EUV / DUV combined pellicle membrane inspection device

Abstract

The present invention relates to an inspection device for EUV / DUV combined pellicle membranes, and more specifically, aims to reduce the defect rate in the process caused by membrane defects occurring in the process by pre-inspecting foreign substances, etc., that occur on the membrane formed at the bottom of the mask before introducing the EUV / DUV pellicle used in the photomask into the process.To this end, the configuration of the present invention comprises an EUV / DUV combined inspection device for selectively inspecting an EUV mask (M1) and a DUV mask (M2) for inspecting foreign substances, etc., generated on the membrane film of each mask before introducing the EUV pellicle and DUV pellicle used in a photomask into a semiconductor process line, comprising: a base plate (11) that fixes the EUV mask (M1) and the DUV mask (M2) on the upper part in the form of a rectangular parallelepiped structure; a mask loading section (10) that forms an EUV mask (M1) loading unit (12) for loading the EUV mask (M1) and a DUV mask (M2) loading unit (13) for loading the DUV mask (M2) on one side of the base plate (11) to perform supply and discharge of the EUV pellicle mask (M1) and the DUV pellicle mask (M2); and a device located in front of the Y-axis of the mask loading section (10) and attached to the EUV mask (M1) and the DUV mask (M2) being transported. The apparatus is characterized by comprising: a Cover Housing / EFEM section (20) that maintains a clean state of the pellicle membrane; a PTR section (30) that supplies or discharges the EUV mask (M1) and DUV mask (M2) in front of the Cover Housing / EFEM section (20); a mask fixing section (40) that fixes the EUV mask (M1) and DUV mask (M2) transferred to an inspection area by a transfer robot (31) on the PTR section (30); a foreign substance inspection section (50) that inspects foreign substances generated on the pellicle membrane of the masks (M1) (M2) fixed to the mask fixing section (40); and a control section (60) that transfers and fixes the EUV mask (M1) and DUV mask (M2) and selectively controls the inspection by linking the masks (M1) (M2).

Description

Technology Field

[0001] The present invention relates to a pellicle membrane inspection device for Extreme & Deep Ultravilot Lithography (hereinafter referred to as “EUV / DUV”), and more specifically, aims to reduce the defect rate in the process caused by membrane defects occurring in the process by pre-inspecting foreign substances, etc., that occur on the membrane formed at the bottom of the mask before introducing the EUV / DUV pellicle used in the photomask into the process.

[0002] In addition, the present invention has an additional objective of improving inspection performance by accurately positioning and fixing the photomask pellicle without deformation in order to inspect the membrane on the photomask.

[0003] In addition, the present invention aims to improve work efficiency in the process by enabling simultaneous or selective control of inspection of both pellicle membranes according to the request for input of EUV / DUV photomask in the process. Background Technology

[0004] A photomask (or reticle) is used to transfer a photosensitive film pattern. As these photomasks move between the lithography station, process station, and storage station, they are stored in containers. Information related to the photomask is displayed on the photomask itself in a machine-readable format. Here, the machine-readable format can be a barcode, OCR, etc. To identify the photomask, a BCR / OCR scan must be performed on the photomask.

[0005] Generally, a mask sorting system opens a reticle pod (POD) to remove a photomask and performs vision inspection with the photomask seated on the stage.

[0006] However, there is a problem in that if the photomask is not properly positioned on the stage where vision inspection is performed, the vision inspection cannot be performed accurately.

[0007] Prior art 1, Korean Published Patent Application No. 10-2023-0099601 (published on July 4, 2023), discloses a photomask stage unit and a photomask stocker having the same. Prior art 1 describes a stage unit for performing alignment with respect to a photomask, comprising: an alignment member for performing alignment with respect to the photomask so that the photomask is positioned in a correct position; and guide members for supporting the edge of the photomask and guiding the photomask to the correct position; wherein the alignment member is characterized by a photomask stage unit that pushes the photomask in a diagonal direction.

