Anti-adhesion nanocomposite coating material and its manufacturing system

Abstract

The objective of the present invention is to provide a new coating material that is applied to a base material and possesses heat resistance, anti-sticking properties, durability, chemical resistance, low friction, and release properties, and to provide a method for manufacturing such a coating material and a manufacturing system. The present invention provides a ternary nanocoposite coating material comprising CFH or CF-Si applied to a substrate.

Description

Technology Field

[0001] The present invention relates to an anti-adhesion nanocomposite coating material and a manufacturing system thereof. Background Technology

[0002] Combustion engine parts such as rolling rollers, molds, mold ejection pins, pistons, tappets, cylinder heads, and shafts, as well as motor components, require anti-sticking properties. In particular, molds must be able to detach from the inner surface of the mold without sticking when the product is ejected after the high-temperature molten metal has solidified. Combustion engine parts must also be equipped with high-temperature anti-sticking surfaces as they are components subjected to friction at significant temperatures, and motor components also require high-temperature anti-sticking properties due to frictional heat. Furthermore, large rollers used in secondary battery manufacturing equipment roll slurry-type materials, and in this case, durability, chemical resistance, low friction, release properties, anti-sticking, and heat resistance are required.

[0003] To achieve these characteristics, registered patent No. 10-1709538 proposes a method of coating the roller surface with DLC (Diamond-Like-Carbon). However, since DLC is susceptible to heat, it is difficult to apply to rollers for hot rolling, so there is a need to provide a better coating material that satisfies the above characteristics.

[0004] In addition, the rollers used in the secondary battery electrode manufacturing equipment are large rollers weighing up to 5 tons, and unlike coating on small components, they present the challenge of achieving uniform coating over a large area. The same applies to the nozzle slot die. The problem to be solved

[0005] The objective of the present invention is to provide a new coating material having heat resistance, anti-sticking properties, durability, chemical resistance, low friction, and release properties, and to provide a method for manufacturing such a coating material and a manufacturing system. means of solving the problem

[0006] In accordance with the above purpose, the present invention provides a ternary nanocoposite coating material comprising CF-Si or CFH.

[0007] In addition, the present invention provides a coating system capable of achieving a uniform coating over a large area, and to this end, provides a nanocomposite coating system for coating a ternary nanocomposite coating material containing CF-Si or CFH on a substrate by a CVD process, comprising a large chamber into which a substrate (a body to be coated) is loaded, an ion source applied to the chamber, and a raw material supply unit that supplies C, F, Si or C, F, H as raw materials to the ion source, respectively.

[0008] In the above, since a high-density plasma must be formed to uniformly coat a large area within a large chamber, a permanent magnet or an electromagnet is arranged in the ion source to form a magnetic field so that the plasma is concentrated in a predetermined space.

[0009] In the above, to strongly attract the generated plasma and electrons toward the base material, a high bias voltage of 50 to 500 V is applied to the base material, including a power supply.

[0010] In the above, the jig for fixing the base material is configured to be rotatable and rotates during the coating process.

[0011] In the above, a cylinder sputtering device including a Cr cylinder target is mounted in the chamber so that a Cr-based buffer layer is formed on the surface of the substrate before coating with a ternary nanocomposite.

[0012] In addition, the present invention provides a method for forming a ternary nanocomposite coating material comprising CF-Si or CFH using the coating system, wherein

[0013] One or more of hydrocarbon gas, F gas, SiH4, Si2H6, or SiH2Cl2 are supplied to the raw material supply section of the ion source, and additionally, hydrogen (H2) is additionally supplied to form a reducing atmosphere, power of 500 to 2000 V and 0.3 to 1.8 A is applied to the ion source, and a bias voltage of 50 to 500 V is applied to the substrate to form a ternary nanocomposite coating material containing CF-Si.

[0014] Hydrocarbon gas, F gas, is supplied to the raw material supply section of the ion source, and additionally, hydrogen (H2) is supplied to form a reducing atmosphere, power of 500 to 2000 V and 0.3 to 1.8 A is applied to the ion source, and a bias voltage of 50 to 500 V is applied to a jig on which the base material is fixed to form a ternary nanocomposite coating material containing CFH.

[0015] In the above, prior to forming the ternary nanocomposite coating material, plasma cleaning is performed on the substrate, an inert gas (such as Ar) is flowed into the raw material supply section of the ion source, power of 500 to 2000 V and 0.3 to 1.8 A is applied to the ion source, and a bias voltage of 50 to 500 V is applied to the substrate.

