Decoration film manufacturing method using pattern gradient method

Abstract

The present invention relates to a pattern gradient method, and more specifically, to a method for manufacturing a decoration film that applies a pattern gradient method, which enables the maximization of aesthetics through a method of realizing a gradient effect by stacking a plurality of pattern layers.

Description

Technology Field

[0001] The present invention relates to a pattern gradient method, and more specifically, to a method for manufacturing a decoration film that applies a pattern gradient method, which enables the maximization of aesthetics through a method of realizing a gradient effect by laminating a plurality of pattern layers and a design printing layer. Background Technology

[0002] Recently, with the advancement of mobile phone and smartphone technology, mobile phones and smartphones of various designs (hereinafter collectively referred to as "mobile phones") are being released. These mobile phones consist of a case that forms the exterior and various circuit components mounted inside the case to perform the inherent functions of the mobile phone.

[0003] Among these, a mobile phone back cover refers to a case that is attached to the back of the device. While these back covers not only serve the function of protecting the product from external impacts, recently, attempts have been made to develop various materials or incorporate design elements such as color, gloss, and patterns to enhance aesthetics and suit the preferences of modern consumers.

[0004] Recently, active technological development has been underway for back covers for mobile device housings, aimed not only at protecting the devices but also at enhancing their aesthetics. Currently, there is a growing demand for back covers with diverse film colors, gloss, and patterns to suit the preferences of modern consumers with unique personalities.

[0005] Accordingly, back covers for mobile communication device housings are recently required to incorporate various design elements, such as colors, patterns, textures, and gradient effects, to enhance aesthetics. There is a need for methods that allow users to experience unique textures and colors distinct from existing designs, while providing a more three-dimensional aesthetic. Prior art literature

[0006] Republic of Korea Published Patent No. 10-2018-0052828 The problem to be solved

[0007] The present invention aims to solve the aforementioned problems by providing a method for manufacturing a decoration film using a pattern gradient method, wherein a gradient effect is achieved by laminating a plurality of pattern layers and a design printing layer, thereby making the connection of the gradients much more natural compared to conventional pattern designs and enhancing depth and three-dimensionality, so as to ensure superior design quality and enhanced aesthetics.

[0008] The above and other objects and advantages of the present invention will become apparent from the following description describing preferred embodiments. means of solving the problem

[0009] The above objective is achieved by a step of preparing a first anti-shatter film; a step of forming a first UV pattern layer on the back surface of the first anti-shatter film; a step of forming a first deposition layer on the first UV pattern layer; a step of forming a design printing layer on the first deposition layer using a DDP printing method; a step of etching an area in the first deposition layer where the design is not printed; and a step of forming an OCR layer that fills the step difference of the design printing layer by applying OCR resin to the etched surface; a step of preparing a second anti-shatter film; a step of forming a second UV pattern layer on the back surface of the second anti-shatter film; a step of forming a second deposition layer on the second UV pattern layer; and

[0010] This can be achieved by a method for manufacturing a decoration film using a pattern gradient method, comprising: a step of forming a silk printing layer on the second deposition layer; a step of manufacturing a lower sheet including the step of forming a silk printing layer on the second deposition layer; and a step of laminating the lower sheet to the lower part of the upper sheet.

[0011] The above first anti-shatter film and second anti-shatter film are characterized by being films in which an optical OCA is laminated to an optical PET film.

[0012] The above DDP (Digital Direct Printing) printing is characterized by performing printing using transparent ink for DDP printing and further performing a curing process after printing.

[0013] The above curing is characterized by performing drying at a temperature of 80°C or higher for 30 minutes or more using a box oven.

[0014] The step of forming the OCR layer is characterized by performing curing after applying the OCR resin, wherein the curing is performed by both lamp curing and thermal curing.

