Chemical-free cleaning system for water supply and sewage pipes using metal cleaning balls and step-by-step bubble water, and chemical-free cleaning method for water supply and sewage pipes using the same

Abstract

According to one aspect of the present invention, a chemical-free sewage pipe cleaning system and a chemical-free sewage pipe cleaning method using the same can be provided, which can effectively remove sludge attached to the inside of a sewage pipe by sequentially applying a metal cleaning ball and a step-by-step bubble water.

Description

Technology Field

[0001] The present invention relates to a cleaning system for water and sewage pipelines and a cleaning method for water and sewage pipelines using the same. More specifically, it relates to a cleaning system capable of effectively cleaning water and sewage pipelines without using chemical agents by utilizing metal cleaning balls and stepwise bubble water, and a cleaning method for water and sewage pipelines using the same. Background Technology

[0002] With approximately 30 years having passed since full-scale investment in water supply and sewage facilities began, the domestic water supply and sewage coverage rate stands at 99.4% for tap water and 95.1% for sewage as of 2022, with most citizens utilizing these systems. On the other hand, the domestic tap water consumption rate is 49.6% as of 2024, which is known to be significantly lower than that of countries such as Germany (95%), Japan (78.9%), and the United States (68%). Considering that the expected lifespan of water pipes is 25.1 years, it is understood that the main reason for the low tap water consumption rate is that people are reluctant to drink water produced from water sources even if the drinking water meets the "Drinking Water Management Act - Drinking Water Quality Standards," due to the aging of the water pipes connecting to individual households.

[0003] Representative causes of contamination in water and sewage pipelines include crystallization fouling that occurs after the pipelines are buried underground, particulate fouling originating from particles in the water, and biological and chemical reaction fouling caused by the attachment of biofilms generated from extracellular polymeric substances (EPS) of microorganisms.

[0004] As water and sewage pipelines age, pollutants generated continue to accumulate inside the pipelines, and the pipe diameter gradually decreases due to the sludge that is continuously attached to the inside of the pipelines. As sludge continues to adhere to the inside of the pipelines, problems such as red water, corrosion, and poor water flow may occur, and leakage may occur due to pipe damage.

[0005] The government is promoting a project to replace aging pipes to address the problem of aging water and sewage pipelines, but there are practical difficulties in completely replacing aging pipes as replacing approximately 1 km of pipeline costs about 2.5 billion won. Various studies are continuously being conducted to extend the service life of water and sewage pipelines, and brush cleaning, chemical cleaning, ultrasonic cleaning, ceramic cleaning ball cleaning, and robot cleaning methods have been proposed as methods to remove sludge attached to the inside of water and sewage pipelines.

[0006] In the case of the brush cleaning method, there is a limit to the distance the brush can reach, making it difficult to apply when water and sewage pipelines are buried over long distances. The chemical cleaning method uses chemicals that can cause damage to the pipelines, and since it requires additional neutralization work, it is undesirable in terms of economic efficiency and environmental friendliness. The ultrasonic cleaning method is not suitable for cleaning large pipelines due to the capacity limitations of the ultrasonic generator, and in the case of the ceramic cleaning ball method, there is a possibility that the ceramic cleaning balls may not be completely recovered after cleaning and may remain inside the pipeline, causing additional problems. Meanwhile, robot cleaning is not only applicable only to water supply pipes, but it is also undesirable in terms of economic efficiency and versatility because the manufacturing and operation of the robots used for such cleaning tasks are costly.

[0007] Therefore, there is a need for effective measures to effectively remove sludge attached to the inside of water and sewage pipes and extend the service life of water and sewage pipes. The problem to be solved

[0008] One aspect of the present invention is to provide a sewage pipe cleaning system capable of effectively removing sludge attached to the inside of a sewage pipe by sequentially applying a metal cleaning ball and a step-by-step bubble water, and a sewage pipe cleaning method using the same.

[0009] One aspect of the present invention is to provide a sewage pipe cleaning system capable of effectively removing sludge attached to the inside of a sewage pipe without using chemical agents, and a method for cleaning a sewage pipe using the same.

[0010] One aspect of the present invention is to provide a sewage pipe cleaning system capable of effectively recovering cleaning balls used for cleaning sewage pipes, and a method for cleaning sewage pipes using the same.

[0011] The problems of the present invention are not limited to those described above. A person skilled in the art to which the present invention pertains will have no difficulty in easily understanding additional problems of the present invention from the overall contents of this specification. means of solving the problem

[0012] A water and sewage pipe cleaning system according to one aspect of the present invention may include: a cleaning ball tank configured to supply metal cleaning balls contained therein into the interior of a water and sewage pipe to be cleaned and to recover the cleaning balls used for cleaning the water and sewage pipe to be cleaned; a first supply line configured to have one end connected to the cleaning ball tank and extend toward one end of the water and sewage pipe to be cleaned, and to provide a path for the metal cleaning balls to move from the cleaning ball tank to the water and sewage pipe to be cleaned; a bubble generator configured to inject bubbles of a selective particle size into a fluid flowing into the interior of the water and sewage pipe to be cleaned; a precision filtration device configured to filter sludge contained in the fluid discharged from the water and sewage pipe to be cleaned by providing a microfilter; and a pump configured on the first supply line to provide a driving force for movement to the fluid moving through the first supply line.

[0013] The above-described water and sewage pipeline cleaning system comprises: a first valve disposed on the first supply line; a second valve provided at the other end of the first supply line; a first connecting line extended from the second valve and provided to be connected to one end of the water and sewage pipeline to be cleaned; a second connecting line provided to be connected at one end to the other end of the water and sewage pipeline to be cleaned; a third valve provided at the other end of the second connecting line; a second supply line with one end connected to the third valve and the other end connected to a fourth valve; a second branch line with one end connected to the fourth valve and the other end connected to a fifth valve; a first branch line with one end connected to the fourth valve and the other end connected to a sixth valve; a first circulation line with one end connected to the fifth valve and the other end connected to the sixth valve; and a second circulation line with one end connected to the sixth valve and the other end connected to the first supply line. and further include a filtration line extending from the second valve toward the third valve; wherein the bubble generator is positioned on the second branch line and the precision filtration device may be positioned on the filtration line.

[0014] The cleaning ball tank comprises: a first tank having a first receiving space formed inside capable of accommodating a metal cleaning ball used for cleaning the water and sewage pipe; a second tank disposed adjacent to the first tank having a second receiving space formed inside capable of accommodating a metal cleaning ball to be used for cleaning the water and sewage pipe; an electromagnet disposed on the lower side of the first tank to form a magnetic attraction with the metal cleaning ball; a partition disposed between the first tank and the second tank to block the magnetic field generated by the electromagnet; a first sensor provided in the first tank to measure the level of the fluid contained in the first receiving space; and a second sensor provided in the second tank to measure the level of the fluid contained in the second receiving space, wherein one end of the first supply line may be connected to the lower side of the first tank.

