Pulse power supply and electric field processing device

Abstract

In order to provide a pulse power supply having high reliability and capable of bringing an output pulse waveform close to a target waveform, the present invention comprises: i-th units from i=1 to n, including an i-th capacitor (c_i), an i-th reactor (r_i) having one end connected to a ground-side terminal of the i-th capacitor, an i-th diode (d_i) having a p-side connected to a charging-side side terminal of the i-th capacitor, and an i-th switching element (sw_i) connected between the ground-side terminal of the i-th capacitor and an n-side of the i-th diode, the i-th switching element switching between an on-state and an off-state on the basis of a control signal; a direct-current power supply (10) connected to the other end of an n-th reactor and charging the i-th capacitor from i=1 to n; and a control device (2) that outputs a control signal to each of the i-th switching elements from i=1 to n on the basis of a command signal and operation information.

Description

Pulse power supply and electric field processing device

[0001] This disclosure relates to a pulsed power supply and an electric field processing apparatus using the pulsed power supply.

[0002] Pulse power supplies that output high-voltage pulses by connecting multiple stages of units in series, each having a capacitor that stores electric charge and a switching element that outputs the charge from the capacitor, have been developed in recent years for a variety of applications, such as ozonizers, exhaust gas treatment devices, medical equipment, and sterilization treatment devices. Various methods for driving pulse power supplies have been proposed to make the output pulse waveform closer to a target pulse waveform.

[0003] The high-voltage pulse generator described in Patent Document 1 includes a series-connected body in which N stages of unit units, each of which is made up of a capacitor, a first self-arc-extinguishing semiconductor element, a second self-arc-extinguishing semiconductor element, and two diodes, are connected in series so that power is supplied to a load from the positive input of the first-stage unit unit and the negative output of the Nth-stage unit unit, and a third self-arc-extinguishing semiconductor element connected between the input terminals of the first-stage unit units.

[0004] Furthermore, the high-voltage pulse generator of Patent Document 1 includes an initial charging power supply connected to both ends of the capacitor of the first-stage unit, initial charging control means for controlling initial charging by turning on the initial charging power supply and the second self-arc-extinguishing semiconductor element, and discharge control means for turning on the first self-arc-extinguishing semiconductor element and the third self-arc-extinguishing semiconductor element to supply a pulse voltage to a load. The discharge control means independently turns on and off the first self-arc-extinguishing semiconductor element of each stage.

[0005] In the high-voltage pulse generator described in Patent Document 1, each of N individual units has two switching elements (first self-arc-extinguishing semiconductor elements and second self-arc-extinguishing semiconductor elements). As the number of switching elements increases, there is a possibility that electromagnetic noise may increase and malfunctions may occur due to the increase in electromagnetic noise, making it difficult to improve reliability.

[0006] Japanese Patent Application Laid-Open No. 2008-11595

[0007] As described above, there has been a problem in that it is not possible to provide a pulse power supply that is highly reliable and that can make the output pulse waveform approach a target waveform.

[0008] The pulse power supply according to this disclosure includes i-th units (n is an integer of 2 or more) from i=1 to n-1, each unit having an i-th capacitor, an i-th reactor connected between the ground terminal of the i-th capacitor and the ground terminal of the (i+1)-th capacitor, an i-th diode having a p-side connected to the charging terminal of the i-th capacitor and an n-side connected to the charging terminal of the (i+1)-th capacitor, and an i-th switching element connected between the ground terminal of the i-th capacitor and the n-side of the i-th diode and switching between an on state and an off state based on a control signal; an n-th unit having an n-th reactor connected to the n-th terminal of the n-th capacitor, an n-th diode having one end connected to the p-side of the charging terminal of the n-th capacitor, and an n-th switching element connected between the grounding terminal of the n-th capacitor and the n-side of the n-th diode and switching between an on state and an off state based on a control signal; a DC power supply connected to the other end of the n-th reactor and charging the ith capacitors (i=1 to n); and a control device that outputs a control signal to each of the ith switching elements (i=1 to n) instructing them to switch between an on state and an off state based on a command signal and operation information.

[0009] The electric field treatment device according to this disclosure includes i-th units (n is an integer of 2 or more) from i=1 to n-1, each unit having an i-th capacitor, an i-th reactor connected between the ground terminal of the i-th capacitor and the ground terminal of the (i+1)-th capacitor, an i-th diode having a p-side connected to the charging terminal of the i-th capacitor and an n-side connected to the charging terminal of the (i+1)-th capacitor, and an i-th switching element connected between the ground terminal of the i-th capacitor and the n-side of the i-th diode and switching between an on state and an off state based on a control signal; an n-th unit having an n-th capacitor, an n-th reactor having one end connected to the ground terminal of the n-th capacitor, an n-th diode having one end connected to the p-side of the charging terminal of the n-th capacitor, and a ground terminal of the n-th capacitor. the nth unit having an nth switching element connected between the n-side of the nth diode and the n-th unit, which switches between an on state and an off state based on a control signal; a DC power supply connected to the other end of the n-th reactor and which charges the ith capacitors (i=1 to n); a pulse power supply having a control device which outputs a control signal to each of the ith switching elements (i=1 to n) instructing them to switch between an on state and an off state based on a command signal and operation information; a processing section in which a voltage is applied by the pulse power supply to an electrode pair consisting of a high-voltage electrode and a low-voltage electrode, and which performs electric field processing on an object to be processed which passes through a processing chamber between the electrode pair; an upstream transport section which transports the object to be processed to the processing chamber; and a downstream transport section which transports the object to be processed from the processing chamber.

[0010] According to the present disclosure, it is possible to provide a pulsed power supply that is highly reliable and capable of making the output pulse waveform closer to a target waveform.

[0011] 1 is a diagram showing an example of an electric field processing apparatus according to embodiment 1. FIG. 2 is a cross-sectional view showing an example of a processing unit according to embodiment 1. FIG. 3 is a cross-sectional view showing an example of a processing unit according to embodiment 1. FIG. 4 is a diagram showing an example of a circuit configuration of a power supply unit according to embodiment 1, showing the circuit configuration of a first unit. FIG. 5 is a diagram showing an example of a circuit configuration of a power supply unit according to embodiment 1, showing the circuit configuration of an i-th unit. FIG. 6 is a diagram showing an example of a circuit configuration of a power supply unit according to embodiment 1, showing the circuit configuration of an n-th unit. FIG. 7 is a block diagram showing an example of the configuration of a control device according to embodiment 1. FIG. 8 is a block diagram showing an example of the configuration of a control signal determination unit according to embodiment 1. FIG. 9 is a diagram showing an example of a control signal according to embodiment 1. FIG. 10 is a diagram showing an example of an output voltage waveform of a pulsed power supply according to embodiment 1. FIG. 11 is a diagram illustrating an example of a state of a unit unit according to embodiment 1. FIG. 12 is a diagram illustrating an example of a state of a unit unit according to embodiment 1. FIG. 13 is a diagram showing an example of a waveform of a control signal according to embodiment 1. FIG. 14 is a diagram showing an example of an output voltage waveform of a pulsed power supply according to embodiment 1. FIG. 15 is a flow chart showing an example of processing by a control device according to embodiment 1. FIG. 16 is a diagram showing four operating states of a pulsed power supply according to embodiment 1. FIG. 17 is a flow chart showing the operation of a pulsed power supply according to embodiment 1. FIG. 18 is a diagram showing the relationship between an average current value and the operation of a pulsed power supply according to embodiment 1. FIG. 1 is a diagram showing an example of a configuration when the processing circuit included in the electric field processing apparatus according to embodiment 1 is configured by a processor and a memory. FIG. 2 is a diagram showing an example of a configuration when the processing circuit included in the electric field processing apparatus according to embodiment 1 is configured by dedicated hardware. FIG. 3 is a diagram showing an example of an electric field processing apparatus according to embodiment 2. FIG. 4 is a diagram showing an example of a circuit configuration of a power supply unit according to embodiment 2, and is a diagram showing the circuit configuration of an nth unit. FIG. 5 is a block diagram showing an example of a configuration of a control device according to embodiment 2. FIG. 6 is a diagram showing an example of an electric field processing apparatus according to embodiment 3. FIG. 7 is a block diagram showing an example of a configuration of a control device according to embodiment 3. FIG. 8 is a block diagram showing an example of a configuration of a control signal determination unit according to embodiment 3. FIG. 9 is an example of an electric field processing apparatus according to embodiment 3. FIG. 10 is a block diagram showing an example of a configuration of a control device according to embodiment 3.FIG. 11 is a block diagram showing an example of the configuration of a control signal determination unit according to a third embodiment.

[0012] Hereinafter, embodiments will be described in detail with reference to the drawings. Note that the embodiments described below are merely examples, and the scope of the present disclosure is not limited to the embodiments described below. Furthermore, the embodiments described below can be implemented in appropriate combinations.

[0013] 1 is a diagram showing an example of an electric field treatment apparatus 100 according to the present embodiment. The electric field treatment apparatus 100 includes a pulsed power supply 20, a treatment section 3 that receives a supply of pulsed power from the pulsed power supply 20 and performs electric field treatment on an object to be treated, an upstream transport section 4 that transports the object to be treated from outside the electric field treatment apparatus 100 toward the treatment section 3, and a downstream transport section 5 that transports the object to be treated from the treatment section 3 to outside the electric field treatment apparatus 100.

[0014] The upstream conveying section 4 and the downstream conveying section 5 are in communication with the processing section 3. More specifically, the processing chamber pr of the processing section 3 is in communication with the upstream conveying section 4 and the downstream conveying section 5. The object to be processed is transported in this order from the upstream conveying section 4 to the processing section 3, and from the processing section 3 to the downstream conveying section 5. Examples of the object to be processed include liquids such as fruit juice and milk, vegetables soaked in water, and fruits soaked in water.

[0015] The effects of the electric field treatment include sterilization of the treatment object, activation of microorganisms contained within the treatment object, softening of vegetables, fruits, etc. Examples of parameters of the voltage pulse output from the pulse power supply 20 to the treatment unit 3 are as follows. For example, the peak pulse voltage may be between 1 kilovolt (kV) and 100 kV, the pulse width may be between 0.5 microseconds (μs) and 100 μs, and the repetition frequency may be between 10 hertz (Hz) and 5 kilohertz (kHz).

[0016] 2A and 2B are cross-sectional views showing an example of a processing unit 3 according to the present embodiment. FIG. 2A is a cross-sectional view of the processing unit 3 as viewed from a direction parallel to the z-axis, and the cross-section shown in FIG. 2A is parallel to the xy plane. FIG. 2B is a cross-sectional view of the processing unit 3 taken along the XX' plane shown in FIG. 2A as viewed from a direction parallel to the y-axis, and the XX' plane is parallel to the xz plane. Coordinate axes including the x-axis, y-axis, and z-axis are shown at the bottom of FIGS. 2A and 2B.

[0017] The processing unit 3 includes an electrode 31 having a high-voltage electrode 31_1 and a low-voltage electrode 31_2, and an insulating material 32. The high-voltage electrode 31_1 and the low-voltage electrode 31_2 receive power from the pulse power supply 20 and apply an electric field E1 inside the processing chamber pr. The processing unit 3 further includes a load measurement device 33 that measures a state quantity of the processing unit 3 and outputs the result as a load measurement result. The high-voltage electrode 31_1 and the low-voltage electrode 31_2 are electrically connected to the pulse power supply 20.

[0018] The processing chamber pr in FIG. 2 is the space inside the processing unit 3, and is the space sandwiched between the high-voltage electrode 31_1 and the low-voltage electrode 31_2. In this embodiment, the low-voltage electrode 31_2 is at ground potential, but this is not necessarily the case. The electrode 31 may be manufactured using, for example, titanium, platinum, stainless steel, or the like. This can suppress wear caused by the pulse voltage.

