Transfer unit and substrate treating apparatus including the same

Abstract

The present invention relates to a support having a drive unit disposed therein; a support rod coupled to the support and whose operation is controlled by the drive unit; a hand provided at the end of the support rod to support a substrate and having one or more adsorption pads having a predetermined distance from the supported substrate; a vacuum unit connected to the adsorption pad and disposed inside the support; and a cable chain disposed inside the support that guides the movement of a vacuum line of the vacuum unit, wherein the cable chain is provided on the upper part of the drive unit.

Description

Technology Field

[0001] The present invention relates to a conveying unit for conveying a substrate and a substrate processing device including the same. Background Technology

[0002] To manufacture semiconductor devices, desired patterns are formed on a substrate through various processes such as photolithography, etching, ashing, ion implantation, and thin film deposition. These processes involve multiple processing steps, each of which is performed on a different processing unit.

[0003] Therefore, to perform different types of processes, substrates must be transported to different devices, and this substrate transport is carried out by a transport robot. Process devices are highly diverse and are arranged to surround the transport robot. Accordingly, the transport robot can transport substrates to each device. Generally, the transport robot is provided with multiple hands to support the substrates and can transport multiple substrates.

[0004] FIG. 1 is a drawing showing a general conveyor robot, and FIG. 2 is a cross-sectional view schematically illustrating a cross-section of a support body of FIG. 1. Referring to FIG. 1, the conveyor robot (1) includes a hand (2) that supports a substrate, a support rod (3) that supports the hand (2), and a support body (4) on which the support rod (3) is installed. The hand (2) may be provided in multiple numbers, and the conveyor robot (1) of FIG. 1 includes a first hand (2a) and a second hand (2b). The support rod (3) includes a first support rod (3a) that is coupled to the first hand (2a) and a second support rod (3b) that is coupled to the second hand (2b).

[0005] Referring to FIG. 2, inside the support body (4) there is a drive unit (5) for driving the hand (2), a suction line (not shown) for providing vacuum pressure to each hand (2), a pump (not shown) installed on the suction line to generate vacuum pressure in the suction line, and a cable chain (6) for supporting the suction line.

[0006] Each of the two hands (2a, 2b) is connected to a separate drive unit (5) and driven independently. The first hand (2a) is driven by receiving driving force from the first drive unit (5a), and the second hand (2b) is driven by receiving driving force from the second drive unit (5b). When the hand (2) is driven by the drive unit (5), the suction line connected to the hand (2) also moves together, and a cable chain (6) guides the suction line to prevent twisting of the suction line. The cable chain (6) includes a first cable chain (6a) that guides the suction line connected to the first hand (2a) and a second cable chain (6b) that guides the suction line connected to the second hand (2b).

[0007] In the conveyor robot (1) of FIG. 2, the first cable chain (6a) is located at the upper part of the drive unit (5), and the second cable chain (6b) is located at the lower part of the drive unit (5). In this case, the height of the support body (4) in the vertical direction is increased, which limits the range of motion of the hand (2) in the vertical direction.

[0008] In addition, there is a problem that the suction line is frequently damaged due to interference between the suction line and the drive unit (5) depending on the operation of each hand (2), and maintenance is difficult because both the upper and lower plates of the support (4) must be opened to replace and / or repair the damaged suction line. The problem to be solved

[0009] One objective of the present invention is to provide a substrate processing device capable of improving substrate processing efficiency.

[0010] In addition, the present invention has one objective of providing a conveying unit capable of maximizing the range of motion of a hand in the vertical direction and a substrate processing device including the same.

[0011] In addition, the present invention has one objective of providing a return unit capable of minimizing twisting and breakage of the suction line connected to the hand, and a substrate processing device including the same.

[0012] In addition, the present invention has one objective of providing a return unit capable of increasing maintenance efficiency when repairing and / or replacing various parts located inside a support, and a substrate processing device including the same.

[0013] The objectives of the present invention are not limited thereto, and other unmentioned objectives will be clearly understood by those skilled in the art from the description below. means of solving the problem

[0014] The present invention provides a unit for transporting a substrate.

[0015] A return unit comprises: a support body in which a driving unit is disposed inside; a support rod coupled to the support body and whose operation is controlled by the driving unit; a hand provided at the end of the support rod to support a substrate and having one or more suction pads having a predetermined distance from the supported substrate; a vacuum unit connected to the suction pads and disposed inside the support body; and a cable chain disposed inside the support body that guides the movement of the vacuum line of the vacuum unit, wherein the cable chain is provided on the upper part of the driving unit.

