Design method for polishing discs for highly wear-resistant workpieces

Abstract

The present invention discloses a method for designing an abrasive disc for highly wear-resistant workpieces, which relates to the field of precision machining of highly wear-resistant workpieces. It includes the steps of (1) determining the processing dimensional variations in the abrasive disc during the abrasive process, (2) dividing areas on the abrasive disc, (3) calculating the track density of points on the workpiece for each divided area of ​​the abrasive disc, (4) calculating the area of ​​each area proportionally based on the track density of the area to obtain an abrasive disc pattern, and (5) obtaining a patterned abrasive disc by machining or arranging a hot-pressed sintered block of unit area according to the abrasive disc pattern. The present invention has the ability to quickly obtain abrasive disc patterns based on the track density distribution during the abrasive process, thereby realizing the design of abrasive discs with complex shapes. This effectively improves the uniformity of abrasive disc wear during abrasive disc polishing, improves the surface accuracy of the workpiece, shortens the polishing time, and improves processing efficiency.

Description

[Technical Field]

[0001] <Cross-reference of related applications> This invention claims priority based on the Chinese patent application No. 202311374462.5, title "Method for Designing Polishing Discs for High Wear-Resistant Workpieces," filed with the State Intellectual Property Administration of China on October 23, 2023, and the entire disclosure thereof is incorporated herein by reference.

[0002] The present invention relates to the field of ultra-precision machining technology, and more specifically, to a method for designing polishing discs for highly wear-resistant workpieces. [Background technology]

[0003] Materials such as silicon carbide (SiC), diamond, and gallium nitride (GaN) are widely used in fields such as high frequency, high temperature, radiation resistance, and optoelectronics due to their excellent physical properties, including a wide band gap, high thermal conductivity, good thermal stability, and high saturation drift rate. However, these materials require extremely high surface quality in industrial applications, and their extremely high hardness and chemical inertness result in high wear resistance, making processing difficult and limiting their range of industrial applications.

[0004] Polishing is widely applied in semiconductor substrate processing as an important means of precision and ultra-precision machining, as it yields excellent surface quality. However, when polishing the end faces of highly wear-resistant workpieces, wear of the polishing disc is unavoidable, leading to a decrease in the flatness of the workpiece. During processing, errors in the polishing disc are transmitted to the workpiece surface, which can negatively affect the accuracy of the workpiece surface. If the flatness error exceeds the acceptable range, the polishing disc needs to be dressed, which not only reduces the lifespan of the polishing disc but also decreases production efficiency. [Overview of the project] [Problems that the invention aims to solve]

[0005] The object of the present invention is to provide a method for designing polishing discs for highly wear-resistant workpieces. By calculating the area of ​​different regions based on the distribution of trajectory density on the polishing disc, the invention solves problems such as the decrease in processing efficiency of conventional highly wear-resistant workpieces, uneven wear of the polishing disc, and increased variation in workpiece surface accuracy. [Means for solving the problem]

[0006] To achieve the above objective, the solution of the present invention is as follows.

[0007] The design method for polishing discs for highly wear-resistant workpieces is as follows: (1) Rotation speed of the polishing disc ω m , workpiece rotation speed ω w Or the rotation speed of the solar gear ω s (1) The steps of determining the machining dimensional variables in the polishing process, including the radius dimension r of the workpiece, the radius dimension R of the polishing disc, and the eccentricity distance e; (2) the steps of dividing the polishing disc into regions; and (3) the steps of point P on the workpiece for each divided region of the polishing disc. i The process includes (4) calculating the trajectory density of a region, and (5) calculating the area of ​​different regions proportionally based on the trajectory density of the region to obtain a pattern of polishing discs, and (6) obtaining a patterned polishing disc by machining or arranging hot-pressed sintered blocks of a unit area according to the pattern of the polishing discs.

[0008] When dividing a region on the polishing disc, the divided region is a concentric ring with the center point of the polishing disc as its center, or a rectangle arranged in an array of the same area.

[0009] When dividing a region on the polishing disc, the divided region is a concentric ring with the center point of the polishing disc as its center, or a rectangle arranged in an array of the same area.

[0010] JPEG0007909323000001.jpg12170 is calculated, and the base area is A b Let A be the area of ​​the region with the highest trajectory density. bAs follows, the maximum trajectory density of all compartment regions is ρ max and the trajectory density of the compartment region is ρ u is set as such.

[0011] The substrate of the polishing disk obtained by the machining is an active metal.

[0012] The hot press sintered mass is obtained by hot press sintering an active metal powder and abrasive grains.

[0013] The design method of the polishing disk for the high wear-resistant workpiece of the present invention calculates the trajectory density of different compartment regions, and based on the trajectory density in the region, calculates the areas of different compartment regions proportionally to obtain the pattern of the polishing disk. According to the pattern of the polishing disk, a patterned polishing disk is obtained by machining or arranging the hot press sintered masses per unit area. The present invention can quickly obtain the pattern of the polishing disk based on the trajectory density in the end face polishing process, and has the ability to design a polishing disk with a complex shape. It enables the rapid design and precise manufacturing of complex patterns. It effectively improves the uniformity of wear of the polishing disk in end face polishing, enhances the surface accuracy of the workpiece, shortens the polishing time, and improves the processing efficiency.

