Composition, surface treatment agent, article, and method for producing article

Abstract

The present invention provides a composition, etc., with which it is possible to form a surface-treated layer exhibiting excellent water repellency and abrasion resistance.　This composition includes: a first compound that has an organo(poly)siloxane residue and a reactive silyl group a; and a second compound that does not have an organo(poly)siloxane residue, and has a reactive silyl group b and a C4 or higher hydrocarbon group not directly bonded to an oxygen atom and optionally having a functional group or a substituent. The composition satisfies at least one of the following requirements (1) and (2). Requirement (1): In the first compound, two or more reactive silyl groups a are linked to at least one terminal of the organo(poly)siloxane residue. Requirement (2): In the second compound, two or more reactive silyl groups b are linked to at least one terminal of the hydrocarbon group.

Description

Composition, surface treatment agent, article, and method for manufacturing article

[0001] The present disclosure relates to compositions, surface treatments, articles, and methods for making articles.

[0002] In recent years, there has been a demand for technologies that make surfaces of articles less susceptible to fingerprints and that make them easier to remove stains, in order to improve performance such as appearance and visibility. As a specific method, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes a mixed composition of a compound (A1) represented by formula (a1), an organosilicon compound (B) represented by formula (b1), and an organosilicon compound (C) represented by formula (c1), characterized in that the mass ratio of compound (A1) to the total of organosilicon compound (B) and organosilicon compound (C) is 0.060 or more. Patent Document 2 describes a composition for forming a water-repellent layer, which contains a compound represented by formula (6), which may have undergone partial hydrolysis condensation and / or co-condensation, and a compound represented by formula (3) in an amount of 0.5 to 50 mass% relative to 100 mass% of the compound represented by formula (6). Patent Document 3 describes a composition containing an organosilicon compound (a) having at least one trialkylsilyl group and two or more hydrolyzable silicon groups, and a metal compound (b) in which at least one hydrolyzable group is bonded to a metal atom.

[0004] International Publication No. 2021 / 187184 Japanese Patent Application Laid-Open No. 2015-145463 Japanese Patent Application Laid-Open No. 2017-119849

[0005] A surface treatment layer formed by a surface treatment agent is required to have both water repellency and abrasion resistance.

[0006] According to the present inventors, the surface treatment layers formed using the compositions described in Patent Documents 1 to 3 were unable to achieve both water repellency and abrasion resistance. The present disclosure was made in consideration of these circumstances, and the problem to be solved by one embodiment of the present invention is to provide a composition and a surface treatment agent that can form a surface treatment layer having excellent water repellency and abrasion resistance on a substrate. The problem to be solved by one embodiment of the present invention is to provide an article having a surface treatment layer having excellent water repellency and abrasion resistance, and a method for manufacturing the article.

[0007] The present disclosure includes the following aspects. <1> A composition comprising: a first compound having an organo(poly)siloxane residue and a reactive silyl group a; and a second compound having a hydrocarbon group having 4 or more carbon atoms, which is free of an organo(poly)siloxane residue and is not directly bonded to an oxygen atom, and which may have a functional group or a substituent, and a reactive silyl group b, wherein the composition satisfies at least one of the following requirements (1) and (2): Requirement (1): In the first compound, two or more reactive silyl groups a are linked to at least one terminal of the organo(poly)siloxane residue. Requirement (2): In the second compound, two or more reactive silyl groups b are linked to at least one terminal of the hydrocarbon group. <2> The composition according to <1>, wherein the reactive silyl group a and the reactive silyl group b are each independently represented by the following formula (S1) or (S2): -Si(R ２ ) ｎ L ３－ｎ ...(S1) -[Si(L ２ ) ２ -Q] ｎ１２ -Si(L ２ ) ３ ...(S2) where R ２ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; ２ are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group; ２ At least four L ２represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, each Q independently represents an oxygen atom or an organic group having one carbon atom bonded to adjacent Si atoms on both sides, n represents an integer of 0 to 2, and n12 represents an integer of 1 to 3. <3> The composition according to <1> or <2>, wherein the organo(poly)siloxane residue contained in the first compound is represented by the following formula (B1): In formula (B1), R ３ are each independently a hydrocarbon group, k1 is a number of 1 or more, and * is a bonding site to an adjacent atom. <4> The composition according to any one of <1> to <3>, wherein the first compound is a compound represented by the following formula (C): In formula (C), T １１ is a monovalent group that does not contain a reactive silyl group, each B is independently —O— or —C(═O)—, each r is independently 0 or 1, and R ３ are each independently a hydrocarbon group, k1 is each independently a number of 1 or more, p1 is an integer of 1 or more, and A １１ is a (p1+q1)-valent linking group, q1 is an integer of 1 or more, R ２ are each independently a hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and each n is independently an integer of 0 to 2. <5> The composition according to <4>, wherein in formula (C), k1 is 2 to 600. <6> The composition according to <4> or <5>, wherein in formula (C), q1 is an integer of 1 to 4. <7> The composition according to any one of <1> to <6>, wherein in the second compound, the reactive silyl group b is linked to only one end of the hydrocarbon group. <8> The composition according to any one of <1> to <7>, wherein the second compound is a compound represented by formula (G). (R ７１ -R ７２ ) ｐ７ -A ７１ -(Si(R ２ ) ｎ L ３－ｎ ) ｑ２ ...(G) In formula (G), R ７１is a hydrogen atom or [(CH ３ ) ３ Q ７１ -R ７３ -] ｍ７ Q ７２ (CH ３ ) ３－ｍ７ - and Q ７１ and Q ７２ , each independently represents C or Si; R ７３ are each independently an alkylene group having 1 to 6 carbon atoms, m7 is an integer of 0 to 3, and R ７２ is an alkylene group, and when the number of carbon atoms is 2 or more, between carbon atoms, there may be any of -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and a phenylene group, ７１ is a single bond or a (p7+q2)-valent linking group, R ２ are each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, n is an integer of 0 to 2, p7 is an integer of 1 or greater, and q2 is an integer of 1 or greater. <9> The composition according to any one of <1> to <8>, wherein the second compound is a compound represented by the following formula (E): In formula (E), R Ａｋ are each independently an alkyl group; ｄ represents a single bond or a (p2+q2)-valent linking group other than an oxygen atom, p2 and q2 each independently represent an integer of 1 or more, R ２ are each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and n is an integer of 0 to 2. Ａｋ<11> The composition according to any one of <1> to <10>, wherein the second compound is a compound represented by the following formula (F): ７１ -L １ -(Si(R ２ ) ｎ L ３－ｎ ) ｑ２ ...(F) In formula (F), R ７１ is a hydrogen atom or [(CH ３ ) ３ Q ７１ -R ７３ -] ｍ７ Q ７２ (CH ３ ) ３－ｍ７ - and Q ７１ and Q ７２ , are each independently C or Si, provided that Q ７１ and Q ７２ At least one of the groups is Si, and R ７３ are each independently an alkylene group having 1 to 6 carbon atoms, m7 is an integer of 0 to 3, and L １ is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and phenylene groups, ２ are each independently a hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, n is an integer of 0 to 2, and q2 is an integer of 1 or more. １ <13> The composition according to <11>, wherein R is an alkylene group having 13 to 36 carbon atoms. １ However, (CH ３ ) ３The composition according to <11> or <12>, wherein the compound is Si-. <14> The composition according to any one of <1> to <13>, wherein the mass ratio of the second compound to the first compound is 0.01 to 0.9. <15> The composition according to any one of <1> to <14>, further comprising a liquid medium. <16> A surface treatment agent comprising the composition according to any one of <1> to <15>. <17> A method for producing an article, comprising treating a substrate with the surface treatment agent according to <16> to produce an article having a surface treatment layer formed on the substrate. <18> An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to <16>. <19> The article according to <18>, which is an optical member. <20> The article according to <18>, which is a display or a touch panel.

[0008] According to one embodiment of the present invention, there are provided a composition and a surface treatment agent capable of forming a surface treatment layer having excellent water repellency and abrasion resistance on a substrate, an article having a surface treatment layer having excellent water repellency and abrasion resistance, and a method for producing the article.

[0009] In the present disclosure, when a numerical range is indicated using "to", the numerical values ​​before and after "to" are included as the minimum and maximum values, respectively. In the present disclosure, when a numerical range is indicated in a stepped manner, the upper or lower limit value of one numerical range may be replaced with the upper or lower limit value of another stepped numerical range. Furthermore, in the numerical ranges described herein, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In the present disclosure, the term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In the present disclosure, "Me" may refer to a methyl group. In the present disclosure, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. In the present disclosure, the term "organo(poly)siloxane residue" refers to an organosiloxane residue or an organopolysiloxane residue.

[0010] [Composition] The composition of the present disclosure includes a first compound having an organo(poly)siloxane residue and a reactive silyl group a, and a second compound having a hydrocarbon group having 4 or more carbon atoms that is not directly bonded to an oxygen atom and that may have a functional group or a substituent, and a reactive silyl group b, and does not have an organo(poly)siloxane residue, and satisfies at least one of the following requirements (1) and (2): Requirement (1): In the first compound, two or more reactive silyl groups a are linked to at least one end of the organo(poly)siloxane residue. Requirement (2): In the second compound, two or more reactive silyl groups b are linked to at least one end of the hydrocarbon group.

[0011] The composition of the present disclosure can form a surface treatment layer that is excellent in water repellency and abrasion resistance. The reason why such effects are obtained is not clear, but is presumed to be as follows.

[0012] The first compound contained in the composition of the present disclosure has an organo(poly)siloxane residue, resulting in excellent water repellency. Furthermore, the second compound contained in the composition of the present disclosure has a hydrocarbon group having 4 or more carbon atoms that is not directly bonded to an oxygen atom and may have a functional group or a substituent, resulting in excellent abrasion resistance. Satisfying at least one of requirements (1) and (2) means that at least one of the first compound and the second compound has two or more reactive silyl groups linked to at least one end. In particular, since two or more reactive silyl groups are linked to at least one end, two or more reactive silyl groups can be present in close proximity to each other in one compound. Therefore, it is believed that the composition can achieve excellent adhesion to the substrate, as well as both water repellency and abrasion resistance.

[0013] Patent Documents 1 to 3 do not describe a combination of a first compound and a second compound that satisfies at least one of the above requirements (1) and (2).

[0014] Each component contained in the composition of the present disclosure will be described in detail below.

[0015] <First Compound> The first compound has an organo(poly)siloxane residue and a reactive silyl group a. The composition of the present disclosure may contain only one type of first compound, or may contain two or more types.

[0016] (Organo(poly)siloxane residue) The first compound contains an organo(poly)siloxane residue. The first compound may contain one organo(poly)siloxane residue or two or more organo(poly)siloxane residues. When the first compound contains two or more organo(poly)siloxane residues, the two or more organo(poly)siloxane residues may be the same or different.

[0017] Examples of the organo(poly)siloxane residue include linear organo(poly)siloxane residues, cyclic organo(poly)siloxane residues, and cage-shaped organo(poly)siloxane residues. Of these, the organo(poly)siloxane residue is preferably a linear organo(poly)siloxane residue, and more preferably a divalent linear organo(poly)siloxane residue.

[0018] Examples of the organo(poly)siloxane residue include linear organo(poly)siloxane residues represented by the following formula (B1) or (B2): Of these, the organo(poly)siloxane residue represented by formula (B1) is preferred.

[0019]

[0020]

[0021] In formula (B1), R ３ are each independently a hydrocarbon group, k1 is a number of 1 or more, and * is a bonding site to an adjacent atom.

[0022] In formula (B2), R ４ are each independently a hydrocarbon group or T １１ -B ｒ -(SiR ３ ２ -O) ｋ１ - and T １１are each independently a monovalent group; B is each independently -O- or -C(=O)-; r is each independently 0 or 1; R ３ are each independently a hydrocarbon group; each k1 is independently a number of 1 or more; * is a bonding site to an adjacent atom.

[0023] In formulas (B1) and (B2), R ３ Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, or an n-butyl group is more preferred, and a methyl group is even more preferred. Furthermore, the aromatic hydrocarbon group is preferably a phenyl group.

[0024] In formulas (B1) and (B2), k1 is a number of 1 or more, preferably a number from 1 to 600, more preferably a number from 1 to 500, still more preferably a number from 3 to 500, particularly preferably a number from 9 to 50, extremely preferably a number from 11 to 30, and most preferably a number from 11 to 25.

[0025] In formula (B2), R ４ are each independently a hydrocarbon group or T １１ -B ｒ -(SiR ３ ２ -O) ｋ１ -, and a hydrocarbon group is preferred. Details of the hydrocarbon group are as follows: R ３ The hydrocarbon group is the same as the hydrocarbon group represented by the following formula:

[0026] T １１ are each independently a monovalent group, and specific embodiments thereof are as shown in T in formula (C) described later. １１ Specific embodiments of B and r are the same as those of B and r in formula (C) described below.

[0027] (Reactive Silyl Group) The number of reactive silyl groups a contained in the first compound is 1 or more, and from the viewpoint of further improving the abrasion resistance of the surface treatment layer, is preferably 2 to 18, more preferably 2 to 12, still more preferably 2 to 8, and particularly preferably 2 to 4. The number of reactive silyl groups may be 1.

[0028] The reactive silyl group means a group in which a reactive group is bonded to a Si atom. The reactive group is preferably a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group.

[0029] The hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. １ The hydrolyzable silyl group represented by the formula (I) becomes a silanol group represented by Si—OH through a hydrolysis reaction. The silanol groups further react with each other to form Si—O—Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si—O—Si bonds.

[0030] Examples of the hydrolyzable group include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, an amino group, and —O—N═CR ｒ ２ and an isocyanato group (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms. R ｒ are each independently an alkyl group having 1 to 10 carbon atoms.

[0031] The group having a hydrolyzable group may be, for example, any of the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is a divalent linking group, and L Ｂ is a hydrolyzable group.Ａ The divalent linking group in L is preferably an alkylene group, and the alkylene group preferably has 1 to 10 carbon atoms, and may have an oxygen atom between carbon atoms. Ｂ The hydrolyzable group represented by the formula １ The meaning and preferred embodiments are the same as those of the hydrolyzable group represented by the following formula: ２ CH ２ -OCH ３ Examples include:

[0032] The reactive silyl group is preferably a group represented by the following formula (S1) or (S2): —Si(R ２ ) ｎ L ３－ｎ ...(S1) -[Si(L ２ ) ２ -Q] ｎ１２ -Si(L ２ ) ３ ...(S2) where R ２ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; ２ are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group; ２ At least four L ２ represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; each Q is independently an oxygen atom or an organic group having one carbon atom bonded to adjacent Si atoms on both sides; n is an integer of 0 to 2; and n12 is an integer of 1 to 3.

[0033] When a molecule contains a plurality of reactive silyl groups, the plurality of reactive silyl groups may be the same or different from each other. From the viewpoints of availability of raw materials and ease of production of the compound, it is preferable that the plurality of reactive silyl groups are the same.

[0034] R ２ are each independently a monovalent hydrocarbon group, and preferably a monovalent saturated hydrocarbon group. ２Examples of the hydrocarbon group include an alkyl group, a cycloalkyl group, an alkenyl group, and an allyl group. From the viewpoint of ease of synthesis, a saturated hydrocarbon group is preferred, and an alkyl group is more preferred. The number of carbon atoms in the hydrocarbon group is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 to 2. ２ The number of carbon atoms is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2.

[0035] Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. ２ are each independently a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group. ２ The details of the hydrolyzable group in are as described above.

[0036] Among them, L and L ２ From the viewpoint of ease of production of the compound, L and L are preferably an alkoxy group having 1 to 4 carbon atoms, an alkylene oxide-modified alkoxy group, or a halogen atom. ２ is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably an ethoxy group or a methoxy group, in terms of less outgassing during coating and better storage stability of the compound.

[0037] n is an integer of 0 to 2, preferably 0 or 1, and more preferably 0. The presence of a plurality of Ls strengthens the adhesion of the surface treatment layer to the substrate.

[0038] n12 is an integer of 1 to 3, preferably 1 or 2, and more preferably 1, from the viewpoint of ease of synthesis.

[0039] Multiple L or L present in one molecule ２ In terms of availability of raw materials and ease of production of the compound, it is preferable that multiple Ls are the same. ２ may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of R ２ are preferably the same.

[0040] Each Q is independently an oxygen atom or an organic group having one carbon atom bonded to adjacent Si atoms on both sides. Here, "an organic group having one carbon atom bonded to adjacent Si atoms on both sides" means that Si atoms are linked to each other via one carbon atom. An example of the organic group in Q is -CR ８ ２ -, where R ８ are each independently a hydrogen atom or a hydrocarbon group. ８ The hydrocarbon group in the formula (I) is an alkyl group having 1 to 6 carbon atoms, and preferably an alkyl group having 1 to 3 carbon atoms. From the viewpoint of durability of the surface treatment layer, Q is preferably an oxygen atom, —CH ２ -, or -C(CH ３ ) ２ - is preferred, and an oxygen atom or -CH ２ - is more preferred, and an oxygen atom is even more preferred.

[0041] The group (S2) is —[Si(OR １８ ) ２ -O] ｎ１２ -Si(OR １８ ) ３ is preferred, and among these, -Si(OR １８ ) ２ —O—Si(OR １８ ) ３ is particularly preferred. １８ R are each independently a hydrocarbon group. Examples of the hydrocarbon group include an alkyl group, a cycloalkyl group, an alkenyl group, and an allyl group. From the viewpoint of ease of synthesis, a saturated hydrocarbon group is preferred, and an alkyl group is more preferred. ２ The number of carbon atoms is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2.

[0042] Specific examples of the group (S2) include —Si(OCH ３ ) ２ —O—Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ -CH ２ -Si(OCH ３ ) ３ , -Si(OCH３ ) ２ -C(CH) ３ ) ２ -Si (OCH) ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -O-Si(OCH ３ ) ３ ,-Si(OCH ３ ) ２ -O-Si(OCH ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -O-Si(OCH ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -CH ２ -Si(OCH ３ ) ３ ,-Si(OCH ３ ) ２ -CH ２ -Si (OCH) ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -CH ２ -Si (OCH) ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -C(CH) ３ ) ２ -Si(OCH ３ ) ３ ,-Si(OCH ３ ) ２ -C(CH) ３ ) ２ -Si(OCH ２ CH ３ ) ３ ,-Si(OCH ２ CH ３ ) ２ -C(CH) ３ ) ２ -Si(OCH２ CH ３ ) ３ , —Si(OH) ２ —O—Si(OH) ３ , —Si(OH) ２ —O—Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ —O—Si(OH) ３ , —Si(OH) ２ -CH ２ -Si(OH) ３ , —Si(OH) ２ -CH ２ -Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ -CH ２ -Si(OH) ３ , —Si(OH) ２ -C(CH ３ ) ２ -Si(OH) ３ , —Si(OH) ２ -C(CH ３ ) ２ -Si(OCH ３ ) ３ , -Si(OCH ３ ) ２ -C(CH ３ ) ２ -Si(OH) ３ Examples include:

[0043] From the viewpoint of excellent uniformity and durability of the surface treatment layer, the reactive silyl group is preferably an alkoxysilyl group or a trichlorosilyl group. From the viewpoint of ease of handling of by-products generated in the reaction with the substrate, the reactive silyl group is more preferably an alkoxysilyl group. As the alkoxysilyl group, a dialkoxysilyl group or a trialkoxysilyl group is preferred, and a trialkoxysilyl group is more preferred.

[0044] The reactive silyl group may be a group represented by the following formula (S3): >SiL ２ ...(S3) L is the same as L in formula (S1).

[0045] The number average molecular weight (Mn) of the first compound is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. When Mn is 500 or more, the abrasion resistance of the surface treatment layer is superior. When Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range and solubility is improved, resulting in excellent handling properties during film formation.

[0046] The composition of the present disclosure may contain impurities such as by-products produced in the manufacturing process of the first compound.

[0047] The content of the first compound is preferably 0.001 to 50 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the first compound may be 0.01 to 10 mass%, 0.02 to 5 mass%, 0.03 to 3 mass%, or 0.05 to 2 mass%, relative to the total amount of the composition of the present disclosure.

