Method, apparatus and program for detecting anomalies in process equipment by integrating multiple anomaly detection techniques

Abstract

A method for detecting anomalies in process equipment by integrating a plurality of anomaly detection techniques according to various embodiments of the present invention is disclosed. The method may include: a step of collecting Bin data, Parametric Characteristic Monitoring (PCM) data, a plurality of wafer maps, and Fault Detection and Classification (FDC) data collected from process equipment; a step of extracting a predetermined number of specific Bin data in order of highest defect rate based on the Bin data; a step of extracting specific components in which specification defects or control defects have occurred based on the PCM data; a step of classifying patterns of each of the plurality of wafer maps based on the plurality of wafer maps and extracting at least one specific defective device corresponding to the classified pattern; a step of extracting whether there is a defect regarding abnormal operation of the process equipment based on the FDC data; and a step of integrating and providing results extracted based on the Bin data, the PCM data, the plurality of wafer maps, and the FDC data, respectively.

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