Plasma-based purification system and method

Abstract

To provide new systems and plasma reactors for removing NOX compounds from diesel exhaust gas.SOLUTION: A system for exhaust gas remediation includes an engine, a plasma reactor, and a pulse source. The engine emits exhaust gas that includes NO molecules and NOX molecules. The plasma reactor includes an internal chamber that is fluidly connected to the engine such that the exhaust gas flows into the internal chamber. An electrode is disposed within the internal chamber of the plasma reactor. The electrode is electrically coupled to an electrical pulse source. The electrical pulse source delivers electrical pulse to the electrode to form a plasma from the exhaust gas, thereby removing at least a portion of the NO molecules and at least a portion of the NOX molecules.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] Cross-reference of related applications This application claims the interests and priority of U.S. Provisional Patent No. 62 / 816,694, filed on March 11, 2019. This document is incorporated herein by reference in its entirety.

[0002] Technical field This invention relates to a transient plasma-based purification system. Specifically, this invention relates to an electrode configuration for a transient plasma-based purification system. [Background technology]

[0003] background Diesel engines are used to move large merchant ships across sea routes. When diesel engines are running, a large amount of exhaust gas is produced. This exhaust gas contains NO. X It may contain multiple harmful substances, such as compounds of NO emitted from diesel engines. X These compounds are substances that cause air pollution. Therefore, NO X A new system and method are needed to remove these compounds from diesel exhaust gases. [Overview of the Initiative]

[0004] overview According to some embodiments of the present disclosure, a plasma-based purification system is an engine including an exhaust port, wherein the engine discharges exhaust gas from the exhaust port, and the exhaust gas contains NO molecules and NO molecules passing through the exhaust port. XA plasma reactor comprising an engine containing molecules, a reactor tube and electrodes, wherein the reactor tube defines an internal chamber, the electrodes are at least partially located within the internal chamber inside the reactor tube, and the internal chamber is fluidly coupled to the exhaust port of a diesel engine so that exhaust gas flows from the exhaust port into the internal chamber of the plasma reactor; and a high-voltage source electrically coupled to the electrodes of the plasma reactor, which delivers electrical pulses to the electrodes, thereby forming plasma from the exhaust gas and from the exhaust gas NO molecules and NO X It comprises a high-voltage source configured to remove at least a portion of the molecules.

[0005] According to some embodiments of the present disclosure, a plasma reactor for plasma-based purification comprises a first reactor tube and a second reactor tube, and an inlet port coupled to a first end of the first reactor tube and a second end of the second reactor tube, the inlet port being configured to fluidly couple the exhaust port of an engine to the first reactor tube and the second reactor tube, thereby allowing exhaust gas to flow through the first reactor tube and the second reactor tube. The reactor comprises an outlet port coupled to a second end of a reactor tube, a first electrode disposed in a first reactor tube and a second electrode disposed in a second reactor tube, and a high-voltage connector coupled to the first and second reactor tubes, configured to electrically connect both the first and second electrodes to a high-voltage source, wherein the high-voltage connector is configured to deliver electrical pulses from the high-voltage source to both the first and second electrodes, thereby forming plasma from exhaust gas flowing through the first and second reactor tubes.

[0006] According to some embodiments of the present disclosure, a system for plasma-based purification comprises: a pair or more pairs of reactor tubes, each reactor tube in each pair having electrodes disposed therein; an inlet port fluidically coupled to the pair or more pairs of reactor tubes, the inlet port being configured to fluidly couple an engine exhaust port to the pair or more pairs of reactor tubes so that exhaust gases can flow through the pair or more pairs of reactor tubes; and one or more high-voltage connectors, each high-voltage connector being coupled to each of the pair or more pairs of reactor tubes, each high-voltage connector being electrically connected to an electrode in each of the pairs or more pairs of reactor tubes, the high-voltage connector being configured to carry an electrical pulse from a high-voltage source to an electrode in each of the pairs or more pairs of reactor tubes so as to form a plasma from exhaust gases flowing through the pair or more pairs of reactor tubes.