[0016] In the above, after plasma cleaning and before forming the ternary nanocomposite coating material, a Cr-based buffer layer is formed using a sputtering device including a Cr cylinder target, and 5 to 20 A and 300 to 1000 V are applied to the sputtering device, a bias voltage of 80 to 500 V is applied to the substrate, and an inert gas and / or nitrogen (N2) is flowed to carry out the process.

[0017] In the above, plasma cleaning is performed for 30 to 300 minutes, the buffer layer formation process for 40 to 200 minutes, and the ternary nanocomposite coating material formation process for 240 to 780 minutes.

[0018] In the above, the ternary nanocomposite coating material enhances mold release and anti-sticking properties by increasing the content of the F component toward the surface.

[0019] In the above, the buffer layer is a gradient layer formed in the order of Cr / CrN / CrN2 / CrN2 (N component enhanced) / CrCH. Effects of the invention

[0021] The ternary nanocomposite coating material containing CF-Si according to the present invention exhibits high hardness characteristics of 17 to 27 GPa, excellent durability with a bonding strength of 20 N or more, a low friction coefficient of 0.12 or less, and excellent anti-sticking, release properties, and chemical resistance with a contact angle of 90° or more.

[0022] That is, according to the present invention, a ternary nanocomposite coating material is formed on the surface of a substrate so that a continuous process can be carried out without long-term maintenance, thereby improving the productivity of inline manufacturing equipment.

[0023] In addition, the ternary nanocomposite coating material according to the present invention is 10 5 to 10 8 It exhibits an electrical resistance of Ω to prevent static electricity and arcing during operation or idle, and prevents the adhesion of foreign substances.

[0024] In addition, the ternary nanocomposite coating material manufacturing system according to the present invention does not generate defects on the surface of the coating material caused by arcing, which was a problem with conventional ion sources, resulting in good surface roughness and improved quality of the product. Brief explanation of the drawing

[0025] FIG. 1 is a layered cross-sectional view showing the composition of a ternary nanocomposite coating material according to the present invention. FIG. 2 is a schematic diagram illustrating the functionality of each constituent element of the ternary nanocomposite coating material according to the present invention. Figure 3 is a drawing and photograph showing the configuration of a ternary nanocomposite coating material manufacturing system according to the present invention and the generation of high-density plasma accordingly. Figure 4 is a table illustrating the manufacturing process of the ternary nanocomposite coating material of the present invention. Figure 5 is a table comparing the physical properties of the ternary nanocomposite coating material of the present invention with those of the prior art. Figure 6 is a photograph showing a problem that occurred on the surface of a roller, which is a base material, according to the prior art. Figure 7 is a photograph and schematic diagram showing the configuration of a manufacturing system for manufacturing a buffer layer and a ternary nanocomposite coating material together according to the present invention. FIG. 8 shows an example of a roller to which the coating material of the present invention is applied. Specific details for implementing the invention

[0026] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the attached drawings.

[0027] The nanocomposite coating material of the present invention can exhibit anti-sticking, heat resistance, chemical resistance, mold release, low friction, and durability, and can be applied to rolling rollers, molds, ejection pins, combustion engine parts (pistons, tappets, cylinder heads, shafts, etc.), motor components, rollers for secondary battery manufacturing equipment, nozzle slot die components for electrode manufacturing processes, etc. If the above-mentioned physical properties are required, the nanocomposite coating material of the present invention can be applied to various articles. The following examples describe in detail specifically rollers for secondary battery manufacturing equipment, but the same coating technology is applied even when other articles, such as molds, are used as base materials, and replacing the base material is undoubtedly a technology that is easy for those skilled in the art.

[0028] Rollers used in secondary battery manufacturing equipment include those for cold rolling, hot rolling, and guide applications. In equipment that manufactures electrodes by continuously processing electrode materials using rollers, the durability, anti-sintering, heat resistance, chemical resistance, release properties, and low friction of the rollers directly affect the maintenance cycle and influence the performance of the final product, the electrode. Therefore, the aforementioned physical properties of the rollers ultimately lead to the price competitiveness of batteries.

