PCB processing system, PCB processing method, and program

Abstract

To provide a substrate processing system, a substrate processing method, and a program that can easily confirm or detect whether a liquid shortage has occurred.SOLUTION: A substrate processing system 1 includes a first nozzle 136, a second nozzle 146, and an imaging device 510. The imaging device 510 captures images of a first processing liquid discharged from the first nozzle 136 and a second processing liquid discharged from the second nozzle 146 to generate video data. A control unit 102 or 532 starts supplying the first processing liquid to the first nozzle 136 and then starts supplying the second processing liquid to the second nozzle 146. On the basis of the video data, the control unit 102 or 532 generates first discharge data indicating in chronological order whether the first processing liquid is being discharged from the first nozzle 136 and second discharge data indicating in chronological order whether the second processing liquid is being discharged from the second nozzle 146.SELECTED DRAWING: Figure 8

Description

Technical Field

[0001] The present invention relates to a substrate processing system, a substrate processing method, and a program.

Background Art

[0002] A single wafer type substrate processing apparatus that sequentially discharges a plurality of types of processing liquids onto a substrate to process the substrate is known. The single wafer type substrate processing apparatus processes one substrate at a time with the processing liquid. For example, Patent Document 1 discloses a single wafer type substrate processing apparatus.

[0003] The substrate processing apparatus of Patent Document 1 includes an organic solvent valve that opens and closes an organic solvent pipe and a hydrophobizing agent valve that opens and closes a hydrophobizing agent pipe. After a delay time has elapsed since the start of the closing operation of the organic solvent valve, the opening operation of the hydrophobizing agent valve is started while the discharge of IPA (isopropyl alcohol) from the organic solvent nozzle has not completely stopped. As a result, it is possible to shift from processing the substrate with the organic solvent to processing the substrate with the hydrophobizing agent while suppressing or preventing the occurrence of liquid splashing caused by interference between the organic solvent and the hydrophobizing agent and without causing liquid breakage on the substrate.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] In a substrate processing apparatus as described in Patent Document 1, the organic solvent valve and hydrophobic agent valve are provided for each of the multiple chambers, resulting in variations in their opening and closing speeds. Furthermore, variations occur in the timing of when the processing liquid reaches the nozzle from the organic solvent valve and hydrophobic agent valve due to the distance and / or height difference between them. In addition, fluctuations in the power supply of the factory where the substrate processing apparatus is installed also cause variations in the opening and closing speed of the organic solvent valve and hydrophobic agent valve, and / or the timing of when the processing liquid reaches the nozzle. As a result, the discharge of the hydrophobic agent may start after the discharge of the organic solvent has stopped. In other words, liquid depletion may occur on the substrate. When liquid depletion occurs, the surface of the substrate dries out, resulting in defects such as particles.

[0006] However, if problems such as particle generation occur, it is necessary to investigate the cause and implement countermeasures. Since there are various factors that can cause particle generation, it takes time to determine the cause.

[0007] The present invention has been made in view of the above problems, and its purpose is to provide a substrate processing system, a substrate processing method, and a program that can easily confirm or detect whether or not liquid depletion occurs. [Means for solving the problem]

[0008] According to a first aspect of the present invention, the substrate processing system comprises a substrate holding unit, a first nozzle, a first valve, a second nozzle, a second valve, an imaging device, and a control unit. The substrate holding unit holds the substrate and rotates the substrate. The first nozzle discharges a first processing liquid onto the upper surface of the substrate held by the substrate holding unit. The first valve supplies and stops the supply of the first processing liquid to the first nozzle. The second nozzle discharges a second processing liquid onto the upper surface of the substrate held by the substrate holding unit. The second valve supplies and stops the supply of the second processing liquid to the second nozzle. The imaging device captures the first processing liquid discharged from the first nozzle and the second processing liquid discharged from the second nozzle to generate video data. The control unit controls the first valve to start supplying the first processing liquid to the first nozzle, and then controls the second valve to start supplying the second processing liquid to the second nozzle. The control unit generates, based on the video data, first discharge data indicating in time series whether or not the first processing liquid is being discharged from the first nozzle, and second discharge data indicating in time series whether or not the second processing liquid is being discharged from the second nozzle.

[0009] The first discharge data may indicate the start and end of discharge of the first processing liquid. The second discharge data may indicate the start and end of discharge of the second processing liquid. The first and second discharge data may continuously show the presence or absence of discharge over time, from before the discharge of the first processing liquid at the first nozzle to after the discharge of the second processing liquid at the second nozzle. In one embodiment, the control unit adds the first ejection data and the second ejection data to the time-series data that shows the substrate processing status in chronological order.

[0010] In one embodiment, the control unit includes a first control unit that controls the first valve and the second valve, and a second control unit that controls the imaging device. The second control unit generates the first ejection data and the second ejection data. The second control unit transmits the generated first ejection data and the second ejection data to the first control unit.

[0011] In one embodiment, the substrate processing system includes a display unit that displays the first ejection data and the second ejection data.

[0012] In one embodiment, the control unit transmits a first control signal to the first valve to control the opening and closing of the first valve. The control unit transmits a second control signal to the second valve to control the opening and closing of the second valve. The display unit displays first control data indicating the first control signal and second control data indicating the second control signal, along with the first discharge data and the second discharge data.

[0013] In one embodiment, the display unit displays the first control data and the second control data, and the first discharge data and the second discharge data side by side as a timing chart.

[0014] In one embodiment, the control unit determines, based on the first discharge data and the second discharge data, whether there is a non-discharge period between the first discharge period in which the first processing liquid is discharged from the first nozzle and the second discharge period in which the second processing liquid is discharged from the second nozzle, in which neither the first processing liquid nor the second processing liquid is discharged.

[0015] In one embodiment, if the control unit determines that a non-discharge period exists, the system includes a notification unit that notifies the user of the existence of the non-discharge period.

[0016] In one embodiment, the substrate processing system includes a speed controller that adjusts the opening and closing speed of the second valve. When the control unit determines that a non-discharge period exists, it controls the speed controller to increase the opening and closing speed of the second valve.

[0017] According to a second aspect of the present invention, a substrate processing method includes the steps of: holding a substrate and rotating the substrate; starting the supply of a first processing liquid to a first nozzle that discharges the first processing liquid onto the upper surface of the substrate; after starting the supply of the first processing liquid, starting the supply of a second processing liquid to a second nozzle that discharges the second processing liquid onto the upper surface of the substrate; imaging the first processing liquid discharged from the first nozzle and the second processing liquid discharged from the second nozzle to generate video data; and generating first discharge data and second discharge data based on the video data, which indicate in time series whether or not the first processing liquid is being discharged from the first nozzle and whether or not the second processing liquid is being discharged from the second nozzle.

[0018] According to a third aspect of the present invention, the program causes a computer to perform the following steps: generate video data by imaging the first processing liquid discharged from a first nozzle that discharges the first processing liquid onto the upper surface of a substrate, and the second processing liquid discharged from a second nozzle that starts discharging the second processing liquid onto the upper surface of the substrate after the discharge of the first processing liquid by the first nozzle has started; and generate first discharge data that shows in chronological order whether or not the first processing liquid is being discharged from the first nozzle, and second discharge data that shows in chronological order whether or not the second processing liquid is being discharged from the second nozzle, based on the video data. [Effects of the Invention]

[0019] According to the present invention, it is possible to provide a substrate processing system, a substrate processing method, and a program that can easily confirm or detect whether or not liquid depletion has occurred. [Brief explanation of the drawing]

[0020] [Figure 1] This is a schematic plan view of the substrate processing apparatus of the substrate processing system of this embodiment. [Figure 2] This is a schematic diagram of the substrate processing unit and ejection analysis device of a substrate processing system. [Figure 3]It is a diagram schematically showing an example of a captured image generated by an imaging device. [Figure 4] It is a diagram schematically showing an example of a captured image generated by an imaging device. [Figure 5] It is a block diagram of a substrate processing system. [Figure 6] It is a flowchart of the substrate processing method of this embodiment. [Figure 7] It is a schematic diagram showing an example of time-series data displayed on a display unit. [Figure 8] It is a flowchart of the discharge analysis device of this embodiment. [Figure 9] It is a diagram showing the processing flow of the substrate processing apparatus when displaying the first discharge data and the second discharge data on the display unit. [Figure 10] It is a schematic diagram showing an example of time-series data displayed on a display unit. [Figure 11] It is a block diagram of the substrate processing system of the first modification example. [Figure 12] It is a block diagram of the substrate processing system of the second modification example. [Figure 13] It is a block diagram of the substrate processing apparatus of the third modification example.

