Dimmable screen, dimmable system, and dimmable method

Abstract

The present invention relates to a dimming screen, a dimming system, and a dimming method. The dimming screen includes a first conductive structure, a second conductive structure, and a photoresponsive structure. The bistable display structure is located between the first conductive structure and the second conductive structure, and is located on one side or inside the photoresponsive structure. The system's advantages include low power consumption and extremely fast response because it utilizes the electrical properties of the photoresponsive structure for coloring and erasing. Except for the light-irradiated area, other areas of the photoresponsive structure still function as insulators, and only the light-irradiated area exhibits conductivity. This eliminates the need for complex circuit design and additional sensing structures compared to conventional voltage-resistant types, making it useful for the production of large-scale screens and large-scale promotion.

Description

[Technical Field]

[0001] The present invention relates to the field of multi-stable display technology, and in particular, to a light dimming screen, a method for manufacturing the light dimming screen, a light dimming system, and a square light dimming method. [Background Art]

[0002] Compared with conventional LCD display technology, bistable display technology (e.g., electronic ink display, liquid crystal handwriting board, liquid crystal blackboard) consumes energy only when the displayed content changes, which can greatly reduce power consumption. In addition, since bistable display technology basically relies on reflected light, it does not have the problem of blue light emission like conventional LCD display technology, and is gentle on the eyes.

[0003] However, bistable display technology still has drawbacks. 1) For electronic ink displays that need to display specific images, it is necessary to design complex circuits. 2) Electronic ink displays / liquid crystal blackboards can only achieve full-screen erasing, and cannot perform local erasing. If local erasing is to be achieved, a complex circuit structure needs to be designed, which results in high cost.

[0004] At present, no effective solution has been proposed to address the problems existing in the related art, such as the need to design complex circuits for displaying specific images on electronic ink displays, and the inability of liquid crystal handwriting boards / liquid crystal blackboards to achieve local erasing at low cost. [Summary of the Invention]

[0005] The object of the present invention is to provide a light dimming screen, a method for manufacturing the light dimming screen, a light dimming system, and a square light dimming method that address the deficiencies of the prior art, so as to solve the problems existing in the related art, such as the need for complex circuit design to display specific images on an electronic ink screen, and the inability of liquid crystal handwriting boards / liquid crystal blackboards to achieve local erasing at low cost.

[0006] To achieve the above objectives, the technical solutions employed by the present invention are as follows. In the first embodiment, a dimmable screen is provided, A first conductive structure, A second conductive structure is provided opposite to the first conductive structure described above, A photoresponsive structure is provided between the first conductive structure and the second conductive structure described above, which exhibits a non-conductive state when there is no light irradiation and a conductive state when there is light irradiation, and the wavelength of light is 200 nm to 2000 nm. The present invention includes a bistable display structure provided between the first conductive structure and the second conductive structure, located on one side or inside the photoresponse structure, which enters a locally erased state when the voltage is modulated and the photoresponse structure is in a conductive state.

[0007] In some embodiments, the first conductive structure described above is The first base layer, It includes a first conductive layer provided on the side of the first base layer adjacent to the second conductive structure described above.

[0008] In some embodiments, the second conductive structure described above is The second base layer, It includes a second conductive layer provided on the side of the second base layer adjacent to the first conductive structure described above.

[0009] In some embodiments, the above photoresponsive structure is The present invention includes the first photoresponse layer provided between the first conductive structure and the bistable display structure.

[0010] In some embodiments, the above photoresponsive structure is The present invention includes a second photoresponsive layer provided between the second conductive structure and the bistable display structure.

[0011] In some embodiments, the above-described bistable display structure is, The device includes a liquid crystal display layer provided between the first conductive structure and the second conductive structure, located on one side of the photoresponse structure, which indicates a local erasure state when the voltage is modulated and the photoresponse structure is in a conductive state.

[0012] In some embodiments, the above-described bistable display structure is, The present invention includes an ink display layer provided between the first conductive structure and the second conductive structure, positioned inside the photoresponsive structure, which indicates a local erasure state when the voltage is modulated and the photoresponsive structure is in a conductive state.

[0013] In a second embodiment, a method for manufacturing a dimmable screen for manufacturing the dimmable screen described in the first embodiment, the manufacturing method being: (To manufacture the first conductive structure) A first conductive layer is formed on the surface of the first base layer to form a first conductive structure. (To manufacture a second conductive structure) A second conductive layer is formed on the surface of the second base layer to form a second conductive structure. (Manufacturing of photoresponsive structures) A first photoresponsive layer is formed on the surface of the first conductive layer. (Manufacturing dimmable screens) A dimmable screen is formed by assembling a first base layer, a first conductive layer, a first photoresponse layer, a liquid crystal display layer, a second conductive layer, and a second base layer.

[0014] Furthermore, a method for manufacturing a dimmable screen described in the first embodiment is provided, and the manufacturing method is as follows: (To manufacture the first conductive structure) A first conductive layer is formed on the surface of the first base layer to form a first conductive structure. (To manufacture a second conductive structure) A second conductive layer is formed on the surface of the second base layer to form a second conductive structure. (Manufacturing of photoresponsive structures) forming a second photoresponse layer on a surface of a second conductive layer, (manufacturing a light control screen) assembling a first base layer, a first conductive layer, a liquid crystal display layer, a second photoresponse layer, a second conductive layer and a second base layer to form a light control screen.

[0015] further provided is a method for manufacturing a light control screen configured to manufacture the light control screen according to the first aspect, the manufacturing method comprising: (manufacturing a first conductive structure) forming a first conductive layer on a surface of a first base layer to obtain a first conductive structure, (manufacturing a second conductive structure) forming a second conductive layer on a surface of a second base layer to obtain a second conductive structure, (manufacturing a photoresponse structure) forming a first photoresponse layer on a surface of the first conductive layer and forming a second photoresponse layer on a surface of the second conductive layer, (manufacturing a light control screen) combining the first base layer, the first conductive layer, the first photoresponse layer, a liquid crystal display layer, the second photoresponse layer, the second conductive layer, and the second base layer to form a light control screen.

[0016] further provided is a method for manufacturing a light control screen configured to manufacture the light control screen according to the first aspect, the manufacturing method comprising: (manufacturing a first conductive structure) forming a first conductive layer on a surface of a first base layer to obtain a first conductive structure, (manufacturing a second conductive structure) forming a second conductive layer on a surface of a second base layer to obtain a second conductive structure, (manufacturing a photoresponse structure) forming a first photoresponse layer on a surface of the first conductive layer and forming a second photoresponse layer on a surface of the second conductive layer, (manufacturing a light control screen) A dimmable screen is formed by combining a first base layer, a first conductive layer, a first photoresponse layer, an ink display layer, a second photoresponse layer, a second conductive layer, and a second base layer. In a third embodiment, a dimming system is provided, A dimmable screen according to the first embodiment, or The second embodiment includes a dimmable screen manufactured by the manufacturing method described in the second embodiment.

[0017] In some embodiments, further, Includes a control device connected to the dimming screen to adjust the voltage applied to the dimming screen.

[0018] In some embodiments, further, The dimming device includes a light-emitting device that emits light onto the dimming screen to change the state of the photoresponse structure of the dimming screen, wherein the light has a wavelength of 200 nm to 2000 nm.

[0019] In a fourth aspect, a dimming method is provided, the dimming method being Obtain a voltage adjustment command, In accordance with the above voltage adjustment command, the voltage applied to the first conductive structure / second conductive structure is adjusted so that the bistable display structure enters local erase mode.

[0020] When the above bistable display structure is in local erasure mode, it is determined whether or not the above photoresponsive structure is irradiated with light, where the wavelength of the light is 200 nm to 2000 nm. When the above photoresponsive structure is irradiated with light, the above photoresponsive structure is in a conductive state so as to put the irradiated bistable display structure into a locally erased state. When the above-mentioned photoresponsive structure is not subjected to light irradiation, the above-mentioned photoresponsive structure is in a non-conductive state so as not to cause the above-mentioned bistable display structure to enter a locally erased state.