[0008] In addition, prior art 2, Korean Published Patent Application No. 10-2023-0139896 (published on October 6, 2023), also discloses a technology for a reticle pod baseplate inspection device. Prior art 2 is a reticle pod baseplate inspection device comprising: a base; an inspection stage installed on the base and configured to be movable in a first direction relative to the base; an inspection chuck installed on the inspection stage and configured to be movable in a second direction perpendicular to the first direction and rotatable relative to the inspection stage, and having at least three support members for supporting a baseplate of a pod; a gantry fixed to the base and positioned on the upper part of the inspection stage; an area camera fixed to the gantry; a probe fixed to the gantry for measuring the height of a plurality of points of a baseplate mounted on the inspection chuck or a master reticle mounted on the baseplate; and a control unit for controlling the inspection stage and the inspection chuck.

[0009] However, conventional technologies 1 and 2 both have problems with the jig-like coupling structure for simultaneously and stably fixing the positioning part, support part, and clamping part of a photomask or reticle. In addition, when the alignment member moves from the corner direction and settles on each guide member, it is expected that the photomask or reticle cannot be stably seated due to unstable seating on the stage and shaking, which is an additional problem that increases the defect rate.

[0010] In addition, the present invention aims to reduce the defect yield that occurs during clamping by applying a magnetic method to reduce defects caused by clamping when mounting a photomask using a hydraulic or pneumatic method in prior art 1 and 2.

[0011] In addition, the present invention aims to improve inspection performance by solving the expected problems of prior art 1 and 2, and by accurately positioning and fixing the photomask pellicle without deformation in order to inspect foreign substances, etc., that occur on the mask film before the process, before introducing the EUV pellicle used in the photomask into the process. Prior art literature

[0012] Patent Document 1 Korean Published Patent Application No. 10-2023-0099601 (Publication Date: July 4, 2023) Patent Document 2 Korean Published Patent Application No. 10-2023-0139896 (Publication Date: October 6, 2023) The problem to be solved

[0013] The present invention aims to solve the problem of the above-mentioned conventional technology by pre-inspecting foreign substances, etc. that occur on the membrane formed at the bottom of the mask before introducing the EUV / DUV pellicle used in the photomask into the process, thereby reducing the defect rate in the process caused by membrane defects occurring in the process.

[0014] In addition, the present invention aims to solve the problem of improving inspection performance by accurately positioning and fixing the photomask pellicle without deformation in order to inspect the membrane on the photomask.

[0015] In addition, the present invention aims to solve the problem of improving work efficiency in the process by enabling simultaneous or selective control of inspection of both pellicle membranes according to the request for input of EUV / DUV photomask in the process.

[0016] The objectives of the invention are not limited to those mentioned above, and other objectives and advantages of the invention not mentioned may be understood from the following description and will be more clearly understood from the embodiments of the invention.

[0017] Furthermore, it will be readily apparent that the objectives and advantages of the present invention can be realized by the means and combinations thereof set forth in the patent claims. means of solving the problem

[0018] To solve the aforementioned problem, the EUV / DUV combined pellicle membrane inspection device of the present invention is an EUV / DUV combined inspection device that selectively inspects EUV masks and DUV masks to inspect foreign substances, etc., generated on the membrane film of each mask before introducing EUV pellicles and DUV pellicles used in photomasks into a semiconductor process line, comprising: a base plate in the form of a rectangular parallelepiped structure that fixes the EUV mask and DUV mask to the upper part; a mask loading section that forms an EUV mask loading unit for loading EUV masks and a DUV mask loading unit for loading DUV masks on one side of the base plate to perform supply and discharge of EUV pellicle masks and DUV pellicle masks; a Cover Housing / EFEM section located in front of the Y-axis of the mask loading section and maintaining the clean state of the pellicle membrane attached to the EUV mask and DUV mask being transported; a PTR section that supplies or discharges the EUV mask and DUV mask in front of the Cover Housing / EFEM section; and by a transfer robot on the PTR section The means for solving the problem includes: a mask fixing part for fixing the EUV mask and DUV mask transferred to an inspection area; a foreign substance inspection part for inspecting foreign substances generated on the pellicle membrane of the mask fixed to the mask fixing part; and a control part for transferring and fixing the EUV mask and DUV mask, and controlling inspection by selectively linking the masks.

