Apparatus capable of continuous plasma treatment

Abstract

A plasma processing device of one embodiment comprises: a tube in which a plasma discharge is performed; a first fixing member into which one end of the tube is inserted and a gate formed therein for a workpiece to enter; a second fixing member into which the other end of the tube is inserted, which fixes the tube together with the first fixing member and has a gate formed therein for a workpiece to exit; a first electrode disposed on the outer circumference of the tube; a second electrode disposed inside the tube; a first electrode and a second electrode, each supported by the first fixing member and the second fixing member and connected to the first electrode and the second electrode, respectively; and a power supply unit that applies voltage to the first electrode and the second electrode through the first support electrode and the second support electrode to perform the plasma discharge, wherein the processing device allows a workpiece in the form of a thread to enter one gate and perform plasma processing, and the plasma-processed workpiece exits through another gate.

Description

Technology Field

[0001] The present disclosure generally relates to an apparatus for continuous plasma processing. Background Technology

[0002] Plasma refers to a state composed of ionized gas—atoms from which orbital electrons have been removed—and free electrons. It is formed when heated by a strong electric field or heat source, causing the substance to break beyond its gaseous state into particles such as electrons, neutral particles, and ions; it contains a significant proportion of charged particles, such as ions and / or electrons. The presence of charged particles is the primary characteristic that distinguishes plasma from other fundamental states of matter. Plasma can be artificially generated by heating neutral gas or exposing it to a strong electromagnetic field.

[0003] The presence of charged particles makes the plasma electrically conductive through macroscopic plasma motion, which is governed by the dynamics of individual particles and collective electromagnetic fields and is highly sensitive to externally applied fields; many modern technological devices, such as plasma televisions and plasma etching, utilize the plasma's response to electromagnetic fields. Neon signs and lightning are examples of plasma that can be observed up close.

[0004] Plasma has primarily been used for material surface modification, coating, sterilization, and disinfection, and recently, it is being widely used not only in the biomedical field but also in the beauty industry. The problem to be solved

[0005] As mentioned above, the number of objects requiring plasma treatment is increasing significantly. Objects extending in one direction, such as threads and wires, are no exception to this trend of requesting plasma treatment.

[0006] For example, plasma treatment is required for the sheathing of high-voltage power lines; in the case of high-voltage lines, performing plasma treatment can effectively prevent sheathing rupture caused by burrs on the outer resin coating. As another example, fiber materials are used in filters and gas sensors, and there are often requests to modify surface properties from hydrophilic to hydrophobic, or vice versa. In other words, technology is required to continuously perform plasma treatment on thread-shaped workpieces.

[0007] Furthermore, conventional plasma processing devices created a vacuum in the area where plasma discharge takes place using a vacuum pump. Consequently, there was a drawback in that expensive vacuum pumps had to be provided, and costs were incurred to maintain the vacuum in the processing area, resulting in increased process costs.

[0008] One of the problems to be solved by this embodiment is to resolve the requirements of the aforementioned prior art. means of solving the problem

[0009] A plasma processing device of one embodiment comprises: a tube in which a plasma discharge is performed; a first fixing member into which one end of the tube is inserted and a gate formed therein for a workpiece to enter; a second fixing member into which the other end of the tube is inserted, which fixes the tube together with the first fixing member and has a gate formed therein for a workpiece to exit; a first electrode disposed on the outer circumference of the tube; a second electrode disposed inside the tube; a first electrode and a second electrode, each supported by the first fixing member and the second fixing member and connected to the first electrode and the second electrode, respectively; and a power supply unit that applies voltage to the first electrode and the second electrode through the first support electrode and the second support electrode to perform the plasma discharge, wherein the processing device allows a workpiece in the form of a thread to enter one gate and perform plasma processing, and the plasma-processed workpiece exits through another gate.

[0010] According to one aspect of the present embodiment, the interior of the tube where the plasma discharge takes place is maintained at atmospheric pressure.

[0011] According to one aspect of the present embodiment, the gate is an aperture with a diameter of 1 mm to 100 mm.

[0012] According to one aspect of the present embodiment, the plasma treatment device comprises a plurality of first electrodes, and the first electrodes and the second electrodes are arranged alternately with each other.