Embodiments for Carrying Out the Invention

[0021] Hereinafter, embodiments of a substrate processing system, a substrate processing method, and a program according to the present invention will be described with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference numerals and description thereof will not be repeated. In this specification, for ease of understanding of the invention, the X-axis, Y-axis, and Z-axis orthogonal to each other may be described. Typically, the X-axis and Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction.

[0022] First, referring to FIG. 1, the substrate processing apparatus 100 of the substrate processing system 1 of this embodiment will be described. FIG. 1 is a schematic plan view of the substrate processing apparatus 100 of the substrate processing system 1 of this embodiment.

[0023] As shown in Figure 1, the substrate processing system 1 comprises a substrate processing apparatus 100 and an ejection analysis apparatus 500 (see Figure 2). The substrate processing apparatus 100 processes the substrate W. The substrate processing apparatus 100 processes the substrate W by performing at least one of the following on the substrate W: etching, surface treatment, characterization, processing film formation, removal of at least a portion of the film, and cleaning.

[0024] The substrate W is used as a semiconductor substrate. The substrate W includes a semiconductor wafer. For example, the substrate W is roughly disc-shaped. Here, the substrate processing apparatus 100 processes the substrate W one sheet at a time.

[0025] As shown in Figure 1, the substrate processing apparatus 100 comprises a plurality of substrate processing units 110, a fluid cabinet 10A, a fluid box 10B, a plurality of load ports LP, an indexer robot IR, a center robot CR, and a control device 101. The control device 101 controls the load ports LP, the indexer robot IR, the center robot CR, and the substrate processing units 110.

[0026] Each load port LP accommodates multiple substrates W stacked on top of each other. The indexer robot IR transports the substrates W between the load port LP and the center robot CR. Alternatively, a temporary platform (path) for placing the substrates W may be provided between the indexer robot IR and the center robot CR, allowing for indirect transfer of the substrates W between the indexer robot IR and the center robot CR via the platform. The center robot CR transports the substrates W between the indexer robot IR and the substrate processing unit 110. Each substrate processing unit 110 processes the substrates W by discharging a processing liquid onto them. The fluid cabinet 10A contains the processing liquid. The fluid cabinet 10A may contain gas.

[0027] Multiple substrate processing units 110 form multiple towers TW (four towers TW in Figure 1) arranged to surround the central robot CR in a plan view. Each tower TW contains substrate processing units 110 (three substrate processing units 110 in Figure 1) stacked vertically. Each fluid box 10B corresponds to one of the towers TW. The processing fluid in the fluid cabinet 10A is supplied to all substrate processing units 110 included in the tower TW corresponding to one of the fluid boxes 10B via one of the fluid boxes 10B. Similarly, the gas in the fluid cabinet 10A is supplied to all substrate processing units 110 included in the tower TW corresponding to one of the fluid boxes 10B via one of the fluid boxes 10B.

[0028] The control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 includes a control unit 102 and a storage unit 104. The control unit 102 has a processor. The control unit 102 has, for example, a central processing unit (CPU). Alternatively, the control unit 102 may have a general-purpose arithmetic unit. Note that the control unit 102 is an example of the "first control unit" of the present invention.

[0029] The storage unit 104 includes a main memory and an auxiliary storage device. The main memory is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 104 may also include removable media. The control unit 102 executes the computer program stored in the storage unit 104 to perform board processing operations.

[0030] The storage unit 104 stores data. The data includes recipe data. The recipe data includes information indicating multiple recipes. Each of the multiple recipes defines the processing content and processing procedure for the substrate W. The storage unit 104 also stores data received from the ejection analysis device 500.

[0031] Next, with reference to Figure 2, the substrate processing unit 110 and the ejection analysis device 500 of the substrate processing system 1 of this embodiment will be described. Figure 2 is a schematic diagram of the substrate processing unit 110 and the ejection analysis device 500 of the substrate processing system 1.

[0032] As shown in Figure 2, the substrate processing unit 110 comprises a chamber 112, a substrate holding section 120, a first processing liquid supply section 130, and a second processing liquid supply section 140. The chamber 112 houses the substrate holding section 120 and at least a portion of the first processing liquid supply section 130 and the second processing liquid supply section 140. At least a portion of the discharge analysis device 500 may be located inside the chamber 112, but in this embodiment, the entire discharge analysis device 500 is located outside the chamber 112.

[0033] Chamber 112 is a roughly box-shaped chamber with an internal space. Chamber 112 houses the substrates W. Here, the substrate processing unit 110 is a single-wafer type that processes substrates W one at a time, and each substrate W is housed in the chamber 112. The substrates W are housed in and processed within the chamber 112.

[0034] The substrate holder 120 holds the substrate W. The substrate holder 120 holds the substrate W horizontally so that the upper surface (front surface) Wa of the substrate W faces upward and the lower surface (back surface) Wb of the substrate W faces vertically downward. The substrate holder 120 also rotates the substrate W while holding it. The upper surface Wa of the substrate W may be flattened. Alternatively, the upper surface Wa of the substrate W may have a device surface, or a pillar-shaped laminate with recesses may be provided. The substrate holder 120 rotates the substrate W while holding it.

[0035] For example, the substrate holder 120 may be a clamping type that clamps the edges of the substrate W. Alternatively, the substrate holder 120 may have any mechanism for holding the substrate W from its lower surface Wb. For example, the substrate holder 120 may be a vacuum type. In this case, the substrate holder 120 holds the substrate W horizontally by adhering the central part of the lower surface Wb of the substrate W, which is the non-device forming surface, to its upper surface. Alternatively, the substrate holder 120 may combine a clamping type and a vacuum type, where a plurality of chuck pins contact the peripheral edge surface of the substrate W.

[0036] For example, the substrate holding section 120 includes a spin base 121, a chuck member 122, a shaft 123, an electric motor 124, and a housing 125. The chuck member 122 is provided on the spin base 121. The chuck member 122 chucks the substrate W. Typically, the spin base 121 is provided with multiple chuck members 122.

[0037] The shaft 123 is a hollow shaft. The shaft 123 extends vertically along the axis of rotation Ax. The spin base 121 is coupled to the upper end of the shaft 123. The substrate W is placed above the spin base 121.

[0038] The spin base 121 is disc-shaped. The chuck member 122 supports the substrate W horizontally. The shaft 123 extends downward from the center of the spin base 121. The electric motor 124 provides rotational force to the shaft 123. By rotating the shaft 123 in the rotational direction, the electric motor 124 rotates the substrate W and the spin base 121 around the rotation axis Ax. The housing 125 surrounds the shaft 123 and the electric motor 124.

[0039] The first processing liquid supply unit 130 and the second processing liquid supply unit 140 supply processing liquid to the substrate W. Typically, the first processing liquid supply unit 130 and the second processing liquid supply unit 140 supply processing liquid to the upper surface Wa of the substrate W held by the substrate holding unit 120.

[0040] The processing solution may be an etching solution for etching the substrate W. Examples of etching solutions include hydrofluoric acid (a mixture of hydrofluoric acid (HF) and nitric acid (HNO3)), hydrofluoric acid, buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (a mixture of hydrofluoric acid and ethylene glycol), and phosphoric acid (H3PO4). The type of etching solution is not particularly limited and may be acidic or alkaline, for example.

[0041] Alternatively, the treatment solution may be a rinsing solution. Examples of rinsing solutions include deionized water (DIW), carbonated water, electrolyzed ionized water, ozonated water, ammonia water, diluted hydrochloric acid water, and reduced water (hydrogen water).

[0042] Alternatively, the treatment solution may be an organic solvent. Typically, the volatility of the organic solvent is higher than that of the rinsing solution. Examples of organic solvents include isopropyl alcohol (IPA), methanol, ethanol, acetone, hydrofluoro ether (HFE), propylene glycol ethyl ether (PGEE), and propylene glycol monomethyl ether acetate (PGMEA).

