Resin, resin composition and display device using the same

Abstract

A resin composition according to one embodiment of the present invention allows for the control of pattern flowability during thermal curing by using a polymer that incorporates a flexible monomer, and thereby enables the formation of a pattern shape suitable for an application. The pattern formed in this way can provide a display panel having high luminous efficiency as well as highly reliable pixels, while satisfying appropriate levels of minimum pattern size and outgassing.

Description

Technology Field

[0001] The present invention relates to a photosensitive resin composition and a display device capable of achieving clearer image quality using the same. Background Technology

[0002] Liquid crystal display devices (LCDs) and organic light emitting display devices (OLEDs) are widely used in flat panel displays. Among these, organic light emitting displays, in particular, have advantages such as low power consumption, fast response speed, high color reproduction, high brightness, and a wide viewing angle.

[0003] In the case of the above organic light-emitting display device, a polarizing film is used to block light reflected from the panel when external light is incident, but there is a disadvantage that the polarizing film is not suitable for application to a flexible device due to a lack of bending characteristics.

[0004] As a solution to the aforementioned problems, methods such as forming an inorganic film for light blocking on the upper substrate, as well as using color filters and a black matrix, have been proposed. However, these methods have limitations in achieving the desired level of anti-reflection and fail to provide specific methods to replace polarizing films.

[0005] Therefore, the coloring pattern is used as a red, green, and blue color filter in a liquid crystal display device or as a pixel separation unit that separates pixels, and is used not only in liquid crystal displays but also in organic light-emitting displays.

[0006] In the above-mentioned composition for coloring patterns, various types of organic pigments as well as carbon black and inorganic pigments are used as coloring agents, and a pigment dispersion in which these are dispersed is mixed with other compositions to form a pattern.

[0007] The above coloring pattern is formed to distinguish pixels through optical patterning in order to distinguish pixels before depositing the common layer and the light-emitting layer in the organic light-emitting display.

[0008] The angle at which the formed pattern meets the substrate is called the taper angle. If this taper angle is high, a cross-layer may occur between the layers deposited due to the high taper angle after the deposition of the common layer and the emissive layer, which may prevent light emission. Therefore, a pattern with a low taper angle is required.

[0009] In addition, conventional coloring patterns reduce the lifespan of the display because the minimum pattern size is unsatisfactory and the amount of outgassing is high. The problem to be solved

[0010] In order to solve the problems of the above-mentioned prior art, one embodiment of the present invention is intended to provide a pixel with high reliability as well as high luminous efficiency even after deposition of a common layer and a light-emitting layer by adjusting the taper angle of the pixel separation layer pattern to a low level while satisfying the minimum pattern size and the amount of outgas to an appropriate level. means of solving the problem

[0011] The present invention provides a resin comprising repeating units represented by the following chemical formula (1).

[0012] Chemical formula (1)

[0013]

[0014] In addition, the present invention comprises (A) a resin having a repeating unit represented by the above chemical formula (1);

[0015] (B) Reactive unsaturated compounds; and

[0016] (C) Photoinitiator; provides a photosensitive resin composition comprising

[0017] The above photosensitive resin composition preferably further comprises an alkali-soluble resin comprising repeating units represented by the following chemical formula (2).

[0018] Chemical formula (2)

[0019]

[0020] In addition, it is preferable that the above (B) reactive unsaturated compound includes a compound represented by the following chemical formula (3).

[0021] Chemical formula (3)

[0022]

[0023] In addition, it is preferable that the above (C) photoinitiator includes a compound represented by the following chemical formula (4).

[0024] Chemical formula (4)

[0025]

[0026] In addition, the photosensitive resin composition may further include a coloring agent, and it is preferable that the coloring agent includes at least one of an inorganic dye, an organic dye, an inorganic pigment, and an organic pigment.

[0027] In addition, as one embodiment of the present invention, a pattern or film formed from a photosensitive resin composition according to the present invention is provided.

[0028] In addition, the display device according to the present invention comprises a first electrode formed on a substrate, a pixel separation unit formed on the first electrode to partially expose the first electrode, and a second electrode installed opposite the first electrode, wherein the pixel separation unit is preferably formed of the photosensitive resin composition.

[0029] In addition, it is preferable that the electronic device according to the present invention includes a display device according to the present invention and a control unit that drives the display device. Effects of the invention

[0030] A resin composition according to one embodiment of the present invention allows for the control of pattern flowability during thermal curing by using a polymer that incorporates a flexible monomer, and thereby enables the formation of a pattern shape suitable for an application. The pattern formed in this way can provide a display panel having high luminous efficiency as well as highly reliable pixels, while satisfying appropriate levels of minimum pattern size and outgassing. Brief explanation of the drawing

[0031] FIG. 1 schematically illustrates a display device according to one embodiment of the present invention. Figure 2 shows the taper angle of a pixel separation unit formed according to an embodiment of the present invention. Specific details for implementing the invention

[0032] Hereinafter, some embodiments of the present invention will be described in detail with reference to the exemplary drawings. In assigning reference numerals to the components of each drawing, the same components may have the same reference numeral as much as possible, even if they are shown in different drawings.

[0033] In describing the present invention, if it is determined that a detailed description of related known configurations or functions may obscure the essence of the invention, such detailed description may be omitted. Where terms such as "comprising," "having," or "consisting of" are used in this specification, other parts may be added unless "only" is used. Where a component is expressed in the singular, it may include a plural form unless otherwise specified.

[0034] Additionally, terms such as first, second, A, B, (a), (b), etc., may be used when describing the components of the present invention. These terms are used merely to distinguish the components from other components, and the essence, order, sequence, or number of the components are not limited by such terms.

[0035] In describing the positional relationship of components, where it is stated that two or more components are "connected," "combined," or "joined," it should be understood that while the two or more components may be directly "connected," "combined," or "joined," they may also be "connected," "combined," or "joined" with other components "intervened." Here, the other components may be included in one or more of the two or more components that are "connected," "combined," or "joined" with one another.

[0036] Furthermore, when it is stated that a component, such as a layer, membrane, region, or plate, is "on" or "on" another component, it should be understood that this includes not only the case where it is "directly on" another component, but also the case where there is another component in between. Conversely, when it is stated that a component is "directly on" another part, it should be understood that this means there is no other part in between.

[0037] In describing the temporal flow relationship regarding components, methods of operation, or methods of production, for example, when the temporal or sequential relationship is described using "after," "following," "next," or "before," it may include cases where the relationship is not continuous unless "immediately" or "directly" is used.

[0038] Meanwhile, where numerical values ​​or corresponding information regarding a component are mentioned, even without separate explicit notation, the numerical values ​​or corresponding information may be interpreted as including a margin of error that may occur due to various factors (e.g., process factors, internal or external shock, noise, etc.).

[0039] The terms used in this specification and the appended claims are as follows, to the extent that they do not deviate from the spirit of the invention, unless otherwise stated.

[0040] The terms “halo” or “halogen” as used in this application include fluorine (F), chlorine (Cl), bromine (Br), and iodine (I) unless otherwise noted.

[0041] Unless otherwise noted, the terms “alkyl” or “alkyl group” as used in this application refer to radicals of saturated aliphatic functional groups having 1 to 60 carbons connected by single bonds, including straight-chain alkyl groups, branched-chain alkyl groups, cycloalkyl (alicyclic) groups, alkyl-substituted cycloalkyl groups, and cycloalkyl-substituted alkyl groups.

[0042] The terms “haloalkyl group” or “halogenalkyl group” as used in this application mean an alkyl group substituted with a halogen, unless otherwise explained.

[0043] Unless otherwise noted, the terms “alkenyl” or “alkynyl” as used in this application each have a double or triple bond, include a straight or side chain group, and have 2 to 60 carbon atoms, but are not limited thereto.

[0044] The term "cycloalkyl" as used in this application means an alkyl group forming a ring having 3 to 60 carbon atoms, unless otherwise explained, but is not limited thereto.

[0045] The terms “alkoxy group” or “alkyloxy group” as used in this application refer to an alkyl group to which an oxygen radical is bonded, and unless otherwise explained, have 1 to 60 carbon atoms, but are not limited thereto.

[0046] The terms “alkenoxyl group,” “alkenoxy group,” “alkenyloxyl group,” or “alkenyloxy group” as used in this application refer to an alkeneyl group to which an oxygen radical is attached, and unless otherwise stated, have 2 to 60 carbon atoms, but are not limited thereto.

[0047] Unless otherwise noted, the terms "aryl group" and "arylene group" as used in this application each have 6 to 60 carbon atoms, but are not limited thereto. In this application, an aryl group or an arylene group includes a single cyclic type, a ring aggregate, a conjugated multi-cyclic compound, etc. For example, the aryl group may include a phenyl group, a monovalent functional group of biphenyl, a monovalent functional group of naphthalene, a fluorenyl group, or a substituted fluorenyl group, and the arylene group may include a fluorenyl group or a substituted fluorenyl group.

[0048] As used in this application, the term “ring assemblies” means that two or more ring systems (single rings or bonded ring systems) are directly connected to each other through single or double bonds, and the number of such direct connections between rings is one less than the total number of ring systems contained in the compound. Ring assemblies may consist of identical or different ring systems directly connected to each other through single or double bonds.

[0049] In this application, since the aryl group includes a ring assembly, the aryl group includes biphenyls and terphenyls in which a benzene ring, which is a single aromatic ring, is connected by a single bond. Additionally, since the aryl group also includes compounds in which an aromatic ring system conjugated to an aromatic single ring is connected by a single bond, for example, compounds in which a fluorene ring, which is an aromatic ring system conjugated to an aromatic single ring, is connected by a single bond.

[0050] The term "fused multi-ring system" as used in this application refers to a fused ring form sharing at least two atoms, and includes a form in which two or more hydrocarbon ring systems are fused, and a form in which at least one heterocyclic system containing at least one heteroatom is fused. Such fused multi-ring systems may be aromatic rings, heteroaromatic rings, aliphatic rings, or combinations thereof. For example, in the case of an aryl group, it may be a naphthalenyl group, a phenanthreneyl group, a fluorenyl group, etc., but is not limited thereto.

[0051] The term "spiro compound" as used in this application refers to a "spiro union" having a connection formed by two rings sharing only one atom. In this case, the atom shared between the two rings is called a "spiro atom," and depending on the number of spiro atoms contained in a compound, they are respectively called "monospyro-," "dyspyro-," and "trispyro-" compounds.

[0052] Unless otherwise noted, the terms “fluorenyl group,” “fluorenyl group,” and “fluorentriyl group” as used in this application refer to a monovalent, divalent, or trivalent functional group in which R, R', R" and R'" are all hydrogens in the following structures, respectively; “substituted fluorenyl group,” “substituted fluorenyl group,” or “substituted fluorentriyl group” refer to a case where at least one of the substituents R, R', R", and R'" is a substituent other than hydrogen, and includes cases where R and R' are bonded to each other to form a spiro compound together with the carbon to which they are bonded. In this specification, fluorenyl group, fluorenyl group, and fluorentriyl group may all be referred to as fluoren groups regardless of valence, such as monovalent, divalent, trivalent, etc.

