forming layer) is bonded to the back surface 9b of the wafer 9. Here, we show the case where the first release film 151 is removed from the protective film forming film 13 shown in Figures 1 and 6, and the first surface 13a of the protective film forming film 13 (i.e., the first surface 131a of the first protective film forming layer) is attached to the back surface 9b of the wafer 9. Alternatively, the third release film 153 may be removed from the second laminate 6 shown in Figure 7 or 8, and the first surface 131a of the first protective film forming layer 131 may be attached to the back surface 9b of the wafer 9, the fourth release film 154 may be removed, and the fifth release film 155 may be removed from the third laminate 7, and the first surface 132a of the second protective film forming layer 132 may be attached to the second surface 131b of the first protective film forming layer 131. From the viewpoint of energy ray curability, it is preferable that the first surface 131a of the first protective film forming layer is attached to the back surface 9b of the wafer 9.

[0277] The protective film 13 can be attached to the wafer 9 by a known method. For example, the protective film 13 may be attached to the wafer 9 while being heated. The first protective film forming layer 131 can be attached to the wafer 9, and the second protective film forming layer 132 can be attached to the first protective film forming layer 131, using the same method.

[0278] Next, in the curing step of manufacturing method 1, the protective film forming film 13 in the first laminated film 601 is cured by energy rays, that is, the second protective film forming layer and the first protective film forming layer are cured by energy rays to form a protective film 13', thereby producing a second laminated film 602 in which the protective film 13' and the wafer 9 are laminated together, as shown in Figure 9(b). Reference numeral 13a' indicates the surface of the protective film 13' that was the first surface 13a of the protective film forming film 13 (i.e., the surface that was the first surface 131a of the first protective film forming layer 131). Reference numeral 13b' indicates the surface of the protective film 13' that was the second surface 13b of the protective film forming film 13 (i.e., the surface that met the second surface 132b of the second protective film forming layer 132).

[0279] In the curing process, the protective film 13' is formed by irradiating the protective film forming film 13 with energy rays from outside the protective film forming film 13 side of the first laminated film 601, through the second release film 152 (through the second release film 152). At this time, the energy rays enter the protective film forming film 13 from the side of the second protective film forming layer 132. Since the second protective film forming layer 132 readily transmits near-infrared light as well as energy rays such as ultraviolet light, the energy rays reach the first protective film forming layer 131 sufficiently. As a result, the second protective film forming layer and the first protective film forming layer are well cured by energy rays, suppressing peeling of the formed protective film and providing excellent reliability. In the curing step, the second release film 152 may be removed from the protective film forming film 13 in the first laminated film 601, exposing the second surface 13b of the protective film forming film 13, and then the protective film 13' may be formed by irradiating the protective film forming film 13 with energy rays.

[0280] The irradiation conditions for the energy rays in the curing process are as described above.

[0281] The protective film 13 shown in Figure 9(a) may be laser-marked by irradiating it with a laser through the second release film 152 (allowing the laser to pass through the second release film 152), or the protective film 13' shown in Figure 9(b) may be laser-marked by irradiating it with a laser through the second release film 152 (allowing the laser to pass through the second release film 152).

[0282] Next, in the dividing step of manufacturing method 1, the second release film 152 is first removed from the protective film 13' in the second laminated film 602. Then, one side (sometimes referred to as the "first side" in this specification) 8a of the dicing sheet 8 is attached to the second side 13b' of the protective film 13' that has been newly exposed, as shown in Figure 9(c). The dicing sheet 8 shown herein comprises a base material 81 and an adhesive layer 82 provided on one surface 81a of the base material 81, with the adhesive layer 82 in the dicing sheet 8 being attached to the protective film 13'. The surface 82a of the adhesive layer 82 facing the protective film 13' (sometimes referred to as the "first surface" in this specification) is the same as the first surface 8a of the dicing sheet 8.

[0283] The dicing sheet 8 may be a known material. For example, the base material 81 may be the same as the base material in the composite sheet for forming the protective film described above, and the adhesive layer 82 may be the same as the adhesive layer in the composite sheet for forming the protective film described above. In other words, the dicing sheet 8 can be replaced with the support sheet 10.

[0284] Here, we describe the case where a dicing sheet 8 comprising a base material 81 and an adhesive layer 82 is used, but in the division step, other materials may be used as the dicing sheet, for example, a dicing sheet consisting only of a base material.

[0285] Next, in the division step, as shown in Figure 9(d), with the dicing sheet 8 provided on the protective film 13' side of the second laminated film 602, the wafer 9 in the second laminated film 602 is divided and the protective film 13' is cut. The wafer 9 is divided into individual pieces, becoming multiple chips 90.

[0286] The wafer 9 and the protective film 13' can be divided by known methods. For example, the wafer 9 and the protective film 13' can be divided continuously by various dicing methods such as blade dicing, laser dicing using laser irradiation, or water dicing by spraying water containing an abrasive. Regardless of the cutting method, the protective film 13' is cut along the outer circumference of the chip 90.

