Deposition chamber module for in-line deposition system and In-line deposition system having the same

Abstract

According to one aspect of the present invention, a deposition chamber module of an inline deposition system in which a process is performed on a substrate while the substrate moves continuously is provided, comprising: a deposition chamber having a deposition space in which the substrate moves sequentially and an opening provided in a side wall perpendicular to the direction of movement of the substrate; an opening / closing door that moves linearly back and forth in a direction perpendicular to the direction of movement of the substrate and opens / closes the opening; an evaporation source support coupled to the opening / closing door inside the deposition chamber and moving integrally according to the movement of the opening / closing door; and a linear evaporation source located above the evaporation source support and positioned in the deposition space perpendicular to the direction of movement of the substrate.

Description

Technology Field

[0001] The present invention relates to a deposition chamber module of an inline deposition system and an inline deposition system. More specifically, the invention relates to a deposition chamber module of an inline deposition system and an inline deposition system that facilitates easy handling of a linear evaporation source during maintenance of the inline deposition system and easy adjustment of the deposition distance from a substrate during the deposition process. Background Technology

[0003] Organic Luminescence Emitting Devices (OLEDs) are self-luminous devices that emit light by utilizing the electroluminescence phenomenon in which light is emitted when an electric current flows through a fluorescent organic compound. Since a backlight is not required to apply light to non-luminous devices, lightweight and thin flat panel display devices can be manufactured.

[0004] Flat panel displays utilizing such organic electroluminescent devices are emerging as next-generation display devices due to their fast response speed and wide viewing angle.

[0005] In an organic electroluminescent device, the organic layers excluding the anode and cathode electrodes, such as the hole injection layer, hole transport layer, emissive layer, electron transport layer, and electron injection layer, are made of organic thin films, and these organic thin films are deposited on a substrate by a vacuum thermal evaporation method.

[0006] Cluster deposition systems and inline deposition systems are applied as equipment systems for forming organic or metal thin films by vacuum thermal evaporation. A cluster deposition system is a method of depositing organic thin films onto a substrate by arranging multiple vacuum chamber modules in a cluster to form various organic thin films, while an inline deposition system is a method of performing a deposition process by arranging multiple process chamber modules in a line and continuously transporting multiple substrates mounted on substrate carriers. Recently, significant research and development is being conducted in response to the demand for improved mass production capabilities.

[0007] Meanwhile, due to the demand for larger display sizes and improved mass production capabilities, substrates on which organic materials are deposited are required to be larger in area; consequently, the length and weight of linear evaporation sources for scan deposition in inline deposition systems are also increasing significantly.

[0008] Due to the increased size and weight of these linear evaporation sources, handling them during maintenance is difficult, and controlling the deposition distance from the substrate during the deposition process is also challenging; therefore, improvements are required in this regard. Prior art literature

[0010] Korean Patent Publication No. 10-2005-0038121 (Published April 27, 2005) The problem to be solved

[0011] The present invention provides a deposition chamber module of an inline deposition system and an inline deposition system that facilitates the handling of a linear evaporation source during maintenance of the inline deposition system and facilitates the adjustment of the deposition distance from the substrate during the deposition process. means of solving the problem

[0013] According to one aspect of the present invention, a deposition chamber module of an inline deposition system in which a process is performed on a substrate while the substrate moves continuously is provided, comprising: a deposition chamber having a deposition space in which the substrate moves sequentially and an opening provided in a side wall perpendicular to the direction of movement of the substrate; an opening / closing door that moves linearly back and forth in a direction perpendicular to the direction of movement of the substrate and opens / closes the opening; an evaporation source support coupled to the opening / closing door inside the deposition chamber and moving integrally according to the movement of the opening / closing door; and a linear evaporation source located above the evaporation source support and positioned in the deposition space perpendicular to the direction of movement of the substrate.