[0029] As exemplified in FIG. 6, the surface of a conventional roller is corroded and the mating material is adhered, and consequently, there are wear marks on the produced product. As a coating material having enhanced characteristics compared to conventional nitride-based coatings, the present invention proposes a ternary nanocomposite coating material containing CF-Si as shown in FIG. 1.

[0030] That is, as shown in Fig. 2, a ternary nanocomposite coating material was designed based on a C component capable of exhibiting high hardness, low friction, and chemical resistance, and including an F component capable of enhancing mold release, anti-sticking, and corrosion resistance, and a Si component capable of enhancing amorphousness, heat resistance, and corrosion resistance.

[0031] Since the roller prior to coating is originally composed mostly of chrome steel, it is advantageous to form a Cr-based buffer layer to enhance the adhesion of the nanocomposite coating material of the present invention. The buffer layer comprises one or more of Cr, CrN, and Cr-NC. Such a buffer layer configuration can be applied to any other article (combustion engine parts, motor parts, press molds, die-casting molds, mold members such as ejection pins, etc.) provided that the base material includes chrome steel.

[0032] It is preferable to form the buffer layer with a thickness of 20 to 200 nm and the ternary nanocomposite coating material containing CF-Si with a thickness of 1 to 5 µm.

[0033] The formation of such nanocomposite coating materials for rollers in secondary battery manufacturing equipment requires a large-scale manufacturing system due to the large size of the rollers themselves. Furthermore, as manufacturing equipment, including chambers, becomes larger, a method capable of forming a uniform coating over a large area is required. Large-area uniform coating is equally required for large molds and rolling rollers in addition to secondary battery manufacturing equipment rollers; similarly, the requirement for large-area uniform coating applies to small components such as combustion engine parts and ejection pins, as they are loaded in large quantities.

[0034] FIG. 3 illustrates a manufacturing system for a ternary nanocomposite coating material for a roller of a secondary battery manufacturing facility according to the present invention.

[0035] The roller, weighing approximately 5 tons, has a central roller and shafts extending from the center to both ends. The chamber capable of accommodating the roller, which has a total length of 3 meters, is also enlarged. Since forming coating layers on multiple products in a single coating process lowers manufacturing costs, an even larger chamber is desirable. The nozzle slot die for the electrode manufacturing process is also large, so a large chamber is required.

[0036] Both shaft ends of the roller are fixed to a rotatable jig, and the jig is composed of a conductor and also serves as an electrical connection part that applies a strong bias voltage to the roller, as will be described later.

[0037] Since the roller is heavy, weighing about 5 tons, it is more stable to support both ends of the shaft on the bottom and ceiling surfaces of the chamber rather than supporting them in the air. That is, the jig is positioned on the bottom and ceiling surfaces of the chamber, and the roller is vertically arranged and rotates during the process. This fixing configuration of the base material is applied equally to the nozzle slot die, rolling roller, and mold, and other small components are fixed radially in large numbers to a large rotating jig, and the jig includes components such as latches.

[0038] An ion source, preferably a linear ion source, is installed in a large chamber as a means of forming a CF-Si ternary nanocomposite coating material. A raw material supply unit is configured to supply reaction gas to the ion source, and a CVD process is performed in which the reaction gas is ionized and the electrons of the generated ions create plasma to form a coating layer on the roller surface.

[0039] If the chamber space is large and the plasma generated by the dispersion of ternary cations is not densified, it is difficult to efficiently form a uniform coating layer over a large area. Accordingly, the present invention densifies the plasma by confining it within a predetermined space using electromagnetic force by arranging magnets in the ion source. The arrangement of magnets may consist of permanent magnets and / or electromagnets. Preferably, permanent magnets are arranged to generate a constant magnetic force and prevent heat generation. However, it may be composed of electromagnets, and electromagnets can be arranged in an overlapping manner with permanent magnets to supplement the magnetic field generated by the permanent magnets. That is, in a coating system with arranged permanent magnets, the magnetic field can be supplemented by driving electromagnets at positions where the magnetic force can be changed to analyze the plasma density or to control the plasma distribution based on sample coating results.

[0040] In addition, since it is necessary to strongly attract the high-density plasma toward the base material roller, a bias voltage is applied toward the base material roller, and at this time, a very high power bias is applied. In this embodiment, the bias voltage applied to the roller is 50 to 500 V, as described in FIG. 4, and a bias current of 0.3 to 1.5 A flows. In the case of a small base material other than the roller, the bias voltage is applied to the jig. When the mold is the base material, the bias voltage is applied to the mold through the mold itself or through a mold fixing member.