[0007] The aforementioned and other advantages of this disclosure will become apparent upon reading the following detailed description and referring to the drawings. [Brief explanation of the drawing]

[0008] [Figure 1] This is a block diagram of a system for plasma-based purification of diesel exhaust gases according to some embodiments of the present disclosure. [Figure 2] Figure 1 shows profiles of three-wire electrodes, four-wire electrodes, and extruded electrodes according to some embodiments of the present disclosure, all of which can be used in the system shown in Figure 1. [Figure 3]FIG. 3A is a perspective view of a plasma reactor including four pairs of reactor tubes and four high-voltage connectors for use in the system of FIG. 1 according to some embodiments of the present disclosure. FIG. 3B is a top plan view of the plasma reactor of FIG. 3A according to some embodiments of the present disclosure. [Figure 4] FIG. 4A is a top plan view of a pair of reactor tubes for use in the system of FIG. 1 according to some embodiments of the present disclosure. FIG. 4B is a cross-sectional view of one end of the pair of reactor tubes of FIG. 4A according to some embodiments of the present disclosure. [Figure 5A] A perspective view of a high-voltage connector for use in the system of FIG. 1 according to some embodiments of the present disclosure. [Figure 5B] A perspective view of a portion of the high-voltage connector of FIG. 5A and an electrode disposed within the plasma reactor according to some embodiments of the present disclosure. [Figure 5C] A plan view of the high-voltage connector of FIG. 5A coupled to two spacers according to some embodiments of the present disclosure. [Figure 6A] A first perspective view of an extruded electrode coupled to a spacer for use in the system of FIG. 1 according to some embodiments of the present disclosure. [Figure 6B] A second perspective view of the extruded electrode and spacer of FIG. 6A according to some embodiments of the present disclosure. [Figure 6C] A third perspective view of the extruded electrode and spacer of FIG. 6A according to some embodiments of the present disclosure. [Figure 7] A perspective view of a capacitor bypass network for use in the system of FIG. 1 according to some embodiments of the present disclosure.

DETAILED DESCRIPTION OF THE INVENTION

[0009] While this disclosure is open to various modifications and alternative forms, certain embodiments and several embodiments are shown as examples in the drawings and will be described in detail herein. However, it should be understood that this disclosure is not intended to be limited to any particular form of disclosure. Rather, this disclosure covers all modifications, equivalents, and alternative forms that fall within the spirit and scope of this disclosure as defined by the appended claims.

[0010] Detailed explanation While the present invention is open to many different forms of embodiment, preferred embodiments of the present invention are illustrated in the drawings and described in detail herein, with the understanding that this disclosure is intended to illustrate the principles of the present invention and is not intended to limit the broader aspects of the invention to the illustrated embodiments. For the purposes of this detailed description, singular terms include plurals (unless expressly denied), and vice versa. The terms “and” and “or” shall be both conjunctive and disjunctive. The term “all” means “any and all.” The term “any” means “any and all.” The term “including” means “including without limitation.” Furthermore, the singular terms “a,” “an,” and “the” include plural subjects unless clearly indicated otherwise by context.

[0011] Large merchant ships (such as general cargo ships, container ships, tankers, dry bulk carriers, multipurpose vessels, and refrigerated ships) operate using diesel engines that emit large amounts of exhaust gas. These diesel engines emit nitrogen-based gases such as nitric oxide (NO), nitrogen dioxide (NO2), and other compounds. X These compounds may be included. X These compounds are understood to be pollutants and can be harmful to the environment. To reduce these harmful emissions from diesel engines, diesel engine exhaust gases contain NOX It can be purified to reduce and / or remove the amount of the compound of

[0012] Figure 1 shows a system 100 for purifying exhaust gas, including a high-voltage source 108 and a plasma reactor 110. During operation, the plasma reactor 110 is fluidly coupled to the outlet of the engine 102 via a valve 111. The valve 111 is operable to control the exhaust gas discharged by the engine 102 directed towards the inlet port 112 of the plasma reactor 110. Any gas and / or substance discharged by the plasma reactor can be discharged at the outlet port 114. The exhaust gas not directed towards the engine 102 can be sent to the discharge port 104. In some embodiments, the exhaust gas of the engine 102 contains NO X molecules. In some embodiments, the engine 102 is a diesel engine and the exhaust gas is diesel exhaust. For example, the engine 102 can be a diesel engine of a large merchant ship. However, the engine 102 can also be other types of diesel engines, such as diesel engines of smaller ships, trucks, sports utility vehicles (SUVs), submarines, trains, or any other type of vehicle that may include a diesel engine. In still other embodiments, the engine 102 is a diesel engine of equipment such as a crane, bulldozer, or excavator. The engine 102 can also be a diesel engine of a power plant or a diesel engine from any other source. In further embodiments, the engine 102 is an engine other than a diesel engine.