Advantages of the Invention

[0014] The design method of the polishing disk for the high wear-resistant workpiece according to the present invention has the following beneficial effects. 1. The present invention effectively solves the problem of uneven wear of the polishing disk and realizes uniform wear in the processing area. 2. The present invention reduces the manufacturing difficulty and cost of the polishing disk by obtaining the polishing disk through machining. 3. The present invention effectively improves the processing efficiency and surface accuracy of the high wear-resistant workpiece.

Brief Description of the Drawings

[0015] [Figure 1] It is a flowchart showing the process of the design method provided by the embodiment of the present invention. [Figure 2] It is a schematic diagram of single-sided polishing processing according to Embodiment 1 of the present invention. [Figure 3] It is a diagram of area partitioning of a polishing disk according to Embodiment 1 of the present invention. [Figure 4] It is a diagram showing the pattern of a single-sided polishing disk according to Embodiment 1 of the present invention. [Figure 5] It is a schematic diagram of double-sided polishing processing according to Embodiment 2 of the present invention. [Figure 6] It is a diagram showing the pattern of a double-sided polishing disk according to Embodiment 2 of the present invention.

Mode for Carrying Out the Invention

[0016] Hereinafter, in order to further explain the technical aspects of the present invention, specific examples will be given to explain the present invention in detail.

[0017] The design method of the polishing disk for the high wear-resistant workpiece of the present application is (1) First, the rotational speed ω of the polishing disk m and the rotational speed ω of the workpiece w or the rotational speed ω of the sun gear s and the step of determining the machining dimension variables in the polishing process including the radius dimension r of the workpiece, the radius dimension R of the polishing disk, and the eccentricity distance e, (2) the step of partitioning the area of the polishing disk, (3) the step of calculating the locus density of the point P i on the workpiece for each partitioned area of the polishing disk, (4) the step of calculating the areas of different areas proportionally based on the locus density in the area to obtain the pattern of the polishing disk, and (5) the step of obtaining a patterned polishing disk by machining or arranging hot press sintered blocks per unit area according to the pattern of the polishing disk.

[0018] When partitioning the area of the polishing disk, the partitioned area is a concentric ring centered on the center point of the polishing disk or a rectangle arranged in an array with the same area.

[0019] JPEG0007909323000002.jpg14170 was calculated, and of that, the base area was A b Let A be the area of ​​the region with the highest trajectory density. b The following is set, and the maximum trajectory density for all partitioned regions is ρ max The trajectory density of the partitioned area is ρ u Let's assume that.

[0020] The substrate of the polishing disc obtained by machining is an active metal.

[0021] The aforementioned hot-press sintered mass is obtained by hot-press sintering activated metal powder and abrasive grains. [Examples]

[0022] The design method for polishing discs for highly wear-resistant workpieces includes the following steps:

[0023] Step 1: Determining the dimensional variation in single-sided polishing. In the aforementioned single-sided polishing process, the workpiece rotation speed ω w The rotation speed of the polishing disc is set to 60 rpm, and the rotation speed of the polishing disc is ω m The rotation speed is set to 100 rpm, the workpiece radius r to 50 mm, the polishing disc radius R to 360 mm, and the eccentricity distance e to 90 mm. A schematic diagram of the polishing process is shown in Figure 2.

[0024] Step 2: Dividing the surface of the polishing disc into areas. As shown in Figure 3, the polishing disc is divided into concentric rings, and the difference between the inner and outer radii of each concentric ring is 10 mm.

[0025] Step 3: Calculate the trajectory density of each section of the abrasive disc. The workpiece surface is divided into a grid with a 1 mm pitch, and the formula Calculate the trajectory length of all grid points on the workpiece in the JPEG0007909323000003.jpg11170 area, (x i ,y i ) point P i Let t be the coordinate ofp Let this be the time step, and the trajectory density ρ in each region. u Calculate.

[0026] Step 4: Calculate the area of ​​different regions and obtain the pattern of the polishing disc. JPEG0007909323000004.jpg12170 was calculated, and of those, A b The base area is 3550mm² 2 It will be set to this.

[0027] Step 5: Obtain a patterned polishing disc by machining, as shown in Figure 4. The excess area of ​​different compartmentalized regions of the abrasive disc is removed by machining, resulting in a patterned abrasive disc. [Examples]

[0028] The design method for polishing discs for highly wear-resistant workpieces includes the following steps:

[0029] Step 1: Determine the dimensional changes for grinding both end faces. In the machining dimension variation during the polishing of both end faces, Sun Gear ω s The rotation speed of the polishing disc ω is set to 10 rpm. m The rotational speed is set to 80 rpm, the workpiece radius r to 50 mm, the polishing disc radius R to 150 mm, and the eccentricity distance e to 58 mm. A schematic diagram of the end face polishing is shown in Figure 5.

[0030] Step 2: Dividing the surface of the polishing disc into areas. The polishing disc is divided into concentric rings, and the difference between the inner and outer radii of each concentric ring is set to 20 mm.