[0048] Examples of the first compound include a compound having a chain organo(poly)siloxane residue and a reactive silyl group linked to only one end of the chain organo(poly)siloxane residue (hereinafter also referred to as "first compound S"), and a compound having a chain organo(poly)siloxane residue and a reactive silyl group linked to both ends of the chain organo(poly)siloxane residue (hereinafter also referred to as "first compound D"). As the first compound, first compound S may be used alone, first compound D may be used alone, or first compound S and first compound D may be used in combination. In either case, one type of first compound S may be used alone, or two or more types may be used in combination. As the first compound D, one type of first compound D may be used alone, or two or more types may be used in combination.

[0049] [First Compound S] The first compound S has a linear organo(poly)siloxane residue and a reactive silyl group linked to only one end of the linear organo(poly)siloxane residue. In the present disclosure, the term "reactive silyl group linked to only one end of the linear organo(poly)siloxane residue" refers to a reactive silyl group linked to only one end of the linear organo(poly)siloxane residue, either directly or indirectly via another chemical structure.

[0050] (Chained Organo(Poly)siloxane Residue) The first compound S contains a chained organo(poly)siloxane residue. The chained organo(poly)siloxane residue contained in the first compound S may be one or two or more. When the first compound S contains two or more chained organo(poly)siloxane residues, the two or more chained organo(poly)siloxane residues may be the same or different. When the first compound S contains two or more chained organo(poly)siloxane residues, it is sufficient that there is no chained organo(poly)siloxane residue having reactive silyl groups linked to both terminals, and that at least one chained organo(poly)siloxane residue has a reactive silyl group linked to one terminal.

[0051] Details of the linear organo(poly)siloxane residue are as described above in the section on the linear organo(poly)siloxane residue contained in the first compound. In particular, the linear organo(poly)siloxane residue is preferably represented by formula (B1) or (B2), and more preferably represented by formula (B1).

[0052] (Reactive Silyl Group) Details of the reactive silyl group are as described above in the section on the reactive silyl group contained in the first compound. The number of reactive silyl groups contained in the first compound S is one or more per one end of the linear organo(poly)siloxane residue, and from the viewpoint of further improving the abrasion resistance of the surface treatment layer, it is preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, and particularly preferably 1 to 6 per one end of the linear organo(poly)siloxane residue. In one aspect, the number of reactive silyl groups contained in the first compound S is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, and particularly preferably 2 to 6 per one end of the linear organo(poly)siloxane residue. The number of reactive silyl groups may be one per one end of the linear organo(poly)siloxane residue.

[0053] (Compound (C)) In one embodiment, the first compound S is preferably represented by the following formula (C).

[0054]

[0055] In formula (C), T １１ is a monovalent group that does not contain a reactive silyl group, each B is independently —O— or —C(═O)—, each r is independently 0 or 1, and R ３ are each independently a hydrocarbon group, k1 is each independently a number of 1 or more, p1 is an integer of 1 or more, and A １１ is a (p1+q1)-valent linking group, q1 is an integer of 1 or more, R ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and each n is independently an integer of 0 to 2.

[0056] In formula (C), R ３ and k1 is R in formula (B1). ３ and k1. R ２ , L, and n are R in formula (S1). ２ , L, and n.

[0057] In formula (C), T１１ is a monovalent group. １１ Examples of the alkyl group include alkyl groups, T １ ３ M １ - (where M １ is Si, Sn, or Ge, and T １ are each independently a hydrocarbon group or a trialkylsilyloxy group; T １ ３ M １ -R １ - (where M １ is Si, Sn, or Ge, and T １ are each independently a hydrocarbon group or a trialkylsilyloxy group, and R １ represents an alkylene group), a monovalent cyclic polysiloxane residue or a monovalent cage-like polysiloxane residue, and a combination of a monovalent cyclic polysiloxane residue or a monovalent cage-like polysiloxane residue with a divalent hydrocarbon group.

[0058] T １１ The alkyl group represented by the formula (I) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, with a linear alkyl group or a branched alkyl group being preferred. The alkyl group may have 1 carbon atom or 2 or more carbon atoms. When the alkyl group has 2 or more carbon atoms, the number of carbon atoms is preferably 2 to 30, more preferably 3 to 28, and even more preferably 4 to 22.

[0059] T １ ３ M １ - and T １ ３ M １ -R １ M in - １ As the element, Si is preferred.

[0060] T １ ３ M １ - and T １ ３ M １ -R １ T in - １As the group, an alkyl group or a trialkylsilyloxy group is preferable, and a methyl group, a butyldimethylsilyloxy group, a trimethylsilyloxy group, or a triethylsilyloxy group is more preferable.

[0061] R １ As the alkylene group, an alkylene group having 1 to 20 carbon atoms is preferable, an alkylene group having 1 to 10 carbon atoms is more preferable, an alkylene group having 1 to 5 carbon atoms is even more preferable, and an ethylene group is particularly preferable.

[0062] In one embodiment, T １１ is preferably an alkyl group or a trialkylsilyl group, more preferably a methyl group or a trimethylsilyl group.

[0063] The monovalent cyclic polysiloxane residue is preferably a group represented by the following formula (T1): Ｔ are each independently a hydrocarbon group or a hydrocarbon group having a substituent, and s is an integer of 1 to 4.

[0064]

[0065] R Ｔ Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group.

[0066] R Ｔ Among the hydrocarbon groups represented by the formula (I), the alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 1 to 4. Specifically, the alkyl group is preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and more preferably a methyl group.

[0067] R ＴExamples of the hydrocarbon group contained in the hydrocarbon group having a substituent represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group contained in the substituted alkyl group is preferably 1 to 10, more preferably 1 to 8, and even more preferably 2 to 4.

[0068] R Ｔ Examples of the substituent in the hydrocarbon group having a substituent represented by the formula (I) include a halogen atom, a hydroxyl group, an alkoxy group, a trialkylsilyl ether group, a trialkylsilyl group, an amino group, a nitro group, a cyano group, a sulfonyl group, and a trifluoromethyl group.

[0069] Multiple R Ｔ may be the same or different from each other, but from the viewpoint of ease of production, it is preferable that they are the same.

[0070] Examples of the monovalent cyclic polysiloxane residue include the following groups.

[0071]

[0072] The monovalent cage-like polysiloxane residue is preferably a group represented by the following formula (T2): ５ are each independently a hydrocarbon group or a trialkylsilyloxy group.

[0073]

[0074] R ５Examples of the hydrocarbon group represented by the formula (I) include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group or a branched alkyl group is preferred, and a methyl group, an ethyl group, an n-propyl group, an n-butyl group, or an isobutyl group is more preferred, and an isobutyl group is even more preferred.

[0075] R ５ The alkyl group contained in the trialkylsilyloxy group represented by the formula (R) may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but is preferably a linear alkyl group, more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group. ５ is a trialkylsilyloxy group, the three alkylsilyloxy groups may be the same or different from one another, but from the viewpoint of ease of production, they are preferably the same.

[0076] Examples of the monovalent cage-like polysiloxane residue include the following groups.

[0077]

[0078] The divalent hydrocarbon group in the combination of the monovalent cyclic polysiloxane residue or the monovalent cage polysiloxane residue with the divalent hydrocarbon group is, for example, an alkylene group, preferably having 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 5 carbon atoms.

[0079] In formula (C), each B is independently -O- or -C(=O)-, and -O- is preferable. In formula (C), r is 0 or 1. When r is 0, T １１ is directly bonded to Si.

[0080] In formula (C), p1 is an integer of 1 or more, preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1. When p1 is 2 or more, a plurality of T １１ -B ｒ -[Si(R ３) ２ -O] ｋ１ -Si(R ３ ) ２ - may be the same or different from each other.

[0081] In formula (C), A １１ is a (p1+q1)-valent linking group. １１ Examples of the alkylene group include an alkylene group, an organo(poly)siloxane residue, a polyalkylene oxide group, and combinations thereof; and combinations thereof with a (p1+1)-valent group and / or a (q1+1)-valent group. Examples of the alkylene group include an alkylene group having 1 to 30 carbon atoms, preferably an alkylene group having 1 to 20 carbon atoms, which may or may not have an etheric oxygen atom. Examples of the organo(poly)siloxane residue include a group represented by the above formula (B1). Examples of the polyalkylene oxide group include a group represented by the formula (XO) ｍ Here, X is independently an alkylene group having 1 to 5 carbon atoms, and m is an integer of 1 or more. The number of carbon atoms in X is preferably 1 to 4, more preferably 2 or 3. m is preferably 1 to 200, more preferably 1 to 20, and even more preferably 1 to 10. A １１ As the compound represented by the formula A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ Examples of the A in the above formula include:

[0082] In formula (C), q1 is an integer of 1 or more, preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, particularly preferably 1 to 6, and extremely preferably 1 to 4. In one embodiment, q1 is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, particularly preferably 2 to 6, and extremely preferably 2 to 4. q1 may be 1. When q1 is an integer of 2 or more, a plurality of [Si(R ２ ) ｎ L ３－ｎ ] may be the same or different from each other.

[0083] In one embodiment, T in formula (C) １１is preferably a trialkylsilyl group or an alkyl group, more preferably a trimethylsilyl group or a methyl group. B is preferably O, and r is 0 or 1. ３ is preferably a methyl group. k1 is preferably 2 to 600, more preferably 3 to 500, even more preferably 6 to 50, particularly preferably 6 to 30, and most preferably 6 to 25. p1 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably 1. A １１ represents an alkylene group having 1 to 30 carbon atoms, or a group selected from the group (3-1A) to Si(R ２ ) ｎ L ３－ｎ is preferably an alkylene group having 1 to 30 carbon atoms, or a group selected from the group (3-1A-4) to Si(R ２ ) ｎ L ３－ｎ q1 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably 2 or 3.

[0084] The number average molecular weight (Mn) of the first compound S is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. In one embodiment, the Mn of the first compound S may be 500 to 5,000 or 500 to 3,000. When Mn is 500 or more, the abrasion resistance of the surface treatment layer is superior. When Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range, and the solubility is improved, resulting in excellent handleability during film formation.

[0085] The composition of the present disclosure may contain only one type of first compound S, or may contain two or more types.

[0086] The composition of the present disclosure may contain impurities such as by-products produced in the manufacturing process of the first compound S.

[0087] The content of the first compound S is preferably 0.001 to 50 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the first compound may be 0.01 to 10 mass%, 0.02 to 5 mass%, 0.03 to 3 mass%, or 0.05 to 2 mass%, relative to the total amount of the composition of the present disclosure.

[0088] The content of the first compound S is preferably 5% by mass or more and less than 65% by mass, more preferably 10 to 64% by mass, may be 20 to 60% by mass, or may be 30 to 50% by mass, relative to the total solid content of the composition of the present disclosure.

[0089] [First Compound D] The first compound D has a linear organo(poly)siloxane residue and reactive silyl groups linked to both ends of the linear organo(poly)siloxane residue. In the present disclosure, the term "reactive silyl groups linked to both ends of the linear organo(poly)siloxane residue" refers to reactive silyl groups linked to both ends of the linear organo(poly)siloxane residue directly or indirectly via other chemical structures.

[0090] (Chained Organo(Poly)siloxane Residue) The first compound D contains a chained organo(poly)siloxane residue. The number of chained organo(poly)siloxane residues contained in the first compound D may be one or two or more. When the first compound D contains two or more chained organo(poly)siloxane residues, the two or more chained organo(poly)siloxane residues may be the same or different. When the first compound D contains two or more chained organo(poly)siloxane residues, it is sufficient that reactive silyl groups are linked to both terminal sides of at least one chained organo(poly)siloxane residue.

[0091] Details of the linear organo(poly)siloxane residue are as described above in the section on the linear organo(poly)siloxane residue contained in the specific silane compound. In particular, the linear organo(poly)siloxane residue is preferably represented by formula (B1) or (B2), and more preferably represented by formula (B1).

[0092] (Reactive Silyl Group) Details of the reactive silyl group are as described above in the section on the reactive silyl group contained in the specific silane compound. The number of reactive silyl groups contained in the first compound D is one or more per one end of the linear organo(poly)siloxane residue, and from the viewpoint of further improving the abrasion resistance of the surface treatment layer, it is preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, and particularly preferably 1 to 6 per one end of the linear organo(poly)siloxane residue. In one aspect, the number of reactive silyl groups contained in the first compound D is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, and particularly preferably 2 to 6 per one end of the linear organo(poly)siloxane residue. The number of reactive silyl groups may be one per one end of the linear organo(poly)siloxane residue.

[0093] (Compound (D)) In one embodiment, the first compound D is preferably represented by the following formula (D).

[0094]

[0095] In formula (D), R ４ are each independently a hydrocarbon group or T １１ -B ｒ -(SiR ３ ２ -O) ｋ１ - and T １１ are each independently a monovalent group; B is each independently -O- or -C(=O)-; r is each independently 0 or 1; R ３ are each independently a hydrocarbon group; k1 is each independently a number of 1 or more; A １２ are each independently a (q1+1)-valent linking group, each q1 is independently an integer of 1 or more, R ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and each n is independently an integer of 0 to 2.

[0096] In formula (D), R ４and k1 is R in formula (B2). ４ and k1. R ２ , L, and n are R in formula (S1). ２ , L, and n.

[0097] A １２ Examples of the alkylene group include an alkylene group, an organo(poly)siloxane residue, a polyalkylene oxide group, and combinations thereof; as well as combinations of these with a (q1+1)-valent group. Examples of the alkylene group include alkylene groups having 1 to 30 carbon atoms, preferably alkylene groups having 1 to 20 carbon atoms, which may or may not have an etheric oxygen atom. Examples of the organo(poly)siloxane residue include groups represented by the above formula (B1) or (B2). Examples of the polyalkylene oxide group include groups represented by the formula (XO) ｍ Here, X is independently an alkylene group having 1 to 5 carbon atoms, and m is an integer of 1 or more. The number of carbon atoms in X is preferably 1 to 4, more preferably 2 or 3. m is preferably 1 to 100, more preferably 1 to 10, and even more preferably 1 to 5. A １２ As the compound represented by the formula A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ In the above formula, A is a (q1+1)-valent group.

[0098] Each q1 is independently an integer of 1 or more, and each q1 is independently preferably 1 to 18, more preferably 1 to 12, even more preferably 1 to 8, particularly preferably 1 to 6, and extremely preferably 1 to 4. In one embodiment, q1 is preferably 2 to 18, more preferably 2 to 12, even more preferably 2 to 8, particularly preferably 2 to 6, and extremely preferably 2 to 4. q1 may be 1. When q1 is an integer of 2 or more, a plurality of [Si(R ２ ) ｎ L ３－ｎ ] may be the same or different from each other.

[0099] In one embodiment, R ４is preferably a methyl group. k1 is preferably 2 to 600, more preferably 3 to 500, still more preferably 6 to 50, particularly preferably 6 to 30, and most preferably 6 to 25. A １２ represents an alkylene group having 1 to 30 carbon atoms, or a group selected from the group (3-1A) to Si(R ２ ) ｎ L ３－ｎ is preferably an alkylene group having 1 to 30 carbon atoms, or a group selected from the group (3-1A-4) to Si(R ２ ) ｎ L ３－ｎ q1 is preferably an integer of 1 to 15, more preferably an integer of 1 to 6, even more preferably an integer of 1 to 4, and particularly preferably 2 or 3.

[0100] The number average molecular weight (Mn) of the first compound D is preferably 500 to 20,000, more preferably 600 to 18,000, and even more preferably 700 to 15,000. In one embodiment, the Mn of the first compound D may be 500 to 5,000, or may be 500 to 3,000.

[0101] If Mn is 500 or more, the abrasion resistance of the surface treatment layer is superior. If Mn is 20,000 or less, the viscosity can be easily adjusted within an appropriate range, and the solubility is improved, resulting in excellent handling properties during film formation.

[0102] The composition of the present disclosure may contain only one type of first compound D, or may contain two or more types.

[0103] The composition of the present disclosure may contain impurities such as by-products produced in the manufacturing process of the first compound D.

[0104] The content of the first compound D is preferably 0.001 to 50 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the first compound D may be 0.01 to 10 mass%, 0.02 to 5 mass%, 0.03 to 3 mass%, or 0.05 to 2 mass%, relative to the total amount of the composition of the present disclosure.

[0105] The content of the first compound D is preferably more than 35% by mass and not more than 95% by mass, more preferably 36 to 90% by mass, may be 40 to 80% by mass, or may be 50 to 70% by mass, relative to the total solid content of the composition of the present disclosure.

[0106] [Partial Structure of First Compound S and First Compound D] Hereinafter, A in formula (C) １１ (Si(R ２ ) ｎ L ３－ｎ ) ｑ１ and A in formula (D) １２ (Si(R ２ ) ｎ L ３－ｎ ) ｑ１ A preferred embodiment of the formula (C) will be described below. １１ (Si(R ２ ) ｎ L ３－ｎ ) ｑ１ and A in formula (D) １２ (Si(R ２ ) ｎ L ３－ｎ ) ｑ１ A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ However, in the case of formula (C), A is a (p1+q1)-valent group, and in the case of formula (D), A is a (q1+1)-valent group.

[0107] A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ The group represented by the formula (3-1A) is preferably the group (3-1A) or the group (3-1B), and more preferably the group (3-1A).

[0108] -Q ａ -X ３１ (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) ｈ (-R ３１ ) ｉ …(3-1A) -Q ｃ - [CH ２ C (R ３２ ) (-Q ｄ -Si(R ２ ) ｎ L ３－ｎ )] ｙ -R ３３ ...(3-1B) In addition, in the formula (3-1A) and the formula (3-1B), R ２ , L, and n are defined as above.

[0109] In formula (3-1A), Q ａ is a single bond or a divalent linking group. Examples of the divalent linking group include a divalent hydrocarbon group, a divalent heterocyclic group, —O—, —S—, and —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ - and groups obtained by combining two or more of these. The divalent hydrocarbon group may be a divalent saturated hydrocarbon group, a divalent aromatic hydrocarbon group, an alkenylene group, or an alkynylene group. The divalent saturated hydrocarbon group may be linear, branched, or cyclic, and examples thereof include alkylene groups. The alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, still more preferably 4 to 20, and particularly preferably 5 to 15. Furthermore, the divalent aromatic hydrocarbon group preferably has 5 to 20 carbon atoms, and examples thereof include a phenylene group. In addition, the group may be an alkenylene group having 2 to 20 carbon atoms or an alkynylene group having 2 to 20 carbon atoms. The R ａ is an alkyl group (preferably having 1 to 10 carbon atoms) or a phenyl group. ｄis a hydrogen atom or an alkyl group (preferably having 1 to 10 carbon atoms). Examples of groups formed by combining two or more of these groups include -OC(O)-, -C(O)O-, -C(O)S-, and -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —OC(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ an alkylene group having —SO ２ N (R ｄ )- and alkylene groups -Si(R ａ ) ２ -phenylene group -Si(R ａ ) ２ Examples include:

[0110] In formula (3-1A), X ３１ is a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organo(poly)siloxane residue, or a group having a (h+i+1)-valent ring. The alkylene group may have -O-, a silphenylene skeleton group, a divalent organo(poly)siloxane residue, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeleton group, a divalent organo(poly)siloxane residue, and a dialkylsilylene group. X ３１The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, and more preferably 1 to 10. Examples of the divalent to octavalent organo(poly)siloxane residue include a divalent organo(poly)siloxane residue and a (w2+1)-valent organo(poly)siloxane residue described below.

[0111] In formula (3-1A), X ３１ is a group having a (h+i+1)-valent ring, Q ａ , (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) and R ３１ is directly bonded to an atom constituting the ring, provided that the ring is a ring other than an organopolysiloxane ring. ３１ The ring in may be any of a monocycle, a fused polycycle, a bridged ring, a spiro ring, and an aggregate polycycle, and the atoms constituting the ring may be a carbocycle consisting of only carbon atoms, or a heterocycle consisting of a heteroatom having a valence of divalent or higher and a carbon atom. The bond between the atoms constituting the ring may be a single bond or a multiple bond. Furthermore, the ring may be an aromatic ring or a non-aromatic ring. As the monocycle, a 4- to 8-membered ring is preferred, and a 5- or 6-membered ring is more preferred. As the fused polycycle, a fused polycycle in which two or more 4- to 8-membered rings are fused is preferred, and a fused polycycle in which two or three rings selected from 5- and 6-membered rings are bonded, and a fused polycycle in which one or two rings selected from 5- or 6-membered rings are bonded to one 4-membered ring are more preferred. The bridged ring is preferably a bridged ring having a 5-membered or 6-membered ring as the largest ring, and the spiro ring is preferably a spiro ring consisting of two 4- to 6-membered rings. The assembled polycycle is preferably an assembled polycycle in which two or three rings selected from the 5-membered and 6-membered rings are bonded via a single bond, 1 to 3 carbon atoms, or one heteroatom having a valence of 2 or 3. In the assembled polycycle, each ring may have a Q ａ , (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) and R ３１(when i = 1 or more) is preferably bonded. As heteroatoms constituting the ring, nitrogen atoms, oxygen atoms, and sulfur atoms are preferred, and nitrogen atoms and oxygen atoms are more preferred. The number of heteroatoms constituting the ring is preferably 3 or less. Furthermore, when the number of heteroatoms constituting the ring is 2 or more, the heteroatoms may be different.