[0015] The above objective can be achieved by a decoration film with a pattern gradient method applied, characterized in that it has a structure in which an upper sheet is laminated with a second anti-shatter film, a second UV pattern layer formed on the back surface of the first anti-shatter film, a first deposition layer formed on the first UV pattern layer, a design printing layer formed on the first deposition layer using a DDP printing method, and an OCR layer formed on the design printing layer, and a lower sheet is laminated with a second anti-shatter film, a second UV pattern layer formed on the back surface of the second anti-shatter film, a second deposition layer formed on the second UV pattern layer, and a silk printing layer formed on the second deposition layer. Effects of the invention

[0016] According to the present invention, a decoration film can be manufactured by a method of realizing a gradient effect by laminating a plurality of pattern layers and a design printing layer, such that the connection of the gradient is much more natural compared to conventional pattern designs, and the sense of depth and three-dimensionality is enhanced, thereby ensuring excellent design quality and enhanced aesthetics.

[0017] Furthermore, by improving the protective effect and adhesion of the design printing layer formed by the DDP printing method, and by increasing the adhesion between the upper sheet and the lower sheet, the physical properties and product reliability of the overall decoration film for smartphone back covers can be met at a level equivalent to or higher than that of the standard technology.

[0018] However, the effects of the present invention are not limited to those mentioned above, and other unmentioned effects will be clearly understood by those skilled in the art from the description below. Brief explanation of the drawing

[0019] FIG. 1 is a schematic diagram showing the laminated structure of a decoration film according to one embodiment of the present invention. FIG. 2 is a schematic diagram showing the sequence of a method for manufacturing an upper sheet of a decoration film according to one embodiment of the present invention. FIG. 3 is a schematic diagram showing the method of manufacturing a lower sheet of a decoration film according to one embodiment of the present invention in sequence. FIG. 4 is a drawing showing an actual photo and design elements of a decoration film manufactured according to one embodiment of the present invention applied to a smartphone back cover. Figure 5 is a drawing showing an actual photograph of a decoration film manufactured according to conventional technology applied to a smartphone back cover. Figures 6 to 8 are photographs showing the results of the reliability evaluation of Experimental Example 1. Specific details for implementing the invention

[0020] The present invention will be described in detail below with reference to the embodiments and drawings. These embodiments are presented merely as examples to explain the invention more specifically, and it will be obvious to those skilled in the art that the scope of the invention is not limited by these embodiments.

[0021] Furthermore, unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the art to which the present invention pertains, and in the event of a conflict, the description in this specification, including the definitions, shall prevail.

[0022] To clearly explain the proposed invention in the drawings, parts unrelated to the description have been omitted, and similar parts throughout the specification have been given similar reference numerals. Furthermore, when a part is described as "comprising" a certain component, this means that, unless specifically stated otherwise, it does not exclude other components but may include additional components. Additionally, the term "part" as described in the specification refers to a single unit or block that performs a specific function.

[0023] In each step, identification codes (1st, 2nd, etc.) are used for convenience of explanation and do not describe the order of the steps; the steps may be performed differently from the specified order unless a specific order is clearly indicated in the context. That is, the steps may be performed in the same order as specified, substantially simultaneously, or in the reverse order.

[0025] Hereinafter, embodiments and examples of the present invention will be described in detail with reference to the attached drawings. However, the present invention may not be limited to these embodiments and examples and drawings.

[0027] FIG. 1 is a schematic diagram showing the laminated structure of a decoration film according to one embodiment of the present invention.

[0028] Referring to FIG. 1, the decoration film comprises an upper sheet including a first anti-shatter film (100); a first UV pattern layer (90) formed on the back surface of the first anti-shatter film (100); a first deposition layer (80) formed on the first UV pattern layer (90); a design printing layer (70) formed on the first deposition layer (80) using a DDP printing method; and an OCR layer (60) formed on the design printing layer (70); and the lower part of the upper sheet has a structure in which a lower sheet is laminated, comprising a second anti-shatter film (50); a second UV pattern layer (40) formed on the back surface of the second anti-shatter film (50); a second deposition layer (30) formed on the second UV pattern layer (40); and a silk printing layer (20) formed on the second deposition layer (30).