[0053]

[0054] In addition, the above R, R', R" and R'" may each independently be an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or a heterocyclic group having 2 to 30 carbon atoms, for example, the aryl group may be phenyl, biphenyl, naphthalene, anthracene, or phenanthrene, and the heterocyclic group may be pyrrole, furan, thiophene, pyrazole, imidazole, triazole, pyridine, pyrimidine, pyridazine, pyrazine, triazine, indole, benzofuran, quinazolin, or quinoxaline. For example, the substituted fluorenyl group and fluorenyl group may each be a monovalent or divalent functional group of 9,9-dimethylfluorene, 9,9-diphenylfluorene, and 9,9'-spirobi[9H-fluorene].

[0055] The term "heterocyclic group" as used in this application includes not only aromatic rings such as "heteroaryl groups" or "heteroarylene groups" but also non-aromatic rings, and unless otherwise noted, means a ring having 2 to 60 carbon atoms containing one or more heteroatoms, but is not limited thereto. The term "heteroatom" as used in this application represents N, O, S, P, or Si unless otherwise noted, and heterocyclic groups mean a single ring type, ring assembly, conjugated multi-ring system, spiro compound, etc. containing a heteroatom.

[0056] For example, the “heterocyclic group” may also include compounds containing heterocyclic groups such as SO2, P=O, etc., instead of the carbon forming the ring, as in the following compounds.

[0057]

[0058] The term "ring" as used in this application includes single rings and polycyclic rings, hydrocarbon rings as well as heterorings containing at least one heteroatom, and aromatic and non-aromatic rings.

[0059] The term “polycyclic” as used in this application includes ring assemblies such as biphenyl, terphenyl, etc., fused multiple ring systems and spiro compounds, includes not only aromatic but also non-aromatic, and includes hydrocarbon rings as well as heterocycles containing at least one heteroatom.

[0060] The term "aliphatic ring" as used in this application refers to a cyclic hydrocarbon excluding aromatic hydrocarbons, and includes monocyclic, ring aggregate, conjugated multi-ring systems, spiro compounds, etc. Unless otherwise stated, it refers to a ring having 3 to 60 carbon atoms, but is not limited thereto. For example, even when benzene, an aromatic ring, and cyclohexane, a non-aromatic ring, are fused, it corresponds to an aliphatic ring.

[0061] In addition, when prefixes are named consecutively, it means that the substituents are listed in the order in which they were first described. For example, "aryl alkoxy" refers to an alkoxy group substituted with an aryl group; "alkoxycarbonyl" refers to a carbonyl group substituted with an alkoxy group; and "arylcarbonylalkenyl" refers to an alkeneyl group substituted with an aryl carbonyl group, where the aryl carbonyl group is a carbonyl group substituted with an aryl group.

[0062] Additionally, unless explicitly stated otherwise, in the terms "substituted or unsubstituted" as used in this application, "substituted" refers to deuterium, halogen, amino group, nitrile group, nitro group, C1~C 30 alkyl group of, C1~C 30 alkoxy groups, C1~C 30 alkylamine group of, C1~C 30 alkylthiophene group of, C6~C 30 arylthiophene group, C2~C 30 The Alken Diary, C2~C 30 Alkin's Diary, C3~C 30 cycloalkyl group of, C6~C 30 aryl group, C6~C substituted with deuterium 30 aryl group of, C8~C30 C2~C comprising an aryl alkenyl group, a silane group, a boron group, a germanium group, and at least one heteroatom selected from the group consisting of O, N, S, Si, and P. 20 It means being substituted with one or more substituents selected from a group of heterocyclic rings, but is not limited to these substituents.

[0063] In this application, the ‘functional group name’ corresponding to the aryl group, arylene group, heterocyclic group, etc., which are exemplified as examples of each symbol and its substituent, may be described as the ‘functional group name reflecting the valence,’ but may also be described as the ‘parent compound name.’ For example, in the case of ‘phenanthrene,’ which is a type of aryl group, the name of the group may be described by distinguishing the valence, such as ‘phenanthrile (group)’ for the monovalent group and ‘phenanthrillene (group)’ for the divalent group, but it may also be described as the parent compound name ‘phenanthrene’ regardless of the valence.

[0064] Similarly, in the case of pyrimidine, it may be described as 'pyrimidine' regardless of the valence, or as the 'name of the group' of the corresponding valence, such as pyrimidineyl(group) in the case of monovalence, or pyrimidineyl(group) in the case of divalence. Therefore, when the type of substituent is described in the name of the parent compound in this application, it may refer to an n-valence 'group' formed by the detachment of a hydrogen atom bonded to a carbon atom and / or a heteroatom of the parent compound.

[0065] In addition, when describing compound names or substituent names in this specification, numbers or alphabets indicating positions may be omitted. For example, pyrido[4,3-d]pyrimidine may be described as pyridopyrimidine, benzofuro[2,3-d]pyrimidine as benzofuropyrimidine, 9,9-dimethyl-9H-fluorene as dimethylfluorene, etc. Accordingly, both benzo[g]quinoxaline and benzo[f]quinoxaline may be described as benzoquinoxaline.

[0066] In addition, unless explicitly stated otherwise, the chemical formulas used in this application shall be applied identically to the definitions of substituents by the definitions of the indices of the following chemical formulas.

[0067]

[0068] Here, if a is an integer of 0, the substituent R 1 ≡ indicates absence; that is, when a is 0, it means that hydrogen is bonded to all carbons forming the benzene ring, in which case the chemical formula or compound can be written without indicating the hydrogen bonded to the carbons. Additionally, when a is an integer of 1, one substituent R 1 It bonds to any one of the carbons forming the benzene ring, and when a is an integer of 2 or 3, it can bond, for example, as follows; when a is an integer of 4 to 6, it bonds to the carbons of the benzene ring in a similar manner; and when a is an integer greater than or equal to 2, R 1 They may be the same or different from each other.

[0069]

[0070] Unless otherwise described in this application, forming a ring means that adjacent groups are combined to form a single ring or multiple bonded rings, and the single ring and the formed multiple bonded rings may include hydrocarbon rings as well as heterorings containing at least one heteroatom, and may include aromatic and non-aromatic rings.

[0071] In addition, unless otherwise stated in this specification, when indicating a condensed ring, the number in 'number-condensed ring' indicates the number of rings being condensed. For example, a form in which three rings are condensed together, such as anthracene, phenanthrene, and benzoquinazolin, may be indicated as a 3-condensed ring.

[0072] Meanwhile, the term "bridged bicyclic compound" as used in this application refers, unless otherwise stated, to a compound in which two rings share three or more atoms to form a ring. The atoms shared may include carbon or heteroatoms.

[0073] In the present application, the organic electric device may mean a component(s) between an anode and a cathode, or an organic light-emitting diode comprising an anode, a cathode, and a component(s) located between them.

[0074] Additionally, depending on the case, the display device in this application may refer to an organic electric device, an organic light-emitting diode and a panel including the same, or an electronic device including a panel and a circuit. Here, for example, the electronic device may include, but is not limited to, lighting devices, solar cells, portable or mobile terminals (e.g., smartphones, tablets, PDAs, electronic dictionaries, PMPs, etc.), navigation terminals, game consoles, various TVs, various computer monitors, etc., and may be any type of device that includes the above-mentioned component(s).

[0075] Hereinafter, embodiments of the present invention will be described in detail. However, these are presented as examples and are not intended to limit the present invention, and the present invention is defined only by the scope of the claims set forth below. Each component will be described in detail below.

[0077] (1) Alkali-soluble resin

[0078] A photosensitive resin composition according to one embodiment of the present invention comprises a resin having repeating units of a structure such as the following chemical formula (1).

[0079] Chemical formula (1)

[0080]

[0081] In the above chemical formula (1),

[0082] 1) * indicates the part where the combination is connected as a repeating unit, and

[0083] 2) R 1 and R 2 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0084] 3) R 1 and R 2 Each can form adjacent tile rings, and

[0085] 4) a and b are independent integers from 0 to 4, and

[0086] 5) X 1 is a single bond, O, CO, SO2, CR'R", SiR'R", chemical formula (A) or chemical formula (B).

[0087] Specific examples of the chemical formulas (A) and (B) mentioned above are as follows.

[0088] Chemical formula (A)

[0089]

[0090] Chemical formula (B)

[0091]

[0092] In the above chemical formulas (A) and (B),

[0093] 5-1) * indicates the joint position,

[0094] 5-2) X3 is O, S, SO2 or NR', and

[0095] 5-3) R' is hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0096] 5-4) R 3 ~R 6 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0097] 5-5) R 3 ~R 6 Each can form adjacent tile rings, and

[0098] 5-6) c~f are independent integers from 0 to 4.

[0100] 6) X 2 is the chemical formula (G), and

[0101] A specific example of the chemical formula (G) mentioned above is as follows.

[0102] Chemical formula (G)

[0103]

[0104] 6-1) * indicates the joint position,

[0105] 6-2) X 3 and X 4 are independently O or S, and

[0106] 6-3) R 16 fluorenyllene group, C1~C 30 alkylene of; C3~C 30 cycloalkylene of; C6~C 30 arylene of; C2~C 30 heterocycle of; or C1~C 30 It is an alkoxylene.

[0108] 7) R' and R" are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0109] 8) R' and R" can each form adjacent tile rings.

[0110] An example of the above R' and R" combining to form a ring is as follows.

[0111]

[0112]

[0114] 9) A 1 and A 2 They are either chemical formula (C) or chemical formula (D) independently of each other.

[0115] Specific examples of the aforementioned chemical formulas (C) and (D) are as follows.

[0116] Chemical formula (C)

[0117]

[0118] Chemical formula (D)

[0119]

[0120] In the above chemical formulas (C) and (D),

[0121] 9-1) * indicates the joint position,

[0122] 9-2) R 7 ~R 10 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0123] 9-3) Y 1 and Y 2 is independently either chemical formula (E) or chemical formula (F).

[0124] Specific examples of the aforementioned chemical formulas (E) and (F) are as follows.

[0125] Chemical formula (E)

[0126]

[0127] Chemical formula (F)

[0128]

[0129] In the above chemical formulas (E) and (F),

[0130] 9-3-1) * indicates the joint position,

[0131] 9-3-2) R 11 ~R 15 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0132] 9-3-3) L 1 ~L 3 They have independent single bonds, fluorenyllene groups, C1~C 30 alkylene, C6~C 30 arylene or C2~C 30 It is a heterocycle of, and

[0133] 9-3-4) g and h are independent integers from 0 to 3; provided that g+h= 3.

[0135] 10) The ratio of formula (C) to formula (D) within the polymer chain of the resin containing repeating units represented by formula (1) satisfies 1:9 to 9:1, and

[0136] 11) t is an integer between 1 and 200,000.