[0287] In this way, by dividing the wafer 9 and cutting the protective film 13', a plurality of protective film-covered chips 901 are obtained, each comprising a chip 90 and a protective film (sometimes simply referred to as "protective film" in this specification) 130' provided on the back surface 90b of the chip 90 after cutting. Reference numeral 130b' indicates the surface of the protective film 130' after cutting that was the second surface 13b' of the protective film 13' (sometimes referred to as "second surface" in this specification).

[0288] In the division step of manufacturing method 1, a third laminated film 603 is produced by fixing these multiple protective film-coated chips 901 on the dicing sheet 8.

[0289] Next, in the pickup step of manufacturing method 1, as shown in Figure 9(e), the protective film-covered chip 901 in the third laminated film 603 is picked up by pulling it away from the dicing sheet 8. In the pickup process, delamination occurs between the second surface 130b' of the protective film 130' in the protective film-coated chip 901 and the first surface 82a of the adhesive layer 82 in the dicing sheet 8.

[0290] This diagram shows the case where the protective film-coated tip 901 is separated in the direction of arrow P using a separation means 17 such as a vacuum collet. Note that the cross-sectional view of the separation means 17 is omitted here. The protective film-covered chip 901 can be picked up by known methods.

[0291] If the adhesive layer 82 is energy ray curable, in the pickup step, it is preferable to cure the adhesive layer 82 by irradiating it with energy rays to form a cured product (not shown), and then pull the protective film-coated chip 901 away from the dicing sheet 8. In this case, in the pickup step, delamination occurs between the protective film 130' in the protective film-coated chip 901 and the cured product of the adhesive layer 82 in the dicing sheet 8. In this case, the cured adhesive layer 82 becomes less prone to deformation compared to before curing, making it easier to pick up the protective film-covered chip 901.

[0292] The energy ray irradiation conditions for the adhesive layer 82 in the pickup step may be the same as, for example, the energy ray irradiation conditions for the protective film forming film 13 in the curing step.

[0293] In this specification, even after the energy-ray curable adhesive layer has been cured by energy rays, as long as the laminated structure of the substrate and the cured product of the energy-ray curable adhesive layer is maintained, this laminated structure will be referred to as a "dicing sheet".

[0294] On the other hand, if the adhesive layer 82 is non-energy ray curable, the protective film-covered chip 901 can be simply pulled away from the adhesive layer 82, and curing of the adhesive layer 82 is unnecessary. Therefore, the protective film-covered chip 901 can be picked up in a simplified process. Even if the adhesive layer 82 is energy ray curable, the protective film-coated chip 901 can be picked up in a simplified process by picking it up without curing the adhesive layer 82.

[0295] In the aforementioned pickup process, the pickup of such protective film-coated chips 901 is performed for all of the target protective film-coated chips 901.

[0296] In manufacturing method 1, the desired protective film-coated chip 901 is obtained by performing the pickup step.

[0297] In manufacturing method 1, since the protective film forming film comprising the above-described second protective film forming layer and first protective film forming layer is used, the near-infrared shielding performance of the protective film forming film is excellent, and when the protective film forming film is cured by energy rays, peeling of the formed protective film is suppressed, resulting in excellent reliability.

[0298] <<Manufacturing method 2>> Figure 10 is a schematic cross-sectional view illustrating manufacturing method 2. Here, manufacturing method 2 will be explained using the example of using the protective film-forming composite sheet 101 shown in Figure 2. In the bonding step of manufacturing method 2, as shown in Figure 10(a), the protective film forming film 13 from the protective film forming composite sheet 101 is bonded to the back surface 9b of the wafer 9, thereby producing a first laminated composite sheet 501 in which the support sheet 10, the protective film forming film 13 (i.e., the second protective film forming layer and the first protective film forming layer) and the wafer 9 are laminated in this order. In this case as well, similar to manufacturing method 1, the first surface 13a of the protective film forming film 13 from the protective film forming composite sheet 101 (i.e., the first surface 131a of the first protective film forming layer) is bonded to the back surface 9b of the wafer 9.

[0299] The protective film-forming film 13 (i.e., the second protective film-forming layer and the first protective film-forming layer) in the protective film-forming composite sheet 101 can be attached to the wafer 9 by known methods. For example, the protective film-forming film 13 may be attached to the wafer 9 while being heated.

[0300] Next, in the curing step of manufacturing method 2, the protective film forming film 13 (i.e., the second protective film forming layer and the first protective film forming layer) in the first laminated composite sheet 501 is cured by energy rays to form a protective film 13', thereby producing a second laminated composite sheet 502 in which the support sheet 10, protective film 13', and wafer 9 are laminated in this order, as shown in Figure 10(b).

[0301] In the curing process, a protective film 13' is formed by irradiating the protective film-forming film 13 with energy rays from outside the support sheet 10 side of the first laminated composite sheet 501, through the support sheet 10 (through the support sheet 10). At this time, the energy rays enter the protective film forming film 13 from the side of the second protective film forming layer 132. Since the second protective film forming layer 132 readily transmits near-infrared light as well as energy rays such as ultraviolet light, the energy rays reach the first protective film forming layer 131 sufficiently. As a result, the second protective film forming layer and the first protective film forming layer are well cured by energy rays, suppressing peeling of the formed protective film and providing excellent reliability.