[0019] 2, the high-voltage electrode 31_1 and the low-voltage electrode 31_2 have the shape of two flat plates parallel to the yz plane. The electrodes are disposed opposite each other across the processing chamber pr. The processing chamber pr has a rectangular parallelepiped shape. The object to be processed passes through the processing chamber pr parallel to the y-axis direction, as indicated by flow directions f1 and f2.

[0020] The high-voltage electrode 31_1 and the low-voltage electrode 31_2 generate an electric field E1 between the two electrodes, which is parallel to the x-axis, which is generally perpendicular to the flow direction of the processing object. The electric field E1 is generated by a voltage applied by the pulsed power supply 20, and the processing object is subjected to electric field processing by the electric field E1 as it passes through the processing chamber pr.

[0021] When applying an electric field E1 to a liquid object to be treated, or when a solid object to be treated is suspended in a liquid and the electric field E1 is applied to the liquid, a device for generating a flow may be provided somewhere in the flow path to transport the object to be treated. Examples of devices for generating a flow include a pump and a screw. Furthermore, when the object to be treated is solid, a transport device such as a belt conveyor may be incorporated inside the treatment chamber pr to transport the object to be treated. In this case, it is desirable that the belt or the like be made of a material that does not affect the electric field E1.

[0022] 2, insulating materials 32 made of an insulating material are arranged between the upstream transport section 4 and the downstream transport section 5 and the high-voltage electrode 31_1, and between the upstream transport section 4 and the downstream transport section 5 and the low-voltage electrode 31_2. By providing the insulating materials 32, the transport sections can be made of an electrically conductive material such as a metal material. The upstream transport section 4 and the downstream transport section 5 are collectively referred to as the transport sections.

[0023] Furthermore, electrical noise generated when a pulse voltage is applied to both electrodes may be reduced by providing an insulating material 32 between the electrodes and the transport section. Examples of materials for the insulating material 32 include fluorine-containing resin materials and ceramics. Using these materials as the insulating material 32 can improve the heat resistance and voltage resistance of the insulating material 32. The high-voltage electrode 31_1 and the low-voltage electrode 31_2 are referred to as both electrodes.

[0024] 2, the insulating material 32 is provided between both electrodes and the transport section, but the high-voltage electrode 31_1, the upstream transport section 4, and the downstream transport section 5 may be integrally formed from the same material. By adopting such a structure, the processing section 3 may have a simple structure and may be made smaller.

[0025] In the structure of the processing section 3, a flat high-voltage electrode 31_1 and a flat low-voltage electrode 31_2 are arranged facing each other. This makes the direction and magnitude (strength of the electric field E1) of the electric field E1 spatially uniform over a wide range inside the processing chamber pr. This makes it possible to perform uniform electric field processing on the processing object.

[0026] The above-described homogenization will be exemplified in more detail. For example, the magnitude and direction of the electric field E1 do not change significantly over a wide range within the XX' plane of the processing chamber pr shown in FIG. 2B. This reduces the difference in the effect of the electric field processing that occurs depending on the position within the xz plane of the processing chamber pr through which the processing object passes. Furthermore, because the electric field E1 is also uniform in the y-axis direction, the variation in the effect of the processing that depends on the timing at which the processing object passes through the processing chamber pr can also be reduced.

[0027] The load measuring device 33 measures the state of the processing device 3 as a load measurement result. Examples of objects to be measured by the load measuring device 33 include the amount of the processing object passing through the processing device 3, the upstream transport unit 4, the downstream transport unit 5, etc. per unit time, or the amount of the liquid in which the processing object is immersed, the voltage between the high-voltage electrode 31_1 and the low-voltage electrode 31_2, the current flowing between the high-voltage electrode 31_1 and the low-voltage electrode 31_2, the temperature around the processing device 3, the humidity around the processing device 3, the temperature of the processing object, the temperature of the liquid in which the processing object is immersed, the temperature of the high-voltage electrode 31_1, the temperature of the low-voltage electrode 31_2, the temperature of the insulating material 32, the temperature of the upstream transport unit 4, and the temperature of the downstream transport unit 5.

[0028] Various sensors can be used as the load measuring device 33. Current and voltage may be measured by an ammeter, a voltmeter, etc. Flow rate may be measured by, for example, a flow meter. Temperature may be measured by a thermistor, a non-contact thermometer, etc.

[0029] Furthermore, the load measuring device 33 may acquire as the load measurement result a processing unit control signal that controls the processing unit 3. Examples of control targets controlled by this processing unit control signal include the amount of processing objects passing through the processing unit 3, the upstream transport unit 4, the downstream transport unit 5, etc. per unit time, the amount of liquid in which the processing objects are immersed, the temperature of the processing objects, the temperature of the liquid in which the processing objects are immersed, the components of the processing objects, the components of the liquid in which the processing objects are immersed, etc.

[0030] Here, when the amount of the object to be treated or the like is controlled by the processing unit control signal, it may be possible to control a valve provided in the flow path, the output of a device that generates a flow in the flow path, etc. Furthermore, when the temperature of the object to be treated is controlled by the processing unit control signal, it may be possible to control the temperature of the object to be treated, the liquid in which the object to be treated is immersed, etc.

[0031] The temperatures of the high-voltage electrode 31_1 and the low-voltage electrode 31_2 arranged near the processing chamber pr may also be controlled by the processing unit control signal. Depending on the object to be temperature controlled, a heating device, a cooling device, or the like may be provided for the object. The processing unit 3 may obtain the processing unit control signal from outside the electric field processing apparatus 100 or from inside the electric field processing apparatus 100.

[0032] 1, the load device to which the pulsed power supply 20 applies a voltage is the processing unit 3, but is not limited to this. The pulsed power supply 20 can be applied to any load device that uses a high-voltage pulse. Examples of the load device include an ozonizer, a gas laser device, and a sterilizer.

[0033] 3A and 3B are cross-sectional views showing an example of the processing unit 3a according to this embodiment. Coordinate axes are displayed at the bottom of each of FIGS. 3A and 3B. FIG. 3A is a cross-sectional view taken along the z-axis, which is parallel to the xy plane. FIG. 3B is a cross-sectional view taken along the YY' plane of FIG. 3A, which is parallel to the y-axis, which is parallel to the xz plane.

[0034] Processing section 3a is arranged in place of processing section 3 in Fig. 1. In other words, processing section 3a is a variation of processing section 3. Unless otherwise specified, the connection between processing section 3a and the outside of processing section 3a and the role that processing section 3a plays in electric field processing apparatus 100 are the same as the connection between processing section 3 and the outside of processing section 3a and the role that processing section 3 plays in electric field processing apparatus 100.

[0035] Processing section 3a has a substantially plane-symmetric structure with respect to the YY' cross section. High-voltage electrode 31a_1, insulating material 32a, low-voltage electrode 31a_2, and insulating material 32b are arranged in this order from the YY' cross section toward the end of processing section 3a in a direction parallel to the y-axis. High-voltage electrode 31a_1, insulating material 32a, low-voltage electrode 31a_2, and insulating material 32b all have a hollow cylindrical shape (or a cylindrical shape) with substantially the same inner and outer diameters.

[0036] The high-voltage electrode 31a_1, the insulator 32a, the low-voltage electrode 31a_2, and the insulator 32b share a common central axis ZZ'. Since the components constituting the outer wall of the processing chamber pr_a have the above-described shapes, the inner wall of the processing chamber pr_a has a cylindrical shape. The upstream transport unit 4a and the downstream transport unit 5a are connected to the processing chamber pr_a, and the processing object is transported in flow directions f3 and f4, i.e., in the y-axis direction.

[0037] By making the inner wall of the processing chamber pr_a cylindrical, the processing object can be flowed from the upstream transfer section 4a to the downstream transfer section 5a with low pressure loss. Furthermore, the flow of the processing object and the like can be made uniform inside the processing chamber pr_a. That is, a configuration can be achieved in which the flow of the processing object and the like does not change significantly depending on the position in the xz plane inside the processing chamber pr_a. This allows the effect of the electric field processing to be configured so that it does not significantly depend on the position in the xz plane inside the processing chamber pr_a through which the processing object passes.

[0038] 3, voltages are applied between the high-voltage electrode 31a_1 and the two low-voltage electrodes 31a_2 in two directions symmetrically with respect to the YY' cross section. As a result, the current path flowing from the high-voltage electrode 31a_1 to the low-voltage electrode 31a_2 is split into two. By splitting the current path, an electric field E2 is generated over a wider range, and processing unevenness inside the processing chamber pr_a is reduced.

[0039] Here, "processing unevenness" refers to the magnitude of the difference in the effect of the electric field processing of the processing object that occurs depending on the position where the processing object passes within the xz plane inside the processing chamber pr_a. Furthermore, according to the configuration of the processing unit 3a, the provision of the insulating material 32b reduces electrical noise. It is also possible to eliminate the insulating material 32b from the structure shown in FIG. 3 and integrally mold the low-voltage electrode 31a_2 to the upstream transport unit 4a and the low-voltage electrode 31a_2 to the downstream transport unit 5a, thereby miniaturizing or simplifying the entire device.

[0040] Furthermore, the structure of the processing section 3a generates an electric field E2 having electric field vectors and electric field lines that are approximately parallel to the flow direction of the processing object. The electric field lines that are approximately parallel to the flow direction of the processing object reduce the current per unit area of ​​the electrode 31a. This allows the current value of the power supply to be reduced relative to the processing volume per unit time. This in turn reduces the load on the power supply, extending the life of components such as the electrode 31a and switching elements.

[0041] The pulse power supply 20 includes a power supply unit 1 and a control device 2 that controls the power supply unit 1. FIG. 4 is a diagram showing an example of the circuit configuration of the power supply unit 1 according to this embodiment, specifically the circuit configuration of the first unit u_1. In FIG. 4, omitted portions are indicated by wavy lines. Below is an example where omitted portions are indicated by wavy lines in FIG. 4. The circuit on the opposite side of the first reactor r_1 with respect to the second reactor r_2 is omitted.

[0042] FIG. 5 is a diagram showing an example of the circuit configuration of the power supply unit 1 according to this embodiment, and is a diagram showing the circuit configuration of the ith unit u_i (i is an integer from 2 to n-1). As in FIG. 4, omitted parts are indicated by wavy lines. FIG. 6 is a diagram showing an example of the circuit configuration of the power supply unit 1 according to this embodiment, and is a diagram showing the circuit configuration of the nth unit u_n. As in FIG. 4, omitted parts are indicated by wavy lines.

[0043] The power supply unit 1 includes i-th units u_i, where i=1 to n-1, where n is an integer equal to or greater than 2. The i-th unit u_i includes an i-th capacitor c_i, an i-th reactor r_i, an i-th diode d_i, and an i-th switching element sw_i. The i-th reactor r_i is connected between the ground terminal of the i-th capacitor c_i and the ground terminal of the (i+1)-th capacitor c_i+1.

[0044] The i-th diode d_i has its p-side connected to the charging terminal of the i-th capacitor c_i and its n-side connected to the charging terminal of the (i+1)th capacitor c_i+1. The i-th switching element sw_i is connected between the ground terminal of the i-th capacitor c_i and the n-side of the i-th diode d_i. The i-th switching element sw_i switches between an on state and an off state based on a control signal.

[0045] The power supply unit 1 includes an nth unit u_n. The nth unit u_n includes an nth capacitor c_n, an nth reactor r_n, an nth diode d_n, and an nth switching element sw_n. One end of the nth reactor r_n is connected to the ground terminal of the nth capacitor c_n. One end of the nth diode d_n is connected to the p-side of the charging terminal of the nth capacitor c_n. The nth switching element sw_n is connected between the ground terminal of the nth capacitor c_n and the n-side of the nth diode d_n.