[0030] FIG. 2 is a schematic diagram showing the sequence of a method for manufacturing an upper sheet of a decoration film according to one embodiment of the present invention.

[0031] Referring to FIG. 2, first, a first anti-shatter film (100) can be prepared.

[0032] The first anti-shatter film (100) above may be a base layer for laminating other functional layers, for example, an optical OCA laminated onto an optical PET film. This anti-shatter film can be used by adhering it to various materials such as glass, optical film, acrylic, PC, etc., and can maintain an excellent anti-shatter effect and high transmittance, and can exhibit the advantage of having properties that allow for easy performance of processes such as UV pattern formation, deposition, and printing.

[0033] For example, the first anti-shatter film (100) may be laminated with, for example, a PET film with a thickness of 20 to 25 μm, preferably 23 μm, and, for example, an OCA with a thickness of 20 to 25 μm, preferably 25 μm.

[0035] The first UV pattern layer (90) is an optical pattern layer formed on the back surface of the first anti-shatter film (100), and can display a three-dimensional design pattern and implement a variety of refraction effects.

[0036] The first UV pattern layer (90) is formed to produce various design effects such as patterns and three-dimensionality, and, for example, can be manufactured by forming a pattern through a rubbing process using a solvent-free UV-curing resin.

[0037] Specifically, first, a primary coating layer (not shown) can be formed using the above solvent-free UV-curing resin.

[0038] The above solvent-free UV-curing resin may comprise, for example, 45 to 55 weight% of an oligomer comprising polyurethane acrylate, e.g., 50 weight%, based on the total weight; 40 to 50 weight% of a monomer comprising N, N-dimethylacrylamide (DMAA) 1,6-hexanediol diacrylate (HDDA) or a combination thereof, e.g., 45 weight%; and 2 to 6 weight% of an additive comprising an initiator, e.g., 5 weight%.

[0039] The above-mentioned first coating layer (not shown) may be formed through a coating method such as a slot die, but is not limited thereto, and may be formed using a coating method commonly used in the industry.

[0040] The above first coating layer (not shown) is preferably formed with a thickness such that it is possible to make a rubbing in the next process, the roll rubbing step, for example, a thickness of 10 to 15 μm.

[0041] Next, a first UV pattern layer (90) can be formed by performing a process of making a pattern on the first coating layer using a rubbing device.

[0042] Specifically, the above-described rubbing device may be equipped with a roll-shaped pattern slave. Specifically, when a substrate having a primary coating layer formed thereon is fed into the rubbing device, the pattern slave moves from the pattern slave roll toward the pressure roller. The pattern slave may be formed from a material of polyethylene terephthalate (PET) with good thermoplasticity and may have a thickness of 0.15 to 0.20 mm.

[0043] The above pattern slave can display various pattern shapes.

[0044] The above pattern slave is positioned on the upper pressure roller with the pattern shape exposed as the protective film attached to the front surface is removed through a protective film remover. Subsequently, the pattern slave comes into contact with the primary coating layer on the substrate fed into the pressure roller, and the pattern can be imprinted on the primary coating layer by pressurizing the substrate and the pattern slave together while in contact with each other by the upper pressure roller and the lower pressure roller.

[0045] The above rubbing device is equipped with an LED irradiation unit, and during the rubbing step, the first coating layer uses an LED or similar light intensity of 100 to 150 mJ / cm² 2 and illuminance 50 to 80 mW / cm 2 By investigating with this, the main hardening can be performed together.

[0046] However, this is not limited thereto, and the specific methods of the above-mentioned rubbing process may be adjusted differently depending on the type of pattern to be formed.

[0047] For example, the pattern formed may be any one selected from, for instance, matte, glossy, haze, clear, holographic, and Fresnel patterns, but is not limited thereto.