[0302] The curing step can be carried out in the same manner as the curing step in manufacturing method 1, except that the first laminated composite sheet 501 is used instead of the first laminated film 601.

[0303] The second laminated composite sheet 502 obtained in the curing step has the same structure as the laminate of the second laminated film 602 and the dicing sheet 8 in the dividing step of manufacturing method 1. If the dicing sheet 8 is the same as the support sheet 10, the second laminated composite sheet 502 is the same as the laminate.

[0304] Next, in the division step of manufacturing method 2, as shown in Figure 10(c), the wafer 9 in the second laminated composite sheet 502 is divided and the protective film 13' is cut. The wafer 9 is divided into individual pieces, which become multiple chips 90.

[0305] The aforementioned dividing step can be carried out in the same manner as the dividing step in manufacturing method 1, except that the second laminated composite sheet 502 is used instead of the laminate of the second laminated film 602 and the dicing sheet 8. In manufacturing method 2 as well, the protective film 13' is cut along the outer circumference of the chip 90, regardless of the cutting method.

[0306] In this way, by dividing the wafer 9 and cutting the protective film 13', multiple protective film-covered chips 901 are obtained, each comprising a chip 90 and the protective film 130' provided on the back surface 90b of the chip 90 after cutting. The protective film-coated chips 901 obtained in the division step in manufacturing method 2 are the same as the protective film-coated chips 901 obtained in the division step in manufacturing method 1.

[0307] The protective film 13 shown in Figure 10(a) may be laser-marked by irradiating it with a laser through the support sheet 10 (allowing the laser to pass through the support sheet 10), or the protective film 13' shown in Figure 10(b) may be laser-marked by irradiating it with a laser through the support sheet 10 (allowing the laser to pass through the support sheet 10).

[0308] In the division step of manufacturing method 2, a third laminated composite sheet 503 is produced by fixing these multiple protective film-coated chips 901 on the support sheet 10. The third laminated composite sheet 503 has the same structure as the third laminated film 603 obtained in the division step of manufacturing method 1. If the dicing sheet 8 is the same as the support sheet 10, the third laminated composite sheet 503 is the same as the third laminated film 603.

[0309] Next, in the pickup step of manufacturing method 2, as shown in Figure 10(d), the protective film-covered chip 901 in the third laminated composite sheet 503 is picked up by pulling it away from the support sheet 10. In the pickup process, delamination occurs between the second surface 130b' of the protective film 130' in the protective film-covered chip 901 and the first surface 12a of the adhesive layer 12 in the support sheet 10.

[0310] The aforementioned pickup process can be carried out in the same manner as the pickup process in manufacturing method 1, except that the third laminated composite sheet 503 is used instead of the third laminated film 603.

[0311] For example, if the adhesive layer 12 is energy ray curable, in the pickup step, it is preferable to cure the adhesive layer 12 by irradiating it with energy rays to form a cured product (not shown), and then pull the protective film-covered chip 901 away from the support sheet 10. In this case, in the pickup step, delamination occurs between the protective film 130' in the protective film-covered chip 901 and the cured product of the adhesive layer 12 in the support sheet 10. In this case, the cured adhesive layer 12 becomes less prone to deformation compared to before curing, making it easier to pick up the protective film-covered chip 901.

[0312] On the other hand, if the adhesive layer 12 is non-energy ray curable, the protective film-covered chip 901 can be simply pulled away from the adhesive layer 12, and curing of the adhesive layer 12 is unnecessary. Therefore, the protective film-covered chip 901 can be picked up in a simplified process. Even if the adhesive layer 12 is energy ray curable, the protective film-coated chip 901 can be picked up in a simplified process by picking it up without curing the adhesive layer 12.

[0313] In manufacturing method 2, the desired protective film-coated chip 901 is obtained by performing the pickup step. The protective film-coated chip 901 obtained in manufacturing method 2 is the same as the protective film-coated chip 901 obtained in manufacturing method 1.

[0314] In manufacturing method 2, since the above-mentioned composite sheet for forming a protective film, which includes the above-mentioned protective film forming film, is used, the near-infrared shielding properties of the protective film forming film are excellent, and when the protective film forming film is cured by energy rays, peeling of the formed protective film is suppressed, resulting in excellent reliability.

[0315] Up to this point, we have described manufacturing method 2 using the protective film-forming composite sheet 101 shown in Figure 2. However, in manufacturing method 2, other protective film-forming composite sheets of this embodiment may be used, such as the protective film-forming composite sheet 102, protective film-forming composite sheet 103, or protective film-forming composite sheet 104 shown in Figures 3 to 5.

[0316] ◇Manufacturing method for substrate devices (Method of using chips with protective film) After obtaining a chip with a protective film using the manufacturing method described above, the substrate device can be manufactured in the same manner as the conventional face-down substrate device manufacturing method, except that this chip with a protective film is used instead of a conventional chip with a protective film.

[0317] For example, one method of manufacturing a circuit board device involves a reflow process in which a circuit board on which a protective film-coated chip obtained using the protective film-forming film is mounted is heated using a reflow furnace equipped with a halogen heater, thereby melting the protruding electrodes on the protective film-coated chip and strengthening the electrical connection between the protruding electrodes and the connection pads on the circuit board.