[0013] According to one aspect of the present embodiment, at least one of the first fixed member and the second fixed member has a gas inlet formed therein that can be connected to a gas tank.

[0014] According to one aspect of the present embodiment, the power supply unit includes an RF voltage source that provides a signal in the RF band, and a matching circuit that performs impedance matching in relation to the RF voltage source, the first electrode, and the second electrode.

[0015] A plasma processing device of another embodiment comprises: a tube in which a plasma discharge is performed; a first fixing member into which one end of the tube is inserted and a gate formed therein for a workpiece to enter; a second fixing member into which the other end of the tube is inserted, which fixes the tube together with the first fixing member and a gate formed therein for a workpiece to exit; a first electrode extended along the length direction in which the tube is extended and disposed on the outer circumference of the tube; a second electrode extended along the length direction in which the tube is extended and disposed inside the tube; and a power supply unit that applies voltage to the first electrode and the second electrode through the first support electrode and the second support electrode to perform the plasma discharge, wherein the processing device allows a workpiece in the form of a thread to enter one gate to perform plasma processing, and the plasma-processed workpiece exits through another gate.

[0016] According to one aspect of another embodiment, the interior of the tube where the plasma discharge takes place is maintained at atmospheric pressure.

[0017] According to one aspect of another embodiment, the first electrode is a ring-shaped electrode that surrounds the outer circumference of the tube.

[0018] According to one aspect of another embodiment, the first electrode is one or more plate-shaped electrodes located on at least a portion of the outer circumference of the tube, and the one or more plate-shaped electrodes are spaced apart from each other at equal intervals with respect to the center of the tube.

[0019] According to one aspect of another embodiment, the second electrode is a wire-shaped electrode extended along the longitudinal direction of the tube.

[0020] According to one aspect of another embodiment, the second electrode has a cross-section that divides the interior of the tube into a plurality of intervals and extends along the length direction of the tube. Effects of the invention

[0021] According to the present disclosure, plasma treatment can be easily performed on thread-shaped workpieces that were difficult to treat with plasma using conventional technology, and plasma treatment can be performed at atmospheric pressure without a vacuum pump, providing an advantage. Brief explanation of the drawing

[0022] FIG. 1 is a perspective view illustrating an overview of a plasma processing apparatus according to the present embodiment. FIG. 2 is a block diagram illustrating an overview of the power supply unit in a plasma processing apparatus according to the present embodiment. FIGS. 3(a) and FIGS. 3(b) are drawings illustrating an overview of a first electrode located on the outside of a tube. FIGS. 4(a), FIGS. 4(b), and FIGS. 4(c) are drawings illustrating an overview of a second electrode located inside the tube. Figure 5 is a photograph of an embodiment of the present invention. Specific details for implementing the invention

[0023] First embodiment

[0024] The present embodiment will be described below with reference to the attached drawings. FIG. 1 is a perspective view illustrating an overview of a plasma processing apparatus according to the present embodiment. Referring to FIG. 1, the plasma processing device according to the present embodiment comprises a tube (100) in which plasma discharge is performed internally, a first fixing member (210) into which one end of the tube (100) is inserted and a gate formed therein for a workpiece (T) to enter, a second fixing member (220) into which the other end of the tube (100) is inserted, which fixes the tube (100) together with the first fixing member (210) and has a gate formed therein for a workpiece (T) to exit, a first electrode (310) disposed on the outer circumference of the tube (100), a second electrode (320) disposed inside the tube (100), a first extension electrode (510) and a second extension electrode (520) each supported by the first fixing member (210) and the second fixing member (220) and connected to the first electrode (310), and connected to the second electrode (320), respectively, so as to perform plasma discharge, the first extension electrode (510) and the second extension The processing device includes a power supply unit (600) that applies voltage to the first electrode (310) and the second electrode (320) through the electrode (520), and a thread-shaped processing object (T) enters one gate to perform plasma processing, and the plasma-processed processing object (T) exits through another gate.

[0025] The plasma processing device of the present embodiment continuously performs plasma processing on a thread-shaped workpiece (T). In one embodiment, the workpiece (T) is unwound from a state where it is wound on a roll and enters a gate formed in a first fixed member (210), and the workpiece (T) after plasma processing is performed can exit to a processing gate formed in a second fixed member (220) and be wound on a roll.