[0019] In addition, the present invention provides a means of solving the problem that the Cover Housing / EFEM part is a space that maintains a clean state while the mask is transferred to the PTR part.

[0020] In addition, the present invention provides a means of solving the problem by transferring the PTR part simultaneously or selectively along the X-axis, Y-axis, and Z-axis by one robot.

[0021] In addition, the present invention provides a means of solving the problem by providing a base plate in the mask fixing part, and first and second magnet units on the base plate that fix the EUV pellicle and DUV pellicle at the same pole by means of N and S pole magnets and release them at the opposite pole.

[0022] In addition, the present invention provides a means of solving the problem in that the first and second magnet units of the mask fixing part have an opposing structure, and a first linear transfer unit is provided to transfer the first and second magnet units along the X-axis, and a second linear transfer unit is provided to transfer them along the Y-axis, respectively.

[0023] Furthermore, the present invention is characterized in that the foreign substance inspection unit comprises a vision inspection unit in which a base plate fixing the EUV mask and the DUV mask is rotated to selectively inspect the upper or lower portions of the EUV pellicle and the DUV pellicle. Additionally, the present invention provides a means of solving the problem by having the foreign substance inspection unit provide a function to inspect and sort good and defective foreign substances generated on the pellicle mask on the pellicle fixing part. Effects of the invention

[0024] The pellicle membrane inspection device of the present invention has the effect of reducing the defect rate in the process caused by membrane defects occurring in the process by pre-inspecting foreign substances, etc. that occur on the membrane formed at the bottom of the mask before introducing the EUV / DUV pellicle used in the photomask into the process.

[0025] In addition, the present invention has the effect of improving inspection performance by accurately positioning and fixing the photomask pellicle without deformation in order to inspect the membrane on the photomask.

[0026] In addition, the present invention can simultaneously or selectively control the inspection of both pellicle membranes according to the request for EUV / DUV photomask input in the present process, thereby improving the work efficiency in the present process.

[0027] In addition, the present invention has the additional effect of improving the stability of the pellicle membrane by precise airflow control to prevent shaking of the photomask pellicle membrane. Brief explanation of the drawing

[0028] FIG. 1 is a drawing of a photomask stage unit of the prior art. FIG. 2 is a perspective view of the pellicle membrane inspection device of the present invention. FIG. 3 is a plan view of the pellicle membrane inspection device of the present invention. FIG. 4 is a detailed view of the chuck unit of the pellicle membrane inspection device of the present invention. FIGS. 5a and 5b are drawings of the state before and after photomask placement in the present invention. FIG. 6 is a drawing of the initial state of the chuck unit of the pellicle membrane inspection device of the present invention. FIG. 7 is a drawing of the inspection module of the pellicle membrane inspection device of the present invention. FIG. 8 is a diagram of the inspection operation of the pellicle membrane inspection device of the present invention. FIG. 9 is a diagram of the EUV pellicle inspection step of the pellicle membrane inspection device of the present invention. FIG. 10 is a diagram of the DUV pellicle inspection step of the pellicle membrane inspection device of the present invention. Figures 11a and 11b are graphs showing membrane oscillation at the center of the EUV pellicle film before and after EFU application. Figures 12a and 12b are graphs showing film oscillation before and after the application of EFU to the edge of the EUV pellicle film. FIG. 13 is a drawing showing the central and edge inspection areas of a pellicle film for EUV. Specific details for implementing the invention

[0029] The aforementioned objectives, features, and advantages will be described in detail below with reference to the attached drawings, and accordingly, a person skilled in the art to which the present invention pertains will be able to easily implement the technical concept of the present invention.

[0030] In describing the present invention, detailed descriptions of known technologies related to the present invention are omitted if it is determined that such descriptions could unnecessarily obscure the essence of the invention.

[0031] Hereinafter, preferred embodiments according to the present invention will be described in detail with reference to the attached drawings. In the drawings, the same reference numerals are used to indicate the same or similar components.