[0318] The substrate device of this embodiment uses the above-mentioned kit or the above-mentioned composite sheet for forming a protective film, which provides excellent shielding against near-infrared rays and suppresses peeling of the formed protective film, resulting in superior reliability.

[0319] ◇ Use of protective film The use of a protective film-forming film according to one embodiment of the present invention is the use of a protective film-forming film for forming a protective film on the side of a semiconductor wafer or semiconductor chip opposite to the circuit surface, wherein the protective film-forming film is the protective film-forming film according to the above-described embodiment of the present invention. The protective film-forming film used in this embodiment utilizes the protective film-forming film comprising the second protective film-forming layer and the first protective film-forming layer described above. As a result, the protective film-forming film exhibits excellent near-infrared shielding properties, and when the protective film-forming film is cured by energy rays, peeling of the formed protective film is suppressed, resulting in superior reliability.

[0320] The use of the protective film-forming film of the present invention has the following aspects. <11> The use of a protective film-forming film for forming a protective film on the side of a semiconductor wafer or semiconductor chip opposite to the circuit side, The protective film-forming film comprises a first protective film-forming layer that is energy-curable and has near-infrared shielding properties, and a second protective film-forming layer that is energy-curable and has a higher transmittance of near-infrared rays with a wavelength of 1300 nm than the first protective film-forming layer, laminated together. The protective film-forming film is characterized by having a near-infrared transmittance of 5% or less at a wavelength of 1300 nm, a thickness of 5 μm or more and 15 μm or less for the first protective film-forming layer, and a thickness of 1 μm or more for the second protective film-forming layer. <12> The first protective film-forming layer contains an inorganic pigment as a coloring agent. <11> Use of the protective film-forming film described above. <13> In the manufacture of chips with protective films, for forming a protective film on the side of the semiconductor wafer or semiconductor chip opposite to the circuit side, <11> or <12> Use of the protective film-forming film described above. <14> In the manufacturing of a face-down substrate device, a protective film is formed on the side of a semiconductor wafer or semiconductor chip opposite to the circuit side. <11> or <12> Use of the protective film-forming film described above.

[0321] ◇Use of the second kit The use of the second kit according to one embodiment of the present invention is the use of the second kit for forming a protective film on the side of a semiconductor wafer or semiconductor chip opposite to the circuit side, The protective film forming film is formed by laminating the first protective film forming layer and the second protective film forming layer, and the second kit is the second kit according to the above-described embodiment. The use of the second kit in this embodiment is advantageous because the second kit includes the protective film-forming film, which provides excellent near-infrared shielding and suppresses peeling of the protective film formed when the protective film-forming film is cured by energy rays, resulting in superior reliability.

[0322] The use of the second kit of the present invention has the following aspects. <21> The use of a second kit for forming a protective film on the side of a semiconductor wafer or semiconductor chip opposite to the circuit side, The second kit comprises a second laminate in which a third release film and a first protective film forming layer which is energy-curable and has near-infrared shielding properties are laminated in this order, and a third laminate in which a fifth release film and a second protective film forming layer which is energy-curable and has a higher transmittance of near-infrared rays at a wavelength of 1300 nm than the first protective film forming layer are laminated in this order. The protective film formed by laminating the first protective film forming layer and the second protective film forming layer has a near-infrared transmittance of 5% or less at a wavelength of 1300 nm, the thickness of the first protective film forming layer is 5 μm or more and 15 μm or less, and the thickness of the second protective film forming layer is 1 μm or more, using the second kit. <22> The first protective film forming layer contains an inorganic pigment as a coloring agent. <21> Use of the second kit as described. <23> In the manufacture of chips with protective films, for forming a protective film on the side of the semiconductor wafer or semiconductor chip opposite to the circuit side, <21> or <22> Use of the second kit as described. <24> In the manufacturing of a face-down substrate device, a protective film is formed on the side of a semiconductor wafer or semiconductor chip opposite to the circuit side. <21> or <22> Use of the second kit as described. [Examples]

[0323] The present invention will be described in more detail below with reference to specific examples. However, the present invention is not limited in any way to the examples shown below.

[0324] <Raw materials for resin manufacturing> The full names of the resin manufacturing raw materials, which are abbreviated in this example and comparative example, are shown below. BA: n-butyl acrylate MA: Methyl acrylate ACrMO:4-Acryloylmorpholine HEA: 2-hydroxyethyl acrylate 2EHA: 2-ethylhexyl acrylate MMA: Methyl methacrylate

[0325] <Raw materials for manufacturing protective film-forming compositions> The raw materials used in the production of the protective film-forming composition are listed below. [Energy ray curing component (a)] (a)-1: ε-Caprolactone-modified tris-(2-acryloxyethyl)isocyanurate (A-9300-1CL, manufactured by Shin-Nakamura Chemical Industry Co., Ltd., a trifunctional UV-curable compound) (a)-2: Urethane acrylate (KJ Chemicals "Quick cure 8100EA70")

[0326] [Acrylic resin without energy-ray curable groups (b)] (b)-1: Acrylic resin (weight-average molecular weight (700,000), glass transition temperature 2°C) which is a copolymer of BA (33 parts by mass), MA (27 parts by mass), ACrMO (25 parts by mass), and HEA (15 parts by mass).