[0021] In some embodiments, further, Obtain a voltage adjustment command, In accordance with the above voltage adjustment command, the voltage applied to the above-mentioned first conductive structure / above-mentioned second conductive structure is adjusted so that the above-mentioned bistable display structure enters write mode.

[0022] In some embodiments, further, Obtain a voltage adjustment command, In accordance with the above voltage adjustment command, the voltage applied to the above first conductive structure / above second conductive structure is adjusted so that the above bistable display structure enters write mode. When the above bistable display structure is in writing mode, it is determined whether the above photoresponse structure has been irradiated with light, where the wavelength of the light is 200 nm to 2000 nm. When the above photoresponsive structure is irradiated with light, the above photoresponsive structure exhibits a conductive state such that the irradiated bistable display structure enters a written state. When the above-mentioned photoresponsive structure is not exposed to light, the above-mentioned photoresponsive structure exhibits a non-conductive state so that the above-mentioned bistable display structure does not enter a written state.

[0023] In some embodiments, further, Obtain a voltage adjustment command, In accordance with the above voltage adjustment command, the voltage applied to the first conductive structure / second conductive structure is adjusted so that the bistable display structure enters the overall erase mode.

[0024] In some embodiments, further, When the above photoresponsive structure is irradiated with light, it detects the range of light irradiation, Based on the above light irradiation range, the above photoresponse structure is divided into a conductive region and a non-conductive region. Based on the conductive region and the non-conductive region described above, the bistable display structure described above is divided into a region that can be erased and a region that cannot be erased.

[0025] In some embodiments, further, When the above photoresponsive structure is irradiated with light, it detects the range of light irradiation, Based on the irradiation range described above, the photoresponse structure described above is divided into a conductive region and a non-conductive region. Based on the conductive region and the non-conductive region described above, the bistable display structure described above is divided into a writable region and a non-writable region.

[0026] The dimmable screen, dimmable screen manufacturing method, dimmable system, and rectangular dimmable method according to the present invention have the following technical advantages compared to the prior art. 1) Low system power consumption. In write mode, the dimmable screen is essentially power-free, and color reproduction depends solely on the properties of the bistable material display layer itself. In erase mode, power consumption is not high because local erasure does not conduct most of the circuit due to the insulating effect of the photoresponsive structure, and overall erasure only uses a large number of high-voltage pulses. 2) High-speed response. Because it utilizes the physical properties of the bistable material and the electrical properties of the photoresponsive structure to produce and erase colors, there is no additional signal processing process in the region, resulting in an extremely fast response. 3) Super resolution. Compared to pixel displays, dimmable screens have extremely high resolution and allow for local erasure. When local erasure is performed, the areas of the photoresponsive structure other than the light-illuminated area remain insulated, and only the light-illuminated area is energized, making it possible to partially erase handwritten characters in the energized area. 4) Low cost. Compared to conventional methods, the present invention does not require complex circuit design or additional sensing structures, making it suitable for the production of large screens (e.g., electronic whiteboards) and large-scale promotions. [Brief explanation of the drawing]

[0027] [Figure 1] Figure 1 is a cross-sectional view (1) of a dimmable screen according to an embodiment of the present invention. [Figure 2] Figure 2 is a cross-sectional view (2) of a dimmable screen according to an embodiment of the present invention. [Figure 3] Figure 3 is a cross-sectional view (3) of a dimmable screen according to an embodiment of the present invention. [Figure 4]Figure 4 is a cross-sectional view (IV) of a dimmable screen according to an embodiment of the present invention. [Figure 5] Figure 5 is a frame diagram of a dimming system according to an embodiment of the present invention.

[0028] Technical solutions in embodiments of the present invention will be described below clearly and completely with reference to the accompanying drawings of embodiments of the present invention. Obviously, the embodiments described are only a selection, and not all, of embodiments of the present invention. All other embodiments that can be obtained by those skilled in the art without creative work based on embodiments of the present invention are included within the scope of the protection of the present invention. It should be noted that, insofar as they do not contradict each other, embodiments and features of the present invention can be combined with each other.

[0029] The present invention is described further below in conjunction with the accompanying drawings and specific embodiments, but should not be used as a limitation of the present invention.

[0030] First Embodiment This embodiment relates to the dimmable screen and the method for manufacturing the dimmable screen according to the present invention. An exemplary embodiment of the present invention. As shown in Figures 1 to 3, the dimming screen 100 comprises a first conductive structure 110, a second conductive structure 120, a photoresponsive structure 130, and a bistable display structure 140. Here, the second conductive structure 120 is positioned opposite the first conductive structure 110. The photoresponsive structure 130 is positioned between the first conductive structure 110 and the second conductive structure 120 and is in a non-conductive state when there is no light irradiation and in a conductive state in the presence of light irradiation. The bistable display structure 140 is positioned between the first conductive structure 110 and the second conductive structure 120 and is positioned to the side / inside of the photoresponsive structure 130 to indicate a local erasure state under voltage regulation and when the photoresponsive structure 130 is in a conductive state. Here, the wavelength of light is between 200 nm and 2000 nm, meaning that light includes ultraviolet light, visible light, and infrared light.

[0031] This invention works as follows: The dimmable screen 100 includes a write mode, a local erase mode, and a whole erase mode. When the dimming screen 100 is in local erasure mode, it has the following two states: When no light is applied, the photoresponse structure 130 is in a non-conductive state, and in this case, regardless of whether a voltage is applied to the bistable display structure 140, and whether the direction of the voltage applied to the bistable display structure 140 is adjusted, the strength of the electric field of the bistable display structure 140 is limited. When light is irradiated, the photoresponse structure 130 is in a conductive state, and at this time, the electric field strength of the bistable display structure 140 is strengthened, allowing the bistable display structure 140 to operate.

[0032] In this invention, there are no limitations on the size of the dimmable screen 100. Specifically, the size of the dimmable screen 100 includes, but is not limited to, 5.4 inches, 7.9 inches, 8.3 inches, 9.7 inches, 10.2 inches, 10.5 inches, 10.9 inches, 11 inches, 12.9 inches, 14 inches, 16 inches, 21.5 inches, 24 inches, 27 inches, 32 inches, 43 inches, 48 ​​inches, 50 inches, 55 inches, 65 inches, 75 inches, 85 inches, 100 inches, 148 inches, and 168 inches, ranging from 5 inches to 200 inches.

[0033] In the present invention, the dimmable screen 100 can be used as a handwriting board, a display screen, or an electronic whiteboard.

[0034] This embodiment has the following three embodiments: As shown in Figure 1, the bistable display structure 140 is provided between the second conductive structure 120 and the photoresponsive structure 130. As shown in Figure 2, the bistable display structure 140 is provided between the first conductive structure 110 and the photoresponsive structure 130. As shown in Figure 3, the bistable display structure 140 is located inside the photoresponsive structure 130. As shown in Figures 1 to 3, the first conductive structure 110 consists of a first base layer 111 and a first conductive layer 112, and the first conductive layer 112 is provided on the side of the first base layer 111 that is closer to the second conductive structure 120.

[0035] The first base layer 111 is made of a light-transmitting material that includes, but is not limited to, a flexible material and an inflexible material such as glass, plastic film, or PET.

[0036] In some embodiments, the first base layer 111 is a light-colored material or a dark-colored material. When the first base layer 111 is a light-colored material, the light transmittance of the first base layer 111 is 15% to 90%.

[0037] Preferably, the light transmittance of the first base layer 111 is 30% to 90%. More preferably, the light transmittance of the first base layer 111 is 50% to 90%. More preferably, the light transmittance of the first base layer 111 is 75% to 90%.

[0038] When the first base layer 111 is a dark-colored material, the light transmittance of the first base layer 111 is 0% to 80%.

[0039] Preferably, the light transmittance of the first base layer 111 is 0% to 60%. More preferably, the light transmittance of the first base layer 111 is 0% to 50%. More preferably, the light transmittance of the first base layer 111 is 0% to 35%.

[0040] The thickness of the first base layer 111 is not particularly limited and is limited as required by the dimming screen 100.

[0041] In some embodiments, the thickness of the first base layer 111 is 100 μm to 1 cm.