[0016] The above hand includes a plurality of individually driven hands, the vacuum unit includes a plurality of vacuum lines connected to each of the plurality of hands to provide vacuum pressure to each hand, the cable chain includes a plurality of cable chains that guide the movement of each of the plurality of vacuum lines, and the plurality of cable chains may be arranged side by side on the upper part of the drive unit.

[0017] The above plurality of cable chains can be provided at the same height in the vertical direction from the bottom plate of the support.

[0018] The above driving unit includes a plurality of driving units for driving force to each of the plurality of hands, and the plurality of driving units are arranged to overlap in a first direction which is the longitudinal direction of the support body, and the plurality of cable chains can be arranged to overlap in a second direction perpendicular to the first direction at the top of the plurality of driving units.

[0019] The above plurality of cable chains may not be provided at the lower part of the drive unit.

[0020] The present invention provides a device for processing a substrate.

[0021] A substrate processing device comprises a first unit and a second unit; and a conveying unit for conveying a substrate between the first unit and the second unit, wherein the conveying unit comprises: a support body in which a driving unit is disposed inside; a support rod coupled to the support body and whose operation is controlled by the driving unit; a hand provided at the end of the support rod to support a substrate and provided with one or more adsorption pads having a predetermined distance from the supported substrate; a vacuum unit connected to the adsorption pad and disposed inside the support body; and a cable chain disposed inside the support body that guides the movement of the vacuum line of the vacuum unit, wherein the cable chain may be provided on the upper part of the driving unit.

[0022] The above hand includes a plurality of individually driven hands, the vacuum unit includes a plurality of vacuum lines connected to each of the plurality of hands to provide vacuum pressure to each hand, the cable chain includes a plurality of cable chains that guide the movement of each of the plurality of vacuum lines, and the plurality of cable chains may be arranged side by side on the upper part of the drive unit.

[0023] The above plurality of cable chains can be provided at the same height in the vertical direction from the bottom plate of the support.

[0024] The above driving unit includes a plurality of driving units for driving force to each of the plurality of hands, and the plurality of driving units are arranged to overlap in a first direction which is the longitudinal direction of the support body, and the plurality of cable chains can be arranged to overlap in a second direction perpendicular to the first direction at the top of the plurality of driving units.

[0025] The above plurality of cable chains may not be provided at the lower part of the drive unit. Effects of the invention

[0026] According to the present invention, a substrate processing device capable of improving substrate processing efficiency can be provided.

[0027] In addition, according to the present invention, the range of motion of the hand in the up and down direction can be maximized.

[0028] In addition, according to the present invention, twisting and breakage of the suction line connected to the hand can be minimized.

[0029] In addition, according to the present invention, maintenance efficiency can be increased when repairing and / or replacing various parts located inside the support.

[0030] The effects of the present invention are not limited to the effects described above, and unmentioned effects will be clearly understood by those skilled in the art from this specification and the attached drawings. Brief explanation of the drawing

[0031] Figure 1 is a schematic diagram showing a typical conveyor robot. FIG. 2 is a cross-sectional view schematically illustrating the cross-section of the support of FIG. 1. FIG. 3 is a perspective view schematically showing a substrate processing apparatus according to an embodiment of the present invention. FIG. 4 is a cross-sectional view of a substrate processing device showing the coating block or development block of FIG. 3. Figure 5 is a plan view of the substrate processing apparatus of Figure 3. Figure 6 is a perspective view showing the return robot of Figure 4. Figure 7 is a simplified cross-sectional view illustrating the internal cross-section of the support of Figure 6. Figure 8 is a plan view schematically showing an example of the heat treatment chamber of Figure 5. Fig. 9 is a front view of the heat treatment chamber of Fig. 8. Figure 10 is a schematic diagram showing an example of the liquid treatment chamber of Figure 5. Specific details for implementing the invention

[0032] Embodiments of the present invention are described below with reference to the attached drawings so that those skilled in the art can easily implement them. However, the present invention may be embodied in various different forms and is not limited to the embodiments described herein. Furthermore, in describing preferred embodiments of the present invention in detail, specific descriptions of related known functions or configurations are omitted if it is determined that such detailed descriptions would unnecessarily obscure the essence of the present invention. Additionally, the same reference numerals are used throughout the drawings for parts having similar functions and operations.

[0033] The term 'comprising' a component means that, unless specifically stated otherwise, it does not exclude other components but rather allows for the inclusion of additional components. Specifically, terms such as "comprising" or "having" are intended to indicate the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0034] Singular expressions include plural expressions unless the context clearly indicates otherwise. Additionally, the shapes and sizes of elements in drawings may be exaggerated for clearer explanation.

