Apparatus for removing residue of EUV light source vessel

Abstract

One embodiment of the present invention provides a residue removal device for an EUV light source container, comprising: a frame portion disposed on the bottom surface of an EUV light source container having an inner surface including a curved surface; and a head portion installed on the upper part of the frame portion to be rotatable along a circular trajectory while maintaining a predetermined distance from the curved surface of the EUV light source container and having a heating member that emits heat toward the curved surface of the EUV light source container, wherein the heating member has a shape curved into an arc that is part of the circular trajectory.

Description

Technology Field

[0001] The present invention relates to a residue removal device for an EUV light source container. Background Technology

[0003] Generally, when Extreme Ultraviolet (EUV) lithography equipment is used for a certain period, undischarged tin residue adheres to the interior of the EUV light source vessel. Since this tin residue interferes with the normal operation of the EUV light source, it must be removed periodically. However, removing tin residue from the EUV light source vessel takes a significant amount of time, which is a cause of reduced productivity in the EUV lithography equipment. The problem to be solved

[0005] One of the technical problems that the technical concept of the present invention aims to solve is to provide a residue removal device for an EUV light source vessel that can reduce the time required for maintenance and repair work on the EUV light source vessel. means of solving the problem

[0007] One embodiment of the present invention provides a residue removal device for an EUV light source container, comprising: a frame portion disposed on the bottom surface of an EUV light source container having an inner surface including a curved surface; and a head portion installed on the upper part of the frame portion to be rotatable along a circular trajectory while maintaining a predetermined distance from the curved surface of the EUV light source container and having a heating member that emits heat toward the curved surface of the EUV light source container, wherein the heating member has a shape curved into an arc that is part of the circular trajectory.

[0008] One embodiment of the present invention provides a residue removal device for an EUV light source container, comprising: a frame portion; and a head portion installed on the upper part of the frame portion so as to be rotatable along a circular trajectory and emitting heat toward the outer edge of the circular trajectory, wherein the head portion comprises: a heating member having a shape curved into an arc that is part of the circular trajectory; a cover having an internal space in which the heating member is disposed; and a body having an opening that supports the cover and defines an area in which the cover is exposed toward the outer edge of the circular trajectory. Effects of the invention

[0010] A residue removal device for an EUV light source vessel can be provided that can reduce the time required for maintenance and repair work on the EUV light source vessel.

[0011] The various and beneficial advantages and effects of the present invention are not limited to those described above and will be more easily understood in the process of explaining specific embodiments of the present invention. Brief explanation of the drawing

[0013] FIG. 1 is a schematic diagram showing an extreme ultraviolet exposure facility in which a residue removal device for an EUV light source container according to one embodiment of the present invention is used. Figure 2 is a schematic side view of the EUV light source container of Figure 1. FIG. 3 is a perspective view of a residue removal device for an EUV light source container according to one embodiment. Fig. 4 is a side view of a residue removal device for an EUV light source container of Fig. 3. FIGS. 5(a) and FIGS. 5(b) are drawings illustrating various modified examples of the head portion of a residue removal device for an EUV light source container according to one embodiment of the present invention. FIG. 6 is a block diagram of a residue removal device for an EUV light source container according to one embodiment. FIG. 7 is a schematic side view illustrating the introduction of a residue removal device for an EUV light source container according to an embodiment of the present invention into the EUV light source container of FIG. 2. FIG. 8 is a plan view showing a residue removal device for an EUV light source container according to an embodiment of the present invention being introduced into the EUV light source container of FIG. 2. Specific details for implementing the invention

[0014] Hereinafter, preferred embodiments of the present invention will be described as follows with reference to the attached drawings.

[0016] With reference to FIGS. 1 and 2, an extreme ultraviolet light source system and an extreme ultraviolet exposure facility using a residue removal device for an EUV light source vessel according to one embodiment will be described.