[0042] The dimensions of the first conductive layer 112 are the same as the dimensions of the first base layer 111. Generally, the length of the first conductive layer 112 is equal to the length of the first base layer 111, and the width of the first conductive layer 112 is equal to the width of the first base layer 111.

[0043] The first conductive layer 112 is manufactured from conductive materials including, but not limited to, indium tin oxide (ITO), TCO conductive glass (FTO), and polyethylene dioxythiophene (PEDOT).

[0044] In some embodiments, the first conductive layer 112 has a thickness of 2 nm to 100 μm.

[0045] As shown in Figures 1 to 3, the second conductive structure 120 includes a second base layer 121 and a second conductive layer 122, where the second conductive layer 122 is located on the side of the second base layer 121 that is closer to the first conductive structure 110.

[0046] Specifically, the second conductive layer 122 is located on the side of the second base layer 121 that is closer to the first conductive layer 112.

[0047] The second base layer 121 is made of a flexible material and a non-flexible material such as glass, plastic film, or PET, but is not limited to these materials.

[0048] In some embodiments, the second base layer 121 is a light-colored material or a dark-colored material.

[0049] When the second base layer 121 is a light-colored material, the light transmittance of the second base layer 121 is 15% to 90%.

[0050] Preferably, the light transmittance of the second base layer 121 is 30% to 90%. More preferably, the light transmittance of the second base layer 121 is 50% to 90%. More preferably, the light transmittance of the second base layer 121 is 75% to 90%.

[0051] When the second base layer 121 is a dark-colored material, the light transmittance of the second base layer 121 is 0% to 80%.

[0052] Preferably, the light transmittance of the second base layer 121 is 0% to 60%. More preferably, the light transmittance of the second base layer 121 is 0% to 50%. More preferably, the light transmittance of the second base layer 121 is 0% to 35%.

[0053] At least one of the first base layer 111 and the second base layer 121 is made of a light-colored material.

[0054] The size of the second base layer 121 is the same as the size of the first base layer 111. Generally, the length of the second base layer 121 is equal to the length of the first base layer 111, and the width of the second base layer 121 is equal to the width of the first base layer 111.

[0055] The thickness of the second base layer 121 is not particularly limited and is limited as required by the dimming screen 100.

[0056] In some embodiments, the thickness of the second base layer 121 is 100 μm to 1 cm.

[0057] The dimensions of the second conductive layer 112 are the same as the dimensions of the second base layer 121. Generally, the length of the second conductive layer 112 is equal to the length of the first base layer 111, and the width of the first conductive layer 112 is equal to the width of the first base layer 111.

[0058] The second conductive layer 122 is made of a transparent conductive material that includes, but is not limited to, indium tin oxide (ITO), TCO conductive glass (FTO), polyethylene dioxythiophene (PEDOT), etc.

[0059] In some embodiments, the second conductive layer 122 has a thickness of 2 nm to 100 μm.

[0060] As shown in Figure 1, the photoresponsive structure 130 includes a first photoresponsive layer 131. Here, the first photoresponsive layer 131 is provided between the first conductive structure 110 and the bistable display structure 140. Specifically, the first photoresponse layer 131 is provided between the first conductive layer 112 and the bistable display structure 140.

[0061] The dimensions of the first photoresponse layer 131 are the same as the dimensions of the first conductive layer 112. Generally, the length of the first conductive layer 131 is equal to the length of the first conductive layer 112, and the width of the first photoresponse layer 131 is equal to the width of the first conductive layer 112.

[0062] The first photoresponsive layer 131 is made of a photosensitive material or a material that forms a rectifying structure with the first conductive layer 112, such as a PN junction or a Schottky contact. Examples include titanium dioxide, gallium nitride, zinc oxide, perovskite material, and mercury-cadmium telluride.

[0063] The thickness of the first photoresponse layer 131 is not particularly limited and is limited according to the requirements of the dimmable screen 100. In some embodiments, the thickness of the first photoresponsive layer 131 is 2 nm to 100 μm.

[0064] As shown in Figure 2, the photoresponsive structure 130 includes a second photoresponsive layer 132, which is provided between the second conductive structure 120 and the bistable display structure 140.

[0065] Specifically, the second photoresponse layer 132 is provided between the second conductive layer 122 and the bistable display structure 140.

[0066] The size of the second photoresponse layer 132 is the same as the size of the second conductive layer 122. Generally, the length of the second photoresponse layer 132 is equal to the length of the second conductive layer 122, and the width of the second photoresponse layer 132 is equal to the width of the second conductive layer 122.

[0067] The first photoresponsive layer 131 is made of a photosensitive material or a material that forms a rectifying structure with the second conductive layer 122, such as a PN junction or a Schottky contact. Examples include titanium dioxide, gallium nitride, zinc oxide, perovskite material, and mercury-cadmium telluride.

[0068] The thickness of the second photoresponse layer 132 is not particularly limited and is limited according to the requirements of the dimmable screen 100.

[0069] In some embodiments, the thickness of the second photoresponsive layer 132 is 2 nm to 100 μm.

[0070] As shown in Figures 1 and 2, the bistable display structure 140 includes a liquid crystal display layer 141, which is located between the first conductive structure 110 and the second conductive structure 120, and is positioned on one side of the photoresponse structure 130 to indicate a state in which the voltage is modulated and partially erased when the photoresponse structure 130 is conductive.

[0071] Specifically, the liquid crystal display layer 141 is provided between the first conductive layer 112 and the second conductive layer 122, and is positioned on one side of the first photoresponse layer 131 and / or on one side of the second photoresponse layer 132.

[0072] In this embodiment, there are several possible configurations, as described below. 1) As shown in Figure 1, the liquid crystal display layer 141 is provided between the second conductive layer 122 and the first photoresponse layer 131. 2) As shown in Figure 2, the liquid crystal display layer 141 is provided between the first conductive layer 112 and the second photoresponse layer 132. 3) As shown in Figure 3, the liquid crystal display layer 141 is provided between the first photoresponse layer 131 and the second photoresponse layer 132.

[0073] The size of the liquid crystal display layer 141 matches the size of the first optical response layer 131 / second optical response layer 132. Generally, the length of the liquid crystal display layer 141 is not greater than the length of the first optical response layer 131 / second optical response layer 132, and the width of the liquid crystal display layer 141 is not greater than the width of the first optical response layer 131 / second optical response layer 132.

[0074] The liquid crystal display layer 141 is manufactured from a liquid crystal material such as a cholesteric phase liquid crystal material. The thickness of the liquid crystal display layer 141 is not limited, but is limited depending on the requirements of the dimmable screen 100.

[0075] In some embodiments, the thickness of the liquid crystal display layer 141 is 10 nm to 100 μm.

[0076] The dimmable screen 100 shown in Figure 1 is manufactured as follows: (To manufacture the first conductive structure 110) A first conductive layer 112 is formed on the surface of the first base layer 111 to form a first conductive structure 110. (To manufacture the second conductive structure 120) A second conductive layer 122 is formed on the surface of the second base layer 121 to form a second conductive structure 120. (Manufacturing of the photoresponsive structure 130) A first photoresponsive layer 131 is formed on the surface of the first conductive layer 112. (To manufacture dimmable screen 100) The dimmable screen 100 is formed by combining the first base layer 111, the first conductive layer 112, the first photoresponse layer 131, the liquid crystal display layer 141, the second conductive layer 122, and the second base layer 121.

[0077] Before preparing the dimmable screen 100, further, (To manufacture a bistable display structure 140) A liquid crystal display layer 141 is formed on the surface of the second conductive layer 122.

[0078] Regarding the dimmable screen 100 shown in Figure 2, its manufacturing method is as follows: (To manufacture the first conductive structure 110) A first conductive layer 112 is formed on the surface of the first base layer 111, and a first conductive structure 110 is formed. (To manufacture the second conductive structure 120) A second conductive layer 122 is formed on the surface of the second base layer 121, and a second conductive structure 120 is formed. (Manufacturing the photoresponsive structure 130) A second photoresponsive layer 132 is formed on the surface of the second conductive layer 122. (To manufacture dimmable screen 100) The first base layer 111, the first conductive layer 112, the liquid crystal display layer 141, the second photoresponse layer 132, the second conductive layer 122, and the second base layer 121 are assembled to form the dimmable screen 100.

