Clean room facility
JPWO2025154283A5Active Publication Date: 2025-12-16HITACHI GLOBAL LIFE SOLUTIONS INC
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Patent Information
- Application Number
- JP2024564530
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-10-30
- Publication Date
- 2025-12-16
- Estimated Expiration
- 2044-01-19
Abstract
Provided is a clean room facility that has a high degree of freedom of layout. A clean room facility (100) comprises an air conditioner (10), at least one clean room (R1), a first chamber (C1) that is provided behind the ceiling of the clean room (R1), an air supply duct (D1) that guides air blown from the air conditioner (10) to the first chamber (C1), air supply fans (31a, 32a) that supply air to the clean room (R1) from the first chamber (C1), an exhaust duct (D2) to which air discharged from the clean room (R1) flows, and an exhaust fan (6) that is provided downstream of the exhaust duct (D2). The air discharged from the clean room (R1) flows to the exhaust duct (D2) without returning to the air conditioner (10).
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