[0035] The term "and / or" includes any one of the listed items and all combinations of one or more thereof. Additionally, in this specification, the meaning of "connected" refers not only to cases where Member A and Member B are directly connected, but also to cases where Member A and Member B are indirectly connected by Member C being interposed between Member A and Member B.

[0036] Embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be interpreted as being limited to the embodiments below. These embodiments are provided to more fully explain the present invention to those with average knowledge in the art. Accordingly, the shapes of the elements in the drawings have been exaggerated to emphasize clearer explanations.

[0037] A controller (not shown) can control the overall operation of the substrate processing device. The controller (not shown) may include a CPU (Central Processing Unit), ROM (Read Only Memory), and RAM (Random Access Memory). The CPU executes desired processes, such as liquid processing and drying processing described later, according to various recipes stored in their memory areas. The recipes contain control information for the device regarding process conditions, such as process time, process pressure, process temperature, and various gas flow rates. Meanwhile, these programs or recipes representing processing conditions may be stored on a hard disk or semiconductor memory. Additionally, the recipes may be stored on a portable computer-readable storage medium, such as a CD-ROM or DVD, and set at a predetermined location in the storage area.

[0038] The device of the present embodiment can be used to perform a photolithography process on a circular substrate. In particular, the device of the present embodiment can be connected to an exposure device to perform coating and developing processes on a substrate. However, the technical concept of the present invention is not limited thereto and can be used in various types of processes that supply a processing solution to a substrate while rotating the substrate. Below, the case where a wafer is used as the substrate is described as an example.

[0040] Hereinafter, embodiments of the present invention will be described with reference to FIGS. 3 to 10.

[0041] FIG. 3 is a perspective view schematically showing a substrate processing apparatus according to an embodiment of the present invention, FIG. 4 is a cross-sectional view of the substrate processing apparatus showing the coating block or developing block of FIG. 3, and FIG. 5 is a plan view of the substrate processing apparatus of FIG. 3.

[0042] Referring to FIGS. 3 to 5, the substrate processing device (100) includes an index module (20), a treating module (30), and an interface module (40). According to one embodiment, the index module (20), the treating module (30), and the interface module (40) are arranged sequentially in a line. Hereinafter, the direction in which the index module (20), the treating module (30), and the interface module (40) are arranged is referred to as the first direction (12), the direction perpendicular to the first direction (12) when viewed from above is referred to as the second direction (14), and the direction perpendicular to both the first direction (12) and the second direction (14) is referred to as the third direction (16).

[0043] The index module (20) returns the substrate (W) from the container (10) containing the substrate (W) to the processing module (30) and stores the processed substrate (W) back into the container (10). The longitudinal direction of the index module (20) is provided as a second direction (14). The index module (20) has a load port (22) and an index frame (24). The load port (22) is located on the opposite side of the processing module (30) relative to the index frame (24). The container (10) containing the substrates (W) is placed in the load port (22). Multiple load ports (22) may be provided, and multiple load ports (22) may be arranged along the second direction (14).

[0044] As the container (10), a sealed container (10), such as a Front Open Unified Pod (FOUP), may be used. The container (10) may be placed at the load port (22) by a transport means (not shown), such as an overhead transfer, an overhead conveyor, or an automatic guided vehicle, or by a worker.

[0045] An index robot (2200) is provided inside the index frame (24). A guide rail (2300) is provided within the index frame (24) with a longitudinal direction in the second direction (14), and the index robot (2200) can be provided to be movable on the guide rail (2300). The index robot (2200) includes a hand (2220) on which a substrate (W) is placed, and the hand (2220) can be provided to move forward and backward, rotate about the third direction (16) as an axis, and move along the third direction (16).

[0046] The processing module (30) performs a coating process and a developing process on the substrate (W). The processing module (30) has a coating block (30a) and a developing block (30b). The coating block (30a) performs a coating process on the substrate (W), and the developing block (30b) performs a developing process on the substrate (W). Multiple coating blocks (30a) are provided, and they are provided to be stacked on top of each other. Multiple developing blocks (30b) are provided, and the developing blocks (30b) are provided to be stacked on top of each other. According to the embodiment of FIG. 3, two coating blocks (30a) are provided, and two developing blocks (30b) are provided. The coating blocks (30a) may be placed below the developing blocks (30b). According to one example, the two coating blocks (30a) may perform the same process and may be provided with the same structure. Additionally, the two phenomenon blocks (30b) perform the same process and can be provided with the same structure.