[0041] In the upper right corner of Figure 3, a photograph showing the behavior of a high-density plasma generated by a magnetic field and a strong bias voltage is illustrated. Even in a large space within a large chamber, the plasma is not dispersed but is concentrated in the space where the coating layer is to be formed, and forms the coating layer with high energy through a strong attractive force.

[0042] Meanwhile, as described above, a buffer layer forming system is added to form a buffer layer so that the ternary nanocomposite coating material adheres strongly to the substrate. That is, as shown in FIG. 7, a sputter source (sputtering device) is added to the chamber in addition to the ion source. To form a Cr-based buffer layer, a cylinder sputter source equipped with a Cr cylinder target is mounted in the chamber.

[0043] A pair of ion sources and sputter sources are placed at each end of the chamber, centered on the substrate. This arrangement of coating sources is advantageous for forming a uniform coating layer on a roller rotating at the center.

[0044] The manufacturing process of a ternary nanocomposite coating material using a coating system is as follows (see Fig. 4).

[0045] First, the surface of the base material is plasma cleaned. The inside of the chamber is 10 -6 to 10 -5 torr, preferably the process starting pressure is 7.0×10 -5 After vacuuming to a level below torr, an inert gas such as Ar is supplied to the chamber at an operating pressure of 8 to 20 mtorr, and the ion source is driven to clean for 30 to 300 minutes. The voltage applied to the ion source is 500 to 2000 V, the current is 0.3 to 1.8 A, the bias voltage applied to the roller is 50 to 150 kHz, 50 to 500 V, and a bias current of 0.3 to 1.5 A flows.

[0046] After plasma cleaning is completed, a sputter source is driven together with an ion source to form a Cr-based buffer layer. A bias voltage is applied to a Cr cylinder target, and an inert gas such as Ar and / or nitrogen (N2) gas is flowed through it. A voltage of 300 to 1000 V and 5 to 20 A is applied to the sputter source to form a buffer layer for 40 to 200 minutes. The process temperature is set to room temperature. The composition of the buffer layer may be one or more of Cr, CrN, and Cr-NC.

[0047] During the initial 20 to 30 minutes of forming the buffer layer, an inert gas such as Ar is supplied to the chamber at an operating pressure of 8 to 20 mtorr, and a bias voltage of 50 to 150 kHz, 80 to 500 V, and a bias current of 0.5 to 2 A are applied to the roller to form a Cr layer (first gradient layer). Next, while maintaining the sputter source power and roller bias power, Ar, N2, and reducing H2 gases are supplied to the chamber at an operating pressure of 8 to 20 mtorr, and the nitrogen supply ratio is increased in three sections of 10 to 30 minutes each to form a nitrided hardened layer of CrN (second gradient layer), CrN2 (third gradient layer), and CrN2 (fourth gradient layer). Next, for 10 to 20 minutes, Ar, N2, carbon (C), and H2 are supplied while maintaining the sputter source power and roller bias power to form a CrCH carbonitriding hardened layer as the fifth gradation layer. The carbon source may be a hydrocarbon gas. The buffer layer formed in this way has a thickness of 0.3 to 1.0 μm, which strengthens bonding strength and enhances impact resistance.

[0048] Next, the ternary nanocomposite coating material of the present invention is formed.

[0049] One or more of hydrocarbon gas, CF4 gas, TMS (Tetramethylsilane), SiH4, Si2H6, or SiH2Cl2 are supplied to the raw material supply section of the ion source, and additionally, hydrogen (H2) is additionally supplied to form a reducing atmosphere, power of 500 to 2000 V and 0.3 to 1.8 A is applied to the ion source, and a bias voltage of 50 to 150 kHz, 50 to 500 V, and 0.3 to 1.5 A and a current are applied to the base material to form a ternary nanocomposite coating material containing CF-Si. Although hydrogen is supplied by hydrocarbon gas, the present invention separately supplies hydrogen (H2) to further enhance the reducing atmosphere.