[0048] Next, the first UV pattern layer (90) can be completely cured. At this time, the complete curing can be performed using a metal lamp or a mercury lamp, for example, at a pressure of 950 to 1,200 mJ / cm² 2 and illuminance 200 to 250 mW / cm 2 This can be performed by investigating. This complete curing process can be repeated two or more times, and preferably about three times.

[0049] For example, the thickness of the first UV pattern layer (90) is preferably formed to be 10 to 15 μm.

[0051] The first deposition layer (80) can be formed on the first UV pattern layer (90).

[0052] The first deposition layer (80) can be formed to protect the first UV pattern layer (90), clearly display the three-dimensional effect of the first UV pattern layer (90), and to impart color.

[0053] The first deposition layer (80) can be formed in the form of an inorganic thin film on the first UV pattern layer (90) using a deposition method commonly used in the industry, such as a non-conductive vacuum metallization (NCVM) method including a physical or chemical deposition method or an E-beam deposition method.

[0054] Physical vapor deposition (PV) is a method used to deposit oxide semiconductors or GaAs onto a substrate. In this process, compounds are melted to form a solid target, which is then vaporized using heat or an electron beam to deposit the material onto the substrate. During this process, the raw material is expelled in a gaseous state via heat, a laser, or an electron beam, and it transforms into a solid state upon contact with the substrate.

[0055] Chemical vapor deposition is an industrial method that uses chemical reactions to form thin films, such as silicon, on a substrate during the manufacturing process of ICs. It is used to produce silicon oxide films, silicon nitrogen films, and amorphous silicon films. When energy is applied to a gas containing chemical substances using heat or light, or when plasma is generated using high frequency, the raw material becomes radicalized, significantly increasing its reactivity, and is adsorbed and deposited on the substrate.

[0056] In addition, the first deposition layer (80) can be formed as a color deposition layer, for example, a gradient deposition layer, to improve aesthetics with various colors such as two-tone colors, multi-colors, and colors with varying depths. The gradient deposition layer can be formed, for example, using conventional electron beam deposition equipment.

[0057] For example, the thickness of the first deposition layer (80) is preferably formed to be 3,800 to 4,200 Å, specifically 4,000 Å. The first deposition layer (80) may be formed in a green color.

[0059] The above design printing layer (70) is formed in a portion of the first deposition layer (80), specifically, it can be formed using a Digital Direct Printing (DDP) printing method.

[0060] The above design printing layer (70) can freely display photos, patterns, characters, designs, etc. in a desired form according to the user's preference, and can be formed in a part of the first deposition layer (80) through a DDP printing method using transparent ink for DDP (Digital Direct Printing).

[0061] The above DDP printing method allows for easy control of density for each graphic section, thereby enabling a more natural gradient effect. Conventionally, a method of implementing a two-layer multi-color pattern on the upper and lower patterns of a product structure was used, but in the present invention, reflective colors of a graphic shape can be implemented by a method that allows for controlling the upper deposition area through gradient printing using the DDP printing method on the upper layer.

[0063] The above Digital Direct Printing (DDP) printing can be performed through a process of curing after printing according to known techniques using a conventional DDP printing device, using a DDP printing primer, a transparent ink, or a combination thereof.

[0064] The above DDP (Digital Direct Printing) printing method can be performed according to known techniques commonly practiced in the field.

[0065] The above curing may include, for example, a process of drying at a temperature of 80°C or higher for 30 minutes or more using a box oven.

[0066] For example, the thickness of the design printing layer (70) may be, for example, 10 to 30 μm, specifically 20 to 25 μm.

[0068] After forming the design printing layer (70), etching is performed on the first deposition layer (80), specifically, the deposition surface of the remaining area excluding the DDP printing area, that is, the area where the design is not printed, may be etched.

[0069] The above etching may be performed by a method comprising the steps of: removing the deposited material of a selected area using an etching solution comprising ammonium fluoride, ethoxylated propoxylated alcohol, triethanolamine, and ethylpyrrolidone; and washing with ultrapure water.