[0047] The coating block (30a) has a heat treatment chamber (3200), a return chamber (3400), a liquid treatment chamber (3600), and a buffer chamber (3800). The heat treatment chamber (3200) performs a heat treatment process on the substrate (W). The heat treatment process may include a cooling process and a heating process. The liquid treatment chamber (3600) supplies liquid onto the substrate (W) to form a liquid film. The liquid film may be a photoresist film or an anti-reflective film. The return chamber (3400) returns the substrate (W) between the heat treatment chamber (3200) and the liquid treatment chamber (3600) within the coating block (30a).

[0048] The return chamber (3400) is provided with its longitudinal direction parallel to the first direction (12). The return chamber (3400) is provided with a return unit. The return unit includes a return robot (3422) and a return rail (3300). The return robot (3422) returns a substrate between the heat treatment chamber (3200), the liquid treatment chamber (3600), and the buffer chamber (3800).

[0050] FIG. 6 is a perspective view showing the conveyor robot of FIG. 4, and FIG. 7 is a simplified cross-sectional view showing the internal cross-section of the support of FIG. 6.

[0051] The return robot (3422) includes a hand (3420), a support rod (3423), a support body (1000), a guide rail (1100), a rotation axis (not shown), and a base (not shown).

[0052] The hand (3420) supports the substrate (W). The hand (3420) is provided to enable horizontal linear movement including forward and backward movement, rotational movement rotated about the third direction (16) as an axis, and vertical movement toward the third direction. The hand (3420) directly supports the substrate (W). The hand (3420) is provided in multiple numbers and is positioned to be stacked on top of each other. In the embodiment of FIG. 6, two hands (3420) are shown stacked on top of each other, with the second hand (3420b) stacked below the first hand (3420a). However, this is not limited thereto, and the number of hands (3420) may increase or decrease depending on the process efficiency of the substrate processing system.

[0053] The hands (3420) are positioned on the upper part of the support body (1000). For example, the hands (3420) may be provided as a first hand (3420a) positioned on the upper part and a second hand (3420b) positioned on the lower part. The first hand (3420a) and the second hand (3420b) have the same shape. However, the first hand (3420a) and the second hand (3420b) may perform different functions. For example, the first hand (3420a) may be used to take out a substrate (W) from a chamber or a unit processing a substrate (W), and the second hand (3420b) may be used to bring a substrate (W) into a chamber or a unit processing a substrate (W).

[0054] The hand (3420) has a support (3421b) and a support projection (3421a). The support (3421b) is provided to have an annular ring shape with a portion of the circumference bent. The support (3421b) has a diameter larger than that of the substrate (W), and the hand (3420) supports the substrate (W) so that the support (3421b) surrounds the substrate (W). The support projection (3421a) extends inward from the support (3421b). The support projection (3421a) is provided in multiple numbers and is spaced apart along the circumferential direction of the support (3421b). The support projection (3421a) functions as a seating surface on which the substrate (W) is placed. The support projection (3421a) is provided in four numbers and supports the sides of the substrate (W). A suction pad (not shown) is provided on the support projection (3421a). Vacuum pressure is applied to the suction pad, and the substrate (W) is adsorbed to the suction pad by the vacuum pressure and supported on the transport robot (3422).

[0055] The support rod (3423) connects the support member (3421b) and the guide rail (1100). The support rod (3423) can move in a straight line in the forward and backward directions by the guide rail (1100). The support rod (3423) has a first support rod (3423a) that supports the first hand (3420a) and a second support rod (3423b) that supports the second hand (3420b). As a result, the hand (3420) is stably supported during the operation of the hand (3420), thereby minimizing shaking of the hand (3420). The guide rail (1100) guides the direction in which the support rod (3423) moves. For example, the support rods (3423) can move in a horizontal straight direction.

[0056] Support rods (3423) installed on guide rails (1100) can move in a first direction along the length direction of each guide rail (1100). Guide rails (1000) are installed on one side and the other side of a support body (1000), respectively. Here, the one side and the other side may be opposite sides. When viewed from the side, the guide rails (1100) may be positioned to overlap each other. A first support rod (3423a) is provided on the guide rail (1100) installed on one side of the support body (1000), and a second support rod (3423b) is provided on the guide rail (1100) installed on the other side of the support body (1000).

[0057] The support body (1000) is supported and rotated by a rotation axis (not shown). The rotation axis is installed on a base (not shown) and is provided to be rotatable about a central axis on the base. By rotating the rotation axis, the support body (1000) and the hand (3420) can be rotated together. The base is provided to be able to move up and down. By moving the base up and down, the rotation axis and the hand (3420) can be moved up and down together. Additionally, the base can be moved along the conveyor rail (3300) from a position adjacent to the front buffer (3802) to a position adjacent to the rear buffer (3804). The conveyor rail (3300) is provided to have a longitudinal direction facing the first direction. The base installed on the conveyor rail (3300) can be moved in the first direction by a driving member (not shown).