[0137] 12) The above R 1 ~R 16 , R', R", X 1 ~X 2 and L 1 ~L 3 and the rings formed by the bonding of adjacent groups are, respectively, deuterium; halogen; C1~C 30 alkyl group or C6~C 30 Silane group substituted or unsubstituted with an aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C1~C 30 alkylthio group of; C1~C 30 alkoxy groups; C6~C 30 aryl alkoxy group of; C1~C 30 alkyl group of; C2~C 30 The Alken Diary of; C2~C 30 Alkin's Diary; C6~C 30 aryl group of; C6~C substituted with deuterium 30 aryl group; fluorenyl group; C2~C comprising at least one heteroatom selected from the group consisting of O, N, S, Si, and P 30 The heterocyclic ring of; C3~C 30 of the aliphatic ring; C7~C 30 arylalkyl group of; C8~C 30 The aryl alkenyl group of the group and one or more substituents selected from the group consisting of combinations thereof may be further substituted, and adjacent substituents may form a ring.

[0138] The above R 1 ~R 15 , R', R" and X 1 ~X 2 In the case of this aryl group, preferably C6~C 30 The aryl group of, more preferably C6~C 18 The aryl group can be, for example, phenyl, biphenyl, naphthyl, terphenyl, etc.

[0139] The above R 1 ~R 15 , R', R", X 1 ~X2 , R 16 and L 1 ~L 3 In the case of this heterocycle, Preferably C2~C 30 The heterocyclic group of, more preferably C2~C 18 The heterocyclic group of, for example, dibenzofuran, dibenzothiophene, naphthobenzothiophene, naphthobenzofuran, etc.

[0140] The above R 1 ~R 15 , R', R" and X 1 ~X 2 In the case of this fluorene group, it may preferably be 9,9-dimethyl-9H-fluorene, 9,9-diphenyl-9H-fluorene group, 9,9'-spirobifluorene, etc.

[0141] The above R 16 and L 1 ~L 3 If is an arylene group, preferably C6~C 30 The arylene group of, more preferably C6~C 18 The arylene group can be, for example, phenyl, biphenyl, naphthyl, terphenyl, etc.

[0142] The above R 1 ~R 15 , where R' and R" are alkyl groups, preferably C1 to C 10 It can be an alkyl group, such as methyl, t-butyl, etc.

[0143] The above R 1 ~R 15 , R' and R" are alkoxyl groups, preferably C1~C 20 The alkoxyl group of, more preferably C1~C 10 The alkoxyl group can be, for example, methoxy, t-butoxy, etc.

[0144] The above R 1 ~R 15 , R', R", X 1 ~X 2 and L 1The rings formed by the combination of neighboring groups are C6~C 60 Aromatic ring; fluorene group; C2~C comprising at least one heteroatom among O, N, S, Si and P 60 The heterocyclic group of; or C3~C 60 It may be an aliphatic ring, for example, when adjacent groups combine to form an aromatic ring, preferably C6~C 20 The aromatic ring of, more preferably C6~C 14 It can form aromatic rings, such as benzene, naphthalene, phenanthrene, etc.

[0146] It is preferable that the ratio of formula (E) to formula (F) within the polymer chain of the resin containing the repeating unit represented by the above formula (1) be 2:0 to 1:1, and most preferably 1.5:0.5. If the ratio of formula (F) is higher than the ratio of formula (E), residue may be generated due to excessively high adhesion, and the amount of outgassing may also increase significantly. When the ratio of formula (E) to formula (F) is 1.5:0.5, the resolution of the pattern is best and the amount of outgassing is satisfactory.

[0147] It is preferable that the repeating unit of the above chemical formula (1) be included in an amount of 30% or less of the total number of repeating units of the alkali-soluble resin. When the repeating unit of the above chemical formula (1) is included in the alkali-soluble resin at the above ratio, it can form a tapered angle suitable for organic light-emitting diodes with suitable curing degree and fluidity in the post-baking process.

[0149] Among the total repeating units of the alkali-soluble resin, it is preferable that the repeating units excluding the repeating unit of chemical formula (1) include the repeating unit of chemical formula (2) below.

[0150] Chemical formula (2)

[0151]

[0152] In the above chemical formula (2),

[0153] 1) * indicates the part where the combination is connected as a repeating unit, and

[0154] 2) R 21 and R 22 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0155] 3) R 21 and R 22 Each can form adjacent tile rings, and

[0156] 4) i and j are independent integers from 0 to 4, and

[0157] 5) X 21 is a single bond, O, CO, SO2, CR'R", SiR'R", formula (H) or formula (I), and more preferably formula (H).

[0158] Specific examples of the aforementioned chemical formulas (H) and (I) are as follows.

[0159] Chemical formula (H)

[0160]

[0161] Chemical formula (I)

[0162]

[0163] In the above chemical formulas (H) and (I),

[0164] 5-1) * indicates the joint position,

[0165] 5-2) X 23 is O, S, SO2 or NR', and

[0166] 5-3) R' is hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0167] 5-4) R 23 ~R 26 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0168] 5-5) R 23 ~R 26 Each can form adjacent tile rings, and

[0169] 5-6) k~n are independent integers from 0 to 4.

[0171] 6) X 22 is C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 The aryloxy group of; or a combination thereof.

[0172] 7) R' and R" are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0173] 8) R' and R" can each form adjacent tile rings.

[0174] An example of the above R' and R" combining to form a ring is as follows.

[0175]

[0176]

[0178] 9) A 21 and A 22 They are either chemical formula (J) or chemical formula (K) independently of each other.

[0179] Specific examples of the aforementioned chemical formulas (J) and (K) are as follows.

[0180] Chemical formula (J)

[0181]

[0182] Chemical formula (K)

[0183]

[0184] In the above chemical formulas (J) and (K),

[0185] 9-1) * indicates the joint position,

[0186] 9-2) R 27 ~R 30 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0187] 9-3) Y 21 and Y 22 They are either chemical formula (L) or chemical formula (M) independently of each other.

[0188] Specific examples of the aforementioned chemical formulas (L) and (M) are as follows.

[0189] Chemical formula (L)

[0190]

[0191] Chemical formula (M)

[0192]

[0193] In the above chemical formulas (L) and (M),

[0194] 9-3-1) * indicates the joint position,

[0195] 9-3-2) R 31 ~R 35 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0196] 9-3-3) L 4 ~L 6 They have independent single bonds, fluorenyllene groups, C1~C 30 alkylene, C6~C 30 arylene or C2~C 30 It is a heterocycle of, and

[0197] 9-3-4) o and p are independent integers from 0 to 3; provided that o+p= 3.

[0199] 10) The ratio of formula (J) to formula (K) within the polymer chain of the resin containing repeating units represented by formula (2) satisfies 1:9 to 9:1, and

[0200] 11) n is an integer from 1 to 200,000.

[0201] 12) The above R 21 ~R 35 , R', R", X 21 ~X 22 and L 4 ~L6 and the rings formed by the bonding of adjacent groups are, respectively, deuterium; halogen; C1~C 30 alkyl group or C6~C 30 Silane group substituted or unsubstituted with an aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C1~C 30 alkylthio group of; C1~C 30 alkoxy groups; C6~C 30 aryl alkoxy group of; C1~C 30 alkyl group of; C2~C 30 The Alken Diary of; C2~C 30 Alkin's Diary; C6~C 30 aryl group of; C6~C substituted with deuterium 30 aryl group; fluorenyl group; C2~C comprising at least one heteroatom selected from the group consisting of O, N, S, Si, and P 30 The heterocyclic ring of; C3~C 30 of the aliphatic ring; C7~C 30 arylalkyl group of; C8~C 30 The aryl alkenyl group of the group and one or more substituents selected from the group consisting of combinations thereof may be further substituted, and adjacent substituents may form a ring.

[0203] It is preferable that the ratio of formula (L) to formula (M) within the polymer chain of the resin containing the repeating unit represented by formula (2) be 2:0 to 1:1, and most preferably 1.5:0.5. If the ratio of formula (M) is higher than the ratio of formula (L), residue may be generated due to excessively high adhesion, and the amount of outgassing may also increase significantly. When the ratio of formula (L) to formula (M) is 1.5:0.5, the resolution of the pattern is best and the amount of outgassing is satisfactory.

[0204] In an alkali-soluble resin comprising repeating units represented by chemical formula (1) and repeating units represented by chemical formula (2), the ratio of repeating units represented by chemical formula (1) to repeating units represented by chemical formula (2) is preferably 4:6 to 1:9, and more preferably, the ratio of repeating units represented by chemical formula (1) to repeating units represented by chemical formula (2) is 3:7.

[0205] In the case of an alkali-soluble resin containing repeating units represented by chemical formula (1) and repeating units represented by chemical formula (2) in a ratio of 3:7, it has appropriate developability during the development stage in the process of forming a pixel separation part of an organic light-emitting device, thereby minimizing the occurrence of residue, and exhibits appropriate fluidity during the post-baking stage, thereby forming a taper angle of 20 to 30 degrees suitable for the pixel definition layer of the organic light-emitting device.

[0206] In the case of an alkali-soluble resin containing repeating units represented by chemical formula (1) and repeating units represented by chemical formula (2) in equal proportions, or an alkali-soluble resin in which the proportion of repeating units of chemical formula (2) is lower than the proportion of repeating units of chemical formula (1), there are problems such as low developability, resulting in residue and reduced resolution, and the fluidity is very high during the post-baking stage, so when used as a pixel separation part of an organic light-emitting diode, the taper angle is formed too low, making it difficult to clearly separate pixels, and the pixel separation part may be formed too thick or cause a cross-section between the organic layer and the electrode, which is undesirable.

[0207] The weight-average molecular weight of the alkali-soluble resin of the present invention may be 1,000 to 100,000 g / mol, preferably 1,000 to 50,000 g / mol, and more preferably 1,000 to 30,000 g / mol. When the weight-average molecular weight of the alkali-soluble resin is within the above range, the pattern is formed well without residue when manufacturing the pattern layer, there is no loss of film thickness during development, and a good pattern can be obtained.

[0208] The resin may be included in an amount of 1 to 40 weight%, more preferably 3 to 20 weight%, based on the total amount of the photosensitive resin composition. When the resin is included within the above range, excellent sensitivity, developability, and adhesion (adhesion) can be obtained.

[0209] The above photosensitive resin composition may further include an acrylic resin in addition to the resin. The acrylic resin may be a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable thereto, and may be a resin comprising one or more acrylic repeating units. The acrylic resin may be a copolymer of ethylenically unsaturated monomers including 2 to 10 types of acrylates and methacrylates, and may have a weight-average molecular weight of 5,000 to 30,000 g / mol.

[0211] (2) Reactive unsaturated compounds

[0212] A photosensitive resin composition according to one embodiment of the present invention comprises a reactive unsaturated compound having a structure such as the following chemical formula (3).

[0213] Chemical formula (3)

[0214]

[0215] In the above chemical formula (3), at least two of Z1 to Z4 independently have the structure of the following chemical formula (O); and the remaining Z1 to Z4 independently have hydrogen, deuterium, halogen, methyl group, ethyl group; methylhydroxyl group; C6 to C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group.

[0216] A specific example of the chemical formula (O) mentioned above is as follows.

[0217] Chemical formula (O)

[0218]

[0219] In the above chemical formula (O),

[0220] 1) q is an integer from 1 to 20, and

[0221] 2) L 7 is a single bond, C1~C 30 alkylene, C6~C 30 arylene or C2~C 30 It is a heterocycle of, and

[0222] 3) Y 3 is the following chemical formula (P) or chemical formula (Q).