[0079] Furthermore, before manufacturing the dimmable screen 100, (To manufacture a bistable display structure 140) This includes forming a liquid crystal display layer 141 on the surface of the second conductive layer 122.

[0080] Regarding the dimmable screen 100 shown in Figure 2, its manufacturing method is as follows: (To manufacture the first conductive structure 110) A first conductive layer 112 is formed on the surface of the first base layer 111, and a first conductive structure 110 is formed. (To manufacture the second conductive structure 120) A second conductive layer 122 is formed on the surface of the second base layer 121, and a second conductive structure 120 is formed. (Manufacturing the photoresponsive structure 130) A second photoresponsive layer 132 is formed on the surface of the second conductive layer 122. (To manufacture dimmable screen 100) The method includes assembling a first base layer 111, a first conductive layer 112, a liquid crystal display layer 141, a second photoresponse layer 132, a second conductive layer 122, and a second base layer 121 to form a dimmable screen 100.

[0081] Furthermore, before manufacturing the dimmable screen 100, (To manufacture a bistable display structure 140) This includes forming a liquid crystal display layer 141 on the surface of the first conductive layer 112.

[0082] Regarding the dimmable screen 100 shown in Figure 3, the preparation method is as follows: (To manufacture the first conductive structure 110) A first conductive layer 112 is formed on the surface of the first base layer 111 to form a first conductive structure 110. (To manufacture the second conductive structure 120) A second conductive layer 122 is formed on the surface of the second base layer 121 to form a second conductive structure 120. (Manufacturing the photoresponsive structure 130) A first photoresponse layer 112 is formed on the surface of the first conductive layer 112, and a second photoresponse layer 132 is formed on the surface of the second conductive layer 122. (To manufacture dimmable screen 100) The method includes assembling a first base layer 111, a first conductive layer 112, a first photoresponse layer 131, a liquid crystal display layer 141, a second photoresponse layer 132, a second conductive layer 122, and a second base layer 121 to form a dimmable screen 100.

[0083] Furthermore, before manufacturing the dimmable screen 100, (To manufacture a bistable display structure 140) This includes forming a liquid crystal display layer 141 on the surface of the first photoresponse layer 131 or the second photoresponse layer 132.

[0084] To manufacture the first conductive structure 110, a first conductive layer 112 is formed on the surface of the first base layer 111 by a combination of one or more of the following methods: magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical evaporation, coating, and printing.

[0085] In some embodiments, a 125 μm PET film is used as the first base layer 111, and a 200 nm ITO layer is sputtered onto the surface of the first base layer 111 as the first conductive layer 112 using magnetron sputtering technology under an inert gas (argon) atmosphere.

[0086] In some embodiments, a 125 μm PET film is used as the second base layer 121, and a 200 nm ITO layer is formed as the second conductive layer 122 by magnetron sputtering under partial pressure of an inert gas (argon).

[0087] To manufacture the second conductive structure 120, a second conductive layer 112 is formed on the surface of the second base layer 121 by a combination of one or more of the following methods: magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical evaporation, coating, and printing.

[0088] In some embodiments, a 125 μm PET film is used as the second base layer 121, and a 200 nm ITO layer is sputtered onto the surface of the second base layer 111 as the second conductive layer 122 using magnetron sputtering technology under an inert gas (argon) atmosphere.

[0089] To manufacture the photoresponsive structure 130, a first photoresponsive layer 131 is formed on the surface of a first base layer 112 by a combination of one or more of the following methods: magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical evaporation, coating, and printing. Alternatively, a second photoresponsive layer 132 is formed on the surface of a second base layer 122 by a combination of one or more of the following methods: magnetron sputtering, ion plating, electron beam evaporation, thermal evaporation, electrochemical evaporation, coating, and printing.

[0090] In some embodiments, magnetron sputtering technology is used to sputter a 100 nm zinc oxide layer as a first photoresponse layer 131 onto the surface of a first conductive layer 112, or to sputter a 100 nm zinc oxide layer as a second photoresponse layer 132 onto the surface of a second conductive layer 122, under a mixed atmosphere of oxygen and argon (4:71).

[0091] The assembly method for manufacturing the dimmable screen 100 includes, but is not limited to, roll-to-roll assembly.

[0092] For manufacturing the bistable display structure 140, the liquid crystal slurry is uniformly distributed between the first photoresponsive layer 131 and the second conductive layer 122 by extrusion coating, injection, or other common methods, or curing (such as UV irradiation curing) and edge sealing (such as edge sealing with UV-curable adhesive or other adhesive) are performed between the first conductive layer 112 and the second photoresponsive layer 132.

[0093] In some embodiments, the liquid crystal slurry is prepared as follows. Liquid crystal (such as cholesteric liquid crystal), prepolymer, and photoinitiator are mixed and stirred at 40°C for 5 hours in a mass ratio of 70:28:2 to obtain a mixed slurry. A 500 nm spacer is mixed into this mixed slurry at a mass ratio of 0.4% to obtain a liquid crystal slurry.

[0094] The method of using the dimmable screen 100 of the present invention is as follows. 1) Writing mode There is no need to apply voltage to the first conductive layer 112 and the second conductive layer 122; physical pressure can be sensed by utilizing the bistable effect of the liquid crystal display layer 141 itself, thereby enabling writing display. 2) Erase mode A voltage is applied to the first conductive layer 112 and the second conductive layer 122 so that the liquid crystal display layer 141 enters the erase mode. When light is not irradiated onto the first photoresponse layer 131 / second photoresponse layer 132, the first photoresponse layer 131 / second photoresponse layer 132 are in a non-conductive state, and the first photoresponse layer 131 / second photoresponse layer 132 limit the strength of the electric field of the liquid crystal display layer 141, so the liquid crystal display layer 141 is in erase mode but not in an erased state.

[0095] When light is shone on the first photoresponse layer 131 / second photoresponse layer 132, the first photoresponse layer 131 / second photoresponse layer 132 become conductive, and the first photoresponse layer 131 / second photoresponse layer 132 do not limit the strength of the electric field of the liquid crystal display layer 141. Due to the action of the first conductive layer 112 and the second conductive layer 122, the strength of the electric field of the liquid crystal display layer 141 increases, and the liquid crystal display layer 141 is erased. This enables local erasure (applying a continuous low voltage or low voltage pulse to the first conductive layer 112 and the second conductive layer 122) or overall erasure (applying a high voltage pulse to the first conductive layer 112 and the second conductive layer 122).

[0096] The technical effects of the present invention are, 1. The system consumes little power. In writing mode, the dimmable screen consumes virtually no power, relying on the properties of the liquid crystal display layer itself to sense physical compression and display colors. In erasing mode, during local erasure, most circuits do not conduct under the insulating effect of the photoresponsive structure, and during overall erasure, only a few high-voltage pulses are used, resulting in low power consumption. 2. High-speed response. Because color development and erasure are performed using the physical properties of the liquid crystal display layer (cholesteric liquid crystal material) and the electrical properties of the photoresponse structure, no additional local signal processing is required, resulting in an extremely fast response. 3. Super resolution. Compared to pixel displays, dimmable screens have a much higher resolution. 4. Local erasure capability. When local erasure is performed, the areas of the photoresponsive structure other than the area irradiated with light still function as insulators, and only the irradiated area is conductive, thus enabling partial erasure of handwritten characters in the conductive parts. 5. Low cost. Compared to conventional pressure-resistant types, the present invention does not require complex circuit design or additional sensing structures, making it advantageous for the production of large screens such as electronic whiteboards and large-scale promotions.

[0097] Second Embodiment This embodiment relates to the dimmable screen and the method for manufacturing the dimmable screen according to the present invention. An exemplary embodiment of the present invention. As shown in Figure 4, the dimmable screen 100 comprises a first conductive structure 110, a second conductive structure 120, a photoresponsive structure 130, and a bistable display structure 140. Here, the second conductive structure 120 is positioned opposite the first conductive structure 110. The photoresponsive structure 130 is positioned between the first conductive structure 110 and the second conductive structure 120 and is used to be non-conductive when no light is irradiated and conductive when light is irradiated. The bistable display structure 140 is positioned between the first conductive structure 110 and the second conductive structure 120 and is located inside the photoresponsive structure 130.

