Template substrate, method for manufacturing the same, and semiconductor substrate

Abstract

The present invention reduces the silicon concentration of a nitride semiconductor region when the nitride semiconductor region is formed by using a template substrate. This template substrate comprises: a base substrate; a mask pattern located on the base substrate and including a silicon-containing silicon-based mask and a first opening; an aluminum-containing semiconductor mask located on the silicon-based mask; and a seed part having an Al-based semiconductor layer that includes a main component of the semiconductor mask and overlaps the first opening.