[0014] The deposition chamber module of the above-described inline deposition system may further include a linear guide positioned inside the deposition chamber along the direction of movement of the evaporation source support; and a guide block attached to the bottom of the evaporation source support and moving along the linear guide.

[0015] The deposition chamber module of the above-described inline deposition system may further include a guide frame provided on the outside of the deposition chamber and supporting the movement of the opening and closing door.

[0016] The deposition chamber module of the above-described inline deposition system may further include a guide rail coupled to the guide frame and installed along the direction of movement of the opening / closing door; and a moving roller part coupled to the opening / closing door and moving along the guide rail.

[0017] The deposition chamber module of the above-described inline deposition system may further include a rack gear coupled to the guide frame and installed along the direction of movement of the opening / closing door; a pinion gear meshing with the rack gear and rotatably coupled to the opening / closing door; and a first drive motor that rotates the pinion gear.

[0018] The deposition chamber module of the above-described inline deposition system may further include a lifting member interposed between the linear evaporation source and the evaporation source support to raise and lower the linear evaporation source.

[0019] The lifting unit may include an ATM box interposed between the evaporation source support and the linear evaporation source, maintaining atmospheric pressure; one or more extendable parts including a lifting rod that penetrates the ATM box, is coupled to the linear evaporation source, and moves up and down; and a lifting drive unit located within the ATM box and providing driving force to the extendable part to lift the lifting rod.

[0020] The lifting rod may have a through-hole formed in the longitudinal direction inside, and the extendable portion may include a ball screw inserted into the through-hole of the lifting rod; and a moving block coupled to the end of the lifting rod into which the ball screw is inserted, and which moves linearly along the ball screw according to the rotation of the ball screw.

[0021] The above lifting drive unit may include a second drive motor; a first gearbox unit coupled to the rotation axis of the second drive motor and transmitting the rotational force of the second drive motor in a direction intersecting the rotation axis; and a second gearbox unit coupled to the end of the extension unit and transmitting the rotational force transmitted from the first gearbox to the extension unit.

[0022] The first gearbox section comprises a first bevel gear coupled to the rotation shaft; a second bevel gear that meshes with the first bevel gear and transmits the rotational force of the second drive motor in a direction intersecting the rotation shaft; and a transmission rod with one end coupled to the second bevel gear, and the second gearbox section may comprise a third bevel gear coupled to the other end of the transmission rod; and a fourth bevel gear that meshes with the third bevel gear and transmits the rotational force in a direction intersecting the transmission rod.

[0023] According to another aspect of the present invention, an inline deposition system is provided in which a process on a substrate is performed while the substrate moves continuously, the inline deposition system comprising: a plurality of process chamber modules in which the process on the substrate is performed; and a deposition chamber module of the inline deposition system interposed between the plurality of process chamber modules to perform a deposition process on the substrate. Effects of the invention

[0025] According to an embodiment of the present invention, handling of the linear evaporation source is easy during maintenance of the inline deposition system, and the deposition distance from the substrate is easy to adjust during the deposition process. Brief explanation of the drawing

[0027] FIG. 1 is an inline deposition system to which a deposition chamber module of an inline deposition system according to one embodiment of the present invention is applied. FIG. 2 is a perspective view of a deposition chamber module of an inline deposition system according to one embodiment of the present invention. FIGS. 3 and 4 are drawings for explaining the inflow and outflow states of a deposition chamber module of an inline deposition system according to an embodiment of the present invention. FIGS. 5 and 6 are drawings illustrating the rising and falling states of a linear evaporation source of a deposition chamber module of an inline deposition system according to an embodiment of the present invention. FIGS. 7 and 8 are drawings for explaining the extended state of an extended portion of a deposition chamber module of an inline deposition system according to an embodiment of the present invention. Specific details for implementing the invention

[0028] The present invention is capable of various modifications and may have various embodiments; specific embodiments are illustrated in the drawings and described in detail in the detailed description. However, this is not intended to limit the present invention to specific embodiments, and it should be understood that it includes all modifications, equivalents, and substitutions that fall within the spirit and scope of the present invention. In describing the present invention, detailed descriptions of related prior art are omitted if it is determined that such detailed descriptions may obscure the essence of the present invention.

