Manufacturing method of EUV pellice using protective coating of graphene membrane
By coating graphene membranes with a protective film before attaching to EUV pellicle frames, the method addresses damage issues and enhances mechanical stability and transmittance, improving EUV pellicle manufacturing efficiency and performance.
Patent Information
- Authority / Receiving Office
- KR · KR
- Patent Type
- Patents
- Current Assignee / Owner
- CHARM GRAPHENE CO LTD
- Filing Date
- 2023-09-03
- Publication Date
- 2026-07-15
AI Technical Summary
Existing EUV pellicles made of conventional organic materials suffer from low transmittance and mechanical instability, and attaching graphene membranes to pellicle frames causes damage during the attachment process.
A method involving coating a graphene membrane with a protective film before attachment to a pellicle frame, including steps of transferring graphene to a thermal separation tape, stacking, attaching to a base film, coating with PMMA, and then attaching to the frame while removing the base film and protective film as needed.
Prevents damage to the graphene membrane during attachment and enhances the mechanical stability and transmittance of EUV pellicles, allowing for efficient manufacturing and improved performance.
Smart Images
Figure 112023097121997-PAT00001_ABST
Abstract
Description
Technology Field
[0001] The present invention relates to a method for manufacturing an EUV pellicle using a protective film coating of a graphene membrane, and more specifically, to a method for manufacturing an EUV pellicle using a protective film coating of a graphene membrane that can protect the graphene membrane when the graphene membrane is attached to a pellicle frame by coating a protective film on the surface of the graphene membrane. Background Technology
[0002] Generally, graphene is a material in which carbon atoms are interconnected in a hexagonal shape to form a honeycomb-shaped two-dimensional planar structure. It is characterized by being extremely thin, transparent, and possessing very high electrical conductivity. With a thickness of 0.3 nm, graphene offers high transparency and can transmit 100 times more current than copper and 100 times faster than silicon at room temperature. Furthermore, graphene has more than twice the thermal conductivity of diamond, which is known for having the highest thermal conductivity.
[0003] Graphene can be fabricated using Chemical Vapor Deposition (CVD), which mass-produces high-quality graphene by depositing process gas onto a catalytic metal foil supplied via a roll-to-roll method.
[0004] Graphene possesses mechanical strength more than 200 times greater than steel, yet it has excellent elasticity, maintaining its electrical conductivity even when stretched or folded. Due to these superior properties, it is a next-generation material applicable to flexible and transparent displays—which are gaining attention as future technologies—as well as wearable computers. Furthermore, there has recently been a growing number of attempts to utilize graphene’s excellent thermal and mechanical properties to develop high-sensitivity diaphragm devices using ultra-thin graphene membranes, and to use them as pellicles to protect photomasks used in semiconductor EUV lithographic apparatus. Photomasks have fine circuit patterns formed on them, and these patterns are formed onto silicon using lithographic equipment. However, if fine dust from atmospheric contamination adheres to the photomask, the dust particles are also formed on the silicon, leading to product defects. Attempts to use it as a membrane for a pellicle to prevent impurities from adhering to such photomasks are gradually increasing. A fine circuit pattern is formed on the photomask, and the circuit pattern of the photomask is formed on silicon through an exposure device. However, if fine dust adheres to the photomask due to atmospheric contamination, the shape of the fine dust is also formed on the silicon, leading to product defects.
[0005] In particular, extra ultraviolet (EUV) lithography equipment is equipment that forms a fine circuit pattern of several nanometers on a photomask and forms a circuit pattern on a silicon substrate by irradiating extreme ultraviolet light. By performing the lithography process with a light source having an extreme ultraviolet wavelength, it is possible to produce semiconductor circuit patterns more finely, reduce the number of process steps to increase productivity, and secure high-performance chips.
[0006] Accordingly, along with the development of extreme ultraviolet lithography equipment, competition to develop pellicles that protect photomasks and shield silicon substrates from atmospheric contamination to reduce defects is also intensifying.
[0007] A pellicle is a structure made of a thin film placed over a photomask. It protects the photomask by preventing foreign substances from adhering to it, and also prevents deformation of the circuit pattern caused by the projection of foreign substance images onto the silicon substrate by defocusing the images of the foreign substances. Conventional projection-type optical exposure equipment uses fixed pellicles that are replaced at appropriate times, thereby allowing the process to proceed efficiently by reducing costs associated with mask cleaning or replacement.