[0098] In this embodiment, the structure and materials of the first conductive structure 110 and the second conductive structure 120 are basically the same as in the first embodiment, so their description is omitted here.

[0099] As shown in Figure 4, the photoresponsive structure 130 includes a first photoresponsive layer 131 and a second photoresponsive layer 132. Of these, the first photoresponsive layer 131 is positioned between the first conductive structure 110 and the bistable display structure 140, and the second photoresponsive layer 132 is positioned between the second conductive structure 120 and the bistable display structure 140.

[0100] Specifically, the first photoresponse layer 131 is positioned between the first conductive layer 112 and the bistable display structure 140, and the second photoresponse layer 132 is positioned between the second conductive layer 122 and the bistable display structure 140.

[0101] Here, the configuration and materials of the first photoresponse layer 131 and the second photoresponse layer 132 are basically the same as in the first embodiment, so their explanation is omitted here.

[0102] As shown in Figure 4, the bistable display structure 140 includes an ink display layer 142. The ink display layer 142 is positioned between the first conductive structure 110 and the second conductive structure 120, and is located inside the photoresponsive structure 130. It is used to locally erase when the photoresponsive structure 130 is partially conductive under voltage adjustment.

[0103] Specifically, the ink display layer 142 is positioned between the first photoresponse layer 131 and the second photoresponse layer 132.

[0104] The size of the ink display layer 142 matches the size of the first / second photoresponse layers 131 / 132. Generally, the length of the ink display layer 142 is less than or equal to the length of the first / second photoresponse layer 131 / 132, and the width of the ink display layer 142 is less than or equal to the width of the first / second photoresponse layer 131 / 132.

[0105] As shown in Figure 4, the ink display layer 142 is composed of electronic ink capsules and a transparent adhesive, and the electronic ink capsules are composed of dyed positive and negative charges. The thickness of the ink display layer 142 is not limited, but is limited according to the requirements of the dimmable screen 100.

[0106] In some embodiments, the thickness of the ink display layer 142 is 10 nm to 100 μm.

[0107] The manufacturing method for the dimmable screen 100 of this embodiment is as follows. (To manufacture the first conductive structure 110) A first conductive layer 112 is formed on the surface of the first base layer 111 to form a first conductive structure 110. (To manufacture the second conductive structure 120) A second conductive layer 122 is formed on the surface of the second base layer 121 to form a second conductive structure 120. (Manufacturing the photoresponsive structure 130) A first photoresponsive layer 131 is formed on the surface of the first conductive layer 112. A second photoresponsive layer 132 is formed on the surface of the second conductive layer 122. (To manufacture dimmable screen 100) The dimmable screen 100 is formed by combining the first base layer 111, the first conductive layer 112, the first photoresponse layer 131, the ink display layer 142, the second photoresponse layer 132, the second conductive layer 122, and the second base layer 121.

[0108] Furthermore, before manufacturing the step dimming screen 100, (To manufacture a bistable display structure 140) This includes forming an ink display layer 142 between the first photoresponse layer 131 and the second photoresponse layer 132.

[0109] The steps for manufacturing the first conductive structure 110, the second conductive structure 120, and the photoresponsive structure 130 are essentially the same as in the first embodiment, and therefore will not be described here.

[0110] The manufacturing method for the bistable display structure 140 is as follows: The electronic ink capsules are placed on a second conductive layer 122 to ensure contact between each electronic ink capsule and the electrode, the first conductive structure 110 covers the electronic ink capsules, a transparent adhesive is injected between the electronic ink capsules, and the distance between the electrode and the electronic ink capsule is shortened.

[0111] The method of using the dimmable screen 100 of the present invention is as follows. 1) Writing mode A forward voltage is applied to the first conductive layer 112 and the second conductive layer 122 so that the ink display layer 142 enters writing mode. When light is not irradiated onto the first photoresponse layer 131 / second photoresponse layer 132, the first photoresponse layer 131 / second photoresponse layer 132 become non-conductive, and the first photoresponse layer 131 / second photoresponse layer 132 limit the strength of the electric field of the ink display layer 142, so that the ink display layer 142 is not in a writing state even though it is in writing mode. When light is shone on the first photoresponse layer 131 / second photoresponse layer 132, the first photoresponse layer 131 / second photoresponse layer 132 become conductive, and the conductive state of the first photoresponse layer 131 / second photoresponse layer 132 does not limit the electric field strength of the ink display layer 142. Due to the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the ink display layer 142 increases, the ink display layer 142 enters a writing state, and thus writing is achieved.

[0112] 2) Local erase mode A reverse voltage (continuous low voltage or low voltage pulse) is applied to the first conductive layer 112 and the second conductive layer 122 to put the ink display layer 142 into local erasure mode. When light is not irradiated onto the first photoresponse layer 131 / second photoresponse layer 132, the first photoresponse layer 131 / second photoresponse layer 132 become non-conductive, and the first photoresponse layer 131 / second photoresponse layer 132 limit the strength of the electric field of the ink display layer 142, so that the ink display layer 142 is not in a writing state even though it is in writing mode. When light is shone on the first photoresponse layer 131 / second photoresponse layer 132, the first photoresponse layer 131 / second photoresponse layer 132 become conductive, and this conductive state does not limit the electric field strength of the ink display layer 142. Due to the action of the first conductive layer 112 and the second conductive layer 122, the electric field strength of the ink display layer 142 increases, the ink display layer 142 enters a writing state, and thus writing is achieved.

[0113] 3) Complete erase mode By applying a reverse voltage (high-voltage pulse) to the first conductive layer 112 and the second conductive layer 122, the ink display layer 142 enters a complete erase mode.

[0114] The technical effects of the present invention are as follows: 1) Low system power consumption: In write mode and erase mode, most circuits do not conduct electricity due to the isolation of the photoresponsive structure, resulting in low power consumption. 2) High-speed response: Because color development and erasure are performed using the electrical properties of the ink display layer and the photoresponsive structure, there is no additional local signal processing process, resulting in a very fast response. 3) Super resolution: Compared to pixel displays, dimmable screens have a much higher resolution. 4) Locally erasable: When local erasure is performed, the areas of the photoresponsive structure other than the area irradiated with light still function as insulators, and only the irradiated area is conductive, thus enabling partial erasure of handwritten characters in the conductive parts. 5) Locally writable: When local writing is performed, the areas of the photoresponsive structure remain insulators except for the area illuminated by light, and only the illuminated area becomes conductive. This allows for localized handwritten characters to be written on the conductive portion without the need for numerous electrodes. 5) Low cost: Compared to conventional voltage-resistant types, it does not require complex circuit design or additional sensing structures, making it advantageous for the production of large screens such as electronic whiteboards and large-scale promotions.

[0115] Third Embodiment This embodiment relates to the dimming system of the present invention. An exemplary embodiment of the present invention. As shown in Figure 5, the dimming system includes a dimming screen 100 as described in the first embodiment 1 or the second embodiment.

[0116] Furthermore, the dimming system also includes a control device 200. The control device 200 is connected to the dimming screen 100 and is used to adjust the voltage applied to the dimming screen 100.

[0117] Specifically, the control device 200 is connected to at least the first conductive structure 110 and the second conductive structure 120, and adjusts the voltage applied to the first conductive structure 110 and the second conductive structure 120.

[0118] More specifically, the control device 200 is connected to at least the first conductive layer 112 and the second conductive layer 122, and adjusts the voltage applied to the first conductive layer 112 and the second conductive layer 122.

[0119] The control device 200 has the following operating modes: 1) The control device 200 directly controls the dimming screen 100, for example, through key switching, so that the dimming screen 100 enters write mode or erase mode. 2) The control device 200 obtains control signals from an external source, for example via a wireless connection, and sets the dimming screen 100 to write mode or erase mode.

[0120] The control device 200 includes at least a control circuit, a power module, and a drive module. Of these, the power module is connected to the control circuit, and the drive module is connected to the control circuit, the first conductive layer 112, and the second conductive layer 122, respectively.