[0046] The power supply unit 1 further includes a DC power supply 10. The DC power supply 10 is connected to the other end of the nth reactor r_n (the end not connected to the ground terminal of the nth capacitor c_n). The DC power supply 10 charges the ith capacitors c_i, where i=1 to n. The DC power supply 10 charges the first capacitor c_1 to the nth capacitor c_n all at once.

[0047] The pulsed power supply 20 also includes a control device 2. The control device 2 outputs a control signal to each of the first switching element sw_1 to the n-th switching element sw_n. The control signal may be, for example, a main pulse that is a pulse waveform or a signal that instructs the output of a pulse waveform, and a sub-pulse that temporally overlaps at least a portion of the main pulse.

[0048] In this embodiment, all of the capacitors, from the first capacitor c_1 to the n-th capacitor c_n, are charged at the same time. Then, the waveform is controlled by controlling the opening and closing of the switching elements, so that the output pulse waveform of the pulsed power supply 20 approaches the target waveform. However, all of the capacitors do not have to be charged at the same time. For example, the charging timing can be changed.

[0049] 4 to 6, the charging terminal of the first capacitor c_1 of the first unit u_1 is electrically connected to the processing unit 3, and power is supplied from the pulse power supply 20 to the processing unit 3 via this connection. The connection between the first unit u_1 and the processing unit 3 may be made using, for example, a high-voltage cable.

[0050] 4 to 6, the n-side of the n-th diode d_n of the n-th unit u_n is grounded. By providing the ith diode d_i (i = 1 to n), it is possible to maintain a state in which the charging terminal of the ith capacitor c_i has a higher voltage (positive voltage) than the grounding terminal of the ith capacitor c_i.

[0051] The power supply unit 1 includes a power supply measurement device 11 and an environment measurement device 12. The power supply measurement device 11 measures state quantities of the pulsed power supply 20 and outputs the results as power supply measurement results. Examples of the state quantities of the pulsed power supply 20 include the output voltage or output current of the pulsed power supply 20, the waveform of the output voltage or output current of the pulsed power supply 20, the output voltage or output current of a unitary unit, and the waveform of the output voltage or output current of a unitary unit. Here, a unitary unit is any one of the first unit u_1 to the n-th unit u_n.

[0052] Instead of providing a measuring device for measuring the output current, output voltage, etc. of the pulsed power supply 20 as the power supply measuring device 11, a measuring device for measuring the current flowing across both ends of each of the i-th capacitors c_i (i = 1 to n) and the voltage across both ends may be provided. By providing such a measuring device, the measuring device can be made smaller, and ultimately the pulsed power supply 20 can be made smaller.

[0053] The environment measuring device 12 measures the state quantities of the environment surrounding the pulsed power supply 20 or the processing unit 3 and outputs the results as environmental measurement results. Examples of the state quantities of the environment include temperature, humidity, wind, and parameters of an air conditioner that performs air conditioning in the room where the device is located. The power supply measuring device 11 and the environment measuring device 12 may be omitted from the electric field processing device 100 if the values ​​measured by them are not used for control.

[0054] 7 is a block diagram showing an example of the configuration of the control device 2 according to this embodiment. The control device 2 includes a command signal acquisition unit 21 that acquires a command signal from outside the control device 2, a constraint condition acquisition unit 22 that acquires constraint conditions, a control signal determination unit 23 that determines a control signal, and a storage unit 24.

[0055] The command signal acquiring unit 21 acquires a command signal from outside the control device 2. Examples of the command signal include a command related to the output of the pulsed power supply 20 and a command related to the processing of the processing unit 3. The command signal acquiring unit 21 may acquire the command signal before the start of operation based on the command signal, or may acquire the command signal after the start of operation based on the command signal. When receiving a command signal related to the processing of the processing unit 3, the control device 2 may convert the command signal into a command signal related to the output of the pulsed power supply 20 and use it.

[0056] The command signal may also be temporarily stored in the memory unit 24, and the control signal determination unit 23 may acquire and use the stored command signal from the memory unit 24. Alternatively, the command signal may not be stored in the memory unit 24, but may be directly acquired and used by the control signal determination unit 23. The command signal may be a specific command indicating a target value for operation during a given operation time. For example, the command signal may be a time-series output voltage value of the pulse power supply 20 that changes from moment to moment. The memory unit 24 may also be omitted from the control device 2.

[0057] The constraint condition acquisition unit 22 acquires constraint conditions of the pulsed power supply 20, the processing unit 3, etc. The constraint conditions may be constraint conditions imposed on the control signal determination unit 23 when the control signal determination unit 23 determines a control signal based on a command signal. Examples of the constraint conditions include the number of switching elements, the number of capacitors, the number of units, characteristics or specifications of the capacitors, characteristics or specifications of the switching elements, specifications of the electrodes 31, and specifications of the processing chamber pr.

[0058] The command signal acquisition unit 21 and the constraint condition acquisition unit 22 may have an input unit that receives input from outside. For example, the command signal acquisition unit 21 and the constraint condition acquisition unit 22 may have a user interface including a display unit and an input unit, and may display options, menus, etc. on the display unit so that an operator or the like can select and input a command signal, constraint condition, etc.

[0059] In this configuration, it is possible to provide the user with information and options regarding the operation of the pulsed power supply 20, the processing unit 3, etc., and to provide the pulsed power supply 20 and the electric field processing apparatus 100 that can be easily operated even by a user with little experience or skill. The control signal determination unit 23 shown in Fig. 7 determines a control signal based on the command signal and the operation information.

[0060] The operating information includes constraint conditions, load measurement results, power supply measurement results, and environmental measurement results. Note that the control signal determiner 23 does not need to use the operating information when determining the control signal. Therefore, the constraint condition acquirer 22, the load measuring device 33, the power supply measuring device 11, and the environmental measuring device 12 can be omitted from the control device 2.

[0061] Fig. 8 is a block diagram showing an example of the configuration of the control signal determiner 23 according to this embodiment. The control signal determiner 23 shown in Fig. 8 includes a control signal model. The control signal model associates three items: a command signal, operation information, and a control signal. The configuration and operation of the control signal determiner 23 are illustrated below.

[0062] The control signal determiner 23 in Fig. 8 externally acquires a command signal and operational information. The control signal model determines a control signal corresponding to the command signal and operational information. The control signal model may be, for example, a mathematical table, a function, a neural network, or the like, as long as it can determine a control signal for the input command signal and operational information.

[0063] The control signal determiner 23 may convert an externally acquired command signal, operation information, etc. into a form suitable for input to the control signal model, and then input the converted signal to the control signal model. The control signal determiner 23 may also convert a value output from the control signal model into a form suitable for output, and then output the converted value as a control signal.

[0064] Fig. 9 is a diagram showing an example of a control signal according to this embodiment. Fig. 10 is a diagram showing an example of an output voltage waveform of the pulsed power supply 20 according to this embodiment. In this operation example, it is assumed that the output voltage pulse waveform of the pulsed power supply 20 shown in Fig. 10 is given as a command signal. The constraint conditions acquired by the constraint condition acquisition unit 22 are that the number of units is 10 and the voltage peak output per unit is 1 kV.

[0065] The control device 2 determines a control signal based on these constraints. The control device 2 outputs a control signal to the DC power supply 10, instructing the DC power supply 10 to charge all of the first capacitor c_1 to the tenth capacitor c_10 at once. Next, the control device 2 outputs a control signal to operate the five switching elements sw_1 to sw_5 with the waveform of the main pulse MP1 shown in FIG. 9( a).

[0066] Hereinafter, the control signal pulse output from the control device 2 to the switching element will be referred to as a main pulse or a main pulse signal. Furthermore, the voltage pulse, current pulse, etc. output from the unit in response to the above-mentioned main pulse of the control signal will also be referred to as a main pulse. Furthermore, the control signal pulse output from the control device 2 to the switching element will be referred to as a sub-pulse or a sub-pulse signal. Furthermore, the voltage pulse, current pulse, etc. output from the unit in response to the input of the above-mentioned sub-pulse of the control signal will also be referred to as a sub-pulse.

[0067] The waveform of the main pulse MP1 is a waveform that operates in an on state for a time period w1. Here, the on state refers to a state in which a switch is closed and the charge accumulated in the capacitor of the unit including the closed switch is output as a voltage pulse. In the above case, the output voltage pulses of the first unit u_1 to the fifth unit u_5 are superimposed and output as a voltage pulse from the pulsed power supply 20.

[0068] 9B to two of the sixth switching element sw_6 to the tenth switching element sw_10. The sub-pulse SP1 has a waveform that starts outputting after a delay of time w2-w1 from the start of output of the main pulse MP1, and remains on for a period w2.

[0069] When the control signal for only the main pulse MP1 shown in Fig. 9(a) is used, the pulsed power supply 20 outputs an output pulse waveform with a peak output of 5 kW and a pulse width w1 shown in Fig. 10(a). On the other hand, when the control signal for the main pulse MP1 shown in Fig. 9(a) and the control signal for the sub-pulse SP1 shown in Fig. 9(b) are output simultaneously, the pulse waveform shown in Fig. 10(b) is output. In Fig. 10(b), the voltage is improved during the time width w2 when the main pulse MP1 and the sub-pulse SP1 are output, compared to the time width w1-w2 when only the main pulse MP1 is output.

[0070] Here, the sub-pulse SP1 is at least partially overlapped in time with the main pulse MP1. The sub-pulse SP1 is output from a unit different from the unit that outputs the main pulse MP1. In the pulse waveform shown in Fig. 10(b), during the time period w2-w1 when only the main pulse MP1 is output, a voltage of 5 kV is output from the pulse power supply 20. Then, during the time period w2 when both the sub-pulse SP1 and the main pulse MP1 are output, a voltage of 7 kV is output from the pulse power supply 20.

[0071] In this way, the control device 2 outputs a control signal by combining the main pulse MP1 and the sub-pulse SP1 in response to the command signal, thereby realizing a complex waveform that cannot be realized with the main pulse MP1 alone. Another example of the operation of the pulsed power supply 20 will now be described. It is assumed that the constraint condition acquisition unit 22 has acquired a constraint condition that the sixth unit u_6 to the tenth unit u_10 are to be operated in such a way as to extend their lifespans.

[0072] Here, the state of the unit in which only the control signal of the main pulse MP1 in Fig. 9(a) is input and it operates is called the main pulse mode (hereinafter, MP mode). The state of the unit in which the control signal of the sub-pulse SP1 in Fig. 9(b) is input and it operates is called the sub-pulse mode (hereinafter, SP mode). And the state of the unit in which the control signal to output a pulse is not input is called the standby mode. The states of the unit are classified into the above three types of modes.

[0073] FIG. 11 is a diagram illustrating the states of the individual units according to this embodiment. FIGS. 11(a) to 11(e) each show the state of the ten individual units of the power supply unit 1. In FIGS. 11(a) to 11(e), the first unit u_1 to the fifth unit u_5 are in MP mode. Of the sixth unit u_6 to the tenth unit u_10, two are in SP mode and three are in standby mode. For example, in FIG. 11(a), the sixth unit u_6 and the seventh unit u_7 are in SP mode, and the eighth unit u_8 to the tenth unit u_10 are in standby mode.

[0074] The states of the pulsed power supply 20 shown in Figures 11(a) to 11(e) are referred to as states A to E. The states A to E are switched in sequence for each of the same number of pulses or each of the same operating time to complete a cycle. That is, the pulsed power supply 20 is operated so as to assume each of states A to E once during one cycle (hereinafter, one cycle is referred to as one cycle, and the above operation is referred to as cyclic operation). Note that the cyclic operation may be performed by operating states A to E the same number of times. The temporal order of states A to E may be changed in any way.