[0013] The plasma reactor 110 is generally formed from at least one reactor tube defining an internal chamber 116 (see Figure 5B). The internal chamber 116 is fluidically connected to the engine 102 through an inlet port 112, thereby allowing exhaust gases to flow through the reactor tube. Electrodes are located within the internal chamber 116 of the reactor tube. The electrodes are electrically coupled to a high-voltage source 108. The high-voltage source 108 delivers electrical pulses to the electrodes when the internal chamber 116 contains exhaust gases from the engine 102, thereby forming plasma from the exhaust gases. The electrical pulses, and the resulting plasma formation, cause at least some NO molecules and NO X At least some of the molecules are removed from the exhaust gas, thereby purifying the exhaust gas at least partially.

[0014] In some embodiments, additional components can be added to the system 100 to test the plasma reactor 110. These components may include a gas analyzer 105, an oscilloscope 107, and one or more sensors 109. The gas analyzer 105 can be used to analyze the gas discharged from the outlet port 114 of the plasma reactor 110. Sensors 109 may be coupled to a high-voltage source 108 and are used to measure the voltage and current of pulses supplied to the plasma reactor 110. Sensors 109 are used to measure the induction of electric and magnetic fields of these pulses. The output of sensor 109 is transmitted to an integrator coupled to the oscilloscope 107 to obtain the waveform on the oscilloscope. This waveform is numerically reconstructed to form the actual voltage and current waveforms. The oscilloscope 107 can be housed in an electromagnetically compatible (EMC) cabinet or another suitable enclosure to protect the oscilloscope from any electromagnetic interference from the plasma reactor. In some embodiments, some or all components of system 100 are grounded to help reduce the problem of electromagnetic interference.

[0015] In some embodiments, one of the sensors 109 measures only the electric field D and is located near the cable connecting the high-voltage source 108 and the plasma reactor 110. The sensor can be formed from a metal plate positioned adjacent to the cable, thereby measuring capacitance C D This is how it is formed. Therefore, the voltage of the pulse from the high-voltage source 108 is given by the following equation. TIFF0007902250000001.tif10128 in formula, Z cable V is the impedance of the cable (for example, 50 ohms), HV This is the reconstructed voltage waveform, V D This is the output of the electric field sensor 109.

[0016] In some embodiments, one of the sensors 109 measures only the electric field B and is located near the cable connecting the high-voltage source 108 and the plasma reactor 110. The sensor can be formed from a single metal loop positioned adjacent to the cable. The magnetic field generated by the current in the cable is affected by the mutual inductance M between the metal loop and the cable. B It is coupled to a metal loop via [a certain mechanism]. The resulting change in magnetic flux within the metal loop induces a voltage across the loop, which is given by the following equation: TIFF0007902250000002.tif10128In formula, I HV This is the reconstructed current waveform, V B This is the output of the magnetic field sensor 109.

[0017] The complete numerical reconstruction of the voltage and current waveforms is given by the following equations. In formula TIFF0007902250000003.tif21128, Z0 is the input impedance of oscilloscope 107, and C D and M B Both of these are predetermined calibration values. The last integral term is the impedance correction term for oscilloscope 107.