[0058] Referring to FIG. 7, components capable of driving a hand (3420) and a support rod (3423) are located inside the support body (1000). For example, a vacuum line (not shown) connected to the hand (3420) and a vacuum pump (not shown) installed on the vacuum line are arranged inside the support body (1000). When the vacuum pump operates, suction force is provided to the suction pad provided to the hand (3420), and a substrate (W) provided on the upper part of the suction pad is suctioned and supported by a transport robot (3422). The vacuum line includes a first vacuum line (not shown) connected to the first hand (3420a) and a second vacuum line (not shown) connected to the second head (3420b). The first vacuum line moves together as the first hand (3420a) moves horizontally along the guide rail (1100). Likewise, the second vacuum line moves together as the second hand (3420b) moves horizontally along the guide rail (1100).

[0059] Additionally, a drive unit (1200) is disposed inside the support body (1000) to provide driving force to a hand (3420) and a support rod (3423) coupled to the hand (3420). The drive unit (1200) may include a motor. The drive unit (1200) includes a first drive unit (1220) that provides driving force to a first hand (3420a) and a first support rod (3423a), and a second drive unit (1240) that provides driving force to a second hand (3420b) and a second support rod (3423b). The first drive unit (1220) and the second drive unit (1240) may be arranged to overlap in a first direction, which is the extension direction of the guide rail (1100).

[0060] Additionally, inside the support body (1000), a first vacuum line connected to the first hand (3420a) and moving together as the first hand (3420a) is driven, and a second vacuum line connected to the second hand (3420b) and moving together as the second hand (3420b) is driven are located.

[0061] Additionally, a cable chain (1300) that guides the movement of a vacuum line is located inside the support body (1000). The cable chain (1300) includes a first cable chain (1320) that guides the movement of a first vacuum line and a second cable chain (1340) that guides the movement of a second vacuum line. Referring to FIG. 7, both the first cable chain (1320) and the second cable chain (1340) are located on the upper part of the drive unit (1200). Additionally, the first cable chain (1320) and the second cable chain (1340) may be arranged side by side on the upper part of the drive unit (1200). The first cable chain (1320) and the second cable chain (1340) may be arranged to overlap in a horizontal direction on the upper part of the drive unit (1200). The first cable chain (1320) and the second cable chain (1340) can be positioned at the same height in the vertical direction from the bottom plate of the support (1000). This allows the vertical height of the support (1000) to be minimized, thereby maximizing the range of motion for the lifting and lowering movement of the hand (3420) supported on the support (1000) in the third direction. Additionally, if the vacuum line is damaged and requires replacement or repair, maintenance work can be easily performed, thereby maximizing the efficiency of post-maintenance.

[0063] A plurality of heat treatment chambers (3202) are provided. The heat treatment chambers (3202) are arranged in a row along the first direction (12). The heat treatment chambers (3202) are located on one side of the return chamber (3400).

[0064] FIG. 8 is a plan view schematically showing an example of the heat treatment chamber of FIG. 5, and FIG. 9 is a front view of the heat treatment chamber of FIG. 8.

[0065] Referring to FIGS. 8 and 9, the heat treatment chamber (3202) has a housing (3210), a cooling unit (3220), a heating unit (3230), and a return plate (3240).

[0066] The housing (3210) is generally provided in the shape of a rectangular prism. An inlet (not shown) through which a substrate (W) enters and exits is formed in the side wall of the housing (3210). The inlet may be kept open. Optionally, a door (not shown) may be provided to open and close the inlet. A cooling unit (3220), a heating unit (3230), and a return plate (3240) are provided within the housing (3210). The cooling unit (3220) and the heating unit (3230) are provided side by side along a second direction (14). In one example, the cooling unit (3220) may be located closer to the return chamber (3400) than the heating unit (3230).

[0067] The cooling unit (3220) has a cooling plate (3222). The cooling plate (3222) may have a generally circular shape when viewed from above. A cooling member (3224) is provided on the cooling plate (3222). In one example, the cooling member (3224) is formed inside the cooling plate (3222) and may be provided as a channel through which a cooling fluid flows.