[0043] The first processing liquid supply unit 130 includes a pipe 132, a first valve 134, a flow meter 135, and a first nozzle 136. The first processing liquid flows through the pipe 132 from a supply source. In this embodiment, the first processing liquid is, for example, hydrofluoric acid. The first valve 134 supplies and stops the supply of the first processing liquid to the first nozzle 136. Specifically, the first valve 134 opens and closes the flow path in the pipe 132. The first valve 134 is not particularly limited, but for example, it is an air valve. The flow meter 135 measures the flow rate of the first processing liquid flowing through the pipe 132. The first nozzle 136 is connected to the downstream end of the pipe 132. The first processing liquid supply unit 130 may also include, for example, a pump (not shown) that sends the first processing liquid from the supply source. As the first processing liquid flows through the first nozzle 136, the first nozzle 136 discharges the first processing liquid onto the upper surface Wa of the substrate W.

[0044] The second treatment liquid supply unit 140 includes a pipe 142, a second valve 144, a flow meter 145, and a second nozzle 146. The second treatment liquid flows through the pipe 142 from a supply source. In this embodiment, the second treatment liquid is, for example, a rinsing liquid. The second valve 144 supplies and stops the supply of the second treatment liquid to the second nozzle 146. Specifically, the second valve 144 opens and closes the flow path in the pipe 142. The second valve 144 is not particularly limited, but for example, it is an air valve. The flow meter 145 measures the flow rate of the second treatment liquid flowing through the pipe 142. The second nozzle 146 is connected to the downstream end of the pipe 142. The second treatment liquid supply unit 140 may also include, for example, a pump (not shown) that sends the second treatment liquid from a supply source. As the second processing liquid flows through the second nozzle 146, the second nozzle 146 discharges the second processing liquid onto the upper surface Wa of the substrate W.

[0045] In this embodiment, the first nozzle 136 and the second nozzle 146 are configured to be movable relative to the substrate W. Specifically, the substrate processing unit 110 includes a moving mechanism 150 for moving the first nozzle 136 and the second nozzle 146 relative to the substrate W.

[0046] The moving mechanism 150 moves the first nozzle 136 and the second nozzle 146 in the horizontal and vertical directions. More specifically, the moving mechanism 150 moves the first nozzle 136 and the second nozzle 146 along the circumferential direction with respect to a rotation axis extending in the vertical direction. The moving mechanism 150 also raises and lowers the first nozzle 136 and the second nozzle 146 in the vertical direction.

[0047] In this embodiment, the first nozzle 136 and the second nozzle 146 are fixed to a fixing member 155. The moving mechanism 150 moves the fixing member 155 relative to the substrate W. As a result, the first nozzle 136, the second nozzle 146, and the fixing member 155 move together relative to the substrate W. For example, the moving mechanism 150 includes a ball screw mechanism and an electric motor that provides driving force to the ball screw mechanism. Alternatively, the fixing member 155 may not be provided, and the moving mechanism 150 may be configured to move the first nozzle 136 and the second nozzle 146 separately.

[0048] In this embodiment, the substrate processing unit 110 includes a first adjustment unit 160 for adjusting the opening and closing speed of the first valve 134, and a second adjustment unit 170 for adjusting the opening and closing speed of the second valve 144. Each of the first adjustment unit 160 and the second adjustment unit 170 includes, for example, a solenoid valve and a speed controller. The solenoid valve opens and closes the air passage supplied to the first valve 134 or the second valve 144, for example. The speed controller includes, for example, a needle valve for adjusting the opening degree of the air passage. In this embodiment, the speed controllers of the first adjustment unit 160 and the second adjustment unit 170 are operated manually by the user.

[0049] In this embodiment, the substrate processing apparatus 100 further comprises a liquid return section 210 and a liquid return section 220. The liquid return section 210 is connected to piping 132. The liquid return section 210 is capable of sucking back the first processing liquid in the first nozzle 136 to the upstream side (piping 132 side) when the supply of the first processing liquid from the supply source to the first nozzle 136 is stopped. The liquid return section 220 is connected to piping 142. The liquid return section 220 is capable of sucking back the second processing liquid in the second nozzle 146 to the upstream side (piping 142 side) when the supply of the second processing liquid from the supply source to the second nozzle 146 is stopped. Each of the liquid return section 210 and the liquid return section 220 has, for example, a return pipe branching from piping 132 or piping 142 and a suck-back valve that opens and closes the flow path of the return pipe. Since the configuration of the liquid return section 210 and liquid return section 220 that perform suck-back is publicly known, a detailed explanation will be omitted.

[0050] The substrate processing apparatus 100 further includes a cup 180. The cup 180 collects processing liquid that has splashed from the substrate W. The cup 180 moves up and down. For example, the cup 180 rises vertically upward to the side of the substrate W during the period in which the first processing liquid supply unit 130 or the second processing liquid supply unit 140 supplies processing liquid to the substrate W. In this case, the cup 180 collects processing liquid that splashes from the substrate W due to the rotation of the substrate W. The cup 180 also descends vertically downward from the side of the substrate W when the period in which the first processing liquid supply unit 130 or the second processing liquid supply unit 140 supplies processing liquid to the substrate W ends.

[0051] The ejection analysis device 500 includes an imaging device 510, an illumination device 520, and a control device 530. The imaging device 510 and the illumination device 520 are provided, for example, for each chamber 112. The control device 530 is provided, for example, for each substrate processing device 100.

[0052] The imaging device 510 includes, for example, an image sensor, an electronic shutter, and an optical system. The image sensor may be, for example, a CCD (Charge Coupled Device). The optical system includes, for example, a lens. The imaging device 510 images the inside of the chamber 112 and generates video data. The video data has a plurality of consecutive images. The imaging device 510 outputs the video data to the control device 530. Specifically, the imaging device 510 outputs video data to the control device 530. The operation of the imaging device 510 is controlled by the control device 530.

[0053] In this embodiment, the imaging device 510 is positioned outside the chamber 112. The chamber 112 has a side wall 112a facing the imaging device 510, and the side wall 112a is provided with a window portion (not shown) facing the imaging device 510. The imaging device 510 images the inside of the chamber 112 through the window portion of the side wall 112a. The window portion transmits light. For example, the window portion transmits visible light.

[0054] The imaging device 510 generates video data by imaging a region including the area below the tip 136a of the first nozzle 136 and the area below the tip 146a of the second nozzle 146. Therefore, the imaging device 510 can generate video data by imaging the processing liquid discharged from the first nozzle 136 and the second nozzle 146. In this embodiment, the imaging device 510 generates video data by imaging a region including the tip 136a of the first nozzle 136, the tip 146a of the second nozzle 146, and the upper surface Wa of the substrate W.

[0055] In the imaging device 510, the frame rate may be 30fps, 60fps, or 120fps. The imaging device 510 is, for example, sensitive to visible light.

[0056] The illumination device 520 irradiates light (for example, visible light) into the chamber 112. Specifically, the illumination device 520 irradiates light (hereinafter sometimes referred to as illumination light) into an area including the area below the tip 136a of the first nozzle 136 and the area below the tip 146a of the second nozzle 146. In this embodiment, the illumination device 520 irradiates the area including the tip 136a of the first nozzle 136, the tip 146a of the second nozzle 146, and the upper surface Wa of the substrate W with illumination light. Therefore, the imaging device 510 images the first nozzle 136, the second nozzle 146, the processing liquid, and the substrate W, etc., which are illuminated by the illumination light. Thus, the processing liquid, etc., can be easily imaged by the imaging device 510.

[0057] The control device 530 controls various operations of the discharge analysis device 500. The control device 530 includes a control unit 532 and a storage unit 534. The control unit 532 has a processor. The control unit 532 has, for example, a central processing unit (CPU). Alternatively, the control unit 532 may have a general-purpose computer. Note that the control unit 532 is an example of the "second control unit" of the present invention.

[0058] The storage unit 534 includes a main memory and an auxiliary storage device. The main memory is, for example, a semiconductor memory. The auxiliary storage device is, for example, a semiconductor memory and / or a hard disk drive. The storage unit 534 may also include removable media. The control unit 532 executes a computer program stored in the storage unit 534 to perform the ejection analysis operation. The storage unit 534 stores various types of data. The data includes, for example, video data captured by the imaging device 510.