[0327] [Photopolymerization initiator (c)] (c)-1:1-[4-(phenylthio)-2-(O-benzoyloxime)]1,2-octanedione (trade name IRGACURE® OXE01, manufactured by BASF Japan)

[0328] [Inorganic filler (d)] (d)-1: Spherical silica (average particle size 500 nm, product name "SC2050-MA", manufactured by Admatex Co., Ltd.)

[0329] [Coloring agent (g)] (g)-1: Inorganic black pigment (manufactured by Mitsubishi Carbon Black Corporation, #20B, average particle size 50nm) (g)-2: Inorganic black pigment (manufactured by Mitsubishi Carbon Black Corporation, MA600B, average particle size 20 nm) (g)-3: Inorganic black pigment (manufactured by Mitsubishi Carbon Black Corporation, #2600, average particle size 13nm) (g)-4: Organic black pigment (Dainichi Seika Kogyo Co., Ltd. "6377 Black")

[0330] <<Manufacturing of protective film-forming film>> [Example 1] <Manufacturing of protective film-forming composition (IV)-1> Energy-ray curable component (a)-1 (12.6 parts by mass), energy-ray curable component (a)-2 (10.2 parts by mass), acrylic resin (b)-1 (14.9 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (59.3 parts by mass), and colorant (g)-1 (2.0 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain energy-ray curable protective film-forming composition (IV)-1, in which the total concentration of all components other than the solvent was 45% by mass. Note that the amounts of components other than the solvent shown herein are all amounts of the target product excluding the solvent, and the same applies to the following protective film-forming composition (IV).

[0331] <Manufacturing of protective film-forming composition (IV)-2> Energy-ray curable component (a)-1 (12.7 parts by mass), energy-ray curable component (a)-2 (10.4 parts by mass), acrylic resin (b)-1 (15.1 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (59.8 parts by mass), and colorant (g)-1 (1.0 part by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy-ray curable protective film-forming composition (IV)-2 in which the total concentration of all components other than the solvent was 45% by mass.

[0332] <Manufacturing of protective film-forming films> A release film (first release film, Lintec Corporation's "SP-PET381031", 38 μm thick) made of polyethylene terephthalate film in which one side was peeled off by silicone treatment was used. The protective film-forming composition (IV)-1 obtained above was applied to the peeled surface and dried at 100°C for 2 minutes to produce a first protective film-forming layer with a thickness of 10 μm that is energy-ray curable and has near-infrared shielding properties.

[0333] A second protective film-forming layer was produced by coating the peeled surface of a release film (second release film, Lintec Corporation's "SP-PET382150", 38 μm thick) in which one side of a polyethylene terephthalate film had been peeled by silicone treatment, with the protective film-forming composition (IV)-2 obtained above, and drying it at 100°C for 2 minutes. This produced a second protective film-forming layer with a thickness of 30 μm, which is energy-ray curable and has a higher transmittance of near-infrared light at a wavelength of 1300 nm than the first protective film-forming layer.

[0334] Furthermore, by bonding the exposed side of the obtained second protective film-forming layer, which does not have the second release film, to the exposed side of the obtained first protective film-forming layer, which does not have the first release film, a protective film-forming film with a release film is obtained, comprising a first release film, a first protective film-forming layer, a second protective film-forming layer, and a second release film, wherein the first release film, the first protective film-forming layer, the second protective film-forming layer, and the second release film are laminated in this thickness direction.

[0335] [Example 2] <Manufacturing of protective film-forming composition (IV)-3> Energy-ray curable component (a)-1 (12.4 parts by mass), energy-ray curable component (a)-2 (10.1 parts by mass), acrylic resin (b)-1 (14.8 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (58.7 parts by mass), and colorant (g)-1 (3.0 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy-ray curable protective film-forming composition (IV)-3 in which the total concentration of all components other than the solvent was 45% by mass.

[0336] <Manufacturing of protective film-forming composition (IV)-4> Energy-ray curable component (a)-1 (12.6 parts by mass), energy-ray curable component (a)-2 (10.3 parts by mass), acrylic resin (b)-1 (15.0 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (59.1 parts by mass), and colorant (g)-4 (2.0 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy-ray curable protective film-forming composition (IV)-4 in which the total concentration of all components other than the solvent was 45% by mass.

[0337] <Manufacturing of protective film-forming films> The protective film-forming film with a release film of Example 2 was manufactured in the same manner as in Example 1, except that protective film-forming compositions (IV)-3 and (IV)-4 were used instead of protective film-forming compositions (IV)-1 and (IV)-2.

[0338] [Example 3] <Manufacturing of protective film-forming composition (IV)-5> Energy-ray curable component (a)-1 (11.6 parts by mass), energy-ray curable component (a)-2 (9.6 parts by mass), acrylic resin (b)-1 (13.4 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (54.4 parts by mass), and colorant (g)-1 (10.0 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy-ray curable protective film-forming composition (IV)-5 in which the total concentration of all components other than the solvent was 55% by mass.

