Polyion complex composition and its use
Patent Information
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- TOKUYAMA CORP
- Filing Date
- 2025-07-29
- Publication Date
- 2026-07-07
AI Technical Summary
【0010】 本発明の一態様によれば、新規のPIC組成物を提供することができる。また、本発明の一態様に係るPIC組成物は本発明の組成であることによって、目的の環境下でPIC組成物を崩壊させることができる。これによって、ホスト分子がPIC組成物から放出され、該ホスト分子が有する特性を目的の環境下で発揮することができる。
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Abstract
Claims
1. A polyion complex composition, It includes a host molecule and a complex that encloses the host molecule, The composite comprises a cationic polymer and an anionic polymer. A polyion complex composition in which the polyion complex composition disintegrates when its pH is 6.5 or higher and 9.0 or lower.
2. A polyion complex composition, It includes a host molecule and a complex that encloses the host molecule, The composite comprises a cationic polymer and an anionic polymer. The cationic polymer is polylysine, A polyion complex composition in which the anionic polymer is alginic acid or a salt thereof.
3. The polyion complex composition according to claim 1, wherein the cationic polymer and the anionic polymer are self-assembled by electrostatic interaction.
4. The polyion complex composition according to claim 1, wherein the host molecule is at least one host molecule selected from the group consisting of cyclodextrin compounds, calixarenes, crown ethers, carbon nanotubes, zeolites, MOFs, and mesoporous silica.
5. The cationic polymer is polylysine. The polyion complex composition according to claim 1.
6. The cationic polymer is polylysine, The polyion complex composition according to claim 1, wherein the anionic polymer is alginic acid or a salt thereof.
7. A sol comprising the polyion complex composition according to any one of claims 1 to 6.
8. comprising a host molecule and a complex encompassing the host molecule, The composite comprises a sol containing a polyion complex composition comprising a cationic polymer and an anionic polymer, and is a deodorant, biofilm formation inhibitor, or antimicrobial material.
9. The deodorant, biofilm formation inhibitor, or antimicrobial material according to claim 8, further comprising a dressing material.
10. The deodorant, biofilm formation inhibitor, or antimicrobial material according to claim 8, wherein the dosage form is a patch or a topical application.
11. comprising an antimicrobial agent and a complex containing the antimicrobial agent, The complex comprises a cationic polymer having antibiofilm activity and an anionic polymer having anti-inflammatory properties. A polyion complex composition for antimicrobial materials, wherein the aforementioned antimicrobial agent is a host molecule.
12. The polyion complex composition for antimicrobial materials according to claim 11, wherein the host molecule is at least one host molecule selected from the group consisting of cyclodextrin compounds, calixarenes, crown ethers, carbon nanotubes, zeolites, MOFs, and mesoporous silica.
13. The cationic polymer is polylysine, The polyion complex composition for antimicrobial materials according to claim 11, wherein the anionic polymer is alginic acid or a salt thereof.
14. The polyion complex composition for antimicrobial materials according to claim 11, wherein the polyion complex composition disintegrates when its pH is 6.5 or higher and 9.0 or lower.
15. An antimicrobial material comprising the polyion complex composition for antimicrobial materials described in any one of claims 11 to 14.
16. The antibacterial material according to claim 14, further comprising a dressing material.
17. A mixing step comprising mixing a host molecule, a cationic polymer, and an anionic polymer, In the aforementioned mixing step, the acid is further mixed, A method for preparing a polyion complex composition, comprising mixing the cationic polymer with the acid, then mixing the mixture obtained by mixing it with a host molecule, and then mixing the mixture with the anionic polymer.