[0026] The tube (100) may be a transparent tube that allows observation of the plasma discharge state occurring inside. As an example, the tube (100) may be a quartz tube. However, this is merely an example, and the tube may be a polycarbonate tube or a glass tube. Additionally, the tube (100) may be an opaque tube. Furthermore, it is preferable that the tube (100) be formed of a material having electrical insulation properties so that an electrode to which voltage is applied may be disposed therein.

[0027] In the illustrated embodiment, the tube (100) exemplifies a cylinder shape with a circular cross-section. Additionally, the first electrode (310) located on the outer circumference of the tube (100) may be formed in a ring shape to conform to the tube with a circular cross-section and placed in close contact with the outer surface of the tube (100). Furthermore, the second electrode (320) located inside the tube may have a ring shape to conform to the circular cross-section of the tube as described above.

[0028] In another embodiment, the tube (100) may have a polygonal cross-section, such as a square, as an example. Additionally, the first electrode (310) located on the outer circumference of the tube (100) and the second electrode (320) located inside the tube may be closely positioned to conform to the tube having a polygonal cross-section.

[0029] The tube (100) can be fixed by a first fixing member (210) and a second fixing member (220). In one embodiment, one end of the tube (100) is inserted into the first fixing member (210), and the other end is inserted into the second fixing member (220) to fix the tube (100). Additionally, both the first fixing member (210) and the second fixing member (220) are connected to the external environment through a gate (not shown). A workpiece (T) enters the tube (100) where plasma treatment is performed through a gate formed in the first fixing member (210), and the workpiece (T) after plasma treatment is performed exits to the outside through a gate formed in the second fixing member (220).

[0030] An aperture (not shown) may be formed in the gate through which a plasma treatment target (T) can enter and exit, and the diameter of the aperture may be larger than the diameter of the treatment target (T). For example, the diameter of the aperture may be formed to be 1 mm to 100 mm to minimize leakage of plasma formed inside the tube where the plasma discharge takes place.

[0031] In an unillustrated embodiment, the workpiece (T) can enter the inside of the tube through a gate (not illustrated) formed in the first fixed member (210) while being unwound from being wound on a roll, and the workpiece (T) after plasma treatment is completed can exit to the outside through the gate (not illustrated) and be wound on a roll.

[0032] In the embodiment illustrated in FIG. 1, the first fixing member (210) may have a gas inlet (212) formed therein that communicates with the inside of the tube (100). The gas inlet (212) may be connected to the inside of the tube (100) where plasma discharge is performed, and plasma discharge may be performed with the inside of the tube formed into a desired gas atmosphere. For example, the gas may be a Group 18 gas such as helium, neon, or argon, oxygen, nitrogen, air, or tetrafluorinated carbon (CF4). In an embodiment not illustrated, at least one of the first fixing member (210) and the second fixing member (220) may have a gas inlet formed therein that communicates with the inside of the tube. In one embodiment, the first fixing member (210) and the second fixing member (220) may be formed of anodized aluminum.

[0033] The first electrode (310) may be positioned along the outer circumference of the tube (100), and the second electrode (320) may be positioned inside the tube (100). As illustrated in the embodiment, the first electrode (310) may have a shape that corresponds to the outer circumference of the tube (100). For example, if the tube is a circular tube, the first electrode (310) may be a ring-shaped electrode corresponding to the outer circumference of the circular tube. In another example not illustrated, if the tube is a polygonal tube such as a triangle or a square, the first electrode may be a polygonal electrode or a plate-shaped electrode corresponding to the outer circumference of the polygonal tube.

[0034] The second electrode (320) is positioned inside the tube (100), and the extension portion (322) of the second electrode (320) can be electrically connected to the second extension electrode (520) through a hole (not shown) formed in the tube. As in the illustrated embodiment, if the tube (100) is a circular tube, the second electrode (310) may be a ring-shaped electrode corresponding to the inner circumference of the circular tube, but in other examples not limited thereto, the second electrode may be located on the inner circumference of the circular tube and may be a polygonal electrode or a plate-shaped electrode. In other unillustrated embodiments, the tube may be a polygonal tube such as a triangle or a square, and the second electrode may be a polygonal electrode or a plate-shaped electrode corresponding to the outer circumference of the polygonal tube, or a circular electrode not corresponding to the inner circumference of the polygonal tube.