[0070] The above etching is preferably performed under conditions of, for example, 30°C.

[0071] However, it is not limited to this, and may be performed according to known techniques commonly used in the field.

[0073] After performing the above etching, an OCR resin can be applied to the etched surface to form an OCR layer (60) that fills the step difference of the design printing layer.

[0074] Through the above OCR layer (60), the design printing layer (70) formed by DDP printing is protected, adhesion to the printing area is increased, and the occurrence of curl is reduced, thereby improving the reliability of the design quality and the physical properties of the overall decoration film.

[0075] The above OCR resin may include, for example, a urethane acrylate oligomer to enable excellent adhesion to the design printing layer (70).

[0076] Preferably, the OCR resin comprises 30 to 60 weight% of urethane acrylate, specifically 30 to 50 weight%; 10 to 25 weight% of N,N-dimethylacrylamide, specifically 10 to 20 weight%; 5 to 15 weight% of 1,6-hexanediol diacrylate, specifically 5 to 10 weight%; 5 to 15 weight% of tetrahydrofurfuryl acrylate, specifically 5 to 10 weight%; and 0.5 to 5 weight% of diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide, specifically 0.5 to 1.5 weight%. It may include 1 to 5 weight% of 1-hydroxycyclohexyl phenyl ketone; and 0 to 1 weight% of additives.

[0077] The above method of application is not particularly limited and may follow known techniques.

[0078] For example, the thickness of the OCR layer may be 8 to 15 μm, specifically 10 μm.

[0079] After applying the above OCR resin, curing is performed, and the curing can be performed using both lamp curing and heat curing.

[0080] The above lamp curing is performed using a metal halide lamp or a mercury lamp, for example, at 850 to 900 mJ / cm² 2 , for example, 900 mJ / cm² 2 At the amount of light, 80 to 120 mW / cm 2 , for example, 100 mW / cm² 2 Primary curing may be performed by irradiating with the amount of light.

[0081] The above heat curing is performed to achieve higher adhesion between the OCR resin and the DDP layer in the second step. For example, it may include a process of drying at a temperature of 80°C or higher for 30 minutes or more using a box oven.

[0082] Thus, an upper sheet including the aforementioned layer structure can be manufactured.

[0084] FIG. 3 is a schematic diagram showing the method of manufacturing a lower sheet of a decoration film according to one embodiment of the present invention in sequence.

[0085] Referring to FIG. 3, a second anti-shatter film (50) can be prepared.

[0086] The above second anti-shatter film (50) may be, for example, a film in which an optical OCA is laminated to an optical PET film.

[0087] For example, the second anti-shatter film (50) may be laminated with, for example, a PET film with a thickness of 45 to 55 μm, preferably 50 μm, and, for example, an OCA with a thickness of 20 to 25 μm, preferably 25 μm.

[0089] The second UV pattern layer (40) is an optical pattern layer formed on the back surface of the second anti-shatter film (50), and can display a three-dimensional design pattern and implement a variety of refraction effects.

[0090] The method for forming the second UV pattern layer (40) is the same as the method for manufacturing the first UV pattern layer (90) described above, so a detailed explanation is omitted here.

[0092] The second deposition layer (30) can be formed on the second UV pattern layer (40).

[0093] The second deposition layer (30) can be formed to protect the second UV pattern layer (40), clearly display the three-dimensional effect of the second UV pattern layer (40), and to impart color.

[0094] The second deposition layer (30) can be formed in the form of an inorganic thin film on the second UV pattern layer (40) using a deposition method commonly used in the industry, such as a non-conductive vacuum metallization (NCVM) method including a physical or chemical deposition method or an E-beam deposition method.

[0095] Physical vapor deposition (PV) is a method used to deposit oxide semiconductors or GaAs onto a substrate. In this process, compounds are melted to form a solid target, which is then vaporized using heat or an electron beam to deposit the material onto the substrate. During this process, the raw material is expelled in a gaseous state via heat, a laser, or an electron beam, and it transforms into a solid state upon contact with the substrate.