[0029] Terms such as "first," "second," etc., may be used to describe various components, but said components should not be limited by said terms. These terms are used solely for the purpose of distinguishing one component from another.

[0030] The terms used in this application are used merely to describe specific embodiments and are not intended to limit the invention. The singular expression includes the plural expression unless the context clearly indicates otherwise. In this application, terms such as “comprising” or “having” are intended to indicate the presence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0031] Hereinafter, an embodiment of the deposition chamber module of an inline deposition system and an inline deposition system according to the present invention will be described in detail with reference to the accompanying drawings. In describing with reference to the accompanying drawings, identical or corresponding components are given the same reference numerals, and redundant descriptions thereof will be omitted.

[0032] FIG. 1 is a top view of an inline deposition system to which a deposition chamber module of an inline deposition system according to an embodiment of the present invention is applied. FIG. 2 is a perspective view of a deposition chamber module of an inline deposition system according to an embodiment of the present invention, and FIG. 3 and FIG. 4 are drawings for explaining the inward and outward state of a deposition chamber module of an inline deposition system according to an embodiment of the present invention. FIG. 5 and FIG. 6 are drawings for explaining the up-and-down state of a linear evaporator of a deposition chamber module of an inline deposition system according to an embodiment of the present invention, and FIG. 7 and FIG. 8 are drawings for explaining the outward and outward state of an outward and outward section of a deposition chamber module of an inline deposition system according to an embodiment of the present invention.

[0033] In FIGS. 1 to 8, a transfer chamber module (12), a robot arm (14), a substrate (16), a shuttle (18), an alignment chamber module (20), a speed buffer chamber module (22), a linear evaporation source (24), a gate valve (25), a deposition chamber module (26), a deposition chamber (28), an opening (29), an opening / closing door (30), a linear guide (31), a guide frame (32), an evaporation source support (34), an ATM box (36), a lifting unit (38), a guide block (40), a guide rail (42), a moving roller (44), a lifting rod (45), a moving roller unit (46), an extension unit (47), a lifting drive unit (48), a rack gear (50), a pinion gear (52), a first drive motor (54), a second drive motor (55), a first gearbox unit (56), a second gearbox unit (58), a first bevel gear (60), a transmission rod (61), and a second Bevel gear (62), third bevel gear (64), fourth bevel gear (66), ball screw (68), moving block (70), and through part (72) are shown.

[0034] The deposition chamber module (26) of the inline deposition system according to the present embodiment is a deposition chamber module (26) of an inline deposition system in which a process is performed on the substrate (16) while the substrate (16) moves continuously, and comprises: a deposition chamber (28) in which a deposition space is provided for the sequential movement of the substrate (16) and an opening (29) is provided on a side wall in a direction perpendicular to the direction of movement of the substrate (16); an opening / closing door (30) that moves in a straight reciprocating motion in a direction perpendicular to the direction of movement of the substrate (16) and opens / closes the opening (29); an evaporation source support (34) coupled to the opening / closing door (30) inside the deposition chamber (28) and moves integrally according to the movement of the opening / closing door (30); and a linear evaporation source (24) located on the upper part of the evaporation source support (34) and placed in the deposition space perpendicular to the direction of movement of the substrate (16).

[0035] The deposition chamber module (26) of the inline deposition system according to the present embodiment is interposed within the inline system as part of the inline deposition system in which a specific process on the substrate (16) is performed while the substrate (16) is sequentially transported, and performs a deposition process on the substrate (16) that has entered the deposition chamber (28).

[0036] Before describing the deposition chamber module (26) of the inline deposition system according to the present embodiment, the inline deposition system to which the deposition chamber module (26) according to the present embodiment is applied will first be described with reference to FIG. 1.