[0059] The control unit 532 generates first discharge data, based on the video data, which shows in chronological order whether or not the first processing liquid is being discharged from the first nozzle 136. The control unit 532 also generates second discharge data, based on the video data, which shows in chronological order whether or not the second processing liquid is being discharged from the second nozzle 146. The generated first and second discharge data are stored in the storage unit 534.

[0060] The control unit 532 transmits the video data and the generated first ejection data and second ejection data to the control unit 102 of the substrate processing apparatus 100.

[0061] Next, with reference to Figures 3 and 4, the specific methods for generating the first and second discharge data by the discharge analysis device 500 will be described. Figure 3 is a schematic diagram showing an example of an image (one frame of video data) generated by the imaging device 510, and shows the state when the discharge of the first processing liquid from the first nozzle 136 has started. Figure 4 is a schematic diagram showing an example of an image generated by the imaging device 510, and shows the state after a predetermined time has elapsed since the discharge of the first processing liquid from the first nozzle 136 started. In Figures 3 and 4, the first processing liquid is hatched for ease of understanding. Furthermore, the state in which the second processing liquid is discharged from the second nozzle 146 is the same as the state in which the first processing liquid is discharged from the first nozzle 136, so its explanation will be omitted.

[0062] As shown in Figure 3, when the discharge of the first processing liquid from the first nozzle 136 begins, the first processing liquid is discharged from the first nozzle 136 in a roughly cylindrical shape. The diameter φ of the roughly cylindrical first processing liquid increases over time. As a result, the amount of first processing liquid discharged from the first nozzle 136 increases over time.

[0063] As shown in Figure 4, after a predetermined time has elapsed since the discharge of the first processing liquid from the first nozzle 136 began, the diameter φ of the roughly cylindrical first processing liquid is maintained at a nearly constant level. As a result, the amount of first processing liquid discharged from the first nozzle 136 is maintained at a nearly constant level.

[0064] Furthermore, when the discharge of the first processing liquid from the first nozzle 136 is stopped, the diameter φ of the roughly cylindrical first processing liquid decreases over time. As a result, the amount of first processing liquid discharged from the first nozzle 136 decreases over time, and eventually, no more first processing liquid is discharged from the first nozzle 136.

[0065] The imaging device 510 transmits the captured video data to the control unit 532. Based on the video data, the control unit 532 determines whether or not the first processing liquid is being discharged from the first nozzle 136. Specifically, the control unit 532 determines whether or not the diameter φ of the first processing liquid discharged from the first nozzle 136 is greater than or equal to a predetermined threshold. The predetermined threshold is not particularly limited, but is 0 mm or greater. In this embodiment, the predetermined threshold is, for example, about half the maximum diameter (diameter φ shown in Figure 4).

[0066] The control unit 532 determines that the first processing liquid is being discharged from the first nozzle 136 if it determines that the diameter φ of the first processing liquid is greater than or equal to a predetermined threshold (for example, the state in Figure 4). On the other hand, the control unit 532 determines that the first processing liquid is not being discharged from the first nozzle 136 if it determines that the diameter φ of the first processing liquid is less than a predetermined threshold (for example, the state in Figure 3). Based on the determination result, the control unit 532 generates first discharge data. In other words, the control unit 532 generates first discharge data that shows whether or not the first processing liquid is being discharged from the first nozzle 136 in a binary time series by binarizing the diameter φ of the first processing liquid. In this embodiment, the first discharge data shows "0" when the first processing liquid is not being discharged from the first nozzle 136 and "1" when the first processing liquid is being discharged from the first nozzle 136.

[0067] Similarly, the control unit 532 determines, based on the video data, whether or not the second processing liquid is being discharged from the second nozzle 146. Specifically, the control unit 532 determines whether or not the diameter φ of the second processing liquid being discharged from the second nozzle 146 is greater than or equal to a predetermined threshold. If the control unit 532 determines that the diameter φ of the second processing liquid is greater than or equal to the predetermined threshold, it determines that the second processing liquid is being discharged from the second nozzle 146. On the other hand, if the control unit 532 determines that the diameter φ of the second processing liquid is less than the predetermined threshold, it determines that the second processing liquid is not being discharged from the second nozzle 146. Then, the control unit 532 generates second discharge data based on the determination result. In other words, the control unit 532 generates second discharge data that shows whether or not the second processing liquid is being discharged from the second nozzle 146 in a binary time series by binarizing the diameter φ of the second processing liquid. In this embodiment, the second discharge data indicates a state where the second processing liquid is not being discharged from the second nozzle 146 with a value of "0", and a state where the second processing liquid is being discharged from the second nozzle 146 with a value of "1".

[0068] According to the substrate processing system 1 of this embodiment, the control unit 532 generates first discharge data, which shows in time series whether or not the first processing liquid is being discharged from the first nozzle 136, and second discharge data, which shows in time series whether or not the second processing liquid is being discharged from the second nozzle 146, based on video data. Therefore, by using the first discharge data and the second discharge data, it is possible to easily confirm whether or not liquid depletion occurs on the substrate W. Thus, if defects such as particles occur due to liquid depletion, the cause of the defect can be easily determined. However, even if the first processing liquid discharged from the first nozzle 136 and the second processing liquid discharged from the second nozzle 146 are imaged and video data is generated, liquid depletion occurs for only a short period of time, so it is difficult to easily determine whether or not liquid depletion has occurred by looking at the video data.

[0069] Next, the substrate processing system 1 of this embodiment will be described with reference to Figure 5. Figure 5 is a block diagram of the substrate processing system 1.

[0070] As shown in Figure 5, the control device 101 controls various operations of the substrate processing apparatus 100. The control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the first processing liquid supply unit 130, the second processing liquid supply unit 140, the moving mechanism 150, the liquid return unit 210, the liquid return unit 220, and the cup 180. Specifically, the control device 101 controls the indexer robot IR, the center robot CR, the substrate holding unit 120, the first processing liquid supply unit 130, the second processing liquid supply unit 140, the moving mechanism 150, the liquid return unit 210, the liquid return unit 220, and the cup 180 by transmitting control signals to them.

[0071] The substrate processing apparatus 100 further comprises a display unit 300 and an input unit 310. The display unit 300 displays various information. The display unit 300 displays, for example, various setting screens (input screens). In this embodiment, the display unit 300 displays, for example, first ejection data and second ejection data. The display unit 300 has, for example, a liquid crystal display or an organic EL (electroluminescence) display.

[0072] The input unit 310 receives input from the user. For example, the input unit 310 accepts requests to execute processing on the board W, stop processing on the board W, change processing conditions and various setting values, etc. The input unit 310 also includes, for example, a touch panel and a pointing device. The touch panel is, for example, placed on the display surface of the display unit 300. The input unit 310 and the display unit 300 constitute, for example, a graphical user interface.

[0073] The control unit 102 controls the indexer robot IR to transfer the substrate W using the indexer robot IR.

[0074] The control unit 102 controls the center robot CR to transfer the substrates W to the center robot CR. For example, the center robot CR receives an unprocessed substrate W and loads it into one of the multiple chambers 112. The center robot CR also receives the processed substrate W from the chamber 112 and unloads it.

[0075] The control unit 102 controls the substrate holder 120 to control the start of rotation of the substrate W, the change in rotation speed, and the stop of rotation of the substrate W. For example, the control unit 102 can change the rotation speed of the substrate holder 120 by controlling the substrate holder 120. Specifically, the control unit 102 can change the rotation speed of the substrate W by changing the rotation speed of the electric motor 124 of the substrate holder 120.

[0076] The control unit 102 can control the first valve 134 of the first processing liquid supply unit 130 to switch the state of the first valve 134 between an open state and a closed state. Specifically, the control unit 102 transmits a first control signal to the first valve 134 to control the opening and closing of the first valve 134. By controlling the first valve 134 of the first processing liquid supply unit 130 to open the first valve 134, the control unit 102 can allow the first processing liquid flowing through the piping 132 toward the first nozzle 136 to pass through. Alternatively, by controlling the first valve 134 of the first processing liquid supply unit 130 to close the first valve 134, the control unit 102 can stop the supply of processing liquid flowing through the piping 132 toward the first nozzle 136.