[0339] <Manufacturing of protective film-forming composition (IV)-6> Energy-ray curable component (a)-1 (12.8 parts by mass), energy-ray curable component (a)-2 (10.4 parts by mass), acrylic resin (b)-1 (15.2 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (60.1 parts by mass), and colorant (g)-1 (0.5 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy-ray curable protective film-forming composition (IV)-6 in which the total concentration of all components other than the solvent was 55% by mass.

[0340] <Manufacturing of protective film-forming films> The protective film-forming film with a release film of Example 2 was manufactured in the same manner as in Example 1, except that protective film-forming compositions (IV)-5 and (IV)-6 were used instead of protective film-forming compositions (IV)-1 and (IV)-2.

[0341] [Comparative Example 1] <Manufacturing of protective film-forming composition (X)-1> Energy-ray curable component (a)-1 (12.7 parts by mass), energy-ray curable component (a)-2 (10.4 parts by mass), acrylic resin (b)-1 (15.2 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (60.0 parts by mass), and colorant (g)-1 (0.7 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy-ray curable protective film-forming composition (X)-1 in which the total concentration of all components other than the solvent was 55% by mass. Note that the amounts of components other than the solvent shown herein are all amounts of the target product excluding the solvent, and are the same in the protective film-forming composition (X) below.

[0342] <Manufacturing of protective film-forming films> A release film (second release film, Lintec Corporation's "SP-PET382150", 38 μm thick) made of polyethylene terephthalate film, in which one side was peeled off by silicone treatment, was used. The protective film-forming composition (X)-1 obtained above was applied to the peeled-off surface, and the film was dried at 100°C for 2 minutes to produce an energy-ray curable protective film-forming film with a thickness of 40 μm.

[0343] Furthermore, by laminating the release-treated surface of a release film (first release film, Lintec Corporation's "SP-PET381031", 38 μm thick) to the exposed surface of the obtained protective film-forming film that does not have a second release film, a protective film-forming film with a release film is obtained, comprising a protective film-forming film, a first release film provided on one side of the protective film-forming film, and a second release film provided on the other side of the protective film-forming film.

[0344] [Comparative Example 2] <Manufacturing of protective film-forming composition (X)-2> Energy-ray curable component (a)-1 (12.6 parts by mass), energy-ray curable component (a)-2 (10.3 parts by mass), acrylic resin (b)-1 (15.0 parts by mass) without energy-ray curable groups, photopolymerization initiator (c)-1 (1.0 part by mass), inorganic filler (d)-1 (59.6 parts by mass), and colorant (g)-4 (1.5 parts by mass) were dissolved or dispersed in methyl ethyl ketone and stirred at 23°C to obtain an energy-ray curable protective film-forming composition (X)-2 in which the total concentration of all components other than the solvent was 55% by mass.

[0345] <Manufacturing of protective film-forming films> A protective film-forming film with a release film for Comparative Example 2 was manufactured in the same manner as in Comparative Example 1, except that protective film-forming composition (X)-2 was used instead of the protective film-forming composition (X)-2.

[0346] <<Evaluation of protective film-forming film>> <Transmittance measurement of protective film-forming films> The first release film and the second release film were peeled off, and the light transmittance of each protective film forming film was measured using an ultraviolet / visible / near-infrared spectrophotometer (UV-3600, manufactured by Shimadzu Corporation) under the following transmittance measurement conditions.

[0347] (Transmittance measurement conditions) Wavelength range: 190 - 2000 nm Scan speed: High speed Slit width: 8.0 mm Detector unit: Direct light reception [[ID=I4]]

[0348] <Evaluation of near-infrared ray shielding property of protective film forming film> The measurement results of the transmittance at wavelengths of 355 nm and 1300 nm are shown in Tables 1 - 2. Also, the near-infrared ray shielding property was evaluated according to the following criteria. A: The near-infrared ray transmittance at a wavelength of 1300 nm is 5% or less, and the near-infrared ray shielding property is excellent. B: The near-infrared ray transmittance at a wavelength of 1300 nm exceeds 5%, and the near-infrared ray shielding property is poor.

[0349] <Measurement of curing rate difference of protective film forming film> Regarding the protective film forming film obtained above, ultraviolet rays were irradiated from the surface on the side of the second protective film forming layer (for the protective film forming film of the comparative example, from one side) under the conditions of an illuminance of 220 mW / cm 2 , and a light quantity of 500 mJ / cm 2 to produce a protective film forming film after ultraviolet irradiation.

[0350] Using a Fourier transform infrared / near and far infrared spectroscopic analyzer ("Spectrum100" manufactured by PerkinElmer), FT-IR measurement was performed on the surface on the side of the second protective film forming layer (the side irradiated with ultraviolet rays) of the protective film forming film before and after ultraviolet irradiation at an incident angle of 45° by the diamond ATR method. After normalizing the peak intensity of the peak near a wave number of 790 cm -1 to 1.5 Abs to correct the spectral shift, for the protective film forming film before and after ultraviolet irradiation, at a wave number of 810 cm -1The change in peak intensity of the surrounding peaks was calculated using the following formula (1), and this was taken as the curing rate [%] of the side of the protective film that was irradiated with ultraviolet light.