[0112] X ３１ In terms of ease of production of the compound and further improved abrasion resistance of the surface treatment layer, the ring in the formula (I) is preferably one selected from the group consisting of a 3- to 8-membered aliphatic ring, a benzene ring, a 3- to 8-membered heterocyclic ring, a fused ring in which two or three of these rings are fused, a bridged ring in which the largest ring is a 5- or 6-membered ring, and an assembled polycyclic ring having two or more of these rings and in which the linking group is a single bond, an alkylene group having 3 or less carbon atoms, an oxygen atom, or a sulfur atom. Preferred rings are a benzene ring, a 5- or 6-membered aliphatic ring, a 5- or 6-membered heterocyclic ring having a nitrogen atom or an oxygen atom, and a fused ring of a 5- or 6-membered carbocyclic ring with a 4- to 6-membered heterocyclic ring. Specific examples of the ring include the rings shown below, as well as a 1,3-cyclohexadiene ring, a 1,4-cyclohexadiene ring, an anthracene ring, a cyclopropane ring, a decahydronaphthalene ring, a norbornene ring, a norbornadiene ring, a furan ring, a pyrrole ring, a thiophene ring, a pyrazine ring, a morpholine ring, an aziridine ring, an isoquinoline ring, an oxazole ring, an isoxazole ring, a thiazole ring, an imidazole ring, a pyrazole ring, a pyran ring, a pyridazine ring, a pyrimidine ring, and an indene ring. Rings having an oxo group (═O) are also shown below.

[0113]

[0114] X ３１ The bond that does not constitute the ring of the atom that constitutes the ring in ａ , (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) or R ３１When there are remaining bonds, the remaining bonds are bonded to a hydrogen atom or a substituent. Examples of the substituent include a halogen atom, an alkyl group (which may contain an etheric oxygen atom between carbon atoms), a cycloalkyl group, an alkenyl group, an allyl group, an alkoxy group, and an oxo group (=O). In addition, when one of the carbon atoms constituting the ring is bonded to Q ａ , (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) or R ３１ When there are two bonds bonded to one of the carbon atoms, Q ａ and (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) may be bonded to two (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) may be bonded to ａ and (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) or R ３１ It is preferable that h (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) may be bonded to different ring-constituting atoms, and two of them may be bonded to one ring-constituting carbon atom, and two (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ There may be two or more ring-constituting carbon atoms to which i R ３１ may be bonded to different ring-constituting atoms, and two of them may be bonded to one ring-constituting carbon atom, and two R ３１ There may be two or more ring-constituting carbon atoms to which is bonded.

[0115] Among them, X ３１From the viewpoint of improving the abrasion resistance of the surface treatment layer, is preferably a carbon atom, a nitrogen atom, a silicon atom, a tetravalent to octavalent organo(poly)siloxane residue, or a group having a (h+i+1)-valent ring, and more preferably a carbon atom.

[0116] In formula (3-1A), Q ｂ is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q ａ This is the same as the definition explained in

[0117] Among them, Q ｂ is preferably an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10, 2 to 6, or 2 to 5. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0118] In formula (3-1A), R ３１ represents a hydrogen atom, a hydroxyl group, or an alkyl group. The alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms, and even more preferably 1 carbon atom.

[0119] X ３１ When X is a single bond or an alkylene group, h is 1 and i is 0; ３１ is a nitrogen atom, h is an integer of 1 to 2, i is an integer of 0 to 1, and h+i=2 is satisfied; ３１ is a carbon atom or a silicon atom, h is an integer of 1 to 3, i is an integer of 0 to 2, and h+i=3 is satisfied; ３１ When X is a divalent to octavalent organo(poly)siloxane residue, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7. ３１ is a group having a (h+i+1)-valent ring, h is an integer of 1 to 7, i is an integer of 0 to 6, and h+i=1 to 7 is satisfied. ｂ -Si(R) ｎ L ３－ｎ If there are two or more (-Q ｂ -Si(R) ｎ L ３－ｎ) may be the same or different. ３１ If there are two or more, there are two or more (-R ３１ ) may be the same or different.

[0120] In particular, it is preferable that i is 0 from the viewpoint of improving the abrasion resistance of the surface treatment layer.

[0121] In formula (3-1B), Q ｃ is a single bond or a divalent linking group. The definition of a divalent linking group is the same as that of Q ａ This is the same as the definition explained in

[0122] In formula (3-1B), R ３２ is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and is preferably a hydrogen atom in view of ease of production of the compound. As the alkyl group, a methyl group is preferred.

[0123] In formula (3-1B), Q ｄ is a single bond or an alkylene group. The number of carbon atoms in the alkylene group is preferably 1 to 10, more preferably 1 to 6. From the viewpoint of ease of production of the compound, Q ｄ is a single bond or CH ２ It is preferable that −.

[0124] In formula (3-1B), R ３３ is a hydrogen atom or a halogen atom, and is preferably a hydrogen atom in view of ease of producing the compound.

[0125] y is an integer of 1 to 10, preferably an integer of 1 to 6. ２ C (R ３２ ) (-Q ｄ -Si(R ２ ) ｎ L ３－ｎ ) )] may be the same or different.

[0126] As the group (3-1A), groups (3-1A-1) to (3-1A-7) are preferred.

[0127] -(X ３２ ) ｓ１ -Q ｂ１ -Si(R ２ )ｎ L ３－ｎ …(3 - 1A - 1) - (X ３３ ) ｓ２ - Q ａ２ - N[-Q ｂ２ - Si(R ２ ) ｎ L ３－ｎ ２ …(3 - 1A - 2) - Q ａ３ - Si(R ｇ )[-Q ｂ３ - Si(R ２ ) ｎ L ３－ｎ ２ …(3 - 1A - 3) - [Q ｅ ｓ４ - Q ａ４ - (O) ｔ４ - C[-(O) ｕ４ - Q ｂ４ - Si(R ２ ) ｎ [[ID=4​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​​, L, and n are defined as above.

[0128] Among these, the group (3-1A) is preferably the group (3-1A-4).

[0129] In the group (3-1A-1), X ３２ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )-; or a combination of these with a divalent linking group (wherein N in the formula is Q ｂ１ (Binds to R ｄ The definition of is as described above. s1 is 0 or 1.

[0130] X ３２ However, -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )- and a divalent linking group, the divalent linking group is Si(R ３ ) ２ or Si(R ４ ) ２ The divalent linking group includes an alkylene group, an organo(poly)siloxane residue, a polyalkylene oxide group, and combinations thereof.

[0131] Q ｂ１is a single bond or an alkylene group. The alkylene group may have -O-, a silphenylene skeletal group, or a dialkylsilylene group. The alkylene group may have a plurality of groups selected from the group consisting of -O-, a silphenylene skeletal group, a divalent organo(poly)siloxane residue, and a dialkylsilylene group. When the alkylene group has -O-, a silphenylene skeletal group, a divalent organo(poly)siloxane residue, or a dialkylsilylene group, it is preferable that these groups be present between carbon atoms. Q ｂ１ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, still more preferably 2 to 20, and particularly preferably 2 to 6. The number of carbon atoms may also be 1 to 10.

[0132] In the group (3-1A-2), X ３３ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )-; or a combination of these with a divalent linking group. ｄ The definition of is as described above. s2 is 0 or 1. s2 is preferably 0 in view of ease of production of the compound.

[0133] X ３３ However, -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(Rｄ )- and a divalent linking group, the divalent linking group is Si(R ３ ) ２ or Si(R ４ ) ２ The divalent linking group includes an alkylene group, an organo(poly)siloxane residue, a polyalkylene oxide group, and combinations thereof.

[0134] Q ａ２ represents a single bond, an alkylene group, -C(O)-, or an etheric oxygen atom, -C(O)-, -C(O)O-, -OC(O)-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ )- or -NH-. ａ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 3. ａ２ an etheric oxygen atom between carbon atoms of an alkylene group having two or more carbon atoms, represented by —C(O)—, —C(O)O—, —OC(O)—, —C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ The group having — or —NH— preferably has 2 to 10 carbon atoms, more preferably 2 to 6 carbon atoms.

[0135] Q ａ２ is preferably a single bond in terms of ease of production of the compound.

[0136] Q ｂ２ is an alkylene group or a group having a divalent organo(poly)siloxane residue, an etheric oxygen atom, or —NH— between carbon atoms of an alkylene group having two or more carbon atoms. ｂ２ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ２ The number of carbon atoms in the divalent organo(poly)siloxane residue, the etheric oxygen atom, or the group having —NH— between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the following formula (I), is preferably 2 to 10, and more preferably 2 to 6.

[0137] Q ｂ２ As the compound, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0138] Two [-Q ｂ２ -Si(R ２ ) ｎ L ３－ｎ ] may be the same or different.

[0139] In the group (3-1A-3), Q ａ３ is a single bond or an alkylene group which may have an etheric oxygen atom. ａ３ The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms.

[0140] R ｇ is a hydrogen atom, a hydroxyl group, or an alkyl group.ｇ From the viewpoint of ease of production of the compound, a hydrogen atom or an alkyl group is preferred. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 4 carbon atoms, and further preferably is a methyl group.

[0141] Q ｂ３ is an alkylene group or a group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ３ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ３ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ３ is preferably -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - or -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - is preferred.

[0142] Two [-Q ｂ３ -Si(R ２ ) ｎ L ３－ｎ ] may be the same or different.

[0143] In the group (3-1A-4), Q ｅ is -C(O)O-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)- or -C(O)N(Rｄ )-; or a combination of these with a divalent linking group. ｅ is -C(O)O-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)- or -C(O)N(R ｄ )- and a divalent linking group, the divalent linking group is Si(R ３ ) ２ or Si(R ４ ) ２ Examples of the divalent linking group include an alkylene group, an organo(poly)siloxane residue, a polyalkylene oxide group, and combinations thereof. ３１ The definition of is as described above. When w1 is 1 or 2, R ３１ is preferably a hydrogen atom. s4 is 0 or 1. Q ａ４ is a single bond or an alkylene group which may have an etheric oxygen atom. The number of carbon atoms in the alkylene group which may have an etheric oxygen atom is preferably 1 to 20, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 3. t4 is 0 or 1 (provided that Q ａ４ If -Q is a single bond, it is 0. ａ４ -(O) ｔ４ When s4 is 0, a single bond or —CH ２ O-, -CH ２ OCH ２ -, -CH ２ OCH ２ CH ２ O-, -CH ２ OCH ２ CH ２ OCH ２ -, -CH ２ OCH ２ CH ２ CH ２ CH ２ OCH ２ When s4 is 1, a single bond or —CH ２ -, -CH２ CH ２ - is preferred.

[0144] Q ｂ４ is an alkylene group, and the alkylene group is —O—, —C(O)N(R ｄ )-(R ｄ The definition of is as described above. ), may have a silphenylene skeleton group, a divalent organo(poly)siloxane residue, or a dialkylsilylene group. When the alkylene group has -O- or a silphenylene skeleton group, it is preferable that the alkylene group has -O- or a silphenylene skeleton group between carbon atoms. In addition, when the alkylene group is -C(O)N(R ｄ )-, dialkylsilylene group or divalent organo(poly)siloxane residue, carbon atom-carbon atom or (O) ｕ４ It is preferable that these groups are present at the end of the bond with Q. ｂ４ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and still more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10.

[0145] u4 is 0 or 1. -(O) ｕ４ -Q ｂ４ As the -, -CH is preferred from the viewpoint of ease of production of the compound. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ CH ２ CH ２ CH ２ -, -OCH ２ CH ２ CH ２ -, -OSi(CH ３ ) ２ CH ２ CH ２ CH ２-, -OSi(CH ３ ) ２ OSi(CH ３ ) ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ Si(CH ３ ) ２ PhSi(CH ３ ) ２ CH ２ CH ２ - is preferred (where the right side is bonded to Si).

[0146] w1 is an integer of 0 to 2, preferably 0 or 1, and more preferably 0. [-(O) ｕ４ -Q ｂ４ -Si(R ２ ) ｎ L ３－ｎ If there are two or more [-(O) ｕ４ -Q ｂ４ -Si(R ２ ) ｎ L ３－ｎ ] may be the same or different. ３１ If there are two or more, there are two or more (-R ３１ ) may be the same or different.

[0147] In the group (3-1A-5), Q ａ５ is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. ａ５ As the compound, -OCH ２ CH ２ CH ２ -, -OCH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２- is preferred (where the right side is bonded to Si).

[0148] Q ｂ５ is an alkylene group or a group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ５ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ５ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ５ As the compound, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ OCH ２ CH ２ CH ２ - is preferred (however, the right side is Si(R ２ ) ｎ L ３－ｎ Bind to. ).

[0149] Three [-Q ｂ５ -Si(R ２ ) ｎ L ３－ｎ ] may be the same or different.

[0150] Q in group (3-1A-6) ｅ is as defined in the above group (3-1A-4). v is 0 or 1.

[0151] Q ａ６ is an alkylene group which may have an etheric oxygen atom. The alkylene group which may have an etheric oxygen atom preferably has 1 to 10 carbon atoms, and particularly preferably has 2 to 6 carbon atoms. ａ６ As the compound, -CH２ OCH ２ CH ２ CH ２ -, -CH ２ OCH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - is preferred (however, the right side is Z ａ Bind to. ).

[0152] Z ａ is a (w2+1)-valent organo(poly)siloxane residue, or a (w2+1)-valent group having an alkylene group between the organo(poly)siloxane residues. w2 is an integer of 2 to 7. Examples of the (w2+1)-valent organo(poly)siloxane residue and the (w2+1)-valent group having an alkylene group between the organo(poly)siloxane residues include the following groups. However, R in the following formula ａ * indicates a binding site.

[0153]

[0154] Q ｂ６ is an alkylene group or a group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms of an alkylene group having two or more carbon atoms. ｂ６ The number of carbon atoms in the alkylene group represented by the formula (I) is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10. Q ｂ６ The number of carbon atoms in the group having an etheric oxygen atom or a divalent organo(poly)siloxane residue between carbon atoms in the alkylene group having 2 or more carbon atoms, represented by the formula (I), is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. ｂ６As the compound, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ - is preferred. ｂ６ -Si(R ２ ) ｎ L ３－ｎ ] may be the same or different.

[0155] In the group (3-1A-7), Z ｃ is a hydrocarbon group having a valence of (w3+w4+1). w3 is an integer of 4 or more. w4 is an integer of 0 or more. Q ｅ , s4, Q ａ４ , t4, Q ｂ４ The definitions and preferred ranges of u4 and u5 are the same as those of the respective symbols in group (3-1A-4).

[0156] Z ｃ may be composed of a hydrocarbon chain, and may have an etheric oxygen atom between carbon atoms in the hydrocarbon chain, and is preferably composed of a hydrocarbon chain. ｃ The valence of Z is preferably from 5 to 20, more preferably from 5 to 10, still more preferably from 5 to 8, and particularly preferably from 5 to 6. ｃ The number of carbon atoms in [-(O-Q ｂ４ ) ｕ４ -Si(R ２ ) ｎ L ３－ｎ If there are two or more [-(O-Q ｂ４ ) ｕ４ -Si(R ２ ) ｎ L ３－ｎ ] may be the same or different.

[0157] Formula A(Si(R ２ ) ｎ L３－ｎ ) ｑ１ A in the formula may be any of the groups (g2-1) to (g2-7).

[0158]

[0159] (-A １ -Q １２ -) ｅ１ C (R ｅ２ ) ４－ｅ１－ｅ２ (-Q ２２ -) ｅ２ ... (g2-2) -A １ -Q １３ -N(-Q ２３ -) ２ ...(g2-3) (-A １ -Q １４ -) ｈ１ Z ４ (-Q ２４ -) ｈ２ ...(g2-4) (-A １ -Q １５ -) ｉ１ Si(R ｅ３ ) ４－ｉ１－ｉ２ (-Q ２５ -) ｉ２ ... (g2-5) -A １ -Q ２６ - (g2-6) -A １ -Q １２ -CH(-Q ２２ -)-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -) ｉ３ …(g2-7)

[0160] However, in formulas (g2-1) to (g2-7), A １ The side is Si(R ３ ) ２ or Si(R ４ ) ２ and Q ２２ , Q ２３ , Q ２４ , Q ２５ or Q ２６ The side is [-Si(R ２ ) ｎ L ３－ｎ ]. １ represents a single bond, -C(O)NR６ -, -C(O)-, -OC(O)O-, -NHC(O)O-, -NHC(O)NR ６ -, -O- or SO ２ NR ６ - is. １１ represents a single bond, —O—, an alkylene group, or —C(O)NR between carbon atoms of an alkylene group having two or more carbon atoms. ６ -, -C(O)-, -NR ６ - or O- containing group. １２ represents a single bond, an alkylene group, or a —C(O)NR group between carbon atoms of an alkylene group having two or more carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and A is Q １２ If there are two or more, there are two or more Q １２ may be the same or different. １３ is a single bond (where A １ is —C(O)—), an alkylene group, an alkylene group having 2 or more carbon atoms having —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ Q is a group having - or O-, or a group having -C(O)- at the N-terminal of the alkylene group. １４ Is, Q １４ Z to which ４ If the atom in is a carbon atom, Q １２ and Q １４ Z to which ４ When the atom in is a nitrogen atom, Q １３ and A is Q １４ If there are two or more, there are two or more Q １４ may be the same or different. １５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and A is Q １５ If there are two or more, there are two or more Q １５ may be the same or different. ２２represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms. ６ -, -C(O)-, -NR ６ a group having - or O-, and -C(O)NR at the end of the alkylene group not connected to Si; ６ -, -C(O)-, -NR ６ A group having - or O-, or an alkylene group having 2 or more carbon atoms having -C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O- and -C(O)NR at the end not connected to Si ６ -, -C(O)-, -NR ６ - or O-, and A is Q ２２ If there are two or more, there are two or more Q ２２ may be the same or different. ２３ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and two Q ２３ may be the same or different. ２４ Is, Q ２４ Z to which ４ If the atom in is a carbon atom, Q ２２ and Q ２４ Z to which ４ When the atom in is a nitrogen atom, Q ２３ and A is Q ２４ If there are two or more, there are two or more Q ２４ may be the same or different. ２５ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６ - or O-, and A is Q ２５ If there are two or more, there are two or more Q ２５ may be the same or different. ２６ represents an alkylene group or an alkylene group having two or more carbon atoms with —C(O)NR between carbon atoms. ６ -, -C(O)-, -NR ６- or O- containing group. ２２ , Q ２３ , Q ２４ , Q ２５ , Q ２６ When Z is an alkylene group, it preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and even more preferably 1 to 6 carbon atoms. ４ Is, Q １４ has a carbon atom or nitrogen atom to which Q is directly bonded, ２４ is a group having a (h1+h2)-valent ring structure having a carbon atom or nitrogen atom to which R is directly bonded. ｅ１ is a hydrogen atom or an alkyl group, and A is R ｅ１ When there are two or more R ｅ１ may be the same or different. ｅ２ is a hydrogen atom, a hydroxyl group, an alkyl group, or an acyloxy group. ｅ３ is an alkyl group. ６ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group.

[0161] d1 is an integer of 0 to 3, preferably 1 or 2. d2 is an integer of 0 to 3, preferably 1 or 2. d1 + d2 is an integer of 1 to 3. d3 is an integer of 0 to 3, preferably 0 or 1. d4 is an integer of 0 to 3, preferably 2 or 3. d3 + d4 is an integer of 1 to 3. d1 + d3 is an integer of 1 to 5, preferably 1 or 2. d2 + d4 is an integer of 1 to 5, preferably 4 or 5. e1 + e2 is 3 or 4. e1 is an integer of 1 to 3, preferably 1 or 2. e2 is an integer of 1 to 3, preferably 2 or 3. h1 is an integer of 1 or more, preferably 1 or 2. h2 is an integer of 1 or more, preferably 2 or 3. i1 + i2 is 3 or 4. i1 is an integer of 1 to 3, and preferably 1 or 2. i2 is an integer of 1 to 3, and preferably 2 or 3. i3 is 2 or 3.