[0017] FIG. 1 is a schematic diagram showing an extreme ultraviolet exposure facility in which a residue removal device for an EUV light source vessel according to one embodiment of the present invention is used, and FIG. 2 is a schematic side view of the EUV light source vessel of FIG. 1.

[0019] Referring to FIG. 1, the extreme ultraviolet exposure facility (1) may include an exposure chamber (90), an extreme ultraviolet light source system (SO), a lithography device (LA), a projection system (PS), an upper electrostatic chuck (72), and a lower electrostatic chuck (80).

[0020] The exposure chamber (90) has an internal space (91), and an extreme ultraviolet light source system (SO), a lithography device (LA), a projection system (PS), an upper electrostatic chuck (72), and a lower electrostatic chuck (80) may be disposed in the internal space (91). A mask (71) may be loaded / unloaded on the upper electrostatic chuck (72) by an electrostatic force formed by power applied from a power supply unit (73), and a substrate (W) may be loaded / unloaded on the lower electrostatic chuck (80). For example, the substrate (W) may be a semiconductor wafer.

[0022] An extreme ultraviolet light source system (SO) can generate extreme ultraviolet light (B) having a wavelength of less than about 100 nm and supply it to a lithography device (LA). The extreme ultraviolet light source system (SO) will be described in detail later.

[0023] The lithography device (LA) includes a plurality of mirrors and can irradiate extreme ultraviolet light (B) emitted from an extreme ultraviolet light source system (SO) in the direction of the upper electrostatic chuck (72). Since the plurality of mirrors included in the lithography device (LA) have a known structure, only two mirrors (61, 62) are shown for the simplification of the drawing and convenience of explanation.

[0024] The projection system (PS) includes a plurality of mirrors and can expose a pattern of extreme ultraviolet light (B) reflected from a mask (71) attached to an upper electrostatic chuck (72) to a substrate (W) placed on a lower electrostatic chuck (80) by irradiating the pattern onto the surface of the substrate (W). Since the plurality of mirrors included in the projection system (PS) have a known structure, only two mirrors (63, 64) are shown for the simplification of the drawing and convenience of explanation.

[0026] Referring to FIGS. 1 and 2, the extreme ultraviolet light source system (SO) may include an EUV light source container (10) and a light source unit (50). Although not illustrated, the extreme ultraviolet light source system (SO) may further include a droplet supply unit that supplies a droplet (DP) into the interior of the EUV light source container (10).

[0027] The EUV light source container (10) may include an inner container (20) and an outer container (30). The EUV light source container (10) may be positioned within an exposure chamber (90) at a predetermined angle. In one embodiment, the EUV light source container (10) may be positioned at an angle (θ1) of approximately 28° with respect to a normal perpendicular to the bottom surface of the exposure chamber (90).

[0028] The inner container (20) may be placed inside the outer container (30). The inner container (20) may be a cone-shaped cover that gradually narrows toward the top, and an intermediate focus (IF) may be located at the end of the cone to provide a path for the emission of generated extreme ultraviolet light (B). The inner container (20) may include a lower inner container (21) having vanes placed on its inner surface, and an upper inner container (22) placed above the lower inner container (21) and having an intermediate focus (IF). According to an embodiment, an internal temperature sensor (23) for measuring the temperature of the inner container (20) may be placed on the lower surface of the lower inner container (21). The internal temperature sensor (23) may be connected to a control unit (150) described later via wired or wireless communication. The internal temperature sensor (23) may transmit the temperature value of the inner container (20) to the control unit (150).

[0029] The outer container (30) may include a lower outer container (31) and an upper outer container (32) positioned on top of the lower outer container (31). An EUV collector (40) may be positioned on the bottom surface (31B) of the lower outer container (31), and a door (31D) for inserting and withdrawing the EUV collector (40) may be positioned on one side of the lower outer container (31). At least some portion of the inner surface (31S) of the lower outer container (31) may be curved.

