Non-contact particulate processing equipment

Abstract

To provide a particle accommodating device, non-contact particle processing apparatus and its light sensing structure.SOLUTION: A particle accommodating device 1 is configured to accommodate a liquid specimen including a plurality of particles therein. The accommodating device includes: a light sensing structure 11; and a mating structure 12 disposed spaced apart from the light sensing structure. The light sensing structure includes: a substrate 111; an electrode layer 112 and a photoelectric layer 113 formed on the substrate; and an insulating body 114 formed on the photoelectric layer. The insulating body includes a charge track T projecting from the photoelectric layer. The photoelectric layer is operable to generate a plurality of charges concentrated on the charge track, such that a density of the charges on the charge track is greater than a density of the charges on an outer surface of the photoelectric layer for enabling at least one of the particles to be positioned onto the charge track through electrostatic adsorption.SELECTED DRAWING: Figure 2

Description

Technical Field

[0001] The present invention relates to a fine particle processing apparatus, and particularly to a fine particle storage apparatus, a non-contact fine particle processing device, and its optical sensing structure.

Background Art

[0002] Conventional fine particle processing apparatuses can move target fine particles by applying an electric field. However, in order to accurately move the target fine particles along a predetermined path to a predetermined target area without contacting the target fine particles, it is necessary to further improve and refine the conventional fine particle processing apparatuses.

Summary of the Invention

Problems to be Solved by the Invention

[0003] Therefore, the inventor of the present application believes that the above-mentioned defects can be improved, devotes to research, applies scientific principles, and finally proposes the present invention which is reasonably designed and effectively improves the above-mentioned defects.

Means for Solving the Problems

[0004] Embodiments of the present invention provide a fine particle storage apparatus, a non-contact fine particle processing device, and its optical sensing structure that can effectively improve defects that may occur in conventional fine particle processing apparatuses.

[0005] Embodiments of the present invention disclose a non-contact type particulate processing device. The non-contact type particulate processing device comprises a particulate containment device for containing a liquid sample containing a plurality of particulates, and a light driving device facing the particulate containment device, wherein the particulate containment device comprises a light sensing structure having a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer, and matching structures provided at intervals on the light sensing structure, wherein the insulator has a base layer embedded in the photoelectric layer and an orbital layer connected to the base layer, at least a portion of which protrudes from the photoelectric layer and has a charge orbital formed on its upper edge, wherein the photoelectric layer operates to generate a plurality of charges that concentrate on the charge orbital, thereby the charge orbital is electrostatic At least one of the fine particles is positioned thereon by adsorption, the at least one of the fine particles being defined as a target fine particle, at least one of the photosensing structure and the matching structure being transparent, the matching structure comprising a second substrate and a second electrode layer formed on the second substrate, the second electrode layer facing the photosensing structure, the optical driving device causing the photosensing structure to form a dielectric pattern by emitting light to irradiate the photosensing structure, and when the target fine particle is electrostatically adsorbed and positioned on the charge orbit, the optical driving device moves the dielectric pattern, thereby pressing the target fine particle and moving it along the charge orbit.

[0006] Embodiments of the present invention further disclose a microparticle containment device for containing a liquid sample containing a plurality of microparticles. The containment device comprises a photosensing structure having a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer, and matching structures provided at intervals on the photosensing structure, wherein the insulator includes charge orbitals protruding from the photoelectric layer, and the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer by the operation of the photoelectric layer to generate a plurality of charges concentrated on the charge orbitals, and the charge orbitals are positioned on which at least one of the microparticles is positioned by electrostatic adsorption, and at least one of the photosensing structure and the matching structure is transparent, and the matching structure includes a second substrate and a second electrode layer formed on the second substrate, the second electrode layer facing the photosensing structure.

[0007] Embodiments of the present invention further disclose a photosensing structure for a non-contact type particulate processing device. The photosensing structure for a non-contact type particulate processing device comprises a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer, wherein the insulator includes charge orbitals protruding from the photoelectric layer, and the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer as the photoelectric layer operates and generates a plurality of charges concentrated in the charge orbitals. [Effects of the Invention]

[0008] From the above, the microparticle containment device, non-contact microparticle processing device, and photosensing structure disclosed in the embodiments of the present invention are capable of moving and positioning target microparticles by the electrostatic adsorption method described above, as the charge orbits of the insulator cooperate with the operation of the photoelectric layer by forming an insulator on the photoelectric layer, thereby enabling accurate positioning of target microparticles.