[0008] However, in the case of EUV lithography equipment, the short wavelength of extreme ultraviolet light causes most of the light to be absorbed by conventional organic material pellicles, leading to various problems with the application of existing pellicles.
[0009] Accordingly, certain prerequisites are required for pellicles used in EUV lithography equipment. The requirements for EUV pellicles include 1) high transmittance of over 90%, 2) mechanical stability, and 3) minimization of thermal deformation. Accordingly, EUV pellicles require a transmittance of over 90% and mechanical stability at a thickness of 60 nm or less. Polysilicon, CNT, graphene, and silicon carbide (SiC) are emerging as materials that satisfy these conditions, and the number of patent applications related to related technologies is also increasing.
[0010] In order to use graphene in a pellicle, a graphene membrane of a certain thickness must be formed by repeatedly stacking graphene deposited on a catalytic metal foil by chemical vapor deposition multiple times. In addition, a graphene membrane of a certain thickness must be attached to a pellicle frame.
[0011] In order to attach a graphene membrane to a pellicle frame, the graphene membrane must be immersed in an aqueous solution and attached to the frame in a free-standing manner, but there was a problem in that the graphene membrane was prone to damage during attachment to the frame. Prior art literature
[0012] Published Patent Application No. 10-2020-038832 (Published Apr. 14, 2020) Published Patent Application No. 10-2018-0072786 (Published June 29, 2018) Published Patent Application No. 10-2021-0119055 (Published Oct. 05, 2021) Registered Patent Application No. 10-2328694 (Registered Nov. 15, 2021) The problem to be solved
[0013] The present invention aims to provide a method for manufacturing an EUV pellicle using a protective coating on a graphene membrane that can protect the graphene membrane by coating the graphene membrane with a protective film before attaching the graphene membrane to the pellicle frame, in order to solve the above-mentioned problems. means of solving the problem
[0014] To achieve the above objective, the present invention comprises: (a) a step of attaching a catalyst metal film on which graphene is deposited to a thermal separation tape and removing the catalyst metal film by etching to transfer the graphene to the thermal separation tape; (b) a step of sequentially transferring and stacking the graphene to form a stacked graphene having graphene stacked on the thermal separation tape; (c) a step of attaching the thermal separation tape to a base film and thermally separating the thermal separation tape to transfer the stacked graphene to the base film; (d) a step of coating a protective film on the surface of the stacked graphene transferred to the base film; (e) a step of removing the base film coated with the protective film by etching to obtain a graphene membrane having a protective film formed thereon; and (f) a step of attaching the graphene membrane having a protective film formed thereon to a pellicle frame. and (g) a step of removing the protective film from the graphene membrane having the protective film formed on the pellicle frame; the present invention provides a method for manufacturing an EUV pellicle using a protective film coating of a graphene membrane, characterized by comprising: (g) a step of removing the protective film from the graphene membrane having the protective film formed on the pellicle frame.
[0015] The present invention is characterized in that the thickness of the stacked graphene is 1 nm to 100 nm.
[0016] In the present invention, the base film is characterized by being composed of Cu or Ni.
[0017] In the present invention, step (c) is characterized by comprising: (c-1) a step of attaching a thermal separation tape to a base film and thermally separating the thermal separation tape to transfer stacked graphene to the base film; and (c-2) a heat treatment step for removing residues of the thermal separation tape remaining on the stacked graphene transferred to the base film.
[0018] The present invention is further characterized by including (c-3) a graphene deposition step for depositing graphene to compensate for defects in stacked graphene.
[0019] In the present invention, the protective film is characterized by being formed by coating PMMA.
[0020] In the present invention, the protective film is characterized by being removed by etching or by evaporation. Effects of the invention
[0021] The present invention has the advantage of increasing manufacturing efficiency because, since the graphene membrane is coated with a protective film and attached to a pellicle frame, damage occurring during the attachment of the graphene membrane can be prevented.
[0022] In addition, the present invention has the advantage of being able to compensate for defects in graphene that occur during the stacking process.