[0050] In forming the ternary nanocomposite coating material which serves as the top coating layer, hydrocarbons, reducing hydrogen, and TMS are supplied for the initial 240 to 780 minutes to form a CH-based high-density, high-hardness wear-resistant nanomatrix coating layer as the first top coating layer, and for the next 240 to 780 minutes, hydrocarbons, CF4, reducing hydrogen, and TMS are supplied to form a second top coating layer as an interfacial continuous layer for forming a nanocomposite carbon containing CFH and an anti-sticking functional layer. Then, for the next 30 to 180 minutes, hydrocarbons, CF4, reducing hydrogen, and TMS are supplied, but the supply ratio of CF4 is further increased to form an FCH coating layer as the third top coating layer to enhance the anti-sticking properties of the roller surface. That is, the F component increases toward the surface of the top coating layer to enhance the anti-sticking properties of the base material surface. When forming the third top coating layer, the arcing of the drive unit must be controlled so as not to impair mold release properties. The total thickness of the top coating layer shall be 1 to 3 µm. The process temperature shall be room temperature.

[0051] Meanwhile, when forming the top coating layer, CFH can be composed of a ternary nanocomposite coating material excluding Si. That is, it can be composed of a CFH composite coating material as needed, and in this case, the necessary mold release and high hardness can also be exhibited. When Si is included, it is more advantageous for improving low friction, so the coating material composition can be selected to match the desired physical property specifications.

[0052] The amount of reactant supplied is controlled so that the compositional ratio of F to Si in the CFH ternary nanocomposite coating layer or the CF-Si ternary nanocomposite coating layer is 0 to 20 at%. It is preferable that the compositional ratio of F be 0.1 to 20 at%.

[0053] Since the process temperature is at the room temperature level, there are almost no restrictions on the base material.

[0054] By carrying out the process in this manner, a ternary nanocomposite coating layer with a total thickness of 1 to 5 μm, including a buffer layer, is formed.

[0056] The properties of the ternary nanocomposite coating layer formed in this way are shown in the table in Fig. 5.

[0057] The ternary nanocomposite coating material containing CF-Si according to the present invention exhibits high hardness characteristics of 17 to 27 GPa, excellent durability with a bonding strength of 20 N or more, a low friction coefficient of 0.12 or less, and excellent anti-sticking, release properties, and chemical resistance with a contact angle of 90° or more. This represents a much superior achievement compared to conventional nitride-based coating materials.

[0058] In particular, since the coating material has a contact angle of 90° or more, the mating material is not adhered during the roller rolling process, and other contaminants are not attached.

[0059] In addition, the ternary nanocomposite coating material of the present invention has an electrical resistance of 1x10 5 ~9.9x10 8With Ω, it exhibits a resistance value sufficient to provide equipment antistatic and foreign matter adhesion prevention functions. A substrate such as a roller coated with the nanocomposite coating material of the present invention not only has release properties during operation but also has the electrical resistance value as described above even during the idle period, thereby preventing static electricity generation, arcing, and foreign matter adhesion.

[0060] That is, according to the present invention, a ternary nanocomposite coating material is formed on the surface of a base material such as a roller, allowing for a continuous process to be carried out without long-term maintenance, thereby improving the productivity of the inline system in the case of secondary battery manufacturing equipment.

[0062] Unless otherwise defined in the foregoing, all technical and scientific terms used in this specification have the same meaning as commonly understood by a skilled expert in the art to which the present invention pertains. Furthermore, terms defined in commonly used dictionaries are not to be interpreted ideally or excessively unless explicitly and specifically defined otherwise. Throughout the specification, when a part is described as "comprising" a certain component, this means that, unless specifically stated otherwise, it does not exclude other components but may include additional components. Additionally, the singular form may include the plural form depending on the context.

[0063] In addition, in this specification, "on top of, on top of, or above," "below," or "below" means being located above or below the target part, and does not necessarily mean being located on the upper or lower side with respect to the direction of gravity.

[0065] The rights of the present invention are not limited to the embodiments described above but are defined by what is stated in the claims, and it is obvious that a person skilled in the art can make various modifications and productions within the scope of the rights stated in the claims. Explanation of the symbols

[0068] No drawing symbol.