[0009] Furthermore, because the charge orbitals can cooperate with the optical drive, target nanoparticles can be pressed against the dielectrophoretic pattern and rapidly moved along the charge orbitals. That is, target nanoparticles can be moved by being pressed against the dielectrophoretic pattern, or they can move along the charge orbitals after being contacted (or lightly impacted). As a result, damage to target nanoparticles caused by the photomask is effectively reduced. [Brief explanation of the drawing]

[0010] [Figure 1] This is a schematic three-dimensional diagram of a non-contact particulate processing device according to Embodiment 1 of the present invention. [Figure 2] This is a schematic cross-sectional view of a non-contact particulate processing device according to Embodiment 1 of the present invention. [Figure 3] This is a schematic plan view of a non-contact particulate processing device according to Embodiment 1 of the present invention. [Figure 4] Figure 3 is an enlarged schematic diagram of region IV. [Figure 5] This is a schematic diagram of the subsequent operation shown in Figure 4. [Figure 6] Figure 4 is a schematic diagram of other subsequent operations. [Figure 7] This is a schematic diagram of a partial cross-section of a non-contact particulate processing device according to Embodiment 1 of the present invention. [Figure 8] This is a schematic diagram of the subsequent operation shown in Figure 7. [Figure 9] This is a schematic partial cross-sectional view of a non-contact particulate processing device according to Embodiment 2 of the present invention. [Figure 10] This is a schematic cross-sectional view of a non-contact particulate processing device according to Embodiment 3 of the present invention. [Modes for carrying out the invention]

[0011] To further understand the features and technical content of the present invention, please refer to the following detailed description and drawings of the present invention, which are for illustrative purposes only and do not limit the scope of protection of the present invention in any way.

[0012] The embodiments of the "particulate matter containment device, non-contact particulate matter processing device and photosensitive structure thereof" disclosed herein will be described below with reference to specific examples. Those skilled in the art will be able to understand the advantages and effects of the present invention from the disclosed content. The present invention can be carried out or applied through other different specific embodiments, and the various detailed descriptions herein can be modified and changed in various ways without departing from the spirit of the invention, based on different viewpoints and applications. It should also be noted in advance that the drawings of the present invention are for illustrative purposes only and are not based on actual dimensions. The technical content relating to the present invention will be described in more detail using the following embodiments, but the disclosed content is not intended to limit the scope of protection of the present invention.

[0013] In this specification, terms such as “first,” “second,” etc., may be used to describe various elements, but it should be understood that these elements should not be limited by these terms. These terms are primarily used to distinguish one element from another, or one feature from another. Furthermore, the term “or” in this specification should be understood to include any one or more of the items listed in relation to it, depending on the actual context.

[0014] [Example 1] Embodiment 1 of the present invention will be described with reference to Figures 1 to 8. As shown in Figures 1 to 4, this embodiment discloses a non-contact type particulate processing device 100 that includes a particulate containment device 1, an AC device 2 electrically coupled to the particulate containment device 1, and an optical drive device 3 facing the particulate containment device 1. However, the present invention is not limited thereto. For example, in other embodiments not shown herein, the particulate containment device 1 may be applied (e.g., sold) on its own as needed, or used in combination with other devices.

[0015] In this embodiment, the microparticle container 1 has a chip-scale rectangular structure. Further, the microparticle container 1 contains a liquid specimen S including a plurality of microparticles P. However, the present invention is not limited thereto. For example, the amount of the microparticles P contained in the liquid specimen S may be adjusted according to actual needs (for example, at least one).

[0016] Also, in this embodiment, the microparticles P are described as biological microparticles. Further, the liquid specimen S may be a body fluid specimen from an animal (for example, blood, lymph, saliva or urine). The microparticles P may be a specific type of cell or cell cluster, for example, circulating tumor cells (CTC), fetal nucleated red blood cells (FNRBC) or bacteria. However, the present invention is not limited thereto. For example, in other embodiments not shown herein, the liquid specimen S may be a liquid specimen from a plant. Further, the microparticles P may be plastic microparticles that adsorb viruses, bacteria or exosomes according to actual needs.