[0023] In addition, the present invention has the advantage of easily controlling the thickness of the graphene membrane because a protective film is coated on the graphene membrane and can be attached to both sides of the pellicle frame. Brief explanation of the drawing
[0024] FIG. 1 is a flowchart of a method for manufacturing an EUV pellicle using a protective coating of a graphene membrane according to the present invention. FIG. 2 is a cross-sectional view of each process step of the method for manufacturing an EUV pellicle using a protective coating of a graphene membrane according to the present invention. FIG. 3 is a perspective view of a pellicle frame used in the present invention. FIG. 4 is a cross-sectional view of an embodiment of a pellicle frame used in the present invention. FIG. 5 is a cross-sectional view illustrating the process of attaching a graphene membrane to a pellicle frame according to the present invention. FIG. 6 is a cross-sectional view illustrating the steps of attaching a graphene membrane to a pellicle frame according to the present invention. FIG. 7 is a cross-sectional view illustrating the process of removing a protective film from a graphene membrane according to the present invention. FIG. 8 is a cross-sectional view of a pellicle manufactured by the method for manufacturing an EUV pellicle using a protective coating of a graphene membrane according to the present invention. Specific details for implementing the invention
[0025] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, this description is intended to be detailed enough for a person skilled in the art to easily practice the invention, and does not imply that the technical scope and concept of the present invention are limited thereby.
[0026] FIG. 1 is a flowchart according to the method for manufacturing an EUV pellicle using a protective coating of a graphene membrane according to the present invention. As illustrated in the drawing, a method for manufacturing an EUV pellicle comprises: (a) a step of attaching a catalyst metal film on which graphene is deposited to a thermal separation tape and removing the catalyst metal film by etching to transfer the graphene to the thermal separation tape (S1); (b) a step of sequentially transferring and stacking the graphene to form a stacked graphene having graphene stacked on the thermal separation tape (S2); (c) a step of attaching the thermal separation tape to a base film and thermally separating the thermal separation tape to transfer the stacked graphene to the base film (S3); (d) a step of coating a protective film on the surface of the stacked graphene transferred to the base film (S4); (e) a step of removing the base film coated with the protective film by etching to obtain a graphene membrane with a protective film formed thereon (S5); and (f) attaching the graphene membrane with a protective film formed thereon to a pellicle frame. The method comprises step (S6) and (g) step (S7) of removing the protective film from the graphene membrane having the protective film formed on the pellicle frame.
[0027] First, a catalyst metal film with graphene deposited thereon is attached to a thermal separation tape, and the catalyst metal film is removed by etching to transfer the graphene to the thermal separation tape (S1). First, a catalyst metal film with graphene deposited thereon is prepared. Referring to FIG. 2, the specific process is described as follows: first, a catalyst metal film (102) with graphene (101) deposited thereon is manufactured using a chemical vapor deposition method (CVD) as shown in FIG. 2(a), and a step of transferring the graphene (101) to a thermal separation tape (103) is performed as shown in FIG. 2(b). Graphene (101) is deposited on the catalyst metal film (102) through the chemical vapor deposition method, and the deposited graphene (101) is transferred to the thermal separation tape (103) through transfer. In order to transfer to a thermal separation tape (103), a catalyst metal film (102) on which graphene (101) is deposited is attached to the thermal separation tape (103). Next, the catalyst metal film (102) is immersed in an etching solution to remove it by etching. When removed by etching, graphene (101) is transferred to the thermal separation tape (103).
[0028] Next, step (S2) is performed to sequentially transfer and stack graphene to form stacked graphene on the thermal separation tape. A catalyst metal film (102) on which graphene (101) is deposited is attached to the thermal separation tape (103), and the catalyst metal film (102) is removed by etching. This process is repeated sequentially to stack graphene (101) on the thermal separation tape (103) to form stacked graphene (101') (Fig. 2(c)).