[0037] Referring to FIG. 1, a part of an inline deposition system to which a deposition chamber module (26) of an inline deposition system according to the present embodiment is applied is shown, and in this embodiment, two deposition chamber modules (26) are arranged in a continuous configuration.

[0038] In this embodiment, each process chamber module, such as the transfer chamber module (12), alignment chamber module (20), speed buffer chamber module (22), and deposition chamber module (26), refers to a process chamber module in the form of a chamber that performs a specific process on a substrate (16), comprising a chamber in which the interior is made of high vacuum during process processing on the substrate (16), and various mechanisms mounted inside the chamber for process progress on the substrate (16).

[0039] The organic deposition on the substrate (16) is performed in a vacuum chamber, and each process chamber module, such as the transfer chamber module (12), alignment chamber module (20), speed buffer chamber module (22), and deposition chamber module (26), may have spatially separated individual chambers as shown in FIG. 1, or adjacent modules may be configured within a single chamber.

[0040] In this embodiment, each process chamber module, such as the alignment chamber module (20), speed buffer chamber module (22), and deposition chamber module (26), is provided with an individual chamber, and a gate valve (25) is arranged between them. However, among the alignment chamber module (20), speed buffer chamber module (22), and deposition chamber module (26), adjacent modules may be configured within a single chamber.

[0041] The transfer chamber module (12) is positioned at the leading end of each module constituting the inline deposition system and continuously supplies a substrate (16). The transfer chamber module (12) may be equipped with a robot arm (14), and the substrate (16) can be supplied to the alignment chamber module (20) through the robot arm (14).

[0042] The alignment chamber module (20) is connected to the rear end of the transfer chamber module (12) and receives a substrate (16) from the transfer chamber module (12) to align the substrate (16) with the mask of the shuttle (18). The shuttle (18) may be equipped with a mask for forming a pattern during the deposition process, and the substrate (16) may be aligned with the mask of the shuttle (18) and mounted on the shuttle (18).

[0043] In the alignment chamber module (20), the substrate (16) is continuously loaded onto the shuttle (18), and the shuttle (18) with the substrate (16) mounted on it moves sequentially along each module, allowing the process on the substrate (16) to be performed.

[0044] A speed buffer chamber module (22) is positioned at the front of the deposition chamber module (26) to control the speed of the shuttle (18) entering the deposition chamber module (26).

[0045] A linear evaporation source (24) is positioned in the width direction of the substrate (16) at the bottom of the deposition chamber module (26) to perform deposition on the front surface of the substrate (16) as the substrate (16) moves.

[0047] Below, we will examine in detail the deposition chamber module (26) of the inline deposition system according to the present embodiment.

[0048] The deposition chamber (28) is provided with a deposition space in which a substrate (16) moves sequentially, and an opening (29) is provided in the side wall in the direction perpendicular to the direction of movement of the substrate (16).

[0049] Gate valves (25) may be provided at both ends of the deposition chamber (28) through which the substrate (16) enters and exits, and the substrate (16) enters or exits when the gate valves (25) are opened.

[0050] An opening (29) is formed in the side wall in the direction of movement and vertical direction of the substrate (16), through which a linear evaporation source (24) inside the deposition chamber (28) can be drawn out to perform a maintenance process for the linear evaporation source (24) and the deposition chamber (28). The opening (29) is opened and closed by an opening / closing door (30) to be described later.

[0051] The opening / closing door (30) moves in a straight reciprocating motion perpendicular to the direction of movement of the substrate (16) and opens / closes the opening (29). The opening / closing door (30) is a door that closes or opens the aforementioned opening (29) and moves in a straight reciprocating motion relative to the opening (29) to close or open the deposition chamber (28). A sealing material is formed along the end of the surface of the opening / closing door (30) opposite to the opening (29), so that when the opening / closing door (30) moves in a straight motion and comes into close contact with the side wall of the deposition chamber (28), the interior of the deposition chamber (28) can be sealed by the sealing material.