[0017] The microparticle container 1 includes a light sensing structure 11, an alignment structure 12 provided at an interval from the light sensing structure 11, and a bonding layer 13 that joins the periphery of the light sensing structure 11 and the periphery of the alignment structure 12. Here, at least one of the light sensing structure 11 and the alignment structure 12 is transparent. In this embodiment, the light sensing structure 11 and the alignment structure 12 are two plate-like structures arranged parallel to each other, and the distance therebetween is larger than the size of any of the microparticles P. However, the present invention is not limited thereto.

[0018] More specifically, the light sensing structure 11 includes a first substrate 111, a first electrode layer 112 formed on the first substrate 111, a photoelectric layer 113 formed on the first substrate 111, and an insulator 114 formed on the photoelectric layer 113. In this embodiment, the first electrode layer 112 is formed on the bottom side of the first substrate 111, and the photoelectric layer 113 is formed on the upper side of the first substrate 111. A plurality of transistors 1131 arranged in a matrix are formed in the photoelectric layer 113. Here, the photoelectric layer 113 may adopt an NPN transistor structure, a PNP transistor structure, an NP diode structure, or a PN diode structure according to actual requirements. However, the present invention is not limited thereto.

[0019] The alignment structure 12 includes a second substrate 121 and a second electrode layer 122 formed on the second substrate 121. Further, the second electrode layer 122 faces the light sensing structure 11 (for example, the photoelectric layer 113 and the insulator 114). In this embodiment, the AC device 2 is electrically coupled to the first electrode layer 112 of the light sensing structure 11 and the second electrode layer 122 of the alignment structure 12. Thereby, the light sensing structure 11 can be irradiated with light emitted by the light driving device 3, and a dielectrophoretic pattern F can be formed. As a result, any one of the fine particles P in the liquid sample S is moved by the dielectrophoretic pattern F (for example, FIGS. 5 and 6).

[0020] For example, the light driving device 3 may include a camera 31 and a light source 32 corresponding to the camera 31. Here, the light driving device 3 can emit light from the light source 32 to irradiate the light sensing structure 11. Thereby, a dielectrophoretic pattern F is formed in the light sensing structure 11 (or the photoelectric layer 113).

[0021] The insulator 114 includes charge orbits T protruding from the photoelectric layer 113. By operating the photoelectric layer 113 to generate a plurality of charges concentrated in the charge orbits T, the charge density of the charge orbits T can be made larger than the charge density on the outer surface of the photoelectric layer 113. Thereby, at least one fine particle P is positioned thereon by electrostatic adsorption. Further, at least one fine particle P is defined as a target fine particle P1.

[0022] Here, the photoelectric layer 113 may be used to generate multiple charges that concentrate in the charge orbital T by receiving external ambient light. Alternatively, the photoelectric layer 113 may generate multiple charges that concentrate in the charge orbital T by irradiating it with light emitted by the optical drive device 3. The present invention is not limited thereto.

[0023] As described above, when the target microparticle P1 is electrostatically adsorbed and positioned in the charge orbital T, the optical drive device 3 moves the dielectrophoretic pattern F to press the target microparticle P1 against it and move it along the charge orbital T (for example, Figures 5 and 6).

[0024] Therefore, in this embodiment, the non-contact type particulate processing device 100 has an insulator 114 formed on the photoelectric layer 113, and the charge orbital T of the insulator 114 cooperates with the operation of the photoelectric layer 113 to move and position the target particulate matter P1 by electrostatic adsorption. This allows for accurate positioning of the target particulate matter P1.

[0025] Furthermore, because the charge orbital T can cooperate with the optical drive device 3, the target microparticle P1 can be pressed by the dielectrophoretic pattern F and rapidly moved along the charge orbital T. That is, the target microparticle P1 can be moved by being pressed by the dielectrophoretic pattern F (e.g., Figure 6), or it can move along the charge orbital T after being contacted (or lightly impacted) (e.g., Figure 5). As a result, damage to the target microparticle P1 caused by the photomask is effectively reduced.

[0026] It should be noted that, assuming that target particles P1 can be adsorbed onto the charge orbital T, or in addition, that the target particles P1 can be moved on it, the structure of the insulator 114 can be adjusted and modified as needed. However, in order to allow the target particles P1 to move more smoothly and quickly on the charge orbital T, the insulator 114 preferably includes at least some of the following technical features, but the present invention is not limited thereto.