[0077] The control unit 102 can control the second valve 144 of the second processing liquid supply unit 140 to switch the state of the second valve 144 between an open state and a closed state. Specifically, the control unit 102 transmits a second control signal to the second valve 144 to control the opening and closing of the second valve 144. By controlling the second valve 144 of the second processing liquid supply unit 140 to open the second valve 144, the control unit 102 can allow the second processing liquid flowing through the piping 142 toward the second nozzle 146 to pass through. Alternatively, by controlling the second valve 144 of the second processing liquid supply unit 140 to close the second valve 144, the control unit 102 can stop the supply of processing liquid flowing through the piping 142 toward the second nozzle 146.

[0078] The control unit 102 can move the first nozzle 136 and the second nozzle 146 by controlling the moving mechanism 150. Specifically, the control unit 102 can move the first nozzle 136 and the second nozzle 146 above the upper surface Wa of the substrate W by controlling the moving mechanism 150. The control unit 102 can also move the first nozzle 136 and the second nozzle 146 to a retracted position away from above the upper surface Wa of the substrate W by controlling the moving mechanism 150.

[0079] The control unit 102 controls the liquid return unit 210 to pull the first processing liquid in the first nozzle 136 back to the upstream side (pipe 132 side). In other words, the control unit 102 controls the liquid return unit 210 to perform suck-back. Specifically, the control unit 102 controls the first valve 134 to stop the supply of the first processing liquid to the first nozzle 136, and then controls the liquid return unit 210 to pull the first processing liquid in the first nozzle 136 back to the upstream side (pipe 132 side).

[0080] The control unit 102 controls the liquid return unit 220 to pull the second processing liquid in the second nozzle 146 back to the upstream side (pipe 142 side). In other words, the control unit 102 controls the liquid return unit 220 to perform suck-back. Specifically, the control unit 102 controls the second valve 144 to stop the supply of the second processing liquid to the second nozzle 146, and then controls the liquid return unit 220 to pull the second processing liquid in the second nozzle 146 back to the upstream side (pipe 142 side).

[0081] The control unit 102 controls the cup 180 to move it relative to the substrate W. Specifically, the control unit 102 raises the cup 180 vertically upward to the side of the substrate W during the period when the first processing liquid supply unit 130 or the second processing liquid supply unit 140 supplies processing liquid to the substrate W. When the period during which the first processing liquid supply unit 130 or the second processing liquid supply unit 140 supplies processing liquid to the substrate W ends, the control unit 102 lowers the cup 180 vertically downward from the side of the substrate W.

[0082] In this embodiment, the control unit 102 controls the display unit 300 to display the first discharge data and the second discharge data.

[0083] Specifically, the control unit 102 controls the display unit 300 to display time-series data showing the substrate processing status over time. This time-series data shows the state of the substrate processing apparatus 100 during the substrate processing operation over time.

[0084] The time-series data includes, for example, signals transmitted by the control unit 102 to each part of the substrate processing apparatus 100. The signals transmitted to each part include, for example, a first control signal and a second control signal transmitted by the control unit 102 to the first processing liquid supply unit 130 and the second processing liquid supply unit 140 during substrate processing operation.

[0085] Furthermore, the time-series data includes, for example, signals received by the control unit 102 from sensors in various parts of the substrate processing apparatus 100. The sensors in various parts include, for example, a temperature sensor (not shown) for measuring the temperature of the substrate W, a rotation speed sensor for measuring the rotation speed of the substrate W, and flow meters 135 and 145 for measuring the flow rate of the processing liquid.

[0086] In this embodiment, the control unit 102 adds the first discharge data and second discharge data received from the control unit 532 to the time-series data. The control unit 102 then controls the display unit 300 to display the first control data indicating the first control signal, the second control data indicating the second control signal, the first discharge data and second discharge data side by side on one screen (see Figure 7). In this embodiment, the control unit 102 controls the display unit 300 to display the first control data indicating the first control signal, the second control data indicating the second control signal, the measurement data from the flow meter 135 and the measurement data from the flow meter 145, the first discharge data and second discharge data side by side on one screen. More specifically, the control unit 102 controls the display unit 300 to display the first control data, the second control data, the measurement data from the flow meter 135 and the measurement data from the flow meter 145, and the first discharge data and second discharge data side by side in the vertical direction as a timing chart.

[0087] Next, the substrate processing method of this embodiment will be described with reference to Figures 6 and 7. Figure 6 is a flowchart of the substrate processing method of this embodiment. Figure 7 is a schematic diagram showing an example of time-series data displayed on the display unit 300. Steps S101 to S112 are executed by the control unit 102. Step S102 is an example of the "process of rotating the substrate" of the present invention. Step S104 is an example of the "process of starting the supply of the first processing liquid" of the present invention. Step S105 is an example of the "process of starting the supply of the second processing liquid" of the present invention.

[0088] As shown in Figure 6, in step S101, the substrate W is loaded into the substrate processing apparatus 100. Specifically, the substrate W is loaded into the chamber 112 of the substrate processing unit 110 via the indexer robot IR and the center robot CR.

[0089] In step S102, the substrate holding unit 120 holds the substrate W. Specifically, when the substrate W is brought into the chamber 112, it is held by the substrate holding unit 120. Then, the control unit 102 starts rotating the substrate W using the substrate holding unit 120.

[0090] In step S103, the control unit 102 instructs the ejection analyzer 500 to start imaging. Specifically, the control unit 102 transmits an imaging start signal to the ejection analyzer 500 to begin imaging.

[0091] In step S104, the control unit 102 starts supplying the first processing liquid. Specifically, the control unit 102 starts transmitting a first control signal to the first valve 134 indicating an open signal (T1 in Figure 7). As a result, the first valve 134 opens, and the supply of the first processing liquid to the first nozzle 136 begins (T2 in Figure 7). At this time, the flow rate of the first processing liquid passing through the flow meter 135 gradually increases from zero to the first flow rate. Then, after a predetermined time has elapsed since the supply of the first processing liquid to the first nozzle 136 began, the first processing liquid is discharged from the first nozzle 136 onto the substrate W (T3 in Figure 7).

[0092] In step S105, the control unit 102 starts supplying the second processing liquid. Specifically, after a predetermined time has elapsed since the control unit 102 started transmitting the first control signal to the first valve 134, it starts transmitting a second control signal to the second valve 144 indicating an open signal (T4 in Figure 7). As a result, the second valve 144 opens, and the supply of the second processing liquid to the second nozzle 146 begins (T5 in Figure 7). At this time, the flow rate of the second processing liquid passing through the flow meter 145 gradually increases from zero to the second flow rate. Then, after a predetermined time has elapsed since the supply of the second processing liquid to the second nozzle 146 began, the second processing liquid is discharged from the second nozzle 146 onto the substrate W (T6 in Figure 7).

[0093] In step S106, the control unit 102 stops supplying the first processing liquid. Specifically, the control unit 102 stops transmitting the first control signal to the first valve 134 after a predetermined time has elapsed since it started transmitting the first control signal to the first valve 134 (T7 in Figure 7). In other words, the control unit 102 stops transmitting the first control signal to the first valve 134 after a predetermined time has elapsed since it started transmitting the second control signal to the second valve 144. As a result, the first valve 134 closes, and the supply of the first processing liquid to the first nozzle 136 is stopped (T8 in Figure 7). At this time, the amount of the first processing liquid passing through the flow meter 135 gradually decreases. Then, after a predetermined time has elapsed, the discharge of the first processing liquid from the first nozzle 136 to the substrate W is stopped (T9 in Figure 7). In this embodiment, the control unit 102 controls the liquid return unit 210 to pull the first processing liquid in the first nozzle 136 back to the upstream side (pipe 132 side). This prevents the first processing liquid from falling from the first nozzle 136 onto the substrate W.

