Plasma processing device
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Filing Date
- 2025-07-17
- Publication Date
- 2026-02-05
AI Technical Summary
Existing plasma processing apparatuses using microwaves generate non-axially symmetric electric field distributions due to linearly polarized waves and elliptically polarized waves caused by reflected microwaves, leading to non-uniform processing and increased power loss.
A plasma processing apparatus with a septum polarizer and Faraday rotator that converts microwaves into right- and left-handed circularly polarized waves, maintaining axial symmetry by impedance matching and minimizing energy loss through a configuration that separates reflected waves from the processing chamber.
Achieves uniform plasma distribution and processing across a wide range of conditions without active energy loss, ensuring efficient plasma generation and uniformity.