[0029] Next, a step (S3) is performed in which a thermal separation tape is attached to a base film and the thermal separation tape is thermally separated to transfer stacked graphene to the base film. A step is performed in which a thermal separation tape (103) is attached to a base film (102') and transferred, and the base film (102') may be the same film as the catalyst metal film (102) (Fig. 2(d)). Typically, the base film (102') is made of Cu or Ni. When a thermal separation tape (103) with stacked graphene (101') attached is attached to a base film (102') and passed through a thermal roller, the thermal separation tape (103) is separated from the stacked graphene (101'), and accordingly, the stacked graphene (101') is thermally transferred to the base film (102'). After being heat-transferred onto the base film (102'), organic material from the thermal separation tape (103) may remain on the surface of the stacked graphene (101'). To remove this, a heat treatment step may be further included. Specifically, it may consist of (c-1) a step (S31) of attaching the thermal separation tape to the base film and heat-separating the thermal separation tape to transfer the stacked graphene onto the base film, and (c-2) a heat treatment step (S32) to remove the residue of the thermal separation tape remaining on the stacked graphene transferred onto the base film. It may consist of a heat treatment step in which the thermal separation tape (103) is removed to transfer the stacked graphene (101') onto the base film (102'), and heat is applied to evaporate the organic residue of the thermal separation tape (103) remaining on the transferred stacked graphene (101'). Heat treatment is performed at a temperature of 300 to 400°C to burn and remove organic material remaining on the adhesive surface of the thermal separation tape. Additionally, if necessary, a graphene deposition step (S33) for depositing graphene to compensate for defects in (c-3) stacked graphene may be further included. If there are defects in the stacked graphene (101'), the graphene defects in the stacked graphene (101') can be reduced by depositing more graphene.Graphene deposition is typically performed in the deposition chamber of a graphene deposition apparatus into which a deposition gas (CH4, C2H6, H2, etc.) is introduced, and defects remaining in the stacked graphene (101') are removed through graphene deposition.
[0030] Next, a step (S4) is performed to coat a protective film on the surface of the stacked graphene transferred to the base film. A protective film is coated on the surface of the stacked graphene (101') transferred to the base film (102'). The reason for coating the protective film (120) is to prevent damage that may occur to the graphene membrane (110) when attached to the pellicle frame (10). The protective film (120) is formed by coating with a polymer. The protective film (120) is typically coated with PMMA (Polymethylmethacrylate), a type of polymer. PMMA is called acrylic and is a transparent, colorless, amorphous thermoplastic plastic that is hard and rigid but brittle and sensitive to notches. In addition to PMMA, PVA (Polyvinyl alcohol) or PC (Polycarbonate) films may be used, and other transparent films may also be utilized. Various methods can be used for coating the protective film (120). It can be formed as a film and directly attached, or coated onto the stacked graphene (101') through various coating methods. Coating methods include knife coating, roll coating, extrusion coating, dip coating, and spray coating. Knife coating is a method in which the coating material is applied by a knife or blade, and the thickness of the coating is controlled by the distance between the knife and the film. Roll coating involves two rolls arranged vertically This is a coating method that allows coating on one or both sides by changing the approach angle of the web. Extrusion coating is a method applied when using thermoplastic materials such as vinyl or polyethylene as the coating agent; it involves applying molten plastic to a film through an extrusion die under pressure. Immersion coating refers to a method where precise control of coating thickness is not required, or where a film with an irregular surface is coated by immersing it in a coating solution.Spray coating is a method in which the coating liquid is sprayed through a spray nozzle when the viscosity of the coating liquid is low, allowing the coating resin to be uniformly distributed even if the film surface is irregular or uneven. The protective film can be applied to a base film of a specific length using a roll-to-roll method.
[0031] Next, step (S5) is performed to obtain a graphene membrane with a protective film formed by removing the base film coated with a protective film by etching. The base film (102') coated with a protective film (120) is removed by etching, leaving only the protective film (120) and the graphene membrane (110). The method of removing the base film (102') by etching is formed by removing the base film (102') through a roll-to-roll method and leaving only the stacked graphene (101') coated with a protective film (120), or by cutting the base film (101') coated with a protective film (120) into a certain size according to the specifications of the pellicle frame (10) and then removing the base film (102') by etching to leave only the stacked graphene (101') coated with a protective film (120). Stacked graphene (101') that fits the specifications of the pellicle frame is defined as a graphene membrane (110). After the base film (102') is removed, a protective film-forming graphene membrane (100) to be attached to the pellicle frame (10) is obtained.