[0015] The above-described water and sewage pipeline cleaning system further comprises: an inlet line having one end connected to the third valve and the other end connected to the upper side of the second tank, providing a fluid movement path from the third valve to the second receiving space; a return line having one end connected to the fifth valve and the other end connected to the upper side of the first tank, providing a fluid movement path from the fifth valve to the first receiving space; and a discharge line having one end connected to the lower side of the first tank and the other end connected to the first supply line, providing a fluid movement path from the first receiving space to the first supply line, and the cleaning ball tank may further comprise an outflow prevention cover, an upper geotextile, crushed stone, and a lower geotextile sequentially arranged on the lower side of the first receiving space to prevent the metal cleaning ball introduced into the first receiving space from being discharged through the discharge line.

[0016] The bubble generating device can selectively inject large bubbles with an average particle size of 100 to 600 μm, microbubbles with an average particle size of 20 to 50 μm, and nanobubbles with an average particle size of 100 to 350 nm into the fluid moving through the second branch line, depending on the state of the fluid moving through the second supply line.

[0017] The above-described water and sewage pipeline cleaning system may further include: a flow meter provided on the first supply line to measure the flow rate of the fluid moving through the first supply line; a pressure gauge provided on the first supply line to measure the pressure inside the first supply line; a turbidity meter provided on the second supply line to measure the turbidity of the fluid moving through the second supply line; a residual chlorine meter provided on the second supply line to measure the amount of residual chlorine of the fluid moving through the second supply line; and a hydrogen ion meter provided on the second supply line to measure the hydrogen ion concentration of the fluid moving through the second supply line.

[0018] A method for cleaning a water and sewage pipeline according to one aspect of the present invention comprises: a cleaning preparation step in which the water and sewage pipeline cleaning system is connected to one end and the other end of the water and sewage pipeline to be cleaned using the water and sewage pipeline cleaning system; a cleaning ball cleaning step in which the metal cleaning ball contained in the cleaning ball tank is supplied into the interior of the water and sewage pipeline together with a fluid to separate sludge adhered to the inner wall of the water and sewage pipeline from the inner wall of the water and sewage pipeline by the physical impact of the metal cleaning ball; and a cleaning ball and stepwise bubble water cleaning step in which, when one or more of the increase in turbidity, residual chlorine amount, and hydrogen ion concentration measured in the fluid discharged from the water and sewage pipeline is below a preset level, giant bubbles, microbubbles, and nanobubbles are sequentially injected into the fluid containing the metal cleaning ball and supplied into the interior of the water and sewage pipeline, thereby sequentially reacting bubbles of stepwise particle sizes with the sludge contained in the fluid. The method may include: a cleaning ball recovery step of recovering metal cleaning balls contained in the fluid to the cleaning ball tank when one or more of the increases in turbidity, residual chlorine amount, and hydrogen ion concentration measured in the fluid injected with the nanobubbles discharged from the above water and sewage pipeline are below a preset level; and a production water filtration step of filtering and removing sludge floating in the fluid by allowing the fluid in which the cleaning balls were recovered to pass through the precision filtration device.

[0019] The average particle size of the above-mentioned giant bubbles may be 100 to 600 μm, the average particle size of the above-mentioned microbubbles may be 20 to 50 μm, and the average particle size of the above-mentioned nanobubbles may be 100 to 350 nm.

[0020] When the turbidity and residual chlorine of the filtered water passing through the above-mentioned precision filtration device satisfy preset levels, the filtered water can be recirculated to the water supply and sewage pipeline to terminate the cleaning of the water supply and sewage pipeline. Effects of the invention

[0021] According to one aspect of the present invention, a sewage pipe cleaning system and a sewage pipe cleaning method using the same can be provided, which can effectively remove sludge attached to the inside of a sewage pipe by sequentially applying a metal cleaning ball and a step-by-step bubble water.

[0022] According to one aspect of the present invention, a sewage pipe cleaning system and a method for cleaning sewage pipes using the same can be provided, which can effectively remove sludge attached to the inside of a sewage pipe without using chemical agents.

[0023] According to one aspect of the present invention, a water and sewage pipe cleaning system capable of effectively recovering cleaning balls used for cleaning water and sewage pipes and a water and sewage pipe cleaning method using the same can be provided.

[0024] The effects of the present invention are not limited to the matters described above and may include matters that can be reasonably inferred from the following description by a person skilled in the art to which the invention pertains. Brief explanation of the drawing

[0025] FIG. 1 is a schematic diagram of a system configuration illustrating a chemical-free water and sewage pipe cleaning system using a metal cleaning ball and stepwise bubble water according to one aspect of the present invention. Figure 2 is a conceptual diagram schematically illustrating the state of a cleaning ball tank before cleaning balls are used for cleaning water and sewage pipes. Figure 3 is a conceptual diagram schematically illustrating the state of the cleaning ball tank after the cleaning ball has been used to clean the water and sewage pipeline. Specific details for implementing the invention

[0026] Hereinafter, preferred embodiments of a chemical-free water and sewage pipe cleaning system using a metal cleaning ball and stepwise bubble water according to one aspect of the present invention, and a chemical-free water and sewage pipe cleaning method using the same, will be described in more detail with reference to the attached drawings. Embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be interpreted as being limited to the embodiments described below. These embodiments are provided to further explain the present invention in detail to those skilled in the art to which the invention pertains. Accordingly, the shape of each element shown in the drawings may be emphasized or exaggerated for clearer explanation.

[0028] Hereinafter, a chemical-free water and sewage pipe cleaning system using a metal cleaning ball and stepwise bubble water according to one aspect of the present invention will be described in more detail with reference to FIG. 1.

[0030] FIG. 1 is a schematic diagram of a system configuration illustrating a water and sewage pipe cleaning system (S1) according to one aspect of the present invention.

[0031] A water and sewage pipe cleaning system (S1) according to one aspect of the present invention may be provided as a mobile system and may be moved and positioned at a location where a water and sewage pipe (1) requiring cleaning is buried, thereby allowing the cleaning of the water and sewage pipe (1) to be carried out. Typically, water and sewage pipes (1) buried underground have valves installed at regular intervals in designated sections for the purpose of managing water supply as well as various repairs. Therefore, when performing cleaning work using the water and sewage pipe cleaning system (S1) according to one aspect of the present invention, the valve of a specific section is closed, and then the first connecting line (L1a) and the second connecting line (L1b) are connected to the valve on one end and the valve on the other end of the water and sewage pipe (1) to be cleaned, respectively, so that the cleaning work can be carried out. A third valve (V3) of the 4-way type is connected to one end of the second connection line (L1b), and an inflow line (L6) extending toward the cleaning ball tank (10) described later is connected to the third valve (V3). In the initial stage of cleaning the water and sewage pipe (1), the third valve (V3) is opened to connect the second connection line (L1b) and the inflow line (L6), so that the fluid inside the water and sewage pipe (1) to be cleaned can be supplied to the cleaning ball tank (10). At this time, the fluid supplied to the cleaning ball tank (10) is the fluid remaining inside the water and sewage pipe (1) to be cleaned as the valve on one end and the valve on the other end of the water and sewage pipe (1) to be cleaned are closed, and the cleaning operation of the water and sewage pipe (1) can be performed using the said fluid. An auxiliary pump (not shown) may be additionally provided on the inflow line (L6) to provide driving force so that fluid remaining in the water and sewage pipe (1) moves toward the cleaning ball tank (10).