[0027] In this embodiment, as shown in Figures 2, 7, and 8, the insulator 114 includes a base layer 1141 and an orbital layer 1142. The base layer 1141 is embedded within the photoelectric layer 113. The orbital layer 1142 is connected to the base layer 1141, with at least a portion protruding from the photoelectric layer 113. Furthermore, a charge orbital T is formed on the upper edge of the orbital layer 1142. It should be noted that, although the structure of the insulator 114 is described from different angles (e.g., cross-sectional or plan views) in the following description, the insulator 114 can be designed by adopting the structure described from a specific angle as needed.

[0028] Furthermore, in the cross-sectional view shown in Figure 2, the insulator 114 includes multiple blocks having substantially the same structure; however, for ease of understanding, in the following description, only one of the aforementioned blocks in Figure 2 (e.g., Figure 7) will be used to describe the insulator 114. However, the present invention is not limited thereto. For example, in other embodiments not shown herein, the insulator 114 may have different structures formed in the multiple blocks in the cross-sectional view.

[0029] In Figures 7 and 8 of this embodiment, the orbital layer 1142 includes two arms 1143 extending from the base layer 1141, with a gap G formed between the inner surfaces 1143b of the two arms 1143. Here, the gap G is surrounded by the inner surfaces 1143b of the two arms 1143 and the base layer 1141, as the free end faces 1143a of the two arms 1143 are located outside the photoelectric layer 113 and in contact with each other, while the free end faces 1143a of the two arms 1143 form at least a portion of the charge orbital T.

[0030] Furthermore, each arm 1143 includes an inner edge angle 1143c and an outer edge angle 1143d located on opposite sides of the free end face 1143a. Also, the height positions of the two inner edge angles 1143c are different from the height positions of the two outer edge angles 1143d (for example, lower than the height positions of the two outer edge angles 1143d). In this embodiment, since the two arms 1143 are in contact with each other at the two inner edge angles 1143c, the portion of the charge trajectory T formed by the two free end faces 1143a is approximately V-shaped, and the target microparticle P1 can be easily moved along it. Furthermore, since each arm 1143 has an inner edge angle 1143c and an outer edge angle 1143d, multiple charges can easily concentrate at the inner edge angle 1143c and the outer edge angle 1143d.

[0031] Viewed from a different angle, as shown in the plan views of Figures 4 to 6, the charge orbital T includes a plurality of transverse orbital grooves T1 and a plurality of longitudinal orbital grooves T2. Here, each transverse orbital groove T1 is parallel to the first direction D1, and each longitudinal orbital groove T2 is parallel to the second direction D2 so as to intersect with the plurality of transverse orbital grooves T1. In this embodiment, the first direction D1 and the second direction D2 are orthogonal to each other, but are not limited to this.

[0032] Furthermore, each of the multiple overlapping locations where the multiple lateral orbital grooves T1 and the multiple longitudinal orbital grooves T2 intersect is defined as a charge concentration region T3. Here, when the photoelectric layer 113 operates and generates multiple charges concentrated in the charge orbitals T, the charge concentration region T3 has the greatest charge density within the photosensing structure 11, making it easy to position the target nanoparticle P1 in one of the charge concentration regions T3 by electrostatic adsorption.

[0033] Furthermore, as can be understood by combining Figures 4 and 7, in this embodiment, one of the multiple lateral raceway grooves T1 and the multiple longitudinal raceway grooves T2 corresponds to being composed of two arms 1143. That is, one of the multiple lateral raceway grooves T1 and the multiple longitudinal raceway grooves T2 has two adjacent inner edge angles 1143c and two outer edge angles 1143d located outside the two inner edge angles 1143c. Moreover, in one of the multiple lateral raceway grooves T1 and the multiple longitudinal raceway grooves T2, the height positions of the two inner edge angles 1143c are different from the height positions of the two outer edge angles 1143d (for example, lower than the height of the two outer edge angles 1143d).

[0034] It should be noted that, as shown in Figure 4, the lateral raceway groove T1 may be a continuous groove that is not divided along the first direction D1, and the longitudinal raceway groove T2 may also be a continuous groove that is not divided along the second direction D2. However, the present invention is not limited thereto.