[0162] Q １１ , Q１２ , Q １３ , Q １４ , Q １５ , Q ２２ , Q ２３ , Q ２４ , Q ２５ and Q ２６ The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoints of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may also be 1 to 10, 1 to 6, or 1 to 4. However, when a specific bond is present between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2.

[0163] Z ４ Examples of the ring structure in Z include the ring structures described above, and the preferred embodiments are also the same. ４ The ring structure in １４ YaQ ２４ is directly bonded to the ring structure, for example, an alkylene group is linked to the alkylene group, and Q １４ YaQ ２４ are never connected.

[0164] R ｅ１ , R ｅ２ or R ｅ３ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. ｅ２ The number of carbon atoms in the alkyl group portion of the acyloxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2, from the viewpoint of ease of production of the compound. h1 is preferably 1 to 6, more preferably 1 to 4, even more preferably 1 or 2, and particularly preferably 1, from the viewpoint of ease of production of the compound and further excellent abrasion resistance of the surface treatment layer. h2 is preferably 2 to 6, more preferably 2 to 4, and particularly preferably 2 or 3, from the viewpoint of ease of production of the compound and further excellent abrasion resistance of the surface treatment layer.

[0165] Formula A(Si(R ２ ) ｎ L ３－ｎ )ｑ１ Other forms of A in the above formula include groups (g2-8) to (g2-14).

[0166]

[0167] (-A １ -Q １２ -) ｅ１ C (R ｅ２ ) ４－ｅ１－ｅ２ (-Q ２２ -G １ ) ｅ２ ... (g2-9) -A １ -Q １３ -N(-Q ２３ -G １ ) ２ ...(g2-10) (-A １ -Q １４ -) ｈ１ Z ４ (-Q ２４ -G １ ) ｈ２ ...(g2-11) (-A １ -Q １５ -) ｉ１ Si(R ｅ３ ) ４－ｉ１－ｉ２ (-Q ２５ -G １ ) ｉ２ ...(g2-12) -A １ -Q ２６ -G １ ...(g2-13) -A １ -Q １２ -CH(-Q ２２ -G １ )-Si(R ｅ３ ) ３－ｉ３ (-Q ２５ -G １ ) ｉ３ …(g2-14)

[0168] However, in formulas (g2-8) to (g2-14), A １ The side is Si(R ３ ) ２ or Si(R ４ ) ２ and binds to G １ The side is [-Si(R ２ ) ｎ L ３－ｎ] and combine.

[0169] G １ is the following group (g3), and A has two or more G １ may be the same or different. １ The symbols other than are the same as those in formulas (g2-1) to (g2-7). １３ ) ３－ｋ３ (-Q ３ -) ｋ３ ...(g3) In the group (g3), the Si side is Q ２２ , Q ２３ , Q ２４ , Q ２５ and Q ２６ Connect to Q ３ The side is [-Si(R ２ ) ｎ L ３－ｎ ]. １３ is an alkyl group. ３ represents an alkylene group, an alkylene group having 2 or more carbon atoms, and a —C(O)NR group between carbon atoms. ６ -, -C(O)-, -NR ６ - or -O- containing group, or (OSi(R ９ ) ２ ) ｐ -O-, and two or more Q ３ may be the same or different. k3 is 2 or 3. R ６ is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group. ９ is an alkyl group, a phenyl group, or an alkoxy group, and two R ９ may be the same or different. p is an integer of 0 to 5, and when p is 2 or more, there are two or more (OSi(R ９ ) ２ ) may be the same or different.

[0170] Q ３The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 2 to 20, from the viewpoint of ease of production of the compound and further superior abrasion resistance of the surface treatment layer, and may be 2 to 10 or 2 to 6. Examples include 2, 3, 8, 9, and 11. The number of carbon atoms may be 1 to 10, 1 to 6, or 1 to 4. However, when there is a specific bond between carbon atoms, the lower limit of the number of carbon atoms in the alkylene group is 2. R １３ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ The number of carbon atoms in the alkyl group of R is preferably 1 to 6, more preferably 1 to 3, and even more preferably 1 or 2, from the viewpoint of ease of production of the compound. ９ In view of excellent storage stability of the compound, the number of carbon atoms in the alkoxy group is preferably 1 to 6, more preferably 1 to 3, and particularly preferably 1 or 2. p is preferably 0 or 1.

[0171] [Examples of First Compound S and First Compound D] Specific examples of the first compound S and the first compound D are described in detail below. Specific examples of the first compound S include the following compounds (1) to (3), (4A), and (5). Specific examples of the first compound D include the following compound (4B).

[0172] Compound (1) A compound containing the following group 1a, a chain organo(poly)siloxane residue, a partial structure which is an alkylene chain or polyalkylene oxide chain having 3 or more carbon atoms, and the following group 1b. Group 1a: -M １ T １ ３ Group 1b: -Si(R ２ ) ｎ L ３－ｎ M １ is Si, Sn, or Ge, and T １ are each independently a hydrocarbon group or a trialkylsilyloxy group, R ２are each independently a monovalent hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and each n is independently an integer of 0 to 2. ２ , L, and n are R in the above formula (S1). ２ , L, and n are the same as those of the group 1a. １１ T in the explanation of １ ３ M １ - Details are the same as above.

[0173] Compound (2) A compound containing an alkyl group having two or more carbon atoms, a linear organo(poly)siloxane residue, and a reactive silyl group.

[0174] Compound (3) A compound comprising the following group 3a, a partial structure containing a divalent linear organo(poly)siloxane residue, and the following group 3b, wherein the partial structure is a divalent linear organo(poly)siloxane residue or a combination of a divalent linear organo(poly)siloxane residue and at least one of an alkylene chain and a polyalkylene oxide chain. Group 3a: a monovalent cyclic polysiloxane residue or a monovalent cage polysiloxane residue Group 3b: -Si(R ２ ) ｎ L ３－ｎ R ２ are each independently a monovalent hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and each n is independently an integer of 0 to 2. ２ , L, and n are R in the above formula (S1). ２ , L, and n.

[0175] Compounds (4A) and (4B) Compounds represented by the following formula (4A) or (4B) (R Ｔ１ -R Ｓ -(-SiR Ｔ２ ２ -) ｑ４ ) α -X Ａ -R Ｈ β ...(4A) R Ｈ γ -XＡ -O ｐ４ -R Ｓ -(-SiR Ｔ２ ２ -) ｑ４ -X Ａ -R Ｈ γ ... (4B) In formulas (4A) and (4B), R Ｓ are each independently a divalent linear organosiloxane group, and R Ｔ１ are each independently a hydrocarbon group, R Ｔ２ are each independently a hydrocarbon group, p4 is 0 or 1, q4 is each independently 0 or 1, R Ｈ is a group represented by any one of the following formulas (W1) to (W4), Ｈ In the present invention, there are two or more Si atoms to which hydroxyl groups or hydrolyzable groups are bonded, and X Ａ are each independently a single bond or a group represented by the following formula (W5), α is an integer of 1 to 9, β is an integer of 1 to 9, and γ is each independently an integer of 1 to 9. -(CH ２ CR １０ (R １５ ) X １１ -Si(R ２ ) ｎ８１ L ３－ｎ８１ ) ｔ -R １４ ...(W1)-SiR ａ１ ｋ８１ L ｌ８１ R ｃ１ ｍ８１ ...(W2) -CR ｄ１ ｋ８２ R ｅ１ ｌ８２ R ｆ１ ｍ８２ ... (W3) -NR ｇ１ R ｈ１ ...(W4) In formulae (W1) to (W4), each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and R ２ are each independently a monovalent hydrocarbon group, ８１ is (SiR ２ ｎ８１ L３－ｎ８１ ) units are each independently an integer of 0 to 3, １１ are each independently a single bond or a divalent organic group; R １０ are each independently a hydrogen atom or a monovalent organic group; each t is independently an integer of 2 or more; R １４ are each independently a hydrogen atom, a halogen atom, or -X １１ -Si(R ２ ) ｎ８１ L ３－ｎ８１ and R １５ are each independently a single bond, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or an alkyleneoxy group having 1 to 6 carbon atoms; R ａ１ are each independently -Z ８１ -SiR ２１ ｐ８１ L ｑ８１ R ２３ ｒ８１ and Z ８１ are each independently a divalent organic group; R ２１ are each independently -Z １’ -SiR ２１’ ｐ１’ L ｑ１’ R ２３’ ｒ１’ and R ２３ are each independently a monovalent organic group; p81 is each independently an integer of 0 to 3; q81 is each independently an integer of 0 to 3; r81 is each independently an integer of 0 to 3; p81 + q81 + r81 is 3; Z １’ are each independently a divalent organic group; R ２１’ are each independently -Z １” -SiL ｑ１” R ２３” ｒ１” and R ２３’ are each independently a monovalent organic group; each p1' is independently an integer of 0 to 3; each q1' is independently an integer of 0 to 3; each r1' is independently an integer of 0 to 3; p1' + q1' + r1' is 3; Z １”are each independently a divalent organic group; R ２３” are each independently a monovalent organic group; q1" is each independently an integer of 0 to 3; r1" is each independently an integer of 0 to 3; q1"+r1" is 3; R ｃ１ are each independently a monovalent organic group; k81 is each independently an integer of 0 to 3; l81 is each independently an integer of 0 to 3; m81 is each independently an integer of 0 to 3; k81 + l81 + m81 is 3; R ｄ１ are each independently -Z ８２ -CR ７１ ｐ８２ R ７２ ｑ８２ R ７３ ｒ８２ and Z ８２ are each independently a single bond, an oxygen atom, or a divalent organic group; R ７１ are each independently -Z ２’ -CR ３２’ ｑ２’ R ３３’ ｒ２’ and R ７２ are each independently -Z ８３ -SiL ｎ８２ R ３５ ３－ｎ８２ and R ７３ are each independently a hydrogen atom, a hydroxyl group or a monovalent organic group; p82 is each independently an integer of 0 to 3; q82 is each independently an integer of 0 to 3; r82 is each independently an integer of 0 to 3; p82 + q82 + r82 is 3; Z ２’ are each independently a single bond, an oxygen atom, or a divalent organic group; R ３２’ are each independently -Z ８３ -SiL ｎ８２ R ３５ ３－ｎ８２ and R ３３’are each independently a hydrogen atom, a hydroxyl group, or a monovalent organic group; q2' are each independently an integer of 0 to 3; r2' are each independently an integer of 0 to 3; q2'+r2' is 3; Z ８３ are each independently a single bond, an oxygen atom, or a divalent organic group; R ３５ are each independently a monovalent organic group; n82 are each independently an integer of 0 to 3; R ｅ１ are each independently -Z ８３ -SiL ｎ８２ R ３５ ３－ｎ８２ and R ｆ１ are each independently a hydrogen atom, a hydroxyl group, or a monovalent organic group; k82 is each independently an integer of 0 to 3; l82 is each independently an integer of 0 to 3; m82 is each independently an integer of 0 to 3. k82 + l82 + m82 is 3; R ｇ１ and R ｈ１ are each independently -Z ８４ -SiL ｎ８１ R ２ ３－ｎ８１ , -Z ８４ -SiR ａ１ ｋ８１ L ｌ８１ R ｃ１ ｍ８１ , or -Z ８４ -CR ｄ１ ｋ８２ R ｅ１ ｌ８２ R ｆ１ ｍ８２ and Z ８４ are each independently a single bond, an oxygen atom, or a divalent organic group; provided that in formulae (W1), (W2), (W3), and (W4), there are at least two Si atoms bonded to a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. ２ and L is R in the above formula (S1). ２ and L.

[0176] - (R ５０ ) ｐ５ -(X ５１ ) ｑ５-...(W5) In formula (W5), R ５０ is a single bond, -(CH ２ ) ｓ５ - or an o-, m- or p-phenylene group, s5 is an integer of 1 to 20, X ５１ is -(X ５２ ) ｌ５ - and X ５２ each occurrence independently represents an —O—, —S—, o-, m-, or p-phenylene group, —CO—, —C(O)O—, or —CONR ５４ --, --O-CONR ５４ -, -NR ５４ - and - (CH ２ ) ｎ５ - is a group selected from the group consisting of R ５４ is independently in each occurrence a hydrogen atom or a monovalent organic group, n5 is independently in each occurrence an integer from 1 to 20, l5 is an integer from 1 to 10, p5 is 0 or 1, q5 is 0 or 1, at least one of p5 and q5 is 1, (R ５０ ) ｐ５ and (X ５１ ) ｑ５ The order in which they occur is arbitrary.

[0177] X Ａ are each independently a single bond, an alkylene group having 1 to 20 carbon atoms, or —(CH ２ ) ｓ５ -X ５３ -, -X ５３ - (CH ２ ) ｔ５ - or -(CH ２ ) ｓ５ -X ５３ - (CH ２ ) ｔ５ Preferably, X is -. ５３ represents a single bond, —O—, —CO—, or —CONR ５４ --, --O-CONR ５４ -, -O-(CH ２ ) ｕ５ -CONR ５４ -, or -O-(CH ２ ) ｕ５ -CO-, and R５４ are each independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or an oxyalkylene-containing group having 1 to 10 carbon atoms, s5 is an integer of 1 to 20, t5 is an integer of 1 to 20, and u5 is an integer of 1 to 20.

[0178] Compound (5) A compound represented by the following formula (5):

[0179]

[0180] In formula (5), Y is a single bond or *-Si(R ｓ２ ) ２ -L ｓ１ -. * represents a bond to an oxygen atom. Z represents an oxygen atom or a divalent hydrocarbon group having 1 to 10 carbon atoms. R ａ９ each independently represents a hydrocarbon group or a trialkylsilyloxy group. ａ９ When all of are hydrocarbon groups, R ａ９ The hydrocarbon group represented by R is an alkyl group. ｓ１ , R ｓ２ each independently represents an alkyl group having 1 to 10 carbon atoms. ｓ１ represents a divalent hydrocarbon group having 1 to 10 carbon atoms. X represents a group represented by any one of the following formulas (X-1) to (X-3). n9 represents a number from 1 to 150.

[0181]

[0182] In formulas (X-1) to (X-3), L ｘ１ and L ｘ２ each independently represents a divalent hydrocarbon group having 1 to 20 carbon atoms, and the methylene group (—CH ２ -) is -O- or -O-Si(R ｘ７ ) ２ - may be replaced by R ｘ１ ~R ｘ７ each independently represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms. ａ１ each independently represents a hydrolyzable group, a group having a hydrolyzable group, or a trialkoxysilyloxy group.ａ２ each independently represents a trialkylsilyl-containing group, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, a hydrolyzable group, a group having a hydrolyzable group, or a trialkoxysilyloxy group; X ａ２ When is a hydrolyzable group, X ａ２ and X ａ１ may be the same or different. n2 represents an integer of 1 to 50. n3 represents a number of 2 to 5. n4 represents a number of 0 to 5. In formula (X-3), (Si(R ｘ４ ) (-L ｘ２ -Si(X ａ２ ) (X ａ１ ) ２ )—O—) and (Si(R ｘ５ ) (R ｘ６ The units represented by (a)-(O)-) may be in any order.

[0183] Compounds (1) to (5) will be explained below.

[0184] (Compound (1)) Compound (1) is preferably a compound represented by the following formula (1A): [T １ ３ M １ -(O) ｒ -Z １ ] ｐ１ A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ ... (1A) In formula (1A), M １ is Si, Sn, or Ge, and T １ are each independently a hydrocarbon group or a trialkylsilyloxy group, r is 0 or 1, and Z １ are each independently an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent linear organo(poly)siloxane residue, A is a single bond or a (p1+q1)-valent linking group, R ２are each independently a monovalent hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, n is each independently an integer of 0 to 2, and p1 and q1 are each independently an integer of 1 or more, provided that Z １ are each independently an alkylene chain or a polyalkylene oxide chain, A is a (p1+q1)-valent linking group containing a linear organo(poly)siloxane residue.

[0185] T １ and M １ represents T in the above group 1a １ and M １ Since it is the same as １ is preferably Si. １ is preferably a trialkylsilyloxy group, more preferably a butyldimethylsilyloxy group, a trimethylsilyloxy group or a triethylsilyloxy group. ２ , L, and n are R in the above formula (S1). ２ , L, and n. １ The combination of an alkylene chain and a divalent linear organo(poly)siloxane residue represented by the formula (D1), (D2), or (D3) below is preferably represented by the formula (D1), (D2), or (D3) below.

[0186]

[0187] In formula (D1), Ak １ and Ak ２ Each independently represents an alkylene chain. ３ is R in formula (B1). ３ k11 is a number of 1 or more. k12 is 0 or 1. In formula (D2), Ak ３ means an alkylene chain. ３ is R in formula (B1). ３ k21 and k22 are each independently a number of 1 or more. In formula (D3), Ak ４ means an alkylene chain. ３ is R in formula (B1). ３In formula (D1), (D2), or (D3), *1 is linked to the group 1a side, and *2 is linked to the group 1b side.

[0188] A may be any group as long as it does not impair the effects of the present disclosure, and examples thereof include alkylene groups which may have an etheric oxygen atom or a divalent linear organo(poly)siloxane residue, carbon atoms, nitrogen atoms, silicon atoms, divalent to octavalent organo(poly)siloxane residues, and Si(R ２ ) ｎ L ３－ｎ A may include a triptycene structure. The triptycene structure refers to a partial structure in which two or more hydrogen atoms have been removed from triptycene.

[0189] Furthermore, A may be any of the above groups (g2-1) to (g2-14).

[0190] p1 is an integer of 1 or more. In order to improve the water repellency of the surface treatment layer, p1 is preferably 1 to 6, and more preferably 2 to 4. p1 may be 1.

[0191] When p1 is 2 or more, a plurality of [T １ ３ M １ -(O) ｒ -Z １ ] may be the same or different from each other.

[0192] q1 is an integer of 1 or more. In order to provide a surface treatment layer with better abrasion resistance, q1 is preferably 1 to 15, more preferably 1 to 6, even more preferably 2 to 6, particularly preferably 2 to 4, and extremely preferably 2 or 3. q1 may be 1.

[0193] When q1 is 2 or more, a plurality of [Si(R ２ ) ｎ L ３－ｎ ] may be the same or different from each other.

[0194] The group A (Si(R２ ) ｎ L ３－ｎ ) ｑ１ A preferred embodiment of the present invention is the group A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ However, the preferred embodiments of the group A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ A in formula (1A) is [T １ ３ M １ -(O) ｒ -Z １ ] ｐ１ Connect to Z １ When the terminal of the side bonded to A is an alkylene chain, Z of A １ The end of the bonded side to Z is not an alkylene chain. １ When the terminal of the side bonded to A is a polyalkylene oxide chain, Z of A １ The end of the side that is bonded to the alkylene group is not a polyalkylene oxide chain.

[0195] The compound (1) is preferably a compound represented by the following formula (1B):

[0196]

[0197] In formula (1B), T １ is T in group 1a １ It is the same as R ３ is R in formula (B1). ３ k31 is the same as k31 in formula (D3). A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ is the group represented by A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ Ak is the same as the group represented by ４ is A in formula (D3) ４ is the same as

[0198] The compound (1) is preferably a compound represented by the following formula (1C), formula (1D), or formula (1E).

[0199]

[0200]

[0201]

[0202] In formula (1C), formula (1D), and formula (1E), R ３ is R in formula (B1). ３ k31 is the same as k31 in formula (D3). A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ is the group represented by A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ Ak is the same as the group represented by ４ is A in formula (D3) ４ is the same as

[0203] Specific examples of compound (1) include the following compounds:

[0204] In the following formula, n10 is a number of 1 or more, and n10 is preferably a number of 1 to 60, may be a number of 3 to 50, may be a number of 5 to 30, or may be a number of 7 to 25.

