Clean room facility

JPWO2025154283A5Active Publication Date: 2025-12-16HITACHI GLOBAL LIFE SOLUTIONS INC
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Patent Information

Application Number
JP2024564530
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-10-30
Publication Date
2025-12-16
Estimated Expiration
2044-01-19
Patent Text Reader

Abstract

Provided is a clean room facility that has a high degree of freedom of layout. A clean room facility (100) comprises an air conditioner (10), at least one clean room (R1), a first chamber (C1) that is provided behind the ceiling of the clean room (R1), an air supply duct (D1) that guides air blown from the air conditioner (10) to the first chamber (C1), air supply fans (31a, 32a) that supply air to the clean room (R1) from the first chamber (C1), an exhaust duct (D2) to which air discharged from the clean room (R1) flows, and an exhaust fan (6) that is provided downstream of the exhaust duct (D2). The air discharged from the clean room (R1) flows to the exhaust duct (D2) without returning to the air conditioner (10).
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