[0030] Laser light (DL) emitted from the light source unit (50) is supplied into the interior of the EUV light source vessel (10) to generate extreme ultraviolet light (B). Specifically, the laser light (DL) supplied into the interior of the EUV light source vessel (10) can be irradiated at a primary focus (PF) onto a droplet (DP) composed of tin (Sn), lithium (Li), and xenon (Xe) to generate a plasma (P) that emits extreme ultraviolet light (B). An EUV collector (40) placed inside the EUV light source vessel (10) can collect the extreme ultraviolet light (B) emitted in all directions from the plasma (P), concentrate it at an intermediate condensation point (IF), and supply it to a lithography device (LA).

[0032] A droplet (DP) irradiated with laser light (DL) explodes, leaving residue (TC) inside the EUV light source container (10). Some of the residue (TC) may flow into the flow path (G1) between the inner container (20) and the outer container (30) of the EUV light source container (10). The residue (TC) flowing into the flow path (G1) between the inner container (20) and the outer container (30) is collected by gravity in a relatively lower area of ​​the flow path (G1) and can be collected and removed by moving along the inner surface (31S) of the lower outer container (31) and receiving it in a residue collector (IE). However, the residue (TC) collected in the lower area can be easily cooled and adhere to the inner surface (31S) of the lower outer container (31). Residue (TC) adhering to the inner surface (31S) can block the flow path (G1), thereby interfering with the normal operation of the extreme ultraviolet light source system (SO). A residue removal device (100) for an EUV light source container of one embodiment can be used to remove residue (TC) adhering to the extreme ultraviolet light source system (SO) by heating.

[0034] With reference to FIGS. 3 to 6, a residue removal device (100) for an EUV light source container according to one embodiment will be described. FIG. 3 is a perspective view of a residue removal device for an EUV light source container, and FIG. 4 is a side view of the residue removal device for an EUV light source container of FIG. 3. FIGS. 5(a) and FIGS. 5(b) are drawings illustrating various modified examples of the head portion of the residue removal device for an EUV light source container according to one embodiment of the present invention. FIG. 6 is a block diagram of a residue removal device for an EUV light source container according to one embodiment.

[0036] Referring to FIGS. 3 and 4, the residue removal device (100) for an EUV light source container may include a frame portion (110) and a head portion (140) installed on the frame portion (110). Additionally, referring to FIG. 6, each component of the residue removal device (100) for an EUV light source container may be controlled by a control unit (150).

[0037] The control unit (150) may be placed inside the residue removal device (100) for the EUV light source container, or it may be placed separately outside the residue removal device (100) for the EUV light source container. The control unit (150) is intended to control the overall operation of the residue removal device (100) for the EUV light source container and can control the operation of the heating member (143), the head unit temperature sensor (144), the camera (145), the rotation axis drive unit (131), the head unit drive unit (135), and the support unit drive unit (133). Additionally, the control unit (150) can receive the temperature value of the inner container (20) from the inner temperature sensor (23) placed in the inner container (20). For example, the control unit (150) may be implemented as a processor such as a central processing unit (CPU), a graphics processing unit (GPU), a microprocessor, an application-specific integrated circuit (ASIC), or a field programmable gate array (FPGA). In addition, the control unit (150) may be equipped with a memory for storing various data required for the operation of the residue removal device (100) for the EUV light source container.

[0039] The frame portion (110) serves as a support for installing the head portion (140) and can move the head portion (140). The frame portion (110) may include a first plate (112), a second plate (114), a lifting unit (120), and a rotating unit (130). However, it is not limited thereto, and the configuration of the frame portion (110) can be varied in many ways.

[0040] For example, the first plate (112) may be in the shape of a rectangular plate. The first plate (112) may have a size that allows it to be inserted into and removed from the EUV light source container (10) through the previously described door (31D).

[0041] The second plate (114) may be spaced apart from the first plate (112). Additionally, the second plate (114) may have a shape corresponding to the first plate (112). For example, the second plate (114) may be in the shape of a rectangular plate and may have a size corresponding to the size of the first plate (112). A lifting unit (120) may be disposed between the first plate (112) and the second plate (114).