[0121] In some embodiments, the control circuit includes, but is not limited to, a microcontroller and low-power circuits.

[0122] In some embodiments, the drive module includes, but is not limited to, logic gate circuits such as STCs and STMs, chips, and the like.

[0123] The control device 200 also includes a communication module. This communication module is connected to the control circuit and used for communicating with the outside world.

[0124] In some embodiments, the communication module includes, but is not limited to, a SKYLAB Bluetooth module and a 2.4G wireless module, Bluetooth sensors, an antenna, and the like.

[0125] Furthermore, the dimming system also includes a dimming device 300. The dimming device 300 is used to emit light onto the dimming screen 100 and change the state of the photoresponse structure 130 of the dimming screen 100.

[0126] Of these, the wavelength of light is between 200 nm and 2000 nm.

[0127] In some embodiments, the dimming device 300 is also communicably connected to the control device 200 to send control signals to the control device 200 so that the control device 200 switches the operating mode of the dimming screen 100.

[0128] The dimming device 300 includes at least a light-emitting module. The light-emitting module is used to emit light onto the dimming screen 100 and change the state of the photoresponsive structure 130.

[0129] Specifically, the light-emitting module emits light to the first photoresponse layer 131 / second photoresponse layer 132, and the regions of the first photoresponse layer 131 / second photoresponse layer 132 irradiated by that light become conductive.

[0130] The technical effects of the present invention are as follows: 1) Fast response: Utilizing the electrical properties of the photoresponsive structure, it is used for color development and erasure without any additional local signal processing, resulting in a very fast response. 2) Locally erasable: When local erasure is performed, a dimming device is used to illuminate the dimming screen with light. Except for the illuminated area, the other areas of the photoresponsive structure still function as insulators, and only the illuminated area becomes conductive, making it possible to locally erase handwritten characters on the conductive part. 3) Low cost: Compared to conventional voltage-resistant types, it does not require complex circuit design or additional sensing structures, making it advantageous for large-scale promotions.

[0131] Fourth Embodiment This embodiment relates to the dimming method of the present invention. A dimming method which is an exemplary embodiment of the present invention is: Step S602 to obtain a voltage adjustment command, Step S604 adjusts the voltage applied to the first conductive structure / second conductive structure according to a voltage adjustment command so that the bistable display structure is put into local erase mode. Step S606 determines whether the photoresponsive structure has been irradiated with light when the bistable display structure is in local erasure mode, Step S608: When the photoresponsive structure is irradiated with light, the photoresponsive structure is made conductive, and the bistable display structure that has been irradiated with light is locally erased. The method includes step S610, which, when the photoresponsive structure is not irradiated with light, puts the photoresponsive structure into a non-conductive state and prevents the bistable display structure from being locally erased. Here, steps S608 and S610 are parallel steps.

[0132] In step S502, the voltage adjustment command includes a first voltage adjustment command, a second voltage adjustment command, and a third voltage adjustment command. Here, the first voltage adjustment command is for instructing the application of a continuous low voltage or low voltage pulse to the first conductive structure / second conductive structure, the second voltage adjustment command is for instructing the application of a high voltage pulse to the first conductive structure / second conductive structure, and the third voltage adjustment command is for instructing the application of a reverse voltage to the first conductive structure / second conductive structure.

[0133] Here, the first voltage adjustment command and the second adjustment voltage instruction are applied to the dimming screen 100 described in the first embodiment, and the third voltage adjustment command is applied to the dimming screen 100 described in the second embodiment.

[0134] In step S604, there are the following embodiments. 1) After the voltage applied to the first conductive structure / second conductive structure is adjusted according to the first voltage adjustment command, the bistable display structure (liquid crystal display layer 141) enters local erase mode. 2) After the voltage applied to the first conductive structure / second conductive structure is adjusted according to the second voltage adjustment command, the bistable display structure (liquid crystal display layer 141) enters overall erase mode. 3) After the voltage applied to the first conductive structure / second conductive structure is adjusted according to the third voltage adjustment command, the bistable display structure (ink display layer 142) enters local erasure mode. Through the steps described above, partial erasure of the dimming screen can be achieved by utilizing the partial conductivity characteristics of the photoresponsive structure.

[0135] Furthermore, the dimming method is: Step S702 to obtain a voltage adjustment command, Step S704 adjusts the voltage applied to the first conductive structure / second conductive structure according to a voltage adjustment command so that the bistable display structure is put into write mode, Step S706 determines whether the photoresponse structure has been exposed to light when the bistable display structure is in writing mode, When the photoresponsive structure is irradiated with light, the photoresponsive structure becomes conductive, and step S708 puts the bistable display structure that has been irradiated with light into write mode. The process includes step S710, in which, if the photoresponsive structure is not irradiated with light, the photoresponsive structure becomes non-conductive, and the bistable display structure is not put into a write state.

[0136] Here, steps S702 to S710 and steps S602 to S610 are parallel steps.

[0137] Furthermore, step S702 is the same step as step S702. In step S702, the voltage adjustment command includes a fourth voltage adjustment command, which instructs to apply a positive voltage to the first conductive structure / second conductive structure. In this case, the bistable display structure is the ink display layer 142.

[0138] If the bistable display structure is the liquid crystal display layer 141, only steps S702 to S704 need to be executed.

[0139] Furthermore, the dimming method is: Step S802 detects the light irradiation range when the photoresponsive structure is irradiated with light, Step S804 involves classifying the above photoresponse structure into conductive and non-conductive regions based on the above irradiation range. The method includes step S806, which classifies the bistable display structure into erasable regions and non-erasable regions based on the conductive regions and non-conductive regions described above.

[0140] moreover, The step S808 includes classifying the bistable display structure into writable and non-writable regions based on the conductive and non-conductive regions described above.

[0141] Here, steps S802 to S808 are executed after steps S608 and S708.

[0142] For the dimmable screen 100 of the first embodiment, the dimming method is as follows: Step S901 to obtain a voltage adjustment command, If the voltage adjustment command is the first voltage adjustment command, step S902 adjusts the voltage applied to the first conductive structure / second conductive structure so that the bistable display structure is in local erase mode, Step S903 adjusts the voltage applied to the first conductive structure / second conductive structure so that the bistable display structure is put into overall erase mode, if the voltage adjustment command is a second voltage adjustment command. Step S904 determines whether the photoresponsive structure has been irradiated with light when the bistable display structure is in local erasure mode, When the photoresponsive structure is irradiated with light, step S905 detects the range of light irradiation, Step S906 involves classifying the photoresponsive structure into conductive and non-conductive regions according to the irradiation range. The method includes step S907, which classifies the bistable display structure into erasable and non-erasable regions according to its conductive and non-conductive regions.

[0143] For the dimmable screen 100 of the second embodiment, the dimming method is as follows: Step S1001 to obtain a voltage adjustment command, If the voltage adjustment command is a fourth voltage adjustment command, step S1002 adjusts the voltage applied to the first conductive structure / second conductive structure so that the bistable display structure is put into write mode, If the voltage adjustment command is a third voltage adjustment command, step S1003 adjusts the voltage applied to the first conductive structure / second conductive structure so that the bistable display structure is put into local erase mode, Step S1004 determines whether the photoresponsive structure has been exposed to light when the bistable display structure is in write mode or local erase mode, When the photoresponsive structure is irradiated with light, step S1005 detects the range of light irradiation, Step S1006 involves classifying the photoresponsive structure into conductive and non-conductive regions according to the irradiation range. The method includes step S1007, which classifies the bistable display structure into erasable regions (writable regions) and non-erasable regions (non-writable regions) according to the conductive and non-conductive regions.

[0144] The technical effects of the present invention are as follows: 1) Local erasure is possible. When local erasure is performed, a dimming device is used to illuminate a dimming screen. Except for the area illuminated by light, the other areas of the photoresponsive structure still function as insulators, and only the illuminated area becomes conductive, thereby partially erasing the handwriting in the conductive area.