[0032] In the following description, the statement that any component is placed on the "upper (or lower)" or "upper (or lower)" of a component implies not only that the component is placed in contact with the upper (or lower) surface of said component, but also that another component may be interposed between said component and any component placed on (or below) said component. Furthermore, where it is stated that a component is "connected," "combined," or "joined" to another component, it should be understood that while said components may be directly connected or joined to each other, another component may be "interposed" between each component, or that each component may be "connected," "combined," or "joined" through another component.

[0033] As used in this specification, singular expressions include plural expressions unless the context clearly indicates otherwise.

[0034] In the present invention, terms such as "composed of" or "comprising" should not be interpreted as necessarily including all of the various components or steps described in the specification, and should be interpreted as potentially excluding some of the components or steps, or including additional components or steps.

[0035] Throughout the specification, "A and / or B" means A, B, or A and B unless specifically stated otherwise, and "C to D" means C or more and D or less unless specifically stated otherwise.

[0036] Hereinafter, an EUV / DUV combined photomask pellicle membrane inspection device according to some embodiments of the present invention will be specified, and its specific configuration and method of operation will be described.

[0037] First, FIG. 2 is a perspective view of the pellicle membrane inspection device of the present invention, FIG. 3 is a plan view of the pellicle membrane inspection device of the present invention, FIG. 4 is a detailed view of the chuck unit of the pellicle membrane inspection device of the present invention, FIG. 5a and 5b are drawings of the state before and after photomask placement in the present invention, FIG. 6 is a drawing of the initial state of the chuck unit of the pellicle membrane inspection device of the present invention, FIG. 7 is a drawing of the inspection module of the pellicle membrane inspection device of the present invention, FIG. 8 is a drawing of the inspection operation of the pellicle membrane inspection device of the present invention, FIG. 9 is a drawing of the EUV pellicle inspection step of the pellicle membrane inspection device of the present invention, FIG. 10 is a drawing of the DUV pellicle inspection step of the pellicle membrane inspection device of the present invention, FIG. 11a and 11b are graphs showing membrane vibration before and after EFU application at the center of the EUV pellicle film, FIG. Figures 12a and 12b are graphs showing the film vibration before and after the application of EFU to the edge portion of the EUV pellicle film, and Figure 13 is a drawing showing the inspection area of ​​the center and edge portion of the EUV pellicle film.

[0038] Hereinafter, based on Figures 2 to 10 of the present invention, an EUV / DUV combined photomask pellicle membrane inspection device will be specified, and the combined configuration between the components of the device will be described.

[0039] First, we would like to define the abbreviations of the constituent terms described in the present invention. In the present invention, EUV stands for Extreme Ultraviolet, DUV stands for Deep Ultraviolet, WTR stands for Wafer Transfer Robot, BCR stands for Blade Cleaner Ring, OTH stands for Over Head Transfer, Cover Housing stands for Cover Housing, which is a structure that surrounds and protects the outside of the equipment for cleaning, EFEM stands for Equipment Front End Module, which is an automated wafer transfer module that loads and unloads wafers / masks from the front of the equipment, and PTR stands for Photo Track Robot, which is a robot that automatically transfers wafers between process modules inside the photo track equipment.

[0040] In the present invention, the technical combination configuration comprises an EUV / DUV combined inspection device for selectively inspecting an EUV mask (M1) and a DUV mask (M2) for inspecting foreign substances, etc., generated on the membrane film of each mask before introducing the EUV pellicle and DUV pellicle used in a photomask into a semiconductor process line, comprising: a base plate (11) that fixes the EUV mask (M1) and the DUV mask (M2) on the upper part in the form of a rectangular parallelepiped structure; a mask loading section (10) that forms an EUV mask (M1) loading unit (12) for loading the EUV mask (M1) and a DUV mask (M2) loading unit (13) for loading the DUV mask (M2) on one side of the base plate (11) to perform supply and discharge of the EUV pellicle mask (M1) and the DUV pellicle mask (M2); and a device located in front of the Y-axis of the mask loading section (10) and attached to the EUV mask (M1) and the DUV mask (M2) being transported. The apparatus is characterized by comprising: a Cover Housing / EFEM section (20) that maintains a clean state of the pellicle membrane; a PTR section (30) that supplies or discharges the EUV mask (M1) and DUV mask (M2) in front of the Cover Housing / EFEM section (20); a mask fixing section (40) that fixes the EUV mask (M1) and DUV mask (M2) transferred to an inspection area by a transfer robot (31) on the PTR section (30); a foreign substance inspection section (50) that inspects foreign substances generated on the pellicle membrane of the masks (M1) (M2) fixed to the mask fixing section (40); and a control section (60) that transfers and fixes the EUV mask (M1) and DUV mask (M2) and selectively controls the inspection by linking the masks (M1) (M2).