[0094] In step S107, the control unit 102 stops supplying the second processing liquid. Specifically, after a predetermined time has elapsed since the start of transmitting the second control signal to the second valve 144, the control unit 102 stops transmitting the second control signal to the second valve 144 (T10 in Figure 7). As a result, the second valve 144 closes, and the supply of the second processing liquid to the second nozzle 146 is stopped (T11 in Figure 7). At this time, the amount of the second processing liquid passing through the flow meter 145 gradually decreases. After a predetermined time has elapsed, the discharge of the second processing liquid from the second nozzle 146 to the substrate W is stopped (T12 in Figure 7). In this embodiment, the control unit 102 controls the liquid return unit 220 to pull the second processing liquid in the second nozzle 146 back to the upstream side (pipe 142 side). This prevents the second processing liquid from falling from the second nozzle 146 onto the substrate W.

[0095] In step S108, the control unit 102 instructs the ejection analyzer 500 to stop imaging. Specifically, the control unit 102 transmits an imaging stop signal to the ejection analyzer 500 to stop imaging.

[0096] In step S109, the control unit 102 receives first discharge data and second discharge data from the discharge analysis device 500. In this embodiment, the control unit 102 receives first discharge data, second discharge data, and video data from the discharge analysis device 500.

[0097] In step S110, the control unit 102 adds the received first discharge data and second discharge data to the time-series data. The time-series data to which the first discharge data and second discharge data have been added is stored in the storage unit 104.

[0098] In step S111, the control unit 102 stops the rotation of the substrate W by the substrate holding unit 120 and releases the substrate W from being held by the substrate holding unit 120.

[0099] In step S112, the substrate W is discharged from the substrate processing apparatus 100. Specifically, the substrate W is discharged from the chamber 112 of the substrate processing unit 110 via the center robot CR and the indexer robot IR.

[0100] In this embodiment, an example has been described in which steps S108 to S110 are performed before stopping the rotation of the substrate W by the substrate holding part 120, but the present invention is not limited thereto. For example, one or more of steps S108 to S110 may be performed after step S111 or step S112.

[0101] Furthermore, although this embodiment describes an example in which the control unit 102 receives the first ejection data and the second ejection data after transmitting an imaging stop signal, the present invention is not limited to this. For example, the control unit 102 may sequentially receive the first ejection data and the second ejection data after transmitting an imaging start signal.

[0102] Next, with reference to Figure 8, the processing flow of the discharge analysis device 500 of this embodiment will be described. Figure 8 is a flow diagram of the discharge analysis device 500 of this embodiment. Steps S201 to S208 are executed by the control unit 532. Steps S202 and S203 are examples of the "process of imaging the second processing liquid and generating video data" of the present invention. Step S207 is an example of the "process of generating first discharge data and second discharge data" of the present invention.

[0103] As shown in Figure 8, in step S201, the control unit 532 receives an imaging start signal from the control unit 102.

[0104] In step S202, the control unit 532 controls the imaging device 510 to start imaging. At this time, the control unit 532 controls the illumination device 520 to start illuminating the imaging area with light.

[0105] In step S203, the imaging device 510 starts generating video data. The video data is stored in the storage unit 534.

[0106] In step S204, the control unit 532 receives an imaging stop signal from the control unit 102.

[0107] In step S205, the control unit 532 controls the imaging device 510 to stop imaging. At this time, the control unit 532 controls the illumination device 520 to stop illuminating the imaging area with light.

[0108] In step S206, the imaging device 510 stops generating video data.

[0109] In step S207, the control unit 532, movie Based on the data, the first and second discharge data are generated.

[0110] In step S208, the control unit 532 transmits the generated first discharge data and second discharge data to the control unit 102.

[0111] In this embodiment, an example has been described in which the control unit 532 transmits the first ejection data and the second ejection data to the control unit 102 after the imaging device 510 stops capturing images. However, the present invention is not limited to this example. For instance, the control unit 532 may start generating the first ejection data and the second ejection data after starting to generate the video data, and then sequentially transmit the generated data to the control unit 102.

[0112] Next, the methods for utilizing the first and second ejected data will be explained with reference to Figures 7, 9, and 10. Figure 9 is a diagram showing the processing flow of the substrate processing apparatus 100 when displaying the first and second ejected data on the display unit 300. Figure 10 is a schematic diagram showing an example of time-series data displayed on the display unit 300.

[0113] For example, as shown in Figure 7, if the discharge of the first processing liquid from the first nozzle 136 to the substrate W stops (T9) and then the second processing liquid is discharged from the second nozzle 146 to the substrate W (T6), the upper surface Wa of the substrate W dries out, resulting in processing defects and particle generation.

[0114] Therefore, in order to determine the cause, the user operates the input unit 310 to display the first discharge data and the second discharge data on the display unit 300. In this embodiment, as shown in Figure 7, the display unit 300 displays time-series data to which the first discharge data and the second discharge data have been added.

[0115] Specifically, as shown in Figure 9, in step S301, the user operates the input unit 310 so that the first discharge data and the second discharge data are displayed. In this way, the input unit 310 receives instructions from the user.

[0116] In step S302, the display unit 300 displays the first discharge data and the second discharge data. In this embodiment, the display unit 300 displays time-series data in which the first discharge data and the second discharge data have been added.

[0117] In this embodiment, by looking at the first discharge data and the second discharge data, the user can easily determine whether the second processing liquid was discharged from the second nozzle 146 onto the substrate W after the discharge of the first processing liquid from the first nozzle 136 onto the substrate W stopped (T9) (T6).

[0118] If the discharge of the first processing liquid from the first nozzle 136 to the substrate W has stopped (T9), and the second processing liquid is being discharged from the second nozzle 146 to the substrate W (T6), in this embodiment, the user increases the opening and closing speed of the second valve 144 by adjusting the second adjustment unit 170.

[0119] As a result, when processing the next substrate W, the time from when the second control signal is started to be transmitted to the second valve 144 (T4) to when the second valve 144 opens and the supply of the second processing liquid to the second nozzle 146 begins (T5), as shown in Figure 10, is shortened. In addition, the rate at which the amount of the second processing liquid passing through the flow meter 145 increases is increased, so the rate at which the amount of the second processing liquid discharged from the second nozzle 146 increases is also increased. As a result, the timing at which the second processing liquid is discharged from the second nozzle 146 to the substrate W is shortened. Therefore, after the second processing liquid has been discharged from the second nozzle 146 to the substrate W (T6), it is possible to stop the discharge of the first processing liquid from the first nozzle 136 to the substrate W (T9). In other words, it is possible to eliminate the non-discharge period.

[0120] In this embodiment, as described above, the control unit 102 adds the first ejection data and the second ejection data to the time-series data that shows the substrate processing status in chronological order. Therefore, for example, when a user tries to check the time-series data, they can also check the first ejection data and the second ejection data.

[0121] Furthermore, as described above, the control unit 532 transmits the generated first ejection data and second ejection data to the control unit 102. Thus, the substrate processing apparatus 100 can acquire the first ejection data and second ejection data.

[0122] Furthermore, as described above, the display unit 300 displays the first and second dispensing data. Therefore, the user can easily check whether or not liquid depletion has occurred.

[0123] Furthermore, as described above, the display unit 300 displays the first control data indicating the first control signal and the second control data indicating the second control signal, along with the first and second discharge data. Therefore, the user can simultaneously check both the first and second control data and the first and second discharge data. Thus, the user can more easily confirm whether or not liquid depletion has occurred.

[0124] Furthermore, as described above, the display unit 300 displays the first control data and the second control data, and the first discharge data and the second discharge data side by side as a timing chart. Therefore, the user can more easily confirm whether or not liquid depletion has occurred.

[0125] Next, with reference to Figure 11, a substrate processing system 1 according to a first modification of this embodiment will be described. Figure 11 is a block diagram of the substrate processing system 1 of the first modification. In the first modification, unlike the above embodiment, an example will be described in which the substrate processing system 1 includes a notification unit 320.

[0126] As shown in Figure 11, the substrate processing system 1 further includes a notification unit 320. In the first modified example, the control unit 102 determines, based on the first discharge data and the second discharge data, whether there is a non-discharge period tc (the period between T9 and T6 in Figure 7) in which neither the first nor the second processing liquid is discharged, between the first discharge period ta (T3 to T9 in Figure 7) in which the first processing liquid is discharged from the first nozzle 136 and the second discharge period tb (T6 to T12 in Figure 7) in which the second processing liquid is discharged from the second nozzle 146.