[0068] The heating unit (3230) has a heating plate (3232), a cover (3234), and a heater (3233). The heating plate (3232) has a generally circular shape when viewed from above. The heating plate (3232) has a larger diameter than the substrate (W). A heater (3233) is installed on the heating plate (3232). The heater (3233) may be provided as a heating resistor to which current is applied. The heating plate (3232) is provided with lift pins (3238) that can be driven up and down along a third direction (16). The lift pins (3238) receive the substrate (W) from a conveying means outside the heating unit (3230) and place it on the heating plate (3232), or lift the substrate (W) from the heating plate (3232) and transfer it to a conveying means outside the heating unit (3230). According to one example, three lift pins (3238) may be provided. The cover (3234) has a space with an open bottom inside. The cover (3234) is positioned on top of the heating plate (3232) and is moved up and down by an actuator (3236). When the cover (3234) comes into contact with the heating plate (3232), the space enclosed by the cover (3234) and the heating plate (3232) is provided as a heating space for heating the substrate (W).

[0069] The return plate (3240) is generally provided in a disc shape and has a diameter corresponding to the substrate (W). A notch (3244) is formed at the edge of the return plate (3240). The notch (3244) may have a shape corresponding to the support projection (3421b) formed on the hand (3420) of the return robot (3422) described above. Additionally, the notch (3244) is provided in a number corresponding to the support projection (3421b) formed on the hand (3420) and is formed at a position corresponding to the support projection (3421b). When the upper and lower positions of the hand (3420) and the return plate (3240) are changed while the hand (3420) and the return plate (3240) are aligned in the upper and lower directions, the return of the substrate (W) between the hand (3420) and the return plate (3240) is achieved. The return plate (3240) is mounted on a guide rail (3249) and can be moved between a first area (3212) and a second area (3214) along the guide rail (3249) by a driver (3246). The return plate (3240) is provided with a plurality of slit-shaped guide grooves (3242). The guide grooves (3242) extend from the end of the return plate (3240) to the interior of the return plate (3240). The guide grooves (3242) are provided along the second direction (14) in their length direction, and the guide grooves (3242) are spaced apart from each other along the first direction (12). The guide groove (3242) prevents the return plate (3240) and the lift pin (1340) from interfering with each other when the substrate (W) is transferred between the return plate (3240) and the heating unit (3230).

[0070] Heating of the substrate (W) is performed while the substrate (W) is placed directly on the support plate (1320), and cooling of the substrate (W) is performed while the return plate (3240) on which the substrate (W) is placed is in contact with the cooling plate (3222). To ensure good heat transfer between the cooling plate (3222) and the substrate (W), the return plate (3240) is provided with a material having a high heat transfer rate. In one example, the return plate (3240) may be provided with a metal material.

[0071] A heating unit (3230) provided in some of the heat treatment chambers (3200) can improve the adhesion rate of the photoresist to the substrate (W) by supplying gas during heating of the substrate (W). According to one example, the gas may be hexamethyldisilane gas.

[0073] A plurality of liquid treatment chambers (3600) are provided. Some of the liquid treatment chambers (3600) may be provided to be stacked on top of each other. The liquid treatment chambers (3600) are positioned on one side of the return chamber (3402). The liquid treatment chambers (3600) are arranged side by side along the first direction (12). Some of the liquid treatment chambers (3600) are provided in a location adjacent to the index module (20). Hereinafter, these liquid treatment chambers are referred to as front liquid treatment chambers (3602). Other of the liquid treatment chambers (3600) are provided in a location adjacent to the interface module (40). Hereinafter, these liquid treatment chambers are referred to as rear heat treating chambers (3604).

[0074] The first liquid treatment chamber (3602) applies a first liquid onto the substrate (W), and the second liquid treatment chamber (3604) applies a second liquid onto the substrate (W). The first liquid and the second liquid may be of different types of liquids. According to one embodiment, the first liquid is an anti-reflection film, and the second liquid is a photoresist. The photoresist may be applied to the substrate (W) on which the anti-reflection film is applied. Optionally, the first liquid may be a photoresist and the second liquid may be an anti-reflection film. In this case, the anti-reflection film may be applied to the substrate (W) on which the photoresist is applied. Optionally, the first liquid and the second liquid may be of the same type of liquid, and both may be photoresists.

[0075] Figure 10 is a schematic diagram showing an example of the liquid treatment chamber of Figure 5.

[0076] Referring to FIG. 10, the liquid processing chamber (3600) has a housing (3610), a cup (3620), a substrate support unit (3640), and a liquid supply unit (1000). The housing (3610) is provided in the shape of a generally rectangular prism. An inlet (not shown) through which a substrate (W) enters and exits is formed in the side wall of the housing (3610). The inlet may be opened and closed by a door (not shown). The cup (3620), the support unit (3640), and the liquid supply unit (1000) are provided within the housing (3610). A fan filter unit (3670) that forms a downward airflow within the housing (3260) may be provided on the upper wall of the housing (3610). The cup (3620) has a processing space with an open top. The substrate support unit (3640) is placed within the processing space and supports the substrate (W). A substrate support unit (3640) is provided to allow the substrate (W) to rotate during liquid processing. A liquid supply unit (1000) supplies liquid to the substrate (W) supported by the substrate support unit (3640).