[0041] In addition, the present invention is characterized in that the Cover Housing / EFEM section (20) is a space that maintains a clean state while the mask (M1)(M2) is transferred to the PTR section (30).

[0042] In addition, the present invention is characterized in that the PTR part (30) is transferred simultaneously or selectively along the X-axis, Y-axis, and Z-axis by one robot (31).

[0043] In addition, the present invention is characterized in that the mask fixing part (40) is provided with a base plate (41) and first and second magnet units (42) (45) that fix the EUV pellicle (E) and DUV pellicle (D) on the base plate (41) at the same pole by means of N pole and S pole magnets and release them at the opposite pole.

[0044] In addition, the present invention is characterized in that the first and second magnet units (42)(45) of the mask fixing part (40) have an opposing structure, and a first linear transfer unit (44) is provided to transfer the first and second magnet units (42)(45) along the X-axis, and a second linear transfer unit (46)(47) is provided to transfer them along the Y-axis, respectively.

[0045] In addition, the present invention is characterized in that the foreign substance inspection unit (50) includes a vision inspection unit (53)(55) in which a base plate (11) that fixes the EUV mask (M1) and the DUV mask (M2) is rotated to selectively inspect the lower or upper part of the EUV pellicle and the DUV pellicle.

[0046] In addition, the present invention is characterized by having a function to inspect and sort good and defective foreign substances generated on the pellicle mask on the mask fixing part (40) in the foreign substance inspection part (50).

[0047] The operation of the pellicle membrane inspection device of the present invention is described below.

[0048] First, the EUV / DUV combined pellicle membrane that is the subject of inspection of the present invention is a film structure in which the EUV pellicle membrane is significantly thinner than the DUV one.

[0049] Specifically, due to the EUV pellicle membrane having a film structure that is up to 16 times thinner than that of DUV, membrane vibration occurs due to airflow within the facility. In this case, the center of the pellicle membrane experiences greater sagging than the edge region due to gravity. Consequently, the frequency of vibration of the EUV pellicle membrane is very fast, and the difference between the maximum and minimum heights of the vibration is large, resulting in membrane vibration that cannot be captured within the depth of focus of the autofocus unit and optical system. This leads to problems such as failure to detect foreign substances or reduced repeatability of detection, but the present invention solves these problems.

[0050] The present invention is an EUV / DUV combined inspection device that selectively inspects an EUV mask (M1) and a DUV mask (M2) for inspecting foreign substances, etc., that have occurred on the pellicle membrane of each mask before introducing the EUV pellicle and DUV pellicle used in photomasks into a semiconductor process line.

[0051] As shown in FIGS. 2 and 3, the present invention has a base plate (11) in the form of a rectangular parallelepiped structure that fixes an EUV mask (M1) and a DUV mask (M2) on its upper surface. The base plate (10) is structured so that no interference occurs during the transport of the mask pellicle (M), and is positioned in the center of the base plate and has a perforated central portion so that the base plate (11) rotates to selectively inspect the upper or lower portions of the EUV pellicle and the DUV pellicle.