[0018] Figure 2 shows various embodiments and configurations of an electrode, which can be a solid extruded electrode or formed from multiple wires. Wire-based electrodes can be one-wire, two-wire, three-wire, four-wire, five-wire, six-wire electrodes, or any other number of wires. The electrode may include two different types of electrodes. Furthermore, the plasma reactor 110 may include one electrode or three or more electrodes. Shown in Figure 2 are a three-wire electrode 118A, a four-wire electrode 118B, and an extruded electrode 118C. Multi-wire based electrodes (such as the three-wire electrode 118A and the four-wire electrode 118B) may have a cross-section generally defined as the diameter of the circle connecting all the wires of the electrode, as shown. The cross-section of the extruded electrode 118C has a central portion 120 and four arms 122A to 122D. The cross-section of the extruded electrode 118C is defined as the distance between the ends of two opposite arms, such as arm 122A and arm 122B, or arm 122C and arm 122D. In some embodiments, the three-wire electrode 118A and the four-wire electrode 118B have cross-sections of approximately 2.0 inches, 2.25 inches, or 2.5 inches. In other embodiments, the three-wire electrode 118A and the four-wire electrode 118B have cross-sections between approximately 1.0 inch and 5.0 inches. Other electrode types and configurations are also considered. For example, the extruded electrode 118C may have more or fewer arms than the four arms 122A to 122D, and may also have a different overall shape. In other embodiments, the cross-section of the electrode may be between approximately 0.4 inches and 1.1 inches. Furthermore, the electrode may have an impedance between approximately 70 ohms and 300 ohms.

[0019] Figure 3A is a perspective view of one embodiment of the plasma reactor 110. Figure 3B, on the other hand, is a top plan view of one embodiment of the plasma reactor 110. In this embodiment, the plasma reactor includes a first pair of reactor tubes 124A and 124B, a second pair of reactor tubes 126A and 126B, a third pair of reactor tubes 128A and 128B, and a fourth pair of reactor tubes 130A and 130B. Each of the reactor tubes 124A to 130B defines a hollow internal chamber (such as the hollow internal chamber 116 shown in Figure 5B) in which electrodes can be placed. The plasma reactor 110 in Figures 3A and 3B also includes four high-voltage connectors 132A to 132D.

[0020] High-voltage connector 132A is coupled to electrodes located inside the first pair of reactor tubes 124A and 124B. High-voltage connector 132B is coupled to electrodes located inside the second pair of reactor tubes 126A and 126B. High-voltage connector 132C is coupled to electrodes located inside the third pair of reactor tubes 128A and 128B. High-voltage connector 132D is coupled to electrodes located inside the fourth pair of reactor tubes 130A and 130B. High-voltage connectors 132A through 132D transport electrical pulses from the high-voltage source 108 to the electrodes located inside the reactor tubes 124A through 130B. Inlet port 112 and outlet port 114 are located at both ends of the reactor tubes 124A through 130B and are both fluidically coupled to all internal chambers of the reactor tubes 124A through 130B, thereby allowing exhaust gases from engine 102 to flow through the plasma reactor. In some embodiments, each of the high-voltage connectors 132A to 132D is coupled to the same high-voltage source 108. In other embodiments, each of the high-voltage connectors 132A to 132D is coupled to its own respective high-voltage source 108.

[0021] Figure 4A shows a top plan view of a pair of reactor tubes 134A and 134B. An inlet port 112 is coupled to one end of both reactor tubes 134A and 134B. An outlet port is coupled to the other end of both reactor tubes 134A and 134B. A single high-voltage connector 136 is coupled to both the first reactor tube 134A and the second reactor tube 134B. Reactor tubes 134A and 134B may be the same as or similar to reactor tubes 124A through 130B. High-voltage connector 136 may be the same as or similar to high-voltage connectors 132A through 132D. High-voltage connector 136 generally extends between reactor tubes 134A and 134B in a direction perpendicular to the direction in which reactor tubes 134A and 134B extend along them.

[0022] In some embodiments, the pair of reactor tubes 134A, 134B and the high-voltage connector 136 form a separate plasma reactor 110. In other embodiments, the pair of reactor tubes 134A, 134B and the high-voltage connector 136 are components of a larger plasma reactor 110, such as the plasma reactor 110 shown in Figures 3A and 3B. The high-voltage connector 136 includes a housing 137 and a cable 138 extending from this housing 137. The distal end of the cable 138 is electrically connected to a high-voltage source 108, while the proximal end of the cable extends into the housing 137 of the high-voltage connector 136.