[0035] By adjusting the number of alternately arranged first electrodes (310) and second electrodes (320), the length of the region where plasma discharge occurs within the tube (100) can be adjusted. From this, the region where plasma treatment is performed on the plasma treatment target (T) can be adjusted.

[0036] FIG. 2 is a block diagram illustrating an overview of a power supply unit (600) in a plasma processing apparatus according to the present embodiment. In the embodiment illustrated in FIG. 2, the power supply unit (600) includes an RF voltage source (610) that provides a signal in the RF band, and a matching circuit (620) that performs impedance matching in relation to the RF voltage source (610), the first electrode (310), and the second electrode (320).

[0037] In the embodiment of the power supply unit (600) illustrated in FIG. 2, the power supply unit (600) may be housed in a housing (not shown), and the housing may include a power button for supplying or cutting off power to a plasma processing device, a voltage regulator for adjusting the voltage supplied to the electrode, a flow rate control button for controlling the flow rate of the incoming gas, and an intensity control button for controlling the intensity of the plasma formed. Additionally, the housing may have a display formed thereon that displays the intensity of the plasma formed in the tube, the charge density, the magnitude of the voltage applied to the electrode, and the flow rate of the gas entering the tube.

[0038] In the embodiment illustrated in FIGS. 1 and 2, the first electrode (310) located on the outer circumference of the tube (100) can be connected to a first extension electrode (510) connected to an RF voltage source (610), and the second electrode (320) located on the inner side of the tube (100) can be connected to a second extension electrode (520) connected to ground.

[0039] The first electrode (310) can be connected to the first extension electrode (510) to provide RF power from the RF voltage source (610), and the second electrode (320) can be connected to the second extension electrode (520) to provide ground voltage. In the illustrated embodiment, the first electrode (310) is located on the outer circumference of the tube (100). The first extension electrode (510) is inserted into a groove formed in the extension portion (312) so that the first electrode (310) and the first extension electrode (510) are connected. A screw fastening hole (314) may be formed in the extension portion (312), and the first electrode (310) is firmly connected to the first extension electrode (510) by fastening a screw in the screw fastening hole (314).

[0040] Additionally, in the embodiment illustrated in FIG. 1, the second electrode (320) is located inside the tube (100), but the extension (322) of the second electrode (320) penetrates a hole (not shown) formed in the tube (100) and is exposed to the outside. The second extension electrode (520) is inserted into a groove formed in the extension (322) exposed to the outside, and the second electrode (320) is connected to the second extension electrode (520). A screw fastening hole (324) may be formed in the extension (322), and the second electrode (320) is firmly connected to the second extension electrode (520) by fastening a screw in the screw fastening hole (324).

[0041] The first fixed member (210) and the second fixed member (220) are each connected to the first end member (710) and the second end member (720) to be integrally joined. In one embodiment, the first end member (710) and the second end member (720) may be formed of PEEK, a type of insulating engineering plastic, thereby preventing the formation of a short circuit between the first extension electrode (510) and the second extension electrode (520).

[0042] 2nd embodiment

[0043] A second embodiment is described below with reference to the attached drawings. However, descriptions of elements identical or similar to those described above may be omitted. The tube (100) illustrated in FIGS. 3 and 4 is exemplified as having a circular cross-section, but this is merely an example and may have a polygonal cross-section such as a square as described above.

[0044] A plasma processing device of a second embodiment comprises: a tube (100) in which plasma discharge is performed; a first fixing member (210, see FIG. 1) into which one end of the tube is inserted and a gate formed for the object to be processed to enter; a second fixing member (220, see FIG. 1) into which the other end of the tube is inserted, which fixes the tube together with the first fixing member and a gate formed for the object to be processed to exit; a first electrode (310) that extends along the length direction of the tube and is disposed on the outer circumference of the tube; a second electrode (320) that extends along the length direction of the tube and is disposed inside the tube; and a power supply unit (600, see FIG. 2) that applies voltage to the first electrode and the second electrode to perform plasma discharge. In the processing device, a thread-shaped object to be processed enters one gate to perform plasma processing, and the plasma-processed object exits through another gate.