[0205]

[0206] In the following formula, k is preferably 1 to 80, more preferably 3 to 50, and even more preferably 3 to 30. m is preferably 1 to 30, more preferably 3 to 20, and even more preferably 3 to 10. t is preferably 1 to 30, more preferably 3 to 20, and even more preferably 3 to 10. In the following formula, n10 is a number of 1 or more, and n10 is preferably a number of 1 to 60, but may be a number of 3 to 50, a number of 5 to 30, or a number of 7 to 25.

[0207]

[0208] In the following formula, n10 is a number of 1 or more, and n10 is preferably a number of 1 to 60, may be a number of 3 to 50, may be a number of 5 to 30, or may be a number of 7 to 25.

[0209]

[0210] (Compound (2)) In compound (2), the alkyl group means an unsubstituted alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group or a branched alkyl group is preferred. The alkyl group preferably has 2 to 30 carbon atoms, more preferably 3 to 28 carbon atoms, and even more preferably 4 to 22 carbon atoms. The compound may contain only one alkyl group, or two or more alkyl groups. Since the alkyl group is a monovalent group, it is located at the terminal of the compound.

[0211] The compound (2) is preferably a compound represented by the following formula (2A): (T ２ -Z ２ ) ｐ１ A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ ... (2A) In formula (2A), T ２ is an alkyl group having two or more carbon atoms; Z ２ is a divalent chain organo(poly)siloxane residue, A is a single bond or a (p1+q1)-valent linking group, R ２ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; n is an integer of 0 to 2; and p1 and q1 are each independently an integer of 1 or greater.

[0212] T ２ Preferred embodiments of the alkyl group having 2 or more carbon atoms represented by the formula: are as described above. ２ The divalent chain organo(poly)siloxane residue represented by the formula (B1) is preferably a group represented by the formula (B1). ２ , L, and n are R in the above formula (S1). ２, L, and n. A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ In addition to the contents shown below, the group represented by A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ p1 and q1 are the same as p1 and q1 in the above formula (1A).

[0213] A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ The group represented by the formula (3-1A) is preferably the group (3-1A) or the group (3-1B), and more preferably the group (3-1A). ａ is a single bond or a divalent linking group. ａ Z ２ The end of the bonded side is not an oxysilyl group.

[0214] In formula (3-1A), X ３１ is a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organo(poly)siloxane residue, or a group having a (h+i+1)-valent ring. ａ When is a single bond, X ３１ Z ２ The terminal on the side bonding to X is not an oxysilyl group. ３１ may be terminated with an oxysilyl group.

[0215] In formula (3-1A), Q ｂ is a single bond or a divalent linking group. ａ and X ３１ If is a single bond, Q ｂ Z ２ The terminal of the bonded side is not an oxysilyl group. ｂ The terminal of may be an oxysilyl group. ｂ When Q is an alkylene group, ａ -X ３１ Q ｂ The side terminal is not an alkylene group.

[0216] In formula (3-1B), Q ｃ is a single bond or a divalent linking group. ｃ Z ２ The end of the bonded side is not an oxysilyl group.

[0217] As the group (3-1A), groups (3-1A-1) to (3-1A-7) are preferred. However, Z ２ The end of the bonded side is not an oxysilyl group.

[0218] In the group (3-1A-1), X ３２ is -O-, -S-, -N(R ｄ )-, -C(O)O-, -C(O)S-, -N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )- is preferred, and —C(O)O— or —C(O)N(R ｄ )- is more preferred. s1 is preferably 0, and Q ｂ１ is preferably an alkylene group having 2 to 6 carbon atoms.

[0219] In the group (3-1A-2), X ３３ is —O—, —C(O)O—, or —C(O)N(R ｄ )- is preferred.

[0220] A in formula (2A) may be any of groups (g2-1) to (g2-7).

[0221] However, in formulas (g2-1) to (g2-7), A １ Side is Z ２ and Q ２２ , Q ２３ , Q ２４ , Q ２５ or Q ２６ The side is [-Si(R ２ ) ｎ L ３－ｎ ] and combine.

[0222] Other embodiments of A include groups (g2-8) to (g2-14).

[0223] However, in formulas (g2-8) to (g2-14), A １ Side is Z ２ and binds to G １ The side is [-Si(R ２ ) ｎ L ３－ｎ ] and combine.

[0224] The compound (2) is preferably a compound represented by the following formula (2B):

[0225] In formula (2B), R ５１ is an alkyl group having two or more carbon atoms. ５２ and R ５４ are each independently an alkylene group. ５３ is -C(O)O-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)- or -C(O)N(R ｄ )-. R ３ is R in formula (B1). ３ k1 is the same as k1 in formula (B1). X ３１ (-Q ｂ -Si(R ２ ) ｎ L ３－ｎ ) ｈ (-R ３１ ) ｉ is X in group (3-1A). ３１ (-Q ｂ -Si(R ３ ) ｎ L ３－ｎ ) ｈ (-R ３１ ) ｉ t1 is 0 or 1.

[0226] R ５１ Preferred embodiments of the alkyl group represented by the formula (I) are as explained in the alkyl group section above. ５２The alkylene group represented by the formula (I) may be linear, branched, or cyclic. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, still more preferably 4 to 20, and particularly preferably 5 to 15. ５４ The alkylene group represented by the formula (I) may be linear, branched, or cyclic. The alkylene group preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, still more preferably 1 to 6 carbon atoms, and particularly preferably 1 to 3 carbon atoms.

[0227] Examples of compound (2) include the following compounds: In the following formula, n10 is a number of 1 or more, and n10 is preferably a number of 1 to 60, may be a number of 3 to 50, may be a number of 5 to 30, or may be a number of 7 to 25.

[0228]

[0229]

[0230]

[0231]

[0232]

[0233] (Compound (3)) Compound (3) is preferably a compound represented by the following formula (3A): [T ３ -(O) ｒ -Z ３ ] ｐ１ A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ ...(3A) In formula (3A), T ３ is a monovalent cyclic polysiloxane residue or a monovalent cage-like polysiloxane residue, r is 0 or 1, Z ３ is a divalent linear organo(poly)siloxane residue or a combination of a divalent linear organo(poly)siloxane residue and at least one of an alkylene chain and a polyalkylene oxide chain, A is a single bond or a (p1+q1)-valent linking group, R ２are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; n is an integer of 0 to 2; and p1 and q1 are each independently an integer of 1 or greater.

[0234] R ２ , L, and n are R in the above formula (S1). ２ , L, and n. A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ In addition to the contents shown below, the group represented by A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ p1 and q1 are the same as p1 and q1 in the above formula (1A).

[0235] The details of the monovalent cyclic polysiloxane residue or the monovalent cage-like polysiloxane residue are as follows: T １１ This is as described above in the description of the first embodiment.

[0236] A(Si(R ２ ) ｎ L ３－ｎ ) ｑ１ The group represented by the formula (3-1A) is preferably the group (3-1A) or the group (3-1B), and more preferably the group (3-1A).

[0237] In formula (3-1A), Q ａ is a single bond or a divalent linking group. ａ Z ３ The terminal on the side bonding to Z is not an alkylene group, a polyalkylene oxide chain, or a divalent organo(poly)siloxane residue. ３ When the A-side terminal of is an alkylene chain, Q ａ represents a divalent hydrocarbon group other than an alkylene group, a divalent heterocyclic group, —O—, —S—, —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R ｄ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —OC(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or -SO ２ N (R ｄ )- is preferred, and an alkylene group having —OC(O)—, —C(O)N(R ｄ )-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ An alkylene group having —C(O)O— or —C(O)N(R ｄ Alkylene groups having Z are more preferred. ３ When the A-side terminal of Q is a polyalkylene oxide chain, ａ represents a divalent hydrocarbon group other than an alkylene group, a divalent heterocyclic group, or —SO ２ -, -C(O)-, -Si(R ａ ) ２ -, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -SO２ N (R ｄ )-, -C(O)N(R ｄ an alkylene group having —C(O)O—, or —SO ２ N (R ｄ An alkylene group having —C(O)— is preferred, and —C(O)— is more preferred. ３ When the A-terminal of Q is a divalent linear organo(poly)siloxane residue, ａ represents a divalent hydrocarbon group other than an alkylene group, a divalent heterocyclic group, —O—, —S—, —SO ２ -, -N(R ｄ )-, -C(O)-, -Si(R ａ ) ２ -, -OC(O)-, -C(O)O-, -C(O)S-, -C(O)N(R ｄ ) -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ ) -, -N(R ｄ )C(O)O-, -OC(O)N(R ｄ ) -, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -C(O)N(R ｄ an alkylene group having —N(R ｄ )C(O)-, an alkylene group having —OC(O)N(R ｄ an alkylene group having —OC(O)—, an alkylene group having —C(O)O—, an alkylene group having —C(O)S—, an alkylene group having —N(R ｄ an alkylene group having —N(R ｄ )C(O)N(R ｄ )- or -SO ２ N (R ｄ )-containing alkylene groups are preferred.

[0238] In formula (3-1A), X ３１is a single bond, an alkylene group, a carbon atom, a nitrogen atom, a silicon atom, a divalent to octavalent organo(poly)siloxane residue, or a group having a (h+i+1)-valent ring. ａ When is a single bond, X ３１ Z ３ The terminal on the side bonding to X is not an alkylene group, a polyalkylene oxide chain, or a divalent organo(poly)siloxane residue. ３１ The terminal of the alkylene group may be any of an alkylene group, a polyalkylene oxide chain, and a divalent organo(poly)siloxane residue.

[0239] In formula (3-1A), Q ｂ is a single bond or a divalent linking group. ａ and X ３１ If is a single bond, Q ｂ Z ３ The terminal on the side bonding to Q is not an alkylene group, a polyalkylene oxide chain, or a divalent organo(poly)siloxane residue. ｂ The terminal of the alkylene group may be any of an alkylene group, a polyalkylene oxide chain, and a divalent organo(poly)siloxane residue.

[0240] In formula (3-1A), Q ａ , X ３１ , and Q ｂ is a single bond, [Si(R ２ ) ｎ L ３－ｎ ] is Z ３ directly bonded to Z ３ is an alkylene chain.

[0241] In formula (3-1B), Q ｃ is a single bond or a divalent linking group. ｃ Z ３ The terminal on the side bonding to is not an alkylene group, a polyalkylene oxide chain, or a divalent organo(poly)siloxane residue.

[0242] As the group (3-1A), groups (3-1A-1) to (3-1A-7) are preferred. However, Z ３The terminal on the side bonding to is not an alkylene group, a polyalkylene oxide chain, or a divalent organo(poly)siloxane residue.

[0243] In the group (3-1A-1), Z ３ When the A-side terminal of X is an alkylene chain, ３２ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )- is preferred, and —O—, —S—, —N(R ｄ )-, -C(O)O-, -C(O)S-, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )- is more preferred, and —C(O)O— or —N(R ｄ )C(O)- is more preferred. ３ When the A-side terminal of X is a polyalkylene oxide chain, ３２ is -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ )-, or -C(O)N(R ｄ )- is preferred, and —C(O)- is more preferred. ３ When the A-side terminal of X is a divalent linear organo(poly)siloxane residue, ３２ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(Rｄ )-,-OC(O)N(R ｄ )-, or -C(O)N(R ｄ )- is preferred, and -O- is more preferred.

[0244] Z ３ When the A-side terminal of is an alkylene chain, s1 is 0, and Q ｂ１ is a single bond, or s1 is 1 and Q ｂ１ is preferably an alkylene group having 2 to 6 carbon atoms. ３ When the A-side terminal of is a polyalkylene oxide chain, s1 is 1, and Q ｂ１ is preferably an alkylene group having 2 to 6 carbon atoms. ３ When the A-side terminal of is a divalent chain organo(poly)siloxane residue, s1 is 1, and Q ｂ１ is preferably a single bond.

[0245] In the group (3-1A-2), Z ３ When the A-side terminal of X is an alkylene chain or a divalent linear organo(poly)siloxane residue, ３３ is -O-, -S-, -N(R ｄ )-, -C(O)-, -C(O)O-, -C(O)S-, -SO ２ N (R ｄ ) -, -N(R ｄ ) SO ２ -, -N(R ｄ )C(O)-,-N(R ｄ )C(O)N(R ｄ )-,-OC(O)N(R ｄ )- or -C(O)N(R ｄ )- is preferred. ３ When the A-side terminal of X is a polyalkylene oxide chain, ３３ is -C(O)O-, -C(O)S-, -SO ２ N (R ｄ )-, or -C(O)N(R ｄ )- is preferred.

[0246] A in formula (3A) may be any of groups (g2-1) to (g2-7).

[0247] However, in formulas (g2-1) to (g2-7), A １ Side is Z ３ and Q ２２ , Q ２３ , Q ２４ , Q ２５ or Q ２６ The side is [-Si(R ２ ) ｎ L ３－ｎ ] and combine.

[0248] Other embodiments of A include groups (g2-8) to (g2-14).

[0249] However, in formulas (g2-8) to (g2-14), A １ Side is Z ３ and binds to G １ The side is [-Si(R ２ ) ｎ L ３－ｎ ] and combine.

[0250] Specific examples of compound (3) include the following compounds: In the following formula, n10 is a number of 1 or more, and is preferably a number from 1 to 60, and may be a number from 3 to 50, a number from 5 to 30, or a number from 7 to 25.

[0251]

[0252] (Compounds (4A) and (4B)) In compounds (4A) and (4B), X Ａ are each independently -(CH ２ ) ｓ７ -O-(CH ２ ) ｔ７ -, -(CH ２ ) ｓ７ -CONR ５４ - (CH ２ ) ｔ７ -, -(CH ２ ) ｓ７ -O-(CH ２ ) ｕ７ -CO-, or -(CH ２ ) ｓ７ -O-(CH ２ ) ｕ７ -CONR ５４ - (CH ２ )ｔ７ It is more preferable that -.

[0253] R ５４ are each independently a hydrogen atom, a phenyl group, an alkyl group having 1 to 6 carbon atoms, or an oxyalkylene-containing group having 1 to 10 carbon atoms; s7 is an integer of 1 to 20; t7 is an integer of 1 to 20; and u7 is an integer of 1 to 20.

[0254] X Ａ are each independently a group represented by the following formula (W6): ａ are each independently a single bond or a divalent organic group.

[0255]

[0256] Specific examples of the compound (4A) include the following compounds: (CH ３ ) ３ Si-(OSi(CH ３ ) ２ ) １９ - (CH ２ ) １０ -CONH-CH ２ C{CH ２ CH ２ CH ２ Si(OCH ３ ) ３} ３

[0257] (Compound (5)) When the surface treatment agent of the present disclosure contains compound (5), it is preferable that the surface treatment agent of the present disclosure further contains a metal compound.

[0258] The metal compound is preferably a compound represented by the following formula (M6a) or (M6b).

[0259]

[0260] In formula (M6a), R ｋ１ represents a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or a hydrolyzable group; ｋ１ each independently represents a hydrolyzable group. ｋ２ represents a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or a hydrolyzable group.ｋ１ and X ｋ１ The number of elements in the siloxane skeleton-containing group is (R ａ９ ) ３ Si-Z-(Si(R ｓ１ ) ２ -O-) ｎ９ The number of elements in the trialkylsilyl group-containing molecular chain represented by -Y- is less than the number of elements in the trialkylsilyl group-containing molecular chain represented by R ｋ１ and X ｋ１ The number of carbon atoms in the longest linear hydrocarbon chain contained in the hydrocarbon chain-containing group in the compound (5) is ａ９ ) ３ Si-Z-(Si(R ｓ１ ) ２ -O-) ｎ９ The number of elements is less than the number of elements in the trialkylsilyl group-containing molecular chain represented by -Y-. ｋ１ and X ｋ２ is a siloxane skeleton-containing group or a hydrocarbon chain-containing group, R ｋ１ and X ｋ２ may be the same or different. ｋ２ When is a hydrolyzable group, X ｋ２ and X ｋ１ may be the same or different. ｋ１ and X ｋ２ may be the same or different. ４ represents a trivalent or tetravalent metal atom capable of forming a metal alkoxide. ４ represents an integer of 0 or 1 depending on the

[0261]

[0262] In formula (M6b), R ｋ３ represents a hydrolyzable silane oligomer residue, and X ｋ３ represents a hydrolyzable group, a fluorine-containing alkyl group having 1 to 4 carbon atoms, or an alkyl group having 1 to 4 carbon atoms.

[0263] Specific examples of compound (5) include the following compounds: In the following formula, n10 is a number of 1 or more, and is preferably a number from 1 to 60, and may be a number from 3 to 50, a number from 5 to 30, or a number from 7 to 25.

[0264]

[0265] <Second Compound> The second compound does not have an organo(poly)siloxane residue, and has a hydrocarbon group having 4 or more carbon atoms that is not directly bonded to an oxygen atom and may have a functional group or a substituent, and a reactive silyl group b. Examples of the organo(poly)siloxane residue not contained in the second compound include organo(poly)siloxane residues represented by formula (B1) and formula (B2) contained in the first compound.

[0266] Examples of the second compound include a compound having a reactive silyl group b linked to only one end of the hydrocarbon group (hereinafter also referred to as "second compound S"), and a compound having a reactive silyl group b linked to each of both ends of the hydrocarbon group (hereinafter also referred to as "second compound D"). As the second compound, second compound S may be used alone, second compound D may be used alone, or second compound S and second compound D may be used in combination. In either case, one type of second compound S may be used alone, or two or more types may be used in combination, and one type of second compound D may be used alone, or two or more types may be used in combination. Among these, in the second compound, it is preferable that the reactive silyl group b is linked to only one end of the hydrocarbon group.

[0267] (Reactive Silyl Group) The second compound contains a reactive silyl group b. Preferred aspects of the reactive silyl group b contained in the second compound are the same as the preferred aspects of the reactive silyl group a contained in the first compound.

[0268] Specifically, the reactive silyl group a and the reactive silyl group b are preferably each independently represented by the above formula (S1), the details of which are as described above.

[0269] (Hydrocarbon Group) The second compound contains a hydrocarbon group that is not directly bonded to an oxygen atom and has 4 or more carbon atoms, and may have a functional group or a substituent. Note that the "number of carbon atoms in the hydrocarbon group" does not include the number of carbon atoms in the functional group or the substituent.

[0270] Hereinafter, a hydrocarbon group having 4 or more carbon atoms that is not directly bonded to an oxygen atom and may have a functional group or a substituent will be referred to as a "hydrocarbon group M". The second compound may contain a hydrocarbon group directly bonded to an oxygen atom in addition to the hydrocarbon group M. However, it is essential that the second compound contains the hydrocarbon group M. Therefore, a compound containing only a hydrocarbon group directly bonded to an oxygen atom and a reactive silyl group (for example, Si(OCH ２ CH ３ ) ４ ) does not fall under the category of the second compound.

[0271] The hydrocarbon group M may have a functional group or a substituent, or may not have a functional group or a substituent. Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. The hydrocarbon group preferably has 4 to 50 carbon atoms, more preferably 8 to 40 carbon atoms, and particularly preferably 10 to 40 carbon atoms.

[0272] Examples of the functional group or substituent that the hydrocarbon group M may have include an amide group and an ester group.

[0273] Among these, the hydrocarbon group M is preferably an unsubstituted hydrocarbon group that is not directly bonded to an oxygen atom.

[0274] In the second compound, the hydrocarbon group and the reactive silyl group may be bonded directly to each other, or may be bonded to each other via another group.

[0275] The second compound is preferably a compound represented by formula (G). ７１ -R ７２ ) ｐ７ -A ７１ -(Si(R ２ ) ｎ L ３－ｎ ) ｑ２ ...(G) In formula (G), R ７１ is a hydrogen atom or [(CH ３ ) ３Q ７１ -R ７３ -] ｍ７ Q ７２ (CH ３ ) ３－ｍ７ - and Q ７１ and Q ７２ , each independently represents C or Si; R ７３ are each independently an alkylene group having 1 to 6 carbon atoms, m7 is an integer of 0 to 3, and R ７２ is an alkylene group, and when the number of carbon atoms is 2 or more, between carbon atoms, there may be any of -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and a phenylene group, ７１ is a single bond or a (p7+q2)-valent linking group, R ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; n is an integer of 0 to 2; p7 is an integer of 1 or more; and q2 is an integer of 1 or more.