[0223] A specific example of the chemical formula (P) or chemical formula (Q) mentioned above is as follows.

[0224] Chemical formula (P)

[0225]

[0226] Chemical formula (Q)

[0227]

[0228] In the above chemical formula (P), R 41 Hydrogen, deuterium, halogen, methyl group, ethyl group; methylhydroxyl group; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group.

[0229] Multiacrylic compounds having a structure such as the above chemical formula (3) may be used alone or in combination of two or more. Examples include polyfunctional esters of (meth)acrylic acid having at least two ethylenically unsaturated double bonds.

[0230] In this specification, "(meth)acrylic acid" may refer to methacrylic acid, acrylic acid, or a mixture of methacrylic acid and acrylic acid.

[0231] The above-mentioned reactive unsaturated compound has the above-mentioned ethylenically unsaturated double bond, thereby causing sufficient polymerization during exposure in the pattern formation process, and can form a pattern with excellent heat resistance, light resistance, and chemical resistance.

[0232] Specific examples of the above-mentioned reactive unsaturated compounds may be one or more selected from ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, bisphenol A epoxyacrylate, ethylene glycol monomethyl ether acrylate, and trimethylolpropane triacrylate, but are not limited thereto.

[0233] Examples of commercially available products of the above-mentioned reactive unsaturated compounds are as follows.

[0234] Examples of the above-mentioned difunctional esters of (meth)acrylic acid include Aronix M-210, M-240, M-6200 of Doa Kosei Kagaku Kogyo Co., Ltd., KAYARAD HDDA, HX-220, R-604 of Nihon Kayaku Kogyo Co., Ltd., and V-260, V-312, V-335 HP of Osaka Yuki Kagaku Kogyo Co., Ltd.

[0235] Examples of the above trifunctional esters of (meth)acrylic acid include Aronix M-309, M-400, M-405, M-450, M-7100, M-8030, M-8060 from Doa Kosei Kagaku Kogyo Co., Ltd., KAYARAD TMPTA, DPCA-20, DPCA-60, DPCA-120 from Nihon Kayaku Kogyo Co., Ltd., and V-295, V-300, V-360 from Osaka Yuki Kayaku Kogyo Co., Ltd.

[0236] The above product can be used alone or in combination of two or more types.

[0237] The above reactive unsaturated compound may be treated with an acid anhydride to provide better developability. The above reactive unsaturated compound may be included in an amount of 1 to 40 weight%, for example, 1 to 20 weight%, based on the total amount of the photosensitive resin composition. When the above reactive unsaturated compound is included within the above range, sufficient curing occurs during exposure in the pattern formation process, resulting in excellent reliability, and the heat resistance, light resistance, and chemical resistance of the pattern are excellent, as well as the resolution and adhesion are also excellent.

[0239] (3) Photoinitiator

[0240] To realize a negative pattern by photolithography, a photoradical initiator must be used. The photoinitiator is one that has a maximum molar absorption coefficient of 10,000 (L / mol·cm) or more in the 320 to 380 nm region and a 5 wt% weight loss occurs at 200°C or lower. Here, the molar absorption coefficient can be calculated by the Beer-Lambert Law. In addition, weight loss was measured using TGA in a nitrogen atmosphere while increasing the temperature to 300°C at a rate of 5°C per minute.

[0241] A photosensitive resin composition according to one embodiment of the present invention includes a photoinitiator having a structure such as the following chemical formula (4).

[0242] Chemical formula (4)

[0243]

[0244] In the above chemical formula (4),

[0245] 1) u1~u3 are independent integers of 0 or 1, and

[0246] 2) L 8 and L 11 is the following chemical formula (R), and

[0247] A specific example of the chemical formula (J) mentioned above is as follows.

[0248] Chemical formula (R)

[0249]

[0250] In the above chemical formula (R), R 51 Hydrogen, deuterium, halogen, methyl group, ethyl group; methylhydroxyl group; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group.

[0251] 3) L 9 , L 10 and L 12 C6~C are independent of each other 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C3~C 30 of the aliphatic ring C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; C1~C 20 alkoxycarbonyl of; C1~C 30 alkylene of; or C6~C 30 It is Arilen.

[0252] In addition, L of the above chemical formula (4) 9 , L 10 and L 12It is more preferable that it be one of the following chemical formulas (S) to (V) independently of each other.

[0253] Specific examples of the above-mentioned chemical formulas (S) to (V) are as follows.

[0254] Chemical formula (S)

[0255]

[0256] Chemical formula (T)

[0257]

[0258] Chemical formula (U)

[0259]

[0260] Chemical formula (V)

[0261]

[0262] In the above chemical formulas (U) and (V),

[0263] 1) A is hydrogen; O; S; silane group; siloxane group; boron group; germanium group; cyano group; nitro group; nitrile group; C1~C 30 alkyl group of, C6~C 30 The aryl group of or C2~C 30 Amino group substituted or unsubstituted with a heterocyclic group; C1~C 30 alkylthio group of; C1~C 30 alkyl group of; C1~C 30 alkoxy groups; C6~C 30 aryl alkoxy group of; C2~C 30 The Alken Diary of; C2~C 30 Alkin's Diary; C6~C 30 aryl group of; C6~C substituted with deuterium 30 aryl group; fluorenyl group; C2~C comprising at least one heteroatom selected from the group consisting of O, N, S, Si, and P 30 The heterocyclic ring of; C3~C 30 of the aliphatic ring; C7~C 30 arylalkyl group of; C8~C 30The aryl alkene group of; and combinations thereof,

[0264] 2) R 52 ~R 54 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and

[0265] 3) T is S, O, or Se.

[0267] A photosensitive resin composition according to one embodiment of the present invention may use the oxime ester compound of the above formula (4) alone or in a mixture of two or more types.

[0268] The initiator that can be used in combination with the above oxime ester-based compound is an initiator used in a photosensitive resin composition, and, for example, acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, benzoin-based compounds, triazine-based compounds, etc., may be used.

[0269] Examples of the above acetophenone-based compounds include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc.

[0270] Examples of the above benzophenone compounds include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc.

[0271] Examples of the above thioxanthonic compounds include thioxanthon, 2-chlorothioxanthon, 2-methylthioxanthon, isopropylthioxanthon, 2,4-diethylthioxanthon, 2,4-diisopropylthioxanthon, 2-chlorothioxanthon, etc.

[0272] Examples of the above-mentioned benzoin compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, etc.

[0273] Examples of the above triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, and bis(trichloromethyl)-6-styryl-s-triazine. Examples include 2-(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-s(trichloromethyl)-s-triazine, 2-4-trichloromethyl(piperonyl)-6-triazine, and 2-4-trichloromethyl(4'-methoxystyryl)-6-triazine.

[0274] In addition to the above compounds, the above initiator may use carbazole compounds, diketone compounds, sulfonium borate compounds, diazo compounds, imidazole compounds, non-imidazole compounds, etc.

[0275] The above initiator may be a radical polymerization initiator, such as a peroxide-based compound or an azobis-based compound.

[0276] Examples of the above peroxide-based compounds include ketone peroxides such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methylcyclohexanone peroxide, and acetylacetone peroxide; diacyl peroxides such as isobutyryl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; and hydroperoxides such as 2,4,4-trimethylpentyl-2-hydroperoxide, diisopropylbenzene hydroperoxide, cumene hydroperoxide, and t-butyl hydroperoxide. Dialkyl peroxides such as dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, 1,3-bis(t-butyloxyisopropyl)benzene, and t-butylperoxyvaleric acid n-butyl ester; alkyl peresters such as 2,4,4-trimethylpentyl peroxyphenoxyacetate, α-cumyl peroxyneodecanoate, t-butyl peroxybenzoate, and di-t-butyl peroxytrimethyladipate; Examples of percarbonates include di-3-methoxybutyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, bis-4-t-butylcyclohexyl peroxydicarbonate, diisopropyl peroxydicarbonate, acetylcyclohexylsulfonyl peroxide, t-butyl peroxyaryl carbonate, etc.

[0277] Examples of the above azobis-based compounds include 1,1'-azobiscyclohexane-1-carbonitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2,-azobis(methylisobutyrate), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), α,α'-azobis(isobutylnitrile), and 4,4'-azobis(4-cyanovaleic acid).

[0278] The above photoinitiator may also be used together with a photosensitizer that causes a chemical reaction by absorbing light, becoming excited, and then transferring that energy. Examples of the above photosensitizers include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, etc.

[0279] The above photoinitiator may be included in an amount of 0.01 to 10 weight%, for example, 0.1 to 5 weight%, based on the total amount of the photosensitive resin composition. When the above photoinitiator is included within the above range, sufficient curing occurs during exposure in the pattern formation process, so excellent reliability can be obtained, and the heat resistance, light resistance, and chemical resistance of the pattern are excellent, and the resolution and adhesion are also excellent, and the decrease in transmittance due to unreacted initiator can be prevented.

[0281] (4) Colorant

[0282] To color the pattern, various pigments and dyes can be used independently or together, and both organic and inorganic pigments can be used.

[0283] The above pigments include red pigments, green pigments, blue pigments, yellow pigments, black pigments, etc. The above pigments may be used individually or in a mixture of two or more, and are not limited to these examples.

[0284] Examples of the above red pigments include CI red pigment 254, CI red pigment 255, CI red pigment 264, CI red pigment 270, CI red pigment 272, CI red pigment 177, CI red pigment 89, etc.

[0285] Examples of the above green pigments include halogen-substituted copper phthalocyanine pigments such as CI green pigment 36 and CI green pigment 7.

[0286] Examples of the above blue pigments include copper phthalocyanine pigments such as CI blue pigment 15:6, CI blue pigment 15, CI blue pigment 15:1, CI blue pigment 15:2, CI blue pigment 15:3, CI blue pigment 15:4, CI blue pigment 15:5, CI blue pigment 16, etc.

[0287] Examples of the above yellow pigments include isoindoline-based pigments such as CI yellow pigment 139, quinophthalone-based pigments such as CI yellow pigment 138, and nickel complex pigments such as CI yellow pigment 150.

[0288] Examples of the above black pigments include benzofuranon black, lactam black, aniline black, perylene black, titanium black, carbon black, etc.

[0289] A dispersant may be used together with the pigment to disperse the pigment in the photosensitive resin composition. Specifically, the pigment may be surface-treated with a dispersant before use, or the dispersant may be added together with the pigment when preparing the photosensitive resin composition. Nonionic dispersants, anionic dispersants, cationic dispersants, etc., may be used as the dispersant.

[0290] Specific examples of the above-mentioned dispersants include polyalkylene glycol and its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, carboxylic acid salts, alkylamide alkylene oxide adducts, alkyl amines, etc., and these can be used alone or in a mixture of two or more.

[0291] Examples of commercially available products of the above-mentioned dispersants include BYK’s DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; BASF’s EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450; and Zeneka’s Solsperse 5000, Solsperse 12000, Solsperse There are 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc., or Ajinomoto's PB711, PB821, etc.