[0096] Chemical vapor deposition is an industrial method that uses chemical reactions to form thin films, such as silicon, on a substrate during the manufacturing process of ICs. It is used to produce silicon oxide films, silicon nitrogen films, and amorphous silicon films. When energy is applied to a gas containing chemical substances using heat or light, or when plasma is generated using high frequency, the raw material becomes radicalized, significantly increasing its reactivity, and is adsorbed and deposited on the substrate.

[0097] In addition, the second deposition layer (30) can be formed as a color deposition layer, for example, a gradient deposition layer, to improve aesthetics with various colors such as two-tone colors, multi-colors, and colors with varying depths. The gradient deposition layer can be formed, for example, using conventional electron beam deposition equipment.

[0098] For example, it is preferable that the thickness of the second deposition layer (30) be formed to be 3,800 to 4,200 Å, specifically 3,800 Å. The second deposition layer (30) may be formed in a white color. That is, the first deposition layer (80) and the second deposition layer (30) may be formed to have different colors.

[0100] The above silk printing layer (20) can be formed on the second deposition layer (30).

[0101] The above silk printing layer (20) performs the function of blocking the transmission of light and can be implemented by printing a dark color. A decoration film manufactured according to one embodiment of the present invention is applied to the back cover so that the lower side of the silk printing layer (20) is not visible when viewed from above. The above silk printing layer (20) can be formed according to a silk screen printing method commonly used in the field.

[0102] Thus, a lower sheet including the aforementioned layer structure can be manufactured.

[0104] Subsequently, a decoration film can be manufactured by laminating the lower sheet to the lower part of the upper sheet. Specifically, the lower sheet can be laminated to the lower surface of the OCR layer (60) formed on the lower surface of the upper sheet, and then the laminated structure can be cured.

[0105] The above decoration film may be applied, for example, to a smartphone back cover.

[0106] Accordingly, the upper sheet may serve as an outer layer of a decoration film for a smartphone back cover, enabling various designs such as colors, patterns, and three-dimensional effects, while simultaneously performing a protective function for the surface of the back cover.

[0107] However, the decoration film for the smartphone back cover described above may further include known layer structures commonly used in the field, such as an anti-fingerprint layer or a hard coating layer, in addition to the aforementioned layer structure. Furthermore, post-processing commonly used in the field, such as a molding step including CNC machining, may be further performed thereafter.

[0109] FIG. 4 is a drawing showing an actual photo and design elements of a decoration film manufactured according to one embodiment of the present invention applied to a smartphone back cover.

[0110] Referring to FIG. 4, a decoration film manufactured according to one embodiment of the present invention has a structure in which a design printing layer and a second UV pattern layer are laminated, thereby allowing different colors and patterns to blend harmoniously while producing a more natural gradient effect, and by enhancing depth and three-dimensionality, it can produce a unique and colorful design effect.

[0112] Figure 5 is a drawing showing an actual photograph of a decoration film manufactured according to conventional technology applied to a smartphone back cover.

[0113] Referring to FIG. 5, in the case of a decoration film (comparative example) manufactured by performing the remaining processes in the same manner as the previously described embodiment, except that the design printing layer (70) of the present invention is formed using a silk printing method as in the conventional technology rather than a DDP printing method, it can be seen that the design quality is significantly degraded, such as the design effect lacking a natural gradient effect between the upper sheet and the lower sheet, and the silk printing area being implemented as a glossy finish, which feels unnatural.

[0115] Hereinafter, the structure of the present invention and the resulting effects are to be explained in more detail through specific embodiments and comparative examples. However, these embodiments are intended to explain the present invention more specifically, and the scope of the present invention is not limited to these embodiments.