[0023] Figure 4B shows a cross-section of one end of the plasma reactor 110 in Figure 4A, showing the interior of the reactor tubes 134A and 134B, and the interior of the high-voltage connector 136. The high-voltage connector 136 includes two insulating members 142A and 142B extending from the housing 137. The first portion of each insulating member 142A and 142B is located within the housing 137. The second portion of insulating member 142A extends from the housing 137 and is located within the internal chamber of the reactor tube 134A. The second portion of insulating member 142B also extends from the housing 137 and is located within the internal chamber of the reactor tube 134B. The first portion of each insulating member 142A and 142B generally has a cylindrical shape. The second portions of each of the insulating members 142A and 142B are generally cone-shaped and tapered toward the ends located in the respective reactor tubes 134A and 134B.

[0024] Cable 138 extends into housing 137, where it is electrically connected to two separate conductive members 140A and 140B. Conductive member 140A extends through the interior of insulating member 142A toward a tapered end located within reactor tube 134A. Conductive member 140B extends through the interior of insulating member 142B toward a tapered end located within reactor tube 134B. Thus, conductive members 140A and 140B generally extend perpendicular to the length of reactor tubes 134A and 134B.

[0025] Electrode 144A is coupled to conductive member 140A and extends along the length of the internal chamber of reactor tube 134A. Similarly, electrode 144B is coupled to conductive member 140B and extends along the length of the internal chamber of reactor tube 134B. Electrode 144A is formed from wires 145A, 145B, and 145C. Electrode 144B is formed from wires 145D, 145E, and 145F. Spacers 146A and 146B may be coupled to electrodes 144A and 144B, respectively. Spacers 146A and 146B help maintain the position of electrodes 144A and 144B within the internal chambers of their respective reactor tubes 134A and 134B, and also prevent electrodes 144A and 144B from contacting the inner surfaces of reactor tubes 134A and 134B. Electrodes 144A and 144B can be three-wire electrodes (such as electrode 118A), four-wire electrodes (such as 118B), extruded electrodes (such as electrode 118C), or any other suitable electrode type or shape. If the electrodes are multi-wire electrodes, spacers 146A and 146B also help maintain the spacing between the wires. In some embodiments, spacers 146A and 146B are formed from an electrically insulating material such as fiberglass.

[0026] The arrangement of the high-voltage connector 136 and electrodes 144A and 144B can be used for any embodiment of the plasma reactor 110. For example, the plasma reactor 110 may include four pairs of reactor tubes 124A through 130B, as shown in Figures 4A and 4B. The plasma reactor 110 may also include a single reactor tube coupled to an inlet port 112 and an outlet port 114, a single pair of reactor tubes coupled to an inlet port 112 and an outlet port 114, or any number of reactor tubes coupled to any number of inlet ports 112 and any number of outlet ports 114.

[0027] Figure 5A is a perspective view of the high-voltage connector 136 with the cable 138 not attached. In some embodiments, the housing 137 includes one or more ports 139A, 139B, 139C that open into the interior of the housing. The ports 139A, 139B, and 139C can be used to circulate a coolant or other fluid within the housing 137 to cool the high-voltage connector 136 and maintain it at a desired temperature. In some embodiments, the coolant is oil. In some embodiments, the conductive members 140A, 140B extend from their respective insulating members 142A, 142B parallel to the length of the reactor tubes 134A, 134B. Thus, the conductive members 140A, 140B can have a right-angle shape, for example, an "L" shape.

[0028] Figure 5B is a view of the end of the reactor tube 134A with the end cap removed so that the internal chamber 116 is visible. As shown, the electrode 144A extends toward the opposite end of the internal chamber 116 away from the insulating member 142A. In the embodiment shown in Figure 5B, the electrode 144A is a three-wire electrode formed from wires 145A, 146B, and 145C, and the spacer 146A helps to maintain the spacing between the three wires 145A, 145B, and 145C.

[0029] Figure 5C shows the high-voltage connector 136 from the opposite side of Figure 5B. In the embodiment shown in Figure 5C, the spacers 146A and 146B have a large circular shape, with an outer diameter generally equal to the inner diameter of the reactor tubes 134A and 134B. These types of spacers 146A and 146B are generally used with the extruded electrode 118C.