[0032] Next, the step (S6) of attaching the graphene membrane with the protective film formed thereon to the pellicle frame is performed. After the base film (102') is removed, the graphene membrane (110) with the protective film (120) formed thereon is attached to the pellicle frame (10). First, the pellicle frame (10) is examined. The pellicle frame (10) is illustrated in FIGS. 3 and FIGS. 4. As illustrated in the drawings, the pellicle frame (10) of the first embodiment is composed of a frame body (11) consisting of a flat front surface (111) and a rear surface (112), a through hole (13) formed in the center of the frame body (11), and an inclined surface (12) formed on the front surface (111) side of the frame body, surrounding the through hole (13). Referring to the drawing, the inclined surface section (12) is described as follows: the inclined surface section (12) is composed of an upper inclined surface section (121), a lower inclined surface section (122) formed at a certain length apart from the upper inclined surface section (121), and a side inclined surface section (123) formed by connecting both sides of the upper inclined surface section (121) and the lower inclined surface section (122). A through hole (13) is formed inside the end (124) of each inclined surface section. The reinforced graphene membrane (20) is typically attached to the rear side (112) of the frame body opposite the inclined surface section (12), but it can also be attached to the inclined surface section (12) on the front side. Additionally, if necessary, the graphene membrane (20) may be attached to both sides of the frame body (10). The pellicle frame (10) may be made of a material comprising any one of Zr, Mo, Nb, Si, Si3N4, SiC, boron carbide (B4C), Ru, Ti, Ba, ZrO2, Y2O3, SiO2 (quartz), AlN, BN, Si-SiC, or a mixture thereof.
[0033] FIG. 4(b) illustrates a pellicle frame (10') of a second embodiment. The pellicle frame (10') of the second embodiment is composed of a frame body (11) consisting of a flat front surface (111) and a rear surface (112), a front inclined surface portion (12a) formed on the front surface (111) of the frame body, a through hole (13) formed in the center of the front inclined surface portion (12a), and a rear inclined surface portion (12b) formed on the rear surface (112) of the frame body. The front inclined surface portion (12a) is composed of a front upper inclined surface portion (121a), a front lower inclined surface portion (122a) formed spaced apart from the front upper inclined surface portion (121a) by a certain length, and a front side inclined surface portion (123a) formed by connecting both sides of the front upper inclined surface portion (121a) and the front lower inclined surface portion (122a). Additionally, the rear inclined surface (12b) is composed of a rear upper inclined surface (121b), a rear lower inclined surface (122b) formed at a certain length apart from the rear upper inclined surface (121b), and a rear side inclined surface (123b) formed by connecting both sides of the rear upper inclined surface (121b) and the rear lower inclined surface (122b). The end (124) where the front inclined surface (12a) and the rear inclined surface (12b) meet forms the periphery of the through hole (13). The pellicle frame (10') may be made of a material including any one of Zr, Mo, Nb, Si, Si3N4, SiC, boron carbide (B4C), Ru, Ti, Ba, ZrO2, Y2O3, SiO2 (quartz), AlN, BN, Si-SiC, or a mixture thereof.
[0034] A protective film-forming graphene membrane (100) is attached to the pellicle frame (10). The attachment process is illustrated in FIG. 5. As shown in the drawing, first, an aqueous solution or an aqueous solution (31) into which a doping material has been introduced is prepared by introducing it into a water tank (30). Next, the pellicle frame (10) is vertically introduced into the aqueous solution (31), and the protective film-forming graphene membrane (100) is floated on the surface of the aqueous solution (31). Then, the protective film-forming graphene membrane (100) is attached to the top of the pellicle frame (10) while lifting the pellicle frame (10) vertically, and then attached to the pellicle frame (10) while slowly lifting it. Next, the pellicle frame (10) is lifted all the way up to completely attach the graphene membrane (100) to the pellicle frame (10). The pellicle frame can be attached to both the first embodiment (10) and the second embodiment (10'), and a protective film-forming graphene membrane (100) can be attached to one side or both sides of the frame. FIG. 6 is an enlarged view of the process of attaching the protective film-forming graphene membrane (100) to the pellicle frame (10, 10'). Since the protective film-forming graphene membrane (100) has a nano-scale thickness, it is attached to the pellicle frame (10, 10') by van der Waals forces acting on the surface of the membrane, and water droplets attached to the graphene membrane (100) flow downward due to the load. As they flow downward, the end (124) of the inclined surface is pointed, so droplets cannot form on the end (124), and accordingly, the aqueous solution does not remain on the inclined surface (121) but flows down and is removed. As the pellicle frame (10, 10') is lifted in the aqueous solution, the protective film protects the graphene membrane (110), thereby preventing potential damage caused by the surface tension of water that occurred when only the conventional graphene membrane was attached. Therefore, the protective film-forming graphene membrane (100) according to the present invention can protect the protective film-forming graphene membrane (100) from the surface tension of the aqueous solution by reinforcing the strength of the vulnerable edge portion.As moisture is removed, the protective film-forming graphene membrane (100) can be completely attached by van der Waals forces to the inclined surface (121) of the pellicle frame or to the back side without an inclined surface, and can also be attached to both sides. Therefore, adhesives are not required for attaching the membrane. As described above, the pellicle frame (10, 10') has an acute angle (θ) at the end (124) of the inclined surface so that water does not form on the end (124), thereby minimizing damage that may occur when attaching the protective film-forming graphene membrane (100) to the pellicle frame in an aqueous solution.