[0052] The evaporation source support (34) is coupled to the opening / closing door (30) inside the deposition chamber (28) and moves integrally with the opening / closing door (30) according to the reciprocating linear movement of the opening / closing door (30).

[0053] The evaporation source support (34) is a support on which the linear evaporation source (24), to be described later, is placed, and can be formed in a plate-like structure in the form of a frame. The evaporation source support (34) is coupled to the opening / closing door (30) on the inside of the deposition chamber (28) and moves as a single unit as the opening / closing door (30) moves in a straight line.

[0054] A linear evaporation source (24) is positioned on top of an evaporation source support (34) and is placed in a deposition space perpendicular to the direction of movement of the substrate (16). A deposition material is contained in the linear evaporation source (24), and deposition is performed on the substrate (16) as the deposition material sublimates upon heating.

[0055] The deposition material sublimated by the linear evaporation source (24) is ejected linearly, and deposition is performed on the front surface of the substrate (16) as the substrate (16) moves toward the linearly ejected deposition material.

[0056] A linear evaporation source (24) is placed in a direction perpendicular to the direction of movement of the substrate (16), that is, in the width direction of the substrate (16), and deposition is performed on the front surface of the substrate (16) as the substrate (16) moves in the length direction.

[0057] In the case of a typical deposition chamber module, since it is interposed in the middle of an inline deposition system, handling tasks such as cleaning the inside of the deposition chamber, maintaining the evaporation source, or removing the evaporation source was not easy.

[0058] However, when using the deposition chamber module (26) of the inline deposition system according to the present embodiment, the opening / closing door (30), which is positioned perpendicular to the direction of movement of the substrate (16), is pulled out in a straight line during maintenance, and the evaporation source support (34) coupled to the opening / closing door (30) is pulled out together, allowing the linear evaporation source (24) to be easily pulled out to the outside of the deposition chamber (28), thereby facilitating cleaning of the inside of the deposition chamber (28) or maintenance of the linear evaporation source (24).

[0059] In order to facilitate smooth linear movement of an evaporation source support (34) that supports a linear evaporation source (24) within a deposition chamber (28), the deposition chamber module (26) according to the present embodiment may include a linear guide (31) placed inside the deposition chamber (28) along the direction of movement of the evaporation source support (34), as shown in FIGS. 3 and 4; and a guide block (40) attached to the bottom of the evaporation source support (34) and moving along the linear guide (31).

[0060] A linear guide (31) is installed along the direction of movement of the evaporation source support (34) on the bottom of the deposition chamber (28), and a guide block (40) moves smoothly along the linear guide (31). Since the lower end of the evaporation source support (34) is connected to the guide block (40), the evaporation source support (34) moves along the linear guide (31) as the opening / closing door (30) moves.

[0061] Meanwhile, as shown in FIG. 2, a guide frame (32) may be installed on the outside of the deposition chamber (28) to support the movement of a linearly reciprocating opening and closing door (30).

[0062] A guide rail (42) may be installed on the guide frame (32) according to the direction of movement of the opening / closing door (30) to facilitate the movement of the opening / closing door (30), and a moving roller part (46) having a moving roller (44) that moves along the guide rail (42) may be attached to the bottom of the opening / closing door (30). When the opening / closing door (30) moves away from the deposition chamber (28), the moving roller part (46) attached to the bottom of the opening / closing door (30) moves along the guide rail (42) and supports the movement of the opening / closing door (30).

[0063] And, in order to drive the movement of the opening / closing door (30), the deposition chamber module (26) according to the present embodiment may include a rack gear (50) that is coupled to a guide frame (32) and installed along the direction of movement of the opening / closing door (30), as shown in FIG. 1; a pinion gear (52) that meshes with the rack gear (50) and is rotatably coupled to the opening / closing door (30); and a driving motor (54, 55) that rotates the pinion gear (52).