[0351] Note: 790cm -1 The peak originates from (d)-1. Also, 810cm -1 The peaks originate from the vinyl groups of the energy-ray curable components (a)-1 and (a)-2. A higher peak intensity indicates that unreacted vinyl groups remain, meaning the protective film has not fully cured.

[0352] Next, FT-IR measurements were performed on the side of the protective film-forming film facing the first protective film-forming layer (the side opposite to the side irradiated with ultraviolet light) before and after ultraviolet irradiation, under the same conditions as above. Wavenumber 790 cm⁻¹ -1 After normalizing the peak intensity of nearby peaks to 1.5 Abs to correct spectral shifts, the protective film formation film before and after UV irradiation was analyzed at a wavenumber of 810 cm⁻¹. -1 The change in peak intensity of the nearby peaks was calculated using the following formula (1), and this was taken as the curing rate [%] on the side of the protective film opposite to the side irradiated with ultraviolet light.

[0353] Hardening rate [%] = {(Peak intensity before UV irradiation - Peak intensity after UV irradiation) / Peak intensity before UV irradiation} × 100 ... (1) Next, the difference between the curing rate on the side of the protective film irradiated with ultraviolet light and the curing rate on the opposite side was calculated using the following formula (2), and this was defined as the curing rate difference [%] of the protective film.

[0354] Curing rate difference [%] = Curing rate of the side of the protective film irradiated with ultraviolet light - Curing rate of the side of the protective film irradiated with ultraviolet light ... (2) The measurement results of the difference in curing rates of protective film-forming films are shown in Tables 1 and 2.

[0355] [Manufacturing of support sheets with release film] A polymer component (solids) was dissolved or dispersed in methyl ethyl ketone by 100 parts by mass (solids) and a trifunctional xylylene diisocyanate crosslinking agent ("Takenate® D110N," manufactured by Mitsui Takeda Chemical Co., Ltd.) by 40 parts by mass (solids) to obtain an adhesive composition. The polymer component is an acrylic copolymer with a weight-average molecular weight of 500,000 and a glass transition temperature of -31°C, obtained by copolymerizing 60 parts by mass of 2-ethylhexyl acrylate (2EHA), 30 parts by mass of methylmethyl methacrylate (MMA), and 10 parts by mass of 2-hydroxyethyl acrylate (HEA).

[0356] The adhesive composition was applied to the release surface of a release film (Lintec Corporation's "SP-PET382150", 38 μm thick) using a knife coater and dried at 110°C for 2 minutes to form an adhesive layer (5 μm thick after drying). The glossy side of a separate polypropylene film (80 μm thick, Gunze Corporation's "Funclear® LPD #80", glossy side surface roughness 0.1 μm, matte side surface roughness 0.3 μm) was then laminated to the exposed surface (the surface opposite to the side with the release film) to obtain a support sheet with a release film consisting of a base material / adhesive layer / release film.

[0357] [Fabrication of composite sheets for protective film formation] The release film was removed from the support sheet with the release film obtained above. The first release film was also removed from the protective film forming film obtained above. Then, by laminating the exposed surface of the adhesive layer resulting from the removal of the release film with the exposed surface of the protective film forming film resulting from the removal of the first release film, a composite sheet for forming a protective film was prepared, in which the substrate, adhesive layer, protective film forming film, and second release film were laminated in this order.

[0358] <Reliability testing of protective film-forming films> The second release film was removed from the obtained protective film-forming composite sheet. The protective film-forming composite sheet, with the protective film-forming film exposed, was attached to the polished surface of a 6-inch silicon wafer (350 μm thick, #2000 polished) at 70°C and 0.3 MPa to produce a first laminated composite sheet in which the support sheet, protective film-forming film, and wafer were stacked in this order (the above attachment step). After the first laminated composite sheet has stood for 20 minutes, an illuminance of 220 mW / cm² was measured from the side of the support sheet. 2 , Light amount: 500mJ / cm 2 A second laminated composite sheet was fabricated by UV irradiation, in which a support sheet, protective film, and wafer were stacked in that order (the curing step). Next, a silicon wafer was divided using a dicing device (DISCO "DFD6362"), the protective film was cut, and a third laminated composite sheet was fabricated in which 3mm x 3mm chips with protective films were fixed on the support sheet (the dividing step).

[0359] The protective film-coated chip in the third laminated composite sheet was picked up by separating it from the support sheet (the pickup step). Next, the chips with the protective coating were transferred to a metal basket and dried in an oven (ESPEC SPH-201) at 125°C for 24 hours. The protective film-coated chips were removed from the oven and left to stand in a constant temperature and humidity chamber at 85°C / 85%RH for 168 hours to undergo moist heat treatment. After removing the moist heat-treated protective film-coated chips from the constant temperature and humidity chamber, they were subjected to three heat treatments in a reflow oven (STR-2010M, manufactured by Senju Metal Industry Co., Ltd.) at a maximum temperature of 270°C and a speed of 0.22 m / min. Next, the heat-treated chips with protective coatings were subjected to a temperature cycle consisting of a low-temperature treatment (i) followed by a high-temperature treatment (ii) using a small thermal shock device (ESPEC "TSE-11-A"). This temperature cycle was repeated 1000 times. The low-temperature treatment (i) involved exposing the heat-treated chips with protective coatings obtained above to a low temperature of -65°C for a holding time of 10 minutes, and the high-temperature treatment (ii) involved exposing the chips with protective coatings after the low-temperature treatment (i) to a high temperature of 150°C for a holding time of 10 minutes. The temperature cycle was performed in accordance with JEDEC Condition C.