[0075] By repeating this cycle operation, the heat generation amounts from the sixth unit u_6 to the tenth unit u_10 become closer to being equal. As a result, the life spans of the multiple units can become closer to being equal. In other words, the variation in the rate of deterioration between the units can be reduced. An operating mode that makes the heat generation amounts from the sixth unit u_6 to the tenth unit u_10 become closer to being equal has been described with reference to FIG. 11 .

[0076] Furthermore, an example of operation in which the heat generation amounts of the individual units from the first unit u_1 to the tenth unit u_10 are made nearly equal is shown. FIG. 12 is a diagram showing the states of the individual units according to this embodiment. Each of FIG. 12(f) to FIG. 12(j) in FIG. 12 illustrates states F to J. For each of states A to E, a conversion is performed in which the mode of the pth unit u_p (p=1 to 10) is converted to the mode of the 11-pth unit u_11-p, resulting in states F to J.

[0077] For example, the first unit u_1 to the third unit u_3 in state F correspond sequentially to the tenth unit u_10 to the seventh unit u_7 in state A, and therefore are all in standby mode. Also, the fourth unit u_4 and the fifth unit u_5 in state F correspond to the seventh unit u_7 and the sixth unit u_6 in state A, and therefore both are in SP mode.

[0078] Furthermore, the sixth unit u_6 to the tenth unit u_10 in state F correspond sequentially to the fifth unit u_5 to the first unit u_1 in state A, so all are in MP mode. Then, states A to J are switched in sequence for cyclic operation at the same pulse count or the same operating time. This operation makes the heat generation amounts from the first unit u_1 to the tenth unit u_10 closer to equal. Note that it is sufficient to cycle from state A to state J once or multiple times, and the order of states A to J does not matter.

[0079] As described above, if the control device 2 determines the control signals and performs cyclic operation so that the heat generation amounts of the multiple units are approximately equal in one cycle, the heat generation among the multiple units is approximately equal. Furthermore, the control device 2 outputs control signals so that each of the multiple units goes through each of the standby mode, MP mode, and SP mode the same number of times in one cycle.

[0080] In the present disclosure, when referring to achieving uniformity in the amount of heat generated, it is not necessary for the amount of heat generated to be completely uniform between the individual units. For example, variations may occur even when the same pulse operation is performed, depending on the characteristics or specifications of the switching elements and the characteristics or specifications of the individual units. Therefore, it may be difficult to achieve completely uniform amounts of heat generated.

[0081] If the heat generation amount can be made equal even if only slightly among the individual units, it is effective in reducing the difference in life span between the individual units. For example, the individual units may be operated so that the integral value of the voltage or current during the on time is made equal among the individual units. Furthermore, it is also preferable to operate the individual units so that the difference in heat generation amount between the individual units is 10% or less, or 5% or less.

[0082] This operation allows for more uniform heat generation among the multiple units. The output operation may be configured with an MP mode and a standby mode, or may be configured with an MP mode and an SP mode. By combining the MP mode and the SP mode, a pulse waveform close to the desired pulse waveform can be achieved.

[0083] For example, the control signal determination unit 23 stores the relationship between the heat generation amount of each unit and the control signal as a control signal model. Then, as constraints, it is necessary to approximate equality in the heat generation amount among the specified multiple units, or it is necessary to approximate equality in the lifespan among the specified multiple units, etc. Then, the control signal determination unit 23 may determine control signals for the specified multiple units based on this control signal model.

[0084] When the relationship between the heat generation amount of each unit and the control signal is stored as a control signal model, the heat generation amount may be estimated for each unit. The control signal may be determined so that the estimated heat generation amount is the same. Furthermore, the power measurement device 11 may measure the thermal state of each unit as a power measurement result.

[0085] Here, the thermal state may be, for example, a quantity such as temperature, heat generation amount, or temperature rise value that serves as an index showing the heat generation amount or temperature of each unit, the relative relationship of the heat generation amount or temperature between units, etc. In other words, the thermal state may be a quantity that makes it possible to grasp the heat generation amount or temperature of each unit, the relative relationship of the heat generation amount or temperature between units, etc.

[0086] Furthermore, the control signal determination unit 23 holds, as a control signal model, correspondence relationships among the command signal, the thermal state of each unit, constraint conditions specifying the multiple units that require the amounts of heat generated to be made nearly equal, and the control signal.The control signal determination unit 23 may determine the control signal based on the power supply measurement results including the amount of heat generated by each unit, the constraint conditions specifying the multiple units that require the amounts of heat generated to be made nearly equal, and the command signal.

[0087] Although Fig. 11 illustrates a case where the charging of the capacitors is the same for all the units, it is also possible to configure the power supply unit 1 so that the charging rate of each capacitor is controlled in addition to the control of the switching elements described in Fig. 11. Note that in the configurations of the power supply unit 1 illustrated in Figs. 4 to 6, the charging rate of all the capacitors can be changed collectively, but the charging rate cannot be changed individually for each capacitor.

[0088] In this case, the control signal determiner 23 may determine the control signal using a control signal model including information relating the on-time of the switching element, the charging rate of the capacitor, and the amount of heat generated. Also, for example, the control signal determiner 23 may acquire the measurement result of the current of each unit as the power supply measurement result. Then, the control signal determiner 23 uses the control signal model including information relating the current and the amount of heat generated.

[0089] The control signal determination unit 23 described above can perform an operation to equalize the heat generation among a plurality of designated units based on the current measurement value. The control signal determination unit 23 described above can perform an operation to equalize the heat generation among a plurality of units whether the capacitor voltages are the same among the plurality of units or different from each other.

[0090] Furthermore, when energizing by high voltage discharge, when the output is pulsed rather than continuous, etc., the output waveform of the power is likely to deviate from the prediction based on the specifications of the power supply and the circuit consisting of the power supply and load. In such cases, if the output is based on the actual value measured immediately before with the same configuration of the power supply, load, and wiring, the output pulse waveform can be made closer to the desired pulse waveform.

[0091] For example, the electric field treatment apparatus 100 is operated while the control signals and the operating information are associated and stored. Then, the control signal determination unit 23 may generate a control signal model based on the stored control signals and operating information. For example, the control signals and the power supply measurement results for 100 pulses may be associated and stored. Then, based on this storage, a control signal model including the correspondence between the control signals and the power supply measurement results may be created.

[0092] Furthermore, the control signal and power supply measurement results may include a command signal, control signal, and operation information before and after the operation, output, etc. of the pulsed power supply 20 are temporarily stopped. By including the command signal, control signal, and operation information for the temporary stop time, information such as changes in the pulsed power supply 20 during the temporary stop time and the relationship between these changes and the state before the temporary stop can be reflected in the output of the control signal after the start of operation. This makes it possible to make the output of the pulsed power supply 20, the processing of the electric field treatment device 100, etc. after the start of operation follow the command signal with higher accuracy.

[0093] Examples of command signals, control signals, and operating information during the temporary suspension time include the length of the temporary suspension time, changes in the temperature of each unit, each switching element, etc., changes in the amount of charge stored in each capacitor, changes in the state of the processing unit 3, etc.

[0094] Furthermore, the current measurement value of each unit may be an average value of multiple pulses. Furthermore, the current measurement value of each unit may be a measurement value of a pulse immediately before the output of a control signal, or a measurement result of a pulse a predetermined time before the output of a control signal. By using the average value of multiple pulses, the effects of noise, malfunction, operational variations, etc. can be suppressed, and the operation of the pulsed power supply 20 can be stabilized.

[0095] In the operation examples shown in Figures 9 and 10, the case where the total amount of charge discharged from the units in one pulse is smaller than the total amount of charge stored in the capacitors of the units has been described. Figures 13 to 16 show examples of operation where the total amount of charge discharged in one pulse is larger than the total amount of charge stored in the charged capacitors.

[0096] FIG. 13 shows an example of the waveform of a control signal according to this embodiment. Portions of the description of FIG. 13 that overlap with FIG. 9 will be omitted. In the example of operation shown in FIG. 13, the total amount of charge discharged in one pulse is greater than the total amount of charge stored in the charged capacitor. FIG. 13(a) shows a main pulse MP3 with a pulse width w3. FIG. 13(b) shows a sub-pulse SP3 with a pulse width w4. The output of the sub-pulse SP3 begins a time period w3-w4 after the start of output of the main pulse MP3.

[0097] The constraint condition acquisition unit 22 also acquires a constraint condition that the output voltage be maintained in a range greater than 3 kV and less than 6 kV. The meaning of the constraint condition varies depending on the load device, but in this example, the condition that the output voltage is greater than 3 kV is a condition for the processing unit 3 to maintain the electric field processing at or above a reference value. In this example, the condition that the output voltage is less than 6 kV is a condition for ensuring that the life of the processing unit 3 is at or above a reference value.

[0098] An example of a case where such a constraint is imposed is when the output voltage of the pulsed power supply 20 is lower than 3 kV, the effect of the electric field treatment is weak and the object to be treated is insufficiently treated. On the other hand, when the output voltage is less than 6 kV, the electrodes 31 of the electric field treatment device 100 do not deteriorate beyond the standard. Examples of cases where such facts are known through demonstration tests or the like include:

[0099] The constraint condition acquisition unit 22 acquires constraint conditions that the number of units is 10 and the peak voltage output per unit is 1 kV. The power supply measurement device 11 measures the output voltage during pulse output from the pulse power supply 20. Fig. 14 is a diagram showing an example of the output voltage waveform of the pulse power supply 20 according to this embodiment.

[0100] 14(a) shows the output voltage waveform of the pulsed power supply 20 in which a voltage pulse is output by the main pulse MP from each of the five basic units when the capacitor charging voltage is 1 kV, and the outputs of the five basic units are superimposed. In FIG. 14(a), the output pulse voltage attenuates over time, and the voltage, which was 5 kV immediately after the start of the pulse output, drops to 1.8 kV after a time w3 has elapsed since the start of the pulse output.

[0101] The output pulse in Fig. 14(a) does not satisfy the constraints. Therefore, the control signal determination unit 23 monitors the measurement result of the output voltage of the pulsed power supply 20 as the power supply measurement result. Then, as shown in Fig. 14(b), immediately after detecting that the output voltage of the pulsed power supply 20 has fallen below 3.3 kV, the control signal determination unit 23 outputs a control signal to output a sub-pulse SP3 to the two basic units.

[0102] Here, the control signal determination unit 23 provides a margin of 1 kV relative to the upper limit of the constraint condition of 6 kV, setting the operation by the main pulse MP3 to a peak value of 5 kV. Also, a margin of 0.3 kV relative to the lower limit of the constraint condition of 3 kV is provided, and sub-pulses SP3 are output from the two main units immediately after detecting that the voltage has fallen below 3.3 kV.

[0103] Fig. 14(b) shows a voltage pulse waveform of an operation (hereinafter referred to as a boost operation) that combines the main pulse MP3 of Fig. 13(a) and the sub-pulse SP3 of Fig. 13(b). In other words, in addition to the main pulses MP3 from five basic units, sub-pulses SP3 from two basic units are applied.

[0104] Here, the sub-pulse SP3 from the two basic units is applied after a time period w4-w3 has elapsed since the start of output of the main pulse MP3. The two basic units to which the sub-pulse SP3 from the control device 2 is input are different basic units from the five basic units to which the main pulse MP3 from the control device 2 is input.

[0105] Just before the start of the sub-pulse SP3 output, the output voltage drops to 3.3 kV. Then, when the main pulse MP3 and sub-pulse SP3 stop, the output voltage drops to 3.6 kV. Both output voltages exceed the lower limit of 3 kV and satisfy the given constraints.