[0117] <Experimental Example 1: Reliability Evaluation >

[0118] Experimental samples (5×5 cm) were prepared using a decoration film manufactured by including a process for forming a design printing layer and an OCR layer using the DDP printing method as described above. At this time, experimental groups were established with different DDP printing processes and curing conditions during the manufacturing process, and for each experimental group, a hot water resistance test (80℃ / 30 min) and an adhesion (X-CUT) test were performed according to known techniques. Information on the experimental groups is shown in Table 1 below, and the evaluation results are shown in Figures 6 to 8, respectively.

[0119]

[0120] Referring to Figures 6 through 8, it was confirmed that only the sample manufactured under condition A-1 passed the criteria for the hot water (80℃ / 30min) test and the adhesion (X-CUT) test without defects such as micro-delamination. On the other hand, the samples manufactured under conditions A-2, B-1, B-2, C-1, and C-2 exhibited defects such as delamination or micro-delamination at the edges. In other words, as in the embodiment of the present invention, it is shown that excellent reliability regarding the physical properties of the product can be secured when PR-200 (primer) ink is used alone to perform full curing (lamp curing) after DDP printing, followed by additional heat curing using a box oven.

[0122] Optimal embodiments have been disclosed in the drawings and specification. Specific terms have been used herein, but are used only for the purpose of describing the invention and are not intended to limit the meaning or the scope of the invention as described in the claims. Therefore, those skilled in the art will understand that various modifications and equivalent alternative embodiments are possible therefrom. Accordingly, the true technical scope of protection of the invention should be determined by the technical spirit of the appended claims. Explanation of the symbols

[0123] 100 : 1st anti-shatter film 90: 1st UV pattern layer 80: First deposition layer 70: Design print layer 60 : OCR layer 50 : Second anti-shatter film 40: Second UV pattern layer 30 : Second deposition layer 20: Silk printing layer

Claims

Claim 1 A method for manufacturing a decoration film using a pattern gradient method, comprising: a step of preparing a first anti-shatter film; a step of forming a first UV pattern layer on the back surface of the first anti-shatter film; a step of forming a first deposition layer on the first UV pattern layer; a step of forming a design printing layer on the first deposition layer using a DDP printing method; a step of etching an area in the first deposition layer where the design is not printed; and a step of forming an OCR layer that fills the step difference of the design printing layer by applying OCR resin to the etched surface; a step of preparing a second anti-shatter film; a step of forming a second UV pattern layer on the back surface of the second anti-shatter film; a step of forming a second deposition layer on the second UV pattern layer; and a step of forming a silk printing layer on the second deposition layer; a step of manufacturing a lower sheet; and a step of laminating the lower sheet to the bottom of the upper sheet. Claim 2 A method for manufacturing a decoration film using a pattern gradient method, wherein, in claim 1, the first anti-shatter film and the second anti-shatter film are films in which an optical OCA is laminated to an optical PET film. Claim 3 A method for manufacturing a decoration film using a pattern gradient method, wherein, in claim 1, the DDP (Digital Direct Printing) printing is performed using a transparent ink for DDP printing, and further a curing process is performed after printing. Claim 4 A method for manufacturing a decoration film using a pattern gradient method, wherein, in paragraph 3, the curing is performed by drying at a temperature of 80°C or higher for 30 minutes or more using a box oven. Claim 5 A method for manufacturing a decoration film using a pattern gradient method, wherein, in claim 1, the step of forming the OCR layer is characterized by performing curing after applying the OCR resin, wherein the curing is performed by both lamp curing and heat curing. Claim 6 A decoration film applying a pattern gradient method, characterized by having a structure in which an upper sheet is laminated to the lower part of the upper sheet, the upper sheet comprising: a first anti-shatter film; a first UV pattern layer formed on the back surface of the first anti-shatter film; a first deposition layer formed on the first UV pattern layer; a design printing layer formed on the first deposition layer using a DDP printing method; and an OCR layer formed on the design printing layer; and a lower sheet comprising: a second anti-shatter film; a second UV pattern layer formed on the back surface of the second anti-shatter film; a second deposition layer formed on the second UV pattern layer; and a silk printing layer formed on the second deposition layer.

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