Claims

Claim 1 A coating material exhibiting anti-sticking properties, comprising: a buffer layer formed on a substrate, which sequentially includes a Cr layer, a CrN layer, a CrN2 layer, and a CrCH layer; and a ternary nanocomposite coating layer of CFH formed on the buffer layer; wherein the ternary nanocomposite coating layer is formed by additionally supplying reducing hydrogen in addition to the C and F components during the formation process, and the composition of F in the coating layer is 0 to 20 at%, and is a gradient coating layer containing more F components toward the surface, having a contact angle of 90° or more, and having high hardness characteristics of 17 to 27 GPa. Claim 2 A coating material exhibiting anti-sticking properties, comprising: a buffer layer formed on a substrate, which sequentially includes a Cr layer, a CrN layer, a CrN2 layer, and a CrCH layer; and a ternary nanocomposite coating layer of CF-Si formed on the buffer layer; wherein the nanocomposite coating layer is formed by additionally supplying reducing hydrogen in addition to the C component, F component, and Si component during the formation process, and the composition of F in the coating layer is 0 to 20 at%, and is a gradient coating layer containing more F component toward the surface, having a contact angle of 90° or more, and having high hardness characteristics of 17 to 27 GPa. Claim 3 delete Claim 4 A coating material exhibiting anti-sticking properties according to claim 1 or 2, characterized in that the coating material exhibiting anti-sticking properties has a low friction coefficient of 0.12 or less and a bonding strength of 20 N or more. Claim 5 In claim 1 or 2, the coating material exhibiting anti-sticking properties is 1x10 6 ~9.9x10 8 A coating material exhibiting anti-sticking properties characterized by having an electrical resistance of Ω. Claim 6 A system for manufacturing a ternary nanocomposite coating material comprising CFH or CF-Si applied to a substrate requiring anti-adhesion properties, comprising: a large chamber into which one or more substrates are loaded; an ion source applied to the chamber; a cylinder sputter source including a Cr cylinder target to form a Cr-based buffer layer before coating the ternary nanocomposite coating material on the surface of the substrate; and a raw material supply unit for supplying C, F, and H, or C, F, and Si, respectively, as raw materials to the ion source. The method comprises a power supply unit; wherein the power supply unit applies a bias voltage of 50 to 500 V to a substrate to attract generated plasma and electrons toward the substrate, and the ion source comprises a permanent magnet or electromagnet arranged for the formation of a high-density plasma; wherein a buffer layer comprising a Cr layer, a CrN layer, a CrN2 layer, and a CrCH layer is formed in sequence on the substrate using the cylinder sputter source, and a ternary nanocomposite coating layer of CFH is formed on the buffer layer by supplying hydrocarbon, CF4, and reducing hydrogen (H2) as raw materials to the ion source, or a ternary nanocomposite coating layer of CF-Si is formed on the buffer layer by supplying hydrocarbon, CF4, reducing hydrogen (H2), and one or more of TMS (Tetramethylsilane), SiH4, Si2H6, or SiH2Cl2 as raw materials to the ion source, and wherein the nanocomposite coating layer is formed as a gradient coating layer containing more F components toward the surface. A nanocomposite coating material manufacturing system. Claim 7 A nanocomposite coating material manufacturing system according to claim 6, characterized by forming a high-density plasma by arranging permanent magnets or electromagnets in an ion source to form a magnetic field in order to uniformly coat the surface of a substrate within a large chamber, thereby concentrating the plasma in a predetermined space. Claim 8 A nanocomposite coating material manufacturing system according to claim 6, comprising a jig for fixing a base material, wherein the jig is rotatably configured so that the base material is rotated during the coating process. Claim 9 A nanocomposite coating material manufacturing system according to claim 7, characterized in that a permanent magnet and an electromagnet are arranged together to form a magnetic field by the permanent magnet, and an electromagnet at a predetermined position is selectively driven to supplement the magnetic field formed by the permanent magnet with the magnetic field of the electromagnet. Claim 10 A method for forming a ternary nanocomposite coating material containing CFH using a nanocomposite coating material manufacturing system according to any one of claims 6 to 9, wherein, prior to forming the ternary nanocomposite coating material, 300 to 1000 V is applied to a sputter source including a Cr cylinder target, a bias voltage of 80 to 500 V is applied to a substrate, and one or more of an inert gas and nitrogen (N2) are flowed to perform a sputtering process to form a Cr-based buffer layer, wherein in the process of forming the Cr-based buffer layer, a Cr layer is formed by initially