[0106] As shown in FIG. 14(b), the boost operation, which combines the MP mode unit and the SP mode unit, can mitigate the attenuation of the pulse voltage compared to the operation of only the main pulse MP3. Furthermore, the amplitude of the output voltage during pulse output can be reduced. This allows the output voltage to be maintained within a specified range when it is necessary to maintain the voltage within that range. The range may be between an upper limit and a lower limit.

[0107] Furthermore, because the control device 2 monitors actual measured values ​​such as the output voltage and outputs a control signal based on the actual measured values, it is possible to output a control signal with high accuracy. This makes it possible to reduce or prevent deviation from constraint conditions. As a result, it is possible to prevent breakdowns and degradation of processing performance of the pulsed power supply 20, the electric field processing device 100, etc.

[0108] FIG. 15 shows an example of the waveform of a control signal according to this embodiment. In the operational example of FIG. 15, similar to the examples of FIGS. 13 and 14, the amount of charge discharged in one pulse is greater than the amount of charge stored in the charged capacitor. FIG. 15(a) shows a main pulse MP4 with a pulse width w5. FIG. 15(b) shows a sub-pulse SP4 with a pulse width w7. FIG. 15(c) shows a sub-pulse SP5 with a pulse width w8. w5 is equal to the sum of w6, w7, and w8. Portions of the description of the signals in FIG. 15 that overlap with FIG. 9 will be omitted.

[0109] The constraint condition acquisition unit 22 acquires a constraint condition that the output voltage be maintained in the range of greater than 1.8 kV and less than 5 kV. The condition that the output voltage is greater than 1.8 kV is a condition for the processing unit 3 to maintain the electric field processing at a standard level or higher. The condition that the output voltage is less than 5 kV is a condition for ensuring that the life of the processing unit 3 is equal to or longer than a target value.

[0110] The constraint condition acquisition unit 22 also acquires constraint conditions that the number of units is 10 and the peak voltage output per unit is 1 kV or less. The power supply measurement device 11 outputs the output voltage during pulse output from the pulsed power supply 20 as the power supply measurement result. Fig. 16 is a diagram showing an example of the output voltage waveform of the pulsed power supply 20 according to this embodiment.

[0111] Figure 16(a) shows the output waveform of the pulsed power supply 20, in which voltage pulses due to the main pulse MP4 are output from four basic units each having a capacitor charged to a charging voltage of 1 kV, and the outputs from the four basic units are superimposed. In Figure 16(a), the output pulse voltage decays over time. The voltage, which was 4 kV immediately after the start of the pulse output, drops to 0 kV before time w5 has elapsed since the start of the pulse output. The output pulse in Figure 16(a) does not satisfy the given constraints.

[0112] Fig. 16(b) shows a voltage pulse waveform resulting from the operation (boost operation) of the pulsed power supply 20, which combines three pulses: the main pulse MP4 in Fig. 15(a), the sub-pulse SP4 in Fig. 15(b), and the sub-pulse SP5 in Fig. 15(c). The operation of the pulsed power supply 20 that generates the voltage pulse in Fig. 16(b) will be described.

[0113] The control signal determination unit 23 first superimposes and outputs voltage pulses generated by the main pulse MP4 from four basic units each having a capacitor with a charging voltage of 1 kV. These four basic units are referred to as a first basic unit group. The control signal determination unit 23 acquires and monitors the output voltage of the pulsed power supply 20 as a power supply measurement result.

[0114] Then, the control signal determination unit 23 detects that the output voltage of the pulsed power supply 20 has dropped to 2 kV at a time w6 after the start of output of the main pulse MP4. Then, immediately after this detection, the control signal determination unit 23 outputs a sub-pulse SP4 to the two basic units having a charging voltage of 1 kV. These two basic units are defined as a second basic unit group.

[0115] The second group of units is composed of units different from the units included in the first group of units. When the voltage outputs from the first group of units and the second group of units are superimposed and applied to the load, the output voltage of the pulsed power supply 20 temporarily recovers to 4 kV and then drops again.

[0116] Furthermore, the control signal determination unit 23 detects, based on the power supply measurement results, that the output voltage of the pulsed power supply 20 has again dropped to 2.0 kV at a time w7 after the second group of units starts outputting the sub-pulse SP4. Immediately after this detection, the control signal determination unit 23 outputs a sub-pulse SP5 to the two units with a charging voltage of 1 kV. These two units are designated as a third group of units.

[0117] The third group of units is composed of units different from the units constituting the first group of units and the units constituting the second group of units. In other words, all of the 10 units belong to one of the first group of units, the second group of units, and the third group of units.

[0118] Due to the superposition of the output voltages from the first and third groups of units, the output voltage of the pulsed power supply 20 temporarily recovers to 4 kV and then drops after the recovery. Here, the control signal determination unit 23 provides a margin of 0.2 kV with respect to 1.8 kV, which is the lower limit of the voltage given as a constraint condition, and outputs sub-pulses SP4 and SP5 immediately after detecting a voltage below 2.0 kV.

[0119] Furthermore, the control signal determination unit 23 sets the main pulse MP4, sub-pulse SP4, capacitor charging voltage, etc. so that the output voltage of the pulsed power supply 20 immediately after outputting the main pulse MP4, sub-pulse SP4, and sub-pulse SP5 is 4.0 kV. This provides a margin of 1.0 kV with respect to the upper limit of voltage of 5 kV given as a constraint.

[0120] As shown in FIG. 16(b), the control signal determination unit 23 divides the individual units included in the power supply unit 1 into a plurality of individual unit groups. Then, for each individual unit group, a main pulse and a sub-pulse whose output start time differs from the other pulses are output one by one in sequence. This makes it possible to mitigate the attenuation of the pulse voltage. It also makes it possible to reduce the amplitude of the output voltage. This makes it possible to keep the output voltage within a range between an upper limit and a lower limit when a constraint requires that the output voltage be kept within that range.

[0121] 16(b), if the actual measured values ​​of the output voltage and the like are monitored and the control signal determiner 23 outputs a control signal based on the measured voltage value, the control device 2 can output a control signal with high accuracy. As a result, even if the pulsed power supply 20 is likely to output an unintended pulse waveform due to its relationship with the connected load, wiring, etc., it can achieve operation that satisfies the constraints.

[0122] This in turn prevents breakdowns and degradation of processing performance of the electric field processing apparatus 100. In other words, it is possible to provide an electric field processing apparatus that can achieve the desired lifespan, performance, etc. 13 to 16 illustrate the operation of the constraint condition acquisition unit 22 acquiring constraint conditions regarding the lifespan of the processing unit 3 and the effect of the electric field processing in the processing unit 3, and the control signal determination unit 23 determining a control signal based on the power measurement result that is the output of the power measurement device 11.

[0123] As a variation of this embodiment, the output of the power supply measurement device 11, the output of the environment measurement device 12, the output of the load measurement device 33, or a combination of these may be monitored. Furthermore, the constraint conditions acquired by the constraint condition acquisition unit 22 may be conditions related to the maintenance cycle of the pulsed power supply 20 and the processing unit 3, the energy consumption of the electric field processing device 100, etc.

[0124] 14 and 16, even when the total amount of charge discharged in one pulse is greater than the total amount of charge stored in the charged capacitor, the configuration for achieving equal heat generation among the individual units described with reference to Fig. 11 and 12 can be applied. For example, based on the actual measurement results and the estimated results of the heat generation from the individual units described above, a cycle may be configured in which each of the multiple individual units generates the same amount of heat, and this cycle may be repeated.

[0125] In other words, the control signal should be output so that the total amount of heat (integrated over time) output from each unit during one cycle is the same. Another example of operation is shown in Figure 17, which is a flow chart showing an example of the processing of the control device 2 according to this embodiment.

[0126] In step S101, the control signal determination unit 23 divides all the individual units into three modes: MP mode, SP mode, and standby mode, in accordance with the target output voltage acquired by the command signal acquisition unit 21. In the description of the embodiment in FIG. 17, it is assumed that the capacitors of all the individual units are charged to the same voltage.

[0127] From the viewpoint of achieving a long life, it is desirable that the total number of units in the SP mode and the number of units in the standby mode be 2 or more. In step S102, the control device 2 outputs a control signal to the DC power supply 10 to charge all capacitors. It also outputs an MP signal to the units in the MP mode. As a result, a pulse voltage corresponding to the MP mode is output from the corresponding unit.

[0128] The power supply measurement device 11 acquires a pulse current as a power supply measurement result at a fixed sampling period. In step S103, the control device 2 waits until a sampling time has elapsed after starting to output a pulse voltage. In step S104, the control signal determination unit 23 acquires the pulse current as a power supply measurement result.

[0129] In step S105, the control device 2 determines whether the pulse current is equal to or greater than a predetermined threshold. If it is determined that the pulse current is equal to or greater than the threshold, the process proceeds to step S106. If it is determined in step S104 that the pulse current is less than the threshold, the process proceeds to step S107. If the process proceeds to step S107, the control device 2 outputs a control signal to output a sub-pulse to compensate for the insufficient current output. Then, the process proceeds to step S103.

[0130] In step S106, the control signal determination unit 23 determines whether the output of the main pulse signal, which is the standard signal, has ended based on the command signal. That is, it determines whether the command signal instructs the continuation of the output in MP mode. If it is determined in step S106 that the standard signal has ended, the control device 2 proceeds to step S103.

[0131] The process from step S103 to step S107 is then repeated until it is determined in step S106 that the standard signal is not continuing. On the other hand, if it is determined in step S106 that the standard signal is not continuing, the control device 2 ends the pulse output operation. This completes the operation flow shown in FIG. 17.

[0132] 17, the control signal determination unit 23 determines whether to output a sub-pulse based on whether the pulse current value is equal to or greater than a threshold value. As a result, if the absolute value of the pulse current is smaller than the threshold value, a sub-pulse is output to compensate for the lack of output.

[0133] On the other hand, if the absolute value of the pulse current is greater than the threshold, the main pulse continues to be output, and the current value does not increase. In this way, the control signal can be changed without delay according to the measurement results of the pulse current. It is possible to obtain a pulse current that is closer to the command signal, and to achieve an electric field treatment effect that is closer to the desired effect. In addition, the defect rate of defects occurring in the object to be treated can be reduced. Furthermore, because unnecessarily high output power is not used, the life of the device can be extended and power consumption can be reduced.

[0134] Furthermore, it is possible to make the pulse waveform closer to the target pulse waveform. For example, as illustrated in FIG. 14, in the case where the pulse voltage decays over time in one pulse waveform, it is possible to make the decay of the pulse current smaller, thereby realizing a pulse waveform with a flatter peak. As a result, the effect of the electric field treatment in one pulse can be made more uniform over time.

[0135] 13 to 16, instead of or in addition to measuring the current value, the power supply measurement result may be monitored by monitoring the time series current value, pulse waveform, etc. By such an operation, the pulse waveform can be made to approach the target pulse waveform.

[0136] Next, variations in the operation of the control device 2 will be described. The control device 2 stores, for each pulse, the integral of the measured value of the current contained in one pulse in the memory unit 24. This integral value is called the pulse current value. The memory unit 24 also stores four types of operating states in which the number of units in the MP mode, SP mode, and standby mode is changed. Figure 18 is a diagram showing four operating states of the pulse power supply 20 according to this embodiment. Figure 18 illustrates an example in which the number of units is 10.

[0137] 18(k) to 18(n) show states K to N. In state K, the number of units in MP mode is 6, the number of units in SP mode is 2, and the number of units in standby mode is 2. In state L, the number of units in MP mode is 6, the number of units in SP mode is 4, and the number of units in standby mode is 0.