[0031] Step 3: Calculate the trajectory density of each section of the abrasive disc. The workpiece surface is divided into a grid with a 1 mm pitch, and the formula Calculate the trajectory length of all grid points on the workpiece in JPEG0007909323000005.jpg10170, and (x i ,yi ) point P i Let t be the coordinate of p Let this be the time step, and the trajectory density ρ in each region. u Calculate.

[0032] Step 4: Calculate the area of ​​different regions and obtain the pattern of the polishing disc. JPEG0007909323000006.jpg12170 The actual area of ​​the partitioned area of ​​the ring region is calculated, and of that, A b Using this as the base area, 25,000 mm² 2 It will be set to this.

[0033] Step 5: Obtain a patterned polishing disc by machining, as shown in Figure 6. The excess area of ​​different compartmentalized regions of the abrasive disc is removed by machining, resulting in a patterned abrasive disc.

[0034] The embodiments and drawings described above are not intended to limit the product form and style of the present invention, and any modifications or alterations made by those skilled in the art should be considered as not departing from the scope of the patent of the present invention. [Industrial applicability]

[0035] This invention discloses a method for designing polishing discs for highly wear-resistant workpieces, relating to the field of precision machining of highly wear-resistant workpieces, and includes: (1) the step of determining the dimensional variation of the machining process in the polishing process; (2) the step of dividing the polishing disc into regions; (3) the step of calculating the trajectory density of points on the workpiece for each divided region of the polishing disc; (4) the step of calculating the area of ​​different regions proportionally based on the trajectory density of the regions to obtain a pattern of the polishing disc; and (5) the step of obtaining a patterned polishing disc by machining or arranging hot-pressed sintered ingots of a unit area according to the pattern of the polishing disc. This invention has the ability to quickly obtain a pattern of the polishing disc based on the distribution of trajectory density in the polishing process and to realize the design of polishing discs with complex shapes. It efficiently improves the uniformity of wear of the polishing disc in polishing, improves the surface accuracy of the workpiece, shortens polishing time, improves machining efficiency, and has industrial applicability.

Claims

1. A method for designing polishing discs for highly wear-resistant workpieces, (1) Rotation speed of the polishing disc ω ｍ , the rotational speed of the workpiece in single-sided polishing ω ｗ Or the rotation speed ω of the sun gear in double-sided polishing ｓ The steps include determining the machining dimensional variables in the polishing process, including the radius dimension r of the workpiece, the radius dimension R of the polishing disc, and the eccentricity distance e, which is the distance between the center of the polishing disc and the center of the workpiece. (2) A step of dividing the area with respect to the polishing disc, (3) Locus density ρ of point P on the workpiece with respect to each section area K of the polishing disk u on the workpiece ｉ is calculated by dividing the workpiece surface into grids and calculating the locus density ρ of each area K u based on the locus lengths of all grid points P on the workpiece in each section area K u on the workpiece ｉ and step of calculating the locus density ρ of each area K u based on the locus lengths of all grid points P on the workpiece in each section area K u and a step of calculating (4) Each partition area K u Trajectory density ρ u Based on this, the trajectory density ρ u Each partitioned area K is designed such that the area increases as the value of increases. u The steps include: calculating the area proportionally and obtaining the pattern of the polishing disc; (5) A step of obtaining a patterned polishing disc by removing excess area by machining according to the pattern of the polishing disc, or by arranging hot-pressed sintered blocks of a unit area at a density corresponding to the calculated area, A method for designing polishing discs for highly wear-resistant workpieces, characterized by including [a specific element].

2. A region is defined on the polishing disc, and the defined region K u The method for designing a polishing disc for highly wear-resistant workpieces according to claim 1, characterized in that the polishing disc is a concentric ring with the center point of the polishing disc as its center, or an array of rectangles with equal area relative to each other.

3. Different partitioned regions K of the polishing disc u Actual area A u The formula (Here, A ｂ ρ is the base area. max This is all partitioned area K u Maximum trajectory density, ρ u is the relevant partition area K u (This is the trajectory density.) A method for designing a polishing disc for a highly wear-resistant workpiece, as described in claim 1, characterized by calculating according to the formula.

4. The surface of the workpiece is divided into a grid with a 1 mm pitch, and the formula Accordingly, all grid points P on the workpiece in the concentric ring region of the polishing disc ｉ Calculate the trajectory length, (x ｉ , y ｉ ) point P ｉ Let t be the coordinate of ｐ Let this be the time step, and the trajectory density ρ in each region. ｕ A method for designing a polishing disc for a highly wear-resistant workpiece, as described in claim 3, characterized by the calculation of [value].

5. The method for designing a polishing disc for highly wear-resistant workpieces according to claim 1, characterized in that the substrate of the polishing disc obtained by the aforementioned machining is an active metal.

6. The hot-press sintered mass is obtained by hot-press sintering activated metal powder and abrasive grains, and in step (5), the calculated actual area A ｂ A method for designing a polishing disc for a highly wear-resistant workpiece, as described in claim 1, characterized in that the hot-pressed sintered block is arranged based on the above.

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