[0276] The above R ７１ When is a hydrogen atom, R in formula (G) ７１ -R ７２ is an alkyl group. The alkyl group is the same as R Ａｋ The same as the above R ７１ is [(CH ３ ) ３ Q ７１ -R ７３ -] ｍ７ Q ７２ (CH ３ ) ３－ｍ７ In the case of -, R ７１ -R ７２is an alkyl group containing a trimethylsilyl group (TMS) or a tert-butyl group (tBu) at the end. When a surface treatment layer is formed, the second compound having TMS or tBu at the end has TMS or tBu positioned on the air interface side, resulting in excellent water and oil repellency and improved fingerprint wiping properties.

[0277] R ７３ is an alkylene group having 1 to 6 carbon atoms. ７３ By having R, even if two or more TMS and tBu groups are present at the tip, steric hindrance is alleviated and molecular mobility is increased. As a result, a surface treatment layer with excellent water and oil repellency can be formed. ７３ The alkylene group in R may be linear or branched. ７３ As the group, -CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２ -, -CH(CH ２ CH ３ ) CH ２ CH ２ -, -CH ２ C(CH ２ ) ２ CH ２ -, -CH ２ CH (CH ３ ) CH ２ CH ２ CH２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２ - etc. ７３ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. ２ The number of carbon atoms in the alkylene group in the formula (I) is preferably 1 to 5, and more preferably 1 to 4. m7 is an integer of 0 to 3. From the viewpoint of further improving abrasion resistance, acid resistance, and hot water resistance, m7 is preferably 0 to 2, and more preferably 0 to 1.

[0278] From the viewpoints of water repellency, abrasion resistance, and fingerprint removability, the second compound is preferably a compound represented by the following formula (E) or formula (F) among compounds (G).

[0279]

[0280] In formula (E), R Ａｋ are each independently an alkyl group; ｄ represents a single bond or a (p2+q2)-valent linking group other than an oxygen atom, p2 and q2 each independently represent an integer of 1 or more, R ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

[0281] R in formula (E) ２ , L, and n are R in the above formula (S1). ２ , L, and n.

[0282] In formula (E), p2 is preferably 1 to 15, more preferably 1 to 6, even more preferably 2 to 4, and particularly preferably 2 or 3. p2 may be 1. In formula (E), q2 is preferably 1 to 15, more preferably 1 to 6, even more preferably 2 to 4, and particularly preferably 2 or 3. q2 may be 1.

[0283] Aｄ is the same as A in the above formula (1A) except that it is not an oxygen atom.

[0284] Among them, A ｄ (Si(R ２ ) ｎ L ３－ｎ ) ｑ２ The group represented by the formula (3-1A) is preferably the group (3-1A) or the group (3-1B), more preferably the group (3-1A), and further preferably the group (3-1A-4).

[0285] R Ａｋ are each independently an alkyl group, and may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group.

[0286] R Ａｋ The number of carbon atoms in R is preferably 4 to 50, more preferably 8 to 40, and particularly preferably 10 to 40. Ａｋ Examples of the group include the following: CH ３ - (CH ２ ) ｎ６ - (CH ３ ) ３ C-(CH ２ ) ｎ7 - [(CH ３ ) ３ C-CH ２ -CH(CH ３ )-(CH ２ ) ２ -] [(CH ３ ) ３ C-CH ２ -CH(CH ３ )-] (CH ３ )C-(CH ２ ) ｎ８ n6 is, for example, 11, 17, or 22. n7 is, for example, 20. n8 is, for example, 20.

[0287] The compound (E) is preferably a compound represented by the following formula (E1) or (E2).

[0288] (R Ａｋ )-(Si(R ２ ) ｎ L ３－ｎ ) ... (E1) (RＡｋ ) ｐ２２ -C[-(O) ｕ４ -Q ｂ４ -Si(R ２ ) ｎ L ３－ｎ )] ｑ２２ (-R ３１ ) ４－ｐ２２－ｑ２２ ...(E2)

[0289] In formula (E1), R Ａｋ are each independently an alkyl group; R ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

[0290] In formula (E2), R Ａｋ are each independently an alkyl group, p22 is an integer of 1 to 3, q22 is an integer of 1 to 3, p22+q22 is an integer of 2 to 4, u4 is 0 or 1, and Q ｂ４ is an alkylene group, R ３１ is a hydrogen atom, a hydroxyl group or an alkyl group, R ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

[0291] R in formula (E1) and formula (E2) ２ , L, and n are R in the above formula (S1). ２ , L, and n.

[0292] R in formula (E1) and formula (E2) Ａｋ is R in the above formula (E). Ａｋ The same applies to u4 and Q in formula (E2). ｂ４ , and R ３１ represents u4 and Q in the above group (3-1A-4). ｂ４ , and R ３１ is the same as:

[0293] p22 is preferably 1 or 2. q22 is preferably 2 or 3.

[0294] Compound (E) is a specific example of the following.

[0295] ・CH ３ (CH) ２ ) １１ -C[H ２ CH ２ CH ２ -Si(OCH ３ ) ３ ] ３ ・CH ３ (CH) ２ ) １７ -Si(OCH ３ ) ３ ・CH ３ (CH) ２ ) ２２ -C[H ２ CH ２ CH ２ -Si(OCH ３ ) ３ ] ３ ・(CH ３ ) ３ C-(CH) ２ ) ２０ -C[H ２ CH ２ CH ２ -Si(OCH ３ ) ３ ] ３ ・[(CH ３ ) ３ C-CH ２ --H(H) ３ )-(CH ２ ) ２ -] [(CH ３ ) ３ C-CH ２ --H(H) ３ )-] (CH ３ )C-(CH ２ ) ２０ -C[H ２ CH ２ CH ２ -Si(OCH ３ ) ３ ] ３ ・(CH ３ ) ３ C-(CH) ２ ) ｔ１０ -C[H ２ CH ２ CH２ -Si(OCH ３ ) ３ ] ３ ・(CH ３ ) ３ C-(CH ２ ) ｔ１０ -C[CH ２ CH ２ CH ２ -Si(OCH ２ CH ３ ) ３ ] ３ ・[(CH ３ ) ３ CH ２ -] ３ C(CH ２ ) ｔ１０ -C[CH ２ CH ２ CH ２ -Si(OCH ３ ) ３ ] ３３ ・[(CH ３ ) ３ CH ２ -] ３ C(CH ２ ) ｔ１０ -C[CH ２ CH ２ CH ２ -Si(OCH ２ CH ３ ) ３ ] ３ In the above formula, t10 is an integer of 3 to 49, for example, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20.

[0296] R ７１ -L １ -(Si(R ２ ) ｎ L ３－ｎ ) ｑ２ ...(F) In formula (F), R ７１ is a hydrogen atom or [(CH ３ ) ３ Q ７１ -R ７３ -] ｍ７ Q ７２ (CH ３ ) ３－ｍ７ - and Q ７１ and Q７２ , are each independently C or Si, provided that Q ７１ and Q ７２ At least one of the groups is Si, and R ７３ are each independently an alkylene group having 1 to 6 carbon atoms, m7 is an integer of 0 to 3, and L １ is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and phenylene groups, ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; n is an integer of 0 to 2; and q2 is an integer of 1 or greater.

[0297] In compound (F), R ７３ , Q ７１ , Q ７２ , m7, R ２ , L, n, and q2 are the same as those in the compound (G). ７１ , Q ７２ At least one of m7 is Si. m7 is an integer of 0 to 3, preferably 0 to 2, and more preferably 0 to 1. When m7 is 0, Q ７２ is Si, and R ８１ (CH ３ ) ３ q2 is an integer of 1 or more, preferably 2 to 10, and more preferably 2 to 3.

[0298] R ８１ Examples of the groups include the following: １ This is the bonding position with (CH ３ ) ３ Si-* (CH ３ ) ３ Si—CH ２-Si(CH ３ ) ２ -* ・(CH ３ ) ３ H ２ -C(CH ３ ) ２ -* ・(CH ３ ) ３ C-CH ２ -Si(CH ３ ) ２ -* ・[(CH ３ ) ３ H ２ ] ２ -Si(CH ３ )-* ・[(CH ３ ) ３ H ２ ][(CH ３ ) ３ C-CH ２ ]-Si(CH ３ )-* ・[(CH ３ ) ３ H ２ CH ２ ] ２ -Si(CH ３ )-* ・[(CH ３ ) ３ C-CH ２ ] ３ -Si-* ・[(CH ３ ) ３ H ２ ] ３ -C-* ・[(CH ３ ) ３ C-CH ２ CH ２ CH(CH ３ ) ２ -Si(CH ３ )-* ・[(CH ３ ) ３ H ２ CH ２ CH(CH ３ ) ２ -C(CH ３ )-*

[0299] L １is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ L may have one or more groups (bonds) selected from -, and phenylene groups. １ When L is an alkylene group having 13 or more carbon atoms, it is possible to form a surface treatment layer that is excellent not only in acid resistance but also in hot water resistance and abrasion resistance. １ The number of carbon atoms in L may be 13 or more, and from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer, it is preferably 15 or more, and more preferably 19 or more. １ The upper limit of the number of carbon atoms is not particularly limited, but may be, for example, 100 or less, and from the viewpoint of ease of production of compound (1), preferably 36 or less. The number of carbon atoms in the alkylene group does not include the carbon atoms in each of the bonds (for example, the carbon in -C(=O)O-).

[0300] L １ The alkylene group in L may be linear or branched. When branched, the branched chain preferably has 1 to 2 carbon atoms, more preferably 1 (i.e., a methyl group). On the other hand, from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer, １ is preferably a straight chain alkylene group.

[0301] From the viewpoint of further improving the acid resistance, hot water resistance and abrasion resistance of the surface treatment layer, L １ The number of each of the above groups (bonds) in L is preferably 0 to 2, and more preferably 0 to 1. １ When L has the above group, the group is preferably L １ T than the center １ It is preferable that it is located on the side of the

[0302] L １ is preferably a group represented by the following formula (L): ７４-L ７１ -R ７５ (-**) ｑ２ ...(L) In formula (L), R ７４ is a linear alkylene group having 6 or more carbon atoms, ７５ is a single bond, a linear alkylene group having 1 to 6 carbon atoms, or a branched alkylene group; L ７１ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, ７１ When is a single bond, R ７５ is a single bond, and R ７４ is a linear alkylene group having 13 or more carbon atoms; L ７１ is other than a single bond, R ７５ is a linear alkylene group having 1 to 6 carbon atoms, and R ７４ and R ７５ The total number of carbon atoms in R is 13 or more, or ７５ is a linear alkylene group having 1 to 6 carbon atoms, and R ７４ and R ７５ The total number of carbon atoms in the longest carbon chain is 13 or more, q2 is an integer of 1 or more, * is R ８１ is the bonding position with Si(R ２ ) ｎ L ３－ｎ This is the bonding position with

[0303] L ７１ When is a single bond, R ７４ From the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer, the number of carbon atoms in R is preferably 13 or more, more preferably 15 or more, and even more preferably 17 or more. ７４ The number of carbon atoms in L is preferably 36 or less. ７１ In the case of various bonds other than a single bond, R ７４The number of carbon atoms in R is preferably 12 or more, more preferably 14 or more, and even more preferably 16 or more, from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer. ７５ The number of carbon atoms in L is preferably 2 to 6, more preferably 3 to 6, from the viewpoint of ease of production of compound (F). ７１ is preferably a single bond from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer.

[0304] R ７５ The branched alkylene group in ２ ) ｎ L ３－ｎ Binds to R ７５ In the case of a branched alkylene group, the number of carbon atoms is preferably 3 to 30, more preferably 4 to 24. Furthermore, the number of carbon atoms in each branched chain is preferably 1 to 6.

[0305] L １ Examples of the groups include the following: ８１ is the bonding position with Si(R ２ ) ｎ L ３－ｎ Each n1 is independently an integer of 5 or more, and preferably 32 or less.

[0306] Examples of the compound (F) include the following compounds, but are not limited to these. １ R in ８１ The carbon atom at the side end is assigned the number "1" and L １ Si(R ２ ) ｎ L ３－ｎ The carbon atom at the side end is L １ The number of carbon atoms (e.g., 13, 19, 21, etc.) constituting the group is indicated.

[0307] <Requirements (1) and (2)> The composition of the present disclosure satisfies at least one of requirements (1) and (2).

[0308] Requirement (1): In the first compound, two or more reactive silyl groups a are linked to at least one end of the organo(poly)siloxane residue. Requirement (2): In the second compound, two or more reactive silyl groups b are linked to at least one end of the hydrocarbon group.

[0309] Satisfying at least one of the requirements (1) and (2) means that at least one of the first compound and the second compound has two or more reactive silyl groups linked to at least one end. In particular, since two or more reactive silyl groups are linked to at least one end, two or more reactive silyl groups can be present close to each other in one compound.

[0310] The composition of the present disclosure contains a compound having two or more reactive silyl groups, and therefore has excellent adhesion to a substrate, water repellency, and abrasion resistance.

[0311] - Requirement (1) - When requirement (1) is satisfied, the number of reactive silyl groups a in the first compound is 2 or more. The number of reactive silyl groups a is preferably 2 to 6. In the first compound, two or more reactive silyl groups a are preferably linked to one end of the organo(poly)siloxane residue. In other words, the first compound is preferably first compound S, and the number of reactive silyl groups a is preferably 2 or more. The number of reactive silyl groups a linked to one end of the organo(poly)siloxane residue is preferably 2 to 6.

[0312] The reactive silyl group a linked to at least one end of the organo(poly)siloxane residue may be linked to the organo(poly)siloxane residue directly or via another group.

[0313] For example, in formulas (1A) to (1E), (2A), (3A), and (C), q1 is an integer of 2 or more. In formula (2B), h is an integer of 2 or more.

[0314] - Requirement (2) - When requirement (2) is satisfied, the number of reactive silyl groups b in the second compound is 2 or more. The number of reactive silyl groups b is preferably 2 to 6. In the second compound, two or more reactive silyl groups b are preferably linked to one end of the hydrocarbon group. The number of reactive silyl groups b linked to one end of the hydrocarbon group is preferably 2 to 6.

[0315] The reactive silyl group b linked to at least one end of the hydrocarbon group may be linked to the hydrocarbon group directly or via another group. For example, in formula (E), q2 is an integer of 2 or greater.

[0316] The embodiments of the composition of the present disclosure include the following embodiments 1 to 3. Aspect 1: Satisfies requirements (1) and (2). Aspect 2: Satisfies requirement (1) but not requirement (2). Aspect 3: Satisfies requirement (1) but not requirement (2). Aspect 1 is preferred as an embodiment of the composition of the present disclosure.

[0317] In the composition of the present disclosure, the mass ratio of the second compound to the first compound is preferably 0.01 to 0.9, more preferably 0.02 to 0.7, even more preferably 0.03 to 0.5, and particularly preferably 0.04 to 0.2. When the mass ratio of the second compound to the first compound is equal to or greater than the lower limit of the above range, excellent water repellency and abrasion resistance are achieved. When the mass ratio of the second compound to the first compound is equal to or less than the upper limit of the above range, excellent water repellency is achieved. Furthermore, in the composition of the present disclosure, the mass ratio of the second compound to the total mass of the first compound and the second compound is preferably 0.001 to 0.9, more preferably 0.1 to 0.9.

[0318] The composition of the present disclosure may contain components other than the first compound and the second compound. For example, the composition of the present disclosure may contain impurities such as by-products produced in the manufacturing process of the first compound and the second compound.

[0319] (Liquid Medium) The composition of the present disclosure may contain a liquid medium. The liquid medium may be one type only, or two or more types.

[0320] The liquid medium is preferably an organic solvent. Examples of organic solvents include compounds consisting only of hydrogen atoms and carbon atoms, and compounds consisting only of hydrogen atoms, carbon atoms, and oxygen atoms. Specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone-based organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone.Specific examples of ether-based organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of the ester-based organic solvent include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, diethylene glycol Cholesterol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, and dipropylene glycol monopropyl ether. Examples of the glycol monopropyl ether include glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol dimethyl ether pentane, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcohol-based organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0321] Examples of the organic solvent include halogen-based organic solvents, nitrogen-containing compounds, sulfur-containing compounds, siloxane compounds, and fluorine-containing organic solvents.

[0322] Specific examples of halogen-based organic solvents include dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0323] Examples of the nitrogen-containing compound include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0324] Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide.

[0325] Examples of the siloxane compound include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0326] Examples of the fluorine-containing organic solvent include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３ ) (e.g., Novec™ 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C ２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Limited) and other alkyl perfluoroalkyl ethers (the perfluoroalkyl group and the alkyl group may be linear or branched), CF ３ CH ２ OCF ２ CHF ２(for example, Asahiklin (registered trademark) AE-3000 manufactured by AGC); hydrofluoroolefins (HFOs) (for example, 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (for example, Amorea (registered trademark) AS-300 manufactured by AGC), Opteon (registered trademark) SF01, SF05, SF10, SF30, SF33, SF70, SF79, SF80 manufactured by Chemours).

[0327] The content of the liquid medium is preferably 50 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the liquid medium may be 90 to 99.99 mass%, 95 to 99.98 mass%, 97 to 99.97 mass%, or 98 to 99.95 mass%, relative to the total amount of the composition of the present disclosure.

[0328] (Other Components) In addition to the first compound, the second compound, and the liquid medium, the composition of the present disclosure may contain other components to the extent that the effects of the present disclosure are not impaired. Examples of other components include known additives such as acid catalysts and basic catalysts that promote hydrolysis and condensation reactions of reactive silyl groups.

[0329] The catalyst may be any appropriate acid or base, transition metal (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having an unshared electron pair in their molecular structure, nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, urea compounds), etc. Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine.

[0330] Other components also include metal compounds having a hydrolyzable group (hereinafter, metal compounds having a hydrolyzable group are also referred to as "specific metal compounds"). When the composition of the present disclosure contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include those represented by the following formulas (M1) to (M3).

[0331] M (X ｂ１ ) ｍ１１ (X ｂ２ ) ｍ１２ (X ｂ３ ) ｍ１３ ... (M1) Si (X ｂ４ ) (X ｂ５ ) ３ ... (M2) (X ｂ６ ) ３ Si-(Y ｂ１ )-Si(X ｂ７ ) ３ …(M3)

[0332] In formula (M1), M represents a trivalent or tetravalent metal atom. ｂ１ Each of X independently represents a hydrolyzable group. ｂ２ Each of X independently represents a siloxane skeleton-containing group. ｂ３ each independently represents a hydrocarbon chain-containing group, m11 is an integer of 2 to 4, m12 and m13 are each independently an integer of 0 to 2, when M is a trivalent metal atom, m11 + m12 + m13 is 3, and when M is a tetravalent metal atom, m11 + m12 + m13 is 4.

[0333] In formula (M2), X ｂ４ represents a hydrolyzable silane oligomer residue. ｂ５ each independently represents a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0334] In formula (M3), X ｂ６ and X ｂ７ each independently represents a hydrolyzable group or a hydroxyl group. ｂ１ represents a divalent organic group.

[0335] In formula (M1), the metal represented by M also includes semimetals such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0336] In formula (M1), X ｂ１ The hydrolyzable group represented by the formula (I) is the reactive silyl group represented by the formula (I). ２ ) ｎ L ３－ｎ Examples of the hydrolyzable group include the same as the hydrolyzable group represented by L in the formula (1).

[0337] X ｂ２ The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (—Si—O—) and may be linear or branched. Examples of the siloxane unit include a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like may be bonded to the terminal silicon atom of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include: ＊ -(O-Si(CH ３ ) ２ ) ｎ CH ３ In this case, n is an integer of 1 to 5, and * represents a bonding site with an adjacent atom.

[0338] X ｂ３The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be a straight chain or a branched chain, with a straight chain being preferred. The hydrocarbon chain may be a saturated hydrocarbon chain or an unsaturated hydrocarbon chain, with a saturated hydrocarbon chain being preferred. The number of carbon atoms in the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, and more preferably a methyl group, an ethyl group, or a propyl group.

[0339] Preferably, m1 is 3 or 4.

[0340] As the compound represented by formula (M1), compounds represented by the following formulas (M1-1) to (M1-5) in which M is Si are preferred, and the compound represented by formula (M1-1) is more preferred. As the compound represented by formula (M1-1), tetraethoxysilane, tetramethoxysilane, and triethoxymethylsilane are preferred.

[0341] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ …(M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH—Si(X ｂ１ ) ３ …(M1-5)

[0342] In formula (M2), X ｂ４The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group and an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one type. Examples of the hydrolyzable silane oligomer residue include (C ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ O- ＊ Here, * represents a bonding site with an adjacent atom.