[0045] FIGS. 3(a) and FIGS. 3(b) are drawings illustrating an overview of a first electrode located on the outside of a tube (100). Referring to FIG. 3(a), a first electrode (310a) to which an RF voltage is provided is located on the outside of the tube (100). The illustrated first electrode (310a) is a plate-shaped electrode that extends along the direction in which the tube (100) extends. The electrodes illustrated in FIG. 3(a) may be spaced apart from each other on the tube (100), for example, spaced apart by an equal distance from the center of the tube. In the illustrated embodiment, the plate-shaped electrode (310a) is illustrated as providing an RF voltage. However, in an embodiment not illustrated, the plate-shaped electrode may provide a ground voltage.

[0046] The embodiment illustrated in FIG. 3(a) illustrates two first electrodes (310a), but in an embodiment not illustrated, a single plate-shaped first electrode or three or more plate-shaped first electrodes may be placed on the outer circumference of the tube.

[0047] The plate-shaped first electrodes (310a) can be electrically connected to each other through a connecting member (410), and a protrusion (420) protruding from the connecting member (410) can be inserted into a connector (430) and connected to a power supply (600, see FIG. 2) to provide RF voltage or be connected to ground.

[0048] Referring to FIG. 3(b), a first electrode (310b) is located on the outside of the tube (100). The illustrated first electrode (310b) is a ring-shaped electrode that covers the outer surface of the tube (100) and extends along the direction in which the tube (100) extends.

[0049] An electrode (see FIG. 4) may be located on the inner side of the tube where the first electrode (310b) is located. A hole penetrating the first electrode (310b) may be formed in the first electrode (310b). The electrode located on the inner side of the tube (100) may be electrically connected to a protrusion (420) protruding through the hole, and the protrusion (420) may be inserted into a connector (430) to make an electrical connection with the electrode located on the inner side of the tube. The first electrode (310b) may be connected to a power supply unit (600, see FIG. 2) to provide RF voltage or be connected to ground.

[0050] FIGS. 4(a), FIGS. 4(b), and FIGS. 4(c) are drawings illustrating an overview of a second electrode located inside a tube (100). Referring to FIG. 4(a), a second electrode (320a) is located inside the tube (100). The illustrated second electrode (320a) may be a wire-type electrode. The wire-type second electrode (320a) may be located, for example, at the center of the tube and extend along the direction in which the tube is extended, thereby forming plasma evenly inside the tube (100).

[0051] As described, the second electrode (320a) is inserted into a connector (430) connected to a power supply (600, see FIG. 2) at one end so that an RF voltage or ground voltage can be provided.

[0052] Referring to FIG. 4(b), a second electrode (320b) to which an RF voltage is provided is located inside the tube (100). The illustrated second electrode (320b) may be a plate-shaped electrode. The second electrode (320b) may include two plate-shaped electrodes as illustrated. However, according to an unillustrated embodiment, a single plate-shaped second electrode (320b) may be included inside the tube (100). A plurality of plate-shaped second electrodes (320b) may be electrically connected to each other through a connecting member (410), and a protrusion (420) protruding from the connecting member (410) is inserted into a connector (430). Thus, the second electrode (320b) may be connected to a power supply (600) connected to the connector (430) to provide an RF voltage or a ground voltage.

[0053] The first and second fixed members described above have a gate formed with an aperture that allows a workpiece to pass through a region divided by the second electrode. Accordingly, plasma treatment can be performed on multiple workpieces simultaneously. However, this is merely an example, and the second electrode may divide the region inside the tube into three regions or five or more regions.

[0054] Referring to FIG. 4(c), a second electrode (320c) to which an RF voltage is provided is located inside the tube (100). The illustrated second electrode (320c) may be an electrode having a +-shaped cross-section. The second electrode (320c) may divide the area inside the tube (100) into four regions as illustrated.

[0055] In the embodiment illustrated in FIG. 4(c), the inner region of the tube is divided into four regions by the second electrode (320c), and plasma is formed within each region together with the outer first electrode. A protruding projection (420) is formed on the second electrode (320c), and the projection (420) is inserted into the connector (430). Thus, the second electrode (320c) is connected to a power supply unit (600) connected to the connector (430), and an RF voltage or ground voltage can be provided.

[0056] A gate having an aperture formed to allow a workpiece to pass through a region divided by a second electrode is formed in the first and second fixed members. Accordingly, plasma treatment can be performed on multiple workpieces simultaneously. However, this is merely an example, and the second electrode may divide the region inside the tube into three regions or five or more regions.