[0035] Furthermore, in this embodiment, the particulate matter containment device 1 has been described in combination with the photosensing structure 11, matching structure 12, and bonding layer 13, but the present invention is not limited thereto. For example, in other embodiments not shown herein, the photosensing structure 11 may be applied (e.g., sold) alone or used in combination with other devices as needed.

[0036] [Example 2] Embodiment 2 of the present invention will be described with reference to Figure 9. Since this embodiment is similar to Embodiment 1 described above, a detailed explanation of the similarities between the two embodiments will be omitted, and the differences between this embodiment and Embodiment 1 will be described in general terms.

[0037] In this embodiment, the free end faces 1143a of the two arms 1143 are located apart from each other outside the photoelectric layer 113 so that the gap G communicates with the outside. Furthermore, the inner surfaces 1143b of the two arms 1143 form at least a portion of the charge orbital T.

[0038] More specifically, the height position of the inner edge angle 1143c of the two arms 1143 is higher than the height position of the outer edge angle 1143d of the two arms 1143. In this embodiment, since the two inner edge angles 1143c of the two arms 1143 are far apart from each other, the portion of the charge orbit T formed by the inner surfaces 1143b of the two arms 1143 is approximately V-shaped, and the target microparticle P1 can be easily moved along it. That is, a portion of the target microparticle P1 may be located within the gap G.

[0039] [Example 3] Embodiment 3 of the present invention will be described with reference to Figure 10. Since this embodiment is similar to Embodiments 1 and 2 described above, a detailed explanation of the similarities with the above embodiments will be omitted, and the differences between this embodiment and Embodiments 1 and 2 will be described in general terms.

[0040] In this embodiment, either the lateral raceway groove T1 is composed of multiple sections along the first direction D1, and either the longitudinal raceway groove T2 is composed of multiple sections along the second direction D2. Here, the segmented structure of the lateral raceway groove T1 and the longitudinal raceway groove T2 can be adjusted and modified as needed, and the following description merely illustrates one preferred embodiment, and is not limited thereto.

[0041] More specifically, the orbital layer 1142 includes a plurality of annular segments 1144, each surrounding a plurality of transistors 1131. The plurality of annular segments 1144 are arranged adjacent to each other in a matrix, and the upper edges of the plurality of annular segments 1144 together constitute a charge orbital T. That is, the upper edges of the plurality of annular segments 1144 together constitute a plurality of lateral orbital grooves T1 and a plurality of longitudinal orbital grooves T2.

[0042] Furthermore, the outer contour of each annular segment 1144 is rectangular, and a charge concentration region T3 is formed in the center of any four adjacent annular segments 1144 arranged in a rectangle. Viewed from another angle, any two adjacent arms 1143 each belong to two annular segments 1144.

[0043] [Beneficial effects of the embodiment] From the above, the microparticle containment device, non-contact microparticle processing device, and photosensing structure disclosed in the embodiments of the present invention are capable of moving and positioning target microparticles by the electrostatic adsorption method described above, as the charge orbits of the insulator cooperate with the operation of the photoelectric layer by forming an insulator on the photoelectric layer, thereby enabling accurate positioning of target microparticles.

[0044] Furthermore, because the charge orbitals can cooperate with the optical drive, target nanoparticles can be pressed against the dielectrophoretic pattern and rapidly moved along the charge orbitals. That is, target nanoparticles can be moved by being pressed against the dielectrophoretic pattern, or they can move along the charge orbitals after being contacted (or lightly impacted). As a result, damage to target nanoparticles caused by the photomask is effectively reduced.

[0045] The information disclosed herein represents only preferred embodiments of the present invention and does not limit the scope of the claims. Accordingly, all equivalent technical modifications made using the specification and drawings of the present invention are included within the scope of the claims. [Explanation of Symbols]

[0046] 100: Non-contact particulate processing equipment 1: Particulate containment device 11: Light sensing structure 111: First board 112: First electrode layer 113: Photoelectric layer 1131: Transistor 114: Insulator 1141: Basal layer 1142: Orbital layer 1143: Arm 1143a: Free end face 1143b:Inner surface 1143c: Inner edge angle 1143d: Outer edge angle 1144: Ring segment 12: Alignment structure 121: Second board 122:Second electrode layer 13: Laminate layer 2: AC device 3: Optical drive device 31: Camera 32: Light source T: charge orbit T1: Lateral raceway groove T2: Longitudinal track groove T3: Charge concentration region G: Gap S: Liquid sample P: Fine particles P1: Target particle F: Dielectrophoresis pattern D1: 1st direction D2:Second direction