[0032] As illustrated in FIG. 1, a water and sewage pipe cleaning system (S1) according to one aspect of the present invention may include a cleaning ball tank (10) in which a cleaning ball (B) is contained, a bubble generator (9) capable of adjusting the size of the generated bubbles, and a microfiltration (MF) device (2) equipped with a microfilter.

[0033] The first supply line (L2) may be provided to extend from the cleaning ball tank (10) toward the second valve (V2). The second valve (V2) may be a 3-way valve. The second valve (V2) is connected to the first connection line (L1a), and the cleaning balls (B) supplied from the cleaning ball tank (10) may be supplied to the water and sewage pipeline (1) through the first supply line (L2) and the second connection line (L1a). On the first supply line (L2), a first valve (V1) for controlling the flow rate of the fluid moving through the first supply line (L2), a pump (P) for providing a driving force for movement to the fluid moving through the first supply line (L2), a flow meter (3) capable of measuring the flow rate of the fluid moving through the first supply line (L2), and a pressure gauge (4) capable of measuring the pressure inside the first supply line (L2) may be sequentially provided. The first valve (V1) may be a 2-way valve. The pump (P) is not particularly limited as long as it is a device capable of providing a moving driving force to the fluid moving through the first supply line (L2), but a vortex pump may preferably be used to prevent device failure caused by collision and interference with the flowing cleaning ball (B). The flow meter (3) and pressure gauge (4) are also not particularly limited and may be applied in various modified forms as long as they are devices capable of measuring the flow rate of the fluid flowing through the first supply line (L2) and the water pressure inside the first supply line (L2).

[0034] The second supply line (L3) may be provided to extend from the third valve (V3) toward the fourth valve (V4), and a dissolved oxygen meter (5), a turbidimeter (6), a residual chlorine meter (7), and a hydrogen ion meter (8) capable of measuring the dissolved oxygen amount, turbidity, residual chlorine amount, and hydrogen ion concentration of the fluid moving through the second supply line (L3) may be sequentially arranged on the second supply line (L3). The fourth valve (V4) may be a 3-way valve.

[0035] The second branch line (L4) may be provided to extend from the fourth valve (V4) toward the fifth valve (V5) of the 3-way type, and a bubble generating device (9) that generates bubbles in the fluid moving through the second branch line (L4) may be provided on the second branch line (L4). The bubble generating device (9) provided on the second branch line (L4) may have a function to control the average size of the generated bubbles. The bubbles generated by the bubble generating device (9) may be classified into large bubbles with an average diameter of about 100 to 600 μm, microbubbles with an average diameter of about 20 to 50 μm, and nanobubbles with an average diameter of about 100 to 350 nm, and as the cleaning operation proceeds, large bubbles, microbubbles, and nanobubbles may be applied sequentially.

[0036] The first circulation line (L5a) is configured to extend from the fifth valve (V5) toward the 3-way sixth valve (V6), and the second circulation line (L5b) may be configured to extend from the sixth valve (V6) toward the first supply line (L2). It may be preferable for the second circulation line (L5b) to be configured such that one end is connected to the first supply line (L2) between the first valve (V1) and the pump (P).

[0037] A filtration line (L8) is provided to extend from the second valve (V2) toward the third valve (V3), and a microfilter (MF) device (2) may be disposed on the filtration line (L8). A microfilter may be provided inside the microfilter (MF) device (2). A preferred pore size of the microfilter may be 0.1 to 10 μm, and a more preferred pore size of the microfilter may be 5 μm.

[0038] The first branch line (L7) may be configured to connect the fourth valve (V4) and the sixth valve (V6), and the recovery line (L10) may be configured to extend from the fifth valve (V5) toward the cleaning ball tank (10). The discharge line (L9) is configured to extend from the cleaning ball tank (10) toward the first supply line (L2), and a 2-way type seventh valve (V7) capable of controlling the flow rate of the fluid moving along the discharge line (L9) may be configured on the discharge line (L9). It may be preferable for the discharge line (L9) to be configured such that one end is connected to the first supply line (L2) between the first valve (V1) and the pump (P).

[0039] Although not explicitly illustrated in FIG. 1, a water pipe cleaning system (S1) according to one aspect of the present invention may further include a control unit electrically connected to a flow meter (3), a pressure gauge (4), a dissolved oxygen meter (5), a turbidity meter (6), a residual chlorine meter (7), a hydrogen ion meter (8), a pump (P), first to seventh valves (V1 to V7), a bubble generator (9), and a cleaning ball tank (10), and controlling the pump (P), first to seventh valves (V1 to V7), a bubble generator (9), and a cleaning ball tank (10) based on electrical signals received from the flow meter (3), the pressure gauge (4), the dissolved oxygen meter (5), the turbidity meter (6), the residual chlorine meter (7), and the hydrogen ion meter (8).

[0041] Hereinafter, with reference to FIGS. 2 and FIGS. 3, a cleaning ball tank (10) provided in a water and sewage pipe cleaning system (S1) according to one aspect of the present invention will be described in more detail.

[0042] FIG. 2 is a conceptual diagram schematically illustrating the state of a cleaning ball tank (10) before a cleaning ball (B) is used for cleaning a water and sewage pipe (1), and FIG. 3 is a conceptual diagram schematically illustrating the state of a cleaning ball tank (10) after a cleaning ball (B) is used for cleaning a water and sewage pipe (1).

[0043] As illustrated in FIGS. 2 and 3, the cleaning ball tank (10) may include a first tank (11) and a second tank (12) arranged adjacent to each other. Inside the first tank (11) and the second tank (12), a first receiving space (11') and a second receiving space (12') capable of accommodating a cleaning ball (B) are respectively formed, and the first receiving space (11') and the second receiving space (12') may be provided with a shape in which the cross-sectional area decreases toward the lower side. Considering the volume of sludge removed from the water and sewage pipeline (1), it is preferable that the first receiving space (11') be provided to have a larger volume than the second receiving space (12'). As a non-limiting example, the volume of the first receiving space (11') is 0.6 m² 3 It may be, and the volume of the second receiving space (12') is 0.4m 3It may be. A first lower space (11a) connected to the first receiving space (11') may be provided on the lower side of the first receiving space (11'), and a second lower space (12a) connected to the second receiving space (12') may be provided on the lower side of the second receiving space (12'). One end of the discharge line (L9) is connected to the bottom of the first tank (11), and a first discharge port (11b) connecting the first lower space (11a) and the discharge line (L9) may be formed through the bottom of the first tank (11). One end of the first supply line (L2) is connected to the bottom of the second tank (12), and a second discharge port (12b) connecting the second lower space (12a) and the first supply line (L2) may be formed through the bottom of the second tank (12). Although not explicitly shown in FIGS. 2 and 3, one end of the recovery line (L10) may be connected to the upper side of the first tank (11) to supply fluid to the first receiving space (11'), and one end of the inflow line (L6) may be connected to the upper side of the second tank (12) to supply fluid to the second receiving space (12'). Considering ease of molding, moisture resistance, and magnetic field permeability described later, it may be preferable for the first tank (11) and the second tank (12) to be manufactured using either one selected from polyethylene (PE) and polypropylene (PP) or a composite thereof.