[0145] Fifth Embodiment This embodiment relates to a specific embodiment of the dimmable screen of the present invention. A dimmable screen capable of local erasure, comprising a first conductive film, a second conductive film, an ultraviolet response layer, and a cholesteric phase liquid crystal layer. Herein, the first conductive film comprises a first substrate and a first conductive layer, the second conductive film comprises a second substrate and a second conductive layer, the ultraviolet response layer can be manufactured in or within the first conductive film, and the cholesteric phase liquid crystal layer is provided between the first conductive film and the second conductive film and is located on one side of the ultraviolet response layer.

[0146] One of the first and second conductive films is a transparent conductive film, and the other is a dark-colored conductive film. In this embodiment, an example is given in which the first conductive film is a transparent conductive film, the second conductive film is a dark-colored conductive film, an ultraviolet response layer is provided on the second conductive film, and a cholesteric phase liquid crystal layer is placed between the first conductive film and the ultraviolet response layer.

[0147] The material of the first substrate is not particularly limited, but is preferably polyethylene terephthalate (PET), although it may be other flexible materials or non-flexible transparent materials. The transmittance of the first substrate is preferably 15% to 90%, and most preferably 75% to 90%.

[0148] The material and manufacturing process of the first conductive layer are not particularly limited, and it is sufficient to use conductive materials and processes that are well known to those skilled in the art and used in liquid crystal handwriting boards.

[0149] In some embodiments, the manufacturing process for the first conductive film involves using a 125 μm PET film as the first substrate and sputtering a 200 nm ITO layer of the first conductive layer in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0150] The material of the second substrate is not particularly limited, and it is sufficient to use conductive materials and processes that are well known to those skilled in the art and used in liquid crystal handwriting boards.

[0151] In some embodiments, the manufacturing process for the second conductive film involves using a 125 μm PET film as the second substrate and sputtering a 250 nm ITO layer of the first conductive layer in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0152] The material of the UV-responsive layer may be any material that is in a high-resistance state, sensitive to UV response, or capable of forming a pn junction or Schottky contact with the first or second conductive layer.

[0153] The position where the ultraviolet-responsive layer is formed is not limited; it may be on a transparent conductive film or a dark-colored conductive film. The manufacturing method is also not limited; known coating methods or spin-coating methods can be used.

[0154] In some embodiments, the process for manufacturing the UV-responsive layer involves sputtering a 100 nm layer of zinc oxide onto a second conductive film using magnetron sputtering technology in a mixed atmosphere of oxygen and argon (4:71) as the UV-responsive layer.

[0155] The raw material for the cholesteric liquid crystal layer is a liquid crystal slurry, the main components of which are cholesteric liquid crystal, a spacer, a prepolymer, and a photoinitiator. The specific components are not limited, and materials well known to those skilled in the art can be used.

[0156] In some embodiments, the process for manufacturing a cholesteric liquid crystal layer involves stirring and mixing a cholesteric liquid crystal, a prepolymer, and a photoinitiator in a mass ratio of 70:28:2 at 40°C for 5 hours, and then mixing a 500 nm spacer into this mixed slurry at a mass ratio of 0.4% to obtain a liquid crystal slurry.

[0157] In this embodiment, the dimming screen is assembled by uniformly distributing a liquid crystal slurry onto a first conductive film (a transparent conductive film) and a second conductive film (a dark color) by extrusion coating, injection, or other common methods, curing it by irradiation with ultraviolet light, and sealing it with an ultraviolet-curing adhesive or other adhesive.

[0158] The method of using this embodiment is as follows. 1) Writing mode There is no need to apply voltage to the first and second conductive films; the cholesteric liquid crystal layer changes from a planar state to a focal conic state by physical squeeze, allowing handwriting to be left on the dimmable screen, thus realizing a writing function. 2) Local erase mode A bias voltage is applied between the first conductive film and the second conductive film as a continuous constant voltage or low voltage pulse, forming an inverse pn junction structure or Schottky contact between the ultraviolet response layer and the second conductive layer of the second conductive film (dark color conductive film). Alternatively, because the ultraviolet response layer itself is in a high-resistance state, the circuit does not conduct under a low-voltage bias, and the cholesteric liquid crystal layer remains in a pyrocon state. Under external ultraviolet irradiation, the ultraviolet response layer irradiated with ultraviolet light becomes conductive, so a low voltage is applied to the corresponding part of the cholesteric liquid crystal layer, and the liquid crystal state in this part returns from a pyramidal state to a planar state, thereby partially erasing the handwriting. 3) Overall erase mode A bias voltage is applied as a high-voltage pulse between the first conductive film and the second conductive film. The high voltage either destroys the inverse pn junction or Schottky contact, or, according to the voltage division law of the cholesteric phase liquid crystal layer, the cholesteric phase liquid crystal layer is converted into a planar state as a whole, achieving full-screen erasure handwriting.

[0159] Sixth Embodiment This embodiment relates to a specific embodiment of the dimmable screen of the present invention. This is a dimmable screen that allows for local erasure, comprising a first conductive film, a second conductive film, a first ultraviolet response layer, a second ultraviolet response layer, and an electronic ink layer. Here, the first conductive film comprises a first substrate and a first conductive layer, the second conductive film comprises a second substrate and a second conductive layer, the first ultraviolet response layer is provided on the first conductive film, the second ultraviolet response layer is provided on the second conductive film, and the electronic ink layer is provided between the first ultraviolet response layer and the second ultraviolet response layer.

[0160] The material of the first substrate is not particularly limited, but is preferably polyethylene terephthalate (PET), and other flexible or non-flexible transparent materials are also possible. The material and manufacturing process of the first conductive layer are not limited, and it is sufficient to use conductive materials and processes that are well known to those skilled in the art and used in liquid crystal handwriting boards.

[0161] In some embodiments, the manufacturing process for the first conductive film involves using a 125 μm PET film as the first substrate and sputtering a 250 nm ITO layer of the first conductive layer in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0162] The material of the second substrate is not limited, but is preferably polyethylene terephthalate (PET). Other flexible or non-flexible transparent materials can be used.

[0163] The material and manufacturing process of the second conductive layer are not limited, and conductive materials and processes used in liquid crystal handwriting boards, which are well known to those skilled in the art, can be used.

[0164] In some embodiments, the manufacturing process for the second conductive film involves using a 125 μm PET film as the second substrate and sputtering a 250 nm ITO layer of the second conductive layer in an inert gas (argon) atmosphere using magnetron sputtering technology.

[0165] The material of the first UV-responsive layer may be any material that is in a high-resistance state and sensitive to UV response, or that can form a pn junction or Schottky contact with the first conductive layer.

[0166] In some embodiments, the manufacturing process for the first ultraviolet response layer involves sputtering a 100 nm layer of zinc oxide as the first ultraviolet response layer onto a first conductive film using magnetron sputtering technology in a mixed atmosphere of oxygen and argon (4:71).

[0167] The material of the second UV-responsive layer may be any material that is in a high-resistance state and sensitive to UV response, or that can form a pn junction or Schottky contact with the first conductive layer.

[0168] In some embodiments, the manufacturing process for the second ultraviolet response layer involves sputtering a 100 nm layer of zinc oxide as the second ultraviolet response layer onto the second conductive film using magnetron sputtering technology in a mixed atmosphere of oxygen and argon (4:71). There are no restrictions on the materials or manufacturing processes for the electronic ink layer; materials commonly used in this field can be used.

[0169] In some embodiments, the manufacturing process for the electronic ink layer involves arranging the electronic ink capsules on a second conductive layer to ensure contact between each electronic ink capsule and an electrode, covering the electronic ink capsules with a first conductive film, injecting a transparent adhesive between the electronic ink capsules, and reducing the distance between the electrode and the electronic ink capsule.

[0170] The method of using this embodiment is as follows. 1) Writing mode When a positive voltage is applied between the first conductive film and the second conductive film, under the action of the first and second ultraviolet response layers, if there is no ultraviolet irradiation, the electric field of the electronic ink layer is small and display cannot be achieved. However, if there is ultraviolet irradiation, the first and second ultraviolet response layers conduct, and ions with the corresponding charge in the electronic ink layer move to the top of the electronic ink layer, enabling the display of the ultraviolet-irradiated handwriting. 2) Local erase mode By applying a reverse voltage between the first conductive film and the second conductive film, the first and second ultraviolet response layers interact. In the absence of ultraviolet irradiation, the electric field of the electronic ink layer is small, making erasure impossible. However, in the presence of ultraviolet irradiation, the first and second ultraviolet response layers conduct electricity, increasing the electric field strength of the electronic ink layer and enabling localized erasure.