[0343] In formula (M2), X ｂ５ The hydrolyzable group represented by the formula (I) is the reactive silyl group represented by the formula (I). ２ ) ｎ L ３－ｎ Examples of the hydrolyzable group include the same as the hydrolyzable group represented by L in the formula (1), a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. X ｂ５ As the group, a hydrolyzable group is preferred.

[0344] The compound represented by formula (M2) includes (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ O.C. ２ H ５ etc.

[0345] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. ｂ６ and Xｂ７ Examples of the hydrolyzable group represented by formula (M3) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and an alkoxy group and an isocyanato group are preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group and an ethoxy group are more preferred. In formula (M3), X ｂ６ and X ｂ７ may be the same group or different groups. ｂ６ and X ｂ７ are preferably the same group.

[0346] In formula (M3), Y ｂ１ is a divalent organic group that connects the reactive silyl groups at both ends. ｂ１ The number of carbon atoms in Y is preferably 1 to 8, and more preferably 1 to 3. ｂ１ Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ C(CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C(CH ３ ) ２ -, -CH ２ CH ２ OCH２ CH ２ -, -CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ ) CH ２ OCH ２ CH (CH ３ ) -, -C ６ H ４ - are listed.

[0347] The compound represented by formula (M3) includes (CH ３ O) ３ Si(CH ２ ) ２ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ２ Si(OC ２ H ５ ) ３ , (OCN) ３ Si(CH ２ ) ２ Si(NCO) ３ , Cl ３ Si(CH ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH ２ ) ６ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ６ Si(OC ２ H ５ ) ３ Examples include:

[0348] The content of other components that may be included in the composition of the present disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total amount of the composition of the present disclosure. When the composition of the present disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total amount of the composition of the present disclosure.

[0349] The total content of the first compound, the second compound, and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. The solid content concentration of the composition of the present disclosure is a value calculated from the mass before heating and the mass after heating for 4 hours in a convection dryer under conditions of a temperature 50°C higher than the boiling point of the solvent contained in the composition.

[0350] [Surface Treatment Agent] The surface treatment agent of the present disclosure is the above-described composition. The surface treatment agent of the present disclosure may contain a liquid medium as needed, and may contain other components other than the first compound, the second compound, and the liquid medium. The surface treatment agent of the present disclosure contains the first compound and the second compound and satisfies at least one of the above requirements (1) and (2), and therefore can form a surface treatment layer with excellent water repellency and abrasion resistance.

[0351] [Article] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0352] The surface treatment layer may be formed on a portion of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots. In the surface treatment layer, the first compound and the second compound contained in the composition of the present disclosure are contained in a state in which hydrolysis of some or all of the reactive silyl groups has progressed and dehydration condensation reaction of the silanol groups has progressed.

[0353] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0354] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0355] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, drinking vessels, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0356] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0357] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0358] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure, disposed on the primer layer.

[0359] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0360] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0361] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0362] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0363] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with better abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0364] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0365] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0366] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide better abrasion resistance to the surface treatment layer, and Group 1 elements and Group 2 elements are more preferred, with Group 1 elements being even more preferred. The specific element may contain only one type of element or two or more types of elements.

[0367] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0368] From the viewpoint of achieving superior abrasion resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0369] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the above upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0370] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0371] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0372] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0373] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0374] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific source in the same boat, co-evaporating silica and a specific element source in separate boats, or similarly placing them in separate boats and alternately depositing them. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0375] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0376] Specific examples of the silicon compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0377] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0378] The liquid medium may be the same as the liquid medium that may be contained in the composition of the present disclosure.

[0379] The content of the liquid medium is preferably 80 to 99.99% by mass, more preferably 90 to 99.9% by mass, based on the total amount of the coating liquid used to form the underlayer.

[0380] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0381] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0382] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0383] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0384] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0385] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0386] [Method for manufacturing an article] The method for manufacturing an article according to the present disclosure is, for example, a method for manufacturing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0387] Examples of dry coating methods include vacuum deposition, CVD, and sputtering. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing decomposition of the compound and simplicity of the equipment. For vacuum deposition, a pellet-shaped substance obtained by impregnating a metal porous body such as iron or steel with the compound of the present disclosure may be used. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to obtain a pellet-shaped substance impregnated with the compound of the present disclosure.

[0388] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0389] In order to improve the abrasion resistance of the surface treatment layer, an operation to promote the reaction between the compound of the present disclosure and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, the substrate on which the surface treatment layer is formed can be heated in a humid atmosphere to promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0390] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples. Examples 1 to 8 and Examples 12 to 15 are working examples, and Examples 9 to 11 are comparative examples.

[0391] [Synthesis of First Compound (Compound X1)] Compound 11A was obtained according to the method described in WO 2021 / 054413.

[0392]

[0393] Compound 11B was obtained according to the method described in JP 2017-119849 A.

[0394]

[0395] Under a nitrogen atmosphere, 2,3,4,5,6-pentafluorophenol (6.8 g), THF (tetrahydrofuran, 42 mL), and triethylamine (5.1 g) were added to a 100 mL flask and stirred at 25°C. Next, 10-undecenoyl chloride (5.0 g) was added dropwise, and the mixture was stirred at 25°C for 1 hour. The reaction solution was filtered, and the solvent and low-boiling components were distilled off under reduced pressure. 7.9 g of compound 11C was obtained by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate). The structure of compound 11C was confirmed by the following NMR data.

[0396]

[0397] 1 H-NMR (400 MHz, CDCl3) δ 5.74 (ddt, J = 16.9, 10.2, 6.6 Hz, 1H), 5.05 - 4.77 (m, 2H), 2.59 (t, J = 7.4 Hz, 2H), 1.97 (q, J = 7.1 Hz, 2H), 1.70 (p, J = 7.4 Hz, 2H), 1.42 - 1.08 (m, 10H).

[0398] Under a nitrogen atmosphere, compound 11C (5.6 g), THF (5.0 mL), chlorodimethylsilane (2.3 g), and a xylene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 0.10 mL) were placed in a 200 mL flask and stirred at 25°C for 2 hours. The solvent and low-boiling components were removed by distillation under reduced pressure, yielding 7.2 g of compound 11D. The structure of compound 11D was confirmed by the following NMR data.

[0399] 1 H-NMR (400 MHz, CDCl3) δ 2.63 (t, J = 7.4 Hz, 2H), 1.74 (p, J = 7.4 Hz, 2H), 1.46 - 1.17 (m, 14H), 0.90 - 0.69 (m, 2H), 0.37 (s, 6H).

[0400] ​​Under a nitrogen atmosphere, tris(trimethylsiloxy)silanol (1.3 g) and THF (20 mL) were added to a 100 mL three-neck flask and stirred. The mixture was cooled to 0°C, and a hexane solution of n-BuLi (1.6 M, 2.4 mL) was added dropwise. A THF solution of hexamethylcyclotrisiloxane (1.1 M, 4.0 mL) was added dropwise, followed by a THF solution of hexamethylcyclotrisiloxane (1.1 M, 22 mL) and stirring for 7 hours. Subsequently, compound 11D (3.6 g) was added and stirred for 1 hour, after which compound 11A (3.2 g) was added and stirred for 1 hour. Hexane and ion-exchanged water were added sequentially to the reaction solution, and the mixture was separated and the organic layer was isolated. The solvent and low-boiling point components were removed under reduced pressure, followed by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate) to obtain 0.98 g of compound 11E. The structure of Compound 11E was confirmed by the following NMR data: In Compound 11E, the average value of n10 was 21.

[0401]

[0402] 1 H-NMR (400 MHz, CDCl3) δ 5.81 (ddt, J = 16.9, 10.2, 6.7 Hz, 2H), 5.31 (d, J = 4.8 Hz, 1H), 5.08 - 4.84 (m, 4H), 3.19 (t, J = 6.0 Hz, 2H), 2.31 - 2.11 (m, 2H), 2.08 - 1.92 (m, 4H), 1.63 (t, J = 7.3 Hz, 2H), 1.28 (d, J = 9.6 Hz, 47H), 0.53 (t, J = 7.7 Hz, 2H), 0.09 (s, 159H).

[0403] ​A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.40 g) were added to compound 11E (0.80 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 25°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.69 g of compound X1. The structure of compound X1 was confirmed by the following NMR data. In compound X1, the average value of n10 was 21.

[0404]

[0405] 1 H-NMR (400 MHz, CDCl3) δ 5.31 (d, J = 4.8 Hz, 1H), 3.57 (s, 18H), 3.18 (t, J = 6.0 Hz, 2H), 2.31 - 2.11 (m, 2H), 1.64 - 1.25 (m, 57H), 0.64 (m, 4H), 0.52 (t, J = 7.7 Hz, 2H), 0.09 (s, 159H).

[0406] [Preparation of First Compound (Compound X2)] "X-24-9011" manufactured by Shin-Etsu Chemical Co., Ltd. was used as Compound 12. The structure of X-24-9011 is as follows: Note that the number of repeating units of dimethylpolysiloxane, 43, is an average value.

[0407]

[0408] [Synthesis of first compound (compound X3)]

[0409] ​Dichloromethane (100 g) and trichloroisocyanuric acid (14 g) were added to 1,1,1,3,5,5,5-heptamethyltrisiloxane (10 g) and stirred at 25°C for 3 hours. The reaction mixture was then filtered to remove insoluble matter, and the filtrate was then distilled off to remove low-boiling components. Water (20 g), THF (40 g), and triethylamine (10 g) were added to the resulting crude liquid, and the mixture was stirred at 25°C for 2 hours. Hexane and water were added for extraction, and the low-boiling components were removed by distillation. The resulting crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / ethyl acetate), yielding 8.3 g of compound 12A. The structure of compound 12A was confirmed by the following NMR data.

[0410]

[0411] 1 H-NMR (400 MHz, CDCl3) δ 2.41 (q, J = 7.2 Hz, 1H), 0.20 - 0.21 (m, 21H).

[0412] [Synthesis of Compound 12B] THF (20 g) was added to compound 12A (2.0 g) and the mixture was cooled to 0°C. Then, a methyllithium solution (3.1 M in diethoxymethane) (2.7 mL) was added and stirred at 25°C for 10 minutes. Next, a solution of hexamethylcyclotrisiloxane (5.6 g) dissolved in THF (20 g) was added and stirred at 25°C for 4 hours. Next, chlorodimethylsilane (2.0 g) was added and stirred at 25°C for 1 hour. After extraction with hexane and water, low-boiling components were removed by distillation. The obtained crude liquid was purified by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) to obtain 4.3 g of compound 12B. The average value of n in compound 12B was 9. The structure of compound 12B was confirmed by the following NMR data.

[0413]

[0414] 1 ​​H-NMR (400 MHz, CDCl3) δ 4.63 (p, J = 2.8 Hz, 1H), 0.11 (d, J = 2.8 Hz, 6H), 0.09 - 0.12 (m, 75H).

[0415] To compound 12B (2.3 g), dichloromethane (20 g) and 18-bromo-1-octadecene (0.75 g) were added and stirred until homogenous. Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 4.1 mg) was added and stirred at 25°C for 2 hours. After distilling off low-boiling point components under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 1.8 g of compound 12C. In compound 12C, the average value of n was 9. The structure of compound 12C was confirmed by the following NMR data.

[0416]

[0417] 1 H-NMR (400 MHz, CDCl3) δ 3.33 (t, J = 6.9 Hz, 2H), 1.78 (dt, J = 14.5, 7.0 Hz, 2H), 1.42 - 1.08 (m, 30H), 0.45 (t, J = 7.7Hz, 2H), 0.09 - 0.12 (m, 81H).

[0418] To compound 12C (1.8 g), THF (20 g), allyl magnesium chloride solution (in THF, 2.0 M) (20 mL), and copper(II) chloride (0.02 g) were added, and the mixture was stirred at 50° C. for 2 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling point components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 1.5 g of compound 12D. In compound 12D, the average value of n was 9. The structure of compound 12D was confirmed by the following NMR data.

[0419]

[0420] 1 ​​H-NMR (400 MHz, CDCl3) δ 5.74 (ddt, J = 17.0, 10.2, 6.7 Hz, 1H), 5.0 1- 4.76 (m, 2H), 2.07 - 1.87 (m, 2H), 1.41 - 0.97 (m, 34H), 0.45 (dd, J = 9.5, 5.9 Hz, 2H), 0.09 - 0.12 (m, 81H).

[0421] Dichloromethane (10 g) was added to compound 12D (1.5 g) to dissolve it. Next, a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 4.1 mg), aniline (2.6 mg), and trimethoxysilane (0.60 g) were added, and the mixture was stirred at 50°C for 2 hours. The solvent was distilled off under reduced pressure to obtain 1.6 g of compound X3. In compound X3, the average value of n was 9. The structure of compound X3 was confirmed by the following NMR data.

[0422]

[0423] 1 H-NMR (400 MHz, CDCl3) δ 3.49 (s, 9H), 1.81 - 0.97 (m, 38H), 0.65 - 0.51 (m,2H), 0.45 (dd, J = 9.8, 5.3 Hz, 2H), 0.09 - 0.12 (m, 81H).

[0424] [Synthesis of second compound (compound Y1)]

[0425] A THF solution (0.8 M) of compound 21 was obtained by the method described in WO 2021 / 054413.

[0426]

[0427] ​1-Bromoundecane (2.3 g) was dissolved in THF (10 g), and copper(II) chloride (0.07 g) and a THF solution of compound 21 (0.8 M, 20 mL) were added, followed by stirring at 50°C for 16 hours. After completion of the reaction, hydrochloric acid was added, and the mixture was extracted with hexane. The solvent and low-boiling components were distilled off under reduced pressure, and flash column chromatography using silica gel (developing solvent: dichloromethane / hexane) was performed to obtain 1.2 g of compound 22. The structure of compound 22 was confirmed by the following NMR data.

[0428]

[0429] 1 H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 16.6, 10.5, 7.4 Hz, 3H), 5.13 - 4.78 (m, 6H), 1.98 (dt, J = 7.4, 1.2 Hz, 6H), 1.45 - 1.13 (m, 22H), 0.96 - 0.76 (m, 3H).

[0430] Dichloromethane (10 g), compound 22 (1.2 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 8.3 mg), aniline (2.6 mg), and trimethoxysilane (2.5 g) were added and stirred at 50°C for 2 hours. The solvent and low-boiling components were then distilled off under reduced pressure, yielding 2.5 g of compound Y1. The structure of compound Y1 was confirmed from the following NMR data.

[0431]

[0432] 1 H-NMR (400 MHz ,CDCl3) δ 3.56 (s, 27H), 1.39 - 1.03 (m, 34H), 0.96 - 0.79 (m, 3H), 0.58 (dd, J = 8.7, 6.9 Hz, 6H).

[0433] [Preparation of Second Compound (Compound Y2)] As the compound Y2, octadecyltrimethoxysilane (CH ３ (CH ２ ) １７ -Si(OCH ３ )​​３ , manufactured by Tokyo Chemical Industry Co., Ltd.) was prepared.

[0434] [Synthesis of Second Compound (Compound Y3)] 1-Bromodocosane (2.5 g) was dissolved in THF (10 g), and copper(II) chloride (0.07 g) and a THF solution of Compound 21 (0.8 M, 20 mL) were added, followed by stirring at 50°C for 16 hours. Hydrochloric acid was added to the reaction solution, and the mixture was extracted with hexane. The solvent and low-boiling components were distilled off under reduced pressure, and flash column chromatography using silica gel (developing solvent: dichloromethane / hexane) was performed to obtain 1.8 g of Compound 23. The structure of Compound 23 was confirmed by the following NMR data.

[0435]

[0436] 1 H-NMR (400 MHz, CDCl3) δ 5.70 (ddt, J = 16.8, 11.3, 7.4 Hz, 3H), 5.24 - 4.92 (m, 6H), 1.84 (dt, J = 7.4, 1.1 Hz, 6H), 1.44 - 0.72 (m, 47H).

[0437] Dichloromethane (10 g), compound 23 (1.2 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 8.3 mg), aniline (2.6 mg), and trimethoxysilane (2.5 g) were added and stirred at 50°C for 2 hours. The solvent and low-boiling components were removed by distillation under reduced pressure, yielding 2.0 g of compound Y3. The structure of compound Y3 was confirmed from the following NMR data.

[0438]

[0439] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 27H), 1.77 - 1.05 (m, 56H), 0.92 - 0.85 (m, 3H), 0.68 (t, J = 9.4 Hz, 6H).

[0440] [Synthesis of second compound (compound Y4)]

[0441] ​​1,18-Octadecanediol (25 g) was dissolved in toluene (1,000 mL). 48% hydrobromic acid (22 g) was added, and the mixture was stirred under reflux for 24 hours. After the reaction was completed, the layers were separated, and the aqueous layer was extracted with dichloromethane. The organic layers were combined and washed with saturated aqueous sodium bicarbonate. The mixture was dried over anhydrous magnesium sulfate and filtered. The filtrate was evaporated under reduced pressure, and subjected to flash column chromatography using silica gel (developing solvent: hexane / methyl acetate), yielding 22 g of compound 31. The structure of compound 31 was confirmed by the following NMR data.

[0442]

[0443] 1 H-NMR (400 MHz, CDCl3) δ 3.57 (td, J = 5.8, 5.8 Hz, 2H), 3.42 (t, J = 4.7 Hz, 2H), 1.81 - 1.20 (m, 32H).

[0444] Compound 31 (21 g) was dissolved in THF (500 mL), and copper(II) chloride (0.4 g) and a THF solution of compound 21 (0.8 M, 200 mL) were added, followed by stirring at 50°C for 24 hours. Hydrochloric acid was added to the reaction solution, and the mixture was extracted with dichloromethane. The solvent and low-boiling components were removed by distillation under reduced pressure, and flash column chromatography using silica gel (developing solvent: hexane / methyl acetate) was performed to obtain 18 g of compound 32. The structure of compound 32 was confirmed by the following NMR data.

[0445]

[0446] 1 H-NMR (400 MHz, CDCl3) δ 5.81 - 5.57 (m, 3H), 5.28 - 4.88 (m, 6H), 3.57 (td, J = 5.8, 5.8 Hz, 2H), 1.90 - 1.78 (m, 6H), 1.64 - 1.48 (m, 2H), 1.38 - 1.15 (m, 32H).

[0447] ​​Compound 32 (17 g) was dissolved in THF (500 mL) and triphenylphosphine (20 g) was added. Carbon tetrabromide (20 g) was slowly added while stirring in an ice bath, and stirring was continued for 24 hours. Silica gel was added to the reaction solution, and the solvent was distilled off. Extraction with hexane yielded 14 g of compound 33. The structure of compound 33 was confirmed by the following NMR data.

[0448]

[0449] 1 H-NMR (400 MHz, CDCl3) δ 5.80 - 5.59 (m, 3H), 5.23 - 4.90 (m, 6H), 3.42 (t, J = 4.7 Hz, 2H), 1.85 (d, J = 7.3 Hz, 6H), 1.82 - 1.10 (m, 36H).

[0450] Compound 33 (5.0 g) was dissolved in THF (100 mL), and copper(II) chloride (0.005 g) and a THF solution of neopentyl magnesium chloride (1 M, 16 mL) were added, followed by stirring at 50°C for 24 hours. Hydrochloric acid was added to the reaction solution, and the mixture was extracted with hexane. The solvent and low-boiling components were removed by distillation under reduced pressure, and flash column chromatography using silica gel (developing solvent: hexane) was performed to obtain 3.4 g of compound 34.

[0451]

[0452] 1 H-NMR (400 MHz, CDCl3) δ 5.77 - 5.56 (m, 3H), 5.25 - 4.89 (m, 6H), 2.00 - 1.67 (m, 6H), 1.49 - 1.10 (m, 40H), 0.85 (s, 9H).

[0453] ​​Dichloromethane (10 g), compound 34 (1.0 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 8.3 mg), aniline (2.6 mg), and trimethoxysilane (1.0 g) were added and stirred at 50°C for 2 hours, after which the solvent and low-boiling components were distilled off under reduced pressure, yielding 1.8 g of compound Y4. The structure of compound Y4 was confirmed from the following NMR data.

[0454]

[0455] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 27H), 1.57 - 1.12 (m, 52H), 0.85 (s, 9H), 0.68 (t, J = 9.4 Hz, 9H).