[0044] The first sensor (16a) and the second sensor (16b) are each placed in the first tank (11) and the second tank (12), and the first sensor (16a) and the second sensor (16b) can measure the level of fluid flowing into the first receiving space (11') and the second receiving space (12') and transmit an electrical signal to the control unit. The first sensor (16a) and the second sensor (16b) are not particularly limited as long as they are means capable of measuring the level of the first receiving space (11') and the second receiving space (12'), but as a non-limiting example, a four-point control type level sensor may be applied.

[0045] An electromagnet (17) that selectively forms a magnetic field by a control unit may be placed on the lower side of the first tank (11). The cleaning ball (B) may be provided as a spherical shape with an average diameter of 1.2 to 1.5 mm and may be manufactured using a metal material. For magnetic reaction with the electromagnet (17), it is preferable for the cleaning ball (B) to be manufactured using a ferritic material, a martensitic material, or a 400 series stainless steel material, and it may be more preferable to manufacture it using SUS410 material or SUS430 material in terms of corrosion resistance and magnetic properties.

[0046] A partition member (13) may be disposed on the outer side of the first tank (11) and the second tank (12) to support the first tank (11) and the second tank (12) while blocking the magnetic field so that the magnetic field formed by the electromagnet (17) affects only the first tank (11). It may be preferable for the partition member (13) to be manufactured using an austenitic SUS301 material, taking into account rigidity and magnetic field blocking characteristics. The partition member (13) may include a first support partition (13d) and a second support partition (13e) provided to support the first tank (11) and the second tank (12) respectively at the bottom of the first tank (11) and the second tank (12), a first partition (13a) and a third partition (13c) respectively arranged to protect the first tank (11) and the second tank (12) at the outside of the first tank (11) and the second tank (12), and a second partition (13b) arranged between the first tank (11) and the second tank (12).

[0047] In the first lower space (11a), an outflow prevention cover (14), an upper geotextile (15a), crushed stone (16), and a lower geotextile (15b) may be sequentially provided. The outflow prevention cover (14) is intended to prevent cleaning balls (B) introduced into the second receiving space (11') from flowing out to the discharge line (L9) through the first discharge port (11b), and the outflow prevention cover (14) may be provided using a porous material having pores formed with a diameter smaller than the diameter of the cleaning balls (B). The crushed stone (16) is intended to prevent excessive pressure load from being applied to the outflow prevention cover (14), and crushed stone (16) having an average particle size of 13 to 17 mm may be preferably applied. The upper geotextile (15a) and the lower geotextile (16b) are intended to prevent the loss of crushed stone (16), and may be applied within a range that does not impair the flow rate during design.

[0048] As illustrated in FIG. 2, in the stage prior to cleaning the water and sewage pipe (1), the cleaning ball (B) may exist in a state of being received in the second receiving space (12') of the second tank (12). As the cleaning operation of the water and sewage pipe (1) proceeds, the fluid remaining in the water and sewage pipe (1) flows into the second receiving space (12') through the inflow line (L6), and the first valve (V1) is opened only when a fluid level above a certain level is detected by the second sensor (16b), and as the first valve (V1) is opened, the cleaning ball (B) can move into the interior of the water and sewage pipe (1) together with the fluid. As the cleaning operation of the water and sewage pipe (1) proceeds, the cleaning ball (B) may flow into the first receiving space (11') of the first tank (11) through the recovery line (L10) after passing through the first path and the second path. Here, the first path refers to a circulation path that moves sequentially through the first supply line (L2), the first connection line (L1a), the water and sewage pipeline (1), the second connection line (L1b), the second supply line (L3), the first branch line (L7), and the second circulation line (L5b), and the second path may refer to a circulation path that moves through the first supply line (L2), the first connection line (L1a), the water and sewage pipeline (1), the second connection line (L1b), the second supply line (L3), the second branch line (L4), the first circulation line (L5a), and the second circulation line (L5b). The control unit can control the electromagnet (17) to form a magnetic field when a fluid level above a certain level is detected by the first sensor (16a), and as shown in FIG. 3, the cleaning ball used for cleaning the water and sewage pipe (1) can be recovered from the lower side of the first receiving space (11') by magnetic reaction with the electromagnet (17). When the cleaning work of the water and sewage pipe (1) is completed, the worker can take the cleaning ball (B) contained in the first receiving space (11') out to clean it, and then transfer the cleaned cleaning ball (B) to the second receiving space (12') to prepare for the next cleaning work.

[0050] Hereinafter, a method for cleaning water and sewage pipes without chemicals using a metal cleaning ball and step-by-step bubble water according to one aspect of the present invention will be described in more detail.

[0051] A method for cleaning a water and sewage pipe according to one aspect of the present invention may be carried out using the aforementioned water and sewage pipe cleaning system (S1) and may include a cleaning preparation step, a cleaning ball cleaning step, a cleaning ball and stepwise bubble water cleaning step, a cleaning ball recovery step, and a production water filtration step.

[0053] Washing preparation steps

[0054] After moving the aforementioned water and sewage pipe cleaning system (S1) to the location where the water and sewage pipe (1) requiring cleaning is buried, the operation of closing the valve provided in the water and sewage pipe (1) can be performed. By closing the valves located at one end and the other end of the water and sewage pipe (1) to be cleaned, the water and sewage pipe (1) to be cleaned is placed in a state where fluid cannot move to adjacent pipes, so that fluid remains inside the water and sewage pipe (1) to be cleaned. Afterwards, the worker can connect one end of the first connecting line (L1a) and one end of the second connecting line (L1b) to the valves located at one end and the other end of the water and sewage pipe (1), respectively.

[0056] Cleaning ball washing step

[0057] After one end of the first connecting line (L1a) and one end of the second connecting line (L1b) are respectively connected to valves positioned at one end and the other end of the water and sewage pipeline (1), the control unit can control the third valve (V3) so that the fluid remaining in the water and sewage pipeline (1) flows into the second receiving space (12') through the inflow line (L6). If an auxiliary pump (not shown) is provided on the inflow line (L6), fluid movement to the second receiving space (12') through the inflow line (L6) is possible even when the first valve (V1) is closed; however, if an auxiliary pump (not shown) is not provided on the inflow line (L6), fluid movement to the second receiving space (12') through the inflow line (L6) is possible only if the first valve (V1) is open and the pump (P) is maintained in an operating state. When fluid remaining in the water supply and sewage pipe (1) is supplied to the second receiving space (12') through the inflow line (L6), the cleaning ball (B) contained in the second receiving space (12') can be supplied to the water supply and sewage pipe (1) through the first supply line (L2). When the water level measured by the second sensor (16b) is less than 10%, the control unit determines that most of the cleaning ball (B) inside the second receiving space (12') has been discharged through the first supply line (L2) and can close the first valve (V1). In this case, the second valve (V2) can be maintained in a state where the first supply line (L2) and the first connection line (L1a) are open, the third valve (V3) can be maintained in a state where the second connection line (L1b) and the second supply line (L3) are open, the fourth valve (V4) can be maintained in a state where the second supply line (L3) and the first branch line (L7) are open, and the sixth valve (V6) can be maintained in a state where the first branch line (L7) and the second circulation line (L5b) are open, and the cleaning ball (B) discharged from the second receiving space (12') can circulate along the first path (first supply line (L2) → first connection line (L1a) → water and sewage pipeline (1) → second connection line (L1b) → second supply line (L3) → first branch line (L7) → second circulation line (L5b) → first supply line (L2)) together with the fluid.