[0292] The above-mentioned dispersant may be included in an amount of 0.1 to 15 weight percent relative to the total amount of the photosensitive resin composition. When the above-mentioned dispersant is included within the above range, the dispersibility of the photosensitive resin composition is excellent, and accordingly, stability, developability, and patternability are excellent when manufacturing a light-blocking layer.

[0293] The above pigment may also be used after pretreatment using a water-soluble inorganic salt and a wetting agent. When the above pigment is used after pretreatment as described above, the primary particle size of the pigment can be refined. The above pretreatment may be performed through a step of kneading the above pigment together with a water-soluble inorganic salt and a wetting agent, and a step of filtering and washing the pigment obtained from the kneading step. The kneading may be performed at a temperature of 40°C to 100°C, and the filtration and washing may be performed by washing the inorganic salt with water, etc., and then filtering.

[0294] Examples of the above-mentioned water-soluble inorganic salts include sodium chloride and potassium chloride, but are not limited thereto.

[0295] The above wetting agent serves as a medium that allows the pigment and the water-soluble inorganic salt to be uniformly mixed so that the pigment can be easily ground. Examples include alkylene glycol monoalkyl ethers such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and diethylene glycol monomethyl ether; alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, and glycerin polyethylene glycol. These may be used individually or in a mixture of two or more.

[0296] The pigment that has undergone the above kneading step may have an average particle size of 20 nm to 110 nm. When the average particle size of the pigment is within the above range, it can effectively form fine patterns while having excellent heat resistance and light resistance.

[0297] Meanwhile, specific examples of the above dyes include CI solvent dyes such as yellow dyes including CI solvent yellow 4, 14, 15, 16, 21, 23, 24, 38, 56, 62, 63, 68, 79, 82, 93, 94, 98, 99, 151, 162, 163; red dyes including CI solvent red 8, 45, 49, 89, 111, 122, 125, 130, 132, 146, 179; and orange dyes including CI solvent orange 2, 7, 11, 15, 26, 41, 45, 56, 62. Examples include blue dyes such as CI solvent blue 5, 35, 36, 37, 44, 59, 67, 70; violet dyes such as CI solvent violet 8, 9, 13, 14, 36, 37, 47, 49; green dyes such as CI solvent green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, 35.

[0298] Among them, CI solvent dyes with excellent solubility in organic solvents, such as CI solvent yellow 14, 16, 21, 56, 151, 79, 93; CI solvent red 8, 49, 89, 111, 122, 132, 146, 179; CI solvent orange 41, 45, 62; CI solvent blue 35, 36, 44, 45, 70; and CI solvent violet 13, are preferred. In particular, CI solvent yellow 21, 79; CI solvent red 8, 122, 132; and CI solvent orange 45, 62 are more preferred.

[0299] In addition, as a CI acid dye, CI acid yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, Yellow dyes such as 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251; CI Acid Red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 182, 183, 198, 206, 211, 215, 216, 217, 227, 228, 249, 252, 257, Red dyes such as 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 195, 308, 312, 315, 316, 339, 341, 345, 346, 349, 382, ​​383, 394, 401, 412, 417, 418, 422, 426; orange dyes such as CI acid orange 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173; CIBlue dyes such as acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103, 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324:1, 335, 340; There are purple dyes such as CI acid violet 6B, 7, 9, 17, 19, 66; green dyes such as CI acid green 1, 3, 5, 9, 16, 25, 27, 50, 58, 63, 65, 80, 104, 105, 106, 109, etc.

[0300] Among the above acid dyes, CI acid yellow 42; CI acid red 92; CI acid blue 80, 90; CI acid violet 66; and CI acid green 27, which have excellent solubility in organic solvents, are preferred.

[0301] In addition, as a CI Direct dye, yellow dyes such as CI Direct Yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, 141; Red dyes such as CI Direct Red 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250; CI Direct Orange orange dyes such as 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107; CI Direct Blue 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189, 190, 192, Blue dyes of 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275, 293, etc.; Purple dyes such as CI Direct Violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104; CIExamples of green dyes include Direct Green 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 77, 79, 82, etc.

[0302] In addition, as CI Modanto dyes, yellow dyes such as CI Modanto Yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65; red dyes such as CI Modanto Red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 30, 32, 33, 36, 37, 38, 39, 41, 43, 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95; Orange dyes such as CI Modanto Orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48; blue dyes such as CI Modanto Blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83, 84; Examples include purple dyes such as CI Modanto Violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58; green dyes such as CI Modanto Green 1, 3, 4, 5, 10, 15, 19, 26, 29, 33, 34, 35, 41, 43, 53.

[0303] In the present invention, the dyes can each be used individually or in combination of two or more types.

[0304] The above pigments and dyes may be included in an amount of 5 to 40 weight%, more specifically 8 to 30 weight%, based on the total amount of the photosensitive resin composition. When the pigment is included within the above range, it has an absorbance of 0.5 / µm or more at a wavelength of 550 nm, and the curability and adhesion of the pattern are excellent.

[0306] (5) solvent

[0307] The above solvent may be a material that is compatible with but does not react with the binder resin, the reactive unsaturated compound, the pigment, and the initiator.

[0308] Examples of the above solvents include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; and aromatic hydrocarbons such as toluene and xylene. Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, 2-heptanone; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate; lactic acid esters such as methyl lactate, ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; alkoxyacetic acid alkyl esters such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, and ethyl ethoxyacetate; 3-oxypropionate alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; 3-alkoxypropionate alkyl esters such as methyl methoxypropionate, ethyl methoxypropionate, ethyl ethoxypropionate, and methyl ethoxypropionate; 2-oxypropionate alkyl esters such as methyl oxypropionate, ethyl oxypropionate, and propyl oxypropionate; 2-alkoxypropionate alkyl esters such as methyl methoxypropionate, ethyl methoxypropionate, ethyl ethoxypropionate, and methyl ethoxypropionate;There are 2-oxy-2-methylpropionate esters such as 2-oxy-2-methylpropionate methyl and 2-oxy-2-methylpropionate ethyl; monooxymonocarboxylic acid alkyl esters of 2-alkoxy-2-methylpropionate alkyls such as 2-methoxy-2-methylpropionate methyl and 2-ethoxy-2-methylpropionate ethyl; esters such as 2-hydroxypropionate ethyl, 2-hydroxy-2-methylpropionate ethyl, hydroxyacetate ethyl, and 2-hydroxy-3-methylbutanoate; and ketone acid esters such as ethyl pyruvate.

[0309] In addition, high-boiling point solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, capronic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate may also be used.

[0310] Considering compatibility and reactivity among the above solvents, glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; and propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate may be used.

[0311] The above solvent may be included as a remainder with respect to the total amount of the photosensitive resin composition, specifically in an amount of 50 to 90 weight percent. When the above solvent is included within the above range, the processability is excellent when manufacturing a pattern layer as the photosensitive resin composition has an appropriate viscosity.

[0313] In addition, another embodiment of the present invention may provide a display device.

[0314] Hereinafter, a display device is described with reference to FIG. 1. A display device according to an embodiment of the present invention comprises a first electrode formed on a substrate, a pixel separation unit formed on the first electrode to partially expose the first electrode, and a second electrode installed opposite the first electrode. The pixel separation unit is formed from a photosensitive resin composition having a polymer having a structural unit represented by the chemical formula (1) as a main component as an essential component.

[0315] In the display device according to the embodiments of the present invention, details regarding the photosensitive resin composition are the same as those regarding the photosensitive resin composition according to the embodiments of the present invention described above, so they are omitted.

[0316] The polymerization reaction product of the above photosensitive resin composition can be formed, for example, by a process of applying the photosensitive resin composition onto a TFT substrate and curing the applied photosensitive resin composition.

[0317] The pixel separation unit described above can have excellent resolution and a taper angle suitable for an organic light-emitting diode by including a polymerization reaction product of the photosensitive resin composition.

[0318] The above display device includes a plurality of pixels, and the pixel separation unit may be a layer that separates the plurality of pixels.

[0319] For example, a light-emitting element is located in the pixel of the above-described display device, and the light-emitting element may be an organic light-emitting element (see FIG. 1). The organic light-emitting element may, for example, have a TFT layer (3) including a TFT (2) formed on a substrate (1), a flat layer (4) formed thereon, and then a first electrode (5), a pixel separation part (6), an organic layer (7), and a second electrode (8) sequentially stacked thereon. In this example, the pixel separation part (6) is located on the first electrode, and the pixel separation part may have an opening on the first electrode. The organic layer may be located within the opening and on the first electrode, and the second electrode may be located on the organic layer. Since the light-emitting area of ​​the pixel is determined by the opening area of ​​the pixel separation part, the above-described pixel separation part may be a pixel defining layer.

[0320] In addition, the pixel separation part is preferably a light-blocking layer.

[0321] A pixel separation unit according to one embodiment of the present invention may have a taper angle (9). For example, a pattern layer according to an embodiment of the present invention may have a taper angle of 20 to 30 degrees. The taper angle may be an angle of inclination with respect to a direction parallel to the display surface at the point where the inclination begins.

[0322] The pixel separation section, which is the pixel definition layer described above, has an opening, and the inclined section connecting the opening and the non-opening has an angle of inclination.

[0323] A pixel separation unit according to one embodiment of the present invention includes a polymerization reaction product of the aforementioned photosensitive resin composition, wherein the aforementioned photosensitive resin composition can form a pattern layer without residue and can form a taper angle of 20 to 30 degrees by melting flow during the pattern formation process, and when the taper angle is formed at 20 to 30 degrees, deposition defects that may occur during the deposition process of an organic light-emitting diode can be reduced.

[0324] In addition, the pixel separation portion according to the present invention is preferably formed to cover the edge portion of the first electrode, and the thickness of the pixel separation portion is preferably 0.5 to 10 μm.

[0325] In another embodiment, the photosensitive resin composition described above can be patterned onto an organic light-emitting diode electrode to form a pixel separation portion.

[0326] Hereinafter, specific synthetic examples and embodiments according to the present invention are described, but the synthetic examples and embodiments of the present invention are not limited thereto.

[0327] (Synthesized Example 1)

[0328] (Preparation of Compound 1-1)

[0329] 80 g (0.228 mol, Sigma Aldrich) of 9,9'-bisphenolfluorene, 42.67 g (0.461 mol, Sigma Aldrich) of glycidyl chloride, and 191 g (1.38 mol) of anhydrous potassium carbonate were placed in a 1500 ml three-necked round-bottom flask equipped with a distillation column and 600 ml of dimethylformamide. The mixture was heated to 80°C and reacted for 4 hours. Afterward, the temperature was lowered to 25°C and the reaction mixture was filtered. The filtrate was then added dropwise to 1000 ml of water while stirring. The precipitated powder was filtered, washed with water, and dried under reduced pressure at 40°C to obtain 100 g (216 mmol) of Compound 1-1 of Formula 15. The purity of the obtained powder was analyzed by HPLC and showed a purity of 98%.