[0456] [Synthesis of second compound (compound Y5)]

[0457] Isostearic acid (25 g), p-toluenesulfonic acid monohydrate (4.3 g), and methanol (500 g) were added and stirred under reflux for 24 hours. The reaction solution was concentrated and purified by silica gel column chromatography to obtain 26 g of compound 41. The structure of compound 41 was confirmed by the following NMR data.

[0458]

[0459] 1 H-NMR (400 MHz, CDCl3) δ 3.63 (s, 3H), 2.54 - 0.79 (m, 35H).

[0460] ​​Under a dry nitrogen atmosphere, 60% sodium hydride (4.1 g) was dissolved in THF (1,000 mL). Compound (25 g) was slowly added while stirring in an ice bath. After stirring for 1 hour, methyl iodide (13 g) was slowly added, and stirring was continued for 24 hours. The reaction was stopped with a 2N aqueous hydrochloric acid solution, and the layers were separated. The aqueous layer was extracted with ethyl acetate, and the organic layers were combined. The organic layer was dried over anhydrous sodium sulfate and filtered. The filtrate was concentrated using an evaporator. The resulting crude liquid was purified by silica gel column chromatography to obtain 25 g of compound 42. The structure of compound 42 was confirmed by the following NMR data.

[0461]

[0462] 1 H-NMR (400 MHz, CDCl3) δ 3.63 (s, 3H), 2.54 - 0.79 (m, 38H).

[0463] Under a dry nitrogen atmosphere, a THF solution of lithium aluminum hydride (1 M, 100 mL) was added to THF (1,000 mL). Compound (24 g) was slowly added with stirring in an ice bath, and stirring was continued for 1 hour. Water (4 mL), 15% aqueous sodium hydroxide solution (4 mL), and water (12 mL) were slowly added in this order, and the mixture was filtered through Celite. The filtrate was concentrated using an evaporator to obtain 19 g of compound 43. The structure of compound 43 was confirmed by the following NMR data.

[0464]

[0465] 1 H-NMR (400 MHz, CDCl3) δ 3.69 - 3.63 (m, 1H), 3.44 - 3.37 (m, 1H), 1.73 - 0.80 (m, 37H).

[0466] Compound 43 (15 g), carbon tetrachloride (12 g), and acetonitrile (150 mL) were added, and triphenylphosphine (22 g) was added while stirring, followed by stirring at 60° C. for 1 hour. Silica gel was added to the reaction solution, and the solvent was distilled off. Extraction with hexane yielded 16 g of compound 44. The structure of compound 44 was confirmed by the following NMR data. ​​

[0467]

[0468] 1 H-NMR (400 MHz, CDCl3) δ 3.63 - 3.53 (m, 1H), 3.36 - 3.25 (m, 1H), 1.81 - 0.77 (m, 37H).

[0469] Under a dry nitrogen atmosphere, magnesium (1.3 g), THF (100 mL), 1,2-dibromoethane (0.10 g), and the compound (15 g) were added, and stirring was continued for 24 hours under reflux conditions. 80 mL of a THF solution (0.6 M) of compound 45 was obtained. The structure of compound 45 was confirmed by the following NMR data.

[0470]

[0471] 1 H-NMR (400 MHz, CDCl3) δ 1.81 - 0.77 (m, 37H), -0.19 - -0.55 (br, 2H).

[0472] Compound 33 (5.0 g) was dissolved in THF (100 mL), copper(II) chloride (0.005 g) and a THF solution of compound 45 (0.6 M, 30 mL) were added, and the mixture was stirred at 50°C for 24 hours. Hydrochloric acid was added to the reaction solution, and the mixture was extracted with hexane. The solvent and low-boiling components were distilled off under reduced pressure, and flash column chromatography using silica gel (developing solvent: hexane) was performed to obtain 4.8 g of compound 46. The structure of compound 46 was confirmed by the following NMR data.

[0473]

[0474] 1 H-NMR (400 MHz, CDCl3) δ 5.75 - 5.64 (m, 3H), 5.20 - 4.92 (m, 6H), 1.85 (d, J = 1.4 Hz, 6H), 1.68 - 0.73 (m, 77H).

[0475] ​​​Dichloromethane (10 g), compound 46 (1.0 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content 3%, 8.3 mg), aniline (2.6 mg), and trimethoxysilane (1.0 g) were added and stirred at 50°C for 2 hours, after which the solvent and low-boiling components were distilled off under reduced pressure, yielding 1.5 g of compound Y5. The structure of compound Y5 was confirmed from the following NMR data.

[0476]

[0477] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 27H), 1.65 - 0.76 (m, 89H), 0.68 (t, J = 9.4 Hz, 6H).

[0478] [Synthesis of second compound (compound Y6)]

[0479] A THF solution (0.8 M) of compound 51 was obtained by the method described in WO 2021 / 054413.

[0480] 1,18-Octadecanediol (25 g) was dissolved in toluene (1,000 mL). 48% hydrobromic acid (22 g) was added, and the mixture was stirred under reflux for 24 hours. After the reaction was completed, the layers were separated, and the aqueous layer was extracted with dichloromethane. The organic layers were combined and washed with saturated aqueous sodium bicarbonate. The mixture was dried over anhydrous magnesium sulfate and filtered. The filtrate was evaporated under reduced pressure and purified by silica gel column chromatography to obtain 22 g of compound 52. The structure of compound 52 was confirmed by the following NMR data.

[0481] 1 H-NMR (400 MHz, CDCl3) δ 3.57 (td, J = 5.8, 5.8 Hz, 2H), 3.42 (t, J = 4.7 Hz, 2H), 1.81 - 1.20 (m, 32H).

[0482] ​​Compound 52 (21 g) was dissolved in THF (500 mL), copper(II) chloride (0.4 g) and a THF solution (0.8 M) of compound 51 (200 mL) were added, and the mixture was stirred at 50° C. for 24 hours. After the reaction was completed, hydrochloric acid was added, and the mixture was extracted with dichloromethane. The solvent and low-boiling components were distilled off under reduced pressure, and flash column chromatography using silica gel was performed to obtain 18 g of compound 53. The structure of compound 53 was confirmed by the following NMR data.

[0483] 1 H-NMR (400 MHz, CDCl3) δ 5.81 - 5.57 (m, 3H), 5.28 - 4.88 (m, 6H), 3.57 (td, J = 5.8, 5.8 Hz, 2H), 1.90 - 1.78 (m, 6H), 1.64 - 1.48 (m, 2H), 1.38 - 1.15 (m, 32H).

[0484] Compound 53 (17 g) was dissolved in THF (500 mL) and triphenylphosphine (20 g) was added. Carbon tetrabromide (20 g) was slowly added while stirring in an ice bath, and stirring was continued for 24 hours. Silica gel was added to the reaction solution, and the solvent was distilled off. Extraction with hexane yielded 14 g of compound 54. The structure of compound 54 was confirmed by the following NMR data.

[0485] 1 H-NMR (400 MHz, CDCl3) δ 5.80 - 5.59 (m, 3H), 5.23 - 4.90 (m, 6H), 3.42 (t, J = 4.7 Hz, 2H), 1.85 (d, J = 7.3 Hz, 6H), 1.82 - 1.10 (m, 36H).

[0486] ​​Compound 54 (5.0 g) was dissolved in THF (100 mL), and copper(II) chloride (0.005 g) and a 1.0 M solution of trimethylsilylmethylmagnesium chloride in diethyl ether (16 mL) were added, followed by stirring at 60°C for 24 hours. After completion of the reaction, hydrochloric acid was added, and the mixture was extracted with hexane. The solvent and low-boiling components were distilled off under reduced pressure, and the structure of compound 55 was confirmed by flash column chromatography using silica gel from the following NMR data.

[0487] 1 H-NMR (400 MHz, CDCl3) δ 5.70 (ddt, J = 16.8, 11.3, 7.4 Hz, 3H), 5.23 - 4.85 (m, 6H), 1.84 (dt, J = 7.3, 1.0 Hz, 6H), 1.45 - 1.10 (m, 38H), 0.58 (t, J = 8.5 Hz, 2H), -0.05 (s, 9H).

[0488] A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (1.0 g) were added to a solution of compound 55 (0.5 g) in dichloromethane (10 g), and the mixture was stirred for 2 hours at 50° C. The solvent was distilled off under reduced pressure, yielding 0.7 g of compound Y6.

[0489] 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 27H), 1.51 - 1.08 (m, 50H), 0.77 - 0.46 (m, 8H), -0.05 (s, 9H).

[0490] ​​[Preparation of Surface Treatment Agent] The first compound and the second compound shown in Table 1 were mixed in the mass ratio shown in Table 1, and heptane was further added as a liquid medium to obtain a surface treatment agent with a solid content of 20 mass%. A substrate was subjected to a surface treatment using the surface treatment agent. A dry coating method was used as the surface treatment method. Chemically strengthened glass was used as the substrate. 30 g of silicon oxide was placed as a deposition source in a copper hearth in a vacuum deposition apparatus ("VTR-350M" manufactured by ULVAC Kiko Co., Ltd.). A glass substrate was placed in the vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 5 × 10 －３ The hearth was then evacuated to a pressure of 10 Pa or less. The hearth was heated to approximately 2,000°C, and silicon oxide was vacuum-deposited on the surface of the substrate, producing a substrate with a silicon oxide layer having a thickness of approximately 20 nm. 0.5 g of each surface treatment agent was placed in a molybdenum boat in a vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 1 × 10 －３ The boat containing the surface treatment agent was heated at a temperature increase rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate with a silicon oxide layer. The substrate on which the compound or composition had been deposited was heat-treated at 140°C for 30 minutes and washed with ethanol to obtain an article having a surface treatment layer on the surface of the substrate.

[0491] The articles obtained by the dry coating method were evaluated for water repellency, abrasion resistance, and fingerprint removability using the following methods.

[0492] <Water repellency> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the water contact angle. The 2θ method was used to calculate the water contact angle. The evaluation criteria are as follows: AA, A, and B are levels that are acceptable for practical use. AA: Initial water contact angle of 105° or more. A: Initial water contact angle of 100° or more and less than 105°. B: Initial water contact angle of 95° or more and less than 100°. C: Initial water contact angle less than 95°.

[0493] <Abrasion Resistance 1> In accordance with JIS L0849:2013 (corresponding to ISO:105-X12:2001), the surface treatment layer of the article was subjected to a reciprocating traverse test using a reciprocating traverse tester (manufactured by KNT Corporation) with steel wool Bonstar (#0000) at a pressure of 98.07 kPa and a speed of 320 cm / min, and the water contact angle after the friction test was measured every 100 times. The method for measuring the water contact angle after the friction test was the same as the method for measuring the initial water contact angle in the above-mentioned evaluation method for water repellency. First, if the water contact angle obtained after 100 reciprocating strokes was less than 90°, the friction test was terminated and the number of rubbings at the end was recorded. If the water contact angle obtained was 90° or greater, the friction test was continued. This operation was repeated until the maximum number of rubbings was 10,000. The evaluation criteria were as follows: A and B are levels that are acceptable for practical use. A: The number of rubbings was 2,000 or more. B: The number of rubs was 1,000 or more and less than 2,000. C: The number of rubs was less than 1,000.

[0494] <Abrasion Resistance 2> In accordance with JIS L0849:2013 (corresponding to ISO:105-X12:2001), the surface treatment layer of the article was subjected to a reciprocating traverse test using a reciprocating traverse tester (manufactured by KNT Corporation) with steel wool Bonstar (#0000) at a pressure of 98.07 kPa and a speed of 320 cm / min, and the water contact angle after the friction test was measured every 100 times. The method for measuring the water contact angle after the friction test was the same as the method for measuring the initial water contact angle in the above-mentioned water repellency evaluation method. First, if the water contact angle obtained after 100 reciprocating strokes was less than 95°, the friction test was terminated and the number of rubbings at the end was recorded. If the water contact angle obtained was 95° or greater, the friction test was continued. This operation was repeated until the maximum number of rubbings reached 10,000. The evaluation criteria were as follows: A: 200 or more rubbings; B: Less than 200 rubbings.

[0495] <Fingerprint Removability> A 1 kg weight equipped with a 2 cm diameter red rubber stopper to serve as the fingerprint stamp was prepared. Next, 70 μL of artificial fingerprint liquid (manufactured by Isekyu Co., Ltd.) was dropped onto a waste cloth, and the fingerprint stamp was left to adhere to the artificial fingerprint liquid for 1 minute. To remove excess artificial fingerprint liquid from the fingerprint stamp, the fingerprint stamp was left to adhere to a new waste cloth for 20 seconds. Then, the article on which the surface treatment layer was formed was placed on a hot plate whose temperature was adjusted to 23°C. The fingerprint stamp was stamped onto the surface treatment layer.

[0496] The article with the artificial fingerprint liquid attached was placed in a sliding device (product name "HHS-2000", manufactured by Shinto Scientific Co., Ltd.). A wiping cloth (Savina Minimax, manufactured by KB Seiren Co., Ltd.) was attached to a flat indenter having an area of ​​1 cm square using double-sided tape, and the item was placed in the sliding device. The attached artificial fingerprint liquid was wiped off in one direction with the wiping cloth against the surface treatment layer under a load of 100 g. The haze of the wiped area was measured using a haze meter (product name "NDH7000SP", manufactured by Nippon Denshoku Co., Ltd.). The evaluation criteria are as follows: A: Haze value is less than 1%. B: Haze value is 1% or more but less than 5%. C: Haze value is 5% or more.

[0497] The evaluation results are shown in Table 1. In Table 1, Y in requirement (1) and requirement (2) means that requirement (1) and requirement (2) are met, respectively. N in requirement (1) and requirement (2) means that requirement (1) and requirement (2) are not met, respectively. Furthermore, "-" means that the first compound or the second compound is not contained. Example 11 shows the measurement results for a silicon oxide-attached substrate that was not surface-treated with a surface treatment agent. Furthermore, "-" in abrasion resistance 1 and 2 indicates that no treatment was performed.

[0498]

[0499] As shown in Table 1, Examples 1 to 8 and 12 to 15 contained the first compound and the second compound and satisfied at least one of requirements (1) and (2), and were therefore found to have excellent water repellency and abrasion resistance. Comparing Example 1 with Example 3, Example 1 was superior in fingerprint removability. Comparing Example 2 with Example 4, Example 2 was superior in fingerprint removability.

[0500] The composition and surface treatment agent of the present disclosure can be used for substrates in, for example, display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, nanoimprint technology, and the like. The composition and surface treatment agent can also be used for bodies, window glass (windshields, side glass, rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, the composition and surface treatment agent can be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The composition and surface treatment agent can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The composition and surface treatment agent can also be used for antifouling treatments for jigs, interior walls, piping, and the like in factories. The composition and surface treatment agent can also be used for goggles, eyeglasses, helmets, pachinko machines, fibers, umbrellas, playground equipment, and soccer balls. The composition and surface treatment agent can also be used as an anti-adhesion agent for various packaging materials such as food packaging materials, cosmetic packaging materials, the inside of pots, etc. The composition and surface treatment agent can also be used for car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, anti-reflection films, and other optical components.

[0501] This application claims priority based on Japanese Patent Application No. 2023-191140, filed November 8, 2023, and Japanese Patent Application No. 2024-034018, filed March 6, 2024, the disclosures of which are incorporated herein in their entireties.

Claims

1. A composition comprising a first compound having an organo(poly)siloxane residue and a reactive silyl group a, and a second compound having a hydrocarbon group having 4 or more carbon atoms, which does not have an organo(poly)siloxane residue and is not directly bonded to an oxygen atom and may have a functional group or a substituent, and a reactive silyl group b, and which satisfies at least one of the following requirements (1) and (2). Requirement (1): In the first compound, two or more reactive silyl groups a are linked to at least one end of the organo(poly)siloxane residue. Requirement (2): In the second compound, two or more reactive silyl groups b are linked to at least one end of the hydrocarbon group.

2. The composition according to claim 1, wherein the reactive silyl group a and the reactive silyl group b are each independently represented by the following formula (S1) or the following formula (S2): -Si(R ２ ) ｎ L ３－ｎ ...(S1) -[Si(L ２ ) ２ -Q] ｎ１２ -Si(L ２ ) ３ … (S2) where R ２ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; ２ each independently represents a hydrolyzable group, a group having a hydrolyzable group, a hydroxyl group, or a hydrocarbon group; ２ At least four L ２ represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; each Q is independently an oxygen atom or an organic group having one carbon atom bonded to adjacent Si atoms on both sides; n is an integer of 0 to 2; and n12 is an integer of 1 to 3.

3. The composition according to claim 1, wherein the organo(poly)siloxane residue contained in the first compound is represented by the following formula (B1): In formula (B1), R ３ are each independently a hydrocarbon group, k1 is a number of 1 or more, and * is a bonding site with an adjacent atom.

4. The composition according to claim 1, wherein the first compound is a compound represented by the following formula (C): In formula (C), T １１ is a monovalent group not containing a reactive silyl group, each B is independently -O- or -C(=O)-, each r is independently 0 or 1, R ３ are each independently a hydrocarbon group; k1 is each independently a number of 1 or more; p1 is an integer of 1 or more; A １１ is a (p1+q1)-valent linking group, q1 is an integer of 1 or more, R ２ each independently represents a hydrocarbon group; each L independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and each n independently represents an integer of 0 to 2.

5. The composition according to claim 4, wherein in formula (C), k1 is 2 to 600.

6. The composition according to claim 4, wherein in formula (C), q1 is an integer of 1 to 4.

7. The composition according to claim 1, wherein in said second compound, said reactive silyl group b is linked to only one end of said hydrocarbon group.

8. The composition according to claim 1, wherein the second compound is a compound represented by formula (G). ７１ -R ７２ ) ｐ７ -A ７１ -(Si(R ２ ) ｎ L ３－ｎ ) ｑ２ ...(G) In formula (G), R ７１ is a hydrogen atom or [(CH ３ ) ３ Q ７１ -R ７３ -] ｍ７ Q ７２ (CH ３ ) ３－ｍ７ - and Q ７１ and Q. ７２ , each independently represents C or Si; R ７３ are each independently an alkylene group having 1 to 6 carbon atoms, m7 is an integer of 0 to 3, R ７２ is an alkylene group having two or more carbon atoms, and between carbon atoms, there is -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and a phenylene group; ７１ is a single bond or a (p7+q2)-valent linking group, R ２ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; n is an integer from 0 to 2; p7 is an integer of 1 or more; and q2 is an integer of 1 or more.

9. The composition according to claim 1, wherein the second compound is a compound represented by the following formula (E): In formula (E), R Ａｋ are each independently an alkyl group; ｄ represents a single bond or a (p2+q2)-valent linking group other than an oxygen atom, p2 and q2 each independently represent an integer of 1 or more, R ２ each independently represents a hydrocarbon group; each L independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

10. The above R Ａｋ The composition according to claim 9, wherein is an alkyl group having 4 to 50 carbon atoms.

11. The composition according to claim 1, wherein the second compound is a compound represented by the following formula (F): ７１ -L １ -(Si(R ２ ) ｎ L ３－ｎ ) ｑ２ ...(F) In formula (F), R ７１ is a hydrogen atom or [(CH ３ ) ３ Q ７１ -R ７３ -] ｍ７ Q ７２ (CH ３ ) ３－ｍ７ - and Q ７１ and Q. ７２ , are each independently C or Si, provided that Q ７１ and Q. ７２ At least one of the groups is Si; ７３ are each independently an alkylene group having 1 to 6 carbon atoms, m7 is an integer of 0 to 3, and L １ is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and a phenylene group, ２ each independently represents a hydrocarbon group; each L independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; n is an integer of 0 to 2; and q2 is an integer of 1 or greater.

12. Said L １ The composition according to claim 11, wherein is an alkylene group having 13 to 36 carbon atoms.

13. The above R １ However, (CH ３ ) ３ The composition of claim 11 which is Si-.

14. The composition according to claim 1, wherein the mass ratio of the second compound to the first compound is 0.01 to 0.

9.

15. The composition of claim 1, further comprising a liquid medium.

16. A surface treatment agent comprising the composition according to any one of claims 1 to 15.

17. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 16; and manufacturing an article having a surface treatment layer formed on the substrate.

18. An article comprising a substrate, and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 16.

19. The article of claim 18 which is an optical component.

20. The article according to claim 18, which is a display or a touch panel.