semiconductor element
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- FUCAI OPTOELECTRONICS CO LTD
- Filing Date
- 2025-07-03
- Publication Date
- 2026-08-03
Smart Images

Figure 0007899415000001 
Figure 0007899415000002 
Figure 0007899415000003
Abstract
Claims
1. A semiconductor device, A semiconductor stack layer, Type I semiconductor structure including a first side and a second side opposite to the first side; An active structure located on the first side, comprising a quaternary compound semiconductor, and emitting radiation, wherein the peak wavelength of the radiation is between 1000 nm and 2000 nm; and The first contact layer located on the second side and containing a group 35 compound semiconductor material Semiconductor stack layers, including; A first window layer located between the first contact layer and the first type semiconductor structure; A second window layer, wherein the active structure is located between the first type semiconductor structure and the second window layer; A reflective structure located beneath the aforementioned semiconductor stack layer; A conductive structure located between the reflective structure and the semiconductor stack layer; and Insulating layer located between the conductive structure and the semiconductor stack layer Includes, The second window layer is a semiconductor element that is in direct contact with the active structure.
2. A semiconductor device according to claim 1, A semiconductor device wherein the energy gap of the second window layer is larger than the energy gap of the active structure.
3. A semiconductor device according to claim 1, The quaternary compound semiconductor is AlInGaAs or InGaAsP, and the semiconductor device is such that
4. A semiconductor device according to claim 1, A semiconductor device wherein the energy gap of the first window layer is larger than the energy gap of the active structure.
5. A semiconductor device according to claim 1, The first type semiconductor structure is a semiconductor device comprising a ternary or binary compound that does not contain nitrogen (N).
6. A semiconductor device according to claim 1, A semiconductor device in which the first contact layer and the first window layer contain different materials.
7. A semiconductor device according to claim 1, The second window layer is a semiconductor element having a roughened surface.
8. A semiconductor device according to claim 1, The material of the second window layer is a semiconductor device containing InP.
9. A semiconductor device according to claim 1, The aforementioned first type semiconductor structure is a P-type semiconductor device.
10. A semiconductor device according to claim 1, The aforementioned first-type semiconductor structure is a semiconductor device containing InAlAs.