[0058] The cleaning ball (B) introduced into the interior of the water and sewage pipe (1) physically collides with the sludge adhering to the inner wall of the water and sewage pipe (1), and as the cleaning ball (B) continues to be introduced into the interior of the water and sewage pipe (1), the sludge adhering to the inner wall of the water and sewage pipe (1) can be separated from the inner wall of the water and sewage pipe (1). Since the vortex pump (P) forms a vortex in the fluid moving through the first supply line (L2), the effect of removing the adhering sludge by the collision of the cleaning ball (B) can be more effectively enhanced. Considering the prevention of sedimentation of the cleaning ball (B) and the separation of sludge from the inner wall of the water and sewage pipe (1), the control unit can control the operating conditions of the pump (P) so that the flow velocity measured by the flow meter (3) is maintained at a level of 1.2 m / sec or higher. Meanwhile, since there is a concern that the water pipe (1) may be damaged if the cleaning ball (B) is injected excessively, the control unit [sets] the water pressure measured by the pressure gauge (4) to be 5 kgf / cm 2 The operating conditions of the pump (P) can be controlled to maintain the level below.

[0059] As the cleaning ball (B) circulates along the first path (first supply line (L2) → first connection line (L1a) → water supply pipe (1) → second connection line (L1b) → second supply line (L3) → first branch line (L7) → second circulation line (L5b) → first supply line (L2)) together with the fluid, the sludge attached to the inner wall of the water supply pipe (1) is crushed and introduced into the fluid, and accordingly, the turbidity, residual chlorine amount, and hydrogen ion concentration measured by the turbidity meter (6), residual chlorine meter (7), and hydrogen ion meter (8) show an increasing tendency. However, since the separation effect of the fixed sludge by impact of the washing ball (B) tends to become saturated after a certain period of time, if the turbidity, residual chlorine amount, and hydrogen ion concentration measured by the turbidity meter (6), residual chlorine meter (7), and hydrogen ion meter (8) increase to a level below a certain level, it is determined that the separation effect of the fixed sludge by impact of the washing ball (B) is saturated, and the washing ball and step-by-step bubble water washing described later can be performed. As a non-limiting example, the control unit may determine that the sludge separation effect by the washing ball (B) is saturated when any one or more of the increase in turbidity, residual chlorine amount, and hydrogen ion concentration measured by the turbidity meter (6), residual chlorine meter (7), and hydrogen ion meter (8) is at a level of 5% or less for 2 minutes, and control the 4th valve (V4), 5th valve (V5), 6th valve (V6), and bubble generator (9) to perform the washing ball and step-by-step bubble water washing described later.

[0061] Cleaning ball and step-by-step bubble water washing steps

[0062] Since the sludge separated from the inner wall of the water pipe (1) by the collision of the cleaning ball (B) has various particle sizes, the cleaning power of the pipe can be more effectively improved by sequentially injecting and circulating large bubbles, microbubbles, and nanobubbles into the fluid flowing together with the cleaning ball (B) during the cleaning ball and step-by-step bubble water cleaning steps. In particular, considering the floating characteristics of the bubbles and the sludge according to particle size, it is most desirable in terms of cleaning efficiency to inject bubbles in such a way that the bubble particle size gradually decreases in the order of large bubbles, microbubbles, and nanobubbles during the step-by-step bubble water cleaning steps.

[0063] If any one or more of the increase in turbidity, residual chlorine amount, and hydrogen ion concentration measured by the turbidity meter (6), residual chlorine meter (7), and hydrogen ion meter (8) is at a level of 5% or less for 2 minutes, the control unit can control the fourth valve (V4) to open the second branch line (L4) and the second supply line (L3), control the fifth valve (V5) to open the second branch line (L4) and the first circulation line (L5a), and control the sixth valve (v6) to open the first circulation line (L5a) and the second circulation line (L5b), and accordingly, the cleaning ball (B) and the fluid can follow the second path (first supply line (L2) → first connection line (L1a) → water and sewage pipeline (1) → second connection line (L1b) → second supply line (L3) → second branch line (L4) → first circulation line (L5a) → second circulation line (L5b) → It can circulate along the first supply line (L2). Meanwhile, when the cleaning ball (B) and the fluid circulate along the second path (first supply line (L2) → first connecting line (L1a) → water and sewage pipe (1) → second connecting line (L1b) → second supply line (L3) → second branch line (L4) → first circulation line (L5a) → second circulation line (L5b) → first supply line (L2)), the control unit can control the bubble generator (9) to sequentially inject large bubbles, microbubbles, and nanobubbles into the circulating fluid according to the condition of the sludge contained in the fluid.

[0064] The giant bubble is a bubble with an average diameter of about 100 to 600 μm, and is a bubble that has excellent reactivity with large particle sizes among the sludge separated from the inner wall of the sewage pipe (1). Since the giant bubble rapidly raises the sludge to the surface due to buoyancy, the measurement value of the turbidity meter (6) increases due to the floating effect of the sludge after the injection of the giant bubble. Meanwhile, the giant bubble acts together with the vortex formed by the cleaning ball (B) and the pump (B) to effectively prevent the sludge separated from the inner wall of the sewage pipe (1) from sinking again or adhering to the inner wall of the sewage pipe (1). When the amount of dissolved oxygen measured by the dissolved oxygen meter (5) after the injection of large bubbles reaches a level of 4 ppm, or when any one or more of the increase in turbidity, residual chlorine amount and hydrogen ion concentration measured by the turbidity meter (6), residual chlorine meter (7) and hydrogen ion meter (8) is at a level of 5% or less for 2 minutes, the control unit determines that the effect of injecting large bubbles is saturated, stops the injection of large bubbles, and controls the bubble generator (9) so that microbubbles are injected.

[0065] Microbubbles refer to bubbles with an average diameter of about 20 to 50 μm. Since microbubbles are generated with a relatively small volume compared to large bubbles, they have the characteristic of existing in water for a relatively long time compared to large bubbles, and then the gas diffuses into the water and disappears according to Henry's law. As the bubble generator (9) injects microbubbles into the fluid moving along the second path (first supply line (L2) → first connection line (L1a) → water and sewage pipe (1) → second connection line (L1b) → second supply line (L3) → second branch line (L4) → first circulation line (L5a) → second circulation line (L5b) → first supply line (L2)) together with the cleaning ball (B), the microbubbles can react with sludge having a particle size smaller than that of the sludge reacted with when large bubbles are applied. When the amount of dissolved oxygen measured by the dissolved oxygen meter (5) after the injection of microbubbles reaches a level of 25 ppm, or when the increase in any one or more of the turbidity, residual chlorine amount, and hydrogen ion concentration measured by the turbidity meter (6), residual chlorine meter (7), and hydrogen ion meter (8) is 5% or less for 2 minutes, the control unit determines that the effect of the microbubble injection is saturated, stops the injection of microbubbles, and controls the bubble generator (9) to inject nanobubbles.