[0064] Referring to FIG. 1, a rack gear (50) is installed in parallel with a guide rail (42) that supports the movement of the opening / closing door (30), and a pinion gear (52) and a first drive motor (54) are coupled to the opening / closing door (30). As the first drive motor (54) rotates in the forward and reverse directions, the pinion gear (52) moves along the rack gear (50) to control the movement of the opening / closing door (30).

[0065] FIGS. 3 and 4 are drawings illustrating the inlet and outlet states of a deposition chamber module of an inline deposition system according to an embodiment of the present invention. FIG. 3 shows a state in which a linear evaporation source is located inside the deposition chamber, and FIG. 4 shows a state in which a linear evaporation source is withdrawn to the outside of the deposition chamber.

[0066] During the deposition process, as shown in FIG. 3, the opening / closing door (30) is closed to the deposition chamber (28) to airtightly seal the interior of the deposition chamber (28), and after making the interior of the deposition chamber (28) a high vacuum, the deposition process on the substrate (16) is carried out.

[0067] When maintaining the deposition chamber (28) or the linear evaporation source (24), as shown in FIG. 4, when the opening / closing door (30) is pulled out of the deposition chamber (28) while the high vacuum inside the deposition chamber (28) is released, the evaporation source support (34) connected to the opening / closing door (30) is pulled out, and the linear evaporation source (24) is pulled out to the outside of the deposition chamber (28).

[0069] FIGS. 5 and 6 are drawings for explaining the lifting state of a linear evaporation source of a deposition chamber module of an inline deposition system according to the present embodiment, and FIGS. 7 and 8 are drawings for explaining the extendable state of an extendable part of a deposition chamber module of an inline deposition system according to the present embodiment.

[0070] Before starting the deposition process on the substrate (16), it is necessary to adjust the deposition distance between the substrate (16) and the linear evaporation source (24). Since the gaseous evaporation material ejected from the linear evaporation source (24) is deposited on the substrate (16) while scattering upward, it is necessary to adjust the deposition distance between the substrate (16) and the linear evaporation source (24) to control the degree of deposition. Recently, as linear evaporation sources have become larger and heavier, it is not easy to adjust the deposition distance of the linear evaporation source.

[0071] In this embodiment, to control the height of the linear evaporation source (24), a lifting member (38) is interposed between the linear evaporation source (24) and the evaporation source support (34) to allow the linear evaporation source (24) to be raised and lowered.

[0072] The lifting unit (38) according to the present embodiment includes: an ATM box (36) interposed between an evaporation source support (34) and a linear evaporation source (24) and maintaining atmospheric pressure; one or more extension units (47) including a lifting rod (45) that penetrates the ATM box (36), is coupled to the linear evaporation source (24), and moves up and down; and a lifting drive unit (48) located within the ATM box (36) and provides a driving force to the extension unit (47) to lift the lifting rod (45).

[0073] The ATM box (36) is a sealed box for providing a separate atmospheric pressure space within the vacuum deposition chamber (28), and allows for precise operation by placing a device that may be inaccurate to operate in a vacuum state inside the atmospheric pressure ATM box (36).

[0074] The expansion section (47) includes a lifting rod (45) that penetrates the ATM box (36), is coupled to a linear evaporation source (24) inside the deposition chamber (28), and moves up and down. As shown in FIGS. 5 and 6, the expansion section (47) may be composed of one or more members. The lifting rod (45), which penetrates the ATM box (36) and is located inside the deposition chamber (28), may be air-circuited from the vacuum of the deposition chamber (28) by means of a bellows tube or the like.

[0075] The lifting drive unit (48) provides driving force to extend and raise or contract and lower the lifting rod (45) of the extendable unit (47). This lifting drive unit (48) is located inside the ATM box (36) under atmospheric pressure, allowing for precise control without the influence of vacuum.