[0138] In state M, the number of units in MP mode is 5, the number of units in SP mode is 5, and the number of units in standby mode is 0. In state N, the number of units in MP mode is 8, the number of units in SP mode is 0, and the number of units in standby mode is 2. Figure 19 is a flow diagram showing the operation of pulsed power supply 20 according to this embodiment.

[0139] In step S111, the control signal determiner 23 calculates an average current value Iav, which is the average of the multiple pulse current values ​​output before the start. The power supply measurement device 11 outputs the current output value (current value) of the pulsed power supply 20 at a constant cycle. The memory unit 24 sequentially stores the measured current values. The control signal determiner 23 reads the current values ​​of 20 pulses from the memory unit 24 and calculates the average current value as the average current value Iav each time the current values ​​for 20 pulses are stored in the memory unit 24.

[0140] The control signal determination unit 23 calculates the current average value Iav for each sampling period. The sampling period may be the time it takes for one of the 20 pulses to be replaced, or the time it takes for all 20 pulses to be replaced. Alternatively, the sampling period may be a time longer than the time it takes for all 20 pulses to be replaced.

[0141] The control signal determiner 23 holds three predetermined thresholds. These are designated, in descending order, as a first threshold th1, a second threshold th2, and a third threshold th3. That is, the first threshold th1 is the largest and the third threshold th3 is the smallest. The control signal determiner 23 compares the held thresholds with the average current value Iav for each sampling period.

[0142] In step S112, the control signal determiner 23 determines whether the average current value Iav is greater than the first threshold value th1. If the average current value Iav is greater than the first threshold value th1, the control signal determiner 23 proceeds to step S113. If the average current value Iav is smaller than the first threshold value th1, the control signal determiner 23 proceeds to step S114.

[0143] In step S113, the control signal determiner 23 outputs a control signal for performing an output operation in state M. In step S114, the control signal determiner 23 determines whether the average current value Iav is greater than the second threshold value th2. If the average current value Iav is greater than the second threshold value th2, the control signal determiner 23 proceeds to step S115.

[0144] If the current average value Iav is smaller than the second threshold value th2, the control signal determiner 23 proceeds to step S116. In step S115, the control signal determiner 23 outputs a control signal for performing an output operation in state L. In step S116, the control signal determiner 23 determines whether the current average value Iav is larger than the third threshold value th3.

[0145] If the current average value Iav is greater than the third threshold th3, the control signal determiner 23 proceeds to step S117. If the current average value Iav is less than the third threshold th3, the control signal determiner 23 proceeds to step S118. In step S117, the control signal determiner 23 outputs a control signal for performing an output operation in state K.

[0146] In step S118, the control signal determination unit 23 outputs a control signal for performing an output operation according to state N. After performing the output operation according to each step in step S113, step S115, step S117, and step S118, the control signal determination unit 23 proceeds to step S119.

[0147] In step S119, the control signal determiner 23 determines whether the output operation has ended based on the command signal. If the command signal indicates that the output operation should be ended, the control signal determiner 23 ends the output operation. On the other hand, if the command signal indicates that the output operation should be continued rather than ended, the process proceeds to step S111.

[0148] Then, in step S119, the operations from step S111 to step S119 are repeated until the end of the output operation is instructed by a command signal. The above is the operation of the flowchart shown in Fig. 19. The effects of the embodiment according to the operation flow of Fig. 19 will be described. Fig. 20 is a diagram showing the relationship between the average current value Iav and the operation of the pulsed power supply 20 according to this embodiment.

[0149] According to the operation flow of Fig. 19, the pulsed power supply 20 executes output in four operation states shown in Fig. 20 according to the average current value Iav. This makes it possible to reflect information on the latest state of the pulsed power supply 20, the load device (processing unit 3), etc., acquired from the power supply measurement results, in the control without a significant time delay, and allows the pulsed power supply 20 to follow the command signal with high accuracy.

[0150] In high-voltage pulse operation, it may be difficult to predict the waveform depending on the wiring, load, etc., due to the influence of impedance matching between the power supply, wiring, and load, etc. In such cases, the pulse power supply 20 or the power supply unit 1 can be controlled with high precision by reflecting information on the pulse output operation obtained immediately before using the same load and the same wiring.

[0151] Furthermore, by changing the output operation in accordance with the average value of multiple pulses rather than the value of one pulse, the effects of accidentally occurring instantaneous values, measurement errors, malfunctions, etc. can be alleviated.

[0152] The influence may be further reduced by statistical processing such as averaging the remaining values ​​after removing the maximum and minimum values ​​from the plurality of pulse current values. Furthermore, when the average current value Iav is large, it is possible to reduce the number of units in an operation mode that generates a large amount of heat, i.e., in an operation mode that has a large thermal load.

[0153] In Figure 18, the MP mode unit has the highest heat load, followed by the SP mode unit, and the standby mode unit has the lowest heat load. Here, the number of MP mode units may be reduced and the number of SP mode units or standby mode units may be increased. Alternatively, the number of SP mode units may be reduced and the number of standby mode units may be increased. The above operation can reduce the amount of heat generated by the units.

[0154] Furthermore, as described in embodiment 1, the lifespan of the individual units may be equalized by alternating between multiple operating modes over time between the individual units to equalize the amount of heat generated between the individual units.

[0155] 21 is a diagram showing a configuration example in which the processing circuit included in the electric field treatment apparatus 100 according to this embodiment is configured by a processor 1151 and a memory 1152. For example, the processing circuit of FIG. 21 may be included in the control device 2. When the processing circuit is configured by the processor 1151 and the memory 1152, each function of the processing circuit of the control device 2 is realized by software, firmware, or a combination of software and firmware.

[0156] A series of processes to be executed by the control device 2 is written as a program in software or firmware and stored in the memory 1152. In the processing circuit, the processor 1151 reads and executes the program stored in the memory 1152 to realize each function. In other words, when the control device 2 or the like is equipped with a processing circuit, the processing circuit is equipped with the memory 1152 for storing a program that will result in the processing of the control device 2 being executed. It can also be said that these programs cause a computer to execute the procedures and methods executed by the control device 2.

[0157] Here, the processor 1151 may be a computing means called a CPU (Central Processing Unit), processing device, arithmetic device, microprocessor, microcomputer, or DSP (Digital Signal Processor). The memory 1152 may be a non-volatile or volatile semiconductor memory such as a RAM, a ROM (Read Only Memory), a flash memory, an EPROM (Erasable Programmable ROM), or an EEPROM (Electrically EPROM). The memory 1152 may also be a storage means such as a magnetic disk, a flexible disk, an optical disk, a compact disk, a minidisk, or a DVD (Digital Versatile Disc).

[0158] Fig. 22 is a diagram showing a configuration example in which the processing circuit included in the electric field treatment apparatus 100 according to this embodiment is configured with dedicated hardware. For example, the processing circuit of Fig. 22 may be included in the control device 2. In the case where the processing circuit is configured with dedicated hardware, the processing circuit 1161 shown in Fig. 22 may be, for example, a single circuit, a composite circuit, a programmed processor, a parallel programmed processor, an ASIC (Application Specific Integrated Circuit), an FPGA (Field Programmable Gate Array), or a combination thereof.

[0159] The multiple functions of the control device 2 may be realized by the processing circuit 1161 for each function, or multiple functions may be realized collectively by the processing circuit 1161. The control device 2, the pulsed power supply 20, the processing unit 3, etc. may be connected via a network. Furthermore, the control device 2 may exist on a cloud server.

[0160] The pulsed power supply 20 exemplified in this embodiment includes i-th units u_i (where i=1 to n-1) (n is an integer of 2 or more). The i-th unit u_i includes an i-th capacitor c_i, an i-th reactor r_i, an i-th diode d_i, and an i-th switching element sw_i. The i-th reactor r_i is connected between the ground terminal of the i-th capacitor c_i and the ground terminal of the (i+1)-th capacitor c_i+1.

[0161] The i-th diode d_i has its p-side connected to the charging terminal of the i-th capacitor c_i and its n-side connected to the charging terminal of the (i+1)th capacitor c_i+1. The i-th switching element sw_i is connected between the ground terminal of the i-th capacitor c_i and the n-side of the i-th diode d_i. The i-th switching element sw_i switches between an on state and an off state based on a control signal.

[0162] The pulse power supply 20 includes an nth unit u_n. The nth unit u_n includes an nth capacitor c_n, an nth reactor r_n, an nth diode d_n, and an nth switching element sw_n. One end of the nth reactor r_n is connected to the ground terminal of the nth capacitor c_n. One end of the nth diode d_n is connected to the p-side of the charge terminal of the nth capacitor c_n. The nth switching element sw_n is connected between the ground terminal of the nth capacitor c_n and the n-side of the nth diode d_n, and is switched between an on state and an off state based on a control signal.

[0163] The pulse power supply 20 also includes a DC power supply 10. The DC power supply 10 is connected to the other end of the nth reactor r_n and charges the ith capacitors c_i, where i = 1 to n. The pulse power supply 20 also includes a control device 2. The control device 2 outputs a control signal to each of the ith switching elements sw_i, where i = 1 to n, based on a command signal and operation information, instructing switching between an on state and an off state.

[0164] The pulsed power supply 20 includes one switching element in each of its individual units. Therefore, compared with the configuration of Cited Document 1, the number of switching elements is smaller, reducing malfunctions due to electromagnetic noise and the like. The probability of failure can also be reduced. Furthermore, the on / off operation of each switching element can be determined by a control signal, allowing the output pulse waveform of the pulsed power supply 20 to be controlled. For example, the output of the pulsed power supply 20 can be made to follow a command signal with high accuracy. The pulsed power supply 20 of this embodiment can provide a highly reliable pulsed power supply capable of producing an output pulse waveform that is close to a target pulse waveform.

[0165] In the example of this embodiment, the pulse power supply 20 constitutes an electric field processing apparatus 100 with the processing section 3 as a load. The electric field processing apparatus 100 includes the pulse power supply 20 and the processing section 3. In the processing section 3, a voltage is applied by the pulse power supply 20 to an electrode pair consisting of a high-voltage electrode 31_1 and a low-voltage electrode 31_2. Then, electric field processing is performed on the processing object passing through the processing chamber pr between the electrode pair.

[0166] Furthermore, the electric field processing apparatus 100 may include an upstream transport unit 4 and a downstream transport unit 5. The upstream transport unit 4 transports the processing object to the processing chamber pr. The downstream transport unit 5 transports the processing object from the processing chamber pr. The electric field processing apparatus 100 can control the state of the processing object after electric field processing with high precision because the pulsed power supply 20 can control the output pulse waveform. For example, it is possible to make the output of the pulsed power supply 20 follow a command signal with high precision.

[0167] The control device 2 of the present embodiment includes a control signal determiner 23. The control signal determiner 23 has a control signal model that is a model that associates the operation information with the control signal. The control signal determiner 23 determines the control signal based on the command signal, the operation information, and the control signal model.

[0168] Furthermore, the above-mentioned operation information includes at least one of constraint conditions, load measurement results, power supply measurement results, and environmental measurement results. Here, the constraint conditions are information that restricts the operation of the pulsed power supply 20 or information that restricts the operation of a load connected to the pulsed power supply 20. The load measurement results are obtained by measuring the state of the load. Furthermore, the power supply measurement results are obtained by measuring the state of the pulsed power supply 20. The environmental measurement results are obtained by measuring the environment outside the pulsed power supply 20 or the load.

[0169] In this embodiment, the processing unit 3 of the electric field processing apparatus 100 is exemplified as the load, but it goes without saying that the pulsed power supply 20 can be applied to a load other than the processing unit 3. Examples of loads other than the processing unit 3 include an ozonizer, an exhaust gas processing apparatus, a medical device, and a sterilization processing apparatus.