[0042] The lifting unit (120) can raise the second plate (114) to adjust the vertical height of the head portion (140) placed on the second plate (114).

[0043] For example, the lifting unit (120) may include a folding member (122) and a connecting bar (128). One end of the folding member (122) may be connected to the first plate (112) and the other end may be connected to the second plate (114). According to an embodiment, one folding member (122) may be installed at the front end and the rear end of the first and second plates (112, 114), respectively. However, it is not limited thereto, and only one folding member (122) may be placed in the center of the first and second plates (112, 114). The folding member (122) may have a folding link portion (125) in which one end is connected to the first plate (112) and the other end is connected to the second plate (114), and a connecting portion (126) in which the connecting bar (128) is installed through the connecting link portion (125).

[0044] Folding link portions (125) are arranged in pairs on both sides of the first and second plates (112, 114), and connecting portions (126) connect the folding link portions (125). Meanwhile, the connecting portion (126) may be provided with a through hole (not shown) through which a connecting bar (128) is inserted. Additionally, a screw portion (not shown) may be formed in the through hole so that the connecting portion (126) can move when the connecting bar (128) rotates.

[0045] The connecting bar (128) is connected to the folding member (122) and can fold the folding member (122) by rotation. That is, when the connecting bar (128) is rotated, the connecting part (126) of the folding member (122) can move along the connecting bar (128). Accordingly, the folding link part (125) installed on the connecting part (126) can be folded, and the second plate (114) can be raised or lowered. The connecting bar (128) can be rotated manually, or it can be rotated by a driving part such as a motor.

[0047] The rotation unit (130) can be installed on the upper surface of the second plate (114) and connected to the head portion (140) to rotate the head portion (140).

[0048] The rotation unit (130) may include a rotation axis (132) and a support (134). According to an embodiment, a rotation axis drive unit (131) for rotating the rotation axis (132) may be further disposed at the lower part of the rotation axis (132). Additionally, according to an embodiment, a support drive unit (133) for linearly driving the support (134) back and forth may be further disposed at the upper part of the rotation axis (132). Additionally, according to an embodiment, a head unit drive unit (135) for tilting the head unit (140) may be further disposed at the end of the support (134). The rotation axis drive unit (131), the head unit drive unit (135), and the support unit drive unit (133) may be controlled by a control unit (150).

[0050] The rotation axis (132) can be positioned vertically on the upper surface of the second plate (114), and the support (134) is horizontally connected to the rotation axis (132) so that it can rotate and move according to the rotation of the rotation axis (132). The rotation axis (132) can be installed at a position that can be placed at the center (C) of the EUV light source container (10) when the residue removal device (100) for the EUV light source container is inserted into the interior of the EUV light source container (10). Accordingly, as the rotation axis (132) rotates, the head part (140) can rotate while maintaining a predetermined distance from the inner surface (31S) of the EUV light source container (10).

[0052] The head portion (140) is positioned on the upper part of the frame portion (110) and can be used to heat residue (TC) adhering to the inner surface (31S) of the EUV light source container (10). The head portion (140) is connected to a rotation unit (130) and can be installed to rotate along a circular trajectory (CT) while maintaining a predetermined distance from the inner surface (31S) of the EUV light source container (10) (see FIG. 8). Additionally, the head portion (140) can emit heat toward the inner surface (31S) of the EUV light source container (10), which is the outer edge of the circular trajectory (CT). In one embodiment, the case in which the residue removal device (100) for the EUV light source container is equipped with one head portion (140) is described as an example, but it is not limited thereto, and a plurality of head portions (140) may be provided. In this case, a plurality of head portions (140) may be arranged along a circular trajectory (CT) to correspond to the shape of the inner surface (31S) of the EUV light source container (10). The head portions (140) may have a small thickness (T) so that they can be inserted into the narrow space between the lower inner container (21) and the residue collector (IE) inside the EUV light source container (10) (see FIG. 5(a)). For example, the thickness (T) of the head portions (140) may be about 10 cm or less. Preferably, the thickness (T) of the head portions (140) may be about 5 to 8 cm.