[0035] Next, a step (S7) is performed to remove the protective film from the graphene membrane with the protective film formed on the pellicle frame. Since the protective film (120) is made of a polymer material, high energy is emitted during EUV irradiation, so the protective film (120) must be removed. Accordingly, the protective film (120) is removed from the graphene membrane (110). FIG. 7 illustrates the step of removing the protective film (120). As shown in the drawing, first, a water tank (40) into which an etching solution (41) is introduced is prepared. Next, the protective film-forming graphene membrane (100) is introduced into the etching solution (41). The pellicle frame (10) is placed in the aqueous solution (41) for a certain period of time until the protective film (120) is removed. When the protective film (120) is completely removed and only the graphene membrane (110) remains, the pellicle frame (10) is lifted. In the case where PMMA is coated, acetone may be used as the etching solution. The PMMA is completely removed by acetone, and after the PMMA is removed, only the graphene membrane (110) remains. Additionally, although not shown in the drawing, since the surface is coated, the pellicle frame may be placed in a heat treatment device at 300 to 400°C to evaporate and remove the protective film. FIG. 8 is a drawing showing the state in which only the graphene membrane (110) remains on the pellicle frame (10). Also, in the case of the pellicle frame (10') of the second embodiment, the graphene membrane (110) may be attached to both sides.
[0036] Although the embodiments described above are exemplary, it is obvious to those skilled in the art that the present invention may be embodied in various other forms without departing from the spirit and scope thereof. Accordingly, the embodiments described above should be regarded as exemplary rather than restrictive, and all embodiments within the scope of the appended claims and their equivalents shall be deemed to be included within the scope of the present invention. Explanation of the symbols
[0037] 10: Pellicle frame 30 : Water tank 31 : Aqueous solution 40 : Water tank 41 : Etching solution 100: Protective layer forming graphene membrane 101 : Graphene 102 : Catalytic metal film 103 : Thermal separation tape 110 : Graphene membrane 120 : Shield
Claims
Claim 1 (a) a step of attaching a catalyst metal film with deposited graphene to a thermal separation tape and removing the catalyst metal film by etching to transfer the graphene to the thermal separation tape; (b) a step of sequentially transferring and stacking the graphene to form stacked graphene with graphene stacked on the thermal separation tape; (c) a step of attaching the thermal separation tape to a base film made of Cu or Ni and thermally separating the thermal separation tape to transfer the stacked graphene to the base film; (d) a step of coating a protective film with PMMA on the surface of the stacked graphene transferred to the base film; (e) a step of removing the base film coated with the protective film by etching to obtain a graphene membrane with a protective film formed thereon; (f) a step of attaching the graphene membrane with a protective film formed thereon to a pellicle frame; A method for manufacturing an EUV pellicle using a protective film coating on a graphene membrane, characterized by comprising: (g) a step of removing the protective film from the graphene membrane having the protective film formed on the pellicle frame. Claim 2 A method for manufacturing an EUV pellicle using a protective coating of a graphene membrane, characterized in that, in claim 1, the thickness of the stacked graphene is 1 nm to 100 nm. Claim 3 delete Claim 4 A method for manufacturing an EUV pellicle using a protective coating of a graphene membrane, wherein, in claim 1, step (c) comprises: (c-1) a step of attaching the thermal separation tape to a base film and thermally separating the thermal separation tape to transfer stacked graphene to the base film; and (c-2) a heat treatment step for removing residues of the thermal separation tape remaining on the stacked graphene transferred to the base film. Claim 5 A method for manufacturing an EUV pellicle using a protective coating of a graphene membrane, characterized in that, in claim 4, (c-3) a graphene deposition step of depositing graphene to compensate for defects in the stacked graphene. Claim 6 delete Claim 7 A method for manufacturing an EUV pellicle using a protective film coating of a graphene membrane according to claim 1, characterized in that the protective film is removed by etching or by evaporation.