[0076] The lifting drive unit (48) according to the present embodiment may include a second drive motor (55); a first gearbox unit (56) coupled to the rotation axis of the second drive motor (55) and transmitting the rotational force of the second drive motor (55) in a direction intersecting the rotation axis; and a second gearbox unit (58) coupled to the end of the extension unit (47) and transmitting the rotational force transmitted from the first gearbox to the extension unit (47).

[0077] Referring to FIGS. 5 and 6, in order to provide driving force to a plurality of extension parts (47) by a single second driving motor (55), a first gearbox part (56) is coupled to the rotation axis of the second driving motor (55) to transmit the rotational force of the second driving motor (55) in a direction intersecting with the rotation axis, and a second gearbox part (58) is coupled to each extension part (47) to transmit the rotational force transmitted from the first gearbox part (56) to the extension part (47).

[0078] The first gearbox section (56) may include a first bevel gear (60) coupled to the rotation axis of the second drive motor (55); a second bevel gear (62) that meshes with the first bevel gear (60) and transmits the rotational force of the second drive motor (55) in a direction intersecting the rotation axis; and a transmission rod (61) having one end coupled to the second bevel gear (62).

[0079] And, the second gearbox section (58) may include a third bevel gear (64) coupled to the other end of the transmission rod (61); and a fourth bevel gear (66) that meshes with the third bevel gear (64) and transmits rotational force in a direction opposite to the transmission rod (61).

[0080] Referring to FIGS. 5 and 6, as the second drive motor (55) rotates, the first bevel gear (60) coupled to the rotation axis of the second drive motor (55) rotates, and the second bevel gear (62) meshed with the first bevel gear (60) rotates, thereby transmitting the rotational force of the second drive motor (55) to the transmission rod (61).

[0081] The rotational force transmitted by the transmission rod (61) is transmitted to the extension part (47) through the third bevel gear (64) and the fourth bevel gear (66) of the second gearbox part (58). The lifting rod (45) is extended or retracted by the rotational force transmitted to the extension part (47).

[0082] Referring to FIGS. 7 and 8, the configuration of the extension part (47) according to the present embodiment is examined in more detail. The lifting rod (45) has a penetration part (72) formed in the longitudinal direction inside, and the extension part (47) may include a ball screw (68) inserted into the penetration part (72) of the lifting rod (45); and a moving block (70) which is coupled to the end of the lifting rod (45) into which the ball screw (68) is inserted and moves linearly along the ball screw (68) according to the rotation of the ball screw (68).

[0083] The rotational force transmitted to the extension part (47) through the fourth bevel gear (66) causes the ball screw (68) to rotate, and as the ball screw (68) rotates, the movable block (70) screwed to the ball screw (68) moves along the ball screw (68).

[0084] With the ball screw (68) inserted into the through-hole (72) of the lifting rod (45), the lifting rod (45) is coupled to the moving block (70), and as the lifting rod (45) moves up and down according to the up and down movement of the moving block (70), it is raised or lowered as shown in FIGS. 7 and 8. Depending on the raising and lowering of the lifting rod (45), the deposition distance of the linear evaporation source (24) coupled above can be adjusted.

[0086] Although the present invention has been described above with reference to specific embodiments, those skilled in the art will understand that various modifications and changes can be made to the invention without departing from the spirit and scope of the invention as set forth in the following claims.

[0088] Many embodiments other than the aforementioned embodiments exist within the claims of the present invention. Explanation of the symbols

[0091] 12: Transfer chamber module 14: Robot arm 16: Board 18: Shuttle 20: Align chamber module 22: Speed ​​buffer chamber module 24: Linear evaporator 25: Gate valve 26: Deposition chamber module 28: Deposition chamber 29: Opening 30: Door 31: Linear guide 32: Guide frame 34: Evaporation source support 36: ATM box 38: Lifting section 40: Guide block 42: Guide rail 44: Moving roller 45: Lifting rod 46: Moving roller section 47: New section 48: Elevator drive section 50: Rack gear 52: Pinion gear 54: 1st drive motor 55: 2nd drive motor 56: 1st gearbox section 58: 2nd gearbox section 60: 1st bevel gear 61: Transmission rod 62: 2nd bevel gear 64: 3rd bevel gear 66: 4th bevel gear 68: Ball screw 70: Moving block 72: Penetration part