[0030] Figures 6A, 6B, and 6C all show an extruded electrode 118C with a spacer 147 (this spacer 147 may be the same as or similar to any of the spacers 146 discussed herein). As shown, the extruded electrode 118C is formed from four arms 122A to 122D extending from a central portion 120. The extruded electrode 118C is attached to a conductive member 141 (this conductive member 141 may be the same as or similar to conductive members 140A and 140B). The conductive member 141 extends through the center of the spacer 147 and is also used to transmit pulses from the high-voltage source 108 to the electrode 118C.

[0031] Figure 7 shows a bypass network 150 that can be electrically coupled in parallel with the cable 138 of the high-voltage connector 136. During use, the plasma reactor 110 can generate a large amount of electromagnetic interference (EMI) due to the operation of the high-voltage source 108. In certain situations, a large amount of electrical energy can be reflected back to the high-voltage source 108. This situation occurs, for example, when one of the electrodes 144A, 144B is short-circuited, or when there is an impedance mismatch between the high-voltage source 108 and the plasma reactor 110. The reflected energy can be absorbed by the output of the high-voltage source 108 (which can be, for example, a stack of diodes). To avoid this problem, the bypass network 150 can be electrically coupled in parallel with the output of the high-voltage source 108 and the high-voltage connector 136. The bypass network 150 can act as an energy integrator and can absorb any reflected electrical energy. In the illustrated embodiment, the bypass network 150 is one or more capacitors electrically connected in series. Other types of bypass networks 150 can also be used.

[0032] During operation, system 100 is η system =η source ×η reactor ×η plasmaIt has the overall efficiency of the system as defined by η. source η is the electrical efficiency at which electrical energy is taken from the electrical grid (or other final source of electrical energy) by the high-voltage source 108 and converted into short pulses. reactor This is the electrical efficiency by which the energy of the pulse is dissipated by the plasma formed in the plasma reactor 110. It can be specified as TIFF0007902250000004.tif9128. In this formula, E plasma This is the energy dissipated by the plasma, and also, E pulse η is the total available energy within the pulse. plasma η is the chemical efficiency of the plasma, a measure of the amount of energy used by the plasma that is converted into chemically active species. The overall system efficiency η system It is the product of all three efficiencies.

[0033] Reactor efficiency η reactor This is influenced by the electric field strength within the plasma reactor 110 and the impedance matching of the plasma reactor 110. The impedance matching of the plasma reactor 110 determines how much of the pulse from the high-voltage source 108 enters the plasma reactor 110. In a perfectly matched system, the impedance of the cable 138 carrying the pulse matches the impedance of the plasma reactor 110, and the entire pulse enters the plasma reactor 110. If there is some mismatch in impedance, the pulse is partially reflected from the plasma reactor 110, which can lead to energy loss and high-voltage stress on the system. In some embodiments of system 100, the cable 138 has an impedance of about 50 ohms, and each of the conductive members 140A, 140B connected to the high-voltage source 108 through the cable 138 has an impedance of about 100 ohms. In these embodiments, a single high-voltage source 108 is used to generate pulses for each pair of electrodes.

[0034] The reflectance of system 100 is given by the following formula. TIFF0007902250000005.tif10128In formula, Z cable This is the impedance of cable 138, Z reactor This is the impedance of plasma reactor 110. For a perfectly matched system, R=0 and there is no reflection. However, in a mismatched system, there is some degree of reflection. The maximum voltage stress V of system 100. max V is the sum of the incoming pulse voltage and the reflected pulse voltage. peak V is the applied peak voltage. max =(1+R)V peak It is generally given by [this].