supplying only an inert gas, and subsequently, a CrN layer is formed by supplying an inert gas, nitrogen, and reducing hydrogen, but the nitrogen supply ratio is increased to form a nitriding hardened layer with reinforced N components, and in the final formation stage of the buffer layer, an inert gas, nitrogen, reducing hydrogen, and hydrocarbons are supplied to form a carbonitriding hardened layer of CrCH to form a gradient layer, and a hydrocarbon gas, CF4 gas, and reducing hydrogen are supplied to the raw material supply part of the ion source Hydrogen (H2) is supplied, a voltage of 500 to 2000 V is applied to an ion source, and a bias voltage of 50 to 500 V is applied to a substrate to form a ternary nanocomposite coating material containing CFH, wherein the composition ratio of CF4 gas in the raw material supply portion of the ion source is gradually increased to form a gradient layer in which the F component increases toward the surface of the ternary nanocomposite coating material, wherein in the formation of the ternary nanocomposite coating material, hydrocarbons and reducing hydrogen are initially supplied to form a high-density, high-hardness, wear-resistant nanomatrix coating layer based on CH as a first top coating layer, and then hydrocarbons, CF4 gas, and reducing hydrogen are supplied to form a second top coating layer as an interfacial continuous layer for forming a nanocomposite carbon containing CFH and an anti-sticking functional layer, and then hydrocarbons, CF4, and reducing hydrogen are supplied, wherein the supply ratio of CF4 is increased to form an FCH coating layer as a third top coating layer. A method for forming a nanocomposite coating material characterized by strengthening the anti-adhesion properties of the substrate surface by forming. Claim 11 A method for forming a ternary nanocomposite coating material containing CF-Si using a nanocomposite coating material manufacturing system according to any one of claims 6 to 9, wherein, prior to forming the ternary nanocomposite coating material, 300 to 1000 V is applied to a sputter source including a Cr cylinder target, a bias voltage of 80 to 500 V is applied to a base material, and one or more of an inert gas and nitrogen (N2) are flowed to perform a sputtering process to form a Cr-based buffer layer, wherein in the process of forming the Cr-based buffer layer, a Cr layer is formed by initially supplying only an inert gas, and subsequently, a CrN layer is formed by supplying an inert gas, nitrogen, and reducing hydrogen, but the nitrogen supply ratio is increased to form a nitriding hardened layer with reinforced N components, and in the final formation stage of the buffer layer, an inert gas, nitrogen, reducing hydrogen, and hydrocarbon are supplied to form a carbonitriding hardened layer of CrCH to form a gradient layer, and a hydrocarbon gas, CF4 gas, and a raw material supply part of an ion source One or more of TMS (Tetramethylsilane), SiH4, Si2H6, or SiH2Cl2 are supplied, reducing hydrogen (H2) is additionally supplied, a voltage of 500 to 2000 V is applied to an ion source, and a bias voltage of 50 to 500 V is applied to a substrate to form a ternary nanocomposite coating material containing CF-Si, wherein the composition ratio of CF4 gas in the raw material supply part of the ion source is gradually increased to form a gradient layer in which the F component increases toward the surface of the ternary nanocomposite coating material, and in the formation of the ternary nanocomposite coating material, initially, a hydrocarbon and one or more of TMS (Tetramethylsilane), SiH4, Si2H6, or SiH2Cl2 and reducing hydrogen are supplied to form a high-density, high-hardness, wear-resistant nanomatrix coating layer as a first top coating layer, and next, hydrocarbon, CF4 gas, TMS (Tetramethylsilane), SiH4, Si2H6,A method for forming a nanocomposite coating material characterized by supplying one or more of SiH2Cl2 and reducing hydrogen to form a second top coating layer as an interfacial continuous layer for forming a nanocomposite carbon and an anti-adhesion functional layer, and then supplying one or more of hydrocarbon, CF4, TMS (Tetramethylsilane), SiH4, Si2H6, or SiH2Cl2 and reducing hydrogen, while increasing the supply ratio of CF4 to form a third top coating layer to strengthen the anti-adhesion of the substrate surface. Claim 12 A method for forming a nanocomposite coating material according to claim 10, wherein plasma cleaning is performed on the substrate before forming the buffer layer, the voltage applied to the ion source is 500 to 2000 V and the current is 0.3 to 1.8 A, and the bias voltage applied to the substrate is 50 to 150 kHz and 50 to 500 V. Claim 13 A method for forming a nanocomposite coating material according to claim 11, wherein plasma cleaning is performed on the substrate before forming the buffer layer, the voltage applied to the ion source is 500 to 2000 V and the current is 0.3 to 1.8 A, and the bias voltage applied to the substrate is 50 to 150 kHz and 50 to 500 V.

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