[0066] Nanobubbles may refer to bubbles with an average diameter of about 100 to 350 nm. Since nanobubbles have a fine particle size, they are hardly affected by underwater buoyancy and can remain in water for a long time, thereby maximizing cleaning efficiency. After the injection of nanobubbles, if the dissolved oxygen measured by the dissolved oxygen meter (5) reaches a level of 55 ppm, or if any one or more of the increase in turbidity, residual chlorine, and hydrogen ion concentration measured by the turbidity meter (6), residual chlorine meter (7), and hydrogen ion meter (8) is at a level of 5% or less for 2 minutes, the control unit determines that the effect of the nanobubble injection is saturated, stops the injection of microbubbles, and can recover the cleaning ball (B) and fluid to the first tank (11).

[0067] Even when cleaning a water and sewage pipe (1) is performed by sequentially injecting large bubbles, microbubbles, and nanobubbles into a fluid containing a cleaning ball (B), the driving conditions of the pump (P) can be controlled so that the flow velocity measured by the flow meter (3) is maintained at a level of 1.2 m / sec or higher, taking into consideration the prevention of sedimentation of the cleaning ball (B) and the separation of sludge from the inner wall of the water and sewage pipe (1), and the water pressure measured by the pressure gauge (4) is 5 kgf / cm² to prevent damage to the water and sewage pipe (1) caused by excessive collision of the cleaning ball (B). 2 The driving conditions of the pump (P) can be controlled to maintain a level below.

[0069] Cleaning ball recovery step

[0070] When the injection of nanobubbles is finished, the control unit controls the fifth valve (V5) to open the second branch line (L4) and the recovery line (L10), and accordingly, the fluid containing sludge and cleaning balls (B) can flow into the first receiving space (11') through the recovery line (L10). Meanwhile, the control unit can control the electromagnet (17) to form a magnetic field, and the metal cleaning balls (B) can be more effectively maintained in a state of sinking to the lower side of the first receiving space (11') by the magnetic field formed by the electromagnet (17) placed on the lower side of the first tank (11).

[0072] production water filtration stage

[0073] When the water level measured by the first sensor (16a) is detected to be 90% or higher, the control unit can control the seventh valve (V7) to open and the first valve (V1) to remain in a closed state, and accordingly, the cleaning ball (B) remains in the first receiving space (11'), and the fluid containing sludge can be supplied to the first supply line (L2) through the discharge line (L2). Meanwhile, in this case, the control unit can control the second valve (V2) to open the second supply line (L2) and the filtration line (L8), control the third valve (V3) to open the filtration line (L8) and the second supply line (L3), control the fourth valve (V4) to open the second supply line (L3) and the first branch line (L7), and control the sixth valve (V6) to open the first branch line (L7) and the second circulation line (L5b), and accordingly, the fluid containing sludge can move by circulating through the third path (first supply line (L2) → filtration line (L8) → second supply line (L3) → first branch line (L7) → second circulation line (L5b) → first supply line (L20)). When the water level measured by the first sensor (16a) is detected to be less than 10%, the control unit can close the seventh valve (V7). As the fluid containing sludge circulates through the third path (first supply line (L2) → filtration line (L8) → second supply line (L3) → first branch line (L7) → second circulation line (L5b) → first supply line (L20)), it passes through a precision filtration device (2) provided on the filtration line (L8), and the sludge contained in the fluid can be filtered by a microfilter placed inside the precision filtration device (2). Considering the filtration effect by the microfilter, the control unit [determines] that the water pressure measured by the pressure gauge (4) is 1 to 5 kgf / cm² 2The operating conditions of the pump (P) can be controlled to satisfy the range. In the production water filtration step, the circulation of the filtered water through the third path (first supply line (L2) → filtration line (L8) → second supply line (L3) → first branch line (L7) → second circulation line (L5b) → first supply line (L20)) can be continuously carried out until the turbidity measured by the turbidity meter (6) and the residual chlorine amount measured by the residual chlorine meter (7) reach a certain level, and the production water filtration step can be terminated when both the turbidity of 0.5 NTU or less and the residual chlorine amount of 0.1 ppm or less are satisfied.

[0074] Afterwards, the second valve (V2) is switched to a state where the first supply line (L2) and the first connection line (L1a) are opened, and the third valve (V3), the fourth valve (V4), and the sixth valve (V6) are closed sequentially, and after the filtered water is recovered into the water and sewage pipe (1), the second valve (V2) is closed, thereby completing the cleaning operation of the water and sewage pipe (1).

[0076] As described above, a water and sewage pipe cleaning system and a water and sewage pipe cleaning method using the same according to one aspect of the present invention can effectively remove sludge attached to the inside of water and sewage pipes without using chemicals by sequentially applying cleaning balls, stepwise bubble water, and a microfilter, and can also effectively recover cleaning balls used in the cleaning operation through the interaction of metal cleaning balls and electromagnets.

[0078] The present invention will be explained below through experimental examples, but it should be noted that such experimental examples are intended to explain the structure and effects of the present invention more specifically, and the scope of the present invention is not limited to the experimental examples below.

[0080] <Experimental Example 1> Verification of Solid Substance Removal Efficiency by Bubble Size

[0081] Floating tests were conducted according to bubble size to verify the removal rate of solid substances by bubble size. Since sludge in water and sewage pipelines is discharged in the form of sludge with various particle sizes during cleaning, it is not easy to clearly determine the floating characteristics according to bubble size. Therefore, the behavior of sludge in water and sewage pipelines was simulated using ceramic microspheres that allow for the selection and application of a single particle size. Microspheres with particle diameters of 100㎛, 50㎛, and 20㎛ were prepared in separate amounts of 100g each, and nine tanks containing 2L of water were prepared. The experiment was conducted with each tank connected to a bubble generator capable of injecting bubbles into the lower side of the fluid contained in the tank, and a dissolved oxygen measuring device capable of measuring the dissolved oxygen content of the fluid contained in each tank. 100g of microspheres with a particle diameter of 100㎛ were introduced into each of three tanks (Tanks 1 to 3), 100g of microspheres with a particle diameter of 50㎛ were introduced into each of three other tanks (Tanks 4 to 6), and 100g of microspheres with a particle diameter of 20㎛ were introduced into each of three other tanks (Tanks 7 to 9). After introducing the microspheres, ultrasonic treatment was performed on Tanks 1 to 9 for 15 minutes to ensure homogeneity.

[0082] Nanobubbles with an average particle size of 100–200 nm were injected into tanks 1, 4, and 7, microbubbles with an average particle size of 20–50 µm were injected into tanks 2, 5, and 8, and macrobubbles with an average particle size of 100–200 µm were injected separately into tanks 3, 6, and 9. As bubbles were injected into each tank, microspheres that had sunk to the bottom of the tank began to float to the top of the tank.