[0035] NO molecule and NO X The efficiency of the system 100 for removing molecules is NO and NO X It is measured by comparing the initial concentration with the final concentration. This is measured using the following formula: TIFF0007902250000006.tif22128

[0036] The NO removal efficiency of System 100 is defined as the efficiency with which the formed plasma removes NO, and is measured in mol / kWh. The NO removal efficiency is measured by the following equation: TIFF0007902250000007.tif10128

[0037] ΔNO is the concentration of NO removed (in ppm), Vm is the molar volume (in L / mol and temperature-dependent), and ε is the energy density (in J / L). The energy density is given by the following formula: TIFF0007902250000008.tif10128

[0038] Here, f rr is the pulse repetition frequency (in Hz), and E plasmais the energy dissipated from the plasma in each pulse, and F is the gas flow rate (in L / min).

[0039] The overall efficiency of system 100 is given by the following equation. System efficiency = Reactor efficiency × NO rem,eff

[0040] System 100 operates according to various settings, including engine load, engine speed, pulse source voltage, pulse source repetition frequency, flow through the plasma reactor 110, and electrode type and geometry. The engine speed can be between approximately 400 rpm and 1,000 rpm, between approximately 1,000 rpm and 1,800 rpm, between approximately 400 rpm and 1,800 rpm, approximately 400 rpm, approximately 1,000 rpm, or approximately 1,800 rpm. The pulse source voltage can be between approximately 250 volts, approximately 300 volts, approximately 325 volts, approximately 350 volts, or between approximately 250 volts and 350 volts. The pulse source repetition frequency can be approximately 100 Hz, approximately 500 Hz, approximately 1,000 Hz, approximately 1,500 Hz, approximately 2,500 Hz, or generally any range between any two of these values. In some embodiments, the average electric reactor efficiency (e.g., η) is used. reactor ) can be between approximately 70% and 90%, between approximately 78% and 86%, or between approximately 80% and 90%.

[0041] Although the present invention is described with reference to one or more specific embodiments, those skilled in the art will understand that many modifications can be made to these embodiments without departing from the spirit and scope of the invention. Each of these embodiments and its obvious variations is considered to be within the spirit and scope of the invention. Additional embodiments relating to aspects of the invention may also combine any number of features from any of the embodiments described herein.

Claims

1. A transient plasma-based purification system, First reactor tube; A second reactor tube parallel to the first reactor tube; An inlet port connected to one end of both the first reactor tube and the second reactor tube; Outlet ports connected to the other end of both the first reactor tube and the second reactor tube; High voltage source; A high-voltage connector coupled to the first reactor tube and the second reactor tube and electrically connected to the high-voltage source, comprising a first insulating member and a second insulating member extending from the housing of the high-voltage connector, wherein the end of the first insulating member is located inside the first reactor tube and is tapered, and the end of the second insulating member is located inside the second reactor tube and is tapered; A first conductive member extending through the interior of the first insulating member and a second conductive member extending through the interior of the second insulating member; and The reactor includes a first electrode extending axially within the first reactor tube, coupled to the first conductive member, and electrically coupled to the high-voltage source, and a second electrode extending axially within the second reactor tube, coupled to the second conductive member, and electrically coupled to the high-voltage source. The high-voltage source is configured to form a plasma from exhaust gas flowing through the first reactor tube and the second reactor tube, and to remove at least a portion of NO molecules and NOx molecules from the exhaust gas.

2. The system according to claim 1, further comprising a sensor configured to measure the voltage and current of pulses supplied from the high-voltage source to the first electrode and the second electrode.

3. The system according to claim 1, further comprising a sensor configured to measure the electric field of pulses supplied from the high-voltage source to the first electrode and the second electrode.

4. The system according to claim 1, wherein the first electrode and the second electrode have an impedance between 70 ohms and 300 ohms.

5. The system according to claim 1, wherein the first conductive member and the second conductive member extend from the first insulating member and the second insulating member, respectively, and form an "L" shape.

6. The system according to claim 1, further comprising a bypass network electrically connected in parallel with the output of the high-voltage source and the high-voltage connector.

7. The system according to claim 6, wherein the bypass network is one or more capacitors electrically connected in series.

8. The system according to claim 1, wherein the high-voltage source generates a voltage between 250 volts and 350 volts.

9. The system according to claim 1, wherein the frequency of the high-voltage source is approximately 1000 Hz.

10. The system according to claim 1, wherein the first electrode and the second electrode are extruded electrodes having a plurality of arms extending from a radial central portion.

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