[0057] Implementation example

[0058] FIG. 5 is a photograph of an embodiment of the present invention. Referring to FIG. 5, the inside of the tube is maintained at atmospheric pressure, and a first electrode is placed on the outside of the tube and a second electrode is placed on the inside of the tube. It can be confirmed that a plasma discharge is performed inside the tube, and from this, it can be confirmed that plasma treatment can be continuously performed on a wire, fiber, thread, etc., extended in any direction.

[0059] To aid in understanding the present invention, the embodiments illustrated in the drawings have been described with reference to the examples shown; however, these are merely illustrative examples for implementation, and those skilled in the art will understand that various modifications and equivalent alternative embodiments are possible therefrom. Accordingly, the true technical scope of protection of the present invention should be determined by the appended claims. Explanation of the symbols

[0060] 100:Tube 210: First fixing member 212: Gas inlet 220: Second fixing member 310: First electrode 312: 1st extension 314: Screw fastening hole 320: Second electrode 322: Second extension 324: Screw fastening hole 410: Connecting member 420: Protrusion 430: Connector 510: First extension electrode 520: Second extension electrode 600: Power supply 610: RF Power 620: Matching circuit 710: First terminal member 720: Second terminal member

Claims

Claim 1 A plasma processing device comprising: a tube in which a plasma discharge is performed; a first fixing member into which one end of the tube is inserted and a gate formed therein for a workpiece to enter; a second fixing member into which the other end of the tube is inserted, which fixes the tube together with the first fixing member and has a gate formed therein for a workpiece to exit; a first electrode disposed on the outer circumference of the tube; a second electrode disposed inside the tube; a first electrode and a second electrode, each supported by the first fixing member and the second fixing member and connected to the first electrode and the second electrode, respectively; and a power supply unit that applies voltage to the first electrode and the second electrode through the first support electrode and the second support electrode to perform the plasma discharge, wherein the workpiece in the form of a thread enters one gate to perform plasma processing, and the plasma-processed workpiece exits through another gate. Claim 2 A plasma processing device according to claim 1, wherein the interior of the tube where the plasma discharge takes place is maintained at atmospheric pressure. Claim 3 In claim 1, the plasma processing apparatus wherein the gate is an aperture with a diameter of 1 mm to 100 mm. Claim 4 In claim 1, the plasma processing device comprises a plurality of first electrodes, and the plurality of first electrodes and the second electrodes are arranged alternately. Claim 5 A plasma processing device according to claim 1, wherein at least one of the first fixed member and the second fixed member has a gas inlet formed therein that can be connected to a gas tank. Claim 6 In claim 1, the power supply unit comprises an RF voltage source that provides a signal in the RF band, and a matching circuit that performs impedance matching in the relationship between the RF voltage source, the first electrode, and the second electrode. Claim 7 A plasma processing device comprising: a tube in which a plasma discharge is performed; a first fixing member into which one end of the tube is inserted and a gate formed therein for a workpiece to enter; a second fixing member into which the other end of the tube is inserted, which fixes the tube together with the first fixing member and a gate formed therein for the workpiece to exit; a first electrode extended along the length direction in which the tube is extended and disposed on the outer circumference of the tube; a second electrode extended along the length direction in which the tube is extended and disposed inside the tube; and a power supply unit for applying voltage to the first electrode and the second electrode to perform the plasma discharge, wherein the processing device comprises a thread-shaped workpiece to enter one gate to perform plasma processing, and the plasma-processed workpiece to exit through another gate. Claim 8 In claim 7, a plasma processing device in which the interior of the tube where the plasma discharge takes place is maintained at atmospheric pressure. Claim 9 A plasma processing device according to claim 1, wherein the first electrode is one of a ring-shaped electrode surrounding the outer circumference of the tube and one or more plate-shaped electrodes located on at least a portion of the outer circumference of the tube spaced apart from each other with respect to the center of the tube. Claim 10 A plasma processing device according to claim 1, wherein the second electrode is either a wire-shaped electrode extended along the longitudinal direction of the tube or an electrode extended along the longitudinal direction of the tube having a cross-section that divides the inside of the tube into a plurality of intervals.

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