[0170] According to the present disclosure, the control device 2 determines the control signal based on a preset control signal model, so that information about the relationship between preset operating information and the control signal is reflected in the control signal. This allows the output waveform of the pulsed power supply 20 to be controlled with high precision. Ultimately, the operation of the load device, such as the electric field processing of the electric field processing device 100, can be controlled with high precision. For example, it becomes possible to make the output of the pulsed power supply 20, the processing of the electric field processing device 100, etc., follow the command signal with high precision.

[0171] The control device 2 exemplified in this embodiment executes classification setting to classify the i-th unit u_i (i=1 to n) into a main pulse mode, a sub-pulse mode, and a standby mode, or into a main pulse mode and a sub-pulse mode, and inputs a main pulse (main pulse signal) to the switching elements of the unit classified into the main pulse mode.

[0172] The main pulse is a signal that generates a main pulse that is on for a first pulse time in each predetermined period and is off for the rest of the period. Next, a sub-pulse (sub-pulse signal) is input to the switching elements of the units classified as in the sub-pulse mode.

[0173] The sub-pulse is a signal that generates a sub-pulse that is in an ON state during a second pulse time that overlaps a part of the first pulse time in the above-mentioned period and is in an OFF state except for the second pulse time in the above-mentioned period. Next, a control signal is input to the switching elements of the units classified as a standby mode to turn them off during the above-mentioned period.

[0174] By having the control device 2 output control signals according to classification settings, main pulses and sub-pulses are output from different units, and output from capacitors with attenuated charge can be avoided. This improves the reproducibility of the output of the pulsed power supply 20. Furthermore, it becomes easier to predict the output waveform of the pulsed power supply 20, reducing the calculation load when outputting control signals. Furthermore, for example, it becomes possible to make the output of the pulsed power supply 20 follow the command signal with high accuracy.

[0175] The control device 2 may further subdivide the units classified as a sub-pulse mode into a plurality of sub-pulse modes. Then, a sub-pulse (sub-pulse signal) with a different timing for starting the second pulse time may be input for each of the subdivided units. By subdividing the sub-pulses, the output pulse waveform of the pulsed power supply 20 can be controlled more precisely. For example, the amplitude of voltage oscillation of the pulse waveform within one cycle can be reduced. Furthermore, for example, the output of the pulsed power supply 20 can be made to follow the command signal with higher accuracy.

[0176] The control device 2 illustrated in this embodiment individually acquires the thermal state of the ith unit u_i (i = 1 to n) as a power supply measurement result. Here, the thermal state of the ith unit u_i may be acquired by estimation based on the current measurement result or voltage measurement result of the ith unit u_i. Alternatively, the thermal state of the ith unit u_i may be acquired by measuring the thermal state as a power supply measurement result of the ith unit u_i.

[0177] The control device 2 further outputs a control signal for switching the classification settings described above so as to equalize the heat generation amounts of the plurality of units u_i (i=1 to n) based on the acquired thermal state. By switching the classification settings and operating the units so as to equalize the heat generation amounts, the lifespans of the plurality of units or the lifespans of the plurality of switching elements can be made equal.

[0178] The control signal determination unit 23 described in this embodiment may include a storage unit 24 that stores control signals and operation information in association with each other. Then, a control signal model may be generated based on the stored control signals and operation information. The results of operation of the same load device (e.g., the processing unit 3) and the same pulsed power supply 20 can be reflected in the determination of the control signal via the control signal model. This allows the operation of the pulsed power supply 20 to be controlled with high precision. Consequently, the operation of the load device (e.g., the processing of the electric field treatment device 100) can be controlled with high precision.

[0179] Here, the control signal determination unit 23 described in the present embodiment may store in the storage unit 24, in association with the control signal and the operation information during the temporary suspension time, which is the time from when the output of the pulsed power supply 20 is temporarily stopped until the output is resumed. The operation information during the temporary suspension time can be reflected in the determination of the control signal after the output is resumed via the control signal model. This makes it possible to control the operation after the output is resumed with high precision.

[0180] Furthermore, the control signal determination unit 23 may output a control signal indicating the charging voltage of each of the ith capacitors c_i (i=1 to n). The DC power supply 10 may then charge each of the ith capacitors c_i (i=1 to n) based on the output control signal. By charging each of the capacitors, the output of the pulsed power supply 20 can be controlled with higher precision. Furthermore, for example, it is possible to make the output of the pulsed power supply 20 follow the command signal with higher precision.

[0181] 23 is a diagram showing an example of an electric field treatment apparatus 100a according to the present embodiment. The electric field treatment apparatus 100a of the present embodiment includes a pulsed power supply 20a instead of the pulsed power supply 20. The pulsed power supply 20a also includes a power supply unit 1a instead of the power supply unit 1 and a control device 2a instead of the control device 2. In all other respects, the pulsed power supply 20a is the same as the pulsed power supply 20.

[0182] 24 is a diagram showing an example of the circuit configuration of the power supply unit 1a according to this embodiment, specifically the circuit configuration of the n-th unit u_n. The power supply unit 1a included in the electric field processing apparatus 100a includes a DC-DC converter 13 and a switching circuit 14 in addition to the components of the power supply unit 1.

[0183] One end of the DC-DC converter 13 and the terminal sb of the switching circuit 14 are connected to one end of the n-th reactor r_n opposite to the end connected to the ground terminal of the n-th capacitor c_n. The other end of the DC-DC converter 13 is connected to the terminal sa of the switching circuit 14.

[0184] The switching circuit 14 switches between a connection state sa and a connection state sb based on a switching signal, which will be described later. Here, the state in which the DC power supply 10 is connected to the terminal sa is referred to as the connection state sa. Also, the state in which the DC power supply 10 is connected to the terminal sb is referred to as the connection state sb. In the connection state sa, the DC power supply 10 is connected to the ground side terminals of the nth reactor r_n and the nth capacitor c_n via the DCDC converter 13.

[0185] In the connection state sb, the DC power supply 10 is connected directly to the ground terminals of the n-th reactor r_n and the n-th capacitor c_n without going through the DCDC converter 13. The structure and circuit configuration of the power supply unit 1a in the connection state sb are the same as those of the power supply unit 1 shown in the first embodiment.

[0186] In the connection state sa, the DCDC converter 13 can boost the charging voltage to the capacitor relative to the voltage applied from the DC power supply 10. As a result, the connection state sa can charge to a higher voltage than the connection state sb. In addition, the time required for charging can be shortened. In the connection state sb, there is no power consumption by the DCDC converter 13, so the capacitor can be charged more efficiently than in the connection state sa.

[0187] 25 is a block diagram showing the configuration of a control device 2a according to the present embodiment. In addition to the control signal output by the control device 2, the control device 2a outputs a switching signal, which is a signal to the switching circuit 14, as a control signal. Note that the control device 2 of the first embodiment outputs commands to the first switching element sw_1 to the nth switching element sw_n, the DC power supply 10, etc. as control signals.

[0188] The above is the difference in configuration between the electric field treatment apparatus 100 and the electric field treatment apparatus 100a. The following describes an example of the operation of the electric field treatment apparatus 100a. In this example, the control apparatus 2a can perform a combination of two types of switching: the operation by switching the switching elements described in the first embodiment, and switching between the connection state sa and the connection state sb by the switching circuit 14.

[0189] As described above, the switching by the switching circuit 14 is performed based on the switching signal output from the control device 2 a. For example, when it is necessary to increase the charging voltage or shorten the charging time of the capacitor, the switching circuit 14 may be switched from the connection state sb to the connection state sa.

[0190] Furthermore, when it is acceptable for the capacitor charging voltage to decrease or for the capacitor charging time to be longer, the connection state may be switched from the connection state sa to the connection state sb to perform operation with less power consumption. According to the above-described operation, the charging specifications are determined depending on the operating state of the pulsed power supply 20a. Examples of the charging specifications include the capacitor charging voltage and the capacitor charging speed.

[0191] Then, by switching the switching circuit 14 according to the determined charging specifications, it is possible to select and execute an efficient charging operation with a low charging voltage or a slow charging speed, and an efficient charging operation with a high charging voltage or a fast charging speed.

[0192] According to this embodiment, the pulse power supply 20a may include a DC-DC converter 13 and a switching circuit 14. The DC-DC converter 13 has a function of boosting a voltage input from its input side and outputting the boosted voltage from its output side. The output side is connected to a terminal of the n-th reactor r_n opposite to the terminal to which the ground side of the n-th capacitor c_n is connected.

[0193] The switching circuit 14 switches between a state in which the terminals sc and sa are connected and a state in which the terminals sc and sb are connected. The terminal sa is connected to the other end of the DCDC converter 13. The terminal sb is connected to the ground side of the nth capacitor c_n of the nth reactor r_n. The terminal sc is connected to the DC power supply 10. The pulse power supply 20a of this embodiment can provide a highly reliable pulse power supply that can make the output pulse waveform approach a target pulse waveform.

[0194] 26 is a diagram showing an example of an electric field processing apparatus 100b according to this embodiment. The electric field processing apparatus 100b includes a pulsed power supply 20b instead of the pulsed power supply 20. The pulsed power supply 20b includes a control device 2b instead of the control device 2. The other components of the pulsed power supply 20b are the same as those of the pulsed power supply 20.

[0195] 27 is a block diagram showing an example of the configuration of a control device 2b according to the present embodiment. The control device 2b is the same as the control device 2 except that it includes a control signal determiner 23b instead of the control signal determiner 23.

[0196] 28 is a block diagram showing an example of the configuration of the control signal determiner 23b according to this embodiment. The control signal determiner 23b includes a state quantity acquirer 231, a machine learning device 232, and a decision-maker 233. The state quantity acquirer 231 acquires state quantities including control signals when the pulsed power supply 20b is operated.

[0197] An example of a state quantity other than the control signal is operation information. As described in the first embodiment, the operation information includes power supply measurement results, environmental measurement results, load measurement results, constraint conditions, etc. The storage unit 24 may store the above state quantities once, and the state quantity acquisition unit 231 may acquire the state quantities from the storage unit 24. In this case, the storage unit 24 may store the state quantities as time-series signals associated with acquisition times and measurement times for a predetermined period of time.

[0198] Note that calculation processing may be performed on the data before it is acquired by the state quantity acquisition unit 231. Examples of calculation processing include calculating an average value, extracting a maximum value, a minimum value, etc. The calculation processing may be performed before the data is stored in the storage unit 24, or may be performed after the data is stored in the storage unit 24.

[0199] The machine learning device 232 learns how to determine a control signal using the control signal and state quantities acquired by operating the pulsed power supply 20b as a training data set, and generates a learning model. The decision-making unit 233 determines a control signal based on the state quantities, command signal, and learning model. In this embodiment, the learning model is included in the control signal model described in embodiment 1. In other words, the learning model of this embodiment is one variation of the control signal model.

[0200] The following illustrates an operation of the machine learning device 232. The state quantity acquisition unit 231 acquires, as a training data set, control signals acquired in time series while the pulsed power supply 20b is operating for a certain period of time, and environmental measurement results and power supply measurement results while the pulsed power supply 20b is operating.

[0201] The machine learning device 232 learns the relationship between the acquired control signal, the environmental measurement result, and the power supply measurement result. For example, when the humidity and the temperature, which are the environmental measurement results, change, the machine learning device 232 may learn the relationship between the control signal input to the power supply unit 1b and the power supply measurement result, and generate a learning model.