[0052] The mask loading unit (10) of the present invention is formed on the base plate (11), and an EUV mask (M1) loading unit (12) for loading an EUV mask (M1) and a DUV mask (M2) loading unit (13) for loading a DUV mask (M2) are arranged on one side of the base plate (11) to perform supply and discharge of an EUV pellicle mask (M1) and a DUV pellicle mask (M2), and operates in conjunction with an OHT equipped with masks supplied and discharged in the preceding and succeeding processes. The supplied EUV pellicle mask (M1) and DUV pellicle mask (M2) can be selectively inspected by an operator upon a work request. Afterward, when an inspection method is selected, the selected pellicle mask moves to the Cover Housing / EFEM unit (20) waiting in front. The Cover Housing / EFEM unit (20) has the effect of maintaining the clean state of the pellicle membrane attached to the EUV mask (M1) and DUV mask (M2) being transported. At this time, the transport of the masks is carried out by the PTR unit (30) located in front of the BCR unit (20), which supplies or discharges the EUV mask (M1) and DUV mask (M2). The supplied pellicle masks (M1) and (M2) are moved to the inspection area by the transport robot (31) of the same PTR unit (30). The robot (31) of the PTR unit (30) can transport the masks simultaneously or selectively along the X-axis, Y-axis, and Z-axis.

[0053] The EUV mask (M1) and DUV mask (M2), which are transported to the inspection area by the transport robot (31) on the above PTR section (30), are fixed on the pellicle fixing section (40). The first and second magnet units (42) (45), which are arranged in an opposing structure on the pellicle fixing section (40), operate in such a way that the second magnet unit (45) advances to fix the mask (M1 or M2) at the same pole (+ pole and + pole) by means of the N pole and S pole magnets, and the second magnet unit (45) retracts to release it at the opposite pole (+ pole and - pole). The present invention is characterized by solving the problems that appear in conventional fixing methods such as hydraulic and pneumatic systems through this magnet method. The first and second magnet units (42)(45) can be moved along the X-axis and Y-axis respectively or simultaneously in conjunction with the first linear transfer unit (44) and the second linear transfer unit (46)(47).

[0054] Afterwards, when the EUV mask (M1) and DUV mask (M2) are properly fixed to the mask fixing part (40), the foreign substance inspection part (50) located at the top or bottom inspects the foreign substance generated on the pellicle membrane of the mask (M1) (M2), inspects and sorts good products and defective products, and converts the results regarding the confirmation of foreign substances into data, and then discharges them to the mask loading part (10) by the transfer robot (31) of the waiting PTR part (30). The control part (60) of the present invention transfers and fixes the EUV mask (M1) and DUV mask (M2), and performs the function of selectively linking the masks (M1) (M2) to control inspection.

[0055] delete

[0056] In addition, as illustrated in FIGS. 9 and 10, the present invention describes an inspection method for an EUV / DUV combined pellicle membrane. After selecting one type of component supplied to the OHT, such as whether it is an EUV mask or a DUV mask, the operator selects a work and inspection method from the control unit (60) and then operates the equipment to perform the inspection. In one embodiment, if it is an EUV mask (M1), the EUV mask (M1) sequence includes: a step in which the OHT enters the EUV pellicle port; a step in which the EUV mask (M1) is extracted by the transfer robot (31) of the PTR unit (30); a step in which the EUV mask (M1) is scanned by OCR / BCR in a clean state in the Cover Housing / EFEM unit (20); a step in which the EUV mask (M1) is moved to an inspection area; a step in which the transfer robot (31) of the PTR unit (30) transfers the EUV mask (M1) to the mask fixing unit (40); and the EUV The method is performed by the steps of: aligning the mask (M1) with the inspection stage to confirm fixation and transferring it to the foreign substance inspection unit (50), which is the optical system inspection position; inspecting the pellicle membrane of the EUV mask (M1); and discharging the inspected EUV mask (M1) to the EUV pellicle port by the transfer robot (31) of the PTR unit (30).

[0057] In the case of a DUV mask (M2) in another embodiment, the operation steps are performed in the same way as the EUV mask (M1) sequence, so they are omitted.

[0058] As shown in FIGS. 11a and 11b, the present invention solved the problem of vibration in EUV pellicle membranes through inspection results in which the membrane vibration in the center of the EUV pellicle membrane of the present invention decreased from ±110 μm before EFU application to ±13 μm after EFU application, and in FIGS. 12a and 12b, the membrane vibration in the edge portion of the EUV pellicle membrane of the present invention decreased significantly from ±10 μm before EFU application to ±1 μm after EFU application. However, in the present invention, the inspection of the DUV pellicle membrane was omitted because the membrane vibration precision was lower than that of the EUV membrane.