[0330] <Compound 1-1>

[0331]

[0332] (Synthesized Example 2)

[0333] (Preparation of Compounds 2-1 to 2-3)

[0334] 25 g (54 mmol) of Compound 1-1 obtained in Synthesis Example 1, 7.9 g (0.11 mol, Daejeong Chemical Co.), 0.03 g (0.16 mmol, Daejeong Chemical Co.), and 0.01 g (0.05 mmol, Daejeong Chemical Co.) of benzyl triethylammonium chloride were placed in a 300 ml 3-neck round-bottom flask equipped with a distillation column and 52 g of toluene (Sigma Aldrich), and stirred at 110°C for 6 hours. After the reaction was completed, the toluene was removed by vacuum distillation to obtain the product. 500g of silica gel 60 (230~400 mesh, Merck) was packed into a glass column with a diameter of 220 mm, 20g (mmol) of product was packed, and separation was carried out using 10L of solvent mixed with hexane and ethyl acetate in a 4:1 volume ratio to separate compounds 2-1 to 2-3.

[0335] <Compound 2-1>

[0336]

[0337] <Compound 2-2>

[0338]

[0339] <Compound 2-3>

[0340]

[0341] (Synthesized Examples 3 to 15)

[0342] (Preparation of Polymers 1-1 to 1-13)

[0343] Compounds 2-1, 2-2, and 2-3 obtained in Synthesis Example 2 were each placed in 50 ml three-necked round-bottom flasks equipped with distillation columns as shown in Table 1 below; then, 0.05 g (0.27 mmol) benzyl triethylammonium chloride (Daejeong Chemical Co.), 0.05 g (0.46 mmol) hydroquinone (Daejeong Chemical Co.), and 9.5 g propylene glycol methyl ether acetate (Sigma Aldrich) were added to the 50 ml three-necked round-bottom flasks; subsequently, 3,3′,4,4′-Biphenyltetracarboxylic dianhydride (Sigma Aldrich), Tetrahydrophthalic anhydride (Sigma Aldrich), 1,6-hexamethylene diisocyanate (Sigma Aldrich), 4,4'-Methylenediphenyl diisocyanate (TCI), and Isophorone diisocyanate (Sigma Aldrich was added in the composition shown in Table 1 below and stirred at 110°C for 6 hours. After the reaction was finished, the reaction solution was recovered to obtain Polymers 1-1 to 1-13 in the form of a solution with a solid content of 40%. The weight-average molecular weight (Mw) of the synthesized polymers was analyzed using gel permeation chromatography (Agilent).

[0344]

[0346] The molar ratio of dianhydride moiety and diisocynate moiety in each of the resins of Polymer 1-1 to Polymer 1-13 in Table 1 above is as shown in Table 2 below.

[0347] Polymer 1-1 Polymer 1-2 Polymer 1-3 Polymer 1-4 Polymer 1-5 Polymer 1-6 Polymer 1-7 Polymer 1-8 Polymer 1-9 Polymer 1-10 Polymer 1-11 Polymer 1-12 Polymer 1-13 dianhydride moiety 7 7 7 7 7 7 7 7 6 5 3 10 7 diisocynate moiety 3 3 3 3 3 3 3 3 4 5 7 0 3

[0349] (Synthesized Example 16)

[0350] (Preparation of Compound 3-1)

[0351] 20 g (0.147 mol) of trichloro silane (Gelest) and 17.51 ​​g (0.147 mol) of 6-chloro-1-hexene (Aldrich) were dissolved in 200 ml of ethyl acetate in a 3-neck round-bottom flask equipped with a distillation column connected to a cooling water, and 0.02 g of Platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex solution (2 wt% in xylene / Aldrich) was added. After introducing nitrogen and raising the temperature to 75°C for 5 hours, the solution was filtered through a 0.1 μm Teflon membrane to remove the platinum catalyst. Subsequently, 15.6 g (0.487 mol) of methanol was added dropwise over 30 minutes at room temperature, and the temperature was raised to 50°C and the reaction was carried out for an additional 2 hours. Afterward, the solvent was removed by vacuum distillation of the reaction mixture. The resulting 6-Chlorohexyltrimethoxysilane 24 g (0.1 mol), sodium methoxide (Aldrich) 8 g (0.15 mol), hydrogen sulfide THF solution (0.8 M concentration) 187 ml (0.15 mol), and methanol 100 ml were placed in an autoclave and the reaction was carried out at 100°C for 2 hours. After cooling the reaction mixture, 100 ml of hydrogen chloride in methanol (1.25 M concentration) was added dropwise over 30 minutes at room temperature. The resulting salt was removed by filtration, and compound 3-1 (23 g) was obtained by vacuum distillation.

[0352] <Compound 3-1>

[0353]

[0354] (Synthesized Example 17)

[0355] (Preparation of Compound 3-2)

[0356] Compound 3-2 (24 g) was obtained by synthesizing in the same manner as Synthesis Example 16, except that 23.7 (0.147 mol) of 9-Chloro-1-nonene (AK Scientific) was used instead of 6-chloro-1-hexene in Synthesis Example 16.

[0357] <Compound 3-2>

[0358]

[0359] (Synthesized Example 18)

[0360] (Preparation of Compound 3-3)

[0361] Compound 3-3 (26 g) was obtained by synthesizing in the same manner as Synthesis Example 16, except that 30 g (0.147 mol) of 12-Chloro-1-dodecene (Atomax Chemicals) was used instead of 6-chloro-1-hexene in Synthesis Example 16.

[0362] <Compound 3-3>

[0363]

[0364] (Synthesized Example 19)

[0365] (Preparation of Compound 3-4)

[0366] Compound 3-4 (24 g) was obtained by synthesizing in the same manner as Synthesis Example 16, except that 22.4 g (0.487 mol) of ethanol (Aldrich) was used instead of methanol added after removing platinum in Synthesis Example 16.

[0367] <Compound 3-4>

[0368]

[0369] (Synthesized Example 20)

[0370] (Preparation of Compound 3-5)

[0371] Compound 3-5 (27 g) was obtained by synthesizing in the same manner as Synthesis Example 16, except that 36 g (0.487 mol) of 1-butanol (Aldrich) was used instead of methanol added after removing platinum in Synthesis Example 16.

[0372] <Compound 3-5>

[0373]

[0374] (Synthesized Example 21)

[0375] (Preparation of Compounds 3-6)

[0376] Compound 3-6 (22 g) was obtained by synthesizing in the same manner as Synthesis Example 16, except that 18 g (0.147 mol) of dichloromethylsilane was used instead of trichlorosilane in Synthesis Example 16.

[0377] <Compound 3-6>

[0378]

[0379] (Synthesized Example 22)

[0380] (Preparation of Polymer 2-1)

[0381] 6.36 g (34 mmol) of KBM 803 [3-(Trimethoxysilyl)-1-propanethiol] (Shinetsu), which is the same as Compound 3-7, was added to 360 g of the solution of Polymer 1-1 prepared in Synthesis Example 3, and after raising the temperature to 60°C and stirring for 4 hours, a cardo-based binder resin Polymer 2-1, which is substituted with a silane group like Compound 3-7, was obtained.

[0382] <Compound 3-7>

[0383]

[0384] (Synthesized Examples 23 to 34)

[0385] (Preparation of Polymer 2-2 to Polymer 2-13)

[0386] Cardo-based binder resins Polymers 2-2 to 2-13, which are substituted with silane groups, were prepared in the same manner as in Synthesis Example 22, except that Polymers 1-2 to 1-13 listed in Table 3 below were used instead of the solution of Polymer 1-1 in Synthesis Example 22.

[0387] The weight-average molecular weights of Polymers 2-1 to 2-13 synthesized in Synthesis Examples 22 to 34 above are as shown in Table 3 below.

[0388]

[0390] (Synthesized Example 35)

[0391] (Preparation of Polymer 3-1)

[0392] 8.1 g (34 mmol) of 6-(Trimethoxysilyl)-1-hexanethiol (compound 3-1) was added to 360 g of the solution of Polymer 1-1 prepared in Synthesis Example 3 above, the temperature was raised to 60°C, and the mixture was stirred for 4 hours to obtain a cardo-based binder resin Polymer 3-1 substituted with a silane group similar to that of compound 3-1.

[0393] (Synthesized Examples 36 to 47)

[0394] (Preparation of Polymer 3-2 to Polymer 3-7)

[0395] Cardo-based binder resins Polymers 3-2 to 3-13, which are substituted with silane groups, were prepared in the same manner as in Synthesis Example 35, except that Polymers 1-2 to 1-13 listed in Table 3 below were used instead of the solution of Polymer 1-1 in Synthesis Example 35.

[0396] The weight-average molecular weight of Polymers 3-1 to 3-13 synthesized in Synthesis Examples 35 to 47 above is as shown in Table 4 below.

[0397]

[0399] (Synthesized Example 48)

[0400] (Preparation of Polymer 4-1)

[0401] 9.53 g (34 mmol) of 6-(Triethoxysilyl)-1-hexanethiol (compound 3-4) was added to 360 g of the solution of Polymer 1-1 prepared in Synthesis Example 3 above, the temperature was raised to 60°C, and the mixture was stirred for 4 hours to obtain a cardo-based binder resin Polymer 4-1 substituted with a silane group similar to that of compound 3-4.

[0402] (Synthesized Examples 49 to 60)

[0403] (Preparation of Polymer 4-2 to Polymer 4-7)

[0404] Cardo-based binder resins Polymers 4-2 to 4-13, which are substituted with silane groups, were prepared in the same manner as in Synthesis Example 48, except that Polymers 1-2 to 1-13 listed in Table 5 below were used instead of the solution of Polymer 1-1 in Synthesis Example 48.

[0405] The weight-average molecular weight of Polymers 4-1 to 4-13 synthesized in Synthesis Examples 48 to 60 above is as shown in Table 5 below.

[0406]

[0408] (Preparation Example 1)

[0409] (Preparation of black pigment dispersion)

[0410] A dispersion was obtained by dispersing 15g of black pigment (BASF, Irgaphor® Black S 0100CF), 8.5g of Disperbyk 163 (BYK), 5.5g of V259ME (Nippon Steel Chemical), 71g of propylene glycol methyl ether acetate, and 100g of zirconia beads with a diameter of 0.5mm (Toray) using a paint shaker (Asada) for 10 hours.

[0412] (Examples 1 to 18)

[0413] Photosensitive solutions were prepared with the compositions shown in Tables 6 and 7 below.