[0077] The nozzle (1100) supplies a liquid onto the substrate at a process position facing the substrate supported by the substrate support unit. For example, the liquid may be a photosensitive liquid such as photoresist. The process position may be a position where the nozzle (1100) can discharge the photosensitive liquid to the center of the substrate.

[0079] Referring again to FIGS. 4 and 5, a plurality of buffer chambers (3800) are provided. Some of the buffer chambers (3800) are positioned between the index module (20) and the return chamber (3400). Hereinafter, these buffer chambers are referred to as front buffers (3802). A plurality of front buffers (3802) are provided and positioned to be stacked on top of each other along the vertical direction. Another portion of the buffer chambers (3802, 3804) is positioned between the return chamber (3400) and the interface module (40). Hereinafter, these buffer chambers are referred to as rear buffers (3804). A plurality of rear buffers (3804) are provided and positioned to be stacked on top of each other along the vertical direction. Each of the front buffers (3802) and the rear buffers (3804) temporarily stores a plurality of substrates (W). The substrate (W) stored in the front buffer (3802) is brought in or taken out by the index robot (2200) and the return robot (3422). The substrate (W) stored in the rear buffer (3804) is brought in or taken out by the return robot (3422) and the first robot (4602).

[0080] The developing block (30b) has a heat treatment chamber (3200), a return chamber (3400), and a liquid treatment chamber (3600). Since the heat treatment chamber (3200) and the return chamber (3400) of the developing block (30b) are provided with a structure and arrangement generally similar to the heat treatment chamber (3200) and the return chamber (3400) of the coating block (30a), a description thereof is omitted.

[0081] In the development block (30b), the liquid treatment chambers (3600) are all provided as development chambers (3600) that supply the same developer solution to develop the substrate.

[0082] The interface module (40) connects the processing module (30) to an external exposure device (50). The interface module (40) has an interface frame (4100), an additional process chamber (4200), an interface buffer (4400), and a return member (4600).

[0083] A fan filter unit that forms a downward airflow inside may be provided at the top of the interface frame (4100). An additional process chamber (4200), an interface buffer (4400), and a return member (4600) are disposed inside the interface frame (4100). The additional process chamber (4200) can perform a predetermined additional process before the substrate (W) that has completed the process in the coating block (30a) is brought into the exposure device (50). Optionally, the additional process chamber (4200) can perform a predetermined additional process before the substrate (W) that has completed the process in the exposure device (50) is brought into the development block (30b). According to one example, the additional process may be an edge exposure process for exposing the edge region of the substrate (W), an upper surface cleaning process for cleaning the upper surface of the substrate (W), or a lower surface cleaning process for cleaning the lower surface of the substrate (W). Multiple additional process chambers (4200) may be provided, and they may be provided to be stacked on top of each other. All additional process chambers (4200) may be provided to perform the same process. Optionally, some of the additional process chambers (4200) may be provided to perform different processes.

[0084] The interface buffer (4400) provides a space where a substrate (W) temporarily stays during transport between the coating block (30a), the additional process chamber (4200), the exposure device (50), and the development block (30b). Multiple interface buffers (4400) are provided, and multiple interface buffers (4400) can be provided stacked on top of each other.

[0085] According to one example, an additional process chamber (4200) may be placed on one side along the longitudinal extension of the return chamber (3400), and an interface buffer (4400) may be placed on the other side.

[0086] The conveying member (4600) conveys a substrate (W) between the coating block (30a), the additional process chamber (4200), the exposure device (50), and the developing block (30b). The conveying member (4600) may be provided with one or more robots. According to one example, the conveying member (4600) has a first robot (4602) and a second robot (4606). The first robot (4602) may be provided to convey the substrate (W) between the coating block (30a), the additional process chamber (4200), and the interface buffer (4400), the interface robot (4606) may be provided to convey the substrate (W) between the interface buffer (4400) and the exposure device (50), and the second robot (4604) may be provided to convey the substrate (W) between the interface buffer (4400) and the developing block (30b).

[0087] The first robot (4602) and the second robot (4606) each include a hand on which a substrate (W) is placed, and the hand may be provided to move forward and backward, rotate about an axis parallel to the third direction (16), and move along the third direction (16).

[0088] The hands of the index robot (2200), the first robot (4602), and the second robot (4606) may all be provided with the same shape as the hand (3420) of the transfer robot (3422). Optionally, the hand of the robot that directly transfers the substrate (W) to the transfer plate (3240) of the heat treatment chamber may be provided with the same shape as the hand (3420) of the transfer robot (3422), and the hands of the remaining robots may be provided with a different shape.