[0360] After performing these tests on 25 chips, the presence or absence of peeling of the protective film was visually checked, and reliability was evaluated according to the following criteria. A: No chips with peeling of the protective film were observed, indicating particularly excellent reliability. B: One or more chips were found to have the protective film peeled off only at the tip, but their reliability was excellent. C: One or more chips were found to have the protective film peeled off all the way to the center, resulting in lower reliability. The results of the reliability tests of the protective film are shown in Tables 1 and 2.

[0361] In addition, a "-" in the "Components" column of Tables 1 and 2 indicates that the protective film does not contain that component.

[0362] [Table 1]

[0363] [Table 2]

[0364] As is clear from the results above, the protective film-forming films of Examples 1 to 3 had a near-infrared transmittance of 5% or less, excellent near-infrared shielding properties, small differences in curing rates, and excellent reliability of the formed protective film.

[0365] The protective film-forming film of Comparative Example 1 showed a small difference in curing rate and excellent reliability of the formed protective film. However, its near-infrared transmittance at a wavelength of 1300 nm was 9.7%, indicating poor near-infrared shielding performance.

[0366] The protective film-forming film of Comparative Example 2 had a near-infrared transmittance of 5% or less at a wavelength of 1300 nm, indicating excellent near-infrared shielding properties. However, it exhibited large differences in curing rates, resulting in poor reliability of the formed protective film. [Industrial applicability]

[0367] This invention can be used in the manufacture of various substrate devices, including semiconductor devices. [Explanation of symbols]

[0368] 1...First kit, 2...Second kit, 3...Third kit, 5...first laminate, 6...second laminate, 1,7...third laminate, 10,20...Support sheet, 10a,20a...One side of the support sheet (first side), 11...Substrate, 12...Adhesive layer, 13,23...Energy ray curable protective film forming film, 131...First protective film forming layer, 132...Second protective film forming layer, 13'...Protective film, 13b'...Other side of the protective film (second side), 130'...Protective film after cutting. 101, 102, 103, 104… Composite sheets for forming protective films, 15...Release film, 151...First release film, 152...Second release film, 153...Third release film, 154...Fourth release film, 155...Fifth release film, 156...Sixth release film, 501...First laminated composite sheet, 502...Second laminated composite sheet, 503...Third laminated composite sheet, 601…First layered film, 602…Second layered film, 603…Third layered film, 8…Dicing sheet, 9…Wafer, 9b…Back side of wafer, 90…Chip, 90b…Back side of chip, 901…Chip with protective film

Claims

1. A protective film-forming film is formed by laminating, in this order, a first protective film-forming layer that is energy-curable and has near-infrared shielding properties, and a second protective film-forming layer that is energy-curable and has a higher transmittance of near-infrared rays with a wavelength of 1300 nm than the first protective film-forming layer. The protective film has a near-infrared transmittance of 5% or less at a wavelength of 1300 nm. The thickness of the first protective film forming layer is 5 μm or more and 15 μm or less. A protective film-forming film in which the thickness of the second protective film-forming layer is 1 μm or more.

2. The protective film forming film according to claim 1, wherein the first protective film forming layer contains an inorganic pigment as a coloring agent.

3. A composite sheet for forming a protective film, comprising a support sheet and a protective film forming film provided on one surface of the support sheet, The protective film forming film is the protective film forming film according to claim 1 or 2. A composite sheet for forming a protective film, wherein the support sheet, the second protective film forming layer, and the first protective film forming layer are laminated in this order.

4. A first kit comprising a first laminate in which a first release film and a protective film forming film are laminated in this order, and a support sheet used to support a workpiece to which the protective film forming film is to be attached and the protective film forming film, The first kit, wherein the protective film forming film is the protective film forming film according to claim 1 or 2.

5. The second kit comprises a second laminate in which a third release film and a first protective film forming layer that is energy-curable and has near-infrared shielding properties are laminated in this order, and a third laminate in which a fifth release film and a second protective film forming layer that is energy-curable and has a higher transmittance of near-infrared rays at a wavelength of 1300 nm than the first protective film forming layer are laminated in this order, The protective film formed by laminating the first protective film forming layer and the second protective film forming layer has a near-infrared transmittance of 5% or less at a wavelength of 1300 nm. The thickness of the first protective film forming layer is 5 μm or more and 15 μm or less. A second kit, wherein the thickness of the second protective film forming layer is 1 μm or more.

6. The use of a protective film-forming film for forming a protective film on the side of a semiconductor wafer or semiconductor chip opposite to the circuit side, Use of a protective film-forming film, wherein the protective film-forming film is the protective film-forming film described in claim 1 or 2.

7. The use of a second kit for forming a protective film on the side of a semiconductor wafer or semiconductor chip opposite to the circuit side, The protective film is formed by laminating the first protective film forming layer and the second protective film forming layer, Use of the second kit, wherein the second kit is the second kit described in claim 5.

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