[0054] The head portion (140) may include a body (141), a cover (142), and a heating member (143). Additionally, the head portion (140) may further include a camera (145) and a head portion temperature sensor (144). Additionally, according to an embodiment, the head portion (140) may further include a cooling unit to prevent the head portion (140) from overheating.

[0056] The heating element (143) is a member capable of generating high-temperature heat, and in one embodiment, the heating element (143) may be a halogen lamp. However, it is not limited thereto, and the heating element (143) may be a coil that emits heat by an induction current.

[0057] The heating element (143) can be controlled to generate heat above the melting point at which the residue (TC) melts on the inner surface (31S) of the EUV light source container (10). If the residue (TC) is tin, the heating element (143) can be controlled to generate heat above 232°C, which is the melting point of tin.

[0058] Meanwhile, the heating member (143) may be formed to have a curved surface corresponding to the inner surface (31S) of the EUV light source container (10). The heating member (143) may be formed in a shape that can maintain a predetermined distance (G2) from the inner surface (31S) of the EUV light source container (10) when the head part (140) rotates along a circular trajectory (CT) (see FIG. 8). For example, the heating member (143) may have a shape curved into an arc (ARC) that is part of the circular trajectory (CT) in which the head part (140) rotates.

[0060] The cover (142) can be formed in the shape of a hollow tube that is long in one direction and surrounds the heating member (143), and the heating member (143) can be positioned on the central axis of the hollow tube. That is, the cover (142) can have a shape that is curved into an arc (ARC) so that the central axis corresponds to the shape of the heating member (143).

[0061] The cover (142) may be made of a transparent material that effectively transmits heat emitted from the heating element (143) while protecting the heating element (143). For example, the cover (142) may be a quartz glass tube.

[0062] Referring to FIG. 5(a), a reflective surface (RF1) may be formed on the inner surface (142IS) of the cover (142) to reflect heat emitted from the heating member (143) to the front. The reflective surface (RF1) may be positioned so that the heat emitted from the heating member (143) is reflected in a specific direction. However, according to the embodiment, the reflective surface may be positioned on the outer surface (142OS) of the cover (142) (see FIG. 5(b)). In this case, the reflective surface (RF2) may be formed directly on the outer surface (142OS) of the cover (142) or may be formed on the inner surface of the body (141) that contacts the cover (142).

[0064] The body (141) may be a housing formed of a metal material with excellent heat generation efficiency, serving as a support for fixing the cover (142) and the heating member (143). A cover (142), which is a hollow tube with a curved shape, may be attached to the front of the body (141), and a heating member (143), which has a curved shape, may be positioned along the central axis of the cover (142). A support member (134) may be connected to the rear of the body (141). The front (141F) of the body (141) may be formed as a curved surface similar to the shape of the cover (142) and the heating member (143) so as to maintain a predetermined distance from the inner surface (31S) of the EUV light source container (10) when the head part (140) rotates along the circular trajectory (CT) (see FIG. 8).

[0065] Referring to FIG. 5(a), an opening (141O) may be formed on the front of the body (141) to limit the irradiation range (RA) of heat emitted from the heating member (143). The opening (141O) may be formed to face upward on the front of the body (141) so that the main direction (RD) of the heat irradiated through the opening (141O) forms a predetermined angle (θ2). In one embodiment, the predetermined angle (θ2) may be about 60°, which is an angle facing the area where residue (TC) easily adheres among the inner surface (31S) of the EUV light source container (10).