[0414] Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9 black pigment dispersion of Preparation Example 1 30 30 30 30 30 30 30 30 30 M600 (Miwon Trading Co. / Reactive Unsaturated Compounds) 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 OXE-02 (BASF / Photoinitiator) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Polymer 1-1 9.7 - - - - - - - - Polymer 1-2 - 9.7 - - - - - - - Polymer 1-3 - - 9.7 - - - - - - Polymer 1-4 - - - 9.7 - - - - - Polymer 1-5 - - - - 9.7 - - - - Polymer 1-6 - - - - - 9.7 - - - Polymer 1-7 - - - - - - 9.7 - - Polymer 1-8 - - - - - - - 9.7 - Polymer 1-9 - - - - - - - - 9.7 Propylene glycol methyl ether acetate (Daicel) 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4

[0416] Example 10 Example 11 Example 12 Example 13 Example 14 Example 15 Example 16 Example 17 Example 18 black pigment dispersion of Preparation Example 1 30 30 30 30 30 30 30 30 30 M600 (Miwon Trading Co. / Reactive Unsaturated Compounds) 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 OXE-02 (BASF / Photoinitiator) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Polymer 2-1 9.7 - - - - - - - - Polymer 2-2 - 9.7 - - - - - - - Polymer 2-3 - - 9.7 - - - - - - Polymer 2-4 - - - 9.7 - - - - - Polymer 2-5 - - - - 9.7 - - - - Polymer 2-6 - - - - - 9.7 - - - Polymer 2-7 - - - - - - 9.7 - - Polymer 3-1 - - - - - - - 9.7 - Polymer 4-1 - - - - - - - - 9.7 Propylene glycol methyl ether acetate (Daicel) 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4

[0418] (Comparative Examples 1 to 9)

[0419] Photosensitive solutions were prepared with the compositions shown in Table 8 below.

[0420] Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 Comparative Example 8 Comparative Example 9 black pigment dispersion of Preparation Example 1 30 30 30 30 30 30 30 30 30 M600 (Miwon Trading Co. / Reactive Unsaturated Compounds) 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 OXE-02 (BASF / Photoinitiator) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Polymer 1-10 9.7 - - - - - - - - Polymer 1-11 - 9.7 - - - - - - - Polymer 1-12 - - 9.7 - - - - - - Polymer 1-13 - - - 9.7 - - - - - Polymer 2-10 - - - - 9.7 - - - - Polymer 2-11 - - - - - 9.7 - - - Polymer 2-12 - - - - - - 9.7 - - Polymer 2-13 - - - - - - - 9.7 - NPR-8000 (Miwon Trading Co. / Acryl binder) - - - - - - - - 9.7 Propylene glycol methyl ether acetate (Daicel) 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4

[0422] The method for manufacturing a light-blocking layer using the compositional solution according to Examples 1 to 18 and Comparative Examples 1 to 9 is as follows (photolithography step).

[0423] (1) Application and film formation step

[0424] The aforementioned black photosensitive resin composition was applied to a cleaned 10cm x 10cm ITO / Ag substrate to a thickness of 1.5 μm using a spin coater, and then a film was formed by heating at a temperature of 100°C for 1 minute to remove the solvent.

[0425] (2) Exposure step

[0426] To form the necessary pattern on the above-mentioned coating film, a mask of a predetermined shape was interposed, and then active rays of 190 nm to 500 nm were irradiated. An MA-6 exposure unit was used, and the exposure dose was 100 mJ / cm². 2 It was investigated.

[0427] (3) Phenomenon stage

[0428] Following the above exposure step, the image pattern was formed by developing the image using a dipping method in AZEM AX 300 MIF developer at 25°C for 1 minute, and then washing with water to dissolve and remove the non-exposed portions, thereby leaving only the exposed portions.

[0429] (3-1) Measurement of development time

[0430] The time taken to complete the development process is measured when the non-exposed portion of the photosensitive composition applied in the above development step is completely dissolved and a pattern is formed without residue.

[0431] (4) Post-processing step

[0432] In order to obtain an image pattern obtained by the above phenomenon that is excellent in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength, and storage stability, post-baking was performed in a 230°C oven for 30 minutes.

[0433] (5) Measure the minimum pattern size on the record

[0434] The minimum pattern size on a substrate was measured using an optical microscope (Nikon) for the patterns of the photosensitive compositions of Examples 1 to 18 and Comparative Examples 1 to 9 obtained through the above post-processing step.

[0435] (6) Taper angle measurement

[0436] Cross-sectional images of the patterns of the photosensitive compositions of Examples 1 to 18 and Comparative Examples 1 to 9 obtained through the above post-processing step were observed using FE-SEM (Hitachi), and the taper angles of the patterns with a critical dimension (CD) of 10 μm were measured.

[0437] (7) Outgas measurement

[0438] Six specimens of each photosensitive composition of Examples 1 to 18 and Comparative Examples 1 to 9 were prepared by forming a film on a glass substrate through steps (1), (2), (3), and (4) above and cutting it into pieces measuring 1 cm x 3 cm. Outgases were collected from each sample at 250°C for 30 minutes using a JAI JTD-505². Toluene calibration samples (100, 500, 1,000 ppm) were measured using a Shimadzu QP2020 GC / MS, a calibration curve was constructed, and the amount of outgas generated from the collected samples was measured.

[0439] The outgassing amount of the patterns obtained in this way and the maximum resolution of the patterns formed on the substrate (minimum size pattern on the substrate) were measured and are shown in Tables 9 to 11.

[0440] Photosensitive composition Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9 Minimum pattern size (㎛) on the substrate 4.2 4.3 4.8 4.7 4.8 4.4 4.3 3.9 4.8 Outgas generation amount (ppm) 3.6 3.4 3.5 3.6 3.8 3.7 3.6 3.1 3.6 Phenomenon time (s) 60 60 60 60 60 60 60 60 60 Taper angle (°) 28 28 29 29 29 29 30 28 27

[0442] Photosensitive composition Example 10 Example 11 Example 12 Example 13 Example 14 Example 15 Example 16 Example 17 Example 18 Minimum pattern size (㎛) on the substrate 3.3 3.2 3.7 3.8 4.0 3.6 3.4 3.4 3.2 Outgas generation amount (ppm) 4.5 4.2 4.4 4.3 4.8 4.7 4.6 4.7 4.7 Phenomenon time (s) 60 60 60 60 60 60 60 60 65 Taper angle (°) 27 27 27 27 28 28 29 28 26

[0444] Photosensitive composition Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 Comparative Example 8 Comparative Example 9 Minimum pattern size (㎛) on the substrate 9.3 11.5 4.1 7.4 8.2 9.9 3.4 6.7 13.8 Outgas generation amount (ppm) 3.9 4.1 3.2 3.7 4.7 4.9 4.1 4.0 8.8 Phenomenon time (s) 75 90 60 60 75 90 60 60 60 Taper angle (°) 18 16 45 31 17 16 39 33 54

[0446] In the case of Examples 1 to 9, in which Polymers 1-1 to 1-9, which do not contain silane substituents, were used as binder resins in Table 9 above, it can be confirmed that the amount of outgassing tends to be lower than in Examples 10 to 18, in which Polymers 2-1 to 2-7, Polymer 3-1, and Polymer 4-1, which contain silane substituents, were used as binder resins in Table 10.

[0447] In addition, Examples 10 to 18 showed a tendency for the minimum pattern size on the substrate to be smaller compared to Examples 1 to 9. This suggests that when a binder resin substituted with silane groups is used, adhesion to the substrate is improved, which enhances the resolution of the final pattern after the photolithography (PR) process, but the amount of outgassing also increases slightly.

[0448] When comparing Examples 1 to 5 of Table 9 and Examples 10 to 14 of Table 10 with Comparative Examples 4 and 8 of Table 11, Polymers 1-13 and 2-13 used in Comparative Examples 4 and 8 have a polymer backbone formed by polymerizing one type of monomer and have a relatively linear shape compared to Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 depending on the structure of the monomer.

[0449] On the other hand, Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 used in Examples 1 to 5 and Examples 10 to 14 are polymerized from three types of monomers with different structures and have a relatively network structure compared to Polymers 1-13 and 2-13. Due to their structural characteristics, Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 effectively form intermolecular bonds with surrounding compounds, making them more suitable for photolithography processes. Accordingly, it is determined that Examples 1 to 5 and Examples 10 to 14 exhibit higher resolution during the development process and have lower outgassing than Comparative Examples 4 and 8.

[0450] In addition, looking at Comparative Example 9 in Table 11 above, it was confirmed that when an acrylic binder (NPR-8000) is used as the binder resin, the resolution and outgassing characteristics are significantly reduced and the taper angle is formed very high compared to Examples 1 to 18 and Comparative Examples 1 to 8.

[0451] When comparing Examples 1 and 9 in Table 9 with Comparative Examples 1 to 3 in Table 11, it can be seen that the minimum pattern size on the substrate, the amount of outgassing, the development speed, and the taper angle show a consistent trend depending on the ratio of dianhydride moiety to diisocynate moiety among the resins used as binder resins. In the case of Comparative Example 3, which used Polymer 1-12 containing dianhydride moiety without containing diisocynate moiety in the main chain of the resin, it was confirmed that compared to other examples, the minimum pattern size on the substrate, the amount of outgassing, and the development speed were similar, but the taper angle was formed at a very high 45°.

[0452] In addition, in the case of Comparative Examples 1 and 2, which used Polymer 1-10 containing the same ratio of diisocynate moiety as the ratio of dianhydride moiety in the main chain of the resin, or Polymer 1-11 having a higher ratio of diisocynate moiety than the ratio of dianhydride moiety, the taper angle was formed very low compared to other examples, but showed a large difference in the minimum pattern size on the substrate, outgassing amount, and development speed.

[0453] On the other hand, in the case of Examples 1 and 9 using Polymers 1-1 and 1-9, in which the ratio of dianhydride moiety is higher than the ratio of diisocynate moiety, excellent characteristics were exhibited in terms of minimum pattern size on the substrate, outgassing amount, and development time compared to the comparative examples above, and as shown in FIG. 2, the taper angle was formed at an angle between 25 and 30°, confirming that it is very suitable as a pixel separation material for organic light-emitting diodes.

[0454] The above description is merely illustrative of the present invention, and those skilled in the art to which the present invention pertains will be able to make various modifications within the scope of the essential characteristics of the present invention.