[0083] Nanobubbles with an average particle size of 100–200 nm were injected until the dissolved oxygen measured in tanks 1, 4, and 7 reached 55 ppm, microbubbles with an average particle size of 20–50 µm were injected until the dissolved oxygen measured in tanks 2, 5, and 8 reached 24 ppm, and macrobubbles with an average particle size of 100–200 µm were injected until the dissolved oxygen measured in tanks 3, 6, and 9 reached 4 ppm. Here, reference dissolved oxygen levels of 4 ppm, 24 ppm, and 55 ppm correspond to the theoretical saturated dissolved oxygen levels of macrobubbles with an average particle size of 100–200 µm, microbubbles with an average particle size of 20–50 µm, and nanobubbles with an average particle size of 100–200 nm, respectively.

[0084] When the dissolved oxygen measured in tanks 1, 4, and 7 reached 55 ppm, 200 ml of sample fluids 1, 4, and 7 were extracted from tanks 1, 4, and 7; when the dissolved oxygen measured in tanks 2, 5, and 8 reached 24 ppm, 200 ml of sample fluids 2, 5, and 8 were extracted from tanks 2, 5, and 8; and when the dissolved oxygen measured in tanks 3, 6, and 9 reached 4 ppm, 200 ml of sample fluids 3, 6, and 9 were extracted from tanks 3, 6, and 9. The sample fluids were extracted from the upper side of each tank, and the injection of macrobubbles, microbubbles, and nanobubbles was stopped after the extraction of the sample fluids was completed.

[0085] Subsequently, vacuum filtration was performed on each sample fluid, and the microsphere removal rate in each tank was measured using the difference (M2-M1) between the initial weight (M1) of the filter used for vacuum filtration and the weight (M2) of the filter dried after vacuum filtration was completed, as shown in Equation 1 below. Since microspheres suspended in each tank remain in the filter after vacuum filtration is completed, the mass of the suspended microspheres can be estimated using the difference between the initial weight (M1) of the filter used for vacuum filtration and the weight (M2) of the filter dried after vacuum filtration is completed.

[0087] (Equation 1) Microsphere Removal Rate (MRR, %) = {(M2 - M1) / 10} * 100

[0088] In Equation 1, M2 represents the weight of the filter before vacuum filtration, and M1 represents the weight of the filter after vacuum filtration.

[0090] A total of 3 sets of microsphere introduction, bubble injection, sample extraction, and vacuum filtration were performed on 9 tanks, and the microsphere removal rate (MRR, %) calculated using the difference between the initial weight (M1) of the filter used for vacuum filtration and the weight (M2) of the filter dried after vacuum filtration is as shown in Table 1 below.

[0092] Microsphere Removal Rate (MRR, %) Microsphere size (㎛) Types of bubbles Nanobubbles (Tanks 1, 4, 7) average Microbubbles (Tanks 2, 4, 8) average Giant bubble (tank 3, 6, 9) average 20 69.45 69.64 86.26 84.94 90.48 91.52 71.12 84.36 92.48 68.34 82.41 91.59 50 74.32 75.14 89.67 90.88 94.59 94.14 77.63 90.48 95.36 73.48 92.48 92.47 100 79.26 81.99 95.78 94.27 94.61 95.55 84.07 92.78 95.47 82.65 94.26 96.56

[0094] As shown in Table 1, it can be seen that the microsphere removal rate (MMR, %) tends to increase as the size of the microspheres and the size of the bubbles increase.

[0096] <Experimental Example 2> Verification of Solid Substance Removal Efficiency of Mixed Bubbles

[0097] An experiment was conducted to verify the removal rate of solid substances when bubbles of various sizes are introduced simultaneously. As in Experimental Example 1, 100g of microspheres with particle diameters of 100㎛, 50㎛, and 20㎛ were prepared separately, and nine tanks containing 2L of water were prepared. The experiment was conducted with each tank connected to a bubble generator capable of injecting bubbles into the lower side of the fluid contained in each tank and a dissolved oxygen measuring device capable of measuring the amount of dissolved oxygen in the fluid contained in each tank. 100g of microspheres with a particle diameter of 100㎛ were introduced into each of three tanks (tank a to c), 100g of microspheres with a particle diameter of 50㎛ were introduced into each of three other tanks (tank d to f), and 100g of microspheres with a particle diameter of 20㎛ were introduced into each of three other tanks (tank g to i). After introducing the microspheres, ultrasonic treatment was performed on tanks 1 to 9 for 15 minutes to ensure homogeneity.

[0098] For tanks a, d, and g, microbubbles with an average particle size of 20–50 µm were injected until the dissolved oxygen reached 25 ppm, and then nanobubbles with an average particle size of 100–200 nm were injected until the dissolved oxygen reached 55 ppm. For tanks b, e, and h, macrobubbles with an average particle size of 100–200 µm were injected until the dissolved oxygen reached 4 ppm, and then microbubbles with an average particle size of 20–50 µm were injected until the dissolved oxygen reached 25 ppm. For tanks c, f, and i, large bubbles with an average particle size of 100–200 μm were injected until the dissolved oxygen reached 4 ppm, then microbubbles with an average particle size of 20–50 μm were injected until the dissolved oxygen reached 25 ppm, and subsequently nanobubbles with an average particle size of 100–200 nm were injected until the dissolved oxygen reached 55 ppm.

[0099] When the dissolved oxygen measured in tanks a, d, and g reached 55 ppm, 200 ml of sample fluids a, d, and g were extracted from tanks a, d, and g; when the dissolved oxygen measured in tanks b, e, and h reached 25 ppm, 200 ml of sample fluids b, e, and h were extracted from tanks b, e, and h; and when the dissolved oxygen measured in tanks c, f, and i reached 55 ppm, 200 ml of sample fluids c, f, and i were extracted from tanks c, f, and i. The sample fluids were extracted from the upper side of each tank, and the injection of bubbles was stopped after the extraction of the sample fluids was completed.

[0100] Subsequently, vacuum filtration was performed on each sample fluid, and the microsphere removal rate (Microsphere Removal Ratio, MRR, %) calculated after weighing three sets as in Experimental Example 1 is as shown in Table 2 below.

[0102] Microsphere Removal Rate (MRR, %) Microsphere size (㎛) Types of bubbles Microbubbles + Nanobubbles (tank a, d, g) average Giant bubbles + microbubbles (tank b, e, h) average Giant bubbles + microbubbles + nanobubbles (tank c, h, i) average 20 87.59 87.59 92.41 93.41 93.24 94.79 87.22 93.57 95.47 87.96 94.26 95.67 50 91.68 92.58 96.24 95.98 97.24 97.01 92.91 97.14 97.56 93.14 94.57 96.24 100 94.26 94.74 95.47 95.65 97.14 97.42 95.38 95.24 97.26 94.58 96.25 97.85

[0104] Compared to the microsphere removal rate (MRR, %) in Table 1, where nanobubbles, microbubbles, and macrobubbles were injected individually, it can be seen that the microsphere control rate (MRR, %) in Table 2, where nanobubbles, microbubbles, or macrobubbles were injected in combination, was significantly improved. It can also be seen that the microsphere removal rate (MRR, %) for all microsphere sizes was highest in tanks c, h, and i, where macrobubbles, microbubbles, and nanobubbles were applied sequentially.