[0089] According to one embodiment, the index robot (2200) is provided to directly exchange a substrate (W) with a heating unit (3230) of a shear heat treatment chamber (3200) provided in a coating block (30a).

[0090] Additionally, the transfer robot (3422) provided in the coating block (30a) and the developing block (30b) may be provided to directly transfer the substrate (W) to the transfer plate (3240) located in the heat treatment chamber (3200).

[0092] The processing block of the substrate processing device (100) described above is explained as performing a coating process and a developing process. However, unlike this, the substrate processing device (100) may be equipped with only an index module (20) and a processing block (37) without an interface module. In this case, the processing block (37) performs only a coating process, and the film applied on the substrate (W) may be a spin-on hard mask film (SOH).

[0094] The above detailed description is illustrative of the present invention. Furthermore, the foregoing describes preferred embodiments of the present invention, and the present invention may be used in various other combinations, modifications, and environments. That is, modifications or alterations are possible within the scope of the concept of the invention disclosed herein, the scope equivalent to the disclosed content, and / or the scope of the art or knowledge. The described embodiments describe the best state for implementing the technical concept of the present invention, and various modifications required for specific fields of application and uses of the present invention are possible. Accordingly, the above detailed description of the invention is not intended to limit the present invention to the disclosed embodiments. Additionally, the appended claims should be interpreted as including other embodiments. Explanation of the symbols

[0095] 1000: Support 1100: Guide rail 1200: Drive unit 1220: First drive unit 1240: 2nd drive unit 1300: Cable chain 1320: 1st cable chain 1340: 2nd cable chain 3420: Hand 3420a: First hand 3420b: Second hand 3423: Support rod 3423a: 1st support rod 3423b: 2nd support rod

Claims

Claim 1 A unit for conveying a substrate comprises: a support body having a drive unit disposed therein; a support rod coupled to the support body and whose operation is controlled by the drive unit; a hand provided at the end of the support rod to support the substrate and having one or more suction pads having a predetermined distance from the supported substrate; a vacuum unit connected to the suction pad and disposed inside the support body, and a cable chain disposed inside the support body that guides the movement of the vacuum line of the vacuum unit, wherein the cable chain is provided above the drive unit, and the hand comprises a plurality of individually driven hands, and the vacuum unit comprises a plurality of vacuum lines each connected to the plurality of hands to provide vacuum pressure to each hand, and the cable chain comprises a plurality of cable chains that guide the movement of each of the plurality of vacuum lines, wherein the plurality of cable chains are arranged side by side above the drive unit and are not provided below the drive unit, and are provided at the same height in the vertical direction from the bottom plate of the support body, and the drive unit comprises a plurality of drive units that provide driving force to each of the plurality of hands, and the plurality of drive units are arranged to overlap in a first direction which is the longitudinal direction of the support body, and A conveying unit in which a plurality of cable chains are arranged to overlap in a second direction perpendicular to the first direction at the upper part of the plurality of drive units. Claim 2 delete Claim 3 delete Claim 4 delete Claim 5 delete Claim 6 A device for processing a substrate comprises: a first unit and a second unit; and a conveying unit for conveying a substrate between the first unit and the second unit, wherein the conveying unit comprises: a support body having a driving unit disposed therein; a support rod coupled to the support body and whose operation is controlled by the driving unit; a hand provided at the end of the support rod to support a substrate and having one or more adsorption pads having a predetermined distance from the supported substrate; a vacuum unit connected to the adsorption pad and disposed inside the support body; and a cable chain disposed inside the support body that guides the movement of the vacuum line of the vacuum unit, wherein the cable chain is provided on the upper part of the driving unit, and the hand comprises a plurality of individually driven hands, wherein the vacuum unit comprises a plurality of vacuum lines each connected to the plurality of hands and providing vacuum pressure to each hand, and the cable chain comprises a plurality of cable chains that guide the movement of each of the plurality of vacuum lines, wherein the plurality of cable chains are arranged parallel to the upper part of the driving unit and are not provided on the lower part of the driving unit, and are identical in the vertical direction from the bottom plate of the support body A substrate processing device provided at a height, wherein the driving unit comprises a plurality of driving units, each of which applies a driving force to each of the plurality of hands, the plurality of driving units are arranged to overlap in a first direction which is the longitudinal direction of the support, and the plurality of cable chains are arranged to overlap in a second direction perpendicular to the first direction at the top of the plurality of driving units. Claim 7 delete Claim 8 delete Claim 9 delete Claim 10 delete

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