[0171] The foregoing is merely a better embodiment of the present invention and is not intended to limit the embodiments or scope of protection of the present invention. Those skilled in the art will recognize that all equivalent substitutions and obvious modifications obtained by applying the contents of the specification and drawings of the present invention should be included within the scope of protection of the present invention. [Explanation of symbols]

[0172] 100…Dimming screen, 110…First conductive structure, 111…First base layer, 112…First conductive layer, 120…Second conductive structure, 121…Second base layer, 122…Second conductive layer, 130…Photoresponse structure, 131…First photoresponse layer, 132…Second photoresponse layer, 140…Bistable display structure, 141…Liquid crystal display layer, 142…Ink display layer, 200…Control device, 300…Dimming device

Claims

1. It is a dimmable screen, and this dimmable screen is, A first conductive structure and A second conductive structure is provided opposite to the first conductive structure described above, Provided between the first conductive structure and the second conductive structure described above, in the absence of light irradiation The photoresponsive structure is non-conductive under normal conditions, conductive when exposed to light, and has a light wavelength of 200 nm to 2000 nm. A bistable indicator structure is provided between the first conductive structure and the second conductive structure, located on one side or inside the photoresponse structure, and exhibits a localized erasure state when the voltage is modulated and the photoresponse structure is in a conductive state. Includes, The first conductive structure described above is A first base layer having a thickness of 100 μm to 1 cm, being a light-colored material with a light transmittance of 15% to 90%, or being a dark-colored material with a light transmittance of 0% to 80%, The first conductive layer has a thickness of 2 nm to 100 μm and is provided on the side of the first base layer that is close to the second conductive structure, The second conductive structure described above is A second base layer having a thickness of 100 μm to 1 cm, being a light-colored material with a light transmittance of 15% to 90%, or being a dark-colored material with a light transmittance of 0% to 80%, The second conductive layer has a thickness of 2 nm to 100 μm and is provided on the side of the second base layer closest to the first conductive structure, At least one of the first base layer and the second base layer is a light-colored material. The aforementioned photoresponsive structure is A first photoresponse layer provided between the first conductive structure and the bistable display structure, the first photoresponse layer having a thickness of 2 nm to 100 μm and made of a material that forms a rectifying structure together with the first conductive layer, the material including titanium dioxide, gallium nitride, zinc oxide, perovskite material, mercury cadmium telluride, and / or A second photoresponse layer is provided between the second conductive structure and the bistable display structure, the second photoresponse layer having a thickness of 2 nm to 100 μm and made of a material that forms a rectifying structure together with the second conductive layer, the material including titanium dioxide, gallium nitride, zinc oxide, perovskite material, and mercury cadmium telluride. The bistable display structure is, A liquid crystal display layer provided between the first conductive structure and the second conductive structure, located on one side of the photoresponsive structure, which, by the action of voltage control, enters a write state, a global erase state, and a partial erase state by the action of voltage control and the conductive state of the photoresponsive structure, wherein the liquid crystal display layer has a thickness of 10 nm to 100 μm, or A dimmable screen characterized by comprising an ink display layer provided between the first conductive structure and the second conductive structure, located inside the photoresponsive structure, and which enables writing, global erasing, and partial erasing states through the interaction of voltage control and the conductivity state of the photoresponsive structure, wherein the ink display layer has a thickness of 10 nm to 100 μm.

2. A method for manufacturing a dimmable screen according to claim 1, Manufacturing a first conductive structure includes the step of forming a first conductive layer on the surface of a first base layer to form a first conductive structure. Manufacturing a second conductive structure includes the step of forming a second conductive layer on the surface of a second base layer to form a second conductive structure. The fabrication of a photoresponsive structure includes the step of forming a first photoresponsive layer on the surface of a first conductive layer, A method for manufacturing a dimmable screen, characterized by comprising the step of assembling a first base layer, a first conductive layer, a first photoresponse layer, a liquid crystal display layer, a second conductive layer, and a second base layer to form a dimmable screen.

3. A method for manufacturing a dimmable screen according to claim 1, Manufacturing a first conductive structure includes the step of forming a first conductive layer on the surface of a first base layer to form a first conductive structure. Manufacturing a second conductive structure includes the step of forming a second conductive layer on the surface of a second base layer to form a second conductive structure. The fabrication of a photoresponsive structure includes the steps of forming a first photoresponsive layer on the surface of a first conductive layer and forming a second photoresponsive layer on the surface of a second conductive layer. A method for manufacturing a dimmable screen, characterized in that the manufacturing of a dimmable screen includes the step of assembling a first base layer, a first conductive layer, a first photoresponse layer, a liquid crystal display layer, a second photoresponse layer, a second conductive layer, and a second base layer to form a dimmable screen.

4. A method for manufacturing a dimmable screen according to claim 1, Manufacturing a first conductive structure includes the step of forming a first conductive layer on the surface of a first base layer to form a first conductive structure. Manufacturing a second conductive structure includes the step of forming a second conductive layer on the surface of a second base layer to form a second conductive structure. The fabrication of a photoresponsive structure includes the steps of forming a first photoresponsive layer on the surface of a first conductive layer and forming a second photoresponsive layer on the surface of a second conductive layer. A method for manufacturing a dimmable screen, characterized by comprising the step of assembling a first base layer, a first conductive layer, a first photoresponse layer, an ink display layer, a second photoresponse layer, a second conductive layer, and a second base layer to form a dimmable screen.

5. It is a dimming system, A dimmable screen according to claim 1, or A dimming system characterized by including a dimming screen manufactured by the manufacturing method described in any one of claims 2 to 4.

6. The dimming system described in claim 5 further includes: A dimming system characterized by including a control device connected to the dimming screen described above, which adjusts the voltage applied to the dimming screen described above.

7. The dimming system described in claim 5 further includes: A dimming system characterized by emitting light onto the dimming screen in order to change the state of the photoresponse structure of the dimming screen, wherein the light includes a dimming device having a wavelength of 200 nm to 2000 nm.

8. A method for adjusting light using a dimmable screen described in claim 1, or a dimmable screen manufactured by a manufacturing method described in any one of claims 2 to 4, A voltage adjustment command is obtained that includes a first voltage adjustment command that commands the application of a continuous low voltage or low voltage pulse to the first / second conductive structure, a second voltage adjustment command that commands the application of a high voltage pulse to the first / second conductive structure, and a third voltage adjustment command that commands the application of a reverse voltage to the first / second conductive structure. In accordance with the above voltage adjustment command, the voltage applied to the first / second conductive structure is adjusted so that the bistable display structure enters a local erase mode. When the above bistable display structure is in local erasure mode, it is determined whether or not the above photoresponsive structure has been exposed to light. When the above photoresponsive structure is irradiated with light, the above photoresponsive structure becomes conductive in such a way that the bistable display structure that has been irradiated with light is put into a locally erased state. When the above-mentioned photoresponsive structure is not irradiated with light, the above-mentioned photoresponsive structure includes becoming non-conductive so as not to cause the above-mentioned bistable display structure to enter a locally erased state. By adjusting the voltage applied to the first / second conductive structure based on the aforementioned voltage adjustment command, the bistable display structure is put into local erase mode. After adjusting the voltage applied to the first / second conductive structure based on the first voltage adjustment command, the bistable display structure is put into local erase mode. After adjusting the voltage applied to the first / second conductive structure based on the second voltage adjustment command, the bistable display structure is put into global erase mode, and A dimming method characterized by adjusting the voltage applied to the first / second conductive structure based on the third voltage adjustment command, and then putting the bistable display structure into local erase mode.

9. The dimming method described in claim 8 further includes: When the above photoresponsive structure is irradiated with light, it detects the range of light irradiation, Based on the above light irradiation range, the above photoresponse structure is divided into a conductive region and a non-conductive region. A dimming method characterized by dividing the above-mentioned bistable display structure into an erasable region and an erasable region based on the above-mentioned conductive region and the above-mentioned non-conductive region.

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