[0106] Although the present invention has been described in detail through embodiments above, other forms of embodiments are also possible. Therefore, the technical concept and scope of the claims described below are not limited to the embodiments. Explanation of the symbols

[0107] 1: Water and sewage pipeline 2: Precision Filtration Device 3: Flow meter 4: Pressure gauge 5: Dissolved Oxygen Meter 6: Turbidity meter 7: Residual Chlorine Meter 8: Hydrogen ion meter 9: Bubble generator 10: Cleaning ball tank 11: 1st Tank 12: 2nd Tank B: Cleaning ball P: Pump

Claims

Claim 1 A sewage pipe cleaning system comprising: a cleaning ball tank configured to supply metal cleaning balls contained therein into the interior of a sewage pipe to be cleaned and to recover the metal cleaning balls used for cleaning the sewage pipe to be cleaned by magnetic force; a first supply line configured to have one end connected to the cleaning ball tank and extend toward one end of the sewage pipe to be cleaned, and to provide a movement path for the metal cleaning balls from the cleaning ball tank to the sewage pipe to be cleaned; a bubble generator configured to inject bubbles of a selective particle size into a fluid flowing into the interior of the sewage pipe to be cleaned; a precision filtration device configured to filter sludge contained in the fluid discharged from the sewage pipe to be cleaned by a microfilter; and a pump configured on the first supply line to provide a driving force for movement to the fluid moving through the first supply line, wherein the cleaning balls are made of one or more materials selected from a ferritic material, a martensitic material, or a 400 series stainless steel material. Claim 2 In claim 1, the water and sewage pipeline cleaning system comprises: a first valve disposed on the first supply line; a second valve provided at the other end of the first supply line; a first connecting line extended from the second valve and provided to be connected to one end of the water and sewage pipeline to be cleaned; a second connecting line provided to be connected at one end to the other end of the water and sewage pipeline to be cleaned; a third valve provided at the other end of the second connecting line; a second supply line with one end connected to the third valve and the other end connected to a fourth valve; a second branch line with one end connected to the fourth valve and the other end connected to a fifth valve; a first branch line with one end connected to the fourth valve and the other end connected to a sixth valve; a first circulation line with one end connected to the fifth valve and the other end connected to the sixth valve; and a second circulation line with one end connected to the sixth valve and the other end connected to the first supply line. A water and sewage pipeline cleaning system further comprising: a filtration line extending from the second valve toward the third valve; wherein the bubble generator is positioned on the second branch line and the precision filtration device is positioned on the filtration line. Claim 3 In paragraph 2, the cleaning ball tank comprises: a first tank having a first receiving space formed therein capable of accommodating a metal cleaning ball used for cleaning the water and sewage pipe; a second tank disposed adjacent to the first tank having a second receiving space formed therein capable of accommodating a metal cleaning ball to be used for cleaning the water and sewage pipe; an electromagnet disposed on the lower side of the first tank to form a magnetic attraction with the metal cleaning ball; a partition disposed between the first tank and the second tank to block the magnetic field generated by the electromagnet; a first sensor provided in the first tank to measure the level of the fluid contained in the first receiving space; and a second sensor provided in the second tank to measure the level of the fluid contained in the second receiving space, wherein one end of the first supply line is connected to the lower side of the first tank, a water and sewage pipe cleaning system. Claim 4 The water and sewage pipeline cleaning system according to claim 3 further comprises: an inlet line having one end connected to the third valve and the other end connected to the upper side of the second tank, providing a fluid movement path from the third valve to the second receiving space; a return line having one end connected to the fifth valve and the other end connected to the upper side of the first tank, providing a fluid movement path from the fifth valve to the first receiving space; and a discharge line having one end connected to the lower side of the first tank and the other end connected to the first supply line, providing a fluid movement path from the first receiving space to the first supply line; and the cleaning ball tank further comprises an outflow prevention cover, an upper geotextile, crushed stone, and a lower geotextile sequentially arranged on the lower side of the first receiving space to prevent the metal cleaning ball introduced into the first receiving space from being discharged through the discharge line. Claim 5 In paragraph 2, the bubble generating device is a water and sewage pipeline cleaning system that selectively injects, by distinguishing between large bubbles with an average particle size of 100 to 600 μm, microbubbles with an average particle size of 20 to 50 μm, and nanobubbles with an average particle size of 100 to 350 nm into the fluid moving through the second branch line according to the state of the fluid moving through the second supply line. Claim 6 In paragraph 2, the water and sewage pipe cleaning system further comprises: a flow meter provided on the first supply line to measure the flow rate of a fluid moving through the first supply line; a pressure gauge provided on the first supply line to measure the pressure inside the first supply line; a turbidity meter provided on the second supply line to measure the turbidity of a fluid moving through the second supply line; a residual chlorine meter provided on the second supply line to measure the amount of residual chlorine of a fluid moving through the second supply line; and a hydrogen ion meter provided on the second supply line to measure the hydrogen ion concentration of a fluid moving through the second supply line. Claim 7 A method for cleaning a water and sewage pipeline using a water and sewage pipeline cleaning system according to any one of claims 1 to 6, comprising: a cleaning preparation step of connecting the water and sewage pipeline cleaning system to one end and the other end of the water and sewage pipeline to be cleaned; a cleaning ball cleaning step of supplying the metal cleaning balls contained in the cleaning ball tank into the interior of the water and sewage pipeline together with a fluid to separate sludge adhered to the inner wall of the water and sewage pipeline from the inner wall of the water and sewage pipeline by the physical impact of the metal cleaning balls; a cleaning ball and stepwise bubble water cleaning step of sequentially reacting bubbles of stepwise particle sizes with the sludge contained in the fluid by sequentially injecting giant bubbles, microbubbles, and nanobubbles into the fluid containing the metal cleaning balls and supplying them into the interior of the water and sewage pipeline when one or more of the increase in turbidity, residual chlorine amount, and hydrogen ion concentration measured in the fluid discharged from the water and sewage pipeline is below a preset level; and in the fluid into which the nanobubbles are injected, A method for cleaning a water and sewage pipeline, comprising: a cleaning ball recovery step of recovering a metal cleaning ball contained in the fluid to the cleaning ball tank when one or more of the increases in measured turbidity, residual chlorine amount, and hydrogen ion concentration are below a preset level; and a production water filtration step of filtering and removing sludge floating in the fluid by allowing the fluid in which the cleaning ball was recovered to pass through the precision filtration device. Claim 8 A method for cleaning water and sewage pipes according to claim 7, wherein the average particle size of the giant bubbles is 100 to 600 μm, the average particle size of the microbubbles is 20 to 50 μm, and the average particle size of the nanobubbles is 100 to 350 nm. Claim 9 A method for cleaning a sewage pipe according to claim 7, wherein when the turbidity and residual chlorine of the filtered water passing through the precision filtration device satisfy a preset level, the filtered water is recirculated to the sewage pipe to terminate the cleaning of the sewage pipe.

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