[0067] Meanwhile, the head unit (140) may further include a head unit temperature sensor (144). One embodiment is described as an example in which the head unit temperature sensor (144) is placed on the upper surface of the head unit (140), but is not limited thereto. The head unit temperature sensor (144) can measure the temperature of the head unit (140) and / or the temperature of the heating member (143). The head unit temperature sensor (144) is connected to a control unit (150) and can transmit the measured temperature of the head unit (140) and / or the temperature of the heating member (143) to the control unit (150). The control unit (150) can control the power applied to the heating member (143) based on the temperature of the head unit (140) and / or the temperature of the heating member (143) to prevent overheating of the head unit (140) and to control the temperature of the heating member (143).

[0069] Additionally, the head unit (140) may further include a camera (145). The camera (145) is positioned to face the upper front of the head unit (140) and can form an image of one area of ​​the inner surface (31S) of the EUV light source container (10). The camera (145) is connected to a control unit (150) and can transmit the formed image to the control unit (150). The control unit (150) can process the image received from the camera (145) to detect the location of the residue (TC) in the formed image.

[0071] Hereinafter, with reference to FIGS. 7 and FIGS. 8, the operation of a residue removal device for an EUV light source container according to one embodiment will be described.

[0072] FIG. 7 is a schematic side view showing a residue removal device for an EUV light source container according to an embodiment of the present invention inserted into the EUV light source container of FIG. 2, and FIG. 8 is a plan view showing a residue removal device for an EUV light source container according to an embodiment of the present invention inserted into the EUV light source container of FIG. 2.

[0074] Referring to FIGS. 7 and 8, a residue removal device (100) for an EUV light source container according to one embodiment can be used for maintenance and repair work on an EUV light source container (10). The EUV collector (40) of the EUV light source container (10) can be removed in advance before maintenance and repair work is performed. The residue removal device (100) for an EUV light source container can be loaded onto a loading plate (14) and brought into the interior of the EUV light source container (10) through a door (31D). A stepped portion may be disposed on one end of the loading plate (14) to be fixed by being caught on the bottom surface (31B) of the EUV light source container (10). The residue removal device (100) for an EUV light source container may be positioned so that a rotation axis (132) that rotates the head portion (140) is aligned with the center (C) of the EUV light source container (10). At this time, the head portion (140) may be positioned between the lower inner container (21) and the residue collector (IE). The gap (G2) between the head portion (140) and the inner surface (31S) of the EUV light source container (10) may be adjusted to a size such that the head portion (140) can rotate while maintaining the gap (G2) with the inner surface (31S) of the EUV light source container (10).

[0075] The head portion (140) can irradiate light onto the inner surface (31S) of the EUV light source container (10) through the heating member (143) to heat and melt the residue (TC) adhering to the inner surface (31S) of the EUV light source container (10). The melted residue (TC) can descend along the inner surface (31S) and be received by the residue collector (IE), and the residue (TC) received by the residue collector (IE) can be removed after maintenance and repair work is completed.

[0076] The control unit (150) can control the rotation axis drive unit (131) so that the head unit (140) rotates along the inner surface (31S) of the EUV light source container (10). Additionally, the control unit (150) can control the heating member (143) to adjust the temperature and irradiation time of the light irradiated from the heating member (143). The control unit (150) can control the head unit (140) to rotate along the inner surface (31S) and irradiate light, but it can also control the head unit (140) to irradiate light while it is stopped after rotating along the inner surface (31S).

[0077] Additionally, the control unit (150) can process an image transmitted from the camera (145) to detect the location of the residue (TC), and control the head unit (140) to move to the detected location to intensively heat the area where the residue (TC) is attached. According to an embodiment, the control unit (150) can control the head unit (140) to move in a pendulum motion centered on the location of the detected residue (TC).

[0078] Additionally, the control unit (150) can control the power applied to the heating member (143) by referring to the temperature values ​​transmitted from the internal temperature sensor (23) and the head unit temperature sensor (144). The control unit (150) can cut off the power if the temperature value transmitted from the internal temperature sensor (23) exceeds a first reference temperature. For example, the first reference temperature may be approximately 1000°C. Additionally, the control unit (150) can cut off the power if the temperature value transmitted from the head unit temperature sensor (144) exceeds a second reference temperature. For example, the second reference temperature may be approximately 300°C, which is lower than the first reference temperature.