Claims

Claim 1 A deposition chamber module of an inline deposition system in which a process is performed on a substrate while the substrate moves continuously, comprising: a deposition chamber having a deposition space in which the substrate moves sequentially and an opening provided in a side wall perpendicular to the direction of movement of the substrate; an opening / closing door that moves linearly back and forth perpendicular to the direction of movement of the substrate and opens / closes the opening; an evaporation source support member coupled to the opening / closing door member inside the deposition chamber and moves integrally according to the movement of the opening / closing door member; a linear evaporation source positioned above the evaporation source support member and placed in the deposition space perpendicular to the direction of movement of the substrate; and a lifting member interposed between the linear evaporation source support member and the evaporation source support member to raise and lower the linear evaporation source member, wherein the lifting member includes an ATM box interposed between the evaporation source support member and the linear evaporation source member and maintaining atmospheric pressure; one or more extension members including a lifting rod that penetrates the ATM box, is coupled to the linear evaporation source member, and raises and lowers in an up-and-down direction; and a member located within the ATM box and providing a driving force to the extension member. The lifting drive unit for lifting the lifting rod is included, wherein the lifting rod has a through-hole formed in the longitudinal direction, and the extendable part includes a ball screw inserted into the through-hole of the lifting rod; and a moving block coupled to the end of the lifting rod into which the ball screw is inserted, and which moves linearly along the ball screw according to the rotation of the ball screw, wherein the lifting drive unit includes a second drive motor; a first gearbox part coupled to the rotation axis of the second drive motor and transmitting the rotational force of the second drive motor in a direction intersecting the rotation axis; and a second gearbox part coupled to the end of the extendable part and transmitting the rotational force transmitted from the first gearbox to the extendable part, wherein the first gearbox part includes a first bevel gear coupled to the rotation axis; and a second bevel gear meshed with the first bevel gear and transmitting the rotational force of the second drive motor in a direction intersecting the rotation axis;A deposition chamber module of an inline deposition system, characterized in that one end includes a transmission rod coupled to the second bevel gear, and the second gearbox includes a third bevel gear coupled to the other end of the transmission rod; and a fourth bevel gear that meshes with the third bevel gear and transmits the rotational force in a direction intersecting the transmission rod. Claim 2 A deposition chamber module of an inline deposition system according to claim 1, further comprising: a linear guide placed inside the deposition chamber along the direction of movement of the evaporation source support; and a guide block attached to the bottom of the evaporation source support and moving along the linear guide. Claim 3 A deposition chamber module of an inline deposition system according to claim 1, further comprising a guide frame provided on the outside of the deposition chamber and supporting the movement of the opening and closing door. Claim 4 A deposition chamber module of an inline deposition system according to paragraph 3, further comprising: a guide rail coupled to the guide frame and installed along the direction of movement of the opening / closing door; and a moving roller part coupled to the opening / closing door and moving along the guide rail. Claim 5 A deposition chamber module of an inline deposition system, further comprising: a rack gear coupled to the guide frame and installed along the direction of movement of the opening / closing door; a pinion gear meshing with the rack gear and rotatably coupled to the opening / closing door; and a first drive motor for rotating the pinion gear. Claim 6 delete Claim 7 delete Claim 8 delete Claim 9 delete Claim 10 delete Claim 11 An inline deposition system in which a process on a substrate is performed while the substrate moves continuously, comprising: a plurality of process chamber modules in which the process on the substrate is performed; and a deposition chamber module of the inline deposition system according to any one of claims 1 to 5, which is interposed between the plurality of process chamber modules to perform a deposition process on the substrate.

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