Claims

1. A microparticle containment device for containing liquid samples containing multiple microparticles, A light driving device facing the aforementioned particle containment device, Equipped with, The aforementioned particle containment device, A photosensing structure having a first substrate, a first electrode layer formed on the first substrate, a photoelectric layer formed on the first substrate, and an insulator formed on the photoelectric layer, Matching structures provided at intervals on the aforementioned light sensing structure, It has, The insulator is The base layer embedded within the photoelectric layer, A rail layer connected to the base layer, with at least a portion protruding from the photoelectric layer and having a charge rail formed on its upper edge, It has, The photoelectric layer operates to generate a plurality of charges that concentrate in the charge orbital, thereby positioning at least one of the microparticles on it by electrostatic adsorption, and the at least one of the microparticles is defined as a target microparticle. At least one of the light-sensing structure and the matching structure is transparent, and the matching structure includes a second substrate and a second electrode layer formed on the second substrate, the second electrode layer facing the light-sensing structure, The light driving device emits light to irradiate the light sensing structure, thereby causing a dielectric pattern to form on the light sensing structure. When the target microparticles are electrostatically attracted and positioned in the charge orbit, the optical drive device moves the dielectric pattern to press the target microparticles against it and move them along the charge orbit. A non-contact type particulate processing device characterized by the following features.

2. When the photoelectric layer operates and generates a plurality of charges that concentrate in the charge orbitals, the charge density of the charge orbitals is greater than the charge density of the outer surface of the photoelectric layer. The non-contact type particulate processing apparatus according to claim 1.

3. The orbital layer includes two arms extending from the base layer, with a gap formed between the inner surfaces of the two arms, and the free end faces of the two arms located outside the photoelectric layer and in contact with each other, so that the gap is surrounded by the inner surfaces of the two arms and the base layer, while the free end faces of the two arms form at least a portion of the charge orbital. The non-contact type particulate processing apparatus according to claim 1.

4. The orbital layer includes two arms extending from the base layer, with a gap formed between the inner surfaces of the two arms, the free end faces of the two arms are located apart from each other outside the photoelectric layer such that the gap communicates with the outside, and the inner surfaces of the two arms form at least a portion of the charge orbital. The non-contact type particulate processing apparatus according to claim 1.

5. The aforementioned charge orbital is Multiple lateral track grooves, each parallel to the first direction, Each of them is parallel to the second direction, and there are multiple longitudinal raceway grooves that intersect each other with the multiple transverse raceway grooves, It has, Each of the multiple overlapping locations where the multiple lateral raceway grooves and the multiple longitudinal raceway grooves intersect each other is defined as a charge concentration region. When the photoelectric layer operates and generates a plurality of charges that concentrate in the charge orbitals, the charge concentration region has the maximum charge density within the photosensing structure. The non-contact type particulate processing apparatus according to claim 1.

6. Any one of the plurality of lateral track grooves and any one of the plurality of longitudinal track grooves has two adjacent inner edge angles and two outer edge angles located outside the two inner edge angles, and in any one of the plurality of lateral track grooves and any one of the plurality of longitudinal track grooves, the height positions of the two inner edge angles are different from the height positions of the two outer edge angles. The non-contact type particulate processing device according to claim 5.

7. The photoelectric layer comprises a plurality of transistors arranged in a matrix, and the orbital layer includes a plurality of annular segments surrounding each of the plurality of transistors, the plurality of annular segments are arranged adjacent to each other in a matrix, and the upper edges of the plurality of annular segments together constitute the charge orbital. The non-contact type particulate processing apparatus according to claim 1.

8. The outer contour of each annular segment is rectangular, and a charge concentration region is formed in the center of any four adjacent annular segments arranged in a rectangle, and when the photoelectric layer operates to generate a plurality of charges that concentrate in the charge orbits, the charge concentration region has the greatest charge density within the photosensing structure. The non-contact type particulate processing device according to claim 7.

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