[0079] Afterward, when maintenance and repair work is completed, the residue removal device (100) for the EUV light source container can be withdrawn from the EUV light source container (10) through the door (31D).

[0081] As described above, the residue removal device (100) for the EUV light source vessel can easily remove the residue (TC) attached inside the EUV light source vessel (10) by melting it. Therefore, the time spent on maintenance and repair work of the EUV light source vessel (10) can be saved.

[0083] The present invention is not limited by the embodiments described above and the attached drawings, but is intended to be limited by the appended claims. Accordingly, various substitutions, modifications, and changes may be made by those skilled in the art within the scope of the technical concept of the present invention as described in the claims, and such are also to be considered to fall within the scope of the present invention. Explanation of the symbols

[0085] 1: Extreme Ultraviolet Exposure Equipment 10: Light Source Chamber 20: Inner container 30: Outer container 100: Residue removal device for EUV light source vessel 110: Frame section 120: Lifting unit 130: Rotating unit 140: Head unit 141: Body 142: Cover 143: Heating element 144: Head unit temperature sensor 145: Camera SO: Light source system LA: Lithography device PS: Projection system

Claims

Claim 1 A residue removal device for an EUV light source container comprising: a frame portion disposed on the bottom surface of an EUV light source container having an inner surface including a curved surface; and a head portion installed on the upper part of the frame portion to be rotatable along a circular trajectory while maintaining a predetermined distance from the curved surface of the EUV light source container, and having a heating member that emits heat toward the curved surface of the EUV light source container, wherein the heating member has a shape curved into an arc that is part of the circular trajectory, and the circular trajectory is based on a vertical axis penetrating the frame portion. Claim 2 A residue removal device for an EUV light source container according to claim 1, wherein the frame portion comprises: a first plate; a second plate spaced apart from the first plate; a lifting unit disposed between the first plate and the second plate; and a rotating unit installed on the second plate and connected to the head portion to rotate the head portion. Claim 3 In paragraph 2, the rotary unit further comprises: a rotary shaft drive unit disposed on the second plate; a rotary shaft rotatably installed on the rotary shaft drive unit; and a support connecting the rotary shaft and the head unit, wherein the vertical shaft penetrating the frame unit extends from the rotary shaft, forming a residue removal device for an EUV light source container. Claim 4 A residue removal device for an EUV light source vessel according to claim 1, wherein the head portion further comprises: a cover having an internal space in which the heating member is disposed; and a body having an opening that supports the cover and defines an area in which the cover is exposed toward the outer edge of the circular trajectory. Claim 5 In paragraph 4, the above cover is a residue removal device for an EUV light source container, which is a quartz glass tube. Claim 6 In paragraph 4, the above cover further comprises a reflective surface disposed on the inner surface of the residue removal device for an EUV light source container. Claim 7 In paragraph 4, the body further comprises a reflective surface disposed in an area in contact with the cover, for a residue removal device for an EUV light source container. Claim 8 A residue removal device for an EUV light source container according to claim 1, wherein the head portion is positioned to face the curved surface of the EUV light source container and further comprises a camera that forms an image of one region of the curved surface of the EUV light source container. Claim 9 In claim 1, the head portion further comprises a temperature sensor for measuring the temperature of the head portion, a residue removal device for an EUV light source container. Claim 10 A residue removal device for an EUV light source container comprising: a frame portion; and a head portion installed on the upper part of the frame portion so as to be rotatable along a circular trajectory and emitting heat toward the outer edge of the circular trajectory, wherein the head portion comprises: a heating member having a shape curved into an arc that is part of the circular trajectory; a cover having an internal space in which the heating member is disposed; and a body having an opening that supports the cover and defines an area in which the cover is exposed toward the outer edge of the circular trajectory, wherein the circular trajectory is based on a vertical axis penetrating the frame portion.

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