[0059] Although the present invention has been described above with reference to the illustrated drawings, the present invention is not limited by the embodiments and drawings disclosed in this specification, and it is obvious that various modifications can be made by those skilled in the art within the scope of the technical concept of the present invention.

[0060] In addition, even if the effects of the configuration of the present invention were not explicitly described while explaining the embodiments of the present invention above, it is natural that the effects predictable by said configuration should also be recognized. Explanation of the symbols

[0061] M1. EUV Mask M2. DUV Mask 10. Mask storage section 11. Base Plate 12. EUV Mask (M1) Loading Unit 13. DUV Mask (M2) Loading Unit 20. Cover Housing / EFEM Section 30. PTR Department 40. Mask fixing part 41. Baseplate 42., 45. 1st and 2nd magnet units 44. First Linear Transfer Unit 46., 47. Second linear transfer unit 50. Foreign Substance Inspection Department 53., 55. Vision Inspection Unit 60. Control unit

Claims

Claim 1 In an EUV / DUV combined inspection device for selectively inspecting an EUV mask (M1) and a DUV mask (M2) to inspect foreign substances, etc., generated on the membrane film of each mask before introducing the EUV pellicle and DUV pellicle used in a photomask into a semiconductor process line, the device comprises: a base plate (11) that fixes the EUV mask (M1) and the DUV mask (M2) on its upper side in the form of a rectangular parallelepiped structure; and a mask loading section (10) that forms an EUV mask (M1) loading unit (12) for loading the EUV mask (M1) and a DUV mask (M2) loading unit (13) for loading the DUV mask (M2) on one side of the base plate (11) to perform supply and discharge of the EUV pellicle mask (M1) and the DUV pellicle mask (M2); and a pellicle membrane attached to the EUV mask (M1) and the DUV mask (M2) being transported, which is located in front of the Y-axis of the mask loading section (10). A Cover Housing / EFEM (Equipment Front End Module, mask input / output transfer automation module) unit (20) equipped with an EFU (Equipment Fan Track, air purification device) to maintain a clean state while being transferred to a PTR (Photo Track Robot, process module transfer robot) unit (30); a PTR unit (30) that supplies or discharges EUV masks (M1) and DUV masks (M2) simultaneously or selectively in the X-axis, Y-axis, and Z-axis by a transfer robot (31) located in front of the Cover Housing / EFEM (20); a base plate (41) to be transferred to an inspection area by the transfer robot (31) on the PTR unit (30), and first and second magnet units (42) (45) provided on the base plate (41) to fix the EUV pellicle (E) and DUV pellicle (D) at the same pole by N-pole and S-pole magnets and release them at the opposite pole, thereby enabling EUV Mask fixing part (40) for fixing mask (M1) and DUV mask (M2);An EUV / DUV combined pellicle membrane inspection device characterized by comprising: a foreign substance inspection unit (50) for inspecting foreign substances generated on the pellicle membrane of the mask (M1)(M2) fixed to the mask fixing unit (40); and a control unit (60) for transporting and fixing the EUV mask (M1) and the DUV mask (M2), and controlling the inspection by selectively linking the masks (M1)(M2). Claim 2 delete Claim 3 delete Claim 4 delete Claim 5 An EUV / DUV combined pellicle membrane inspection device according to claim 1, wherein the first and second magnet units (42)(45) of the mask fixing part (40) have an opposing structure, and a first linear transfer unit (44) is provided to transfer the first and second magnet units (42)(45) along the X-axis, and a second linear transfer unit (46)(47) is provided to transfer them along the Y-axis, respectively. Claim 6 In claim 1, the EUV / DUV combined pellicle membrane inspection device is characterized in that the foreign substance inspection unit (50) has a function to inspect and sort good and defective foreign substances generated on the pellicle mask on the mask fixing unit (40) by a vision inspection unit (53)(55) in which a base plate (11) that fixes the EUV mask (M1) and DUV mask (M2) rotates to selectively inspect the upper or lower part of the EUV pellicle and DUV pellicle. Claim 7 delete

Images