[0127] If the control unit 102 determines that a non-discharge period tc exists between the first discharge period ta and the second discharge period tb, it transmits a notification signal to the notification unit 320. The notification signal is a signal that indicates the existence of a non-discharge period tc between the first discharge period ta and the second discharge period tb. In other words, the notification signal is a signal that indicates the occurrence of liquid depletion.

[0128] When the notification unit 320 receives a notification signal, it notifies the user that there is a non-discharge period tc between the first discharge period ta and the second discharge period tb. The notification unit 320 is not particularly limited, but for example, it may have a display screen that displays the notification content. The notification unit 320 may also have an indicator lamp or a speaker that emits sound. In addition, the display unit 300 may also serve as the notification unit 320.

[0129] The other components of the first modified example are the same as those of the embodiment described above.

[0130] In the first modified example, as described above, the control unit 102 determines, based on the first discharge data and the second discharge data, whether or not there is a non-discharge period tc between the first discharge period ta and the second discharge period tb during which neither the first nor the second processing liquid is discharged. Therefore, the occurrence of liquid depletion can be easily detected.

[0131] Furthermore, as described above, the notification unit 320 notifies the user that a non-dispensing period tc exists when the control unit 102 determines that such a period exists. Therefore, the user can easily know when the liquid runs out.

[0132] Other effects of the first modification are the same as those of the embodiment described above.

[0133] Next, with reference to Figure 12, a substrate processing system 1 according to a second modification of this embodiment will be described. Figure 12 is a block diagram of the substrate processing system 1 of the second modification. In the second modification, unlike the above embodiment and the first modification, an example will be described in which the control unit 102 controls at least the second speed controller 171 of the second adjustment unit 170. The second speed controller 171 is an example of the "speed controller" of the present invention.

[0134] As shown in Figure 12, the first adjustment unit 160 has a first speed controller 161 that adjusts the opening and closing speed of the first valve 134. The second adjustment unit 170 has a second speed controller 171 that adjusts the opening and closing speed of the second valve 144. In the second modified example, the first speed controller 161 and the second speed controller 171 are controlled by the control unit 102. Specifically, each of the first speed controller 161 and the second speed controller 171 includes, for example, a needle valve (not shown) and a drive motor (not shown) that drives the needle valve. In the second modified example, the control unit 102 drives the needle valve by controlling the drive motor.

[0135] In the second modified example, similar to the first modified example, the control unit 102 determines, based on the first and second discharge data, whether or not a non-discharge period tc exists between the first discharge period ta and the second discharge period tb.

[0136] In the second modified example, if the control unit 102 determines that there is a non-discharge period tc between the first discharge period ta and the second discharge period tb, it controls the second speed controller 171 to increase the opening and closing speed of the second valve 144.

[0137] The memory unit 104 may also pre-store an adjustment table that associates the length of the non-discharge period tc with the adjustment amount of the second speed controller 171. The control unit 102 may calculate the length of the non-discharge period tc and control the second speed controller 171 based on the calculated non-discharge period tc and the adjustment table. With this configuration, the control unit 102 can easily and appropriately adjust the discharge timing of the second processing liquid.

[0138] The other configurations of the second modified example are the same as those of the above embodiment and the first modified example.

[0139] In the second modified configuration, as described above, if the control unit 102 determines that a non-discharge period tc exists between the first discharge period ta and the second discharge period tb, it controls the second speed controller 171 to increase the opening and closing speed of the second valve 144. Therefore, if liquid depletion occurs, the discharge timing of the second processing liquid can be automatically adjusted so that liquid depletion does not occur in subsequent substrate processing.

[0140] In the second modified example, the control unit 102 automatically adjusts the opening and closing speed of the second valve 144 to prevent liquid depletion, even if the user does not need to confirm the existence of a non-discharge period tc. Therefore, the display unit 300 does not need to display the first and second discharge data.

[0141] Other effects of the second modification are the same as those of the above embodiment and the first modification.

[0142] Next, with reference to Figure 13, a third modified example of the substrate processing apparatus 100 of this embodiment will be described. Figure 13 is a block diagram of the third modified example of the substrate processing apparatus 100. In the third modified example, unlike the above embodiment, the first modified example, and the second modified example, an example will be described in which the substrate processing apparatus 100 includes an imaging device 510 and an illumination device 520.

[0143] As shown in Figure 13, in the third modified example, unlike the above embodiment, the first modified example, and the second modified example, the substrate processing apparatus 100 includes an imaging device 510 and an illumination device 520. The control unit 102 controls the imaging device 510 and the illumination device 520. In other words, the control unit 102 also functions as the control unit 532. For example, the control unit 102 generates first ejection data and second ejection data based on video data. In the third modified example, the substrate processing apparatus 100 corresponds to the "substrate processing system" of the present invention.

[0144] Other configurations, control methods, and effects of the third modified example are the same as those of the embodiments, the first modified example, and the second modified example described above.

[0145] Embodiments and modifications of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above embodiments and modifications, and can be implemented in various forms without departing from the spirit of the invention. Furthermore, various inventions can be formed by appropriately combining the multiple components disclosed in the above embodiments and modifications. For example, some components may be deleted from all the components shown in the embodiments and modifications. Furthermore, components from different embodiments and modifications may be appropriately combined. The drawings schematically show each component in order to make them easy to understand, and the thickness, length, number, spacing, etc. of each component shown may differ from the actual dimensions due to the convenience of drawing creation. Also, the material, shape, dimensions, etc. of each component shown in the above embodiments and modifications are examples and are not particularly limited, and various changes are possible without substantially departing from the effects of the present invention.

[0146] For example, in the above embodiment, an example was described in which the display unit 300 displays the first control data and the second control data side by side with the first discharge data and the second discharge data, but the present invention is not limited to this. For example, the display unit 300 may not display the first control data and the second control data, but may display only the first discharge data and the second discharge data. Alternatively, the display unit 300 may display data other than the first control data and the second control data side by side with the first discharge data and the second discharge data.

[0147] Furthermore, while the above embodiment describes an example in which the display unit 300 displays the first control data and the second control data, and the first discharge data and the second discharge data as a timing chart, the present invention is not limited to this. For example, the display unit 300 may display the first control data and the second control data, and the first discharge data and the second discharge data using a display method other than a timing chart.

[0148] Furthermore, although the above embodiment describes an example in which the first and second discharge data are added to the time-series data, the present invention is not limited thereto. The first and second discharge data do not need to be added to the time-series data.

[0149] Furthermore, in the second modified example described above, the control unit 102 controls the second speed controller 171 to automatically adjust the discharge timing of the second processing liquid, and an example in which the substrate processing system 1 does not have a notification unit 320 was described, but the present invention is not limited to this. For example, in a configuration in which the control unit 102 automatically adjusts the discharge timing of the processing liquid, the substrate processing system 1 may have a notification unit 320.

[0150] Furthermore, in the above embodiment and the second modification, for example, an example was described in which the non-discharge period tc is eliminated by increasing the opening and closing speed of the second valve 144. In other words, an example was described in which the non-discharge period tc is eliminated by starting the second discharge period tb earlier. However, the present invention is not limited to this. For example, the non-discharge period tc may be eliminated by delaying the end timing of the first discharge period ta. In this case, for example, the delay time for delaying the end timing of the first discharge period ta may be set in the recipe or soft parameter.

