Three dimensional semiconductor memory device, electronic system including the same, and method of fabricating the same

KR103003034B1Active Publication Date: 2026-08-11SAMSUNG ELECTRONICS CO LTD
View PDF 8 Cites 0 Cited by

Patent Information

Application Number
KR1020220012993
Authority / Receiving Office
KR · KR
Patent Type
Patents
Current Assignee / Owner
Filing Date
2022-01-28
Publication Date
2026-08-11
Estimated Expiration
2042-01-28

Smart Images

  • Figure 112022011197311-PAT00012_ABST
    Figure 112022011197311-PAT00012_ABST
Patent Text Reader

Abstract

A three-dimensional semiconductor memory device, an electronic system including the same, and a method for manufacturing the same are provided. The device comprises: lower selection lines disposed on a substrate and extending in a first direction, wherein the lower selection lines are spaced apart from each other in a second direction parallel to the upper surface of the substrate and intersecting the first direction; an intermediate stack structure comprising electrode layers and electrode interlayer insulating films alternately stacked on the lower selection lines; upper selection lines located on the intermediate stack structure and extending in the first direction, wherein the upper selection lines are spaced apart from each other in the second direction; and a first polishing stop film interposed between the intermediate stack structure and the lower selection lines, wherein the first polishing stop film comprises a material different from that of the electrode interlayer insulating films.
Need to check novelty before this filing date? Find Prior Art

Citation Information

Patent Citations

  • Three-dimensional semiconductor memory device

    CN108461502A

  • Semiconductor device and manufacturing method thereof

    KR1020140026278A

  • Vertical type memory device

    KR1020180138381A

  • Semiconductor devices having word line seperation layers

    KR1020210081051A

  • Semiconductor memory device

    KR1020210101900A