[0455] Accordingly, the embodiments disclosed in this specification are intended to illustrate, not limit, the invention, and the spirit and scope of the invention are not limited by these embodiments. The scope of protection of the invention shall be interpreted by the claims, and all technology within an equivalent scope shall be interpreted as being included within the scope of rights of the invention. Explanation of the symbols

[0456] 1 : Substrate 2 : TFT 3 : TFT layer 4 : Flat layer 5: First electrode 6: Pixel separation unit 7 : Organic layer 8 : Second electrode 9: Taper Angle

Claims

Claim 1 A photosensitive resin composition comprising a repeating unit represented by the following chemical formula (1); a reactive unsaturated compound; and a photoinitiator: chemical formula (1) In the above chemical formula (1), 1) * indicates a part where the bonds are connected as a repeating unit, and 2) R 1 and R 2 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is the alkoxycarbonyl group of, and 3) R 1 and R 2 Each can form a ring with an adjacent tile, 4) a and b are independent integers from 0 to 4, and 5) X 1 is a single bond, O, CO, SO2, CR'R", SiR'R", formula (A) or formula (B), and formula (A) Chemical formula (B) In the above chemical formulas (A) and (B), 5-1) * indicates a bonding position, 5-2) X3 is O, S, SO2 or NR', and 5-3) R' is hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is the alkoxycarbonyl group of, and 5-4) R 3 ~R 6 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is the alkoxycarbonyl group of, and 5-5) R 3 ~R 6 Each can form a ring with an adjacent tile, 5-6) c~f are independent integers from 0 to 4, 6) X 2 is chemical formula (G), and chemical formula (G) 6-1) * indicates the joint position, and 6-2) X 3 and X 4 are independently O or S, and 6-3) R 16 fluorenyllene group, C1~C 30 alkylene of; C3~C 30 cycloalkylene of; C6~C 30 arylene of; C2~C 30 heterocycle of; or C1~C 30 It is an alkoxylene,7) and R' and R" are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, 8) R' and R" can each form a ring with an adjacent group, and 9) A 1 and A 2 are independently either chemical formula (C) or chemical formula (D), and chemical formula (C) Chemical formula (D) In the above chemical formulas (C) and (D), 9-1) * indicates a bonding position, and 9-2) R 7 ~R 10 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is the alkoxycarbonyl group of, and 9-3) Y 1 and Y 2 are independently either chemical formula (E) or chemical formula (F), and chemical formula (E) Chemical formula (F) In the above chemical formulas (E) and (F), 9-3-1) * indicates a bonding position, and 9-3-2) R 11 ~R 15 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is the alkoxycarbonyl group of, and 9-3-3) L 1 ~L 3 They have independent single bonds, fluorenyllene groups, C1~C 30 alkylene, C6~C 30 arylene or C2~C 30 It is a heterocycle of, 9-3-4) g and h are independent integers from 0 to 3; provided that g+h=3, 10) the ratio of the number of moles of formula (C) to the number of moles of formula (D) contained within the polymer chain of the resin containing the repeating unit represented by formula (1) satisfies 1:9 to 9:1, 11) t is an integer from 1 to 200,000, 12) the above R 1 ~R 16 , R', R", X 1 ~X 2 and L 1 ~L 3 and the rings formed by the bonding of adjacent groups are, respectively, deuterium; halogen; C1~C 30 alkyl group or C6~C 30 Silane group substituted or unsubstituted with an aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C1~C 30 alkylthio group of; C1~C 30 alkoxy groups; C6~C 30 aryl alkoxy group of; C1~C 30 alkyl group of; C2~C 30 The Alken Diary of; C2~C 30 Alkin's Diary; C6~C 30 aryl group of; C6~C substituted with deuterium 30 aryl group; fluorenyl group; C2~C comprising at least one heteroatom selected from the group consisting of O, N, S, Si, and P 30 The heterocyclic ring of; C3~C 30 of the aliphatic ring; C7~C 30 arylalkyl group of; C8~C 30 The aryl alkenyl group of the group and one or more substituents selected from the group consisting of combinations thereof may be further substituted, and adjacent substituents may form a ring. Claim 2 A photosensitive resin composition according to claim 1, characterized in that the weight-average molecular weight of the resin is 1,000 to 100,000 g / mol. Claim 3 A photosensitive resin composition according to claim 1, characterized in that the number of repeating unit moles represented by the chemical formula (1) is 30% or less of the total number of repeating unit moles of the resin. Claim 4 delete Claim 5 A photosensitive resin composition according to claim 1, wherein the resin comprising the repeating unit represented by the chemical formula (1) further comprises the repeating unit of the chemical formula (2). Chemical formula (2) In the above chemical formula (2) 1) R 21 and R 22 R in the chemical formula (1) of claim 1 1 and R 2 1) is the same as the definition of , 2) I and j are the same as the definitions of a and b in the chemical formula (1) of claim 1, and 3) X 21 X in the chemical formula (1) of claim 1 1 Same as the definition of,4) A 21 and A 22 is A in the chemical formula (1) of claim 1. 1 and A 2 Same as the definition of,5) X 22 is C6~C 30 A tetrasubstituted aryl group; C2~C comprising at least one heteroatom among O, N, S, Si, and P. 30 tetrasubstitution heterocyclic; C6~C 30 4-substitution fused ring of aliphatic and aromatic rings; C1~C 20 tetrasubstituted alkyl group of; C2~C 20 tetrasubstituted alkenyl group of; C2~C 20 4-substitution alkyne diary of; C1~C 20 tetrasubstituted alkoxy group; C6~C 30 A tetrasubstituted aryloxy group of; or a combination thereof. Claim 6 In claim 5, the photosensitive resin composition is characterized in that the above chemical formula (2) comprises the following chemical formula (J) and chemical formula (K) in a ratio of 1:9 to 9:1: chemical formula (J) Chemical formula (K) In the above chemical formulas (J) and (K), 9-1) * indicates a bonding position, and 9-2) R 27 ~R 30 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, and 9-3) Y 21 and Y 22 are independently either chemical formula (L) or chemical formula (M), and chemical formula (L) Chemical formula (M) In the above chemical formulas (L) and (M), 9-3-1) * indicates a bonding position, and 9-3-2) R 31 ~R 35 They are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is the alkoxycarbonyl group of, and 9-3-3) L 4 ~L 6 They have independent single bonds, fluorenyllene groups, C1~C 30 alkylene, C6~C 30 arylene or C2~C 30 It is a heterocycle, and 9-3-4) o and p are independent integers from 0 to 3; provided that o+p= 3. Claim 7 A photosensitive resin composition according to claim 6, characterized in that the number of moles of the formula (L) and the number of moles of the formula (M) included in the polymer chain of the resin containing the repeating unit represented by the formula (2) are included in a ratio of 2:0 to 1:

1. Claim 8 A photosensitive resin composition according to claim 5, characterized in that the ratio of the number of moles of repeating units represented by chemical formula (1) to the number of moles of repeating units represented by chemical formula (2) in the total repeating units is 4:6 to 1:

9. Claim 9 A photosensitive resin composition according to claim 1, characterized in that the reactive unsaturated compound is included in an amount of 1 to 40 weight% with respect to the total amount of the photosensitive resin composition. Claim 10 A photosensitive resin composition according to claim 1, characterized in that the reactive unsaturated compound comprises a compound represented by the following chemical formula (3): chemical formula (3) In the above chemical formula (3), at least two of Z1 to Z4 independently have the structure of the following chemical formula (O); and the remaining Z1 to Z4 independently have hydrogen, deuterium, halogen, methyl group, ethyl group; methylhydroxyl group; C6 to C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group, chemical formula (O) In the above chemical formula (O), 1) q is an integer from 1 to 20, and 2) L 7 is C1~C 30 alkylene, C6~C 30 arylene or C2~C 30 It is a heterocycle of, and 3) Y 3 is the following chemical formula (P) or chemical formula (Q), and chemical formula (P) Chemical formula (Q) In the above chemical formula (P), R 41 Hydrogen, deuterium, halogen, methyl group, ethyl group; methylhydroxyl group; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group. Claim 11 A photosensitive resin composition according to claim 1, characterized in that the photoinitiator is included in an amount of 0.01 to 10 weight% with respect to the total amount of the photosensitive resin composition. Claim 12 A photosensitive resin composition according to claim 1, characterized in that the photoinitiator comprises a compound represented by the following chemical formula (4): chemical formula (4) In the above chemical formula (4), 1) u1 to u3 are independent integers of 0 or 1, and 2) L 8 and L 11 is the following chemical formula (R), and chemical formula (R) 2-1) In the above chemical formula (R), R 51 Hydrogen, deuterium, halogen, methyl group, ethyl group; methylhydroxyl group; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group of,3) L 9 and L 12 C6~C are independent of each other 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C3~C 30 of the aliphatic ring C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; C1~C 20 alkoxycarbonyl of; C1~C 30 alkylene or C6~C 30 It is arylene of,4) L 10 C6~C 30 A disubstituted aryl group; C2~C comprising at least one heteroatom among O, N, S, Si, and P. 30 2-substitution heterocyclic group of; C6~C 30 The disubstitution fused ring of the aliphatic and aromatic rings; C3~C 30 2-substitution aliphatic ring of; C1~C 20 disubstituted alkyl group of; C2~C 20 disubstituted alkenyl group of; C2~C 20 2-substitution alkyne diary of; C1~C 20 disubstituted alkoxy group; C6~C 30 disubstituted aryloxy group; disubstituted fluorenyl group; disubstituted carbonyl group; disubstituted ether group; C1~C 20 disubstituted alkoxycarbonyl; C1~C 30 disubstituted alkylene or C6~C 30 It is a 2-substituted arylene. Claim 13 In claim 12, L of the above chemical formula (4) 9 and L 12 is independently one of the following chemical formulas (S) to (U), and L of the chemical formula (4) 10 A photosensitive resin composition characterized by having the following chemical formula (V): chemical formula (S) Chemical formula (T) Chemical formula (U) Chemical formula (V) In the above chemical formulas (U) and (V), 1) A is hydrogen; O; S; silane group; siloxane group; boron group; germanium group; cyano group; nitro group; nitrile group; C1~C 30 alkyl group of, C6~C 30 The aryl group of or C2~C 30 Amino group substituted or unsubstituted with a heterocyclic group; C1~C 30 alkylthio group of; C1~C 30 alkyl group of; C1~C 30 alkoxy groups; C6~C 30 aryl alkoxy group of; C2~C 30 The Alken Diary of; C2~C 30 Alkin's Diary; C6~C 30 aryl group of; C6~C substituted with deuterium 30 aryl group; fluorenyl group; C2~C comprising at least one heteroatom selected from the group consisting of O, N, S, Si, and P 30 The heterocyclic ring of; C3~C 30 of the aliphatic ring; C7~C 30 arylalkyl group of; or C8~C 30 It is an aryl alkene diary of,2) R 52 ~R 54 are independently hydrogen; deuterium; halogen; C6~C 30 aryl group of; C2~C comprising at least one heteroatom among O, N, S, Si, and P 30 The heterocyclic structure of; C6~C 30 Fusion ring of aliphatic and aromatic rings; C1~C 20 alkyl group of; C2~C 20 alkenyl group of; C2~C 20 Alkin's Diary; C1~C 20 alkoxy groups; C6~C 30 aryloxy group; fluorenyl group; carbonyl group; ether group; or C1~C 20 It is an alkoxycarbonyl group,3) and T is S, O or Se. Claim 14 A photosensitive resin composition characterized by additionally including a coloring agent in claim 1. Claim 15 A photosensitive resin composition according to claim 14, characterized in that the coloring agent comprises one or more selected from the group comprising inorganic dyes, organic dyes, inorganic pigments, and organic pigments. Claim 16 A pattern formed from a photosensitive composition according to claim 1. Claim 17 A display device comprising a first electrode formed on a substrate, a pixel separation unit formed on the first electrode to partially expose the first electrode, and a second electrode installed opposite the first electrode, wherein the pixel separation unit is formed of a photosensitive resin composition according to claim 1. Claim 18 A display device according to claim 17, characterized in that the pixel separation part is formed to cover the edge portion of the first electrode. Claim 19 A display device according to claim 17, characterized in that the thickness of the pixel separation portion is 0.5 to 10 μm. Claim 20 A display device according to claim 17, characterized in that the pixel separation part has a taper angle of 20 to 30 degrees. Claim 21 An electronic device comprising: a display device of claim 17 and a control unit for driving the display device. Claim 22 A film formed from a photosensitive composition according to claim 1.

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