[0151] Furthermore, although the above embodiment describes an example in which the substrate processing apparatus 100 includes a display unit 300 that displays first ejection data and second ejection data, the present invention is not limited to this. For example, the substrate processing apparatus 100 does not need to include a display unit 300 that displays first ejection data and second ejection data. [Industrial applicability]

[0152] The present invention is suitably used in substrate processing systems, substrate processing methods, and programs. [Explanation of symbols]

[0153] 1: Substrate processing system 102: Control Unit (First Control Unit) 120: Board holding part 134: First valve 136: Nozzle No. 1 144: Second valve 146: Second nozzle 171: Second Speed ​​Controller (Speed ​​Controller) 300:Display section 320: Hochi Department 510: Imaging device 532: Control Unit (Second Control Unit) S102: Step (process of rotating the substrate) S104: Step (Step to start supplying the first processing liquid) S105: Step (Step to start supplying the second treatment liquid) S202: Step (Process of imaging the second processing solution and generating video data) S203: Step (Process of imaging the second processing solution and generating video data) S207: Step (The process of generating the first discharge data and the second discharge data) ta: 1st discharge period tb: 2nd discharge period tc: non-discharge period W: Circuit board Wa: Top surface

Claims

1. A substrate holding unit that holds the substrate and rotates the substrate, A first nozzle for discharging a first processing liquid onto the upper surface of the substrate held by the substrate holding portion, A first valve for supplying and stopping the supply of the first processing liquid to the first nozzle, A second nozzle for discharging a second processing liquid onto the upper surface of the substrate held in the substrate holding portion, A second valve for supplying and stopping the supply of the second processing liquid to the second nozzle, An imaging device that captures images of the first processing liquid discharged from the first nozzle and the second processing liquid discharged from the second nozzle to generate video data, A control unit that controls the first valve to start supplying the first processing liquid to the first nozzle, and then controls the second valve to start supplying the second processing liquid to the second nozzle. Equipped with, The control unit, Based on the aforementioned video data, first discharge data is generated that shows in chronological order whether or not the first processing liquid is being discharged from the first nozzle, and indicates the start and end of the discharge of the first processing liquid; and second discharge data is generated that shows in chronological order whether or not the second processing liquid is being discharged from the second nozzle, and indicates the start and end of the discharge of the second processing liquid. A substrate processing system in which the first discharge data and the second discharge data continuously indicate the presence or absence of discharge over time, from before the discharge of the first processing liquid at the first nozzle to after the discharge of the second processing liquid at the second nozzle.

2. The substrate processing system according to claim 1, wherein the control unit adds the first ejection data and the second ejection data to time-series data indicating the substrate processing state in time series.

3. A substrate holding unit that holds the substrate and rotates the substrate, A first nozzle for discharging a first processing liquid onto the upper surface of the substrate held by the substrate holding portion, A first valve for supplying and stopping the supply of the first processing liquid to the first nozzle, A second nozzle for discharging a second processing liquid onto the upper surface of the substrate held in the substrate holding portion, A second valve for supplying and stopping the supply of the second processing liquid to the second nozzle, An imaging device that captures images of the first processing liquid discharged from the first nozzle and the second processing liquid discharged from the second nozzle to generate video data, A control unit that controls the first valve to start supplying the first processing liquid to the first nozzle, and then controls the second valve to start supplying the second processing liquid to the second nozzle, A display unit that displays data including first discharge data showing in chronological order whether or not the first processing liquid is being discharged from the first nozzle, and second discharge data showing in chronological order whether or not the second processing liquid is being discharged from the second nozzle. Equipped with, The control unit, Based on the aforementioned video data, the first ejection data and the second ejection data are generated. The first ejection data and the second ejection data are added to the time-series data that shows the substrate processing status in chronological order. A first control signal for controlling the opening and closing of the first valve is transmitted to the first valve. A second control signal for controlling the opening and closing of the second valve is transmitted to the second valve. The display unit displays first control data indicating the first control signal and second control data indicating the second control signal, along with the first ejection data and the second ejection data, side by side, in a substrate processing system.

4. The substrate processing system according to claim 3, wherein the display unit displays the first control data and the second control data, and the first discharge data and the second discharge data side by side as a timing chart.

5. The control unit comprises a first control unit that controls the first valve and the second valve, and a second control unit that controls the imaging device. The second control unit is, The first discharge data and the second discharge data are generated, A substrate processing system according to any one of claims 1 to 4, comprising transmitting the generated first ejection data and the second ejection data to a first control unit.

6. The substrate processing system according to any one of claims 1 to 4, wherein the control unit determines, based on the first discharge data and the second discharge data, whether or not there is a non-discharge period between the first discharge period in which the first processing liquid is discharged from the first nozzle and the second discharge period in which the second processing liquid is discharged from the second nozzle, in which neither the first processing liquid nor the second processing liquid is discharged.

7. The substrate processing system according to claim 6, further comprising a notification unit that notifies the user of the existence of the non-discharge period when the control unit determines that the non-discharge period exists.

8. The second valve is equipped with a speed controller that adjusts the opening and closing speed, The substrate processing system according to claim 6, wherein the control unit determines that a non-discharge period exists and controls the speed controller to increase the opening and closing speed of the second valve.

9. A step of holding the substrate and rotating the substrate, A step of starting the supply of the first processing liquid to a first nozzle that discharges the first processing liquid onto the upper surface of the substrate, The process includes, after the step of starting the supply of the first processing liquid, starting the supply of the second processing liquid to a second nozzle that discharges the second processing liquid onto the upper surface of the substrate, A step of generating video data by imaging the first processing liquid discharged from the first nozzle and the second processing liquid discharged from the second nozzle, Based on the aforementioned video data, the process generates first discharge data that shows in chronological order whether or not the first processing liquid is being discharged from the first nozzle and indicates the start and end of discharge of the first processing liquid, and second discharge data that shows in chronological order whether or not the second processing liquid is being discharged from the second nozzle and indicates the start and end of discharge of the second processing liquid, and generates data as the first discharge data and the second discharge data that continuously shows the presence or absence of discharge over time, from before the discharge of the first processing liquid from the first nozzle to after the discharge of the second processing liquid from the second nozzle. A substrate processing method, including the following.

10. A step of holding the substrate and rotating the substrate, A step of starting the supply of the first processing liquid to a first nozzle that discharges the first processing liquid onto the upper surface of the substrate, The process includes, after the step of starting the supply of the first processing liquid, starting the supply of the second processing liquid to a second nozzle that discharges the second processing liquid onto the upper surface of the substrate, A step of generating video data by imaging the first processing liquid discharged from the first nozzle and the second processing liquid discharged from the second nozzle, A step of generating, based on the aforementioned video data, first discharge data that shows in chronological order whether or not the first processing liquid is being discharged from the first nozzle, and second discharge data that shows in chronological order whether or not the second processing liquid is being discharged from the second nozzle, A step of adding the first ejection data and the second ejection data to time-series data that shows the substrate processing status in chronological order, A step of displaying side by side the first control data, which indicates a first control signal that controls the opening and closing of a first valve that supplies and stops the supply of the first processing liquid to the first nozzle, and the second control data, which indicates a second control signal that controls the opening and closing of a second valve that supplies and stops the supply of the second processing liquid to the second nozzle, along with the first discharge data and the second discharge data. A substrate processing method, including the following.

11. A process of generating video data by imaging the first processing liquid discharged from a first nozzle that discharges the first processing liquid onto the upper surface of the substrate, and the second processing liquid discharged from a second nozzle that starts discharging the second processing liquid onto the upper surface of the substrate after the start of discharge of the first processing liquid from the first nozzle, Based on the aforementioned video data, the process generates first discharge data that shows in chronological order whether or not the first processing liquid is being discharged from the first nozzle and indicates the start and end of discharge of the first processing liquid, and second discharge data that shows in chronological order whether or not the second processing liquid is being discharged from the second nozzle and indicates the start and end of discharge of the second processing liquid, and generates data as the first discharge data and the second discharge data that continuously shows the presence or absence of discharge over time, from before the discharge of the first processing liquid from the first nozzle to after the discharge of the second processing liquid from the second nozzle. A program that causes a computer to execute something.

12. A step of generating video data by imaging the first processing liquid discharged from a first nozzle that discharges the first processing liquid onto the upper surface of a substrate, and the second processing liquid discharged from a second nozzle that starts discharging the second processing liquid onto the upper surface of the substrate after the start of discharge of the first processing liquid from the first nozzle, A step of generating, based on the aforementioned video data, first discharge data that shows in chronological order whether or not the first processing liquid is being discharged from the first nozzle, and second discharge data that shows in chronological order whether or not the second processing liquid is being discharged from the second nozzle, A step of adding the first ejection data and the second ejection data to time-series data that shows the substrate processing status in chronological order, A step of displaying side by side the first control data, which indicates a first control signal that controls the opening and closing of a first valve that supplies and stops the supply of the first processing liquid to the first nozzle, and the second control data, which indicates a second control signal that controls the opening and closing of a second valve that supplies and stops the supply of the second processing liquid to the second nozzle, along with the first discharge data and the second discharge data. A program that causes a computer to execute something.

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