[0202] Furthermore, the power supply unit 1 is operated by changing a control signal that indicates, for example, the charging voltage of the capacitor, the pulse width and amplitude of the MP signal, the pulse width and amplitude of the SP signal, the relationship between the output start time of the MP signal and the output start time of the SP signal, etc. The state quantity acquisition unit 231 then acquires the control signal and the state quantities, such as the environment measurement result, the power supply measurement result, and the load measurement result, in association with each other. Based on such control signals and state quantities, the machine learning device 232 may generate a learning model.

[0203] The learning model may take any form as long as it shows the correspondence between the environmental measurement results, the control signal, and the power supply measurement results. For example, it may be a mathematical formula or function, a neural network, or a mathematical table showing these correspondences. As an example, it may be a mathematical formula in which the environmental measurement results are parameters, the control signal is input, and the power supply measurement results are output.

[0204] The decision-making unit 233 determines a control signal based on the state quantity, the command signal, and the learning model generated by the machine learning device 232. For example, when the decision-making unit 233 acquires a command signal from the outside, it newly acquires the state quantity at that time from the state quantity acquisition unit 231. Then, for the acquired state quantity, it may determine a control signal that causes the power supply unit 1, the processing unit 3, etc. to follow the command signal based on the learning model.

[0205] Figure 29 is a diagram showing an example of an electric field processing apparatus 100c according to this embodiment. The electric field processing apparatus 100c is the same as the electric field processing apparatus 100b except that it includes a pulsed power supply 20c instead of the pulsed power supply 20b. The pulsed power supply 20c is also the same as the pulsed power supply 20b except that it includes a control device 2c instead of the control device 2b. Figure 30 is a block diagram showing an example of the configuration of the control device 2c according to this embodiment.

[0206] The control device 2c is the same as the control device 2b except that it includes a control signal determiner 23c instead of the control signal determiner 23b. Fig. 31 is a block diagram showing an example of the configuration of the control signal determiner 23c according to this embodiment. The control signal determiner 23c is the same as the control signal determiner 23b except that it does not include the machine learning device 232. The control signal determiner 23c does not perform learning, and the decision-making unit 233 is in a state where it has already acquired a learned learning model that has been learned in advance.

[0207] The decision-making unit 233 in Fig. 31 acquires a learning model that has already been learned from outside the control signal determination unit 23c in advance. The control signal determination unit 23c in Fig. 31 can determine a control signal by storing the learning model in advance. This eliminates the need for new learning and can save calculation and processing time for determining a control signal.

[0208] Also, the machine learning device 232 can be omitted. In this way, the control signal determiner 23c may be provided with a trained learning machine. The trained learning machine may be, for example, the decision-making unit 233 having a trained learning model. Examples of trained learning models include data recording the results of learning, and a program in which the results of learning are reflected in parameters within the program.

[0209] The control signal determiner 23c includes a state quantity acquirer 231 and a decision-maker 233. The state quantity acquirer 231 acquires, as state quantities, a command signal and operating information at the time the command signal is acquired. The decision-maker 233 determines a control signal based on a learned learning model (control signal model), the command signal, and the operating information.

[0210] The control signal determiner 23b or the control signal determiner 23c illustrated in this embodiment may include a machine learning device 232 that learns a control signal model using the state quantity acquired by the state quantity acquisition unit 231 as a training data set. In this case, the decision-making unit 233 determines a control signal based on the learned control signal model output by the machine learning device 232.

[0211] The pulse power supplies 20b and 20c of this embodiment are highly reliable and can provide pulse power supplies that can make the output pulse waveform closer to the target pulse waveform.

[0212] The control device 2b or 2c of this embodiment determines a control signal using a learning model (control signal model) determined by learning. This allows the output of the pulsed power source 20b or 20c to follow the command signal with high accuracy. Furthermore, when the command signal instructs the processing unit 3 to perform a process, the operation of a load device such as the processing unit 3 connected to the pulsed power source 20b or 20c can be made to follow the command signal with high accuracy.

[0213] In addition, by combining the control signal determination unit 23b and the control signal determination unit 23c illustrated in this embodiment with the configuration described in embodiment 1 or embodiment 2, it is possible to make the pulse waveform follow the command signal with higher accuracy through machine learning.

[0214] For example, the operation for executing the classification setting described in the first embodiment may be combined with the generation of a learning model described in this embodiment, operation using the generated learning model, etc. Also, the operation for making the thermal state more uniform described in the first embodiment may be combined with the generation of a learning model described in this embodiment, operation using the generated learning model, etc. The effect of machine learning is added to the effect of the pulsed power supply 20 described in the first embodiment, and it becomes possible to make the pulse waveform, the processing of the processing unit 3, etc. follow the command signal with higher accuracy.

[0215] 1, 1a, 1b Power supply unit, 2, 2a, 2b Control device, 3, 3a Processing unit, 4, 4a Upstream transport unit, 5, 5a Downstream transport unit, 11 Voltage measuring device, 12 Current measuring device, 13 DCDC converter, 14 Switching circuit, 20, 20a, 20b Pulse power supply, 21 Command value acquisition unit, 22 Constraint condition acquisition unit, 23, 23a, 23b Control signal determination unit, 24 Memory unit, 31 Electrode, 31_1, 31a_1 High voltage electrode, 31_2, 31a_2 Low voltage electrode, 32, 32a, 32b Insulating material, 33 Load measuring device, 100, 100a, 100b Electric field processing device, 231 State quantity acquisition unit, 232 Machine learning device, 233 Decision making unit, 1151 Processor, 1152 Memory, 1161 Processing circuit, c_i i-th capacitor, d_i i-th diode, E1, E2, E3, E4 electric field, MP1, MP2, MP3 main pulse, SP1, SP2, SP3, SP4, SP5 sub-pulse, pr, pr_a processing chamber, r_i i-th reactor, sw_i i-th switching element, u_i i-th unit.

Claims

1. The i-th capacitor, the i-th reactor connected between the grounded terminal of the i-th capacitor and the grounded terminal of the (i + 1)-th capacitor, the i-th diode having its p-side connected to the charging terminal of the i-th capacitor and its n-side connected to the charging terminal of the (i + 1)-th capacitor, and the i-th switching element connected between the grounded terminal of the i-th capacitor and the n-side of the i-th diode and switching between an on state and an off state based on a control signal, an i-th unit from i = 1 to n - 1 (n is an integer of 2 or more), the n-th capacitor, the n-th reactor having one end connected to the grounded terminal of the n-th capacitor, the n-th diode having one end of its p-side connected to the charging terminal of the n-th capacitor, and the n-th switching element connected between the grounded terminal of the n-th capacitor and the n-side of the n-th diode and switching between an on state and an off state based on a control signal, a n-th unit, a DC power source connected to the other end of the n-th reactor and charging the i-th capacitor from i = 1 to n, a control device that outputs a control signal for instructing switching between an on state and an off state for each of the i-th switching elements from i = 1 to n based on a command signal and operation information A pulse power supply comprising the above.

2. The control device, has a control signal model which is a model for associating operation information and a control signal, and includes a control signal determination unit that determines the control signal based on the command signal, the operation information, and the control signal model, The operation information includes at least any one of a constraint condition which is information that restricts the operation of the pulse power supply or information that restricts the operation of a load connected to the pulse power supply, a load measurement result obtained by measuring the state of the load, a power supply measurement result obtained by measuring the state of the pulse power supply, and an environmental measurement result obtained by measuring the environment outside the pulse power supply or the load. The pulse power supply according to Claim 1.

3. The control device executes a classification setting for classifying the i-th unit from i = 1 to n into a main pulse mode, a sub-pulse mode, and a standby mode, or classifying the main pulse mode and the sub-pulse mode. For the switching element of the unit unit classified into the main pulse mode, a main pulse signal is input that generates a main pulse that is in an on state during the first pulse time within the period at predetermined intervals and is in an off state outside the first pulse time within the period. For the switching element of the unit unit classified into the sub-pulse mode, a sub-pulse signal is input that generates a sub-pulse that is in an on state during a second pulse time that overlaps a part of the first pulse time within the period and is in an off state outside the second pulse time within the period. The switching element of the unit unit classified into the standby mode inputs the control signal that is in an off state during the period. The pulse power supply according to claim 1 or 2, characterized in that.

4. The control device further subdivides the unit unit classified into the sub-pulse mode into a plurality of sub-pulse modes, and inputs sub-pulse signals with different timings at which the second pulse time starts for each subdivided unit unit. The pulse power supply according to claim 3, characterized in that.

5. The control device is The thermal state of the i-th unit from i = 1 to n as the power measurement result is individually obtained by either estimation based on the current measurement result or voltage measurement result of the i-th unit or measurement of the thermal state of the i-th unit, Outputs a control signal for switching the classification setting based on the thermal state, and the pulse power supply according to claim 3, characterized in that the heat generation amounts of a plurality of the i-th units from i = 1 to n are made to approach evenly.

6. The control signal determination unit is Equipped with a storage unit that stores the control signal and the operation information in association with each other, The pulse power supply according to claim 2, characterized in that a control signal model is generated based on the stored control signal and operation information.

7. The control signal determination unit is The control signal and the operation information during a pause time, which is the time from when the output of the pulse power supply is temporarily stopped until the output is resumed, are stored in the storage unit in association with each other. The pulse power supply according to claim 6, characterized in that.

8. The control signal determination unit outputs a control signal for instructing the charging voltage of each of the i-th capacitors from i = 1 to n. The DC power supply charges each of the i-th capacitors from i = 1 to n based on the control signal, and the pulse power supply according to claim 1 or 2 is characterized in that.

9. A DC-DC converter having a function of boosting the voltage input from the input side and outputting it from the output side, and the output side is connected to a terminal opposite to the terminal to which the ground side of the n-th capacitor of the n-th reactor is connected, and A switching circuit in which a terminal sa is connected to the other end of the DC-DC converter, a terminal sb is connected to the ground side of the n-th capacitor of the n-th reactor, a terminal sc is connected to the DC power supply, and a state in which the terminal sc and the terminal sa are connected and a state in which the terminal sc and the terminal sb are connected are switched. The pulse power supply according to claim 1 or 2, comprising:

10. The control signal determination unit A state quantity acquisition unit that acquires the control signal and the operation information as state quantities, A decision-making unit that determines the control signal based on the learned control signal model obtained by learning the control signal model using the state quantity as a training data set, the command signal, and the operation information. The pulse power supply according to claim 2, characterized by comprising:

11. The i-th unit from i = 1 to n-1 having an i-th capacitor, an i-th reactor connected between the ground side terminal of the i-th capacitor and the ground side terminal of the (i + 1)-th capacitor, an i-th diode having a p-side connected to the charging side terminal of the i-th capacitor and an n-side connected to the charging side terminal of the (i + 1)-th capacitor, and an i-th switching element connected between the ground side terminal of the i-th capacitor and the n-side of the i-th diode and switching between an on state and an off state based on a control signal (n is an integer of 2 or more), The n-th unit having an n-th capacitor, an n-th reactor having one end connected to the ground side terminal of the n-th capacitor, an n-th diode having one end connected to the p-side of the charging side terminal of the n-th capacitor, and an n-th switching element connected between the ground side terminal of the n-th capacitor and the n-side of the n-th diode and switching between an on state and an off state based on a control signal, A DC power supply connected to the other end of the n-th reactor and charging the i-th capacitors from i = 1 to n, A control device that outputs a control signal for instructing switching between an on state and an off state to each of the i-th switching elements from i = 1 to n based on a command signal and operation information. A pulse power supply comprising: A processing unit that applies a voltage to an electrode pair composed of a high-voltage electrode and a low-voltage electrode by the pulse power supply and performs an electric field treatment on an object to be processed passing through a processing chamber between the electrode pair; An upstream conveying unit that conveys the object to be processed to the processing chamber; A downstream conveying unit that conveys the object to be processed from the processing chamber An electric field treatment apparatus comprising the same.